JPH01237197A - Production of planographic support - Google Patents

Production of planographic support

Info

Publication number
JPH01237197A
JPH01237197A JP18542588A JP18542588A JPH01237197A JP H01237197 A JPH01237197 A JP H01237197A JP 18542588 A JP18542588 A JP 18542588A JP 18542588 A JP18542588 A JP 18542588A JP H01237197 A JPH01237197 A JP H01237197A
Authority
JP
Japan
Prior art keywords
electrolytic
aluminum
support
treatment
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18542588A
Other languages
Japanese (ja)
Other versions
JPH0798434B2 (en
Inventor
Akio Uesugi
彰男 上杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP18542588A priority Critical patent/JPH0798434B2/en
Priority to DE3838334A priority patent/DE3838334C2/en
Publication of JPH01237197A publication Critical patent/JPH01237197A/en
Priority to US07/553,342 priority patent/US5074976A/en
Publication of JPH0798434B2 publication Critical patent/JPH0798434B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To perform uniform graining and obtain a planographic support having excellent printing performance, by subjecting an aluminum support to an alkali etching treatment in an extremely limited degree within a specified range, and then to an electrolytic graining treatment in an acidic electrolytic liquid. CONSTITUTION:An aluminum support is subjected to an alkali etching treatment in an extremely limited degree within the range of 0.01-1.0g/m<2>, and then to an electrolytic graining treatment in an acidic electrolytic liquid. This method is particularly effective when the aluminum support contains 0.3-3% of manganese, and the electrolytic liquid is preferably an aqueous solution comprising nitric acid as a main constituent. In the alkali etching treatment, a preferable alkali agent to be used is sodium hydroxide, potassium hydroxide, sodium metasilicate, sodium carbonate, sodium aluminate, sodium gluconate or the like, the concentration of which is 0.001-5%, the etching temperature is 20-90 deg.C, and the etching time is 1sec - 5min. Subsequently, the surface of the aluminum plate is electrolytically grained in the acidic electrolytic liquid. The electrolytic liquid is preferably a 0.1-10wt.% nitric acid solution, and AC electrolytic etching is carried out.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、印刷版用支持体の製造方法に関するものであ
り、特に平版印刷版に通ずる粗面化されたマンガンを含
有するアルミニウム板からなる印刷版用支持体の製造方
法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a support for a printing plate, and in particular to a method for manufacturing a support for a printing plate, and in particular, a support made of a roughened manganese-containing aluminum plate that is used in planographic printing plates. The present invention relates to a method for producing a support for a printing plate.

〔従来の技術〕[Conventional technology]

印刷版用支持体、特に平版印刷版用支持体としては、ア
ルミニウム1反が用いられ、ユーザーの多様化から、ア
ルミニウム板も、不純物が非常に少ない純アルミニウム
に近いものからマンガンを添加し純アルミニウムより強
度を増加させるものなど多様化している。特にマンガン
を添加したものは、強度が増加し、今後仕様量も増加し
ていく傾向にある。
As a support for printing plates, especially as a support for lithographic printing plates, 1 sheet aluminum is used, and due to the diversification of users, aluminum plates have changed from pure aluminum with very few impurities to pure aluminum by adding manganese. It is becoming more diverse, including those that increase strength. In particular, materials with manganese added have increased strength, and the amount of specifications will tend to increase in the future.

また、アルミニウム板を平版印刷版用支持体として使用
するためには、感光材との適度な接着性が保水性を有し
ていることが必要である。
In addition, in order to use an aluminum plate as a support for a lithographic printing plate, it is necessary to have appropriate adhesion to the photosensitive material and water retention.

このためには、アルミニウム板の表面を均一かつ緻密な
砂目を有するように粗面化しなければならない、この粗
面化処理は製版後、実際に印刷を行ったとき、版材の汚
れ性能や、耐刷性能などに著しい影響を及ぼすので、そ
の良否は版材製造上重要な要素となっている。
To achieve this, the surface of the aluminum plate must be roughened so that it has a uniform and dense grain.This roughening process affects the staining performance of the plate material during actual printing after plate making. Since it has a significant effect on printing durability, etc., its quality is an important factor in the production of plate materials.

印刷版用アルミニウム支持体の粗面化方法としては、交
流電解粗面化法が一般的に採用されており、電流として
は、普通の正弦波交/R電流、矩形波などの特殊交番電
流が用いられている。また、この交流電解粗面化の前処
理として、苛性ソーダなどでエツチング処理して表面層
を除くことが一般的であった(例えば特公昭57−16
918号公報)。
As a method for roughening aluminum supports for printing plates, alternating current electrolytic surface roughening method is generally adopted.As for the current, special alternating current such as ordinary sine wave alternating current/R current or rectangular wave is used. It is used. In addition, as a pretreatment for this alternating current electrolytic surface roughening, it was common to remove the surface layer by etching with caustic soda (for example,
Publication No. 918).

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、従来のエツチング処理では、次の交流電
解粗面化で均一な粗面化が得られず、特に、前記したよ
うにアルミニウム材料の多様化によりマンガン等を含有
する場合にはこの傾向が著しく、前処理としてのアルカ
リエツチングを検討する必要があった。
However, with conventional etching treatment, uniform surface roughening cannot be obtained in the subsequent alternating current electrolytic roughening, and this tendency is particularly noticeable when aluminum materials contain manganese etc. due to the diversification of aluminum materials as mentioned above. Therefore, it was necessary to consider alkali etching as a pretreatment.

すなわち、従来のアルカリエツチングでは一般に3 g
 / m以上のエツチング量を必要とされるが、このよ
うなエツチングを行うとアルミニウム)反の表面が均一
にエツチングされず、特にマンガン等を0.3%以上含
有すると、アルミニウムとマンガン等との金属間化合物
の影響で均一なエツチングを得ることが更に困難となり
、そのために交流電解粗面化によって表面が均一に粗面
化できず、印刷画質に悪影響を与えるという問題がある
ことがわかった。
That is, conventional alkaline etching generally requires 3 g
/ m or more is required, but if such etching is performed, the surface of the aluminum plate will not be etched uniformly, and especially if it contains 0.3% or more of manganese, etc., the bond between aluminum and manganese, etc. will increase. It has been found that it is more difficult to obtain uniform etching due to the influence of intermetallic compounds, and as a result, the surface cannot be uniformly roughened by AC electrolytic roughening, which adversely affects the quality of the printed image.

本発明の目的は、アルミニウム板を交流電解粗面化で均
一に粗面化することができる印刷性能のすくれた平版印
刷版用支持体の製造方法を提供しようとするものである
An object of the present invention is to provide a method for producing a support for a lithographic printing plate that can uniformly roughen an aluminum plate by roughening the surface by alternating current electrolysis and has excellent printing performance.

〔問題点を解決するための手段及び作用〕本発明者らは
、エツチング量の検討の結果0.01g/n(〜1 g
 / rdの範囲で損少のアルカリエツチングをするこ
とによって目的を達することを見出し、本発明に至った
[Means and effects for solving the problem] As a result of the study of the etching amount, the present inventors determined that the etching amount was 0.01 g/n (~1 g
It has been discovered that the object can be achieved by performing alkali etching with a small loss in the range of /rd, and the present invention has been achieved.

部ち、本発明の上記目的はアルミニウム支持体を、0.
018 / m〜1.0g/イの範囲に損少のアルカリ
エツチング処理した後、酸性電解液中で電解粗面化処理
することによって達成される。
However, the above object of the present invention is to provide an aluminum support with a thickness of 0.
This is achieved by performing an alkaline etching treatment with a small loss in the range of 0.018/m to 1.0 g/m, followed by electrolytic surface roughening treatment in an acidic electrolyte.

尚本発明においてアルミニウム支持体に0.3%以上3
%以下のマンガンが含まれている場合に特に効果的であ
り、又、電解粗面化処理用酸性電解液としては硝酸を主
体とする水溶液が好ましい。
In the present invention, the aluminum support contains 0.3% or more3.
% or less of manganese, and an aqueous solution containing nitric acid as a main component is preferable as the acidic electrolyte for electrolytic surface roughening treatment.

本発明における損少のアルカリエツチング処理の条件と
しては、好ましいアルカリ剤としては、苛性ソーダ、苛
性カリ、メク珪酸ソーダ、炭酸ソーダ、アルミン酸ソー
ダ、グルコン酸ソーダ等を用いる。その1度はo、oo
t %〜5%、温度は20℃〜90℃、時間は1秒〜5
分間の範囲から選択される。
As for the conditions for the alkali etching treatment with minimal loss in the present invention, preferred alkaline agents include caustic soda, caustic potash, sodium silicate, soda carbonate, sodium aluminate, and sodium gluconate. That one time was o, oo
t%~5%, temperature 20℃~90℃, time 1 second~5%
Selected from a range of minutes.

このようなアルカリエツチングしたアルミニウム板の表
面には、アルカリに不溶な物質(スマット)が残存する
ので、必要に応じてデスマット処理を行っても良い。
Since alkali-insoluble substances (smut) remain on the surface of such an alkali-etched aluminum plate, a desmutting treatment may be performed as necessary.

引き続き、アルミニウム板の表面は、酸性電解液中で、
電解粗面化される。この時の電解液は、塩酸、硝酸また
は、その混合液が望ましいが、硝酸がより好ましい。硝
酸の含有量は0.1〜10重量%、より好ましくは0.
3〜3重量%のl容液中で、交流電解エツチングが行わ
れる。電流波形は、求める砂目の形により適時選択され
る。
Subsequently, the surface of the aluminum plate was soaked in an acidic electrolyte.
The surface is electrolytically roughened. The electrolytic solution at this time is preferably hydrochloric acid, nitric acid, or a mixture thereof, and nitric acid is more preferred. The content of nitric acid is 0.1 to 10% by weight, more preferably 0.1% by weight.
AC electrolytic etching is carried out in a 3-3% by weight solution. The current waveform is appropriately selected depending on the desired grain shape.

電解に使用する電気量によって表面の粗面化状況が異っ
て来る。1次組面のビット深さは0,1〜10μm3ビ
ット径は、0.2〜20μmより好ましくはピント深さ
2〜4μm、ピット径5〜15μmである。このような
ピット径を形成させるには、特公昭56−19280号
、特公昭55−19191号各公報に記載の特殊交番波
形を用いるのがより好ましい。
The roughness of the surface varies depending on the amount of electricity used for electrolysis. The bit depth of the primary assembly surface is 0.1 to 10 μm, and the third bit diameter is more preferably 0.2 to 20 μm, preferably a focus depth of 2 to 4 μm, and a pit diameter of 5 to 15 μm. In order to form such a pit diameter, it is more preferable to use the special alternating waveforms described in Japanese Patent Publication No. 56-19280 and Japanese Patent Publication No. 55-19191.

Sち、本発明は上記により感光剤との適度な接着性と保
水性を保つのに良い1次組面を形成させ平版印刷版用支
持体を得ることができるが、さらに次の処理を施すこと
が好ましい。
S. In the present invention, a support for a lithographic printing plate can be obtained by forming a primary surface that is good for maintaining appropriate adhesion with the photosensitive agent and water retention, but the following treatment is also performed. It is preferable.

1次組面を形成したアルミニウムは、引続き、酸又はア
ルカリ溶液で処理されることが好ましい。
It is preferable that the aluminum on which the primary assembled surface is formed is subsequently treated with an acid or alkaline solution.

具体的には特公昭56−11316号公報に記載されて
いる硫酸の他に、リン酸またはリン酸とクロム酸の混液
が用いられる。また、特公昭48−28123号公報に
記載されているような苛性ソーダなどのアルカリ性溶液
で軽くデスマット処理を行って、表面に付着しているス
マットを除去する。アルカリ溶液で付着したスマットを
除去する場合、アルカリに不溶成分が残存することがあ
るので酸性溶液(硫酸、リン酸、クロム酸等)により再
度デスマットすることが好ましい。
Specifically, in addition to the sulfuric acid described in Japanese Patent Publication No. 56-11316, phosphoric acid or a mixture of phosphoric acid and chromic acid is used. Further, smut adhering to the surface is removed by lightly desmutting with an alkaline solution such as caustic soda as described in Japanese Patent Publication No. 48-28123. When removing adhered smut with an alkaline solution, it is preferable to desmut again with an acidic solution (sulfuric acid, phosphoric acid, chromic acid, etc.) since components insoluble in alkali may remain.

この後、必要に応じて1次相面の生成方法と同様な方法
で2次組面を重ねても良い、2次組面のピント深さは0
.1 〜1μm、ピット形は0.1 〜5μmより好ま
しくは、ピット深さが0.1〜0.8  μm、ピント
径0.1〜3μmである。
After this, if necessary, the secondary composite surface may be overlapped using the same method as the primary phase surface generation method.The focus depth of the secondary composite surface is 0.
.. More preferably, the pit depth is 0.1 to 0.8 μm and the focus diameter is 0.1 to 3 μm.

2次組面を形成したアルミニウムは、引続き、酸または
アルカリ溶液で処理されることが好ましい。具体的には
特公昭56−11316号公報に記載されている硫酸の
他に、リン酸またはリン酸とクロム酸の混液が用いられ
る。また、特公昭48−28123号公報に記載されて
いるような苛性ソーダなどのアルカリ性溶液で軽くデス
マット処理を行って、表面に付着しているスマットを除
去する。アルカリ溶液で付着したスマットを除去する場
合、前記と同様アルカリに不溶成分が残存することがあ
るので、酸性溶液(硫酸、リン酸、クロム酸等)により
再度デスマットすることが好ましい。
Preferably, the aluminum with the secondary assembled surface is subsequently treated with an acid or alkaline solution. Specifically, in addition to the sulfuric acid described in Japanese Patent Publication No. 56-11316, phosphoric acid or a mixture of phosphoric acid and chromic acid is used. Further, smut adhering to the surface is removed by lightly desmutting with an alkaline solution such as caustic soda as described in Japanese Patent Publication No. 48-28123. When removing adhered smut with an alkaline solution, it is preferable to desmut again with an acidic solution (sulfuric acid, phosphoric acid, chromic acid, etc.) because alkali-insoluble components may remain as described above.

しかる後最後の処理として陽極酸化が行なわれるが、陽
極酸化皮膜は0.1〜Log/n(、より好ましくは0
.3〜5 g / m表面に形成するのが良い。
After that, anodic oxidation is performed as the final treatment, and the anodic oxide film has a concentration of 0.1 to Log/n (more preferably 0
.. It is best to form it on the surface at a rate of 3-5 g/m.

陽極酸化皮膜する前にアルカリエツチング、デスマット
処理するのが好ましい。
It is preferable to perform alkali etching and desmutting treatment before applying the anodic oxide film.

陽極酸化の処理条件は、使用される電解液によって種々
変化するので一概には決定されないが一般的には、電解
液の濃度が1〜80重量%、液温5〜70℃、電流密度
0.5〜60 A / d g 、電圧1〜100■、
電解時間10秒〜5分の範囲が適当である。
The conditions for anodic oxidation vary depending on the electrolyte used, so they cannot be determined unconditionally, but generally, the concentration of the electrolyte is 1 to 80% by weight, the temperature is 5 to 70°C, and the current density is 0. 5~60 A/d g, voltage 1~100■,
An appropriate electrolysis time range is from 10 seconds to 5 minutes.

この様にして得られた陽極酸化皮膜を持つ砂目のアルミ
ニウム板はそれ自身安定で親水性に優れたものであるか
ら、直ちに感光性塗膜を上に設ける事も出来るが、必要
により更に表面処理を施す事が出来る。たとえば、アル
カリ金属珪酸塩によりシリケート層あるいは、親水性高
分子化合物よりなる下塗層を設けることができる。下塗
層の塗布量は5〜150■/dが好ましい。
The grained aluminum plate with the anodic oxide film obtained in this way is itself stable and has excellent hydrophilic properties, so a photosensitive coating can be immediately applied on top, but if necessary, the surface can be further coated. Can be processed. For example, a silicate layer made of an alkali metal silicate or an undercoat layer made of a hydrophilic polymer compound can be provided. The coating amount of the undercoat layer is preferably 5 to 150 μ/d.

このように処理したアルミニウム支持体上に感光性塗膜
を設けて感光性平版印刷版を得る。これを印刷に用いる
には、画像露光、及び現像して製版した後に、印刷機に
セットし印刷を開始する。
A photosensitive lithographic printing plate is obtained by providing a photosensitive coating on the aluminum support thus treated. To use this for printing, after image exposure, development, and plate making, it is set in a printing machine and printing begins.

〔実施例〕〔Example〕

実施例−1 JIS3003材(Mg1.1 %)のアルミニウム支
持体で、1%苛性ソーダ水溶液を30℃に温めた?8液
中に浸漬して、アルミニウム溶解量が0.1g/rdに
なるようにエンチングした。水洗後3%硝酸水溶液に浸
漬して十分水洗した。
Example-1 A 1% aqueous solution of caustic soda was heated to 30°C on an aluminum support made of JIS3003 material (Mg 1.1%). It was immersed in liquid No. 8 and etched so that the amount of aluminum dissolved was 0.1 g/rd. After washing with water, it was immersed in a 3% nitric acid aqueous solution and thoroughly washed with water.

水洗後1.5%硝酸水溶液中で、特公昭55−1919
1号公報に記載の交番波形電流を用いて、電気化学的に
粗面化した。
After washing with water, in a 1.5% nitric acid aqueous solution,
The surface was electrochemically roughened using the alternating waveform current described in Publication No. 1.

電解条件はV a−12,7ボルト、V、=9.1 ポ
ルト、陽橿時電気量が600クローン/ d n(とな
る様にした。表面のスマットを除去した後、電顕写真で
観察すると、10μm程度の大きなピントと1μm程度
の細いピットが均一に生成していた。この支持体に20
%硫酸中で、陽極酸化皮膜2.5g/m設け、水洗し乾
燥した。
The electrolytic conditions were set to V a - 12.7 volts, V = 9.1 port, and the amount of electricity during positive operation was 600 clones/dn. After removing the smut on the surface, it was observed with an electron microscope photo. As a result, a large focus of about 10 μm and a narrow pit of about 1 μm were uniformly generated.
% sulfuric acid, an anodized film of 2.5 g/m was applied, washed with water, and dried.

これを基板(A)とする。This will be referred to as a substrate (A).

比較例−1 J[53003材のアルミニウム支持体で、10%苛性
ソーダー水溶液を60℃に温めた?8液中に浸漬して、
アルミニウム溶解量が5 g / rdになるようにエ
ツチングした。水洗後lO%硝酸水溶液に浸漬して十分
水洗した。
Comparative Example-1 J [10% caustic soda aqueous solution was heated to 60°C on an aluminum support made of 53003 material? 8 Immersed in liquid,
Etching was performed so that the amount of aluminum dissolved was 5 g/rd. After washing with water, it was immersed in a 10% nitric acid aqueous solution and thoroughly washed with water.

水洗後実施例−1と同様な方法で粗面化した後表面のス
マットを除き、電顕写真で観察した。その結果、30μ
程度の大きなピットがあり、砂目の形も不均一で末エッ
チ部(マンガン析出部分)が多かった。この支持体を2
0%硫酸中で陽極酸化皮膜2.5g/n?設け、水洗し
乾燥した。
After washing with water, the surface was roughened in the same manner as in Example 1, and the smut on the surface was removed and observed with an electron microscope. As a result, 30μ
There were large pits, the shape of the grain was uneven, and there were many end-etched areas (manganese precipitated areas). This support is 2
Anodic oxide film 2.5g/n in 0% sulfuric acid? It was set up, washed with water, and dried.

この基亭反をCB)とする。Let this kitei resistance be CB).

以上の如くして作成した基板〔A〕、〔B〕に下記組成
物を、乾燥後の塗布重量が2.0g/耐になる様に塗布
して感光層を設けた。
A photosensitive layer was provided by applying the following composition to the substrates [A] and [B] prepared as above so that the coating weight after drying was 2.0 g/durability.

感 光7夜 N−(4−ヒドロキシフェニル)メタクリルアミド/2
−ヒドロキシエチルメタクリレート/アクリロニトリル
/メチルメタクリレート/メタクリル酸(= 15 :
 10 : 30 : 38 : 7モル比)共重合体
(平均分子1160000)・・・・・・・・・5.0
g4−ジアゾジフェニルアミンとホルムアルデヒドの縮
合物の六弗化燐酸塩・・・・・・・・・0,5g亜塙酸
        ・・・・・・・・・0.05gジクト
リアピュアープルーBOH(採土ケ谷化学−社製)  
     ・・・・・・・・・0.1  g2−メトキ
シエタノール・・・・・・・・・100gこのようにし
て作製して感光製平版印刷版に、真空焼伜中で1明ネガ
ティブフィルムを通して、1mの距離から3に−のメタ
ルハライドランプにより50秒間露光を行なったのち、
下記組成の現像液で現像しアラビアガム水溶液でガム引
きして平版印刷版とした。
Sensitivity 7 nights N-(4-hydroxyphenyl)methacrylamide/2
-Hydroxyethyl methacrylate/acrylonitrile/methyl methacrylate/methacrylic acid (= 15:
10:30:38:7 molar ratio) copolymer (average molecule 1160000)...5.0
g4-Hexafluorophosphate of the condensate of diazodiphenylamine and formaldehyde 0.5 g Solanous acid 0.05 g Dictoria Pure Blue BOH (Odugaya (manufactured by Chemistry)
・・・・・・・・・0.1 g2-Methoxyethanol・・・・・・100 g After exposure for 50 seconds with a metal halide lamp of 3 - from a distance of 1 m,
A lithographic printing plate was prepared by developing with a developer having the following composition and gumming with an aqueous gum arabic solution.

現像液 亜硫酸ナトリウム ・・・・・・・・・5gヘンシルア
ルコール・・・・・・・・・30g炭酸ナトリウム  
・・・・・・・・・5gイソプロピルナフタレンスルホ
ン酸ナトリウム                  
    ・・・ ・・・ ・・・12g純水     
  ・・・・・・1000 gこの様にして製版された
印刷版を用いて、通常の手順で印刷した結果を第1表に
示す。
Developer Sodium sulfite: 5g Hensyl alcohol: 30g Sodium carbonate
・・・・・・・・・5g Sodium isopropylnaphthalene sulfonate
・・・ ・・・ 12g pure water
...1000 g Using the printing plate made in this way, printing was carried out according to the usual procedure, and the results are shown in Table 1.

第  1  表 実施例−2 JISI100材(At99%以上)の純アルミニウム
に近い支持体で、実施例1と同様な処理方法で電気化学
的に粗面化し、表面のスマットを除き、電顕写真で観察
した。その結果15μm程度の大きなピットと1μm程
度の細いピットが均一に生成していた。この支持体を、
20%硫酸中で陽極酸化皮膜2゜5g/i設け、水洗し
乾燥した。
Table 1 Example-2 A support made of JISI100 material (99% At or higher) that is close to pure aluminum was electrochemically roughened using the same treatment method as in Example 1, and the surface smut was removed and the support was photographed using an electron microscope. Observed. As a result, large pits of about 15 μm and thin pits of about 1 μm were uniformly generated. This support
An anodized film of 2.5 g/i was applied in 20% sulfuric acid, washed with water, and dried.

これを基板〔CDとする。This will be referred to as a substrate (CD).

比較例−2 JISI100材のアルミ支持体で比較例2と同様な処
理方法で電気化学的に粗面化し、表蘭のスマットを除き
電顕写真で観察した。その結果25μm程度の大きなピ
ットがあり、砂目の形も不均一であった。この支持体を
20%硫酸中で陽極酸化皮膜2.5 g /=設け、水
洗し乾燥した。この基板を1D〕とする。
Comparative Example 2 An aluminum support made of JISI 100 material was electrochemically roughened using the same treatment method as in Comparative Example 2, and the smut on the surface was removed and observed using an electron microscope. As a result, there were large pits of about 25 μm, and the shape of the grains was non-uniform. This support was coated with an anodized film of 2.5 g/= in 20% sulfuric acid, washed with water, and dried. This substrate is referred to as 1D].

以上の如(して作製した基板(C)、CD)に基板(A
)、(B)と同様な組成物を塗布、乾燥し感光層を設け
、現像し、印刷した。
The substrates (C) and CD produced as described above are
), a composition similar to (B) was applied, dried to form a photosensitive layer, developed, and printed.

〔発明の効果〕〔Effect of the invention〕

上記の如く、本発明によりアルミニウム支持体を、0.
01 g /M〜1.0g/n(の範囲に極少のアルカ
リエツチング処理した後、酸性電解液中で電解粗面化処
理することにより、砂目が均一に生成され、印刷性能の
優れた平版印刷版用支持体が得られた。
As mentioned above, in accordance with the present invention, an aluminum support of 0.
After a very small amount of alkali etching in the range of 0.01 g/M to 1.0 g/n, electrolytic surface roughening treatment is performed in an acidic electrolyte, resulting in uniform grains and a planographic plate with excellent printing performance. A printing plate support was obtained.

手続補正書 昭和63年9月22日Procedural amendment September 22, 1986

Claims (4)

【特許請求の範囲】[Claims] (1)アルミニウム支持体を、0.01g/m^2〜1
.0g/m^2の範囲に極少のアルカリエッチング処理
した後、酸性電解液中で電解粗面化処理することを特徴
とする平版印刷版支持体の製造方法。
(1) Aluminum support at 0.01g/m^2~1
.. A method for producing a lithographic printing plate support, which comprises performing an extremely small alkaline etching treatment in the range of 0 g/m^2, followed by an electrolytic surface roughening treatment in an acidic electrolyte.
(2)前記アルミニウム支持体の中にマンガンが0.3
%以上含まれていることを特徴とする特許請求の範囲第
1項記載の平版印刷版支持体の製造方法。
(2) 0.3% manganese in the aluminum support
% or more of the lithographic printing plate support according to claim 1.
(3)前記極少のアルカリエッチング処理の条件がアル
カリ剤としてその濃度0.001〜5%、温度20〜9
0℃、時間1〜5分であることを特徴とする特許請求の
範囲第1項又は第2項記載の平版印刷版支持体の製造方
法。
(3) The conditions for the minimally alkaline etching treatment are an alkali agent concentration of 0.001 to 5% and a temperature of 20 to 9%.
3. The method for producing a lithographic printing plate support according to claim 1 or 2, characterized in that the temperature is 0° C. and the time is 1 to 5 minutes.
(4)前記電解粗面化処理用酸性電解液が硝酸を主体と
する水溶液であることを特徴とする特許請求の範囲第1
、2、又は第3項記載の平版印刷版支持体の製造方法。
(4) Claim 1, characterized in that the acidic electrolytic solution for electrolytic surface roughening treatment is an aqueous solution mainly containing nitric acid.
, 2, or 3. The method for producing a lithographic printing plate support according to item 3.
JP18542588A 1987-11-12 1988-07-27 Method for producing lithographic printing plate support Expired - Lifetime JPH0798434B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP18542588A JPH0798434B2 (en) 1987-11-25 1988-07-27 Method for producing lithographic printing plate support
DE3838334A DE3838334C2 (en) 1987-11-12 1988-11-11 Process for producing an aluminum support for a lithographic printing plate
US07/553,342 US5074976A (en) 1987-11-12 1990-07-16 Process for producing aluminum support for lithographic printing plate

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP29513587 1987-11-25
JP62-295135 1987-11-25
JP18542588A JPH0798434B2 (en) 1987-11-25 1988-07-27 Method for producing lithographic printing plate support

Publications (2)

Publication Number Publication Date
JPH01237197A true JPH01237197A (en) 1989-09-21
JPH0798434B2 JPH0798434B2 (en) 1995-10-25

Family

ID=26503094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18542588A Expired - Lifetime JPH0798434B2 (en) 1987-11-12 1988-07-27 Method for producing lithographic printing plate support

Country Status (1)

Country Link
JP (1) JPH0798434B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0581321A2 (en) * 1992-07-31 1994-02-02 Fuji Photo Film Co., Ltd. Method of producing planographic printing plate support
EP0615801A1 (en) * 1993-03-09 1994-09-21 Fuji Photo Film Co., Ltd. Method of producing support for planographic printing plate
EP0695647A1 (en) 1994-08-05 1996-02-07 Fuji Photo Film Co., Ltd. Aluminum alloy support for planographic printing plate and method for producing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0581321A2 (en) * 1992-07-31 1994-02-02 Fuji Photo Film Co., Ltd. Method of producing planographic printing plate support
EP0581321A3 (en) * 1992-07-31 1994-08-03 Fuji Photo Film Co Ltd
EP0615801A1 (en) * 1993-03-09 1994-09-21 Fuji Photo Film Co., Ltd. Method of producing support for planographic printing plate
US5462614A (en) * 1993-03-09 1995-10-31 Fuji Photo Film Co., Ltd. Method of producing support for planographic printing plate
EP0695647A1 (en) 1994-08-05 1996-02-07 Fuji Photo Film Co., Ltd. Aluminum alloy support for planographic printing plate and method for producing the same

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