JPS60208293A - Preparation of support for planographic printing plate - Google Patents

Preparation of support for planographic printing plate

Info

Publication number
JPS60208293A
JPS60208293A JP6563184A JP6563184A JPS60208293A JP S60208293 A JPS60208293 A JP S60208293A JP 6563184 A JP6563184 A JP 6563184A JP 6563184 A JP6563184 A JP 6563184A JP S60208293 A JPS60208293 A JP S60208293A
Authority
JP
Japan
Prior art keywords
aluminum
support
aluminum plate
etching solution
phosphoric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6563184A
Other languages
Japanese (ja)
Inventor
Haruo Nakanishi
治雄 中西
Hisao Oba
大場 久男
Hirokazu Sakaki
榊 博和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP6563184A priority Critical patent/JPS60208293A/en
Priority to GB08508199A priority patent/GB2160222B/en
Priority to US06/719,086 priority patent/US4686021A/en
Publication of JPS60208293A publication Critical patent/JPS60208293A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/03Chemical or electrical pretreatment
    • B41N3/034Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To meka it possible to form a homogenous grain reduced in an etching amount by chemically treating the surface of an aluminum plate within a short time, by using an aqueous solution containing ferric chloride and phosphoric acid as an etching solution. CONSTITUTION:An aluminum plate, of which the surface was cleaned, is chemically grained by using an aqueous solution containing ferric chloride and phosphoric acid as an etching solution. The concn. of ferric chloride contained in the etching solution is selected from a range of 20-60wt% and that of phosphoric acid from a range of 40-70wt%. The treatment condition of chemical graining is within a range wherein average center line roughness (Ra) is 0.3-1.0mum and it is advantageous to select said condition from such a range that the temp. of the etching solution is 20-100 deg.C and the treating time thereof is 5- 120sec. As a treating means, a method for immersing the aluminum plare in the bath of the etching solution or one for spraying the etching solution to the surface of the aluminum plate is used. Because smut is generated on the surface of the aluminum plate, desmutting treatment is performed for 1-300sec at 20- 100 deg.C by using a 0.5-40wt% aqueous alkali solution.

Description

【発明の詳細な説明】 〔発明の分野〕 本発明は平版印刷版用支持体の製造方法に関するもので
あり、特にアルミニウム板の表面?化学的に砂目立てす
る工程を含む当該製造方法に関す〔従来技術〕 アルミニウム板を平版印刷版用支持体として使用するた
めには、その上に設けられる感光層との密着性ケ良好に
し、且つ保水性ケ改善するため、その表面?粗面化する
ことが通常行われる。この粗面化処理は、いわゆる砂目
立て(グレイニング)と称され、ボ゛−ルグレイニング
、ワイヤーグレイニング、ブラシグレイニング等の機械
的砂目室て、腐蝕液でアルミニウムの表面を梨地状にす
る化学的砂目立て、及び電解エツチングによる電気化学
的砂目室てが知られている。
DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a method for manufacturing a support for a lithographic printing plate, and in particular to a method for manufacturing a support for a lithographic printing plate, and in particular for the surface of an aluminum plate. [Prior art] Regarding the manufacturing method including the step of chemically graining [Prior art] In order to use an aluminum plate as a support for a lithographic printing plate, it must be made to have good adhesion to the photosensitive layer provided thereon, and Its surface to improve water retention? Roughening is usually performed. This surface roughening treatment is called graining, and is performed by using a mechanical graining chamber such as ball graining, wire graining, or brush graining to give the surface of the aluminum a satin-like appearance using a corrosive solution. Chemical graining by electrolytic etching and electrochemical graining by electrolytic etching are known.

本発明は、上記のような各種の砂目立て方法の中の化学
的砂目立て方法によりアルミニウム板の表面を粗面化す
る工程に特徴を有する平版印刷版用支持体の製造方法に
関するものであるが、かかる化学的砂目立てに使用され
る腐蝕液としては、例えば米国特許第’/ 、77A 
、63j号に記載されているような塩化第二鉄と硝酸と
紮含む水溶液、英国特許第り<tr 、tot号に記載
されているよう方塩什旭二鉄と塩酸とアルミニウムイオ
ンとケ含む水溶液が知られている。
The present invention relates to a method for producing a support for a lithographic printing plate, which is characterized by the step of roughening the surface of an aluminum plate by a chemical graining method among the various graining methods described above. Erosive liquids used in such chemical graining are described, for example, in US Pat.
, an aqueous solution containing ferric chloride, nitric acid and ligation, as described in British Patent No. Aqueous solutions are known.

しかし乍ら、これら公知の腐蝕液を使ってアルミニウム
板の表面を化学的に砂目立てすると、均一な砂目立て表
面ケ得るのに長時間の腐蝕処理を行なわなければならな
η1つたり、本来エツチング寧れる必要のない部分(例
えば砂目の頂部など)が少なからずエツチングされてし
壕って効率が悪く多量のアルミニウムをエツチングして
しまうという欠点があった。このような欠点は、工業的
な実施の上では生産スピードの低下や腐蝕液の組成葡一
定の許容範囲内に維持する上で大きな負担につながって
し寸う罠め、工業化する上での大きな障害となっていた
However, when chemically graining the surface of an aluminum plate using these known corrosive solutions, a long etching process is required to obtain a uniformly grained surface. This technique has the disadvantage that a considerable amount of the parts that do not need to be etched (for example, the tops of the grains) are etched, resulting in inefficiency and a large amount of aluminum being etched. These drawbacks lead to a reduction in production speed and a large burden on maintaining the composition of the corrosive liquid within a certain tolerance range in industrial implementation, and are a major problem in industrialization. It was a hindrance.

〔発明の目的〕[Purpose of the invention]

従って、本発明の目的はアルミニウム板の表面を化学的
に砂目立てする工程を含む、平版印刷版用支持体の改良
された製造方法を提供することである。即ち、本発明の
目的は短時間の処理でアルミニウム板の表面に均一な砂
目に形成させることができる化学的砂目立て工程を含む
、平版印刷版用支持体の製造方法を提供することである
。本発明の別の目的は、アルミニウム板の表面に少ない
エツチング量で均質な砂目倉形成させることができる化
学的砂目立て工程を含む、平版印刷版用支持体の製造方
法を提供することである。
Accordingly, it is an object of the present invention to provide an improved method for manufacturing a support for a lithographic printing plate, which includes the step of chemically graining the surface of an aluminum plate. That is, an object of the present invention is to provide a method for producing a support for a lithographic printing plate, which includes a chemical graining step that can form uniform grains on the surface of an aluminum plate in a short time. . Another object of the present invention is to provide a method for producing a support for a lithographic printing plate, which includes a chemical graining step capable of forming uniform grains on the surface of an aluminum plate with a small amount of etching. .

〔発明の構成〕[Structure of the invention]

本発明者等は極々研究を重ねた結果、化学的砂目立てに
使用される腐蝕液として塩化第二鉄および燐酸を含む水
溶液を使用することにより、上記目的が達成されること
を見い出した。即ち、本発明はアルミニウム板の表面ケ
腐蝕液で化学的に砂目立てする工程を含む平版印刷版用
支持体の製造方法において、該腐蝕液が塩化第二鉄およ
び燐酸を含む水溶液であることを特徴とする該製造方法
である。
As a result of extensive research, the present inventors have discovered that the above object can be achieved by using an aqueous solution containing ferric chloride and phosphoric acid as an etchant used in chemical graining. That is, the present invention provides a method for producing a support for a lithographic printing plate, which includes a step of chemically graining the surface of an aluminum plate with an etching solution, in which the etching solution is an aqueous solution containing ferric chloride and phosphoric acid. The manufacturing method is characterized by:

以下、本発明について順2追って詳しく説明する。Hereinafter, the present invention will be explained in detail in step 2.

本発明において使用されるアルミニウム板には純アルミ
ニウム及びアルミニウム合金板が含まれる。アルミニウ
ム合金としてVith々のものが使用でき、例えばけい
累、銅、マンガン、マグネシウム、クロム、e鉛、鉛、
ビスマス、ニッケルなどの金属とアルミニウムの合金が
用いられる。これらの組成物は、いくらかの鉄およびチ
タンに加えてその他無視し得る程度の綾の不純物をも含
むものである。
The aluminum plate used in the present invention includes pure aluminum and aluminum alloy plate. Various aluminum alloys can be used, such as aluminum alloy, copper, manganese, magnesium, chromium, e-lead, lead,
An alloy of aluminum and metals such as bismuth or nickel is used. These compositions contain some iron and titanium as well as other negligible twill impurities.

化学的砂目立てに先立って、アルミニウム表面の圧延油
を除去すること及び清浄なアルミニウム面を表出させる
ためにアルミニウムの表面を紡処理r行なってもよい。
Prior to chemical graining, the aluminum surface may be subjected to a spinning treatment in order to remove rolling oil from the aluminum surface and expose a clean aluminum surface.

前者のためVCは、トリクレン等の溶剤、界面活性剤等
が用いられている。又後者のためには水酸化ナトリウム
、水酸化カリウム等のアルカリ・エツチング剤を用いる
方法が広く用いられている。後者のアルカリエツチング
剤による前処理を行なつ′fc場合には、アルミニウム
板の表面にスマットが生成するので、硝酸などを使って
デスマット処理されるのが通例である。
For the former, VC uses a solvent such as trichlene, a surfactant, and the like. For the latter, a method using an alkaline etching agent such as sodium hydroxide or potassium hydroxide is widely used. In the latter case where a pretreatment with an alkaline etching agent is performed, smut is generated on the surface of the aluminum plate, so it is customary to perform a desmut treatment using nitric acid or the like.

このようにして必要により表面が清浄化されたアルミニ
ウム板は、塩化第二鉄と燐酸を含む水溶上記腐蝕液中に
含まれる塩化第二鉄の濃度は、一般的にVi3〜10重
i[が適しており、より好ましくは一〇−≦O重量%の
範囲から選ばれる。
The aluminum plate whose surface has been cleaned as necessary in this way has a concentration of ferric chloride contained in the aqueous corrosive solution containing ferric chloride and phosphoric acid. suitable, more preferably selected from the range 10-≦0% by weight.

一方、燐酸は腐蝕液中に10−ざO重景係の範囲で含有
させるのが適当である。燐酸の濃度が、上記の10重重
量上り低くなるにつれて、均一な砂目を得るに必要とさ
れる処理時間が長くなる上に、アルミニウムのエツチン
グ鎗が増加してアルミニウム板の厚さの減少を生じるよ
うになり、他方上記10重i%より多くなるにつれて所
望の砂目が形成されずに光沢面となってし塘うようにな
る。
On the other hand, it is appropriate that phosphoric acid be contained in the corrosive solution in an amount of 10-10%. As the concentration of phosphoric acid decreases above 10% by weight, the processing time required to obtain a uniform grain increases and the aluminum etching tool increases, reducing the thickness of the aluminum plate. On the other hand, as the amount exceeds 10% by weight, the desired grains are not formed and the surface becomes glossy.

従って、より好ましい燐酸の濃度はμ0〜70重t%の
範囲から選ばれる。
Therefore, a more preferable concentration of phosphoric acid is selected from the range of μ0 to 70% by weight.

上記腐蝕液には、必要に応じて公知の撞々のゐ加削を廿
有させてもよい。例えば塩化アンモニウム、塩化カルシ
ウム、塩化ニッケル、塩化ナトリウム、塩化アルミニウ
ム、塩化銅などのような塩化物、塩酸、硝酸、硫酸、ク
ロム酸、酢酸などのような種々の酸など?挙げることが
できる。このの濃度以下の範囲で含有させるのが適当で
ある。
The above-mentioned corrosive liquid may be subjected to a known process of machining, if necessary. For example, chlorides like ammonium chloride, calcium chloride, nickel chloride, sodium chloride, aluminum chloride, copper chloride etc., various acids like hydrochloric acid, nitric acid, sulfuric acid, chromic acid, acetic acid etc? can be mentioned. It is appropriate that the content be within the range of this concentration.

上述のような腐蝕液による化学的砂目立ての処理条件は
中心線平均粗さくRa)が0.3〜l。
The processing conditions for chemical graining using a corrosive solution as described above are such that the centerline average roughness (Ra) is 0.3 to 1.

Oμn1の範囲となるように選ぶことが好ましく、この
ような条件は一般的には腐蝕液の温度が20〜1000
Cで処理時間がj〜/、20秒間の範囲から選ばれるの
が有利である。ま1こ処理手段としては、腐蝕液が満た
され7ζ浴中にアルミニウム板倉&rAする方法、アル
ミニウム板の表面に腐蝕液をスプレーする方法などのア
ルミニウム板と腐蝕#に接触させれるい刀・なる手段を
も採用することができる。
It is preferable that the temperature of the corrosive solution be selected to be in the range of Oμn1, and such conditions are generally set in the range of
C, the processing time is advantageously selected from the range j~/, 20 seconds. The treatment methods include a method of placing an aluminum plate in a 7ζ bath filled with a corrosive solution, a method of spraying a corrosive solution onto the surface of the aluminum plate, and a method of bringing the aluminum plate into contact with the corrosive material. can also be adopted.

このようにして化学的に砂目立てされ罠アルミニウム板
の表面にはスマットが生じるので、このスマツi−除く
罠めのデスマット処理を施こすのが好ましい。デスマッ
ト処理は、酸またはアルカリの水溶液にアルミニウム表
面を、例えば浸漬処理などの方法で接触させることによ
り行なわれる。
Since smut is produced on the surface of the trap aluminum plate chemically grained in this way, it is preferable to perform a desmutting process to remove the trap aluminum plate. The desmut treatment is carried out by bringing the aluminum surface into contact with an aqueous acid or alkali solution, for example, by dipping.

酸としては、燐酸、硫酸、クロム酸などが含まれ、アル
カリとしては、水酸化ナトリウム、水酸化カリウム、第
三燐酸ナトリウム、第三燐酸カリウム、アルミン酸ナト
リウム、メタ珪酸ナトリウム、炭酸ナトリウムなどが含
まれる。これらの内でも特に後者のアルカリの水溶液を
使用する方が処理速度が早いので好ましい。これらの酸
ま7(はアルカリの0.2−μO重量係水溶IF1.を
用いλO〜10O0Cの液温で7〜300秒処理するの
が一般的である。アルカリ水溶液を用いた場合は、アル
ミニウム板の表面が溶解されて、アルカリに溶解しない
不溶解残渣が表面に生成するので、この場合には更に燐
酸、硝酸、硫酸、クロム酸またはこれらの2以上の酸を
組合せた混酸で処理して、この不溶解残渣がとり除かれ
る。
Acids include phosphoric acid, sulfuric acid, chromic acid, etc., and alkalis include sodium hydroxide, potassium hydroxide, sodium triphosphate, potassium triphosphate, sodium aluminate, sodium metasilicate, sodium carbonate, etc. It will be done. Among these, it is particularly preferable to use the latter aqueous alkali solution because the processing speed is faster. These acids (7) are generally treated for 7-300 seconds at a liquid temperature of λO ~ 1000C using an alkali 0.2-μO weight coefficient aqueous solution IF1. When using an alkaline aqueous solution, aluminum When the surface of the plate is dissolved, an insoluble residue that does not dissolve in alkali is generated on the surface, so in this case, it is further treated with phosphoric acid, nitric acid, sulfuric acid, chromic acid, or a mixed acid that is a combination of two or more of these acids. , this undissolved residue is removed.

以上のような処理が施され罠アルミニウム板は、そのま
まか又は更に親水化処理を施して平版印刷版用支持体と
して使用できるが、高耐刷力の平版印刷版の作成に供さ
れる場合には、引き続いて陽極酸化処理される。
The trap aluminum plate treated as described above can be used as a support for lithographic printing plates either as it is or after being subjected to a hydrophilic treatment, but when used for making lithographic printing plates with high printing durability, is subsequently anodized.

陽極酸化処理は、この分野で従来より行なわれている方
法で行なうことができる。具体的には、硫酸、りん酸、
クロム酸、蓚酸、スルファミン酸、(ンゼンスルホン酸
等あるいはこれらの二種類以上全組み合せ1ζ水溶液又
は非水溶液中でアルミニ乙 ラムに直流″−またけ交流の電流を流す々、アルミニウ
ム支持体表面に陽極酸化皮膜を形成させることができる
The anodic oxidation treatment can be performed by a method conventionally used in this field. Specifically, sulfuric acid, phosphoric acid,
Chromic acid, oxalic acid, sulfamic acid, (benzenesulfonic acid, etc.) or all combinations of two or more of these are passed through the aluminum substrate in an aqueous or non-aqueous solution, and an anode is applied to the surface of the aluminum support. An oxide film can be formed.

陽極酸化の処理条件は使用される?にM液によって櫨々
変化するので一概には決定されイ拝ないが一般的にけ實
解液の濃度がl−rθ重量係、液温j〜71:)0C:
%m流密度θ、j〜6oアンはア/l(m2、電圧t 
〜i o OV%tlJ時r# jθ0〜l0分の範囲
が適当である。
What treatment conditions are used for anodizing? Although it cannot be determined unambiguously because it varies depending on the M solution, in general, the concentration of the actual solution is determined by l-rθ weight, and the liquid temperature is j~71:)0C:
%m flow density θ, j ~ 6o an is a/l (m2, voltage t
~io OV% tlJ time r# jθ0 to 10 minutes is appropriate.

これらの11!l極酸化処理の内でも、待に英国特許第
1.μ/j、7i<r号明細書に記載されている発明で
使用きれている、硫酸中で高電流密度で陽極酸化する方
法および米国特許第J、j//、ぶ4/号明m舊に記載
されている燐酸ケ中解浴として陽極酸化する方法が好ま
しい。
These 11! Among the polar oxidation treatments, the British patent number 1. μ/j, 7i<r, a method of anodizing at high current density in sulfuric acid, and U.S. Pat. Preferred is the method of anodic oxidation using phosphoric acid solution as described in .

陽極酸化されてアルミニウム板は、更に米国特Ilf第
λ、7/41.OAA号および同第3.lri。
The anodized aluminum plate is further coated with US Pat. No. λ, 7/41. OAA No. 3. lri.

4LA1号の各明細書に記されている様にアルカリ金属
シリケート、例えば珪酸す) IJウムの水溶液で浸漬
などの方法により処理したり、米国特許第3、(6o、
弘26号明細書に記載されているように、水溶性金属塩
(例えば酢酸亜鉛など)を含む親水性セルロース(例え
ば、カルボキシメチルセルロースなど)の下塗り層に設
けることもできる。
As described in the specifications of US Pat.
As described in Kou 26, it can also be provided in an undercoat layer of hydrophilic cellulose (eg, carboxymethyl cellulose, etc.) containing a water-soluble metal salt (eg, zinc acetate, etc.).

本発明による+版印刷版用支持体の上l/cけ、28版
の感光層として、従来より知られている感光層(1−設
けて、感光性平版印刷版(以下、I)S版と称す。)を
得ることができ、これ?製版処理して得た平版印刷版は
、浸れた性能ケ有している。
A conventionally known photosensitive layer (1-) is provided as a photosensitive layer for the 28th plate on the upper l/c of the support for the + plate printing plate according to the present invention, and a photosensitive lithographic printing plate (hereinafter referred to as I) S plate ) can be obtained, this? The lithographic printing plate obtained by the plate-making process has excellent properties.

上記感光層の組成物としては(a)ンアソ樹脂とバイン
ダーからなるもの、(b)o−ナフトキノンジアンド化
合物からなるもの、(C)アンド化合物とバインダーか
らなるもの、 (d)エチレン性不飽40モノマー、光
重付開始剤及び局分子バインダーからなる光重合性組成
物、(e)重合体の主鎖又は側鎖に−C1(=(?)(
−(:Q−基忙有する光架橋性ポリマ−からなるものな
どが含まれ、これらの詳細は米国特許第μ、λ31.J
tO号明細書に詳しく説明づれている。このような感光
層は本発明により裳漬され罠支持体に約θ、7〜約7f
/m、より好iL、O1o、s〜μ9 / 17t の
波偵嘲゛となるように設けられる。
The composition of the photosensitive layer is (a) composed of an azo resin and a binder, (b) composed of an o-naphthoquinone diand compound, (C) composed of an and compound and a binder, and (d) ethylenically unsaturated. 40 monomer, a photopolymerization initiator, and a local molecular binder; (e) -C1 (=(?)() in the main chain or side chain of the polymer;
-(: those made of photocrosslinkable polymers having a Q-group, etc.), details of which are described in U.S. Patent No.
It is explained in detail in the tO specification. Such a photosensitive layer is coated according to the present invention and attached to the trap support at about θ, 7 to about 7 f.
/m, more preferably iL, O1o, s~μ9/17t.

〔発明の効果〕〔Effect of the invention〕

本発明の平版目J刷版用支持体の製造方法によれば、化
学的な砂目立て工程が短時間で済む上、従来の化学的砂
目立て法に比べてアルミニウムのエツチング量が少ない
にも拘わらず均質な砂目?アルミニウム板の表面に形成
きせることができるという顕著な利点がある。従って、
工業的な突流に際しては、生I)Uスピードが早く腐蝕
液の組成k 一定の許容ψα囲に維持するための負担が
少ないという大きな効果が得られる。更に、本発明によ
り製造され7ζ乎版印刷版用支持体ケ使用して作成され
1ζ平版f−JJ刷版1:1 、機械的砂目立て方法?
利用して製造され罠平版印刷版用支持体から作成された
平版用刷版に比べて、非画1象部が汚れにくいという予
想外の効果もあることが判明し7こ。
According to the method for manufacturing a support for a lithographic J printing plate of the present invention, the chemical graining step can be completed in a short time, and the amount of aluminum etched is smaller than in the conventional chemical graining method. Is it a homogeneous grain? It has the distinct advantage that it can be formed on the surface of an aluminum plate. Therefore,
In the case of industrial rush currents, a great effect can be obtained in that the raw I) U speed is fast and the burden of maintaining the composition k of the corrosive liquid within a certain allowable ψα range is small. Further, a support for a 7ζ printing plate produced according to the present invention is used to prepare a 1ζ lithographic f-JJ printing plate 1:1, and a mechanical graining method?
It has also been found that it has the unexpected effect that the non-image area is less stained compared to lithographic printing plates made from trap lithographic printing plate supports manufactured using this technology.

〔実施例〕〔Example〕

以下、実施例により本発明を更VC祥しく説明する。な
お、実施例中の冬は、他に指定のない限り重f係?示す
Hereinafter, the present invention will be further explained with reference to Examples. In addition, in winter in the examples, unless otherwise specified, it is heavy duty? show.

実施例1 厚さ0.211m1mのアルミニウム板(材質:JIS
 Aloso)23oチの塩化第二鉄とjO係のリン酸
ケ含む水溶液中でroocで、中心線平均粗さが0.3
0μmとなるようVC浸漬処理して化学的に砂目立てし
1【。次いで10%水酸化ナトリウム水溶液VCj00
CでIO秒間浸1貴して、上記砂目立てにより生成した
スマットを除去し、更VC,20qb硝酸で中和洗浄し
て不溶解残渣ゲ除去したのち水洗した。次にlざ多硫酸
水溶液中で酸化皮膜前が/、s?/m になるように陽
極順化処理したのち、水洗し、コチ珪酸ナトリウム水溶
液VC70’ C:で7分間浸漬し、水洗、乾燥して支
持体(1)に用意した。
Example 1 Aluminum plate with a thickness of 0.211 m and 1 m (material: JIS
Aloso) In an aqueous solution containing ferric chloride of 23o and phosphoric acid of jO, the centerline average roughness was 0.3.
Chemically grained with VC immersion treatment to 0 μm [1]. Then 10% aqueous sodium hydroxide solution VCj00
The smut generated by the graining process was removed by immersion in C for 10 seconds, followed by neutralization cleaning with VC and 20 qb nitric acid to remove undissolved residue, followed by washing with water. Next, the front of the oxide film is /, s? in a polysulfuric acid aqueous solution. /m2, washed with water, immersed in an aqueous solution of sodium flat silicate VC70'C: for 7 minutes, washed with water, dried, and prepared as a support (1).

このようにして得られた支持体に軍配組成の感光液を塗
布し2乾燥して感光層ケ設けた。感光層の乾燥塗布量は
、λ、or7m であった。
A photosensitive solution having a uniform composition was coated on the support thus obtained and dried for two minutes to form a photosensitive layer. The dry coating weight of the photosensitive layer was λ or 7 m.

感光液 このようにして作られた感光性平版印刷版は、真空焼枠
中でa明ネガティブフィルムk )+u I、て、/ 
tnの相離から3KWのメタルノ1ライドランプにより
SO秒間露光を竹なつ罠のち、F記組成の現1象故で現
1象し、アラビアガム水溶液でガム引きして平版印刷版
とした。
Photosensitive liquid The photosensitive lithographic printing plate made in this way is coated with a bright negative film k )+u I,te,/ in a vacuum printing frame.
From the phase separation of tn, the plate was exposed to SO light for seconds using a 3KW metallolide lamp, and then subjected to the phenomenon of composition F, and gummed with an aqueous gum arabic solution to prepare a lithographic printing plate.

現像液 このようにして製版され罠印刷版に1通常の手順で印刷
した。その結果を後記第1表に示した。
The developer thus prepared was printed onto trap printing plates in the usual manner. The results are shown in Table 1 below.

比較例1 化学的砂目立ての腐蝕液として、30%の塩化第二鉄と
コO%の塩酸?含む水溶液を使用した以外は実施例1と
全く同様にして支持体Ak作成した。この支持体を使用
して、感光層塗布、露光、現*、ガム引きから印刷まで
は実施例1と同様に行なった。その結果を後記第7表に
示した。
Comparative Example 1: 30% ferric chloride and 0% hydrochloric acid as a corrosive solution for chemical graining. A support Ak was prepared in exactly the same manner as in Example 1 except that an aqueous solution containing the following was used. Using this support, the steps from coating the photosensitive layer, exposure, development*, gumming to printing were carried out in the same manner as in Example 1. The results are shown in Table 7 below.

比較例2 厚さO8,2μm / rnのアルミニウム板2t、t
o。
Comparative Example 2 Aluminum plate 2t, t with thickness O8, 2μm/rn
o.

メツシュの・ぐミストン−水の懸濁液中で回転ナイロン
ブラシにより、機械的に砂目立てした。この砂目型てさ
れたアルミニウムi10%の水酸化ナトリウム水溶液V
cjO0Cでto秒間浸漬して、砂目型て処理時にアル
ミニウム表面にくい込んだrJJf暦剤、アルミ屑等倉
除去して表面を均斉化し罠のち流水で洗浄し、次いで2
0%硝酸で中和洗浄して水洗した。次vcir%硫酸水
浴液中で、酸化皮膜量が/、397m2になるように陽
極酸化し1このち1.2チ珪酸ナトリウム水溶液VC7
00Cで7分間浸漬し7、水洗、乾燥して支持体CB)
’に用意した。感光1−塗布、感光、境謙ガ、ム引きか
ら印刷までは実施例1と同様に行なった。その結果を第
1イセの結果刀>1−1.本元明による支持体は、支持
体の重f−の減少朧が比較例1Yζ比べて少ないことが
判る。これは、化学的砂目立てによる厚さの減少が少な
いことを意味している。更に本発明による支持体は機械
的に砂目型てし7ζ比較例−の支持体に比べて、印刷版
としたときの非画廣部が汚れにくいことが判る。
Mechanical graining was carried out with a rotating nylon brush in a suspension of mesh and water. This grained aluminum i 10% sodium hydroxide aqueous solution V
It was immersed in cjO0C for up to seconds, and the rJJf calendar agent and aluminum debris that had penetrated into the aluminum surface during grain molding were removed, the surface was leveled, and the trap was washed with running water.
It was neutralized with 0% nitric acid and washed with water. Next, anodize in a vcir% sulfuric acid water bath solution so that the amount of oxide film becomes /, 397 m2.
Immerse at 00C for 7 minutes, wash with water, and dry to form support CB)
Prepared for '. Exposure 1 - The steps from coating, exposure, sanding, and printing were carried out in the same manner as in Example 1. The result is the result of the first straw>1-1. It can be seen that the support produced by Akira Motomoto has a smaller decrease in the weight f- of the support than Comparative Example 1Yζ. This means that the reduction in thickness due to chemical graining is small. Furthermore, it can be seen that when the support of the present invention is used as a printing plate, the non-image area is less likely to be smudged than the mechanically grained support of Comparative Example 7ζ.

突流−12 ノV−jθ、−!4Lns/znのアルミニウム板(材
11:JIS Aiosθ)?μθチの塩化第二鉄と6
θチの#酸ケ含む水溶液中、SOoCで、中心線平均粗
さが0.3jμmとなるように処理して化学的に砂目型
てした。次に、ノチ水酸化ナトリウム水溶液に500c
で10秒間浸漬して、上記砂目型てにより生成したスマ
ットを除去し、更VCλo%硝酸で中和洗浄して不溶解
残渣r除去したのち、水洗し、/、j%珪酸ナトリウム
水溶液VC70°Cで30秒間浸漬し、水洗、乾燥して
支持体〔λ〕會用、板し1ζ。
Rush current-12 ノV-jθ,-! 4Lns/zn aluminum plate (material 11: JIS Aiosθ)? μθ ferric chloride and 6
It was treated with SOoC in an aqueous solution containing #acid of θ so that the center line average roughness was 0.3 μm, and was chemically grained. Next, add 500c to the sodium hydroxide aqueous solution.
The smut generated by the above-mentioned grain molding was removed by immersion in water for 10 seconds, and the mixture was further neutralized and washed with VCλo% nitric acid to remove undissolved residues, and then washed with water. Dip in C for 30 seconds, wash with water, dry, and use as a support [λ] and plate 1ζ.

このようにして得られた支持体に下記組成の感光液勿塗
布し、乾燥して、感光層を設け1こ。感光層の乾燥塗布
量は1,377m であった。
A photosensitive solution having the following composition was coated on the support thus obtained, and dried to form a photosensitive layer. The dry coverage of the photosensitive layer was 1,377 m2.

感光液 このようにして作成した感光性平版印刷版ヲJKWのメ
タルハライドランプに51jとして7mの距離を隔て罠
位置に配置して60秒間ポジ透明画を;+l* t、 
−U Thみ光した後、下記の組成の現像g、(液温、
2j0U)i用いて現1象し、2らにガム引きした。
Photosensitive liquid The photosensitive lithographic printing plate thus prepared was placed in a trap position at a distance of 7 m using a JKW metal halide lamp as 51j, and a positive transparent image was made for 60 seconds;
-U Th After exposure, develop g with the following composition (liquid temperature,
2j0U)i was used, and the second layer was gummed.

h6の汚れの程度を訓べ、後記の第2表に結果を示[7
た。
The degree of contamination of h6 was determined, and the results are shown in Table 2 below [7
Ta.

比較Pレリ3 化学的砂目立ての腐蝕液として4tO%の塩化嬉二鉄と
t、toqbの硝酸2含む水溶液?使用した以外は、実
施I’l+ 2と全く同様にして支持体[U)2作成し
罠。この支持体を感光1−塗布露光、現像、ガム引きη
・ら印刷までは、実施例2と同様に行なつ第2表の結果
より、本発明による支持体は、比較例17比べ重量減少
が少ない、即ち、イし学的砂目立てによる厚さの減少が
少なく、シρ)も、非画像部が汚れにくく、耐刷性も優
れていることが判る。
Comparison P Reli 3 An aqueous solution containing 4tO% diferric chloride and t, toqb of nitric acid 2 as a corrosive solution for chemical graining? Support [U) 2 was prepared in exactly the same manner as in Example I'l+2 except that a trap was used. This support was photosensitive 1-coating exposure, development, gumming η
・Printing was carried out in the same manner as in Example 2. From the results shown in Table 2, the support according to the present invention showed less weight loss than Comparative Example 17, that is, the thickness decreased due to graining. It can be seen that the non-image area is less stained and the printing durability is also excellent.

Claims (1)

【特許請求の範囲】 /)アルミニウム板の表面を腐蝕液で化学的に砂目立て
する工程を含む平版印刷版用支持体の製造方法において
、該腐蝕液が塩化第二鉄および燐酸ケ含む水溶液である
こと?特徴とする該製造方法。 2)アルミニウム板の表面を、順に腐蝕液で化学的に砂
目立てし、陽極酸化する各工程を含む平版印刷版用支持
体の製造方法において、該腐蝕液が塩化第二鉄および燐
酸を含む水溶液であることを特徴とする該製造方法。
[Claims] /) A method for producing a support for a lithographic printing plate, which includes a step of chemically graining the surface of an aluminum plate with an etching solution, wherein the etching solution is an aqueous solution containing ferric chloride and phosphoric acid. Something? The manufacturing method is characterized by: 2) A method for producing a lithographic printing plate support comprising steps of chemically graining the surface of an aluminum plate with an etchant and anodizing the surface, the etchant being an aqueous solution containing ferric chloride and phosphoric acid. The manufacturing method is characterized in that:
JP6563184A 1984-04-02 1984-04-02 Preparation of support for planographic printing plate Pending JPS60208293A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP6563184A JPS60208293A (en) 1984-04-02 1984-04-02 Preparation of support for planographic printing plate
GB08508199A GB2160222B (en) 1984-04-02 1985-03-29 Lithographic support and process of preparing the same
US06/719,086 US4686021A (en) 1984-04-02 1985-04-02 Lithographic support and process of preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6563184A JPS60208293A (en) 1984-04-02 1984-04-02 Preparation of support for planographic printing plate

Publications (1)

Publication Number Publication Date
JPS60208293A true JPS60208293A (en) 1985-10-19

Family

ID=13292553

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6563184A Pending JPS60208293A (en) 1984-04-02 1984-04-02 Preparation of support for planographic printing plate

Country Status (1)

Country Link
JP (1) JPS60208293A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6270510A (en) * 1985-09-20 1987-04-01 Shin Etsu Chem Co Ltd Support member for heated steel material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6270510A (en) * 1985-09-20 1987-04-01 Shin Etsu Chem Co Ltd Support member for heated steel material

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