JPS60202959A - Package for semiconductor device - Google Patents

Package for semiconductor device

Info

Publication number
JPS60202959A
JPS60202959A JP5824284A JP5824284A JPS60202959A JP S60202959 A JPS60202959 A JP S60202959A JP 5824284 A JP5824284 A JP 5824284A JP 5824284 A JP5824284 A JP 5824284A JP S60202959 A JPS60202959 A JP S60202959A
Authority
JP
Japan
Prior art keywords
thermal expansion
semiconductor device
support wall
expansion coefficient
wall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5824284A
Other languages
Japanese (ja)
Inventor
Hideki Watanabe
秀樹 渡邊
Masakazu Yamamoto
雅一 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5824284A priority Critical patent/JPS60202959A/en
Publication of JPS60202959A publication Critical patent/JPS60202959A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/42Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
    • H01L23/433Auxiliary members in containers characterised by their shape, e.g. pistons
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15312Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a pin array, e.g. PGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/1615Shape
    • H01L2924/16195Flat cap [not enclosing an internal cavity]

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To make a package compact, by forming a supporting wall member with a material, whose thermal expansion coefficient is approximately equal to the thermal expansion coefficient of a substrate, and imparting flexibility to the member. CONSTITUTION:A supporting wall 9 is fixed approximately vertically with a semiconductor-device mounting surface at the lower end part of the wall. The wall is made of Cobal, which has the thermal expansion coefficient that is approximately equal to the thermal expansion coefficient of a ceramic substrate 1. Therefore the wall is directly soldered by gold, tin and the like. An annular groove 10 is formed in the supporting wall 9 so as to reduce the rigidity of the supporting wall 9 and to impart flexibility. Therefore, thermal stress due to the difference in thermal expansion coefficients of a water cooled heat sink 6 and the ceramic substrate 1 is absorbed by the supporting wall 9.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、半導体デバイス用パッケージに関する。[Detailed description of the invention] [Field of application of the invention] The present invention relates to packages for semiconductor devices.

〔発明の背景〕[Background of the invention]

従来の半導体デバイス用パッケージとして、セラミック
基板の端部を越えて外方へ水平に延びた環状フランジに
、クランプ部材を介しキャンプを取付ける構造としたも
のがある(特開昭56−7457号)。このような構造
にすると、キャップの熱膨張係数をセラミック基板の熱
膨張係数に整合させる必要がないため、キャップの材料
として。
A conventional semiconductor device package has a structure in which a camp is attached via a clamp member to an annular flange extending horizontally outward beyond the edge of a ceramic substrate (Japanese Patent Application Laid-open No. 7457/1983). With this structure, there is no need to match the thermal expansion coefficient of the cap to that of the ceramic substrate, so it is not necessary to match the thermal expansion coefficient of the cap to the ceramic substrate.

アルミニウムのような高熱伝導材料を使うことができ、
パッケージの冷却性能を高めることができる。しかし、
環状フランジとキャップの一部およびクランプ部材がセ
ラミック基板の外側に突き出るため、パッケージ相互間
の配線が長くなり、高密度化、高速化をより要求される
場合には改善の余地がある。
High thermal conductivity materials such as aluminum can be used,
The cooling performance of the package can be improved. but,
Since the annular flange, part of the cap, and the clamp member protrude outside the ceramic substrate, the wiring between the packages becomes long, and there is room for improvement when higher density and higher speed are required.

〔発明の目的〕[Purpose of the invention]

本発明は基板の端部から突き出る部分をなくしたコンパ
クトな半導体デバイス用パッケージを提供することにあ
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a compact package for a semiconductor device that eliminates a portion protruding from the edge of a substrate.

〔発明の概要〕[Summary of the invention]

本発明は、基板の端部から外側に突き出る部分をなくす
るために、基板の半導体デバイス搭載面に対しほぼ垂直
に延びた環状支持壁部材を、半導体デバイス搭載面に固
着し、この支持壁部材と共に半導体デバイス搭載面を封
止するための部材を支持壁部材に固着する。また、支持
壁部材を基板の熱膨張係数とほぼ整合する熱膨張係数を
有する材質により形成し、かつ可撓性を付与することに
より、封止のための部材の材料を任意に選べるようにす
る。
In order to eliminate the portion protruding outward from the edge of the substrate, the present invention fixes an annular support wall member extending substantially perpendicularly to the semiconductor device mounting surface of the substrate to the semiconductor device mounting surface, and this support wall member At the same time, a member for sealing the semiconductor device mounting surface is fixed to the support wall member. Furthermore, by forming the support wall member from a material having a thermal expansion coefficient that almost matches that of the substrate and providing flexibility, the material for the sealing member can be arbitrarily selected. .

〔発明の実施例〕[Embodiments of the invention]

第1図は本発明の一実施例を示す概略断面図である。こ
の図において、1は多層のセラミック基板であり、その
上面(半導体デバイス搭載面)には、複数の半導体デバ
イス2が半田3により電気的および物理的に接続されて
いる。セラミック基(反1の下面にはパッケージ内部と
外部との電気的接続用の110ピン4がロー付けされて
いる。
FIG. 1 is a schematic sectional view showing an embodiment of the present invention. In this figure, 1 is a multilayer ceramic substrate, and a plurality of semiconductor devices 2 are electrically and physically connected to its upper surface (semiconductor device mounting surface) by solder 3. A 110 pin 4 for electrical connection between the inside of the package and the outside is soldered to the bottom surface of the ceramic base (1).

6は水冷ヒートシンクであり、アルミニウム。6 is a water-cooled heat sink, which is made of aluminum.

銅等の高熱伝導材料で作られており、内部に冷却水を流
すための管路7が設けられている。9は水冷ピー1−シ
ンクロを支持するための環状の支持壁である。この支持
壁9はその下端部において半導体デバイス搭載面にほぼ
垂直に固着されるが、セラミック基板1の熱膨張係数に
ほぼ整合する熱膨張係数を持ったコバール(KOVER
)で作られているため、金スズ等により直接的にロー付
け(I6)されている。上記水冷ヒートシンク6は、環
状ガスケット11を介してねじ12により支持壁9の上
端に固着される。このように、ねじ12によって固着す
るようになっているため、単導体デバイス2の交換、配
線変更等の際にパッケージの開封および再封止を容易に
行うことができる。
It is made of a highly thermally conductive material such as copper, and is provided with a pipe 7 for flowing cooling water inside. 9 is an annular support wall for supporting the water-cooled P1 synchro. This support wall 9 is fixed at its lower end almost perpendicularly to the semiconductor device mounting surface, and is made of KOVER, which has a thermal expansion coefficient that almost matches the thermal expansion coefficient of the ceramic substrate 1.
), it is directly soldered (I6) with gold tin, etc. The water-cooled heat sink 6 is fixed to the upper end of the support wall 9 with screws 12 via an annular gasket 11 . Since the package is fixed by the screws 12 in this way, the package can be easily opened and resealed when replacing the single conductor device 2 or changing the wiring.

上記支持壁9には環状の切り込み10が形成され、支持
壁9の剛性を減らし、支持壁9に可撓性を付与している
。このように支持壁9に可撓性を付与することにより、
水冷ビー1〜シンクロとセラミック基板1の熱膨張係数
の違いによる熱応力を支持壁9によって吸収している。
An annular notch 10 is formed in the support wall 9 to reduce the rigidity of the support wall 9 and provide flexibility to the support wall 9. By imparting flexibility to the support wall 9 in this way,
Thermal stress due to the difference in thermal expansion coefficient between the water-cooled bee 1 to the synchro and the ceramic substrate 1 is absorbed by the support wall 9.

その結果、セラミック基板lとの熱膨張係数の整合を意
識することなく、水冷ヒートシンク6の材料として高熱
伝導材料を選び冷却効果を最高度に高めることができる
。水冷ヒートシンク6の内面には、半導体デバイス2の
発熱を水冷ヒートシンク6に効率よく伝達するための熱
伝導素子5が設けられ、この熱伝導素子5は半導体デバ
イス2の背面に接触する。
As a result, a high thermal conductivity material can be selected as the material for the water-cooled heat sink 6 and the cooling effect can be maximized without being conscious of matching the coefficient of thermal expansion with the ceramic substrate l. A heat conductive element 5 is provided on the inner surface of the water-cooled heat sink 6 for efficiently transmitting heat generated by the semiconductor device 2 to the water-cooled heat sink 6, and this heat conductive element 5 contacts the back surface of the semiconductor device 2.

ここで、第1図に明瞭に示されるように、支持壁9は半
導体デバイス搭載面に対してほぼ垂直に延びており、支
持壁9およびそれに支持された水冷ヒートシンク6は、
従来のようにセラミック基1反1の端部から外側に突出
することはなくなる。
Here, as clearly shown in FIG. 1, the support wall 9 extends almost perpendicularly to the semiconductor device mounting surface, and the support wall 9 and the water-cooled heat sink 6 supported by it are
The ceramic base 1 no longer protrudes outward from the end of the ceramic base 1 as in the conventional case.

従って、コンパクトな半導体デバイス用パッケージを実
現でき、パッケージの一層高密度な実装が可能となる。
Therefore, it is possible to realize a compact package for a semiconductor device, and it is possible to package the package at a higher density.

さらにパッケージ間相互配線の長さも短縮され、配線遅
延も減少されるため、システ11の一層の高速化を図る
ことができる。
Furthermore, the length of the inter-package interconnections is shortened and the interconnection delay is also reduced, making it possible to further speed up the system 11.

第2図は本発明の他の実施例を示す概略断面図である。FIG. 2 is a schematic sectional view showing another embodiment of the present invention.

本実施例においては、セラミック基板1の熱膨張係数と
ほぼ整合する熱膨張係数を持つ4270イの薄板にて可
撓性のある環状支持壁9を形成している。そして、水冷
ヒートシンク6を支持壁9の上端に拡散接合(21)に
より固着し、支持壁9の下端を低温半田(22)により
半導体デバイス搭載面に固着している。支持壁9と半導
体デバイス搭載面の着脱は、低温半田22の部分で容易
に行うことができるので、パッケージの開封、再封止の
作業は簡単である。これ以外は上記実施例と同様である
In this embodiment, the flexible annular support wall 9 is formed of a 4270 mm thin plate having a coefficient of thermal expansion substantially matching that of the ceramic substrate 1. The water-cooled heat sink 6 is fixed to the upper end of the support wall 9 by diffusion bonding (21), and the lower end of the support wall 9 is fixed to the semiconductor device mounting surface by low-temperature solder (22). Since the support wall 9 and the semiconductor device mounting surface can be easily attached and detached at the low-temperature solder 22, the work of opening and resealing the package is easy. Other than this, this embodiment is the same as the above embodiment.

第3図は第2図に示した実施例の変形例を示す概略断面
図である。この例においては、支持壁9を2山のベロー
ズとして形成し、支持壁9の可撓性を高めている。これ
以外は上記実施例と同様である。
FIG. 3 is a schematic sectional view showing a modification of the embodiment shown in FIG. 2. In this example, the support wall 9 is formed as a double bellows to increase the flexibility of the support wall 9. Other than this, this embodiment is the same as the above embodiment.

第4図は本発明の別の実施例を示す概略断面図である。FIG. 4 is a schematic cross-sectional view showing another embodiment of the present invention.

この実施例においては、水冷ヒートシンクの代わりにア
ルミニウムや銅等の高熱伝導材料で作られた空冷ヒート
シンク36が設けられ、この空冷ヒートシンク36と半
導体デバイス2は、物理的に不活性な熱伝導ペースト3
5によって熱的に結合されている。支持壁9は、コバー
ルの薄肉材料で1山のベローズに形成されている。また
I10ピン4はフラットリードとなっている。これ以外
は上記各実施例と同様である。
In this embodiment, an air-cooled heat sink 36 made of a highly thermally conductive material such as aluminum or copper is provided instead of a water-cooled heat sink, and the air-cooled heat sink 36 and the semiconductor device 2 are connected to a physically inert thermally conductive paste 3.
5. The support wall 9 is made of a thin Kovar material and is formed into a single bellows. Also, I10 pin 4 has a flat lead. Other than this, it is the same as each of the above embodiments.

この実施例のパッケージは、搭載される半導体デバイス
の個数が少ない場合や、半導体デバイスの発熱量が少な
い場合に好適である。
The package of this embodiment is suitable when the number of semiconductor devices to be mounted is small or when the amount of heat generated by the semiconductor devices is small.

〔発明の効果〕〔Effect of the invention〕

本発明によれば次にような効果が達成できる。 According to the present invention, the following effects can be achieved.

(イ) 基板の端部から外部に突出する部分がなくなり
パッケージがコンパクトになる。従って。
(b) There is no part protruding from the edge of the board to the outside, making the package more compact. Therefore.

パッケージ実装密度を従来より向上でき、またパッケー
ジ相互配線の長さが短縮し、その配線遅延の減少により
システムの高速化を達成することができる。
The packaging density of the package can be improved compared to the conventional method, and the length of interconnections between the packages can be shortened, and the wiring delay can be reduced, thereby increasing the speed of the system.

(ロ)支持壁部材に可撓性を付与したため、パッケージ
の天板部材(前記各実施例のヒートシンク)を、基板と
の熱膨張係数の整合を考慮することなく、高熱伝導材料
を用いて形成することができ、高い冷却性能を得ること
ができる。
(b) Since flexibility is imparted to the support wall member, the top plate member of the package (heat sink in each of the above embodiments) is formed using a highly thermally conductive material without considering matching of the coefficient of thermal expansion with the substrate. It is possible to obtain high cooling performance.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ないし第4図はそれぞれ本発明の別異の実施例を
示す概略断面図である。 1・・・セラミック基板、2・・・半導体デバイス、4
・・・I10ピン、5・・・熱伝導素子。 6・・・水冷ヒートシンク、9・・・支持壁、10・・
・切り込み、36・・・空冷ヒートシンク、35・・・
熱伝導ペースト。
1 to 4 are schematic sectional views showing different embodiments of the present invention. 1... Ceramic substrate, 2... Semiconductor device, 4
...I10 pin, 5...thermal conduction element. 6...Water-cooled heat sink, 9...Supporting wall, 10...
・Notch, 36... Air cooling heat sink, 35...
Thermal conductive paste.

Claims (1)

【特許請求の範囲】[Claims] (1)半導体デバイスが搭載される基板と、該基板の半
導体デバイス搭載面に固着され、該半導体デバイス搭載
面からほぼ垂直に延びた環状の支持壁部材と、該半導体
デバイス搭載面を覆うように該支持壁部材に固着支持さ
れ、該支持壁部材と協働して該半導体デバイス搭載面を
封止する部材とを具備し、該支持壁部材は該基板の熱膨
張係数とほぼ整合する熱膨張係数を有す材質から成り、
かつ可撓性を有することを特徴とする半導体デバイス用
パッケージ。
(1) A substrate on which a semiconductor device is mounted, an annular support wall member fixed to the semiconductor device mounting surface of the substrate and extending substantially perpendicularly from the semiconductor device mounting surface, and a ring-shaped support wall member that covers the semiconductor device mounting surface. a member that is fixedly supported by the support wall member and cooperates with the support wall member to seal the semiconductor device mounting surface, the support wall member having a thermal expansion coefficient substantially matching a coefficient of thermal expansion of the substrate. Made of material with a coefficient,
A semiconductor device package characterized by having flexibility.
JP5824284A 1984-03-28 1984-03-28 Package for semiconductor device Pending JPS60202959A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5824284A JPS60202959A (en) 1984-03-28 1984-03-28 Package for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5824284A JPS60202959A (en) 1984-03-28 1984-03-28 Package for semiconductor device

Publications (1)

Publication Number Publication Date
JPS60202959A true JPS60202959A (en) 1985-10-14

Family

ID=13078639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5824284A Pending JPS60202959A (en) 1984-03-28 1984-03-28 Package for semiconductor device

Country Status (1)

Country Link
JP (1) JPS60202959A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6985668B2 (en) 2003-07-15 2006-01-10 National Semiconductor Corporation Multi-purpose optical light pipe

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6985668B2 (en) 2003-07-15 2006-01-10 National Semiconductor Corporation Multi-purpose optical light pipe

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