JPS60222846A - 電離放射線感応ネガ型レジスト材料 - Google Patents

電離放射線感応ネガ型レジスト材料

Info

Publication number
JPS60222846A
JPS60222846A JP7965884A JP7965884A JPS60222846A JP S60222846 A JPS60222846 A JP S60222846A JP 7965884 A JP7965884 A JP 7965884A JP 7965884 A JP7965884 A JP 7965884A JP S60222846 A JPS60222846 A JP S60222846A
Authority
JP
Japan
Prior art keywords
resist
polymer
ionizing radiation
polyvinyl alcohol
resist material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7965884A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0449935B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Oguchi
小口　清
Yoichi Takahashi
洋一 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP7965884A priority Critical patent/JPS60222846A/ja
Publication of JPS60222846A publication Critical patent/JPS60222846A/ja
Publication of JPH0449935B2 publication Critical patent/JPH0449935B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP7965884A 1984-04-20 1984-04-20 電離放射線感応ネガ型レジスト材料 Granted JPS60222846A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7965884A JPS60222846A (ja) 1984-04-20 1984-04-20 電離放射線感応ネガ型レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7965884A JPS60222846A (ja) 1984-04-20 1984-04-20 電離放射線感応ネガ型レジスト材料

Publications (2)

Publication Number Publication Date
JPS60222846A true JPS60222846A (ja) 1985-11-07
JPH0449935B2 JPH0449935B2 (enrdf_load_stackoverflow) 1992-08-12

Family

ID=13696241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7965884A Granted JPS60222846A (ja) 1984-04-20 1984-04-20 電離放射線感応ネガ型レジスト材料

Country Status (1)

Country Link
JP (1) JPS60222846A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009132234A3 (en) * 2008-04-25 2011-06-16 Medtronic, Inc. Medical devices, polymers, compositions, and methods for delivering a haloacetate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009132234A3 (en) * 2008-04-25 2011-06-16 Medtronic, Inc. Medical devices, polymers, compositions, and methods for delivering a haloacetate

Also Published As

Publication number Publication date
JPH0449935B2 (enrdf_load_stackoverflow) 1992-08-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees