JPS60212201A - Chlorine injection control apparatus of water purification plant - Google Patents

Chlorine injection control apparatus of water purification plant

Info

Publication number
JPS60212201A
JPS60212201A JP6909984A JP6909984A JPS60212201A JP S60212201 A JPS60212201 A JP S60212201A JP 6909984 A JP6909984 A JP 6909984A JP 6909984 A JP6909984 A JP 6909984A JP S60212201 A JPS60212201 A JP S60212201A
Authority
JP
Japan
Prior art keywords
chlorine
chlorine injection
amount
solar radiation
residual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6909984A
Other languages
Japanese (ja)
Other versions
JPH0472595B2 (en
Inventor
Ryosuke Miura
良輔 三浦
Chiyouko Kurihara
潮子 栗原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6909984A priority Critical patent/JPS60212201A/en
Publication of JPS60212201A publication Critical patent/JPS60212201A/en
Publication of JPH0472595B2 publication Critical patent/JPH0472595B2/ja
Granted legal-status Critical Current

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  • Treatment Of Water By Oxidation Or Reduction (AREA)

Abstract

PURPOSE:To stably control the concn. of residual chlorine of a precipitation basin to a required value, by preliminarily correcting the estimation amount of quantity of solar radiation and feeding the corrected value forwardly to operate and set the objective chlorine concn. of floc water flowed into the precipitation basin. CONSTITUTION:A chlorine injection apparatus 2 performs chlorine injection operation according to the chlorine injection ratio MV to the lately control cycle calculated by a residual salt meter 17, an actinometer 19 and first - fifth operators 18, 20, 25, 27, 29. As a result, feedback control by the actual residual chlorine concn. of floc water and feedforward control by the preliminarily calculated quantity of solar radiation are performed and the concn. of residual chlorine of a precipitation basin can be stably controlled by both control operations.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は、浄水場の前塩素注入量を日射による沈殿池の
残留塩素の分解を考慮して制御する浄水場の塩素注入制
御装置に関するものである。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a chlorine injection control device for a water treatment plant that controls the pre-chlorine injection amount in a water treatment plant by taking into consideration the decomposition of residual chlorine in a sedimentation tank due to solar radiation. be.

[発明の技術的背景とその問題点コ 第1図に浄水場の一般的な構成を示す。[Technical background of the invention and its problems] Figure 1 shows the general configuration of a water treatment plant.

第1図において、原水は導水管Aを通って着水井1に流
入し、ここで前塩素注入装置2および前アルカリ注入装
置3からそれぞれ塩素と苛laFソーダが注入される。
In FIG. 1, raw water flows into a receiving well 1 through a water conduit A, where chlorine and sodium chloride are injected from a pre-chlorine injection device 2 and a pre-alkali injection device 3, respectively.

次に急速混和池4では#:集集注注入装置5らPAC(
ポリ塩化アルミニウム)が注入され、フラッシュミキサ
6で急激に混合される。
Next, in the rapid mixing pond 4, #: PAC (
polyaluminum chloride) is injected and rapidly mixed in a flash mixer 6.

次(ニフロック形成池7でフロックが形成され。Next (flocs are formed in the nifloc formation pond 7).

沈殿池8で沈殿し除去される。It is precipitated and removed in the settling tank 8.

沈殿池8で沈殿せずに沈殿池流出水と共に溢流した微小
7μツクは、導水管Bで中塩素注入装置′ 9および中
アルカリ注入装置10から塩素および苛性ソーダが注入
されたあと、濾過池1】で除去される0 1過池11を通ったIP迦水は、さらに導水管Cで後塩
素注入装置12および後アルカリ注入装置13から塩素
および苛性ソーダを注入され、浄水池14に一貯水され
る。
The microscopic 7 micron particles that did not settle in the sedimentation tank 8 and overflowed with the sedimentation tank outflow water are transferred to the filtration tank 1 after chlorine and caustic soda are injected from the medium chlorine injection device 9 and the medium alkali injection device 10 in the water conduit B. ] The IP water that has passed through the filter pond 11 is further injected with chlorine and caustic soda from the post-chlorine injection device 12 and the post-alkali injection device 13 in the water conduit C, and is stored in the water purification pond 14. .

これによって原水中の濁度物質その他の不純物が除去さ
れ且つ十分に消毒された適正なpH値の浄水がftJ水
池14からWi安家に供給される。
As a result, turbid substances and other impurities in the raw water are removed, and purified water that is sufficiently disinfected and has an appropriate pH value is supplied from the ftJ water pond 14 to Wi Yasuya.

この場合前塩素注人知は原水の塩素要求量の他に日射量
よる残留塩素の分触や風による飛散を考1i、W、 し
て制御する必要がある。
In this case, it is necessary to control the pre-chlorine injection by considering not only the chlorine demand of the raw water but also the distribution of residual chlorine due to the amount of solar radiation and its scattering by the wind.

塩素景求翔の変動に対しては、前塩素注入後の早い時期
に、(例えば着水井で塩素注入しているときは九〇、速
混和池またはフロック形成池で)残留塩素濃度を測定し
てフィードバックすれば安定な制御が可能である。
To deal with fluctuations in chlorine concentration, measure the residual chlorine concentration early after pre-chlorine injection (for example, when injecting chlorine at the receiving well, at 90°C, at the rapid mixing pond or at the floc formation pond). Stable control is possible by providing feedback.

しかしながら残留塩素の分解は王として滞留時間のしい
沈殿池で緩慢に行われるので、フィードバック制御を用
いることが困難であり、このため日射パターンを予測し
た運転員の判断による手動制御が用いられているが、運
転員の負担が増大するばかりでなく、塩素注入に過不足
を生ずるという問題がある。
However, since the decomposition of residual chlorine takes place slowly in sedimentation tanks with short residence times, it is difficult to use feedback control, so manual control is used based on the judgment of operators who have predicted solar radiation patterns. However, this method not only increases the burden on the operator, but also causes problems in that chlorine injection may be insufficient or excessive.

このため予測した日射量に比例して塩素注入量を増減す
るフィードフォワード制御が提案されているが、沈殿池
での時間遅れ仁よって、日射量が増大する午前中は注入
不足1日射量が減少する午後には注入過多となり、塩素
の注入が適正に制御できないという問題がある。
For this reason, feedforward control has been proposed to increase or decrease the amount of chlorine injection in proportion to the predicted amount of solar radiation, but due to the time lag in the settling basin, the amount of solar radiation due to insufficient injection decreases in the morning when the amount of solar radiation increases. There is a problem that excessive chlorine injection occurs in the afternoon, making it impossible to properly control chlorine injection.

[発明の目的] 本発明は、日射量の予測値を前倒的に修正し、これをフ
ィードフォワードして沈殿池に流入するフロック水目標
塩素濃度を演算設定し、これによって沈殿池の残留塩素
濃度を所要値に安定(二制御する浄水場の塩素注入制御
装置を提供することを目的としている。
[Object of the invention] The present invention corrects the predicted value of solar radiation in advance, feeds it forward, calculates and sets the target chlorine concentration of floc water flowing into the sedimentation tank, and thereby reduces residual chlorine in the sedimentation tank. The purpose is to provide a chlorine injection control device for water treatment plants that stably controls the concentration to a required value.

[発明の概要] 本発明は、@塩素注入率を祠祭して沈殿池の残留塩素濃
度を所定値に制御する浄水場の塩素注入制御装置におい
て、沈殿池に流入するフロック水の塩素両度を検出する
残塩計と、沈殿池の日射部を言1則する日射t(計と、
フロック水の塩素濃度を可変の目標値と比較して塩素注
入率の補償量を算出する第1演算器と、日射量を日出時
刻からの経過時間に応じて前倒しに修正する第2演算器
と、前倒しに修正した日IA用から塩素注入率の補正量
をで置市する第3徂ν、器と、塩素注入率補正量から沈
11軒池の残留塩素濃度の所要値に対応するフロック水
塩素濃吸の可変目標値を算出する第4演算器と、塩素注
入率の補償量およびフロック水の可変目標値を入力して
塩素注入率を輿出する5I45演算日射−゛による塩素
の分解を適正に抽圧して沈殿池の残留塩素濃度を安定に
制御できるようにしたものである。
[Summary of the Invention] The present invention provides a chlorine injection control device for a water treatment plant that controls the residual chlorine concentration in a settling tank to a predetermined value by enshrining the chlorine injection rate. The residual salt meter that detects
A first computing unit that calculates a compensation amount for the chlorine injection rate by comparing the chlorine concentration of floc water with a variable target value, and a second computing unit that adjusts the amount of solar radiation in advance according to the elapsed time from sunrise time. And, from the 3rd division ν, the chlorine injection rate correction amount is set for the day IA, which was revised in advance. A fourth computing unit that calculates a variable target value for concentrated water chlorine absorption, and a 5I45 calculation that calculates the chlorine injection rate by inputting the compensation amount for the chlorine injection rate and the variable target value for floc water. Decomposition of chlorine by solar radiation. The residual chlorine concentration in the sedimentation tank can be stably controlled by extracting the chlorine appropriately.

[発明の実施例] 本発明の一実一施例を第2図に示す。[Embodiments of the invention] An embodiment of the present invention is shown in FIG.

第2図における浄水系統は第1図と同じであり、沈殿池
8へ流入する70ツ′り水の残留塩素濃度Rcは沈殿池
8の流入県15から採水ポンプ16で採水されたフロッ
ク水を残塩計17で測定することにょって得られる。
The water purification system in FIG. 2 is the same as in FIG. It is obtained by measuring water with a residual salt meter 17.

上記Rcは第1演算器18に入力され、第4演算器27
よりあたえられる可変目標値P■を用いて下記(1)。
The above Rc is input to the first arithmetic unit 18, and the fourth arithmetic unit 27
(1) below using the variable target value P■ given by

(2)式の演算が行われ、その出力△Sが第5演算器2
9に入力されて塩素注入率MYの制御が行われる。
The calculation of equation (2) is performed, and the output △S is the fifth calculation unit 2.
9 to control the chlorine injection rate MY.

△S= Kp・(F’n ’ Bn−i) ”−・kn
 −−−−−(1)TI En= PV−RC−−−−−−一−−−−−−−(2
)ここにKPは比例ゲイン、hは制御周期、TIは積分
時間、EnおよびB、Hn−1は今回および011回の
制御周期における入力偏差である。
△S= Kp・(F'n' Bn-i) ”-・kn
--------(1) TI En= PV-RC-----(2
) Here, KP is the proportional gain, h is the control period, TI is the integration time, and En, B, and Hn-1 are the input deviations in the current and 011 control periods.

沈殿池8にはさらに日射量計19が備えられており、こ
こで検出された日射量RADは第2演算器20に入力さ
れる。
The sedimentation basin 8 is further equipped with a solar radiation meter 19, and the solar radiation amount RAD detected here is input to the second calculator 20.

第2演算器20には別途時計装イガから日出時刻T81
1 日没時刻T88および比測定PKyがそれぞれ接点
21 、22.23を介して入力され下記演算によつて
実際の日射知RAD力Z MfJ倒日射僅RAD’に修
正される。
The second arithmetic unit 20 is provided with a sunrise time T81 from a clock device.
1. Sunset time T88 and ratio measurement PKy are input through contacts 21 and 22.23, respectively, and are corrected to actual solar radiation sensing RAD power ZMfJ by the following calculation.

RAD””KRAD’RAD 、、−−−−−−−−−
−−−−一−−(81ここにtは日出時刻T8Rからの
経過時間であり、第3図はKY = 2の場合のKRA
DおよびRAD’とRADの関係の時11JJ tに対
する変化を示している。
RAD""KRAD'RAD,,---------
-----1---(81 Here, t is the elapsed time from sunrise time T8R, and Figure 3 shows KRA when KY = 2.
It shows changes in the relationship between D and RAD' and RAD with respect to 11JJ t.

上記RAD’は第3演算器25に入力され、別途接点2
4を介して入力された変換係数KCLを用いて下記<5
)式の演算が行われ、塩素注入率MVに対する修正量△
CLがi−1舅される。
The above RAD' is input to the third arithmetic unit 25, and is separately connected to the contact 2.
Using the conversion coefficient KCL input via 4, the following <5
) is calculated, and the correction amount △ for the chlorine injection rate MV is calculated.
CL is i-1 father-in-law.

△CL=KCL・(RAD’RAD″)−−−−−−−
−−−、(δ)ここにRAD″は前回制御周期のRAD
’である。
△CL=KCL・(RAD'RAD'')
---, (δ) where RAD'' is the RAD of the previous control cycle
'is.

上記修正量ΔCLは、第4演算器27に入力され一接点
26を介して入力された定数XSVと前回の制御周期の
Rc目標値S■′と共に下記(6)式の演算が行われ、
今回の制御周期のl(C目標値Svが算出され、これが
前述の第1演算器18に入力される。
The correction amount ΔCL is calculated by the following equation (6) together with the constant XSV inputted to the fourth calculator 27 and inputted through the one contact 26 and the Rc target value S■' of the previous control cycle.
The l(C target value Sv of the current control cycle is calculated, and this is input to the first arithmetic unit 18 described above.

SV = 8V’ + Key ・△C1,−−−”−
−−−−−−(6)上記△CLは第5演算器29にも入
力され第1演洒器18より人力された△S1接点28を
介して入力された定数KMVおよび記憶され次前回の塩
素注入率MY’を用いて下記(7)式の演算が行われ、
これによって今回の制御周期に対する塩素注入率MYが
p、出されるO MV = MY’+△8 + KMV ・ΔCL −−
−−−−−一−(7)前塩素注入装置2は上記MVに従
って塩素注入動作を行うので、実際のフロック水残留塩
素該度によるフィードバック制御および前倒しした日射
量によるフィードフォワード制御が行わtLl こ71
によって沈殿池残留塩素濃度を安定に制御することが可
能となる。
SV = 8V' + Key ・△C1, ---"-
--------(6) The above △CL is also input to the fifth calculator 29, and the constant KMV inputted manually from the first calculator 18 via the △S1 contact 28 is stored, and the next and previous The following equation (7) is calculated using the chlorine injection rate MY',
As a result, the chlorine injection rate MY for the current control cycle is p, OMV = MY'+△8 + KMV ・ΔCL −-
-------1-(7) Since the pre-chlorine injection device 2 performs the chlorine injection operation according to the above MV, feedback control based on the actual degree of residual chlorine in the floc water and feedforward control based on the amount of solar radiation brought forward are performed. 71
This makes it possible to stably control the residual chlorine concentration in the settling tank.

第4図は、従来方法によってフロック水の塩素濃度を一
定に制御した場合、第5図は日射量をそのままフィード
フォワードした場合、第6図は本発明により日射量を前
倒ししてフィードフォワードした場合のそれぞれの沈殿
池の残留塩素濃度の1日間(24時間)の変化を示すシ
ミュレーション結果である。
Figure 4 shows the case where the chlorine concentration of floc water is controlled to be constant using the conventional method, Figure 5 shows the case where the amount of solar radiation is fed forward as it is, and Figure 6 shows the case where the amount of solar radiation is fed forward and fed forward using the present invention. These are simulation results showing changes in residual chlorine concentration in each settling tank over a period of one day (24 hours).

第4図では沈殿池の残留塩素lII度が日射によって午
後に最低となり、f過電の保護に必要な0.5ppm以
下に低下することが予想される。
In Figure 4, the residual chlorine level in the settling tank reaches its lowest level in the afternoon due to solar radiation, and is expected to drop to below 0.5 ppm, which is necessary for protection against f overcharge.

第5しくでは午前中には沈殿池の残留塩素濃度が所要値
よりも低く、午後になって所要値よりも大きく上昇する
ことが予想される。
In the fifth step, it is expected that the residual chlorine concentration in the settling tank will be lower than the required value in the morning, and will rise significantly more than the required value in the afternoon.

第6図は本発明によって日射量を前倒しに修正してフィ
ードフォワードした場合であり、フロック水の塩素濃度
が前倒し的に立上り、これによって沈殿池の残留塩素濃
度がはソ所要値仁制御されることを示している。
Figure 6 shows a case where the amount of solar radiation is corrected in advance and feedforward is carried out according to the present invention, and the chlorine concentration in the floc water rises in advance, thereby controlling the residual chlorine concentration in the settling tank to the required value. It is shown that.

[発明の効果] 以上説明したように本発明によれば1日射量を時間の経
過に対して前倒しに修正してこれを補正財としてフィー
ドフォワードすると共に、実際のフロック水の塩素良度
をフィードバックして前塩素注入貴を制御し、これによ
って沈殿池の残存塩素濃度を所要値に安定に制御する合
理的な浄水場の塩素注入制御装置が得られる。
[Effects of the Invention] As explained above, according to the present invention, the daily solar radiation is corrected ahead of time with respect to the passage of time, and this is fed forward as a correction factor, and the chlorine quality of the actual floc water is fed back. This provides a rational chlorine injection control device for a water treatment plant that controls the amount of pre-chlorine injection, thereby stably controlling the residual chlorine concentration in the settling tank to a required value.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は浄水場の一般的な構成を示す図、第2図は本発
明の一実施例を示す系統図、第3図は本発明における日
射量の修正方法を示す特性図、第4図および第5図はそ
れぞれ従来方法におけるシミュレーション結果を示す図
、第6図は本発明におけるシミニレ−ジョン給茶を示す
図である。 l・・・着水井 2・・・前塩素注入装置4・・・急速
混和池 7・・・フロック形成池8・・・沈殿池 15
・・・沈殿電流入渠16・・・採水ポンプ 17・・・
残塩計19・・・日射1計 18.20.25.27.
29・・・演算器代理人 弁理士 猪 股 祥 晃(は
が1名)第 3 図 D 4− 8 tZ /ム 2001.HR第 5 図 第 6 図 04δtZ t(:、πDI、HF:
Fig. 1 is a diagram showing the general configuration of a water purification plant, Fig. 2 is a system diagram showing an embodiment of the present invention, Fig. 3 is a characteristic diagram showing the method of correcting the amount of solar radiation in the present invention, and Fig. 4 5 and 5 are diagrams showing the simulation results in the conventional method, respectively, and FIG. 6 is a diagram showing the SiminiLesion tea supply in the present invention. l...Water landing well 2...Pre-chlorine injection device 4...Rapid mixing tank 7...Floc formation tank 8...Sedimentation tank 15
...Sedimentation current inlet 16...Water sampling pump 17...
Residual salt meter 19... Solar radiation 1 meter 18.20.25.27.
29...Arithmetic unit agent Patent attorney Yoshiaki Inomata (1 person) Figure 3 D 4-8 tZ /mu 2001. HR Figure 5 Figure 6 Figure 04 δtZ t(:, πDI, HF:

Claims (1)

【特許請求の範囲】[Claims] 前塩素注入量を調整して沈殿池の残留塩素濃度を所要値
に制御する浄水場の塩素注入制御装置において、沈殿′
池に流入するフ筒ツク水の塩素濃度を検出する残塩計と
、沈殿池の日射量を計測する日射−mItと、上記フロ
ック水の塩素製置を可変の目標値と比較して塩素注入率
の補償量を舞、出する第1演説、器と、上記日射量を日
出時刻からの経過時rtiに応じて前倒しに修正する第
2演算益と、上記)7iJ倒しに修正した日射量から塩
素注入率の補正量を算出する第3演算器と、上記塩素注
入率補正量から沈殿池の残留塩素濃度の所要値に対応す
るフロック水の塩素製置に対する上記可変目標値を専出
する第4演算器と、上記塩素注入率の補償量およびフロ
ック水の可変目標値を入力して塩素注入率を算゛和する
第5演算器を備え、上記第5演算器の出力に応じて前塩
素注入量を調整することな特徴とする浄水場の塩素注入
制御装置。
In the chlorine injection control device at a water treatment plant, which adjusts the pre-chlorine injection amount to control the residual chlorine concentration in the settling tank to the required value,
A residual salt meter detects the chlorine concentration of the floc water flowing into the pond, a solar radiation mIt measures the amount of solar radiation in the sedimentation tank, and chlorine injection is performed by comparing the chlorine setting of the floc water with a variable target value. The first speech and device that calculates the amount of compensation for the rate, the second operation profit that adjusts the above solar radiation amount earlier according to the elapsed time rti from the sunrise time, and the above) solar radiation amount that was revised earlier than 7iJ. a third computing unit that calculates a correction amount for the chlorine injection rate from the chlorine injection rate correction amount; and a third computing unit that calculates the variable target value for chlorination of the floc water corresponding to the required value of the residual chlorine concentration in the settling tank from the chlorine injection rate correction amount. It is equipped with a fourth calculator and a fifth calculator which inputs the compensation amount of the chlorine injection rate and the variable target value of the floc water and sums the chlorine injection rate. A chlorine injection control device for a water treatment plant that is characterized by adjusting the amount of chlorine injection.
JP6909984A 1984-04-09 1984-04-09 Chlorine injection control apparatus of water purification plant Granted JPS60212201A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6909984A JPS60212201A (en) 1984-04-09 1984-04-09 Chlorine injection control apparatus of water purification plant

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6909984A JPS60212201A (en) 1984-04-09 1984-04-09 Chlorine injection control apparatus of water purification plant

Publications (2)

Publication Number Publication Date
JPS60212201A true JPS60212201A (en) 1985-10-24
JPH0472595B2 JPH0472595B2 (en) 1992-11-18

Family

ID=13392835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6909984A Granted JPS60212201A (en) 1984-04-09 1984-04-09 Chlorine injection control apparatus of water purification plant

Country Status (1)

Country Link
JP (1) JPS60212201A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63196915A (en) * 1987-02-12 1988-08-15 Toshiba Corp Control equipment for injection of chlorine in purification plant
JPH03165892A (en) * 1989-11-22 1991-07-17 Meidensha Corp Controller for preinjection of chlorine in water purifying plant
JPH03224694A (en) * 1990-01-30 1991-10-03 Toshiba Corp Chlorine dosing control device in water purification plant
CN108475922A (en) * 2015-12-15 2018-08-31 Abb瑞士股份有限公司 The method that prediction solar inverter can generate electric power daily

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730590A (en) * 1980-07-30 1982-02-18 Hitachi Ltd System for preliminary control of injection of chlorine
JPS57207588A (en) * 1981-06-15 1982-12-20 Hitachi Ltd Controlling method for chlorination in water purification plant

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730590A (en) * 1980-07-30 1982-02-18 Hitachi Ltd System for preliminary control of injection of chlorine
JPS57207588A (en) * 1981-06-15 1982-12-20 Hitachi Ltd Controlling method for chlorination in water purification plant

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63196915A (en) * 1987-02-12 1988-08-15 Toshiba Corp Control equipment for injection of chlorine in purification plant
JPH03165892A (en) * 1989-11-22 1991-07-17 Meidensha Corp Controller for preinjection of chlorine in water purifying plant
JPH03224694A (en) * 1990-01-30 1991-10-03 Toshiba Corp Chlorine dosing control device in water purification plant
CN108475922A (en) * 2015-12-15 2018-08-31 Abb瑞士股份有限公司 The method that prediction solar inverter can generate electric power daily

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