JPS60251919A - Gas scrubbing appratus - Google Patents
Gas scrubbing appratusInfo
- Publication number
- JPS60251919A JPS60251919A JP59107187A JP10718784A JPS60251919A JP S60251919 A JPS60251919 A JP S60251919A JP 59107187 A JP59107187 A JP 59107187A JP 10718784 A JP10718784 A JP 10718784A JP S60251919 A JPS60251919 A JP S60251919A
- Authority
- JP
- Japan
- Prior art keywords
- storage tank
- scrubbing
- cleaning
- gas
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Gas Separation By Absorption (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は、洗浄塔内で、触媒をけん濁状態で含む洗浄
液によりガス洗浄を行なう装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for cleaning gas in a cleaning tower using a cleaning liquid containing a catalyst in suspension.
ガス洗浄装置は、ガス中の特定成分を洗浄液に吸収させ
るために充填材を介して気液接触させるもので、一般に
脱臭や排ガスの洗浄などに広く用いられている。例えば
、脱臭装置の例をあげると、洗浄液としてアルカリ水溶
液を用い、し尿処理塔などの悪臭ガスを洗浄して、ガス
中の硫化水素を吸収、アルカリ反応させて除去するもの
があり、また、その洗浄液に触媒をけん濁状態で含才せ
て吸収効率を高めたものがある。Gas cleaning devices bring specific components in gas into gas-liquid contact through a filler in order to absorb them into a cleaning liquid, and are generally widely used for deodorization, exhaust gas cleaning, and the like. For example, some deodorizing equipment uses an alkaline aqueous solution as the cleaning liquid to clean foul-smelling gas from sources such as human waste treatment towers, absorbs hydrogen sulfide in the gas, and removes it through an alkaline reaction. Some cleaning solutions contain catalysts in a suspended state to increase absorption efficiency.
これらは、洗浄液に吸収した物質の酸化生成物が蓄積さ
れ、才だ、洗浄ガスが乾燥していると、洗浄液中の水分
が蒸発するため、溶解物質が濃縮されることとなり、カ
ルシウム、マグネジ1クムなどのスケールが生成しやす
くなる。このため、濃縮率を高めないように補給水を加
え、溶解物質を常に排出させる必要がある。この排出さ
れた洗浄液には触媒などかけん濁物として含まれている
ため、従来から種々の工夫がなされて、触媒を回収再利
用し、けん濁物のない上澄水として排出している。These are caused by the accumulation of oxidation products of substances absorbed in the cleaning liquid.If the cleaning gas is dry, the water in the cleaning liquid evaporates, concentrating the dissolved substances, causing calcium, magnetic acid, etc. Scales such as cum become easier to generate. For this reason, it is necessary to add make-up water and constantly discharge dissolved substances so as not to increase the concentration rate. Since this discharged cleaning liquid contains catalyst and other suspended matter, various techniques have been used to collect and reuse the catalyst and discharge it as supernatant water free of suspended matter.
その従来の一例を示せば、第1図に示すように充填材1
を内装した洗浄塔2内上部のスプレーノズル3から洗浄
液を噴出流下させるとともに、ブロアー4により洗浄塔
2内に下部から被洗浄ガスを送り込み、その洗浄ガスを
充填材1中で洗浄液と気液接触させ、デミスタ−5にて
同伴するミストを除去したのち、外気に放出する。一方
、充填材1からの洗浄水は洗浄塔2下部の貯留槽6に流
下し、スラリーポンプ7によりスプレーノズル3に循環
される。An example of the conventional method is as shown in FIG.
The cleaning liquid is jetted down from the spray nozzle 3 at the upper part of the cleaning tower 2, which is equipped with a cleaning tower 2, and the gas to be cleaned is sent from the lower part into the cleaning tower 2 by the blower 4, and the cleaning gas is brought into gas-liquid contact with the cleaning liquid in the packing material 1. After removing the accompanying mist with a demister 5, it is released into the outside air. On the other hand, the cleaning water from the filler 1 flows down to the storage tank 6 at the bottom of the cleaning tower 2 and is circulated to the spray nozzle 3 by the slurry pump 7.
循環する洗浄水は、pH計8によりpH値が測定され、
その値に基つき、調整器9によりアルカリ濃厚液10が
ポンプ11を介して洗浄塔2内に適宜に流入されて洗浄
水のpH調整がなされる。The pH value of the circulating cleaning water is measured by a pH meter 8,
Based on this value, the alkaline concentrate 10 is appropriately flowed into the washing tower 2 by the regulator 9 via the pump 11 to adjust the pH of the washing water.
また、悪臭成分あるいは悪臭成分の酸化生成物が洗浄液
中に蓄積濃縮されるのを防ぐため、一定量の補給水12
が加えられ、その加えた量の洗浄液が貯留槽6の下部開
口13から隣接する沈降分離槽14に流入して上部から
溢流する。In addition, in order to prevent malodorous components or oxidation products of malodorous components from accumulating and concentrating in the cleaning solution, a certain amount of make-up water 12
is added, and the added amount of cleaning liquid flows into the adjacent settling tank 14 from the lower opening 13 of the storage tank 6 and overflows from the upper part.
この従来例においては、沈降分離槽14の側面を傾斜さ
せているため、ここでの液の流れはゆっくりとなり、更
に上部へ行(はど流速は遅くなり、けん濁している触媒
が沈降分離されるとしている。In this conventional example, since the side surface of the sedimentation separation tank 14 is inclined, the flow of the liquid here is slow, and the liquid flows further upward (the flow rate is slow and the suspended catalyst is separated by sedimentation). It is said that
しかしながら、貯留槽6と分離槽14とは下部開口13
によって連通しているため、貯留槽6下部に集積する触
媒が流水と共に分離槽14に流入して大量となり、沈降
せずに溢流水とともに外部に流れ出る問題がある。すな
わち、円滑な沈降分離がなされない問題がある。However, the storage tank 6 and the separation tank 14 are connected to the lower opening 13.
Because of this, there is a problem that the catalyst accumulated in the lower part of the storage tank 6 flows into the separation tank 14 together with the flowing water, becomes large in quantity, and flows out together with the overflowing water without settling. That is, there is a problem in that smooth sedimentation and separation cannot be performed.
この発明は、触媒の円滑な沈降分離を行ない得るガス洗
浄装置を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a gas cleaning device that can perform smooth sedimentation separation of a catalyst.
この目的を達成するため、この発明にあっては上記従来
のガス洗浄装置において、洗浄塔内下部の洗浄液貯留槽
に隣接して沈降分離槽を形成するとともに、両槽間上部
に貯留槽からの溢流堰を形成し、分離槽下部から貯留槽
上部にポンプを介設した沈降触媒返送用通路を設けたも
のである。In order to achieve this object, in the conventional gas cleaning apparatus described above, a sedimentation separation tank is formed adjacent to the cleaning liquid storage tank in the lower part of the cleaning tower, and a sedimentation separation tank is formed in the upper part between the two tanks from the storage tank. An overflow weir is formed, and a precipitated catalyst return passageway with a pump is provided from the bottom of the separation tank to the top of the storage tank.
この様に構成することにより、従来と同様に気液接触に
よってガス洗浄が行なわれ、貯留槽の洗浄液は溢流して
沈降分離槽に流れ込み、その上澄液が溢流して外部に排
出される。分離槽内の沈降 □触媒はポンプにより返送
用通路を通って貯留槽に戻される。この作用時、貯留槽
の上部は触媒のけん制用も少なく、その上部の洗浄水が
溢流によって分離槽に流入するため、触媒の流入量も少
ない。With this configuration, gas cleaning is performed by gas-liquid contact as in the conventional case, the cleaning liquid in the storage tank overflows and flows into the sedimentation separation tank, and the supernatant liquid overflows and is discharged to the outside. Sedimentation in the separation tank □The catalyst is returned to the storage tank through the return passage by a pump. During this operation, the upper part of the storage tank does not have much use for holding back the catalyst, and since the washing water in the upper part overflows and flows into the separation tank, the amount of catalyst flowing in is also small.
したかつて、この発明によると、ガス洗浄装置から流れ
出る触媒が極めて少なくなるため、操業コストの低減を
図り得る効果がある。However, according to the present invention, the amount of catalyst flowing out from the gas scrubbing device is extremely reduced, which has the effect of reducing operating costs.
以下、この発明の実施例を添付図面第2図に基ついて説
明する。なお前記と同一符号は同一物を示す。Embodiments of the present invention will be described below with reference to FIG. 2 of the accompanying drawings. Note that the same reference numerals as above indicate the same items.
図に示すように、前述のガス洗浄装置において、貯留槽
6と沈降分離槽14との隔壁上部に溢流堰15を形成1
.て、貯留槽6」二部の洗浄水を溢流可能とし、分因(
槽14下部から貯留槽6上部にタクト16を設け、この
ダクト16下部にブロアー17から電磁弁18を介して
エアーを流入可能とし、このエアーのリフト効果により
分離槽14下部の沈降触媒を貯留槽6に返送する。As shown in the figure, in the above-mentioned gas cleaning device, an overflow weir 15 is formed at the upper part of the partition between the storage tank 6 and the sedimentation separation tank 14.
.. This allows the cleaning water in two parts of the storage tank 6 to overflow, causing separation (
A tact 16 is provided from the lower part of the tank 14 to the upper part of the storage tank 6, and air can flow into the lower part of the duct 16 from a blower 17 via a solenoid valve 18, and the lifting effect of this air moves the sedimented catalyst in the lower part of the separation tank 14 into the storage tank. Return it to 6.
才だフロア−17からは、貯留槽6下部に設けた散気具
19にエアーを供給可能とし、この散気具19の散気に
より貯留槽6内における触媒の沈降堆積を防止する。Air can be supplied from the floor 17 to a diffuser 19 provided at the bottom of the storage tank 6, and the diffusion of air by the diffuser 19 prevents the catalyst from settling and accumulating in the storage tank 6.
沈降分離槽14は、図示のことくその側壁を傾斜面とす
れは、触媒沈降作用の点て有利となる。If the sedimentation separation tank 14 has a sloped side wall as shown in the drawing, it is advantageous in terms of the catalyst sedimentation effect.
また、分離槽14の整流板20を設けれは、貯留槽6か
らの洗浄液と上澄液か混合しない効果がある。Further, the provision of the current plate 20 in the separation tank 14 has the effect of preventing the cleaning liquid from the storage tank 6 from mixing with the supernatant liquid.
実施例は思」二のように構成されており、つぎにその作
用を説明する。The embodiment is constructed as shown in Fig. 2, and its operation will be explained next.
従来と同様にスプレーノズル3から洗浄液が噴出流下し
ている状態において、ブロアー4により洗浄塔2内に被
洗浄ガスが送り込まれると、その被洗浄ガスは充填材1
中で洗浄液と気液接触し、デミスタ−5にて同伴するミ
ストを除去されたのち、外気に放出される。一方、充填
材1からの洗浄水は洗浄塔2下部の貯留槽6に流下し、
スラリーポンプ7によりスプレーノズル3に循環される
。As in the conventional case, when the gas to be cleaned is sent into the cleaning tower 2 by the blower 4 while the cleaning liquid is jetting down from the spray nozzle 3, the gas to be cleaned passes through the filler 1.
After coming into gas-liquid contact with the cleaning liquid inside, the accompanying mist is removed by a demister 5, and then released to the outside air. On the other hand, the washing water from the filler 1 flows down to the storage tank 6 at the bottom of the washing tower 2.
The slurry pump 7 circulates the slurry to the spray nozzle 3 .
循環する洗浄水はpT−1計8によりp T−1値が測
定され、その値に基づき、調整器9によりアルカリ濃厚
液10かポンプ11を介して洗浄塔2内に適宜に流入さ
れて洗浄水のpH調整がなされる。The pT-1 value of the circulating cleaning water is measured by a pT-1 total 8, and based on the value, the regulator 9 flows the alkaline concentrated liquid 10 or the pump 11 into the cleaning tower 2 as appropriate for cleaning. The pH of the water is adjusted.
また、洗浄水の濃度調整のため補給水12が適宜吊、適
時に加えられ、その加えた量の洗浄液が堰15から溢流
して分離槽14に流入し、その上部の堰21から上澄液
が外部に溢流する。この作用時、貯留槽6の上部は触媒
のけん燭量も少なく、その上部の洗浄水が溢流によって
分離槽14に流入するため、触媒の流入量も少ない。In addition, make-up water 12 is suspended and added at the appropriate time to adjust the concentration of the washing water, and the added amount of washing liquid overflows from the weir 15 and flows into the separation tank 14, and the supernatant liquid flows from the weir 21 above it. overflows to the outside. During this operation, the amount of catalyst in the upper part of the storage tank 6 is small, and the washing water in the upper part flows into the separation tank 14 by overflowing, so the amount of catalyst flowing in is also small.
分離槽14に沈降堆積した触媒は、エアーリフト効果に
より、タクト16を通して貯留槽6に適宜又は定期的に
返送する。通常、ブロアー17は、このガス洗浄装置を
含む 処理設備に設けられている既存のものを使用すれ
はよく、この点て、エアーリフトによる返送は有利であ
る。The catalyst deposited in the separation tank 14 is returned to the storage tank 6 through the tact 16 as needed or periodically due to the air lift effect. Normally, the blower 17 can be an existing blower installed in the processing equipment including this gas cleaning device, and in this respect, return using an air lift is advantageous.
第1図は従来のガス洗浄装置の概略図、第2図はこの発
明のガス洗浄装置の一実施例の概略図である。
1・・充填材、2・・・洗浄塔、6・・・貯留槽、14
・・・沈降分離槽、15・・・堰、16・・・ダクト特
許出願人 久保田鉄工株式会社
第1図
洗浄ガス
↑
第2図
洗浄ガス
↑FIG. 1 is a schematic diagram of a conventional gas cleaning device, and FIG. 2 is a schematic diagram of an embodiment of the gas cleaning device of the present invention. 1...Filling material, 2...Washing tower, 6...Storage tank, 14
... Sedimentation tank, 15... Weir, 16... Duct Patent applicant Kubota Iron Works Co., Ltd. Figure 1 Cleaning gas ↑ Figure 2 Cleaning gas ↑
Claims (1)
りガス洗浄を行なう装置において、前記洗浄塔内下部の
洗浄液貯留槽に隣接して沈降分離槽を形成するとともに
、両槽間上部に貯留槽からの溢流堰を形成し、分離槽下
部から貯留槽上部にポンプを介設した沈降触媒返送用通
路を設けたことを特徴とするガス洗浄装置。 (2) 上記ポンプをエアーリフト型式にしたことを特
徴とする特許請求の範囲第(1)項に記載のガス洗浄装
置。[Scope of Claims] ([) An apparatus for performing gas cleaning in a cleaning tower using a cleaning liquid containing a catalyst in a suspended state, wherein a sedimentation separation tank is formed adjacent to a cleaning liquid storage tank at a lower part of the cleaning tower; A gas cleaning device characterized in that an overflow weir from the storage tank is formed in the upper part between the two tanks, and a precipitated catalyst return passage with a pump interposed from the lower part of the separation tank to the upper part of the storage tank is provided. (2) The gas cleaning device according to claim (1), wherein the pump is of an air lift type.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59107187A JPS60251919A (en) | 1984-05-25 | 1984-05-25 | Gas scrubbing appratus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59107187A JPS60251919A (en) | 1984-05-25 | 1984-05-25 | Gas scrubbing appratus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60251919A true JPS60251919A (en) | 1985-12-12 |
Family
ID=14452674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59107187A Pending JPS60251919A (en) | 1984-05-25 | 1984-05-25 | Gas scrubbing appratus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60251919A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012021768A3 (en) * | 2010-08-12 | 2012-05-31 | Diversey, Inc. | Air scrubber measurement and control system |
CN103157368A (en) * | 2013-03-29 | 2013-06-19 | 常熟市中钛科技有限公司 | Titanium metal tube acid cleaning waste gas purification treatment device |
CN108211741A (en) * | 2018-02-27 | 2018-06-29 | 浙江绿维环境股份有限公司 | A kind of acid mist processing system |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131962A (en) * | 1973-04-04 | 1974-12-18 | ||
JPS5275060A (en) * | 1975-12-18 | 1977-06-23 | Takuo Mouri | Circulating regeneration method and apparatus for waste water |
JPS56115618A (en) * | 1980-02-16 | 1981-09-10 | Toshiba Corp | Malodorous gas cleaning method |
-
1984
- 1984-05-25 JP JP59107187A patent/JPS60251919A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131962A (en) * | 1973-04-04 | 1974-12-18 | ||
JPS5275060A (en) * | 1975-12-18 | 1977-06-23 | Takuo Mouri | Circulating regeneration method and apparatus for waste water |
JPS56115618A (en) * | 1980-02-16 | 1981-09-10 | Toshiba Corp | Malodorous gas cleaning method |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012021768A3 (en) * | 2010-08-12 | 2012-05-31 | Diversey, Inc. | Air scrubber measurement and control system |
CN103157368A (en) * | 2013-03-29 | 2013-06-19 | 常熟市中钛科技有限公司 | Titanium metal tube acid cleaning waste gas purification treatment device |
CN108211741A (en) * | 2018-02-27 | 2018-06-29 | 浙江绿维环境股份有限公司 | A kind of acid mist processing system |
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