JPS6022724A - Production of magnetic head - Google Patents

Production of magnetic head

Info

Publication number
JPS6022724A
JPS6022724A JP13146583A JP13146583A JPS6022724A JP S6022724 A JPS6022724 A JP S6022724A JP 13146583 A JP13146583 A JP 13146583A JP 13146583 A JP13146583 A JP 13146583A JP S6022724 A JPS6022724 A JP S6022724A
Authority
JP
Japan
Prior art keywords
magnetic heads
processing
magnetic head
processed
plural magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13146583A
Other languages
Japanese (ja)
Inventor
Yasuhiro Okamura
康弘 岡村
Masaaki Shiga
正明 志賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP13146583A priority Critical patent/JPS6022724A/en
Publication of JPS6022724A publication Critical patent/JPS6022724A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166Testing or indicating in relation thereto, e.g. before the fabrication is completed

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve the accuracy of processing size and to attain the simultaneous processing for plural magnetic heads by forming a conductor pattern on a substrate containing plural magnetic heads to be processed. CONSTITUTION:When magnetic heads 5a-5n are processed, the connection is measured between terminals 7a and 7b as well as 7c and 7d of conductor patterns 6a and 6b provided at both ends of a substrate 4. The processing is finished at a time point when no connection is secured between terminals 7a and 7b as well as 7c and 7d after the patterns 6a and 6b are cut by processing. In such a way, the accurate throat height is obtained for plural magnetic heads. Thus it is possible to process simultaneously and accurately plural magnetic heads compared with the processing using the optical measurement. This also reduces the working time.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は複数個の磁気ヘッドを同時に加工する磁気ヘ
ッドの製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method of manufacturing a magnetic head in which a plurality of magnetic heads are processed simultaneously.

[従来技術〕 第1図に複数の磁気ヘッドを化学処理、蒸着処理等を用
いて同時に製造する薄膜ヘッドの構造を示す。図におい
て(1)はコア:h、(2)はコアB、(3)はコイル
を示す。コアA(1)とコアB(2)の突合せ部の図上
δで示す部分をスo −ト高さと称し、このスロート高
さδの寸法が磁気ヘッドの電磁変換特性に影響を与える
。す万わちスロート高さδが太であると読み出し電圧が
低くなり、スロート高さδが小になると記録がしにくく
なる。従ってd己録と読み出しの特性を考慮した所定の
値にスロート高さδを加工する必要がある。
[Prior Art] FIG. 1 shows the structure of a thin film head in which a plurality of magnetic heads are manufactured simultaneously using chemical processing, vapor deposition processing, etc. In the figure, (1) shows the core: h, (2) shows the core B, and (3) shows the coil. The abutting portion of core A (1) and core B (2), indicated by δ in the figure, is called the throat height, and the dimension of this throat height δ affects the electromagnetic conversion characteristics of the magnetic head. In other words, if the throat height δ is large, the read voltage will be low, and if the throat height δ is small, it will be difficult to record. Therefore, it is necessary to process the throat height δ to a predetermined value that takes into consideration the recording and readout characteristics.

この磁気ヘッドのスロート高さδけ、一般に機械的寸法
を、例えば光学的に測定して加工している。しかし各部
分の寸法測定公差の積み重ねが影響して、寸法精度が落
ちるという欠点がある。
The throat height δ of this magnetic head is generally machined by measuring its mechanical dimensions, for example, optically. However, there is a drawback that dimensional accuracy is reduced due to the accumulation of dimensional measurement tolerances of each part.

〔発明の目的〕[Purpose of the invention]

この発明は上述の欠点を除去し、さらに複数個の磁気ヘ
ッドを同時に加工できる磁気ヘッドの製造方法を提供す
ることを目的とするものである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for manufacturing a magnetic head that eliminates the above-mentioned drawbacks and can process a plurality of magnetic heads at the same time.

〔発明の概要〕[Summary of the invention]

この発明の磁気ヘッドの製造方法は、磁気ヘッドの加工
寸法を決定するために、導体パターンを1個以上、複数
個の被加工磁気ヘッドを有する基板上に設けて、同時に
複数個の磁気ヘッドを加工することを特徴とするもので
ある。
In the method for manufacturing a magnetic head of the present invention, one or more conductive patterns are provided on a substrate having a plurality of magnetic heads to be processed, in order to determine the processing dimensions of the magnetic head, and the plurality of magnetic heads are simultaneously processed. It is characterized by being processed.

〔実施例〕〔Example〕

この発明の磁気ヘッドの製造方法を実施例に基いて説明
する。第2図は、この発明の一実施例を示す。第2図に
おいて(4)は基板、(5a)乃至(5n)は基板(4
)上に配置された磁気ヘッドである。磁気ヘッド(5a
)〜(5n)は例えば第1図に示した薄膜ヘッドである
。(6a)、(6blは基板(1)の両端に設けられた
U字形の導体パターン、(7a)乃至(7d)は導体パ
ターン(6a)、(6b)に設けられた端子である。
A method of manufacturing a magnetic head according to the present invention will be explained based on examples. FIG. 2 shows an embodiment of the invention. In Figure 2, (4) is the substrate, (5a) to (5n) are the substrates (4).
) is a magnetic head placed on top of the magnetic head. Magnetic head (5a
) to (5n) are the thin film heads shown in FIG. 1, for example. (6a) and (6bl) are U-shaped conductor patterns provided at both ends of the substrate (1), and (7a) to (7d) are terminals provided on the conductor patterns (6a) and (6b).

被数個の磁気ヘッド(5a)〜(5n)を加工する際に
、基板(4)の両端に設けた導体パターン(6a)の端
子(7al、(7b)及び導体バター/(6b)の端子
(7c ) #(7d)の導通を測定しておハ加工にょ
シ導体パターン(6a)、(6b)が切断して、端子(
7a)と端子(7b)間及び端子(7c)と(7d)間
の導通が無くなった時点を加工終了点とする。このこと
にょシ、複数個の磁気ヘッドのスロート高さδを正確に
得るようにしたものである。
When processing several magnetic heads (5a) to (5n), the terminals (7al, (7b) and conductor butter/(6b) of the conductor pattern (6a) provided at both ends of the substrate (4) (7c) Measure the continuity of # (7d) and process it.The conductor patterns (6a) and (6b) are cut and the terminal (
The point in time when there is no continuity between 7a) and the terminal (7b) and between the terminals (7c) and (7d) is defined as the processing end point. In this case, the throat heights δ of the plurality of magnetic heads can be accurately obtained.

この実施例においては導体パター7 (6a)、(6b
)をU字形としたが第6図に示すように、平行した2本
の導体パターン(6c)、(6d)として、加工により
2本の導体パターン(6c)、(6d)の先端に刃物が
接触して、端子(7a)、(7b)に導通が生じた時点
を加工終了点とすることもできる。又第4図に示すよう
に、加工面の導体パターン(6e)の面積を大とし、導
体パターン(6e)を切断し、て行ぐ過程での抵抗値の
値で加工終了点を定めることもできる。
In this embodiment, conductor patterns 7 (6a), (6b
) was made into a U-shape, but as shown in Figure 6, two parallel conductor patterns (6c) and (6d) were formed, and a knife was cut at the tips of the two conductor patterns (6c) and (6d) by processing. The point in time when the terminals (7a) and (7b) are electrically connected can also be defined as the processing end point. Alternatively, as shown in Fig. 4, the area of the conductor pattern (6e) on the processing surface may be increased, the conductor pattern (6e) may be cut, and the processing end point may be determined by the resistance value during the process. can.

〔発明の効果〕〔Effect of the invention〕

以上説明したように この発明の磁気ヘッドの製造方法
においては、磁気ヘッドの加工を光学的測定によシ加工
する場合に比較して、複数個の磁気ヘッドを同時に、正
確に加工することができ、さらに加工寸法は機械に基板
を装置したまま測定でき、作業時間を短縮できるという
効果もある。
As explained above, in the magnetic head manufacturing method of the present invention, multiple magnetic heads can be processed simultaneously and accurately compared to the case where magnetic heads are processed by optical measurement. Furthermore, processing dimensions can be measured while the substrate is installed in the machine, which has the effect of shortening the working time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は薄膜ヘッドの構造図、第2図はこの発明の一実
施例の構造図、第6図及び第4図は、それぞれ導体パタ
ーンの構造図である、 図中、(1)はコアA、(2+けコアB、(3)はコイ
ル、(4)は基板、(5a)乃至(5n)は磁グヘッド
、(6a)乃至(6e)は導体パターンである。 なお各図中同一符号は同一または相当部分を示す。 代理人 大岩増雄 第1図 第3図 第 4図 手続補正帯(自発) 昭和59年2灸役18日 特許庁長官殿 1、事件の表示 特願昭 58−131465号2、発
明の名称 磁気ヘッドの製造方法 3、補正をする者 明lf!A書の「発明の詳細な説明」の欄06、補正の
内容
Fig. 1 is a structural diagram of a thin film head, Fig. 2 is a structural diagram of an embodiment of the present invention, and Figs. 6 and 4 are structural diagrams of conductor patterns, respectively. In the figure, (1) is a core A, (2+ core B), (3) is a coil, (4) is a substrate, (5a) to (5n) are magnetic heads, and (6a) to (6e) are conductor patterns. Note that the same reference numerals are used in each figure. indicates the same or equivalent parts. Agent Masuo Oiwa Figure 1 Figure 3 Figure 4 Procedural amendment band (spontaneous) 18th, 1982, Mr. Commissioner of the Japan Patent Office, Indication of the case, Patent application No. 58-131465 No. 2, Name of the invention Method for manufacturing a magnetic head 3, Name of the person making the amendment lf! Column 06 of "Detailed description of the invention" in Book A, Contents of the amendment

Claims (1)

【特許請求の範囲】[Claims] 磁気ヘッドの製造工程において、磁気ヘッドの加工寸法
を決定するための導体パターンを、1個所以上複数個の
被加工磁気ヘッドを有する基板上に設けたことを特徴と
する磁気ヘッドの製造方法、
A method for manufacturing a magnetic head, characterized in that, in the manufacturing process of the magnetic head, a conductor pattern for determining the processing dimensions of the magnetic head is provided at one or more locations on a substrate having a plurality of magnetic heads to be processed.
JP13146583A 1983-07-19 1983-07-19 Production of magnetic head Pending JPS6022724A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13146583A JPS6022724A (en) 1983-07-19 1983-07-19 Production of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13146583A JPS6022724A (en) 1983-07-19 1983-07-19 Production of magnetic head

Publications (1)

Publication Number Publication Date
JPS6022724A true JPS6022724A (en) 1985-02-05

Family

ID=15058594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13146583A Pending JPS6022724A (en) 1983-07-19 1983-07-19 Production of magnetic head

Country Status (1)

Country Link
JP (1) JPS6022724A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0463765A2 (en) * 1990-06-29 1992-01-02 Quantum Corporation Thin film head slider fabrication process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0463765A2 (en) * 1990-06-29 1992-01-02 Quantum Corporation Thin film head slider fabrication process
USRE35477E (en) * 1990-06-29 1997-03-18 Quantum Corporation Thin film head slider fabrication process

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