JPS60215552A - Production of plate microlens - Google Patents

Production of plate microlens

Info

Publication number
JPS60215552A
JPS60215552A JP7210084A JP7210084A JPS60215552A JP S60215552 A JPS60215552 A JP S60215552A JP 7210084 A JP7210084 A JP 7210084A JP 7210084 A JP7210084 A JP 7210084A JP S60215552 A JPS60215552 A JP S60215552A
Authority
JP
Japan
Prior art keywords
substrate
mask
flat
pattern mask
microlenses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7210084A
Other languages
Japanese (ja)
Other versions
JPH0623080B2 (en
Inventor
Masatake Matsuo
誠剛 松尾
Norihisa Okamoto
岡本 則久
Naoyuki Ito
直行 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP59072100A priority Critical patent/JPH0623080B2/en
Publication of JPS60215552A publication Critical patent/JPS60215552A/en
Publication of JPH0623080B2 publication Critical patent/JPH0623080B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Optical Integrated Circuits (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To make it possible to mass-produce the titled lens having accuracy required for various uses in a relatively simple step, by subjecting a substrate having a mask even on a surface except a surface having a pattern mask to ionic thermomigration. CONSTITUTION:Plate microlenses are produced by the ionic thermomigration method. In the method, substrates with a pattern mask down have been dipped in a molten salt in the past, but measures for preventing penetration of a dopant into a surface except the surface having the pattern mask, e.g. sides or rear of the substrate, are not taken. The dopant diffuses from the sides, etc. of the substrate, and therefore phenomena, e.g. warpage, torsion, stain, etc. are observed. Thus, a substrate 1 having the mask 7 on surfaces except the surfaces having the pattern mask 2 is used to eliminate the conventional defects, and the aimed plate microlenses 5 of high accuracy can be produced.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は、イオン熱拡散法を用いた平板マイクロレンズ
の製造方法において、基板中のイオンと置き換わること
によって基板の屈折率を局部的に変化せしめるドーパン
トを選択拡散させるためのパターンマスクが形成されて
いる曲以外の面にもマスクを形成し、不要なドーパント
が基板内に浸入しないようにしてイオン熱拡散を行なう
平板マイクロレンズの製造方法Gこ関する。
Detailed Description of the Invention [Technical Field] The present invention is a method for manufacturing a flat plate microlens using an ion thermal diffusion method. This relates to a method of manufacturing a flat microlens in which a mask is formed on a surface other than the curved surface on which a pattern mask for selective diffusion is formed, and ion thermal diffusion is performed while preventing unnecessary dopants from penetrating into the substrate.

〔従来技術〕[Prior art]

近年、伊賀、及用らによって、平板基板内へのドーパン
トの選択拡散によってできる平板マイクロレンズが報告
され注目をあつめている。(Al)1)1.0pt。2
2,441(1983)) この平板マイクロレンズは
、多数のマイクロレンズを所望の位置関係でモノリシッ
クに集積できるという特徴をもち、他のアレイ状の光学
素子と積層することによって光回路をアレイ状に一括し
て製作できるなど、将来の光関連分野において基本的な
エレメントになることが期待されている。また複写器、
プリンターイメージセンサ等、画像伝送の分野において
も基本的なエレメントになっていくと思われる。
In recent years, a planar microlens formed by selective diffusion of a dopant into a planar substrate has been reported by Iga et al. and has attracted attention. (Al)1) 1.0pt. 2
2, 441 (1983)) This flat plate microlens has the feature that a large number of microlenses can be monolithically integrated in a desired positional relationship, and by stacking it with other arrayed optical elements, it is possible to form an optical circuit into an array. It is expected that it will become a basic element in future optics-related fields, as it can be manufactured in bulk. Also a copier,
It is thought that it will become a fundamental element in the field of image transmission, such as printer image sensors.

さらGこは光ディスクのピックアップ等にも応用されよ
う。このように平板マイクロレンズは光関連の多くの分
野で基本的なエレメントになることが期待できる。
Sarago will also be applied to optical disc pickups, etc. In this way, flat microlenses can be expected to become a fundamental element in many optical-related fields.

ところが従来の平板マイクロレンズの製造方法は、ドー
パントを基板に選択拡散させるイオン熱拡散の工程で、
基板がわずかにそる、ねじれる、基板側面、裏面がドー
パントで汚洗される等の欠点をもつために、各種分野で
要求される精度をもった平板マイクロレンズを再現性良
く得ることはできなかった。従来の平板マイクロレンズ
の製造方法のイオン熱拡散の工程を図1で、また従来の
製造方法で得られた平板マイクロレンズのもつ各種の欠
陥を図2で説明する。
However, the conventional manufacturing method for flat plate microlenses uses an ion thermal diffusion process that selectively diffuses dopants into the substrate.
Due to drawbacks such as the substrate being slightly warped or twisted, and the side and back surfaces of the substrate being contaminated with dopants, it was not possible to obtain flat microlenses with the precision required in various fields with good reproducibility. . The ion thermal diffusion process of a conventional flat microlens manufacturing method will be explained with reference to FIG. 1, and various defects in flat microlenses obtained by the conventional manufacturing method will be explained with reference to FIG.

従来のイオン熱拡散法においては、イオン熱拡散を、パ
ターンマスクを下にして基板を溶融塩に浸すことによっ
て行なっていた。ところが図1のごトく、パターンマス
クの形成されている曲以外の面(図1では基板側面、基
板裏面)には特にドーパントの基板への浸入を防ぐため
の対策がとられておらず、基板側面等からドーパントが
拡散し、そのため基板のそり、ねじれ、汚れ等の現象が
みられた。これらの現象は図2に示した様に、平板マイ
クロレンズ、および平板マイクロレンズアレイの精度を
低下させていた。((α)〜Cd))。
In conventional ion thermal diffusion methods, ion thermal diffusion is performed by immersing the substrate in molten salt with the patterned mask facing down. However, as shown in FIG. 1, no measures are taken to prevent the dopant from penetrating into the substrate on surfaces other than the curved surface where the pattern mask is formed (the side surface of the substrate and the back surface of the substrate in FIG. 1). The dopant diffused from the side surfaces of the substrate, causing phenomena such as warping, twisting, and staining of the substrate. As shown in FIG. 2, these phenomena degrade the precision of flat microlenses and flat microlens arrays. ((α)~Cd)).

(α) 光軸の傾き (b) 個々のレンズ特性のバラツキ(レンズ径、焦点
距離、N A−、収差等) (C) レンズ間の位置関係の精度の低下Cd) 基板
の屈折率の不均一性 〔目的〕 本発明は上記の欠点を解決するため、イオン熱拡散法を
用いた平板マイクロレンズの製造方法において、パター
ンマスクが形成されている曲以外にもマスクが形成され
ている基板を用いてイオン熱拡散を行ない、目的を達し
たものである。
(α) Inclination of the optical axis (b) Variation in individual lens characteristics (lens diameter, focal length, NA-, aberration, etc.) (C) Decrease in precision of positional relationship between lenses Cd) Inconsistency in the refractive index of the substrate Uniformity [Purpose] In order to solve the above-mentioned drawbacks, the present invention provides a flat microlens manufacturing method using the ion thermal diffusion method. The purpose was achieved by using ion thermal diffusion.

〔概要〕〔overview〕

以下、図面を用いて本発明の詳細な説明する。 Hereinafter, the present invention will be explained in detail using the drawings.

本発明の平板マイクロレンズの製造方法において、イオ
ン熱拡散の工程の模式図を図6に示す。本発明で用いる
基板は、図1で説明した従来法のイオン熱拡散で用いた
基板のパターンマスクが形成されている曲以外の面にも
マスクが形成されており、ドーパントはパターンマスク
の開口部からのみ基板に浸入する。したがって従来法の
欠点であった基板のそり、ねじれ、汚れ等が全くといっ
ていいほどなくなり、各種光学デバイスのエレメントと
して必要な精度を具備した平板マイクロレンズが得られ
るようになった。以下、本発明の実施例を記す。
FIG. 6 shows a schematic diagram of the ion thermal diffusion step in the method for manufacturing a flat microlens of the present invention. The substrate used in the present invention has a mask formed on a surface other than the curved surface on which the pattern mask of the substrate used in the conventional ion thermal diffusion method explained in FIG. Infiltrate the substrate only from Therefore, the warpage, twisting, staining, etc. of the substrate, which were disadvantages of the conventional method, are almost completely eliminated, and flat microlenses having the accuracy required as elements of various optical devices can be obtained. Examples of the present invention will be described below.

〔実施例〕〔Example〕

1、30 mm X 50 rrrmX 5 ylB厚
のKF2ガラスの大面を研磨した。
A large surface of KF2 glass with a thickness of 1.30 mm x 50 rrrm x 5 ylB was polished.

2、上記基板の大面にRFスパッタ装置によってT1膜
をおのおの1μ常形成した。
2. A T1 film of 1 μm each was formed on the large surface of the above substrate using an RF sputtering device.

五フオト工程により直径500μ常の円形の開口部を2
mmピッチで格子状に144コ(12×12)設けた。
Two circular openings with a diameter of 500μ are created using a five-photo process.
144 pieces (12 x 12) were provided in a grid pattern with a mm pitch.

4、硫酸タリウム、硫酸亜鉛からなる溶融塩(モル比で
5対5)に基板をパターンマスクを下にして浮かべた。
4. The substrate was floated on a molten salt consisting of thallium sulfate and zinc sulfate (5:5 molar ratio) with the pattern mask facing down.

(図3) 5、N2雰囲気中、500°Cで96時間イオン熱拡散
を行なった。
(Figure 3) 5. Ion thermal diffusion was performed at 500°C for 96 hours in a N2 atmosphere.

6、基板を溶融塩から取り出して徐冷した。6. The substrate was taken out from the molten salt and slowly cooled.

Z基板を洗浄後、Ti膜を熱リン酸でエツチングするこ
とによって取り除いた。
After cleaning the Z substrate, the Ti film was removed by etching with hot phosphoric acid.

aガラス表面を研磨した。a The glass surface was polished.

以上の操作によって下記の特性をもつ平板マイクロレン
ズアレイが得られた。(図4)■ レンズ直径 1.5
2mm ■ 焦点距離A3.12關(空気中) ■ 焦点距離B 5.0OrrrIn(ガラス中)■ 
レンズ間のピッチ 2.00順 ■ レンズ個数 144コ ■ この平板マイクロレンズアレイGこ図5の様に平行
光を入射したところ144コすべてノ平板マイクロレン
ズで良好な集光作用を示し、ガラス基板端面でG工50
ファイバに光を導びくことかできた。
Through the above operations, a flat microlens array having the following characteristics was obtained. (Figure 4) ■ Lens diameter 1.5
2mm ■ Focal length A3.12mm (in air) ■ Focal length B 5.0OrrrIn (in glass) ■
Pitch between lenses 2.00 order ■ Number of lenses 144 ■ When parallel light was incident on this flat microlens array G as shown in Figure 5, all 144 flat microlenses showed a good light focusing effect, and the glass substrate G machining 50 on the end face
It was possible to guide light into a fiber.

〔効果〕 以上の様に、本発明の平板マイクロレンズの製造方法に
よると、各種用途に必要な精度をもつ平板マイクロレン
ズが比較的簡単な工程で量産でき、そのため将来基本的
な光学エレメントになっていくであろう平板マイクロレ
ンズを安価に提供でき、本発明がオプトエレクトロニク
スの分野に多大な寄生をすると確信する。なお本発明の
平板マイクロレンズの製造方法は、平板マイクロレンズ
の他の微小光学デバイス(例えば、薄膜導波路、分岐素
子、薄膜スイッチング素子等)の製造においても同じよ
うに応用できよう。
[Effects] As described above, according to the method for manufacturing flat microlenses of the present invention, flat microlenses with the precision required for various uses can be mass-produced through a relatively simple process, and therefore can become basic optical elements in the future. We are confident that the present invention will have a great impact on the field of optoelectronics, as it will be possible to provide a flat microlens at a low cost. Note that the method for manufacturing a flat microlens of the present invention can be similarly applied to the manufacturing of other microscopic optical devices (for example, thin film waveguides, branching elements, thin film switching elements, etc.) other than flat microlenses.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のイオン熱拡散法を用いた平板マイクロレ
ンズの製造方法で、1はガラス基板、2はパターンマス
ク、3はセラミック容器、4は溶融塩、5は平板マイク
ロレンズ、6はパターンマスクの開口部以外からのドー
パントの拡散部である。第2図は従来のイオン熱拡散法
を用いた平板マイクロレンズの製造方法によって得られ
た平板マイクロレンズアレイの種々の欠点の例である。 (α)は光軸の傾き、(b、、)は個々のレンズ特性の
バラツキ、(C)はレンズ間の位置関係の精度がわるい
こと、(d)は基板の屈折率の不均一性をあられしであ
る。第3図は本発明の平板マイクロレンズの製造方法を
模式的に表わしたもので、従来法と比べると7のパター
ンマスク以外のマスクが新たに形成されている。第4図
(fZ) 、 Cb)、第5図は本発明の実施例におい
て得られた平板マイクロレンズおよび平板マイクロレン
ズアレイの特性を示す図である。第4図は集光特性を表
す図で、第5図は光ファイバーとの結合特性を表す図で
ある。8は平板マイクロレンズ基板、9は平板マイクロ
レンズ、10は集光スポット、11は焦点距離(A)、
12は焦点距離(B)である第5図において13は平板
マイクロレンズアレイ基板、14は平板マイクロレンズ
、15は光ファイバーである。 以 上 出願人 株式会社諏訪精工舎 代理人 弁理士 最上 務 第1図 (C)(引 第20 第31 (久ン (トン ll 第5図
Figure 1 shows a method for manufacturing a flat microlens using the conventional ion thermal diffusion method, in which 1 is a glass substrate, 2 is a pattern mask, 3 is a ceramic container, 4 is a molten salt, 5 is a flat microlens, and 6 is a pattern. This is a region where the dopant is diffused from other than the opening of the mask. FIG. 2 shows examples of various drawbacks of a flat microlens array obtained by a conventional method for manufacturing flat microlenses using the ion thermal diffusion method. (α) is the tilt of the optical axis, (b, ,) is the variation in individual lens characteristics, (C) is the poor precision of the positional relationship between lenses, and (d) is the non-uniformity of the refractive index of the substrate. It's a hailstorm. FIG. 3 schematically shows the method for manufacturing a flat plate microlens according to the present invention, and compared to the conventional method, masks other than pattern mask 7 are newly formed. FIG. 4 (fZ), Cb) and FIG. 5 are diagrams showing the characteristics of the flat microlens and flat microlens array obtained in the examples of the present invention. FIG. 4 is a diagram showing the light condensing characteristics, and FIG. 5 is a diagram showing the coupling characteristics with an optical fiber. 8 is a flat microlens substrate, 9 is a flat microlens, 10 is a condensing spot, 11 is a focal length (A),
In FIG. 5, 12 is a focal length (B), 13 is a flat microlens array substrate, 14 is a flat microlens, and 15 is an optical fiber. Applicant Suwa Seikosha Co., Ltd. Agent Patent Attorney Mogami Figure 1 (C) (Figure 20, Figure 5)

Claims (1)

【特許請求の範囲】[Claims] イオン熱拡散法を用いた平板マイクロレンズの製造方法
において、パターンマスクが形成されている曲以外の面
にもマスクが形成されている基板を用いてイオン熱拡散
を行うことを特徴とする平板マイクロレンズの製造方法
A flat plate microlens manufacturing method using an ion thermal diffusion method, characterized in that ion thermal diffusion is performed using a substrate on which a mask is formed on a surface other than the curved surface on which a pattern mask is formed. How to manufacture lenses.
JP59072100A 1984-04-11 1984-04-11 Manufacturing method of micro optical element Expired - Lifetime JPH0623080B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59072100A JPH0623080B2 (en) 1984-04-11 1984-04-11 Manufacturing method of micro optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59072100A JPH0623080B2 (en) 1984-04-11 1984-04-11 Manufacturing method of micro optical element

Publications (2)

Publication Number Publication Date
JPS60215552A true JPS60215552A (en) 1985-10-28
JPH0623080B2 JPH0623080B2 (en) 1994-03-30

Family

ID=13479648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59072100A Expired - Lifetime JPH0623080B2 (en) 1984-04-11 1984-04-11 Manufacturing method of micro optical element

Country Status (1)

Country Link
JP (1) JPH0623080B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58167451A (en) * 1982-03-25 1983-10-03 Seiko Epson Corp Preparation of optical element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58167451A (en) * 1982-03-25 1983-10-03 Seiko Epson Corp Preparation of optical element

Also Published As

Publication number Publication date
JPH0623080B2 (en) 1994-03-30

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