JPS60206659A - Manufacturing of inkjet recording head - Google Patents

Manufacturing of inkjet recording head

Info

Publication number
JPS60206659A
JPS60206659A JP6411084A JP6411084A JPS60206659A JP S60206659 A JPS60206659 A JP S60206659A JP 6411084 A JP6411084 A JP 6411084A JP 6411084 A JP6411084 A JP 6411084A JP S60206659 A JPS60206659 A JP S60206659A
Authority
JP
Japan
Prior art keywords
ink
inkjet recording
resin layer
recording head
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6411084A
Other languages
Japanese (ja)
Other versions
JPH064333B2 (en
Inventor
Masami Yokota
横田 雅実
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59064110A priority Critical patent/JPH064333B2/en
Publication of JPS60206659A publication Critical patent/JPS60206659A/en
Publication of JPH064333B2 publication Critical patent/JPH064333B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1604Production of bubble jet print heads of the edge shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To stabilize discharge characteristics by adjusting light exposure to be given to photosensitive resin layer in response with the difference of reflectivity at the time of patterning with application of photosensitive resin layer on adhesive surfaces of different reflectivity. CONSTITUTION:A heater 2 which works as an energy generating body and an electrode 3 which supplies electricity to the heater 2 are formed on a substrate 1 by etching, screen printing, etc. In order to completely separate the electrode 3 and ink, an ink-resisting layer 6 is formed with an ink-resisting polyimide, etc. Then, a hardened resin layer 7 which forms walls for ink passage is formed, for instance, by lamination of a dry film. Further, for the formation of an ink passage wall by patterning, a photomask 20 which has a transparent portion which constitutes a nozzle wall is arranged over the hardened resin layer 7 after positioning is performed. Subsequently, light exposure is accomplished.

Description

【発明の詳細な説明】 [技術分野] 本発明は、インクジェット記録ヘッド、詳しくは、イン
クジェ”/ )記録方式におl、Xて記録インクの小滴
を吐出発生させるためのインクジ、z −/ F記録ヘ
ッドの製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an inkjet recording head, specifically an inkjet recording head for ejecting and generating small droplets of recording ink in an inkjet recording system. The present invention relates to a method of manufacturing an F recording head.

[従来技術] インクジェット記録ヘッドは、一般に、微細なインク吐
出口としてのオリフィス、この第1ノフイスにインクを
供給するインク通路およびこのインク通路の一部分に配
設されてインクに吐出圧などのエネルギーを刊年するた
めのエネルギー発生体を具えている。
[Prior Art] An inkjet recording head generally includes an orifice as a fine ink ejection opening, an ink passage that supplies ink to the first orifice, and a part of the ink passage that applies energy such as ejection pressure to the ink. It is equipped with an energy generator to generate the year.

このようなインクジェット記録へ・ソドの一つとして、
基板上にエネルギー発生体となるヒーター、このヒータ
ーに給電するだめの電極およびヒーターの発熱時の酸化
を防止する耐酸化層を設け、この耐酸化層のうちヒータ
ー上の部分にいわゆるキャビテーション現象からこの耐
酸化層を保護するために、例えば金属から成る耐キャビ
テーション層を設け、更に耐インク層として、ヒーター
上部以外の部分に有機物層を設け、かかる基板上に硬化
樹脂膜にパターニング処理を施して硬化樹脂膜によって
インク通路を形成したインクジェット記録ヘッドが提案
されている。
As one of the methods for such inkjet recording,
A heater as an energy generator, an electrode to supply power to the heater, and an oxidation-resistant layer to prevent oxidation when the heater generates heat are provided on the substrate. In order to protect the oxidation-resistant layer, an anti-cavitation layer made of metal, for example, is provided, and an organic layer is provided as an ink-resistant layer in areas other than the top of the heater, and the cured resin film is patterned on the substrate and cured. An inkjet recording head in which an ink passage is formed by a resin film has been proposed.

この場合に、インク通路を形成する硬化樹脂膜の被着さ
れる基板表面上には、耐キヤビテーシヨン層と耐インク
層の2層、あるいはさらに耐酸化層をも含めた3層の膜
が段違いに露出されることになるので、これら各種膜の
反射率が異なることに起因して、硬化樹脂膜にパターニ
ングを施す際の露光がこれら各種膜に対応して異なる。
In this case, two layers, an anti-cavitation layer and an ink-resistant layer, or three layers, including an oxidation-resistant layer, are formed at different levels on the surface of the substrate on which the cured resin film forming the ink passage is adhered. Because these various films have different reflectances, the exposure when patterning the cured resin film differs depending on these various films.

これがため、パターニングにより形成されたインク通路
の寸法は一様でなくなり、設計寸法通りに連続したイン
ク通路を形成しにくいという問題がある。特に、インク
通路となる硬化樹脂膜はその厚みに高精度を要求される
ので露光量の差によって厚みなどの差は顕著に現われる
ことになる。
Therefore, the dimensions of the ink passages formed by patterning are not uniform, and there is a problem that it is difficult to form continuous ink passages according to the designed dimensions. In particular, since the cured resin film that serves as the ink passage requires high precision in its thickness, differences in thickness etc. will be noticeable due to differences in exposure amount.

さらにまた、反射率の最も高い部分、例えば、ヒーター
上の耐キヤビテーシヨン層上のインク通路となる硬化樹
脂膜における適正露光量と同一の露光量を、反射率の最
も低い部分、例えば、耐インク層(有機物層)に与えた
場合には、硬化樹脂膜は、全体として露光量不足となり
、充分な重合が得られず、現像の際に基板よりインク通
路壁が剥離してしまい、歩留りが非常に悪いという欠点
があった。
Furthermore, the exposure amount that is the same as the proper exposure amount in the cured resin film that will become the ink passage on the cavitation-resistant layer on the heater, is applied to the part with the lowest reflectance, for example, on the ink-resistant layer. (organic material layer), the cured resin film will be exposed to insufficient light as a whole, and sufficient polymerization will not be obtained, and the ink passage wall will peel off from the substrate during development, resulting in a very low yield. There was a downside to it being bad.

[目 的] 本発明は」皿体欠点に鑑み成されたもので、その目的は
、精密であり、しかも、信頼性の高いインクジェット記
録ヘッドを製造することのできる方法を提供することに
ある。
[Objective] The present invention was made in view of the drawbacks of plate bodies, and its object is to provide a method for manufacturing a precise and highly reliable inkjet recording head.

本発明の他の目的は、インク通路を精度良くかつ設計に
忠実に微細加工することのできるインクジェット記録ヘ
ッドの製造方法を提供することにある。
Another object of the present invention is to provide a method for manufacturing an inkjet recording head that allows fine processing of ink passages with high precision and faithfulness to the design.

本発明のさらに他の目的は、使用耐久性に優れ、基板と
流路壁との剥離が起こらないインクジェット記録ヘッド
の製造方法を提供することにある。
Still another object of the present invention is to provide a method for manufacturing an inkjet recording head that has excellent durability in use and does not cause peeling between the substrate and the channel wall.

本発明のさらに他の目的は、インクエネルギー発生体を
設けた基板上に、硬化樹脂膜から成るインク通路壁を設
けたインクジェット記録ヘッドを製造するにあたって、
反射率の異なる2種類以上の被着面上にまたがって、イ
ンク通路をパターニング形成するに際し、各被着面の反
射率に応じて、硬化樹脂膜に与える露光量を制御するイ
ンクジェット記録ヘッドの製造方法を提供することにあ
る。
Still another object of the present invention is to manufacture an inkjet recording head in which an ink passage wall made of a cured resin film is provided on a substrate provided with an ink energy generator.
Manufacture of an inkjet recording head that controls the amount of exposure given to a cured resin film according to the reflectance of each adhering surface when patterning ink passages across two or more adhering surfaces with different reflectances. The purpose is to provide a method.

本発明のさらに他の目的は、上述の露光量を制御するに
あたり、第1回目の露光によってインク通路壁となる部
分全体を露光した後に、被着面の反射率が低い部分のみ
に対して更に第2回目の露光を行うインクジェット記録
ヘッドの製造方法を提供することにある。
Still another object of the present invention is that in controlling the above-mentioned exposure amount, after the entire portion that will become the ink passage wall is exposed in the first exposure, further An object of the present invention is to provide a method for manufacturing an inkjet recording head that performs second exposure.

[実 施 例] 以下に、図面を参照して本発明の詳細な説明する。[Example] The present invention will be described in detail below with reference to the drawings.

本発明によるインクジェット記録ヘッドの製造方法の一
実施例における順次の工程を第1A図。
FIG. 1A shows sequential steps in an embodiment of the method for manufacturing an inkjet recording head according to the present invention.

第1B図ないし第13図を参照して説明する。This will be explained with reference to FIGS. 1B to 13.

まず基板l上にエネルギー発生体となるヒーター2、お
よびヒーター2に給電するための電極3を、第1A図お
よび第1B図に示すように、工、チング、スクリーン印
刷等により形成する。
First, a heater 2 serving as an energy generator and an electrode 3 for supplying power to the heater 2 are formed on a substrate 1 by machining, etching, screen printing, etc., as shown in FIGS. 1A and 1B.

第2図の工程では、発熱時のヒーター2の酸化を防止す
るために、例えば5i02のような耐酸化層4をスパッ
タリング等によって形成する。
In the process shown in FIG. 2, an oxidation-resistant layer 4 such as 5i02 is formed by sputtering or the like in order to prevent the heater 2 from being oxidized when it generates heat.

第3図の工程では、ヒーター2を発熱させて、後述する
ようにして形成したインク通路内のインクを発泡させた
場合に起きるいわゆるキャビテーション現象による耐酸
化層4の破裂を防止するために、耐キャビテーション層
5として例えばTa等の金属膜を形成する。
In the process shown in FIG. 3, the oxidation-resistant layer 4 is prevented from bursting due to the so-called cavitation phenomenon that occurs when the heater 2 generates heat and the ink in the ink passage formed as described below foams. For example, a metal film such as Ta is formed as the cavitation layer 5.

次の第4A図に示す上程では、電極3とインクとを完全
にしヤ断するために、耐インク性のある有機物、例えば
ポリイミド等により耐インク層6を形成する。第6A図
の工程を経た基板を上方よ(1見ると第6B図のように
なる。次いで、第5図に示すようにインク通路壁を形成
するための硬化樹脂膜7、例えばドライフィルムをラミ
ネートする。その後に、第6A図に示すように、インク
通路壁をパターニング形成するために、硬化樹脂膜7上
に、第6B図に示すようにノズル壁となる部分のみ透明
なフォトマスク20を周知の方法で位置合せして配置し
、次いで露光を行う。
In the next step shown in FIG. 4A, an ink-resistant layer 6 is formed of an ink-resistant organic material, such as polyimide, in order to completely disconnect the electrode 3 from the ink. The substrate that has gone through the process of FIG. 6A is lifted upward (1) and it looks like FIG. 6B. Next, as shown in FIG. Then, as shown in FIG. 6A, in order to pattern the ink passage walls, a photomask 20 that is transparent only in the portion that will become the nozzle wall is placed on the cured resin film 7, as shown in FIG. 6B. Align and arrange using the method described above, and then perform exposure.

ここで第4B図に示した如く、インク流路壁が形成され
る部分は、金属等から成る耐キャビテーション層5と有
機物から成る耐インク層6の2種類の膜にまたがって形
成しなければならないが、耐インク層8の反射率が耐キ
ヤビテーシヨン層5の反射率に比べて著しく低いので、
耐キャビテーション層5上の硬化樹脂11!I7に与え
る露光量と同一の露光量を耐インク層6上の硬化樹脂膜
7に与えた場合、すなわち、フォトマスク20を用いて
1回のみ露光を行った場合には、耐インク層6上の硬化
樹脂膜7は、露光量不足となり、充分に重合が進まず、
現像後の流路壁の幅が小さくなってしまう。一方、耐キ
ャビテーション層5上の硬化樹脂jiff 7は、設計
寸法通りに仕上るから、耐インク層6と耐キャビテーシ
ョン層5の境界部においてインク流路に凸部が生じてし
まい、正常なインクの通過を妨げ、吐出特性に大きな影
響を与えてしまう。
As shown in FIG. 4B, the part where the ink flow path wall is formed must be formed across two types of films: the anti-cavitation layer 5 made of metal or the like and the ink-resistant layer 6 made of organic material. However, since the reflectance of the ink-resistant layer 8 is significantly lower than that of the cavitation-resistant layer 5,
Cured resin 11 on anti-cavitation layer 5! When the same exposure amount as that given to I7 is given to the cured resin film 7 on the ink-resistant layer 6, that is, when exposure is performed only once using the photomask 20, the amount of exposure given to the ink-resistant layer 6 is The cured resin film 7 has an insufficient amount of exposure, and polymerization does not proceed sufficiently.
The width of the channel wall after development becomes small. On the other hand, since the cured resin jiff 7 on the anti-cavitation layer 5 is finished according to the designed dimensions, a convex portion is generated in the ink flow path at the boundary between the ink-resistant layer 6 and the anti-cavitation layer 5, preventing normal ink passage. This will have a major impact on the ejection characteristics.

そこで、本発明では、第7A図および第7B図に示す如
く、耐キャビテーション層に対応する部分を不透明とし
たフォトマスク30を用いて、第7A図に示すように第
6A図と同様の処理をして、再度所定の露光量を与える
。これにより、設計寸法通りの連続なインク流路を形成
することができる。
Therefore, in the present invention, as shown in FIGS. 7A and 7B, using a photomask 30 whose portion corresponding to the anti-cavitation layer is opaque, the same process as in FIG. 6A is performed as shown in FIG. 7A. Then, apply the predetermined exposure amount again. Thereby, it is possible to form a continuous ink flow path according to the designed dimensions.

ff18図は、第7A図のA−A線断面図である。Figure ff18 is a sectional view taken along the line A-A in Figure 7A.

更に、第8図は、硬化樹脂膜7を現像した後の、第7A
図のA−A線に対応する断面図であり、インク流路9か
形成されている。次いで第1θ図に示すように、インク
通路9に覆いlOを設ける。
Furthermore, FIG. 8 shows the 7A after developing the cured resin film 7.
This is a sectional view taken along the line A-A in the figure, and an ink flow path 9 is formed. Next, as shown in FIG. 1θ, a cover 10 is provided over the ink passage 9.

以」二の工程を経て製造されたインクジェット記録ヘッ
トの外観を第11図に模式的斜視図で示す。
FIG. 11 shows a schematic perspective view of the appearance of the inkjet recording head manufactured through the above two steps.

第11図において、インク通路9はインク供給室9−1
およびインク細流路9−2を有する。11はインク供給
室8−1に不図示のインク供給管を連結させるために層
1,4.5にあけた貫通孔を示している。
In FIG. 11, the ink passage 9 is connected to the ink supply chamber 9-1.
and an ink narrow channel 9-2. Reference numeral 11 indicates a through hole formed in the layer 1, 4.5 for connecting an ink supply pipe (not shown) to the ink supply chamber 8-1.

以上のようにしてインク通路9を形成した基板とインク
通路8の覆い10との接合が完了した後、第11図およ
び第12図に示すC−C線に沿って切断する。これは、
インク細流路9−2においてインクエネルギー発生体2
とインク吐出口8−3との間隔を最適化するために行う
ものであり、それに応じて切断する領域は適宜決定され
る。
After the substrate on which the ink passages 9 are formed as described above and the cover 10 of the ink passages 8 are bonded together, the substrate is cut along the line CC shown in FIGS. 11 and 12. this is,
Ink energy generator 2 in ink narrow channel 9-2
This is done to optimize the distance between the ink discharge port 8-3 and the ink ejection port 8-3, and the area to be cut is appropriately determined accordingly.

この切断には、半導体工業で通常採用されているダイシ
ング法を採用することかできる。
For this cutting, a dicing method commonly used in the semiconductor industry can be used.

次いで第13図に示すように、貫通孔11にインク供給
管12を取り付けて、インクジェット記録ヘッドが完成
する。
Next, as shown in FIG. 13, the ink supply tube 12 is attached to the through hole 11, and the inkjet recording head is completed.

L述した図示実施例においては、インク通路壁となる硬
化樹脂膜へ与える露光量を制御する方法として、2種類
のフォトマスクを用いて2回にわたって露光したが、本
発明はこれにのみ限られない。フォトマスク用いないで
露光する。例えば、ビーム露光法、フォ)・プロア)法
等を用いて被着面の反則率に応した露光量を刊年するよ
うに制御することも有効である。その方法を採用した場
合には、1度目のフォトマスク合せと2度目のフォトマ
スク合せのズレがないから、精度の高いインク通路が得
られる。
In the illustrated embodiment described above, two types of photomasks were used to expose the cured resin film twice as a method of controlling the amount of exposure applied to the cured resin film that forms the ink passage wall, but the present invention is not limited to this. do not have. Expose without using a photomask. For example, it is also effective to control the exposure amount according to the fouling rate of the adhered surface using a beam exposure method, a photoproa method, or the like. When this method is adopted, there is no deviation between the first photomask alignment and the second photomask alignment, so a highly accurate ink path can be obtained.

あるいはまた、図示実施例においては、被着面の反射率
を2種類とした場合について述べたが、3種類以上の反
射率を用いる場合も同様に部分的に複数回露光すること
により、被着面の反射率に応じた露光量を与えることが
できる。
Alternatively, in the illustrated embodiment, the case where two types of reflectance of the adherend surface are used is described, but when using three or more types of reflectance, the adherend can be similarly exposed by partially exposing the surface multiple times. The amount of exposure can be given according to the reflectance of the surface.

[効 果1 以」二に詳しく説明したように、本発明によれば次のよ
うな種々の効果を発揮することができる。
[Effect 1] As explained in detail in Section 2, the present invention can exhibit the following various effects.

反射率の異なる被着面上にまたがって、硬化樹脂膜から
成るインク通路をパターン形成する場合でも、流路寸法
が被着面に依らず一様で連続なインク流路寸法が得られ
るから、吐出特性が安定なヘッドが得られる。
Even when patterning ink passages made of a cured resin film across adherend surfaces with different reflectances, uniform and continuous ink flow path dimensions can be obtained regardless of the adherend surface. A head with stable ejection characteristics can be obtained.

また、インク通路が精度良く、設計に忠実に微細加工さ
れたインクジェット記録ヘッドが得られる。
Furthermore, an inkjet recording head can be obtained in which the ink passages are finely machined with high accuracy and faithful to the design.

さらに加えて、硬化樹脂膜の現像において、露光量不足
による基板とインク通路壁の剥離が起きないので、製造
の歩留りが著しく向上する。
In addition, during development of the cured resin film, peeling between the substrate and the ink passage wall due to insufficient exposure does not occur, so the manufacturing yield is significantly improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1A図、第2図、第3図、第4A図、第5図第6A図
、第7A図、第8図、第9図、第1θ図は、本発明のイ
ンクジェット記録ヘッドの製造の順次の工程例を示す断
面図、 第1B図は第1A図に対応する平面図、第4B図は第4
A図に対応する平面図、第6B図、第7B図は本発明で
用いるフォトマスクの2例を示す平面図、 第11図は本発明により製造したインクジェット記録ヘ
ッドを示す斜視図、 第12図は第11図の2−2線断面図、第13図は第1
2図の次の工程を示す断面図である。 l・・・基板、 2・・・インクエネルギー発生体(ヒーター)、3・・
・電極、 4・・・耐酸化層、 5・・・耐キヤビテーシヨン層、 6・・・面子インク層、 7・・・硬化樹脂膜、 9・・・インク通路 9−1 ・・・インク供給室 9−2・・・インク細流路。 8−3・・・インク吐出口、 10・・・インク通路の覆い 11・・・貫通孔、 12・・・インクイ共S合管、 20.30・・・フォトマスク。 第1A図 第1H図 第2図 第3図 第4A図 笥40図 第5図 第6B図 第7A図 口4 第7■図 第8図
1A, 2, 3, 4A, 5, 6A, 7A, 8, 9, and 1θ are sequential steps for manufacturing the inkjet recording head of the present invention. 1B is a plan view corresponding to FIG. 1A, and FIG. 4B is a sectional view showing an example of the process.
A plan view corresponding to FIG. 6B and FIG. 7B are plan views showing two examples of photomasks used in the present invention, FIG. 11 is a perspective view showing an inkjet recording head manufactured according to the present invention, and FIG. 12 is a plan view corresponding to FIG. is a sectional view taken along line 2-2 in Fig. 11, and Fig. 13 is a sectional view taken along line 2-2 in Fig. 11.
FIG. 2 is a sectional view showing the next step of FIG. 2; l...Substrate, 2...Ink energy generator (heater), 3...
- Electrode, 4... Oxidation resistant layer, 5... Cavitation resistant layer, 6... Surface ink layer, 7... Cured resin film, 9... Ink passage 9-1... Ink supply chamber 9-2... Ink narrow channel. 8-3... Ink discharge port, 10... Ink passage cover 11... Through hole, 12... Ink and S joint tube, 20.30... Photomask. Fig. 1A Fig. 1H Fig. 2 Fig. 3 Fig. 4 A drawer 40 Fig. 5 Fig. 6B Fig. 7 A Fig. 4 Fig. 7 ■ Fig. 8

Claims (1)

【特許請求の範囲】 1)飛翔的液滴を形成するだめのオリフィスと該オリフ
ィスより液体を前記液滴として吐出させるために利用さ
れるエネルギー発生体とを備えたインクジェット記録ヘ
ッドの製造力゛法において、 反射率の異なる被着面上に感光性樹脂層を設けてパター
ニングするに際し、前記反射率の違いに応して前記感光
性樹脂層に与える露光量を調整することを特徴とするイ
ンク ジェット記録ヘッドの製造方法。 ・h 2)前記感莞餉脂膜に与える露光量を制御するにあたっ
て、第1回目の露光によってインク流路壁となる部分全
体を露光した後に、前記被着面の反射率の低い部分のみ
に対して更に第2回目の露光を行うことを特徴とする特
許請求の範囲第1項記載のインクジェット記録ヘッドの
製造方法。 (以下、余白)
[Claims] 1) A manufacturing method for an inkjet recording head comprising an orifice for forming flying droplets and an energy generator used to eject liquid as the droplets from the orifice. Inkjet recording characterized in that when patterning a photosensitive resin layer provided on an adhered surface having different reflectances, the amount of exposure given to the photosensitive resin layer is adjusted according to the difference in reflectance. Head manufacturing method.・h2) In controlling the amount of exposure given to the sensitive resin film, after the first exposure has exposed the entire portion that will become the ink flow path wall, only the portion of the adhered surface with low reflectance is exposed. 2. The method of manufacturing an ink jet recording head according to claim 1, further comprising performing a second exposure. (Hereafter, margin)
JP59064110A 1984-03-31 1984-03-31 Method for manufacturing ink jet recording head Expired - Lifetime JPH064333B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59064110A JPH064333B2 (en) 1984-03-31 1984-03-31 Method for manufacturing ink jet recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59064110A JPH064333B2 (en) 1984-03-31 1984-03-31 Method for manufacturing ink jet recording head

Publications (2)

Publication Number Publication Date
JPS60206659A true JPS60206659A (en) 1985-10-18
JPH064333B2 JPH064333B2 (en) 1994-01-19

Family

ID=13248601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59064110A Expired - Lifetime JPH064333B2 (en) 1984-03-31 1984-03-31 Method for manufacturing ink jet recording head

Country Status (1)

Country Link
JP (1) JPH064333B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013091118A1 (en) * 2011-12-22 2013-06-27 Nanotion Ag Method and apparatus for analysis of samples containing small particles

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5793162A (en) * 1980-12-03 1982-06-10 Fujitsu Ltd Manufacture of ink jet head
JPS5830755A (en) * 1981-08-17 1983-02-23 Teijin Ltd Exposing method
JPS58100133A (en) * 1981-12-10 1983-06-14 Toshiba Corp Resist exposing device
JPS591269A (en) * 1982-06-29 1984-01-06 Canon Inc Manufacture of ink jet recording head

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5793162A (en) * 1980-12-03 1982-06-10 Fujitsu Ltd Manufacture of ink jet head
JPS5830755A (en) * 1981-08-17 1983-02-23 Teijin Ltd Exposing method
JPS58100133A (en) * 1981-12-10 1983-06-14 Toshiba Corp Resist exposing device
JPS591269A (en) * 1982-06-29 1984-01-06 Canon Inc Manufacture of ink jet recording head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013091118A1 (en) * 2011-12-22 2013-06-27 Nanotion Ag Method and apparatus for analysis of samples containing small particles

Also Published As

Publication number Publication date
JPH064333B2 (en) 1994-01-19

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