JPS60215540A - Production unit for porous parent material of optical fiber - Google Patents
Production unit for porous parent material of optical fiberInfo
- Publication number
- JPS60215540A JPS60215540A JP59069569A JP6956984A JPS60215540A JP S60215540 A JPS60215540 A JP S60215540A JP 59069569 A JP59069569 A JP 59069569A JP 6956984 A JP6956984 A JP 6956984A JP S60215540 A JPS60215540 A JP S60215540A
- Authority
- JP
- Japan
- Prior art keywords
- porous
- target
- optical fiber
- shielding layer
- parent material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/10—Non-chemical treatment
- C03B37/12—Non-chemical treatment of fibres or filaments during winding up
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/0144—Means for after-treatment or catching of worked reactant gases
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)技術分野
この発明は光フアイバー用の多孔質母材を製造するため
に用いる、主としてVAD装置の改良(VAD以外にも
、それと原1!l!を同じくする外すす付は方法におい
て効果を有する)に関するものである。Detailed Description of the Invention (a) Technical field This invention mainly relates to improvements in VAD equipment (in addition to VAD, it also has the same basic characteristics as the original 1!l! Removing the attachment has an effect on the method).
(ロ)技術背景
VAD装置において、Sin、を主成分とする光フアイ
バー用の多孔質母材を成長させている際に多孔質母材の
表面の一部に異常に多くの5Lo2微粒子が付着したり
、割れたり、あるいはそれらの結果落下するような現象
がよく生じる。(b) Technical background In a VAD device, when growing a porous base material for optical fiber containing Sin as a main component, an abnormally large number of 5Lo2 fine particles adhere to a part of the surface of the porous base material. It is common for objects to crack, break, or fall as a result.
そしてこのような異常の生じた多孔質母材はほとんどが
不良品となるのである。Most of the porous base materials in which such abnormalities occur are defective products.
即ち、VAD装置の多孔質母材と成長させている部分を
取囲むマツフルと呼ばれる隔離室の隔壁は、一般にガラ
スや石英で作られている。そしてこの部分に酸水素バー
ナからでた帯電した5Lo2の微粒子が当ると、隔壁の
ガラスや石英の帯電のための静電気効果により、これが
吸引されて隔壁としてのガラスや石英面に積層する。そ
して時間とともにその積層量が増加すると、その一部が
自重により落下し、その途中で成長中の多孔質母材に接
触したり、または下部にある酸水素バーナにより吹き上
げられて多孔質母材の表面上に異常なSi 02の突起
状物体を形成したりする。That is, the partition wall of an isolated chamber called a matsufuru that surrounds the porous base material and the growing part of the VAD apparatus is generally made of glass or quartz. When charged fine particles of 5Lo2 emitted from the oxy-hydrogen burner hit this part, they are attracted by the electrostatic effect due to the charging of the glass or quartz of the partition and are deposited on the glass or quartz surface of the partition. As the amount of stacked layers increases over time, some of them fall due to their own weight and come into contact with the growing porous base material, or are blown up by the oxyhydrogen burner located at the bottom of the porous base material. Abnormal Si 02 protrusions are formed on the surface.
このため多孔質11(Aの持つべき長手軸方向に一様性
であるべき特1)+を11うのである。For this reason, the porosity 11 (characteristic 1 that A should have, which should be uniform in the longitudinal axis direction) is 11.
このことを従来使用されている光フアイバー用材製造の
ための第1図のようイfVΔrLH[について説明する
と、2がターゲラ1〜(Aの石英棒(Tどであり、この
ターゲツト材祠の先端に光ファイバーの多孔質母材1が
成長ηる。To explain this about the case of fVΔrLH [as shown in FIG. The porous base material 1 of the optical fiber grows.
3は酸水素バーナで、酸素ど水素を燃焼ガスどし、さら
にこの酸水素バーブ3 +、1バーナ内部が多重管(図
示省略)になっていてSi、 CR4、G3C94、A
rなどを同時に吹田−リことができるJ:うに′/′に
、)でいる。3 is an oxyhydrogen burner, which converts oxygen and hydrogen into combustion gases, and the inside of this oxyhydrogen barb 3 +, 1 burner is made up of multiple tubes (not shown), and Si, CR4, G3C94, A
r etc. can be Suita-ri at the same time.
4はその焔であり、この内部には酸化した5102、G
aO,などの微粒子が存在する。4 is the flame, and inside it is oxidized 5102, G
There are fine particles such as aO.
5はこれらを取囲むマツフルと呼ばれる隔壁であって、
外界との隔#1を目的としており、一般には通常のガラ
ス、石英質ガラス2Zどからイ【っている。5 is a bulkhead called Matsuful that surrounds these,
The purpose is to provide #1 separation from the outside world, and it is generally made of ordinary glass, quartz glass 2Z, etc.
このガラス類は一般に帯電しやすく、付近に微小物体が
飛来してくると、それらの帯電関係により吸着してしま
う。このため酸水素バーナ3により隔壁5内で発生する
Si G2、Geneなどの微粒子は、多孔質母材製造
中に隔壁の内面に堆積する。Generally, this type of glass is easily charged, and if minute objects fly nearby, they will be attracted to them due to their charging relationship. Therefore, fine particles such as Si G2 and Gene generated within the partition wall 5 by the oxyhydrogen burner 3 are deposited on the inner surface of the partition wall during the production of the porous base material.
また、これらの微粒子自体も帯電しているので、隔壁の
帯電に対する異種帯電粒子は吸着が加速される。Further, since these fine particles themselves are electrically charged, the adsorption of charged particles of a different type to the electrical charge of the partition wall is accelerated.
このにうにして堆積が発生し、それが成長すると重力の
ためにその一部が落下し、一時的に隔壁内部は不安定な
状態となり、母材の表面に多量のSi G2が付着した
り、落下物が多孔質母材に当ることににす、母材にクラ
ックが発生し、また一部の落下が見られる。Deposition occurs in this way, and as it grows, part of it falls due to gravity, temporarily creating an unstable state inside the partition wall, and causing a large amount of Si G2 to adhere to the surface of the base material. When a falling object hits the porous base material, cracks occur in the base material, and some parts are seen falling.
これによりVAD生産歩留りが低下する。This reduces VAD production yield.
第1図において、6は隔壁に取付けられた排気孔であり
、酸水素バーナ3により流入したガス、発生したガスあ
るいは廃棄物質がこの排気孔6により外部へ排出される
。In FIG. 1, reference numeral 6 denotes an exhaust hole attached to the partition wall, through which gas flowing in, generated gas, or waste materials from the oxyhydrogen burner 3 is discharged to the outside.
(ハ)発明の開示
このような従来のVAD装置における隔壁表面での5L
02やG102の微粒子の堆積、あるいはこれら3−
の落下にJ:る多孔質用材への悪影響といった欠点を改
善すべく検問の結束得られたのが、この発明の隔壁内表
面に導電III 44質の遮蔽層を母材と酸水素バーナ
を取巻くように設置lノたV A D HIIQ?であ
・ る。(C) Disclosure of the Invention In such a conventional VAD device, 5L on the partition wall surface
In order to improve the drawbacks such as the accumulation of fine particles of 02 and G102, or the adverse effect on porous materials caused by the falling of these 3-, the present invention was able to achieve the result of using conductive III-44 material on the inner surface of the partition wall. A shielding layer was installed around the base material and the oxyhydrogen burner. That's it.
即ち、この発明のVAr)装置−Iでは隔壁が帯電し、
Dつこの帯電のために発生する電界を隔壁内部にで及ぼ
さずにシールドすることにJζり川4A I! 造中の
空間を外部電界の影響を断ち、安定化するのである。That is, in the VAr) device-I of the present invention, the partition wall is charged,
JζRikawa 4A I! To shield the electric field generated due to the charging of the D-tube from reaching the inside of the partition wall. This stabilizes the space under construction by cutting off the influence of external electric fields.
このために11+J !II %Jで、その全過程中に
おいて安定したすすM t−Jが可能となるのである。11+J for this! II %J allows for stable soot M t-J during the entire process.
以下、この発明に<−76装置をその一実7illi例
を示す第2図を参照して具体的に説明する。Hereinafter, the <-76 device according to the present invention will be specifically explained with reference to FIG. 2, which shows an example of the device.
なおこの第2図中、第1図と間部位で同じ働きをする部
分については第1図と同一符号を付1ノでその説明を省
略り゛る。Note that in FIG. 2, parts that have the same functions as those in FIG. 1 are designated by the same reference numerals as in FIG.
第2図において、WAAs2多孔質の光フアイバー用母
材1、酸水素バーナ3から出る焔4との間を導電性材質
からなる遮蔽層7で取囲む。(但し、4−
光フアイバー母材のターゲツト材2に近い側は一部囲み
の中に物理的に入れることは無理であるが)この場合、
最も現実的に遮蔽層7を隔壁5内面に取付は容易にする
形状は、網状のほぼ球形状の物体で、これを遮蔽層7と
して取付けるものである。In FIG. 2, a shielding layer 7 made of a conductive material surrounds the gap between the WAAs2 porous optical fiber base material 1 and the flame 4 emitted from the oxyhydrogen burner 3. (However, 4- It is impossible to physically put part of the side of the optical fiber base material closer to the target material 2 into the enclosure) In this case,
The shape that most realistically makes it easy to attach the shielding layer 7 to the inner surface of the partition wall 5 is a net-like, approximately spherical object, which is attached as the shielding layer 7.
この場合、球形状の網状の遮蔽層7は酸水素バーナ3の
取イ」けや光フアイバー母材1の通過のための所定の孔
をあ番ノでおくことが好ましい。In this case, it is preferable that the spherical net-like shielding layer 7 has predetermined holes at appropriate numbers for the removal of the oxyhydrogen burner 3 and the passage of the optical fiber base material 1.
このような網状の球形状の導電性材質からなる遮蔽層7
を隔壁5の内面に取付けた場合は、その外側に存在する
電界が遮蔽層7の内部には全く影響を及ぼさない。換言
すれば、隔壁5のガラスが帯電したために、それによる
周辺に存在する電界、隔壁5の内側に付着、形成された
Sj O2の微粒子による電界は、この遮蔽層7の有す
る遮蔽効果により内部に電界が及ばない。The shielding layer 7 made of such a net-like spherical conductive material
When the shielding layer 7 is attached to the inner surface of the partition wall 5, the electric field existing outside the shielding layer 7 has no effect on the inside of the shielding layer 7. In other words, since the glass of the partition wall 5 is electrically charged, the electric field existing around it, and the electric field due to the SjO2 fine particles attached and formed inside the partition wall 5, are suppressed internally due to the shielding effect of the shielding layer 7. Electric field does not reach.
なお、上記では導電性材質からなる遮蔽層として網状の
球形状のものを用いた場合について説明したが、隔壁5
が、例えば円柱状であるような場合においては、これに
見合う円柱状またはそれに底のついた導電f1材質で、
網状か21、たはパンチメタル状の遮蔽層を用いてb同
様の効果が1qられる。In addition, although the case where a net-like spherical shielding layer made of a conductive material is used is described above, the partition wall 5
For example, in the case of a cylindrical shape, a conductive f1 material with a cylindrical shape or a bottom corresponding to the cylindrical shape,
An effect similar to b can be obtained by using a shielding layer in the form of a mesh or a punched metal.
このような状況下で光ファイバーの多孔質II祠1の製
造中に隔壁5内に浮遊1゛るSシOf!やGa0eの微
粒子は、遮蔽層7の外に右づる電気的な影響を受けるこ
とはない。Under such circumstances, during the manufacture of the porous optical fiber II structure 1, there are S particles floating inside the partition wall 5! The fine particles of Ga0e and Ga0e are not affected by any electrical influence outside the shielding layer 7.
即ち、外部電界に引さつ【ノられて隔壁5の内壁面に付
着することはあって−b、Ill積することはないので
ある。That is, it may be attracted to the external electric field and adhere to the inner wall surface of the partition wall 5, but it will not result in a -b,Ill product.
また酸水素バーナ3h11らの8103、GaO2など
の微粒子の流れも外乱を受()ることなく流れるため、
光ファイバーの多孔wII目イを1’lJ 造”Jるに
当り、安定した品質の予定通りの形状のものができ、製
造途中で隔壁内面をS(0,を主体どりる微粒子のIf
l積物の落下による破旧どいったおそれもなくなり、ま
た同時に母材表面に局部的に微粒子が(!I n−する
という異常現象も見られないのである。In addition, the flow of fine particles such as 8103 and GaO2 from the oxyhydrogen burner 3h11 etc. also flows without receiving any disturbance.
In manufacturing the optical fiber's porous holes 1'lJ, a product with stable quality and the expected shape is obtained, and during the manufacturing process, the inner surface of the partition wall is coated with If
There is no fear of damage caused by falling objects, and at the same time, there is no abnormal phenomenon in which fine particles are locally formed on the surface of the base material.
なお、この発明で遮蔽層を構成する導電(11+、4質
としては、導電f1を有Jるものであれば、そのl1的
を達しうるが、光ファイバーを製造する装置内に装填す
るという点からはその材質を吟味することも必要であり
、そのような点からアルミニウムが最−t)良好である
。In addition, in this invention, as the conductive (11+, 4 materials) constituting the shielding layer, if it has conductivity f1, it can achieve the l1 target, but from the point of view of loading it into the equipment for manufacturing optical fibers, It is also necessary to carefully examine the material, and from this point of view aluminum is the best.
そしてこの発明の遮蔽層の形状としては、前述した球状
かご型が適当である。As for the shape of the shielding layer of the present invention, the above-mentioned spherical cage shape is suitable.
第1図は従来のVAD装置の断面図、第2図はこの発明
のVAD装置の断面図である。
1・・・多孔質母材 2・・・ターゲツト材3・・・酸
水素バーナ 4・・・焔 5・・・隔壁6・・・排気孔
7・・・遮蔽層
特許出願人 住友電気工業株式会社
代 埋 人 弁理士 和 1) 昭FIG. 1 is a sectional view of a conventional VAD device, and FIG. 2 is a sectional view of a VAD device of the present invention. 1... Porous base material 2... Target material 3... Oxyhydrogen burner 4... Flame 5... Partition wall 6... Exhaust hole 7... Shielding layer patent applicant Sumitomo Electric Industries, Ltd. Company representative Kazu 1) Akira
Claims (2)
先端にて多孔質母材を成長させるターゲツト材と酸水素
バーナを収容する隔離室の内壁面に導電性材質によりな
る遮蔽層を設けたことを特徴とする光ファイバー用多孔
質PJ材の製造装置。(1) A manufacturing device for porous material for optical fiber,
An apparatus for manufacturing a porous projector material for optical fibers, characterized in that a shielding layer made of a conductive material is provided on the inner wall surface of an isolation chamber that accommodates a target material for growing a porous base material at the tip and an oxyhydrogen burner.
ることを特徴とする特許請求の節囲第1項記載の光ファ
イバー用多孔質用材の製造装置。(2) Conductive material J: The apparatus for producing a porous material for optical fibers according to claim 1, wherein the shielding layer has a cage shape.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59069569A JPS60215540A (en) | 1984-04-06 | 1984-04-06 | Production unit for porous parent material of optical fiber |
DE8585102837T DE3583168D1 (en) | 1984-04-06 | 1985-03-12 | DEVICE FOR PRODUCING POROUS PREFORMS FOR OPTICAL FIBERS. |
EP85102837A EP0157238B1 (en) | 1984-04-06 | 1985-03-12 | Apparatus for producing porous preforms for optical fibers |
CA000477509A CA1234971A (en) | 1984-04-06 | 1985-03-26 | Apparatus for producing porous preforms for optical fibers |
AU40405/85A AU565670B2 (en) | 1984-04-06 | 1985-03-27 | Producing fibre optical preforms |
KR1019850002028A KR870001741B1 (en) | 1984-04-06 | 1985-03-27 | Apparatus for making of optical fiber preform |
DK142085A DK163659C (en) | 1984-04-06 | 1985-03-29 | Apparatus for the preparation of porous articles for use in the production of optical fibers |
US06/940,203 US4713107A (en) | 1984-04-06 | 1986-12-10 | Apparatus for producing porous preforms for optical fibers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59069569A JPS60215540A (en) | 1984-04-06 | 1984-04-06 | Production unit for porous parent material of optical fiber |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60215540A true JPS60215540A (en) | 1985-10-28 |
JPS632903B2 JPS632903B2 (en) | 1988-01-21 |
Family
ID=13406540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59069569A Granted JPS60215540A (en) | 1984-04-06 | 1984-04-06 | Production unit for porous parent material of optical fiber |
Country Status (8)
Country | Link |
---|---|
US (1) | US4713107A (en) |
EP (1) | EP0157238B1 (en) |
JP (1) | JPS60215540A (en) |
KR (1) | KR870001741B1 (en) |
AU (1) | AU565670B2 (en) |
CA (1) | CA1234971A (en) |
DE (1) | DE3583168D1 (en) |
DK (1) | DK163659C (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007131487A (en) * | 2005-11-10 | 2007-05-31 | Fujikura Ltd | Method for manufacturing glass preform for optical fiber |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6003342A (en) * | 1991-10-25 | 1999-12-21 | The Furukawa Electric Co., Ltd. | Apparatus for production of optical fiber preform |
US5472509A (en) * | 1993-11-30 | 1995-12-05 | Neomecs Incorporated | Gas plasma apparatus with movable film liners |
JP3485697B2 (en) * | 1995-11-07 | 2004-01-13 | 古河電気工業株式会社 | Optical fiber preform manufacturing equipment |
DE10111733B4 (en) * | 2001-03-09 | 2007-02-08 | Heraeus Tenevo Gmbh | Process for producing a SiO 2 blank |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5653768B2 (en) * | 1972-05-18 | 1981-12-21 | ||
DE2821131C2 (en) * | 1978-05-13 | 1986-02-06 | Leybold-Heraeus GmbH, 5000 Köln | Vacuum coating system with a condensate collecting device |
JPS57100934A (en) * | 1980-12-12 | 1982-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacturing of optical fiber preform |
US4435199A (en) * | 1982-04-26 | 1984-03-06 | Western Electric Co., Inc. | Exhaust system for a vapor deposition chamber |
US4547404A (en) * | 1982-08-27 | 1985-10-15 | Anicon, Inc. | Chemical vapor deposition process |
DE3326043A1 (en) * | 1983-07-20 | 1985-02-07 | Licentia Gmbh | METHOD FOR PRODUCING A AEROSOL FLOW AND THE USE THEREOF |
-
1984
- 1984-04-06 JP JP59069569A patent/JPS60215540A/en active Granted
-
1985
- 1985-03-12 DE DE8585102837T patent/DE3583168D1/en not_active Expired - Fee Related
- 1985-03-12 EP EP85102837A patent/EP0157238B1/en not_active Expired - Lifetime
- 1985-03-26 CA CA000477509A patent/CA1234971A/en not_active Expired
- 1985-03-27 AU AU40405/85A patent/AU565670B2/en not_active Ceased
- 1985-03-27 KR KR1019850002028A patent/KR870001741B1/en not_active IP Right Cessation
- 1985-03-29 DK DK142085A patent/DK163659C/en not_active IP Right Cessation
-
1986
- 1986-12-10 US US06/940,203 patent/US4713107A/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007131487A (en) * | 2005-11-10 | 2007-05-31 | Fujikura Ltd | Method for manufacturing glass preform for optical fiber |
JP4494325B2 (en) * | 2005-11-10 | 2010-06-30 | 株式会社フジクラ | Manufacturing method of glass preform for optical fiber |
Also Published As
Publication number | Publication date |
---|---|
DK142085D0 (en) | 1985-03-29 |
KR850007234A (en) | 1985-12-02 |
DK163659B (en) | 1992-03-23 |
EP0157238A3 (en) | 1989-05-24 |
EP0157238A2 (en) | 1985-10-09 |
DE3583168D1 (en) | 1991-07-18 |
US4713107A (en) | 1987-12-15 |
KR870001741B1 (en) | 1987-09-26 |
DK142085A (en) | 1985-10-07 |
EP0157238B1 (en) | 1991-06-12 |
CA1234971A (en) | 1988-04-12 |
AU565670B2 (en) | 1987-09-24 |
DK163659C (en) | 1992-08-17 |
JPS632903B2 (en) | 1988-01-21 |
AU4040585A (en) | 1985-10-10 |
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