JPS6022733B2 - Sample gas sampling device - Google Patents

Sample gas sampling device

Info

Publication number
JPS6022733B2
JPS6022733B2 JP53051497A JP5149778A JPS6022733B2 JP S6022733 B2 JPS6022733 B2 JP S6022733B2 JP 53051497 A JP53051497 A JP 53051497A JP 5149778 A JP5149778 A JP 5149778A JP S6022733 B2 JPS6022733 B2 JP S6022733B2
Authority
JP
Japan
Prior art keywords
water
cleaning
gas
sample gas
ejector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53051497A
Other languages
Japanese (ja)
Other versions
JPS54145186A (en
Inventor
輝男 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP53051497A priority Critical patent/JPS6022733B2/en
Priority to DE2917274A priority patent/DE2917274A1/en
Priority to GB7914655A priority patent/GB2020016B/en
Publication of JPS54145186A publication Critical patent/JPS54145186A/en
Publication of JPS6022733B2 publication Critical patent/JPS6022733B2/en
Expired legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)

Description

【発明の詳細な説明】 本発明は試料ガスサンプリング装置に係り、特に試料ガ
スを吸引する第1の洗浄ェゼクタのノズル部に供給され
る洗浄水として第2の洗浄ェゼクタを通して得られた清
浄な試料ガスを使用するようにした試料ガスサンプリン
グ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a sample gas sampling device, and more particularly, to a sample gas sampling device that uses a clean sample obtained through a second cleaning ejector as cleaning water to be supplied to a nozzle portion of a first cleaning ejector that sucks a sample gas. This invention relates to a sample gas sampling device that uses gas.

排ガスの成分を調べるために、採取された排ガスを直接
ガス分析計へ導入すると、排ガス中のダスト、ミスト、
水分等によって分析計が汚損されたり、測定成分に干渉
する成分が混入したりして正確な分析結果が得られない
。そこで、通常は議料ガスとして採取された排ガスをガ
ス分析計へ導入する前に排出ガスサンプリング装置を使
って必要な前処理を施している。この種の排ガスサンプ
リング装置として、従来、金網フィル夕やロ紙フィル夕
を使って除塵することが行われていたが、この方式によ
れば、フィル夕の清掃や交換などの保守が厄介であった
り、また、水溶性の腐触成分が含まれている場合には別
の手段で除去しなければならなかった。
In order to investigate the components of exhaust gas, when the collected exhaust gas is introduced directly into a gas analyzer, dust, mist,
Accurate analysis results cannot be obtained because the analyzer is contaminated by moisture or other components that interfere with the measured components are mixed in. Therefore, the exhaust gas sampled as a target gas is normally subjected to necessary pretreatment using an exhaust gas sampling device before being introduced into the gas analyzer. Conventionally, this type of exhaust gas sampling device used a wire mesh filter or a paper filter to remove dust, but with this method, maintenance such as cleaning and replacing the filter was troublesome. In addition, if water-soluble corrosive components were included, they had to be removed by other means.

さらに、この方式とは別の方式として洗浄水が供給され
るェゼクタを使って試料ガスを吸引し、洗浄水によって
排ガス中のダストや水溶性の腐蝕成分を除去する方式が
あるが、02分析の場合、洗浄水中の溶存酸素が加つて
高い分析値を表示したり、C02分析の場合に洗浄水中
へのC02の溶解のために低い分析値を表示したりする
欠点があった。そこで、近時洗浄水を循環させて洗浄水
と試料ガスの濃度とを平衡させる方式が試みられている
。しかしながら、この場合洗浄水が段々とダストを含ん
で汚れてくると、排ガス中のィオウ酸化物(S02、S
03など)が洗浄水中に溶解し、洗浄水が酸性となって
腐蝕性が高まり、そのために、洗浄タンク、洗浄ェゼク
タ、導管、水ガス分離器、水ポンプ等の設備機器を耐蝕
性材料で構成しなければならなくなって設備費の高とう
を招来するという問題があった。そこで本発明の目的は
、上述した従来の装置が有する欠点を解消し、試料ガス
中のダスト、ミストおよび水溶性の腐蝕成分を除去した
清浄な試料ガスをガス分析計へ導入できる安価な試料ガ
スサンプリング装贋を提供することにある。
Furthermore, there is another method that uses an ejector supplied with cleaning water to aspirate the sample gas, and uses the cleaning water to remove dust and water-soluble corrosive components from the exhaust gas. In this case, dissolved oxygen in the wash water is added, resulting in a high analytical value, or in the case of CO2 analysis, a low analytical value is displayed due to the dissolution of CO2 in the wash water. Therefore, recently attempts have been made to circulate the cleaning water to balance the concentrations of the cleaning water and the sample gas. However, in this case, as the cleaning water gradually becomes contaminated with dust, sulfur oxides (S02, S
03, etc.) are dissolved in the cleaning water, making the cleaning water acidic and increasing its corrosivity. Therefore, equipment such as cleaning tanks, cleaning ejectors, conduits, water gas separators, water pumps, etc. must be constructed of corrosion-resistant materials. There was a problem in that this resulted in high equipment costs. Therefore, an object of the present invention is to solve the drawbacks of the conventional devices described above and to provide an inexpensive sample gas that can introduce clean sample gas from which dust, mist, and water-soluble corrosive components in the sample gas have been removed into a gas analyzer. The purpose is to provide sampling counterfeits.

しかして、上記目的を達成する本発明による試料ガスサ
ンプリング装置は、試料ガスおよび洗浄水を混合して前
記試料ガス中に含まれるダスト、ミストおよび水溶性の
腐蝕性成分等を前記洗浄水中に溶解せしめる第1の洗浄
ェゼクタと、前記第1の洗浄ェゼクタと接続され、前記
洗浄水および前記除幽された清浄な試料ガスを分離する
水ガス分離器と、前記水ガス分離器と接続され、前記水
ガス分離器からの清浄な試料ガスを導入して該ガスを分
析するガス分析計と、前記水ガス分離器ならびに前記第
1の洗浄ェゼクタとそれぞれ接続され、前記水ガス分離
器からの前記試料ガスの一部を導入するとともにこれを
給水源からの水と混合させ、この混合により水中の溶解
ガス成分と前記試料ガス成分とを濃度平衡させ、これに
より得られた水を前記洗浄水として前記第1の洗浄ェゼ
クタのノズル部へ供給する第2の洗浄ェゼクタとを備え
ていることを特徴としている。
Therefore, the sample gas sampling device according to the present invention that achieves the above object mixes the sample gas and cleaning water to dissolve dust, mist, water-soluble corrosive components, etc. contained in the sample gas into the cleaning water. a first cleaning ejector connected to the first cleaning ejector and separating the cleaning water and the removed clean sample gas; a gas analyzer that introduces clean sample gas from a water gas separator and analyzes the gas; and a gas analyzer that is connected to the water gas separator and the first cleaning ejector, respectively, and that is connected to the sample gas from the water gas separator. A part of the gas is introduced and mixed with water from a water supply source, and this mixing brings the dissolved gas component in the water into equilibrium with the sample gas component, and the resulting water is used as the cleaning water and is used as the cleaning water. The cleaning ejector is characterized by comprising a second cleaning ejector that supplies the nozzle portion of the first cleaning ejector.

以下本発明による試料ガスサンプリング装置の一実施例
を図を参照して説明する。
An embodiment of the sample gas sampling device according to the present invention will be described below with reference to the drawings.

第1図は本発明による試料ガスサンプリング装置の系路
の全体をブロック図で示しており、全体の系路は、分析
試料ガス供V給系路Aと洗浄水供V給系路Bとから構成
されている。
FIG. 1 is a block diagram showing the entire system of the sample gas sampling device according to the present invention, and the entire system consists of an analysis sample gas supply V supply system A and a cleaning water supply V supply system B. It is configured.

上記分析試料ガス供聯合系路Aは、試料ガスとしての排
ガスの採取器1を有し「 この採取器1によって採取さ
れた試料ガスとしての排ガスは、第1の洗浄ェゼク夕2
内に吸引され、後述する洗浄水供給系路Bからの洗浄水
と混合させられる。
The analysis sample gas supply system A has a sampling device 1 for collecting exhaust gas as a sample gas.
The water is sucked into the water and mixed with wash water from a wash water supply line B, which will be described later.

また、上記分析試料ガス供給系磯Aは、管路3上に水ガ
ス分離器4、フィル夕5、除湿器6およびガス分析計7
を順次直列に接続して構成されている。上記水ガス分離
器4は、第2図に詳細な構成が示されるように、ガス室
8と貯水室9とに区分され、ガス室8内で分離された洗
浄水は貯水室9内に滞留し、洗浄水はドレン管10より
排水シールポット11へと排出される。
In addition, the analysis sample gas supply system Iso A includes a water gas separator 4, a filter 5, a dehumidifier 6, and a gas analyzer 7 on the pipe line 3.
It is constructed by sequentially connecting in series. The water gas separator 4 is divided into a gas chamber 8 and a water storage chamber 9, as the detailed configuration is shown in FIG. The cleaning water is then discharged from the drain pipe 10 to the drainage seal pot 11.

一方、洗浄水供V給系路Bは、給水源より新規な給水を
受ける第2の洗浄ェゼクタ12を有し、この第2の洗浄
ェゼクタ12と、前記第1の洗浄ヱゼクタ2とは、洗浄
水タンク13および水ポンプ14を順次接続した供尊台
管略15によって接続されている。上記洗浄水タンク1
3は、第2図によって機造が明らかにされるように、タ
ンクの上部にガス抜き口16とオーバーフロー管17と
を備え、上方に空室を確保している。このように構成さ
れた実施例において「採取器1によって採取された試料
ガスとしての排ガスは、洗浄水供給系路Bより第1の洗
浄ヱゼクタ2のノズル部へ供V給された洗浄水と強制的
に混合され、管路3を通して水ガス分離器4のガス室8
へ導かれる。
On the other hand, the cleaning water supply V supply line B has a second cleaning ejector 12 that receives new water from a water supply source, and this second cleaning ejector 12 and the first cleaning ejector 2 are connected to each other for cleaning. A water tank 13 and a water pump 14 are connected by a water pipe 15 connected in sequence. Above wash water tank 1
3 is provided with a gas vent 16 and an overflow pipe 17 in the upper part of the tank, as shown in FIG. 2, and has a vacant space above. In the embodiment configured as described above, the exhaust gas as the sample gas collected by the sampler 1 is forced into contact with the cleaning water supplied from the cleaning water supply line B to the nozzle section of the first cleaning ejector 2. water gas separator 4 through line 3 and gas chamber 8 of water gas separator 4
be led to.

このガス室8の内で洗浄水と試料ガスとは気水分離され
、洗浄水は貯水室9内に滞溜し.ドレン管10より排水
シールポット11内に排出される。一方、除塵されて清
浄になった試料ガスは、フィル夕5、除湿器6を遺して
ガス分析計7へ送られ、ここで試料ガスの成分が分析さ
れる。一方、給水源からの洗浄水は第2の洗浄ェゼクタ
12のノズル部に供輪蒼され、水ガス分離器4内の試料
ガスを吸引し水とガスとの混合流体を洗浄水タンク13
内へ供V給し、試料ガスをガス抜き口16より脱気し、
この間に洗浄水中の溶解ガス成分と試料ガス成分との濃
度は平衡化が図られる。
The cleaning water and the sample gas are separated in the gas chamber 8, and the cleaning water accumulates in the water storage chamber 9. It is discharged from the drain pipe 10 into the drainage seal pot 11. On the other hand, the sample gas that has been purified by dust removal is sent to a gas analyzer 7, leaving behind a filter 5 and a dehumidifier 6, where the components of the sample gas are analyzed. On the other hand, the cleaning water from the water supply source is supplied to the nozzle part of the second cleaning ejector 12, which sucks the sample gas in the water gas separator 4 and transfers the mixed fluid of water and gas to the cleaning water tank 13.
The sample gas is degassed from the gas vent port 16,
During this time, the concentrations of the dissolved gas component and the sample gas component in the cleaning water are balanced.

そして、洗浄水は、水ポンプ14によって管路15を介
して第1の洗浄ェゼクタ2のノズル部へ供給される。な
お、上記実施例において、第1の洗浄ヱゼクタ2と水ガ
ス分離器4、および第2の洗浄ェゼクタ12と洗浄水タ
ンク13とをそれぞれ一体的に縄立てることもできる。
The cleaning water is then supplied to the nozzle portion of the first cleaning ejector 2 by the water pump 14 via the pipe line 15. In the above embodiment, the first cleaning ejector 2 and the water gas separator 4, and the second cleaning ejector 12 and the cleaning water tank 13 can also be arranged integrally.

以上の説明から明らかなように、本発明によれば、洗浄
水供給系路内に第1および第2の洗浄ヱゼクタを2個組
み込み、第1の洗浄ェゼクタ内で混合され、ダストやミ
ストや水溶性の腐蝕成分等を除去された試料ガスを新規
な水の供V給を受ける第2の洗浄ェゼクタ内で再度混合
し、供給水中の溶解ガス成分と試料ガス成分とを十分に
平衡させた新鮮な洗浄水を第1の洗浄ヱゼクタのノズル
部へ供V給するようにしたから、洗浄水からの溶存酸素
の放出や洗浄水への溶解に伴なう分析の測定誤差を低減
することができる。
As is clear from the above description, according to the present invention, two first and second cleaning ejectors are installed in the cleaning water supply system, and dust, mist, and water soluble water are mixed in the first cleaning ejector. The sample gas from which corrosive components, etc. have been removed is mixed again in the second cleaning ejector that receives a fresh supply of water, and the sample gas is mixed again to create a fresh mixture in which the dissolved gas components in the supplied water and the sample gas components are sufficiently balanced. Since the cleaning water is supplied to the nozzle part of the first cleaning ejector, measurement errors in analysis due to the release of dissolved oxygen from the cleaning water and its dissolution into the cleaning water can be reduced. .

また、同じ洗浄水を循環させることなく新規な洗浄水を
除塵して清浄な洗浄水として系賂内に供給するようにし
たから、洗浄水を生成し流通させる諸設備機器に対する
耐蝕性を考慮しなくとも良いから、装置を安価に構成で
き、メンテナンスも容易である。
In addition, since the new washing water is dedusted and supplied to the system as clean washing water without circulating the same washing water, corrosion resistance of the equipment that generates and distributes the washing water is considered. Since it is not necessary, the device can be constructed at low cost and maintenance is easy.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による試料ガスサンプリング装置の一実
施例を示す全系統図、第2図は、同系内の水ガス分離器
、第2の洗浄ェゼクタ、洗浄タンクを拡大して示す線図
である。 A・・・・・・分析試料ガス供聯合系路、B・・・・・
・洗浄水供給系路、1……採取器、2・・・・・・第1
の洗浄ェゼクタ、4・・・・・・水ガス分離器、12…
・・・第2の洗浄ヱゼクタ、13・・・・・・洗浄水タ
ンク、14・・・・・・水ポンプ。 努ヱ図 沙2図
Fig. 1 is an overall system diagram showing one embodiment of the sample gas sampling device according to the present invention, and Fig. 2 is an enlarged diagram showing the water gas separator, second cleaning ejector, and cleaning tank in the same system. be. A...Analysis sample gas supply joint line, B...
・Cleaning water supply system line, 1... Sampler, 2... 1st
cleaning ejector, 4... water gas separator, 12...
. . . second washing ejector, 13 . . . washing water tank, 14 . . . water pump. Tsutomu Zusa 2

Claims (1)

【特許請求の範囲】[Claims] 1 試料ガスおよび洗浄水を混合して前記試料ガス中に
含まれるダスト、ミストおよび水溶性の腐蝕性成分等を
前記洗浄水中に溶解せしめる第1の洗浄エゼクタと、前
記第1の洗浄エゼクタと接続され、前記洗浄水および前
記除塵された清浄な試料ガスを分離する水ガス分離器と
、前記水ガス分離器と接続され、前記水ガス分離器から
の清浄な試料ガスを導入して該ガスを分析するガス分析
計と、前記水ガス分離器ならびに前記第1の洗浄エゼク
タとそれぞれ接続され、前記水ガス分離器からの前記試
料ガスの一部を導入するとともにこれを給水源からの水
と混合させ、この混合により水中の溶解ガス成分と前記
試料ガス成分とを濃度平衡させ、これにより得られた水
を前記洗浄水として前記第1の洗浄エゼクタのノズル部
へ供給する第2の洗浄エゼクタとを備えてなる試料ガス
サンプリング装置。
1. A first cleaning ejector that mixes a sample gas and cleaning water to dissolve dust, mist, water-soluble corrosive components, etc. contained in the sample gas into the cleaning water, and is connected to the first cleaning ejector. a water gas separator for separating the cleaning water and the clean sample gas from which dust has been removed; A gas analyzer to be analyzed is connected to the water gas separator and the first cleaning ejector, respectively, to introduce a portion of the sample gas from the water gas separator and mix it with water from a water supply source. a second cleaning ejector that brings the dissolved gas component in the water and the sample gas component into concentration equilibrium through this mixing, and supplies the water obtained thereby to the nozzle portion of the first cleaning ejector as the cleaning water; A sample gas sampling device equipped with
JP53051497A 1978-04-30 1978-04-30 Sample gas sampling device Expired JPS6022733B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP53051497A JPS6022733B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device
DE2917274A DE2917274A1 (en) 1978-04-30 1979-04-27 PROCESS AND DEVICE FOR THE PROCESSING OF UNCLEANED GAS MIXTURES AS SAMPLE GAS FOR GAS ANALYSIS
GB7914655A GB2020016B (en) 1978-04-30 1979-04-27 Winter gas washing and analysis apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53051497A JPS6022733B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device

Publications (2)

Publication Number Publication Date
JPS54145186A JPS54145186A (en) 1979-11-13
JPS6022733B2 true JPS6022733B2 (en) 1985-06-04

Family

ID=12888602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53051497A Expired JPS6022733B2 (en) 1978-04-30 1978-04-30 Sample gas sampling device

Country Status (1)

Country Link
JP (1) JPS6022733B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0754286B2 (en) * 1987-04-03 1995-06-07 三菱重工業株式会社 Pretreatment device for calorie meters
EP2469262A1 (en) * 2010-12-21 2012-06-27 Sinvent AS Fluid transfer system

Also Published As

Publication number Publication date
JPS54145186A (en) 1979-11-13

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