JPS60193618A - Manufacture of aromatic polyimide film - Google Patents

Manufacture of aromatic polyimide film

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Publication number
JPS60193618A
JPS60193618A JP4934184A JP4934184A JPS60193618A JP S60193618 A JPS60193618 A JP S60193618A JP 4934184 A JP4934184 A JP 4934184A JP 4934184 A JP4934184 A JP 4934184A JP S60193618 A JPS60193618 A JP S60193618A
Authority
JP
Japan
Prior art keywords
aromatic
film
acid
polyamic acid
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4934184A
Other languages
Japanese (ja)
Other versions
JPS635421B2 (en
Inventor
Yoshikazu Sasaki
義和 佐々木
Hiroshi Inoue
浩 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP4934184A priority Critical patent/JPS60193618A/en
Publication of JPS60193618A publication Critical patent/JPS60193618A/en
Publication of JPS635421B2 publication Critical patent/JPS635421B2/ja
Granted legal-status Critical Current

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  • Moulding By Coating Moulds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To contrive to separate easily a self supporting film from a base body by a method in which at the manufacture of aromatic polyimide film by casting process, the aromatic polyamix acid solution containing a specified amount of carboxylic acid, is cast on a base body and is made into a film by drying. CONSTITUTION:Aromatic polyamix acid solution contains 0.01-70pts.wt. carboxylic acid shown by a general formula RCOOH to 100pts.wt. aromatic polyamix acid. Said solution has 4-35wt% polymer concentration and logarithmic viscosity with the molecular weight equal to or larger than 0.2. Said solution is filtered and deareated, and then is cast with uniform thickness on a metallic drum from a hopper and a T-die. Then it is heated by hot blast or infrared ray, etc. and the solvent therein is gradually removed. The solution is preliminarily dried until it has self supporting property. Next, the film with self supporting property is separated from the metallic drum.

Description

【発明の詳細な説明】 本発明はカルボン酸を内部添加剤として特定量含有する
芳香族ポリアミック酸溶液を流延法で製膜する芳香族ポ
リイミドフィルムの製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an aromatic polyimide film in which an aromatic polyamic acid solution containing a specific amount of carboxylic acid as an internal additive is formed by a casting method.

芳香族ポリイミドフィルムは、芳香族ポリアミック酸溶
液を基体上にフィルム状に流延し、加熱して自己支持性
フィルムになるまで溶剤を蒸発させ、基体から自己支持
性のポリアミック酸フィルムを剥離し、更に加熱して残
存する溶剤の除去及びポリアミック酸のイミド化を完結
する方法によって製造される。しかしながら従来公知の
方法は。
Aromatic polyimide film is produced by casting an aromatic polyamic acid solution onto a substrate in the form of a film, heating it to evaporate the solvent until it becomes a self-supporting film, and peeling off the self-supporting polyamic acid film from the substrate. It is manufactured by a method in which the remaining solvent is removed by further heating and the imidization of the polyamic acid is completed. However, conventionally known methods.

基体から自己支持性フィルムを剥離することが容易でな
く、剥離中に裂けたり、傷ついだりするという欠点を有
している。
The self-supporting film is not easy to peel off from the substrate and has the disadvantage of being torn or damaged during peeling.

本発明者らは、前述の欠点を有さない芳香族ポリイミド
フィルムの製造法について鋭意研究した結果、カルボン
酸を特定量含有する芳香族ポリアミック酸溶液を基体上
に流延し乾燥製膜すると。
The present inventors conducted extensive research on a method for producing an aromatic polyimide film that does not have the above-mentioned drawbacks, and found that an aromatic polyamic acid solution containing a specific amount of carboxylic acid was cast onto a substrate and dried to form a film.

自己支持性フィルムは基体から容易に剥離することを見
出し1本発明を完成した。
The present invention was completed by discovering that a self-supporting film can be easily peeled off from a substrate.

すなわち1本発明は、流延法による芳香族ポリイミドフ
ィルムの製造方法において。
That is, one aspect of the present invention is a method for producing an aromatic polyimide film by a casting method.

芳香族ポリアミック酸100重量部に対して。Based on 100 parts by weight of aromatic polyamic acid.

一般式 (式中、Rは置換・非置換のアルキル基、シクロアルキ
ル基またはアリール基である。)で示されるカルボン酸
を0.01〜70重量部含有する芳香族ポリアミック酸
溶液を、基体上に流延し乾燥後、該基体から自己支持性
のポリアミック酸フィルムを剥離し、更に加熱して溶媒
を除去しポリアミック酸をイミド化することを特徴とす
る芳香族ポリイミドフィルムの製造方法に関するもので
ある。
An aromatic polyamic acid solution containing 0.01 to 70 parts by weight of a carboxylic acid represented by the general formula (wherein R is a substituted or unsubstituted alkyl group, cycloalkyl group, or aryl group) is applied onto a substrate. This relates to a method for producing an aromatic polyimide film, which comprises casting the polyamic acid film on a substrate, peeling the self-supporting polyamic acid film from the substrate after drying, and further heating to remove the solvent and imidize the polyamic acid. be.

本発明において使用される芳香族ポリアミック酸溶液は
2例えば有機極性溶剤中で芳香族テトラカルボン酸成分
と芳香族ジアミン成分とを反応させることによって得ら
れる。
The aromatic polyamic acid solution used in the present invention is obtained by reacting an aromatic tetracarboxylic acid component and an aromatic diamine component in, for example, an organic polar solvent.

前記の芳香族テトラカルボン酸成分としては。The aromatic tetracarboxylic acid component is as follows.

特に制限はなく1例えば3.3’、4.4’−ビフェニ
ルテトラカルボン酸二無水物1 2,313’+4’−
ビフェニルテトラカルボン酸二無水物、ピロメリット酸
二無水物、ビス(3,4−ジカルボキシフェニル)メタ
ンニ無水物、ビス(ろ、4−ジカルボキシフェニル)エ
ーテルニ無水物、3.a、3’、4’−ベンゾフェノン
テトラカルボン酸二無水物、またはこれらテトラカルボ
ン酸の塩、エステル化誘導体、上記各テトラカルボン酸
類の混合物でもよい。芳香族テトラカルボン酸成分の一
部を他のテトラカルボン酸成分(例えば脂肪族成分)で
おきかえてもよい。
There are no particular limitations. 1 For example, 3.3', 4.4'-biphenyltetracarboxylic dianhydride 1 2,313'+4'-
Biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride, bis(ro,4-dicarboxyphenyl)ether dianhydride, 3. a, 3', 4'-benzophenone tetracarboxylic dianhydride, salts and esterified derivatives of these tetracarboxylic acids, and mixtures of the above-mentioned tetracarboxylic acids. A part of the aromatic tetracarboxylic acid component may be replaced with another tetracarboxylic acid component (for example, an aliphatic component).

前記の芳香族ジアミン成分としては、特に制限はなく1
例えば4,4′−ジアミノジフェニルエーテル、3.3
’−ンアばノジフェニルエーテル、ろ昌′−ジメチルー
4,4′−ジアミノジフェニルエーテル。
The aromatic diamine component mentioned above is not particularly limited, and 1
For example, 4,4'-diaminodiphenyl ether, 3.3
'-N'-Abanodiphenyl ether, Lochang'-dimethyl-4,4'-diaminodiphenyl ether.

名ろ′−ジメトキンー4,4′−ジアミノジフェニルエ
ーテルなどのジフェニルエーテル系ジアミン。
Diphenyl ether diamines such as Naro'-dimethquine-4,4'-diaminodiphenyl ether.

4.4′−ジアミノジフェニルチオエーテル、ろ、3′
−ジフエニルチオエーテルなどのジフェニルチオエーテ
ル糸ジアミン、3.3’−ジアミノベンゾフェノン、4
.4’−ジアミノベンゾフェノンなどのベンゾフヱノン
系ジアミン、ろ、3′−ジアミノジフェニルホスフィン
、4.4’−ジアミノジフェニルホスフィンナトのジフ
ェニルホスフィン系ジアミン、ろ、3′−ジアミノジフ
ェニルメタン、4’、4’−ジアミノジフェニルメタン
などのジフェニルメタン系ジアミ71 0 + m r
 p−フ二二レンジアミンなどを挙げることができる。
4.4'-diaminodiphenylthioether, 3'
- diphenylthioether thread diamines such as diphenylthioether, 3,3'-diaminobenzophenone, 4
.. Benzophenone diamines such as 4'-diaminobenzophenone, filtrate, 3'-diaminodiphenylphosphine, diphenylphosphine diamines such as 4,4'-diaminodiphenylphosphine, filtrate, 3'-diaminodiphenylmethane, 4',4'-diamino Diphenylmethane-based diamides such as diphenylmethane 71 0 + m r
Examples include p-phenyl diamine.

芳香族ジアミン成分の一部を他のジアミン成分(例えば
脂肪族ジアミン成分)でおきかえてもよい。
A part of the aromatic diamine component may be replaced with another diamine component (for example, an aliphatic diamine component).

本発明において芳香族ポリアミック酸として。As an aromatic polyamic acid in the present invention.

乙、 3’、 4. d−ビフェニルテトラカルボン酸
二無水物及び/又はピロメリット酸二無水物と4,4′
−ジアミノジフェニルエーテル及び/又1dp−フェニ
レンジアミンとから得られる芳香族ポリアミック酸が好
ましい。
Otsu, 3', 4. d-biphenyltetracarboxylic dianhydride and/or pyromellitic dianhydride and 4,4'
Aromatic polyamic acids obtained from -diaminodiphenyl ether and/or 1dp-phenylenediamine are preferred.

前記の有機極性溶剤としては、N−メチルピロリドン、
ピリジン、N、N−ジメチルアセトアミド。
As the organic polar solvent, N-methylpyrrolidone,
Pyridine, N,N-dimethylacetamide.

N、N−ジメチルホルムアミド、ジメチルスルホキシド
、テトラメチル尿素、などのポリアミック酸を溶解する
ことができる含窒素化合物からなる溶剤を好適に挙げる
ことができる。これらの有機極性溶剤とともに芳香族炭
化水素の如き有機溶剤との併用も可能である。
Preferred solvents include nitrogen-containing compounds capable of dissolving polyamic acids, such as N,N-dimethylformamide, dimethylsulfoxide, and tetramethylurea. It is also possible to use organic solvents such as aromatic hydrocarbons together with these organic polar solvents.

前記の方法において、芳香族ポリアミック酸溶液中のポ
リマー濃度が3〜40重量%、特に4〜35重量%が好
ましい。
In the above method, the polymer concentration in the aromatic polyamic acid solution is preferably 3 to 40% by weight, particularly 4 to 35% by weight.

また、前記の方法において芳香族ポリアミック酸は、対
数粘度(ろ0℃、濃度Oi 5 f// 100 Kl
溶剤で測定)が0.1以上、特に0.2以上の分子量の
ものであることが好寸しい。
Further, in the above method, the aromatic polyamic acid has a logarithmic viscosity (filtration 0°C, concentration Oi 5 f// 100 Kl
The molecular weight (measured in a solvent) is preferably 0.1 or more, particularly 0.2 or more.

本発明において使用されるカルボン酸は下記の一般式 (式中、Rは置換・非置換のアルキル基、シクロアルキ
ル基またはアリづ・基である。)で示されるものである
The carboxylic acid used in the present invention is represented by the following general formula (wherein R is a substituted or unsubstituted alkyl group, cycloalkyl group, or aryl group).

上記一般式を有するものとして1例えば、酢酸。One example of those having the above general formula is acetic acid.

プロピオン酸、n−酪酸、イン酪酸、n−吉草酸。Propionic acid, n-butyric acid, inbutyric acid, n-valeric acid.

イン吉草酸、メチルエチル酢酸、カプロン酸、ヘプトン
酸、カプリル酸、ペラルゴン酸、カプリン酸、ウンデシ
ル酸、ラウリン酸、ミリスチン酸。
Invaleric acid, methylethyl acetate, caproic acid, heptonic acid, caprylic acid, pelargonic acid, capric acid, undecylic acid, lauric acid, myristic acid.

パルミチン酸、マルガリン酸、ステアリン酸、モノクロ
ル酢酸、ジクロル酢酸、トリクロル酢酸。
Palmitic acid, margaric acid, stearic acid, monochloroacetic acid, dichloroacetic acid, trichloroacetic acid.

モノフルオロ酢酸、ジフルオロ酢酸、ドリブルオロ酢酸
、シアン酢酸、ビニル酢酸、メトキシ酢酸。
Monofluoroacetic acid, difluoroacetic acid, drifluoroacetic acid, cyanacetic acid, vinylacetic acid, methoxyacetic acid.

シクロへブタン酸、シクロヘキサン酸、安息香酸。Cyclohebanoic acid, cyclohexanoic acid, benzoic acid.

フェニル酢酸等をあげることができる。Examples include phenylacetic acid.

芳香族ポリアミック酸溶液に添加するカルボン酸の沸点
が高いと流延した基体から剥離した自己支持性のフィル
ムを更に加熱して残存する溶剤の除去及びイミド化を完
結する工程において、容易に留去せずフィルム中に残存
し、最終的には分解反応を起し、ポリイミドフィルムを
着色したシ。
If the carboxylic acid added to the aromatic polyamic acid solution has a high boiling point, it will be easily distilled off in the process of further heating the self-supporting film peeled off from the cast substrate to remove the remaining solvent and complete imidization. The polyimide film remained in the film, and eventually caused a decomposition reaction and colored the polyimide film.

フィルムにピンホール等の欠陥を生じさせることになる
ので、カルボン酸の沸点は300℃以下であるか又は3
00℃以下の温度で昇華性のあるものが好ましい。
The boiling point of carboxylic acid should be below 300°C or
It is preferable to use a material that sublimes at a temperature of 00° C. or lower.

カルボン酸類は芳香族ポリアミック酸100重量部に対
して、o、o1〜70重量部添加することが必要であり
好ましくは0.1〜60重量部である。
It is necessary to add the carboxylic acids in an amount of 1 to 70 parts by weight, preferably 0.1 to 60 parts by weight, per 100 parts by weight of the aromatic polyamic acid.

カルボン酸の量が前記下限より少ないと効果がなく、カ
ルボン酸の量が前記上限よシ多ぐても特に効果はなくむ
しろ不利である。
If the amount of carboxylic acid is less than the above-mentioned lower limit, there will be no effect, and if the amount of carboxylic acid is more than the above-mentioned upper limit, there will be no particular effect and it will be rather disadvantageous.

前記の方法においてカルボン酸はポリアミック酸溶液の
任意の製造過程で加えることができる。
In the above method, the carboxylic acid can be added at any stage of the preparation of the polyamic acid solution.

すなわち、有機極性溶剤中にカルボン酸を添加した後芳
香族テトラカルボン酸二無水物と芳香族ジアミンとを重
合してもよく1重合中にカルボン酸を添加してもよく2
重合後に添加してもよい。
That is, the aromatic tetracarboxylic dianhydride and the aromatic diamine may be polymerized after adding the carboxylic acid to an organic polar solvent, or the carboxylic acid may be added during one polymerization.
It may be added after polymerization.

本発明の方法において、流延法によって芳香族ポリアミ
ック酸溶液組成物からポリイミドフィルムを製造する方
法は、すでに公知のどのような製造方法で行ってもよく
2例えば、5〜125μの厚さのポリイミドフィルムを
製造する場合には。
In the method of the present invention, the method of producing a polyimide film from an aromatic polyamic acid solution composition by a casting method may be carried out by any known production method2. When manufacturing film.

芳香族ポリアミック酸溶液組成物を濾過及び脱泡し、ホ
ッパー、Tダイより金属ドラム、金属ベルト上に均一の
厚烙に流延し、熱風、赤外線等で60〜160℃に加熱
し溶剤を徐々に除去し自己支持性になるまで前乾燥を行
い1次に金属ドラム又は金属ベルトより自己支持性フィ
ルムを剥離する。この時の自己支持性フィルムの加熱減
量〔420℃で20分間乾燥し2乾燥前のM量WIと乾
燥後の重量W2よシ次式によってめる。
The aromatic polyamic acid solution composition is filtered and defoamed, uniformly cast onto a metal drum or metal belt from a hopper or T-die, and heated to 60 to 160°C with hot air, infrared rays, etc. to gradually remove the solvent. The film is pre-dried until it becomes self-supporting, and then the self-supporting film is peeled off from the metal drum or belt. The heating loss of the self-supporting film at this time [drying at 420° C. for 20 minutes, 2 is determined by the following equation based on the M amount WI before drying and the weight W2 after drying.

加熱減量(重量%)”((W+−wz)/W+)x1o
o〕は15〜605〜60重量部に好ましくは25〜5
55〜55重量部該自己支持性フィルムを更に100〜
450℃の温度で後乾燥してフィルム中に含有きれる溶
剤の除去及びポリアミック酸のアミド−酸結合のイミド
結合への転換を−行い芳香族ポリイミドフィルムを製造
する。後乾燥は該自己支持性フィルムを多数のロール間
を通したり、フィルムの両端をテンターのクリップやピ
ン等で若干の緊張下に保持して行われる。
Heating loss (weight %)” ((W+-wz)/W+) x1o
o] is 15-605-60 parts by weight, preferably 25-5
55 to 55 parts by weight of the self-supporting film and 100 to 55 parts by weight of the self-supporting film.
After drying at a temperature of 450 DEG C., the solvent contained in the film is removed and the amide-acid bond of the polyamic acid is converted into an imide bond to produce an aromatic polyimide film. Post-drying is carried out by passing the self-supporting film between a number of rolls or by holding both ends of the film under slight tension with clips or pins of a tenter.

以下に参考例、実施例および比較例を示す。Reference examples, examples and comparative examples are shown below.

ここで剥離強さは金属板(40mmx 150wm )
にスペーサー(内径20闘×130mm)を置いてポリ
アミック酸溶液を流延し前乾燥後、フィルムの一端を基
体よシ剥離し、引張試験機で90’剥離した時の剥離強
をである。
Here, the peel strength is a metal plate (40mm x 150wm)
A spacer (inner diameter 20 mm x 130 mm) was placed on the film, a polyamic acid solution was cast, and after pre-drying, one end of the film was peeled off from the substrate, and the peel strength was measured by peeling 90' using a tensile tester.

参考例1 N、N−ジメチルアセトアミド2471F中に3、3’
、 4.4’−ビフェニルテトラカルボン酸二無水物2
94.22fとp−フェニレンジアミン10’8.14
1を加え室温で約10時間反応させてポリアミック酸溶
液を得た。このポリアミック酸の対数粘度は2.10で
あり、溶液の30f粘度は1300ボイズであった。
Reference Example 1 3,3' in N,N-dimethylacetamide 2471F
, 4.4'-biphenyltetracarboxylic dianhydride 2
94.22f and p-phenylenediamine 10'8.14
1 was added and reacted at room temperature for about 10 hours to obtain a polyamic acid solution. The logarithmic viscosity of this polyamic acid was 2.10, and the 30f viscosity of the solution was 1300 voids.

参考例2 N、N−ジメチルアセトアミド3037ji’中に6、
ろ/、4 、4/−ビフェニルテトラカルボン酸二無水
物294.22 rと4,4′−ジアミノジフェニルエ
ーテル200.24 fを加え室温で約10時間反応さ
せてポリアミック酸溶液を得た。このポリアミック酸の
対数粘度は1.50であり、溶液の30℃の粘度は11
00ボイズであった。
Reference Example 2 6, in N,N-dimethylacetamide 3037ji'
294.22 r of 4,4/-biphenyltetracarboxylic dianhydride and 200.24 f of 4,4'-diaminodiphenyl ether were added and reacted at room temperature for about 10 hours to obtain a polyamic acid solution. The logarithmic viscosity of this polyamic acid is 1.50, and the viscosity of the solution at 30°C is 11
It was 00 Boys.

参考例3 N、N−ジメチルアセトアミド257OS’中に4.4
′−ジアミノジフェニルエーテル200.24 fを添
加後、ピロメリット酸二無水物218.128i′を加
え約6時間反応してポリアミック酸溶液を得た。このポ
リアミック酸の対数粘度は1.60であシ、溶液の30
℃の粘度ば300ポイスであった。
Reference Example 3 4.4 in N,N-dimethylacetamide 257OS'
After adding 200.24 f of '-diaminodiphenyl ether, 218.128 i of pyromellitic dianhydride was added and reacted for about 6 hours to obtain a polyamic acid solution. The logarithmic viscosity of this polyamic acid is 1.60, and the solution has a logarithmic viscosity of 30
The viscosity at °C was 300 poise.

実施例1〜22および比較例1〜9 参考例1で調製したポリアミック酸溶液の重合体100
重量部に対して、第1表に示す化合物を所定重量部加え
、室温で6時間攪拌してポリアミック酸溶液組成物を得
た。この組成物を第1表に示す金属基体上に0.48の
スペーサーを用いて流延した後、100℃で30分間熱
風乾燥した。金属基体より自己支持性フィルムを剥離し
、更にれらフィルムはいずれも25〜40Kg/−の引
張第 1 表 実施例26〜27および比較例1゜ 参考例2で調製したボリアεツク酸溶液の重合体、10
0重量部に対して、第2表に示す化合物を所定重量部加
え、室温で6時間攪拌してポリアミック酸溶液組成物を
得た。この組成物をステンレいずれも18〜23Kg/
−の引張強さと80〜120チの伸びを示す強靭なもの
であった。結果をまとめて第2表に示す。
Examples 1 to 22 and Comparative Examples 1 to 9 Polymer 100 of the polyamic acid solution prepared in Reference Example 1
A predetermined weight part of the compound shown in Table 1 was added to the weight part, and the mixture was stirred at room temperature for 6 hours to obtain a polyamic acid solution composition. This composition was cast onto the metal substrate shown in Table 1 using a 0.48 spacer, and then dried with hot air at 100° C. for 30 minutes. The self-supporting film was peeled off from the metal substrate, and each of these films was subjected to a tensile strength of 25 to 40 kg/-. polymer, 10
A predetermined weight part of the compound shown in Table 2 was added to 0 weight part, and the mixture was stirred at room temperature for 6 hours to obtain a polyamic acid solution composition. This composition was applied to stainless steel at 18 to 23 kg/
It was strong, exhibiting a tensile strength of - and an elongation of 80 to 120 inches. The results are summarized in Table 2.

実施例28〜ろ0および比較例11 参考例6で調製したポリアミック酸溶液の重合体100
重量部に対して、第3表に示す化合物を所定重量部加え
、室温で6時間攪拌してポリアミック酸溶液組成物を得
だ。この組成物をステンレいずれも16〜22に9/−
の引張強さと60〜100%の伸ひを示す強靭なもので
あった。結果をまとめて第ろ表に示す。
Examples 28 to 0 and Comparative Example 11 Polymer 100 of the polyamic acid solution prepared in Reference Example 6
A predetermined weight part of the compound shown in Table 3 was added to the weight part, and the mixture was stirred at room temperature for 6 hours to obtain a polyamic acid solution composition. This composition was applied to stainless steel from 16 to 22 to 9/-
It was strong, exhibiting a tensile strength of 60% to 100%. The results are summarized in Table 2.

第 2 表 第 ろ 表Table 2 Table 1

Claims (1)

【特許請求の範囲】 流延法による芳香族ポリイミドフィルムの製造方法にお
いて。 芳香族ポリアミック酸100重量部に対して。 一般式 (式中、Rは置換・非置換のアルキル基、シクロアルキ
ル基捷たはアリール基である。)で示されるカルボン酸
を0.01〜70重量部含有する芳香族ボリアεツク酸
溶液を、基体上に流延し乾燥後、該基体から自己支持性
のポリアミック酸フィルムを剥離し、更に加熱して溶媒
を除去しポリアミ2ワクD’rイミド化することを特徴
とする芳香族ポリイミドフィルムの製造法。
[Claims] A method for producing an aromatic polyimide film by a casting method. Based on 100 parts by weight of aromatic polyamic acid. Aromatic boric acid solution containing 0.01 to 70 parts by weight of a carboxylic acid represented by the general formula (wherein R is a substituted or unsubstituted alkyl group, cycloalkyl group, or aryl group) An aromatic polyimide characterized in that after being cast on a substrate and dried, a self-supporting polyamic acid film is peeled from the substrate, and the solvent is removed by further heating to form a polyamide 2 film D'r imidation. Film manufacturing method.
JP4934184A 1984-03-16 1984-03-16 Manufacture of aromatic polyimide film Granted JPS60193618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4934184A JPS60193618A (en) 1984-03-16 1984-03-16 Manufacture of aromatic polyimide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4934184A JPS60193618A (en) 1984-03-16 1984-03-16 Manufacture of aromatic polyimide film

Publications (2)

Publication Number Publication Date
JPS60193618A true JPS60193618A (en) 1985-10-02
JPS635421B2 JPS635421B2 (en) 1988-02-03

Family

ID=12828296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4934184A Granted JPS60193618A (en) 1984-03-16 1984-03-16 Manufacture of aromatic polyimide film

Country Status (1)

Country Link
JP (1) JPS60193618A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018043467A1 (en) * 2016-08-31 2018-03-08 富士フイルム株式会社 Resin composition and application of same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0528929U (en) * 1991-09-25 1993-04-16 日本精機株式会社 Indicator instrument

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018043467A1 (en) * 2016-08-31 2018-03-08 富士フイルム株式会社 Resin composition and application of same
JPWO2018043467A1 (en) * 2016-08-31 2019-08-08 富士フイルム株式会社 Resin composition and its application

Also Published As

Publication number Publication date
JPS635421B2 (en) 1988-02-03

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