JPS60226134A - Semiconductor manufacture apparatus - Google Patents

Abstract

PURPOSE:To improve reliability through accurate detection of transfer or reception of substrates by detecting direction of operations of substrate transfer and reception mechanism at the outside of apparatus and discriminating the substrate receiving and transfer operations with such detection signal. CONSTITUTION:A molecular epitaxy apparatus comprises a detector 13 which detects a direction (vertical direction) of movement of a member 11 of substrate transfer and reception mechanism at the outside of apparatus, a detector 14 which detects a direction (forward or backward direction) of movement of manipulator 10 at the outside of apparatus and a discriminating circuit 15 which discriminates the substrate transfer and reception operation by inputting a detection signals sent from the detectors 13, 14. When the substrate transfer or reception mechanism executes the substrate reception operation, directions in movement of manipular 10 and member 11 are detected by the detectors 13, 14. When the detection signal is input to the discrimination circuit 15, the discrimination circuit 15 issues a signal which indicates that the substrate reception is being carried out. When the substrate reception or transfer mechanism executes the substrate transfer operation, the discrimination circuit 15 issues a signal which indicates that the substrate transfer operation is being carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a semiconductor manufacturing apparatus such as a molecular beam epitaxy apparatus, and particularly to a semiconductor manufacturing apparatus suitable for increasing the reliability of substrate transfer.

[Background of the invention]

A typical semiconductor manufacturing device is a molecular beam epitaxy device, which consists of an introduction chamber, 9 analysis chambers, a growth chamber, an unloading chamber, and a transfer chamber that is directly connected to all of these chambers via a gate valve. The structure includes a substrate transfer mechanism that transfers the substrate in the transfer chamber to the front of each chamber, and a transfer mechanism that transfers the substrate between each chamber and the substrate receiver.

By the way, in such a molecular beam epitaxy apparatus, since the inside of the apparatus cannot be seen from the outside, each substrate receiver generally uses a reading mechanism to determine whether or not the substrate is being transferred reliably. . In other words, since the operator indirectly determines that the board has been transferred by pressing the board transfer command switch, the receiver is not sure whether the transfer mechanism is operating normally and transferring the board. It is difficult to know accurately and there are concerns about reliability.

[Purpose of the invention]

An object of the present invention is to detect the direction of the operation of the transfer mechanism by the substrate receiver outside the device, and to determine whether the substrate is received or transferred based on the detection signal, so that it is possible to accurately know the transfer of the substrate. The purpose of the present invention is to provide highly reliable semiconductor manufacturing equipment.

[Summary of the invention]

The present invention focuses on the fact that there is a difference between the direction of the movement of the board support when the transfer mechanism receives the board and the direction of the movement of the board when it passes the board, and detects the direction of each movement outside the device. The present invention is equipped with a detection means for detecting a circuit board, and a discriminating means for inputting detection signals from these detection means to determine whether a board receiving operation or a board transfer operation is performed, thereby making it possible to accurately know whether a board is being delivered. .

[Embodiments of the invention]

An embodiment of the present invention will be described below using a molecular beam epitaxy apparatus as an example. FIG. 1 is a block diagram of the molecular beam epitaxy apparatus, and FIG. 2 is a perspective view of the substrate holder and transfer mechanism. In Fig. 1, the molecular beam epitaxy apparatus has an introduction chamber 1 for feeding the substrate into the chamber without breaking the vacuum.
．． Analysis chamber 2 for baking out the substrate surface before crystal growth and observing the substrate surface after crystal growth; growth chamber 3 for growing crystals on the substrate surface; and taking out the substrate after crystal growth to the outside of the apparatus without breaking the vacuum. A transfer chamber 4, a transfer chamber 5 that is directly connected to all of these chambers via a gate valve 6, a substrate transfer mechanism that transfers the substrate in the transfer chamber 5 to the front of each chamber, and a substrate transfer mechanism between the transfer chamber 5 and each chamber. The substrate holder that transfers the substrate has a structure that includes a transfer mechanism (all not shown).

In FIG. 2, the substrate transfer mechanism includes a rail 8 laid in a transfer chamber, and a trolley 9 that can run on the rail 8 and load the substrate K in a flat position, and the trolley 9 is positioned at a predetermined position. The board receiving mechanism has a board loading area 10A,
A transfer manipulator (hereinafter simply referred to as a manipulator) 10 that can move forward and backward within the pipe 12 shown in FIG.
A, and can move up and down below the rail 8 (arrows, b
The structure includes a member 11 in the force direction. This substrate receiver is used in the transfer mechanism when the manipulator 10 receives the substrate K on the trolley 9.

(1) As the member 11 rises (in the direction of the arrow), the trolley 9
After the upper substrate K is placed on the substrate holder 11A, it is further raised to a position higher than the manipulator 10.

(2) The manipulator 10 moves forward (in the direction of arrow a) to insert the member 11 into its forked portion.

(3) The member 11 descends (in the direction of arrow b') and transfers the substrate K to the substrate loading location 10A of the manipulator 10.

(4) The manipulator 10 retreats from the trolley 9 side (in the direction of arrow a').

By performing the above operations, the board on the trolley 9 is received by the manipulator 1o.

Also, on the contrary, move the board K on the manipulator 10 to the trolley 9.
When handing over to.

(a) The manipulator 10 carrying the substrate advances onto the trolley 9 (in the direction of arrow a).

(b) The member 11 rises (in the direction of the arrow) and places the substrate on the manipulator 10 on the substrate holding section 11A.

(c) The manipulator 10 moves backward (in the direction of arrow a').

(d) The member 11 descends (in the direction of arrow b') and places the substrate on the trolley 9.

By performing the above operations, the substrate on the manipulator 10 is transferred to the trolley 9.

In this way, in the board transfer system, when the manipulator 10 receives the board K from the trolley 9, after the member 11 has been raised (in the direction indicated by the arrow), the manipulator 10
advances (in the direction of arrow a), but on the contrary, the manipulator 10
When transferring the board to the trolley 9, after the member 11 rises (in the direction of the arrow), the manipulator lO retreats (in the direction of the arrow a').
There is a difference in the direction of the movement. Therefore, by determining this difference in directionality, the board receiver can know whether the transfer mechanism is performing a board receiving operation or a board transfer operation.

In the molecular beam epitaxy apparatus according to the present invention, the substrate holder is equipped with a detector 13 capable of detecting the direction of movement (up and down movement) of the member 11 in the transfer mechanism outside the apparatus, and the direction of movement (advance and retreat) of the manipulator IO. The device is equipped with a detector 14 capable of detecting this externally, and a discrimination circuit 15 which inputs detection signals from these detectors 13 and 14 and discriminates between a board receiving operation and a board transfer operation.

The detectors 13 and 14 are divided into two types: one that detects the direction of the linear movement of the manipulator IO and the member 11, and the other that detects the rotational direction of the drive motor of the manipulator 102 member 11. However, as the former detector, a pair of optical sensors, a reed switch, a limit switch, etc. are used, and as the latter detector, a current direction detector that detects the direction of the supplied current is used.

As the discrimination circuit 15, a logic circuit or the like is used.

In the molecular beam epitaxy apparatus according to the present invention, when the substrate receiving mechanism performs a substrate receiving operation, the directionality of movement of the manipulator 10 and the member 11 is detected by a detector 13.1.
Detected by 4. When the detection signal is input to the discrimination circuit 15, the discrimination circuit 15 outputs a signal indicating that a board receiving operation is being performed. In addition, when the board transfer mechanism performs a board transfer operation, the direction of movement of the manipulator 10 and the member 11 is detected by the detectors 13 and 14, and the detection signal is input to the discrimination circuit 15.
The discrimination circuit 15 outputs a signal indicating that a board transfer operation is being performed. Therefore, by displaying, for example, the board receiving pattern and the board passing pattern on the display panel based on the signal output from the determination circuit 15, it is possible to accurately know whether or not the board is being delivered reliably. can.

Further, the present invention can be applied to a molecular beam epitaxy apparatus having a substrate holder other than the transfer mechanism shown in FIG. 2. Next, an example thereof will be explained with reference to FIG. FIG. 2 shows a transfer manipulator (1) which is housed in the introduction chamber 1 of FIG.
17 (hereinafter simply referred to as a manipulator), the substrate holder is equipped with a manipulator 17 to transfer the substrate on the trolley of the substrate transfer mechanism to the cassette 16, and to transfer the substrate in the cassette 16 onto the trolley. It shows the passing mechanism. The cassette 16 moves up and down vertically within the introduction chamber (arrow C
, C' direction), and the manipulator 17 can advance and retreat ((arrow d direction) within the pipe 12 shown in FIG.
, d' direction).

The substrate receiver is a transfer mechanism, and when the manipulator 17 receives the substrate K in the cassette 16, (1) the manipulator 17 advances (in the direction of arrow d) and enters between the substrates in the cassette 16;

(2) The cassette 16 is lowered by one span (the distance between the two boards in the vertical direction) (in the direction of arrow C')
No. 6 substrates K are placed on the substrate loading location 17A of the manipulator 17.

(3) The manipulator 17 moves backward (in the direction of arrow d').

By performing the above operations, the substrate in the cassette 16 is received by the manipulator 17.

In addition, on the contrary, the substrate on the manipulator 17 can be moved to the cassette 16.
(a) The manipulator 17 advances (in the direction of arrow d) and enters the cassette 16.

(b) Cassette 16 rises by one span (in the direction of arrow C)
Then, the substrate of the manipulator 17 is transferred to the cassette 16.

(c) The manipulator 17 moves backward (in the direction of arrow d').

By performing the above operations, the substrate of the manipulator 17 is transferred to the cassette 16.

In this way, the substrate receiver is a transfer mechanism, and when the manipulator 17 receives the substrate K from the cassette 16, the cassette 16 moves down (in the direction of arrow C') after the manipulator 17 advances (in the direction of arrow d); When the substrate of the manipulator 17 is transferred to the cassette 16, there is a difference in the direction of operation, in that the manipulator 17 advances (in the direction of arrow d) and then the cassette 16 rises (in the direction of arrow C). Therefore, by determining this difference in directionality, the board receiver can know whether the transfer mechanism is performing a board receiving operation or a transfer operation.

However, in a molecular beam epitaxy apparatus having such a substrate holder and transfer mechanism, a detector 131 that can detect the direction of movement (up and down movement) of the cassette 16 outside the apparatus, and a detector 131 that can detect the direction of movement (advance and retreat) of the manipulator 17 are used. ) is installed outside the device, and a discrimination circuit 151 inputs detection signals from these detectors to determine whether the board is received or delivered, thereby ensuring board transfer. It is possible to know exactly whether or not this is being done.

FIG. 4 shows a substrate holder seen in a commercially available molecular beam epitaxy apparatus, which is a transfer mechanism, and includes a fixed ring 18 having a hook-shaped groove 19 and an annular manipulator 20 also having a hook-shaped groove 21. A certain substrate K is connected to the annular manipulator 2.
0, and transfer the substrate on the annular manipulator 20 to the fixed ring 18. The annular manipulator 20 can move forward and backward (in the directions of arrows e and e') and rotate (in the directions of arrows f and f').

Also, the diameter and fixed ring 18. Regarding the relationship between the inner diameters of the annular manipulator 20, the diameter of the substrate is smaller than the inner diameter of the annular manipulator 20, and the inner diameter of the annular manipulator 20 is smaller than the inner diameter of the fixed ring 18. The three pins 22 on the base plate are also adapted to fit into the hook-shaped grooves 19, 20 of both rings.

The board receiver is a transfer mechanism, and when the annular manipulator 20 receives the board K in the fixed ring 18, (1) the hook-shaped groove 19 of the fixed ring 18 and the annular manipulator 2
The annular manipulator 20 moves forward (in the direction of the arrow e) so that the hook-shaped groove 21 of the manipulator 20 coincides with the hook-shaped groove 21 of the manipulator 20.

(2) After the annular manipulator 20 is fitted into the fixed ring 18, the annular manipulator 20 rotates (in the direction of arrow f) and the substrate K is transferred to the annular manipulator 20.

(3) The annular manipulator 20 moves backward (in the direction of arrow e').

By performing the above operations, the base plate of the fixed ring 18 is not received by the annular manipulator 20.

In addition, on the contrary, the substrate of the annular manipulator 20 is fixed to the fixing ring 18.
(a) The annular manipulator 20 advances (in the direction of arrow e).

(b) After the annular manipulator 20 is fitted into the fixed ring 8, the annular manipulator 20 rotates (in the direction of arrow f') and the substrate K is moved to the fixed ring 18.

(c) The annular manipulator 20 moves backward (in the direction of arrow e').

By performing the above operations, the annular manipulator 2
0 substrate is transferred to the fixed ring 18.

In this way, when the substrate receiver is a transfer mechanism and the annular manipulator 20 receives the substrate K from the fixed ring 18,
After the annular manipulator 20 moves forward (in the direction of arrow e), the annular manipulator 20 rotates in the direction of arrow f. On the other hand, when transferring the substrate K of the annular manipulator 20 to the fixed ring 18, the annular manipulator 20 moves forward (in the direction of arrow e). There is a difference in the directionality of the operation in that the annular manipulator 20 rotates in the direction of the arrow f' after the rotation (direction). Therefore, by determining this difference in directionality, the board receiver can know whether the transfer mechanism is performing a board receiving operation or a board transfer operation.

Therefore, in a molecular beam epitaxy apparatus including such a substrate holder and transfer mechanism, a detector 132 capable of detecting the direction of movement (forward/backward) of the annular manipulator 20 outside the apparatus;
Similarly, a detector 142 that can detect the direction of movement (rotation direction) of the annular manipulator 20 outside the device, and a discrimination circuit 152 that inputs detection signals from these detectors to determine whether a substrate receiving operation or a board transfer operation is performed. By having
It is possible to accurately know whether or not the board is being transferred reliably.

〔Effect of the invention〕

As explained above, according to the present invention, the board receiver detects the direction of the operation of the transfer mechanism outside the device, and can determine whether the board is received or transferred based on the detection signal, so that the board transfer can be carried out accurately. This will help improve reliability.

[Brief explanation of the drawing]

1 and 2 show an embodiment of the present invention, FIG. 1 is a block diagram of a molecular beam epitaxy apparatus according to the present invention, FIG. 2 is a perspective view of the substrate holder and transfer mechanism, and FIGS. FIG. 4 is a perspective view of a transfer mechanism portion of a substrate holder shown as another embodiment of the present invention. DESCRIPTION OF SYMBOLS 10... Transfer manipulator, 11... Member, 13.14... Detector, 15... Discrimination circuit, 16
... Cassette, 17... Transfer manipulator, 18... Fixed ring, 20... Annular manipulator, 1
31°132.141,142...Detector, 151°152...Discrimination circuit. χ 1 Mouth 3 Picture 4 Mouth Continued from page 1 ■ Inventor Enso Naoyuki 1 @ Inventor Senyasu Tachibana 794 Higashitoyoi, Koichi Hitachi Ltd. Kasado Factory 1 Higashikoengakubo, Uchigadera City Chome 28 Hatachi Hitachi, Ltd. Nakasho Research Institute

Claims (1)

[Claims] A substrate transfer chamber, a plurality of vacuum processing chambers directly connected to the transfer chamber, a substrate transfer mechanism that transfers the substrate in the transfer chamber to the front of each vacuum processing chamber, and a structure between each vacuum processing chamber and the transfer chamber. In semiconductor manufacturing equipment, each board holder is equipped with a board holder and a transfer mechanism, and each board holder is configured to monitor the direction of operation when the transfer mechanism receives the board and the direction of the operation when transferring the board from outside the equipment. 1. A semiconductor manufacturing apparatus comprising: detection means for detecting the respective detection means; and discrimination means for inputting the detection signals of the respective detection means to discriminate between a receiving operation and a transfer operation of a substrate.