JPS60214340A - Rubbing method of both-surface electrode substrate and work table device used for its method - Google Patents
Rubbing method of both-surface electrode substrate and work table device used for its methodInfo
- Publication number
- JPS60214340A JPS60214340A JP7133384A JP7133384A JPS60214340A JP S60214340 A JPS60214340 A JP S60214340A JP 7133384 A JP7133384 A JP 7133384A JP 7133384 A JP7133384 A JP 7133384A JP S60214340 A JPS60214340 A JP S60214340A
- Authority
- JP
- Japan
- Prior art keywords
- electrode substrate
- rubbing
- double
- work table
- table device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は多層液晶表示装置の中間部位に配設して使用さ
れる両面電極基板の配向膜をラビングする方法及びラビ
ング用ワーク台装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for rubbing an alignment film of a double-sided electrode substrate disposed at an intermediate portion of a multilayer liquid crystal display device, and a worktable device for rubbing. It is.
（従来技術）
一般にこの種の電極基板をラビングする場合には、ラビ
ング装置が使用され、特に両面電極基板の場合には片面
ずつラビングする必要がある。そのために例えば第１図
に示したようなラビング装置のワーク台装置が使用され
る。このワーク台装置ｌは内部に空胴部２を有し、上面
３が電極基板の載置部となり、前記空胴部２から上面３
に貫通して設けた複数個の孔からなる真空チャック機構
４が設けられると共に、前記空胴部２の底部には内部を
減圧するだめの排気孔５が設けられている。(Prior Art) Generally, when rubbing this type of electrode substrate, a rubbing device is used, and especially in the case of a double-sided electrode substrate, it is necessary to rub one side at a time. For this purpose, for example, a work table device of a rubbing machine as shown in FIG. 1 is used. This work table device l has a cavity 2 inside, and an upper surface 3 serves as a mounting section for an electrode substrate, and from the cavity 2 to the upper surface 3
A vacuum chuck mechanism 4 consisting of a plurality of holes extending through the cavity 2 is provided, and an exhaust hole 5 is provided at the bottom of the cavity 2 to reduce the pressure inside.
尚図中６は電極基板、７はラビングローラーであ― る。In the figure, 6 is an electrode substrate, and 7 is a rubbing roller. Ru.
この装置を用いてラビングを行う場合に、まず上面３上
にラビングされる電極基板６を載置し、排気孔５を介し
て空胴部２内の空気を抜いて減圧し、真空チャック機構
４を作動させて前記電極基板６を吸引固定する。次いで
ラビングローラー７を駆動して電極基板６０表面に施し
である有効表示面の配光膜をラビングして表示に合せて
整える。When performing rubbing using this device, the electrode substrate 6 to be rubbed is first placed on the upper surface 3, the air inside the cavity 2 is evacuated through the exhaust hole 5 to reduce the pressure, and the vacuum chuck mechanism 4 is activated to suction and fix the electrode substrate 6. Next, the rubbing roller 7 is driven to rub the light distribution film on the effective display surface applied to the surface of the electrode substrate 60 to adjust it in accordance with the display.
この場合、電極基板が多層液晶表示装置に使用される中
間部位の両面電極基板であると、一つの面をラビングし
た後に他方の面もラビングしなければならない。従って
電極基板６を裏返しにして再度表面３上に載置し真空チ
ャック機構４を作動させて吸引固定しなければならない
。In this case, if the electrode substrate is an intermediate double-sided electrode substrate used in a multilayer liquid crystal display device, it is necessary to rub one side and then rub the other side. Therefore, it is necessary to turn the electrode substrate 6 upside down, place it on the surface 3 again, and operate the vacuum chuck mechanism 4 to suction and fix it.
このように電極基板を裏返しにするということは、先に
ラビング処理した面をワーク台装置の上面、即ち真空チ
ャック機構４の面に接触させることになり、その面が吸
引固定されることと相俟つて、せっかくラビング処理し
た有効表示面を傷付けたり乱したりし易く、それによっ
て不良品となり製品の歩留りが著しく悪くなるという欠
点がある。Turning the electrode substrate upside down in this way means bringing the previously rubbed surface into contact with the top surface of the work table device, that is, the surface of the vacuum chuck mechanism 4, and this surface is fixed by suction. As a result, the effectively rubbed display surface is easily damaged or disturbed, resulting in defective products and a significantly low product yield.
（発明の目的）
本発明はこれらの欠点を除するためになされたものであ
って、その目的は両面電極基板をラビングするに当って
、有効表示面を傷付けたり乱したりしないラビング方法
及びワーク台装置を提供しようとするものである。(Object of the Invention) The present invention has been made to eliminate these drawbacks, and its purpose is to provide a rubbing method and workpiece that do not damage or disturb the effective display surface when rubbing a double-sided electrode substrate. The purpose of this project is to provide a standalone device.
（発明の構成）
この目的を達成するためになされた本発明は、両面電極
基板の有効表示部が当接することなくエツジ部のみが当
接するように中央部を凹部としたワーク台装置上に両面
電極基板を載置し、前記当接したエツジ部を複数個所に
おいて真空チャックで保持固定し、ワークロールで−っ
の面を、ラビングした後に裏返して他の面もラビングす
ることを特徴とする両面電極基板のラビング方法であっ
て、両面電極基板の両面をラビングする際に裏返しにし
ても先にラビング処理した面が傷付いたり乱れたりする
ことは全くなくなると共に、両面電極基板を水平に保つ
ために所定圧力の気体を使用して撓まないようにし、ラ
ビング処理を正確に行えるようにしたのである。(Structure of the Invention) The present invention, which has been made to achieve this object, has a double-sided electrode substrate mounted on a worktable device with a recess in the center so that the effective display portion of the double-sided electrode substrate does not come into contact and only the edge portions come into contact. A double-sided method characterized in that an electrode substrate is placed, the abutting edge portions are held and fixed at a plurality of locations by vacuum chucks, and the first side is rubbed with a work roll, and then turned over and the other sides also rubbed. A rubbing method for an electrode substrate, which eliminates the possibility of damaging or disturbing the previously rubbed surface even if the double-sided electrode substrate is turned over when rubbing both sides, and also keeps the double-sided electrode substrate horizontal. By using gas at a predetermined pressure to prevent bending, the rubbing process can be performed accurately.
更に本発明は、両面電極基板のエツジ部のみが当接し、
有効表示面を浮かせるように中央部に凹部を設け、前記
エツジ部が当接する枠状の載置部に真空チャック機構を
設け、前記凹部に所定圧力の気体が導入できる気体導入
機構を設けたことを特徴とする両面電極基板のラビング
用ワーク台装置を提供し、それによって両面のラビング
処理全効果的に行えるようにしだのである。Further, in the present invention, only the edge portions of the double-sided electrode substrate are in contact with each other,
A recess is provided in the center so as to float the effective display surface, a vacuum chuck mechanism is provided in the frame-shaped mounting portion that the edge portion comes into contact with, and a gas introduction mechanism is provided that can introduce gas at a predetermined pressure into the recess. The present invention provides a worktable device for rubbing double-sided electrode substrates, which is characterized by the following, thereby making it possible to perform double-sided rubbing processing effectively.
（実施例） 次に本発明を図示の実施例に基き更に詳細に説明する。(Example) Next, the present invention will be explained in more detail based on illustrated embodiments.
図中の符号１１はラビング処理に用いられるワーク台装
置であり、該ワーク台装置は中央部を袂り取つ凹部１２
を形成しである。この凹部１２を形成することによって
、ワーク台装置１１の上面で且つ周縁部に枠状の載置部
１３が形成される。この載置部１３にはワーク台装置の
底面から貫通して設けた複数個の貫通孔からなる真空チ
ャック機構１４が設けられている。この場合の貫通孔は
略等間隔で並列しており、各底面側は夫々適宜の減圧装
置に連通しである。Reference numeral 11 in the figure is a workpiece table device used for the rubbing process, and the workpiece table device has a recessed portion 12 that covers the center part.
It is formed. By forming this recess 12, a frame-shaped mounting portion 13 is formed on the upper surface of the work table device 11 and at the peripheral edge thereof. This mounting portion 13 is provided with a vacuum chuck mechanism 14 consisting of a plurality of through holes extending from the bottom of the work table device. In this case, the through holes are arranged in parallel at approximately equal intervals, and each bottom side communicates with an appropriate pressure reducing device.
前記凹部１２の底面には適宜の大きさの貫通孔が設けら
れ、該貫通孔は凹部１２内に所定の圧力の気体が導入さ
れる気体導入機構１５となり、該気体導入機構は適宜の
圧力調整装置に連通している。尚、図中符号１６は両面
電極基板、１７はラビングローラーである。A through hole of an appropriate size is provided in the bottom surface of the recess 12, and the through hole serves as a gas introduction mechanism 15 for introducing gas at a predetermined pressure into the recess 12, and the gas introduction mechanism can adjust the pressure appropriately. It communicates with the device. In the figure, reference numeral 16 is a double-sided electrode substrate, and 17 is a rubbing roller.
両面電極基板１６の両面をラビング処理する方法は、ま
ずワーク台装置１１上に両面電極基板１６を載置する。In the method of rubbing both sides of the double-sided electrode substrate 16, first, the double-sided electrode substrate 16 is placed on the work table device 11.
この時に両面電極基板１６のエツジ部分が載置部１３上
に当接して載置され、有効表示面の部分（中央部の所定
範囲）は何等当接されず浮いた状態になっている。そし
て、真空チャック機構■４を減圧することで両面電極基
板１６のエツジ部分を吸着固定し、ラビングローラー１
７により片面の配向膜をラビングする。このラビングロ
ーラー１７によるラビング処理で両面電極基板１６が撓
むと正確なラビングができなくなるので、その撓みを防
止するために気体導入機構１５を作動させて、凹部１２
内に所定圧の気体を導入させる。この場合、凹部１２内
の圧力が高すぎて逆に両面電極基板１６が外側に膨み過
ぎるとやはり正確なラビングが行えないので、ラビング
処理によって撓みが生じない程度に凹部１２内へ気体を
導入する。At this time, the edge portion of the double-sided electrode substrate 16 is placed in contact with the placing portion 13, and the effective display surface portion (a predetermined range in the central portion) is not in contact with anything and is in a floating state. Then, by reducing the pressure in the vacuum chuck mechanism 4, the edge portion of the double-sided electrode substrate 16 is fixed by suction, and the rubbing roller 1
7, the alignment film on one side is rubbed. If the double-sided electrode substrate 16 is bent during the rubbing process by the rubbing roller 17, accurate rubbing will not be possible.
Gas at a predetermined pressure is introduced into the chamber. In this case, if the pressure inside the recess 12 is too high and the double-sided electrode substrate 16 swells outward too much, accurate rubbing cannot be performed, so gas is introduced into the recess 12 to the extent that no bending occurs during the rubbing process. do.
両面電極基板１６の一方の面のラビング処理が終った後
に、気体導入機構１５と真空チャック機構１４との作動
を中止して、いづれも大気圧に戻すと両面電極基板１６
はワーク台装置１１から自由に取り上げることができる
状態になり、裏返しにして再びワーク台装置１１の載置
部１３上に載置する。そして他の面をラビング処理する
ために前記と同様に真空チャック機構１４と気体導入機
構１５とを作動させて両面電極基板１６を水平に且つ安
定した状態に保持するのである。After the rubbing process on one side of the double-sided electrode substrate 16 is completed, the operations of the gas introduction mechanism 15 and the vacuum chuck mechanism 14 are stopped and both are returned to atmospheric pressure, and the double-sided electrode substrate 16
is in a state where it can be freely picked up from the work table device 11, turned over, and placed on the mounting portion 13 of the work table device 11 again. Then, in order to perform the rubbing treatment on the other side, the vacuum chuck mechanism 14 and the gas introduction mechanism 15 are operated in the same manner as described above to hold the double-sided electrode substrate 16 horizontally and in a stable state.
いづれにしても、両面電極基板１６の両面を別々にラビ
ング処理を施すに当って、有効表示面がワ一り台装置に
触れることがなくなるので、有効表示面における傷の発
生や乱れは生じなく々るのである。In any case, when applying the rubbing treatment to both sides of the double-sided electrode substrate 16 separately, the effective display surface does not come into contact with the stand device, so no scratches or disturbances occur on the effective display surface. It is.
（発明の効果）
以上説明したように本発明に係る両面電極基板のラビン
グ方法及び同方法に使用されるワーク台装置は、ラビン
グ処理を施こそうとする両面電極基板のエツジ部のみが
真空チャック機構によって吸着固定されるため、中央部
の有効表示面が宙に浮いた状態になっているため、一つ
の面をラビング処理した後に他方の面をラビング処理し
ても、有効表示面の配向膜を傷付けたり或は乱すことが
皆無と々るので製造が容易で且つ歩留が著しく向上する
という優れた効果を奏する。(Effects of the Invention) As explained above, in the method of rubbing a double-sided electrode substrate according to the present invention and the work table device used in the method, only the edge portion of the double-sided electrode substrate to be subjected to the rubbing process has a vacuum chuck mechanism. Because it is fixed by suction, the effective display surface in the center is suspended in the air, so even if you rub one surface and then rub the other surface, the alignment film on the effective display surface will not be removed. Since there is no damage or disturbance at all, manufacturing is easy and the yield is significantly improved, which is an excellent effect.
更に、ラビング処理における両面電極基板が撓まないよ
うに真空チャック機構による吸着と、気体導入機構によ
る気体の導入とで水平に且つ安定した状態で両面電極基
板を保持固定でき、傷付けたり乱したりすることなしに
正確なラビング処理が行えるという優れた効果も奏する
。Furthermore, the vacuum chuck mechanism uses suction to prevent the double-sided electrode substrate from bending during the rubbing process, and the gas introduction mechanism uses the gas introduction mechanism to hold and fix the double-sided electrode substrate in a horizontal and stable state, preventing it from being damaged or disturbed. It also has the excellent effect of being able to perform accurate rubbing without having to do much.
第１図は従来のラビング処理に使用されるワーク台装置
の断面図、第２図は本発明に係るワーク台装置の平面図
、第３図は第２図のＩＩＩ−ＩＩ線に沿う断面図である
。
１１・・・・・ワーク台装置 １２・・・・・・凹部１
３・・・・・・載置部
１４・・・・・・真空チャック機構
１５・・・・・・気体導入機構 １６・・・・・・両面
電極基板１７・・・・・・ラビングローラー
特許出願人 スタンレー電気株式会社FIG. 1 is a sectional view of a work table device used in conventional rubbing processing, FIG. 2 is a plan view of a work table device according to the present invention, and FIG. 3 is a sectional view taken along line III-II in FIG. 2. It is. 11... Work table device 12... Concavity 1
3...Placement part 14...Vacuum chuck mechanism 15...Gas introduction mechanism 16...Double-sided electrode substrate 17...Rubbing roller patent Applicant Stanley Electric Co., Ltd.
Claims (1)
エツジ部のみが当接するように中央部を凹部としたワー
ク台装置上に両面電極基板を載置し、前記当接したエツ
ジ部を複数個所において真空チャックで保持固定し、ワ
ークロールで一つの面をラビングした後に裏返して他の
而もラビングすることを特徴とする両面電極基板のラビ
ング方法。 （２ル 前記ワーク台装置の凹部内に所定の圧力の気体
を導入し、載置した基板が撓まないように保持したこと
を特徴とする前記１項記載のラビング方法。 （３）１両面電極基板のエツジ部のみが当接し、有効表
示面を浮かせるように中央部に凹部を設け、前記エツジ
部が当接する枠状の載置部に真空チャック機構を設け、
前記凹部に所定圧力の気体が導入できる気体導入機構を
設けたことを特徴とする両面電極基板のラビング用ワー
ク台装置。[Scope of Claims] (1) 1. A double-sided electrode substrate is placed on a work table device with a recess in the center so that only the edge portions of the double-sided electrode substrate do not come into contact with each other; A method for rubbing a double-sided electrode substrate, which comprises holding and fixing the abutted edges with vacuum chucks at multiple locations, rubbing one side with a work roll, then turning over and rubbing the other sides as well. (2) The rubbing method according to item 1 above, characterized in that gas at a predetermined pressure is introduced into the recess of the work table device and the mounted substrate is held so as not to bend. (3) One double-sided A recess is provided in the center so that only the edge portion of the electrode substrate comes into contact and the effective display surface is raised, and a vacuum chuck mechanism is provided in the frame-shaped mounting portion that the edge portion comes into contact with.
A worktable device for rubbing a double-sided electrode substrate, characterized in that a gas introduction mechanism capable of introducing gas at a predetermined pressure into the recess is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7133384A JPS60214340A (en) | 1984-04-10 | 1984-04-10 | Rubbing method of both-surface electrode substrate and work table device used for its method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7133384A JPS60214340A (en) | 1984-04-10 | 1984-04-10 | Rubbing method of both-surface electrode substrate and work table device used for its method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60214340A true JPS60214340A (en) | 1985-10-26 |
Family
ID=13457495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7133384A Pending JPS60214340A (en) | 1984-04-10 | 1984-04-10 | Rubbing method of both-surface electrode substrate and work table device used for its method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60214340A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1324350C (en) * | 2002-04-18 | 2007-07-04 | 显像制造服务株式会社 | Substrate floating device and method for mfg. liquid crystal display device |
| CN100383621C (en) * | 2004-06-14 | 2008-04-23 | 京东方显示器科技公司 | Rubbing apparatus for LCD |
| WO2016150123A1 (en) * | 2015-03-24 | 2016-09-29 | 京东方科技集团股份有限公司 | Substrate and array substrate |
| CN107329328A (en) * | 2017-08-22 | 2017-11-07 | 京东方科技集团股份有限公司 | Color membrane substrates and display panel |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58215629A (en) * | 1982-06-09 | 1983-12-15 | Canon Inc | Method and device for manufacturing electrooptic element |
-
1984
- 1984-04-10 JP JP7133384A patent/JPS60214340A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58215629A (en) * | 1982-06-09 | 1983-12-15 | Canon Inc | Method and device for manufacturing electrooptic element |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1324350C (en) * | 2002-04-18 | 2007-07-04 | 显像制造服务株式会社 | Substrate floating device and method for mfg. liquid crystal display device |
| CN100383621C (en) * | 2004-06-14 | 2008-04-23 | 京东方显示器科技公司 | Rubbing apparatus for LCD |
| WO2016150123A1 (en) * | 2015-03-24 | 2016-09-29 | 京东方科技集团股份有限公司 | Substrate and array substrate |
| US9823515B2 (en) | 2015-03-24 | 2017-11-21 | Boe Technology Group Co., Ltd. | Substrate and an array substrate |
| CN107329328A (en) * | 2017-08-22 | 2017-11-07 | 京东方科技集团股份有限公司 | Color membrane substrates and display panel |
| CN107329328B (en) * | 2017-08-22 | 2020-12-08 | 京东方科技集团股份有限公司 | Color film substrate and display panel |
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