JPS60256154A - Electrophotographic sensitive body - Google Patents

Electrophotographic sensitive body

Info

Publication number
JPS60256154A
JPS60256154A JP11256784A JP11256784A JPS60256154A JP S60256154 A JPS60256154 A JP S60256154A JP 11256784 A JP11256784 A JP 11256784A JP 11256784 A JP11256784 A JP 11256784A JP S60256154 A JPS60256154 A JP S60256154A
Authority
JP
Japan
Prior art keywords
contg
insulating layer
weight
polymerizable monomer
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11256784A
Other languages
Japanese (ja)
Other versions
JPH071399B2 (en
Inventor
Hideaki Ueda
秀昭 植田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP59112567A priority Critical patent/JPH071399B2/en
Publication of JPS60256154A publication Critical patent/JPS60256154A/en
Publication of JPH071399B2 publication Critical patent/JPH071399B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14Inert intermediate or cover layers for charge-receiving layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To enhance surface hardness and smoothness, and to obtain good durability and cleanability by forming an insulating layer contg. a silicic acrylic resin contg. specified silicic polymerizable monomer units or an fluorine contg. acrylate resin contg. specified polymerizable monomer units on a photoconductive layer. CONSTITUTION:The insulating layer formed on the photoconductive layer contains an Si-contg. acrylate contg., as one structural element, Si-contg. polymerizable monomer units, each represented by formula I or II (R1 is H or methyl, R2 and R3 are each 1-8C alkyl, independent of each other) or an F-contg. acrylate resin, as an essential component, contg. as one of components, polymerizable monomer units each represented by formula III in which R1 is same as before, and Rf is 1-8C fluorinated alkyl or fluorinated hydroxyalkyl. Such an Si-contg. or F-contg. monomre is copolymerized, preferably, randomly with acrylic or methacrylic acids or the like. The formation of the insulating layer made of such a copolymer permits superior sensitivity to be obtained and printing and abrasion resistances to be enhanced.

Description

【発明の詳細な説明】 産業−にの利用分野 本発明は、電子写真感光体、特に光導電性材料粒子を絶
縁性高分子材料からなる結着剤中に分散させてなる感光
層を基体上に形成してなる電子写真感光体の改良に関す
る。
DETAILED DESCRIPTION OF THE INVENTION Field of Application in Industry The present invention relates to an electrophotographic photoreceptor, in particular, a photosensitive layer formed by dispersing photoconductive material particles in a binder made of an insulating polymeric material on a substrate. The present invention relates to an improvement in an electrophotographic photoreceptor formed by.

従来技術 一般に電子写真においては、感光体の感光層表面に帯電
、露光を行ない静電潜像を形成させ、これを現像剤で現
像して可視化させ、その可視像を得るか、あるいは感光
体上の可視像を紙などの転写紙−1−に転写し、その転
写像を定着させて複写像を得る、いわゆるPPC方式に
よるものとがある。
Prior Art In general, in electrophotography, the surface of the photosensitive layer of a photoreceptor is charged and exposed to form an electrostatic latent image, and this is developed with a developer to make it visible to obtain a visible image. There is a method using the so-called PPC method, in which the visible image is transferred to a transfer paper-1- such as paper, and the transferred image is fixed to obtain a copy image.

PPC方式の電子写真プロセスの種qに応じ感光体も種
々の構成をとる。そして、電子写真感光体の代表的なも
のとして、表面に絶縁層を備えた構成の感光体が広く用
いられている。この絶縁I―は、光導電層の保護、感光
体の機械的強度の改善、nli減衰特性の改善または、
特定の電子写真プロセスに適用されるため等の目的のた
めに設けられるものである。
The photoreceptor also has various configurations depending on the type of PPC electrophotographic process. As a typical electrophotographic photoreceptor, a photoreceptor having an insulating layer on its surface is widely used. This insulation I- protects the photoconductive layer, improves the mechanical strength of the photoreceptor, improves the nli attenuation characteristics, or
It is provided for the purpose of application to a specific electrophotographic process.

電了7g真感光体は、当然のことながら、適用される電
子写真プロセスに応した所定の感度、電気特性、さらに
は光学特性を備えていることか要求される。しかしなが
ら、それぽかりでなく、感光体の耐久性およびクリーニ
ング性も重要な性質である。
As a matter of course, the 7g true photoreceptor is required to have predetermined sensitivity, electrical properties, and optical properties in accordance with the electrophotographic process to which it is applied. However, the durability and cleanability of the photoreceptor are also important properties.

耐久性は感光体の繰返し使用する場合に要求される性質
であり、クリーニング性は感光体の表面にI=t 着し
、残留するトナーの除去の容易性を決める性質である。
Durability is a property required when the photoreceptor is used repeatedly, and cleanability is a property that determines the ease with which toner remaining on the surface of the photoreceptor can be removed.

本来、絶縁層を備えた感光体は、絶縁層によって、耐久
性に優れているものであるが、トナーの転写性クリーニ
ング性あるいは表面平滑性といったことについてなお改
善されるごとト点が指摘される。
Originally, a photoreceptor equipped with an insulating layer has excellent durability due to the insulating layer, but it is pointed out that there are still points to be improved in terms of toner transferability, cleaning performance, and surface smoothness. .

一方、絶縁層として、クリーニング性や表面平滑性に優
れたものを用いる場合、一般に感度低下を起し易く、従
って、I−記の全ての要請を満足する絶縁層はまだ得ら
れていない。
On the other hand, when an insulating layer with excellent cleaning properties and surface smoothness is used, sensitivity generally tends to decrease, and therefore an insulating layer that satisfies all the requirements in item I has not yet been obtained.

発明の目的 本発明は表面硬度および表面平滑性に優れ、その結果、
耐久性、クリーニング性に優れた絶縁層を備えた感光体
を提供することを11的とする。
Purpose of the Invention The present invention has excellent surface hardness and surface smoothness, and as a result,
An eleventh object of the present invention is to provide a photoreceptor having an insulating layer with excellent durability and cleanability.

発明の構成 本発明は光導電層」〕に絶縁層を有する電子′す゛真感
光体において、絶縁層が一般式: %式% ] [式中、R,は水素またはメチル基、R2は炭素数1〜
8のフルキレン基もよびY<:lはそれぞれ独立して炭
素91〜8のアルキル基を示す)で表わされる含ケイ素
重合性単量体を一成分として含む含ケイ素アクリル口(
脂または一般式: %式%[111量 1式中、R1は前記と同意義およびRfは炭素数1〜8
のフッ化アルキル基またはフッ化ヒドロキシアルキル基
を示す1で表わされる重合性111量体を一戒分として
含む含フツ素アクリル樹脂を主成分とする電子写真感光
体を提供する。
Structure of the Invention The present invention provides an electronic photoreceptor having an insulating layer in the photoconductive layer, in which the insulating layer has the general formula: 1~
A silicon-containing acrylic material containing as one component a silicon-containing polymerizable monomer represented by the fullkylene group of 8 and Y<:l each independently representing an alkyl group having 91 to 8 carbon atoms.
fat or general formula: % formula % [111 amount 1 formula, R1 has the same meaning as above and Rf has 1 to 8 carbon atoms
Provided is an electrophotographic photoreceptor containing as a main component a fluorinated acrylic resin containing a polymerizable 111-mer represented by 1 representing a fluorinated alkyl group or a fluorinated hydroxyalkyl group.

本発明に用いる含ケイ素重合体としては、一般式[11
または[111で示される含ケイ素単量体と、アクリル
酸またはメタクリル酸(以下、(メタ)アクリル酸と云
う)のエステル類、ニトリルまたはアミド類および所望
により、池の重合性エチレン結合を有するtB量体との
共重合物であって、ランダム共重合体が好ましい。特に
平均分子量450()〜2000 (1で分子量分布の
シャープな熱硬化性樹脂を使用するのが好適である。こ
れは平均分子量が20000を起えると、感光層の硬度
が低くなり耐刷性向−1二が望めず、逆に、4500未
満では暗減衰が増大し良好な特性が得られなくなり、ま
た、分子量分布がシャープなほど架橋度が一定4− になり、高い電荷保持能を得ることができるからである
The silicon-containing polymer used in the present invention has the general formula [11
or [tB having a silicon-containing monomer represented by 111, an ester, a nitrile or an amide of acrylic acid or methacrylic acid (hereinafter referred to as (meth)acrylic acid), and optionally a polymerizable ethylene bond. A random copolymer is preferable. In particular, it is preferable to use a thermosetting resin with an average molecular weight of 450 () to 2,000 (1) and a sharp molecular weight distribution.This is because when the average molecular weight reaches 20,000, the hardness of the photosensitive layer decreases and the printing durability decreases. -12 cannot be expected; conversely, if it is less than 4,500, dark decay increases and good characteristics cannot be obtained; in addition, the sharper the molecular weight distribution, the more constant the degree of crosslinking becomes, and the higher the charge retention ability. This is because it can be done.

また、このケイ素含有熱硬イと性アクリル樹脂は、不揮
発成分50%溶液の時、25°Cで粘度が200〜30
00cpsであるものが好ましい。これは、粘度が30
00cpsより高いと光導電性材料の分散性が悪く、逆
に200より低くなると感度低下を起す他、塗工性が悪
くなって感光層の欠損や空孔を生じるからである。
In addition, this silicon-containing thermoset acrylic resin has a viscosity of 200 to 30 at 25°C when it is a 50% solution of nonvolatile components.
00 cps is preferred. This has a viscosity of 30
If it is higher than 00 cps, the dispersibility of the photoconductive material will be poor, and if it is lower than 200 cps, the sensitivity will be lowered and the coating properties will be poor, resulting in defects and holes in the photosensitive layer.

前記一般式[11またはIn]で示される含ケイ素重合
性単量体は、R1が水素またはメチル基、R2は炭素数
1〜8、好ましくは1〜4のフルキレン基、およびR3
はそれぞれ独立して炭素数1〜8、好ましくは1〜5の
アルキル基である化合物が好適に使用し得る。特に好ま
しい含ケイ素単量体は、CH2=CH3i(OCH−)
3、 CH3 CI(2= CCOOCJ(2S + (OCH−)−
1H3 CH2= CCOOCH2CH2CH2S i(OCH
3)1、C113 ■ C1l、=C−C()OC!12C112Si((’)
Cl13)3、C11゜ ■ Cl1==CC00CH2Si(OC:It、)3、1
13 Cl12”CCO(’)CI−12C112Si(OC
211,)3、C1l、=C1l−CO(”)C112
Si(OCII、)2などである。
In the silicon-containing polymerizable monomer represented by the general formula [11 or In], R1 is hydrogen or a methyl group, R2 is a fullkylene group having 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms, and R3
Compounds each independently being an alkyl group having 1 to 8 carbon atoms, preferably 1 to 5 carbon atoms can be suitably used. A particularly preferred silicon-containing monomer is CH2=CH3i(OCH-)
3, CH3 CI (2= CCOOCJ(2S + (OCH-)-
1H3 CH2= CCOOCH2CH2CH2S i(OCH
3) 1, C113 ■ C1l, =C-C()OC! 12C112Si((')
Cl13)3, C11゜■ Cl1==CC00CH2Si(OC:It,)3,1
13 Cl12"CCO(')CI-12C112Si(OC
211,)3,C1l,=C1l-CO('')C112
Si(OCII, )2, etc.

本発明に使用し得る(メタ)アクリル酸エステル類は、
一般式: %式% 1式中、R,は水素またはエチレン、(、I<、は水素
、炭素数1〜12のアルキル基または炭素数2〜・1の
ヒドロキシアルキル基を表わすうで表わされる化合物で
ある。
(Meth)acrylic acid esters that can be used in the present invention are:
General formula: % formula % 1 In the formula, R is hydrogen or ethylene, (, I<, represents hydrogen, an alkyl group having 1 to 12 carbon atoms, or a hydroxyalkyl group having 2 to 1 carbon atoms. It is a compound.

前記一般式[■1で示される重合性1)1−量体には、
メタクリル酸メチル、メタクリル酸エチル、メタクリル
酸ブチル、メタクリル酸イソブチル、メタ7− クリル酸第3ブチル、アクリル酸ブチル、アクリル酸2
−エチルヘキシル、アクリル酸、メタクリル酸、メタク
リル酸2−ヒドロキシエチル、ツタクリル酸ヒドロキシ
プロピルなどが含まれるか、これに限定されるものでは
ない。
The polymerizable 1) monomer represented by the general formula [■1] includes:
Methyl methacrylate, ethyl methacrylate, butyl methacrylate, isobutyl methacrylate, meth-7-tert-butyl acrylate, butyl acrylate, acrylic acid 2
-Includes, but is not limited to, ethylhexyl, acrylic acid, methacrylic acid, 2-hydroxyethyl methacrylate, hydroxypropyl tutaacrylate, and the like.

また、(メタ)アクリルアミド類としては、 一般式: %式% 1式中、Roは前記と同意義、■<、は水素、炭素数1
〜8、好ましくは1〜・1のアルキル基、ヒドロキシア
ルキル基またはアルフキジメチル基を示11で示される
tlt量体、具体的には、アクリルアミド、メタクリル
アミ「、N−7チロールアクリルアミド、N−n−ブ)
キシメチルアクリルアミド等が例示される。
In addition, as (meth)acrylamides, the general formula: % formula % 1 In the formula, Ro has the same meaning as above, ■<, hydrogen, carbon number 1
to 8, preferably 1 to 1 alkyl group, hydroxyalkyl group or alphkyl dimethyl group, and the tltmer represented by 11, specifically, acrylamide, methacrylamide, N-7 tyrolacrylamide, N- n-bu)
Examples include oxymethylacrylamide.

1−配合ケイ素!it @体および(メタ)アクリル酸
エステル類と重合してもよい重合+1工チレン&11合
を有する単量体としては、スチレン、ll’ll酸ビニ
ル等がある。これらの単量体の使用犠は使用IF祉木全
8− 鼠の2 o ii、 It%以下とすべきである。
1-Blended silicon! Examples of monomers having a polymerization + 1-functional styrene & 11-polymerization which may be polymerized with the it @ body and (meth)acrylic acid esters include styrene, vinyl ll'llate, and the like. The amount of these monomers used should be less than 2.0% of the total amount of IF used.

含ケイ素アクリル?41脂中の含ケイ素りi量体の稲は
含ケイ素rB H置体中のケイ素含駄にもよるが、通常
、li祉木本重量換算5〜7()型破%、より好ましく
は10〜50重量%である。
Silicon-containing acrylic? Although it depends on the silicon content in the silicon-containing rBH substrate, the silicon-containing polymer content in the 41 fat is usually 5 to 7%, more preferably 10 ~50% by weight.

含ケイ集熱硬化性アクリレートは、上記モノマーと一般
式(111で表わされる(メタ)アクリルモノマーを公
知の方法により溶液重合あるいはエマルジョン重合させ
ることにより得られる。
The silicon-containing heat-harvesting curable acrylate can be obtained by solution polymerization or emulsion polymerization of the above monomer and a (meth)acrylic monomer represented by the general formula (111) by a known method.

本発明において用いられる含フン素アクリル(1脂は一
般式rllllで示される含フツ素重合性単量体と(メ
タ)アクリル酸のエステル類、アミド類またはニトリル
および所望により池の重合性エチレン結合を有するQt
 量体との共重合物であって、ラングム共重合体が好ま
しい。特に平均分子@2000〜400 f)Oで分子
量分布のシャープな熱硬化性樹脂を使用するのが好適で
ある。これは平均分子量が40000を超えると、感光
層の硬度が低くなり耐刷性の向−1〕が望めず、逆に、
2000未満では暗滅貸が増大し良好な特性が得られな
くなす、また、分子量分布がシャープなほど架橋度が・
定になり、高い電荷保持能を得ることかできるからであ
る。(31脂は、(;揮発成分5()%溶液の時、25
°Cで粘度か200〜3f) (l fl cp・、で
あるのか好ましい。これはオー1度が30f)fl c
psより高いと光導電性材料の分散性が悪く、逆に、2
0 +1上り低くなると感度低下を起を他、塗[、性が
悪くなって感光層の欠損や空孔を牛しるからである。
Fluorine-containing acrylic used in the present invention (1 fat is a fluorine-containing polymerizable monomer represented by the general formula Qt with
A copolymer with a polymer and a languum copolymer is preferred. In particular, it is preferable to use a thermosetting resin with an average molecular weight of 2000 to 400 f)O and a sharp molecular weight distribution. This is because when the average molecular weight exceeds 40,000, the hardness of the photosensitive layer becomes low and printing durability cannot be expected.
If it is less than 2000, the darkening will increase and it will be impossible to obtain good properties.In addition, the sharper the molecular weight distribution, the lower the degree of crosslinking.
This is because a high charge retention ability can be obtained. (31 fat is (; when volatile components are 5()% solution, 25
It is preferable that the viscosity at °C is 200 to 3 f) (l fl cp. This is 30 f at 1 degree) fl c
If it is higher than ps, the dispersibility of the photoconductive material is poor;
This is because if it goes up or down by 0+1, the sensitivity will decrease and the coating properties will deteriorate, leading to defects and holes in the photosensitive layer.

前記一般式flIl]で・示される含フッ素重合性jl
t晴体としては[で1が水素またはメチル基、I何が炭
素数1〜8、好ましくは1〜・1の77化アルキル基、
または7)化ヒドロキシアルキルJ、%である化合物が
好適に使用し得る。特に好ましい含7ノ素’ttfit
体としては1,1.1−)リフルオルエチルアクリレー
ト、トリフルオルメチルアクリレ−)、I。
The fluorine-containing polymerizable jl represented by the general formula flIl]
As a clear substance, 1 is hydrogen or a methyl group, I is a 77-alkyl group having 1 to 8 carbon atoms, preferably 1 to 1,
or 7) hydroxyalkyl J,% compounds can be suitably used. Particularly preferred heptad-containing 'ttfit
1,1.1-)trifluoroethyl acrylate, trifluoromethyl acrylate), I.

1.1−)リフルオルエチルメタクリレート、トリフル
オルメチルメタクリレート、1,1,1,2゜2.3.
3−へブタフルオルブチルアクリレート、1.1−ノフ
ルオルー1−ヒドロキシエチルアクリレート、li、I
、2,2,3.3−ヘプタフルオルアチルメタクリレー
ト、1,1−ノフルオルー1−ヒドロキシエチルメタク
リレートなどが例示される。
1.1-) Trifluoroethyl methacrylate, trifluoromethyl methacrylate, 1,1,1,2°2.3.
3-hebutafluorobutyl acrylate, 1,1-nofluoro-1-hydroxyethyl acrylate, li, I
, 2,2,3.3-heptafluoroacyl methacrylate, 1,1-nofluoro-1-hydroxyethyl methacrylate, and the like.

本発明に使用し得る(メタ)アクリル酸エステル類およ
びアミド類は、含ケイ素単量体と共重合さぜるのと同様
のものを用いればよい。
The (meth)acrylic acid esters and amides that can be used in the present invention may be the same as those copolymerized with the silicon-containing monomer.

また、所望により、他の重合性エチレン結合を有する’
t’−量体の少酸、例えば20重量%以下と共重合させ
てもよい。
In addition, if desired, '' having other polymerizable ethylene bonds
The t'-mer may be copolymerized with a oligoacid, for example up to 20% by weight.

含7ン素アクリル樹脂中の含ケイ素単量体の礒は単量体
重置換算で、2〜30重量%、より好ましくは3〜30
重量%である。
The weight of the silicon-containing monomer in the heptadium-containing acrylic resin is 2 to 30% by weight, more preferably 3 to 30% by weight, based on the monomer weight.
Weight%.

含フン素重合性I)を量体と、(メタ)アクリル酸エス
テル類(アミド、ニトリルについても同じ)との反応は
溶液重合、エマルン゛ヨン重合等公知の方法に従って行
なえばよく、その際、酸触媒としてクロトン酸、マレイ
ン酸、イタコン酸等を加えてもよい。
The reaction between the fluorine-containing polymerizable I) polymer and (meth)acrylic esters (the same applies to amides and nitriles) may be carried out according to known methods such as solution polymerization and emulsion polymerization. Crotonic acid, maleic acid, itaconic acid, etc. may be added as an acid catalyst.

本発明にJりいては」−記念ケイ素アクリルυノ脂また
は含7ン素アクリル樹脂を池のO(脂と併用してもよい
。併用し1!)る樹脂としては、感光体用結着剤の一成
分として一般に用いられているメラミン樹脂、例えばブ
チルメラミン杉(脂、メチル化メラミン樹脂、ブチル化
ベンゾグアナミン樹脂、メチル化ベンゾグアナミン(相
j凱エポキシ樹脂等がlf適なものとして例示される。
In accordance with the present invention, the commemorative silicon acrylic υ resin or heptadium-containing acrylic resin can be used as a binder for photoreceptors. Suitable examples include melamine resins commonly used as a component of the agent, such as butyl melamine cedar resin, methylated melamine resin, butylated benzoguanamine resin, methylated benzoguanamine resin, and epoxy resin.

特に7チル化メラミン街脂において好ましい&li果が
(:]られる。
Particularly preferred in heptylated melamine street fat is (:].

これらの含ケイ素アクリル樹脂および含7ノ素メラミン
樹脂以外の樹脂は全樹脂甲の5−〇()小量%、好まし
くはI f)= 5 +’1重1に%である。
Resins other than these silicon-containing acrylic resins and hepta-containing melamine resins account for a small amount of 5-0 ()% of the total resin A, preferably If) = 5 + 1% by weight.

絶縁層の形成成分として、必要に応して11!!の成分
を配合してらよい。辿の成分として有効なものに滑剤が
あけられる。滑剤としては、7ノ化ビニル、フッ化ビニ
リデン、ポリスチレン、シリコーン樹脂、塩化ビニル、
ポリ:、フン化クロロエチレン、ネオプレン、ポリプロ
ピレン等の+J4脂類、フ。
As a forming component of the insulating layer, 11! ! You can mix the ingredients. Lubricants are among the effective ingredients. As lubricants, vinyl heptanide, vinylidene fluoride, polystyrene, silicone resin, vinyl chloride,
Poly: +J4 fats such as fluorinated chloroethylene, neoprene, polypropylene, etc.

素ワックス、パラフィンワックス、合成ワックス等のワ
ンジス類、オレイン酸アミド、ステアリン酸アミド、ラ
ウリン酸アミド、7タル酸アミド、カプリン酸アミド、
パルチミン酸アミド等の脂肪−1+− 酸アミド、ステアリン酸金属(Z n + M g 、
Ca 。
Raw wax, paraffin wax, synthetic wax, etc., oleic acid amide, stearic acid amide, lauric acid amide, heptalic acid amide, capric acid amide,
Fatty-1+-acid amides such as palmitic acid amide, metal stearate (Z n + M g ,
Ca.

K、Mn等)塩、オレイン酸金属塩、ラウリン酸金属塩
、フタル酸金属塩、カプリン酸金属塩等の脂肪酸金属塩
、フッ化カーボン、グラファイト等の炭素類、モリブデ
ン、二硫化モリブデン等のモリブデン類、その他室化ホ
ウ素、炭酸金属塩(例えば二酸化ケイ素)等が有効な滑
剤としてあげられる。
K, Mn, etc.) salts, fatty acid metal salts such as oleic acid metal salts, lauric acid metal salts, phthalic acid metal salts, capric acid metal salts, carbons such as carbon fluoride and graphite, molybdenum such as molybdenum, molybdenum disulfide, etc. Examples of effective lubricants include boron chloride, metal carbonate (eg, silicon dioxide), etc.

絶縁層に残留電位を−上昇させないために、電荷輸送材
料や低抵抗有機化合物を添加してもよい。
In order to prevent the residual potential from increasing in the insulating layer, a charge transporting material or a low resistance organic compound may be added.

電荷輸送材料は、ヒドラゾン系、オキサジアゾール系、
トIJフェニルメタン系、ピラゾリン系、スチリル系等
の化合物である。また、低抵抗有機化合物としては7エ
ロセンやテトラシアノキノジメタン等の化合物である。
Charge transport materials include hydrazone type, oxadiazole type,
These are phenylmethane-based, pyrazoline-based, and styryl-based compounds. Examples of low resistance organic compounds include compounds such as 7-erocene and tetracyanoquinodimethane.

絶縁層は所望の特性に応じた厚さに設定される。The thickness of the insulating layer is set according to desired characteristics.

一般に感光体の保護および耐久性、暗減衰特性の必要等
を主目的として絶縁層を付設する場合には絶縁層に比較
的薄く設定され、感光体を特定の電子写真プロセスに用
いる場合に設けられる絶縁層12− は比較的厚く設定される。通常、絶縁層の厚さは、()
、1〜100μ輸、特に()、1〜5()μIが適当で
ある。
Generally, when an insulating layer is attached mainly for the purpose of protecting the photoreceptor, durability, dark decay characteristics, etc., the insulating layer is set to be relatively thin, and it is provided when the photoreceptor is used for a specific electrophotographic process. The insulating layer 12- is set relatively thick. Usually the thickness of the insulation layer is ()
, 1 to 100μI, especially (), 1 to 5()μI are suitable.

本発明に用いられる光導電層は、SeやCdsを蒸着し
たもの、Cds、ZnO,TiO2を絶縁性バインダー
との混合物を塗布したもの、ポリビニルカルバゾール、
アセトラセン、フタロシアニン等の有機光導電性材料を
塗布したものおよび絶縁性バインダーとの混合物や、電
荷輸送層を積層にしたもの等いずれのものでも使用でき
る。
The photoconductive layer used in the present invention includes a layer coated with Se or Cds, a layer coated with a mixture of Cds, ZnO, and TiO2 with an insulating binder, polyvinylcarbazole,
Any of those coated with an organic photoconductive material such as acetracene or phthalocyanine, a mixture with an insulating binder, and a layered layer with a charge transport layer can be used.

発明の効果 本発明電子写真感光体は、優れた感度を有し、耐刷性、
耐摩耗性が著しく優れている。
Effects of the Invention The electrophotographic photoreceptor of the present invention has excellent sensitivity, printing durability,
Excellent wear resistance.

寒埠t1ユ 攪拌磯および冷却器を備えた内容積5eの反応容器中に
アクリルアミド50g、スチレン1308、CH2=C
l−1−COOCH2CF3150Bとクメンハイドロ
パーオキサイド38、ブタノール350BおよびL−ド
デシルメルカプタン3gを仕込み、還流してからクメン
ハイドロパーオキサイド18を加えた。こうして得られ
た不揮発分48〜50%の透明なペースポリマー溶液に
IOflgのホルマリンのメチルエチルケトン18tl
iトME水マレイン酸1.5gを加えた。こうして3時
間反応させることにより、粘度750cpsの無色透明
な含フン素熱硬化性アクリル樹脂を得た。
50 g of acrylamide, 1308 styrene, CH2=C in a reaction vessel with an internal volume of 5e equipped with a stirring rock and a cooler.
l-1-COOCH2CF3150B, cumene hydroperoxide 38, butanol 350B, and 3 g of L-dodecyl mercaptan were charged, and after refluxing, cumene hydroperoxide 18 was added. 18 tl of IOflg of formalin and methyl ethyl ketone were added to the thus obtained clear paste polymer solution with a non-volatile content of 48-50%.
1.5 g of ME water maleic acid was added. By reacting in this way for 3 hours, a colorless and transparent fluorine-containing thermosetting acrylic resin with a viscosity of 750 cps was obtained.

一方、炭酸カドミウム173重量部を塩化第2銅0.6
8重量部を含む水溶液に加え、硫化水素を吹外込んでC
d5(Cu)・nCdCO3を沈殿させた。この沈殿物
を炉別し、水洗し、乾燥した後、粉砕し、250’Cで
15時間焼成してCd5(Cu)・nCdCO:1(0
< n≦4)光導電性粒子を得た。この光導電性粒子1
00重量部、熱硬化性アクリル樹脂(アクリディックA
405:太日本インキ(株)製)60重量部およびトル
エン230重量部をボールミルボットにて十分に混練し
て均一に分散させて光導電性塗料を7111!lた。こ
の光導電性塗料をアルミニウム基体−hに塗布腰約30
μm0の光導電層を形成した。
On the other hand, 173 parts by weight of cadmium carbonate was added to 0.6 parts by weight of cupric chloride.
In addition to an aqueous solution containing 8 parts by weight, hydrogen sulfide was blown into the C.
d5(Cu)·nCdCO3 was precipitated. This precipitate was separated in a furnace, washed with water, dried, crushed, and calcined at 250'C for 15 hours.
<n≦4) Photoconductive particles were obtained. This photoconductive particle 1
00 parts by weight, thermosetting acrylic resin (Acrydic A
405: produced by Tai Nippon Ink Co., Ltd.) and 230 parts by weight of toluene were sufficiently kneaded in a ball mill bot to uniformly disperse the photoconductive paint 7111! It was. The coating time of this photoconductive paint on an aluminum substrate is approximately 30
A photoconductive layer of μm0 was formed.

この光導電層の表面に前述の含フツ素アクリル0(脂1
0重量部とメラミン樹脂(スーパーベッカミンJ82f
l:火1本インキ(株)製)2重量部を加え、メチルイ
ソブチルケトンて゛希釈して0.5μ翔の絶縁層を形成
した。
The surface of this photoconductive layer is coated with the aforementioned fluorine-containing acrylic 0 (fat 1).
0 parts by weight and melamine resin (Super Beckamine J82f
2 parts by weight of 1 (manufactured by Hi-Ippon Ink Co., Ltd.) were added and diluted with methyl isobutyl ketone to form an insulating layer with a thickness of 0.5 μm.

実施例ター 実施例1と同様の重合操作法でモア7−とじて、スチレ
ン20(ig、1,1.1−)リフルオルエチルメタク
リレート12(1,、メチルメタクリレート508およ
びβ−ヒドロキシプロピルアクリレート30gを使用し
て固型分50%、粘度] 20o cpsの含7ン素熱
硬化性アクリル用脂を得た。
EXAMPLE The same polymerization procedure as in Example 1 was used to close the mower to obtain styrene 20 (ig, 1,1.1-) trifluoroethyl methacrylate 12 (1, 508 methyl methacrylate and 30 g of β-hydroxypropyl acrylate). Using this method, a thermosetting acrylic resin containing 7 nitrogen having a solid content of 50% and a viscosity of 20 o cps was obtained.

ε型銅7りロシアニア16重量部、I】−ノ二チルアミ
ノベンズアルデヒドジフェニルヒドラゾン30重量部、
アクリルポリオール(タケラッ2A−フ+12:武田薬
品(株)!り36重量部、エポキシ樹脂(エポン10 
(17ニジモル化学?1製)5重量部およびメチルイソ
ブチルケトン:セロソルブアセテー)(1:1)の混合
溶剤30重量部をボールミルにて十分に混練して均一に
分散さぜ光導電性塗料を調製した。
ε-type copper 7 russiania 16 parts by weight, I]-nonitylaminobenzaldehyde diphenylhydrazone 30 parts by weight,
Acrylic polyol (Takera 2A-F+12: Takeda Pharmaceutical Co., Ltd.) 36 parts by weight, epoxy resin (Epon 10
(manufactured by 17 Nijimol Kagaku? 1) and 30 parts by weight of a mixed solvent of methyl isobutyl ketone: cellosolve acetate (1:1) were thoroughly kneaded in a ball mill and dispersed uniformly to form a photoconductive paint. Prepared.

15− この光導電性塗料をアルミニウム基体上に塗布し、約1
0μ輪の光導電層を形成した。この光導電層の表面に前
述の含フツ素熱硬化性アクリル樹脂10重量部とメラミ
ン樹脂(スーパーベッカミンJ820:大日本インキ(
株)製)2重量部を加え、メチルイソブチルケトンで希
釈して塗布し0゜3μmの絶縁層を形成した。
15- Apply this photoconductive coating onto an aluminum substrate and apply approximately 1
A photoconductive layer with a diameter of 0 μm was formed. The surface of this photoconductive layer is coated with 10 parts by weight of the aforementioned fluorine-containing thermosetting acrylic resin and a melamine resin (Super Beckamine J820: Dainippon Ink (
Co., Ltd.) was added, diluted with methyl isobutyl ketone, and applied to form an insulating layer with a thickness of 0.3 μm.

実美例淡 絶縁層にステアリン酸アミドを0.5重量部添加した以
外は実施例2と全く同様にして感光体を作製した。
EXAMPLE A photoreceptor was prepared in exactly the same manner as in Example 2 except that 0.5 parts by weight of stearic acid amide was added to the thin insulating layer.

采鵞例−牛− 攪拌19j、および加熱器を備えた内容積5eの反応容
器中にメタクリル酸メチル150重量部、アクリル酸ブ
チル100重量部、d−メタクリルオキシプロピルトリ
メトキシシラン40重量部、クメンヒドロパーオキサイ
ド3重量部、トルエン200重量部および酢酸ブチル1
00重量部を入れ、加熱し、共重合させて不揮発分50
重量%の透明な含ケイ素アクリル樹脂を得た。このO(
脂の粘度−16= は1000 c1+s、分子量8 S (1(+であっ
た。
150 parts by weight of methyl methacrylate, 100 parts by weight of butyl acrylate, 40 parts by weight of d-methacryloxypropyltrimethoxysilane, and cumene in a reaction vessel with an internal volume of 5e equipped with a stirrer 19j and a heater. 3 parts by weight of hydroperoxide, 200 parts by weight of toluene and 1 part by weight of butyl acetate
00 parts by weight, heated and copolymerized to reduce the non-volatile content to 50 parts by weight.
% by weight of transparent silicon-containing acrylic resin was obtained. This O(
The viscosity of fat -16= is 1000 c1+s, and the molecular weight is 8 S (1(+).

この含ケイ素アクリル樹脂10重徹部を酸触媒とともに
トルエンで希釈して塗布し砂化さ・Uて0.5μ鎮の絶
縁層を実施例2の光導電層1−に形成した。
10 parts of this silicon-containing acrylic resin was diluted with toluene and applied together with an acid catalyst to form a sanded insulating layer with a thickness of 0.5 μm on the photoconductive layer 1- of Example 2.

実施例−5一 実施例4で得られた含ケイ素アクリル樹脂10重量部に
N−エチルカルバゾール−3−アルデヒドメチルフェニ
ルヒドラゾン2重量部を添加し、トルエンで希釈して塗
布後、硬化させて約1μmの絶縁層を実施例2の光導電
層lユに形成した。
Example 5 - 2 parts by weight of N-ethylcarbazole-3-aldehydemethylphenylhydrazone was added to 10 parts by weight of the silicon-containing acrylic resin obtained in Example 4, diluted with toluene, coated, and cured to give approximately A 1 μm insulating layer was formed on the photoconductive layer of Example 2.

ル悴例−上 実施例1の感光層の一1二に熱硬化性アクリル樹脂(ア
クリディックA405)10重量部とメラミン4J(脂
(スーパーベッカミンJ82(’l)2重量部を加え、
トルエンで希釈して塗布し、硬化させて0゜5μmの絶
縁層を形成した。
Example - 10 parts by weight of a thermosetting acrylic resin (Acrydic A405) and 2 parts by weight of melamine 4J (Super Beckamine J82 ('l) were added to the photosensitive layer 112 of Example 1 above.
It was diluted with toluene, applied, and cured to form an insulating layer with a thickness of 0.5 μm.

坦較例ツー ε型銅7り0972710重量部、【】−ノエチルアミ
ノベンズアルデヒドノフェニルヒドラゾン30重量部、
アクリルポリオール(タケランクツ\7(12)36重
量部、エポキシ411脂(エポンI +−1117)5
重■部す3よびメチルイソブチルケトン:セロソルブア
セテ−)(+:1)の混合溶剤30重市部をボールミル
にて1−分に混練して均一に分散させた導電性塗料を調
製した。この光導電性塗料をアルミニウム基体1〕に塗
布し、約10μmの光導電層を形成し感光体を作製した
Comparative Example Two ε-type copper 7 0972710 parts by weight, []-noethylaminobenzaldehydonophenylhydrazone 30 parts by weight,
Acrylic polyol (Takerankutsu\7(12) 36 parts by weight, epoxy 411 resin (Epon I +-1117) 5
A conductive coating material was prepared by kneading 30 parts of a mixed solvent of 3 parts of 2 parts and 30 parts of methyl isobutyl ketone (cellosolve acetate) (+:1) for 1 minute in a ball mill to uniformly disperse the mixture. This photoconductive paint was applied to an aluminum substrate 1 to form a photoconductive layer of about 10 μm, thereby producing a photoreceptor.

比較例3− 比較例2の光導電層トに前述のアクリルポリオール10
重量部およびエポキシ杉1脂1.5重量部をトルエンで
希釈して塗布し、硬化させて0.5μmの絶縁層を形成
した。
Comparative Example 3 - The photoconductive layer of Comparative Example 2 was coated with the aforementioned acrylic polyol 10.
Parts by weight and 1.5 parts by weight of epoxy Cedar 1 fat were diluted with toluene and applied, and cured to form an insulating layer of 0.5 μm.

得られた感光体を粉像転写型複写(幾(EP−31f)
:ミ/ルタカメラ(株)製)に組込み、実施例1、比較
例1は−(iKVのコロナ放電で、その池は」−6K 
Vのコロナ放電で初期に感光本表面に印加した直後の感
光体の表面電位V。(V)、露先後の表面電位が初期表
面電位の1/2に減少するのに要する露光域E2 /1
(lt+x、5ec)および摩擦係数をillす定した
。また、500 (1枚コピー後の画像晶質を測定した
。測定結果を表−1に示す。
The obtained photoreceptor was subjected to powder image transfer type copying (Iku (EP-31f)).
:Incorporated into Mi/Ruta Camera Co., Ltd.), Example 1 and Comparative Example 1 were -(iKV corona discharge, the pond was "-6K
The surface potential V of the photoreceptor immediately after a corona discharge of V is initially applied to the surface of the photoreceptor. (V), exposure range E2 /1 required for the surface potential after exposure to decrease to 1/2 of the initial surface potential
(lt+x, 5ec) and the coefficient of friction were determined. In addition, the image crystallinity after copying 500 (1 sheet) was measured. The measurement results are shown in Table 1.

19− 20− 表−1から明らかなように、本発明の感光体は、初期静
電特性、耐刷性に優れ、クリーニング性か良好なため、
感光体が艮)1を命となる。
19-20- As is clear from Table 1, the photoreceptor of the present invention has excellent initial electrostatic properties, printing durability, and good cleaning properties.
The photoreceptor becomes life.

Claims (1)

【特許請求の範囲】 1、光導電層−にに絶縁層を有する電子写工1感尤体に
おいて、絶縁層が一般式: %式%] [式中、R3は水素またはメチル基、R2は炭素数1〜
8のアルキレン基およびR3はそれぞれ独立して1に素
数1〜8のアルキル基を示す1で表わされる含ケイ素重
合性単量体を一成分として含む含ケイ素アクリルfit
脂または一般式:%式%11 1式中、R1は前記と同意義およびRfは炭素数1−8
の7フ化アルキル基または7フ化ヒドロキシアルキル基
を示す1で表わされる重合性!iiY!、体を一成分と
して含む含7ン素アクリル樹脂を1:、成分とする電子
写真感光体。
[Claims] 1. In an electrophotographic photosensitive member having an insulating layer on the photoconductive layer, the insulating layer has the general formula: % formula %] [wherein R3 is hydrogen or a methyl group, R2 is Carbon number 1~
A silicon-containing acrylic fit containing as one component a silicon-containing polymerizable monomer represented by 1, in which the alkylene group of 8 and R3 each independently represent an alkyl group having a prime number of 1 to 8.
fat or general formula:% formula%11 In the formula, R1 has the same meaning as above and Rf has 1-8 carbon atoms
Polymerizability represented by 1 representing a heptafluorinated alkyl group or a heptafluorinated hydroxyalkyl group! iiY! , an electrophotographic photoreceptor containing a heptadium-containing acrylic resin as one component.
JP59112567A 1984-05-31 1984-05-31 Electrophotographic photoreceptor Expired - Lifetime JPH071399B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59112567A JPH071399B2 (en) 1984-05-31 1984-05-31 Electrophotographic photoreceptor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59112567A JPH071399B2 (en) 1984-05-31 1984-05-31 Electrophotographic photoreceptor

Publications (2)

Publication Number Publication Date
JPS60256154A true JPS60256154A (en) 1985-12-17
JPH071399B2 JPH071399B2 (en) 1995-01-11

Family

ID=14589927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59112567A Expired - Lifetime JPH071399B2 (en) 1984-05-31 1984-05-31 Electrophotographic photoreceptor

Country Status (1)

Country Link
JP (1) JPH071399B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079108A (en) * 2008-09-26 2010-04-08 Fuji Xerox Co Ltd Electrophotographic photoreceptor, process cartridge and image forming apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117134A (en) * 1976-03-27 1977-10-01 Ricoh Co Ltd Electrophotographic light sensitive material
JPS545731A (en) * 1977-06-15 1979-01-17 Rikurou Saegusa Light sensitive element for electrophotography

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117134A (en) * 1976-03-27 1977-10-01 Ricoh Co Ltd Electrophotographic light sensitive material
JPS545731A (en) * 1977-06-15 1979-01-17 Rikurou Saegusa Light sensitive element for electrophotography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079108A (en) * 2008-09-26 2010-04-08 Fuji Xerox Co Ltd Electrophotographic photoreceptor, process cartridge and image forming apparatus

Also Published As

Publication number Publication date
JPH071399B2 (en) 1995-01-11

Similar Documents

Publication Publication Date Title
US4547447A (en) Photosensitive members for electrophotography containing phthalocyanine
JPS60256154A (en) Electrophotographic sensitive body
JPH0323902B2 (en)
US4960666A (en) Toner and developer compositions with polysilylenes
JP4289853B2 (en) Image forming method
JPH0547104B2 (en)
US4033890A (en) Liquid developer for electrophotography
JPS6259967A (en) Liquid developer for electrophotography
JPH0887126A (en) Positive charge toner and developer composition
JPS60451A (en) Electrophotographic sensitive body
JP3190425B2 (en) Novel (meth) acrylic polymer, and electrophotographic developer and electrophotographic photosensitive member using the same
JPS60501976A (en) Silicone release paint for effect toner transfer
US3515550A (en) Electrophotographic composition comprising zinc oxide and a metallic naphthenate
JPH04121756A (en) Electrophotographic carrier
JP3021260B2 (en) Developer for developing electrostatic image and image forming method
JPS58127930A (en) Electrophotographic receptor
JP3028270B2 (en) Image forming method and image forming developer
JP2003255580A (en) Electrophotographic photoreceptor, method for manufacturing the same, image forming method, image forming apparatus and process cartridge
JP3991572B2 (en) Toner, two-component developer for electrophotography, and method for producing the toner
JPS5938751A (en) Electrophotographic receptor
JP2003005401A (en) Electrophotographic photoreceptor, method for manufacturing electrophotographic photoreceptor, method for forming image, image forming device and process cartridge
JP2003302780A (en) Electrophotographic photoreceptor, method for manufacturing electrophotographic photoreceptor, image forming method, image forming device and process cartridge
JPS59231546A (en) Electrophotographic sensitive body
JP2011242459A (en) Developer carrier
JPH0336221B2 (en)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term