JPS60188902A - Manufacture of color separating filter - Google Patents

Abstract

PURPOSE:To obtain a filter which causes no color shift and is good in its color reproduction by forming a negative type photosensitive film on an intermediate dyeing-proof film, and executing a specified exposure, when constituting a color separating filter of yellow and cyan purple blue, and green consisting of a color mixture of yellow and cyan purple blue. CONSTITUTION:A cyan purple blue constituting dyeing film 2d and a green constituting dyeing film 2e are formed on a substrate 1 of glass, etc. Subsequently, an intermediate dyeing-proof film 3a and a photosensititive film 2 of a negative type are formed successively extending over the surface of the film 2d, 2d. Next, an exposure is executed through a photomask 5 having a transparent window 5a and 5b corresponding to a right above part of the film 2a of the film 2, and a yellow optical transmission film formed part, and thereafter, an exposure is executed through a photomask 6 having a transparent window 6a on only a part corresponding to the right above part of the film 2e of the photosensitive film 2. Subsequently, after developing the photosensitive film 2, a green transmission film constituting dyeing film 2h is formed on the film 3a, and also a yellow optical transmission film 2g is formed. In the end, a surface protecting film is formed extending over the surface of the dyeing-proof film 3a and the films 2g, 2h. In this way, a filter wich causes no color shift is obtained.

Description

[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a solid-state sensor, a device placed on the imaging surface of an image sensor such as an image pickup tube, or an image surface of an image sensor such as a multicolor display device to display a multicolor image. The present invention relates to a method of manufacturing a color separation filter (hereinafter referred to as a "color filter") for obtaining the color separation filter.

[Prior Art] Hereinafter, a color filter placed on the imaging surface of a solid-state imaging device will be described as an example.

In order for a solid-state image sensor to capture a multicolor image, a color filter is required to separate the pixels of the image projected onto the imaging surface of the solid-state image sensor into three primary colors.

FIGS. 1(A) to 1(A) are cross-sectional views showing the state of important parts at major stages of an example of a conventional method for manufacturing a color filter for a solid-state image sensor.

First, as shown in FIG. 1(A), 15 minutes of sound corresponding to the pixels of the image projected onto the imaging surface of the solid-state image sensor on the surface of the substrate (1) made of a glass substrate, silicon substrate, etc. A transparent negative photosensitive liquid made by imparting photosensitivity to a water-soluble resin such as gelatin or polyvinyl alcohol is uniformly applied and dried to form a photosensitive film.This photosensitive film is then subjected to a well-known photolithography process. the surface of the substrate (1) as described below.
The first dyed film forming photoresist film is left on the portion where the dyed film is to be formed.

Next, the first photosensitive film for forming a dyed film is colored using a dye that transmits light of a first color that is an eoix of the three primary colors (in this specification, colored light is referred to as "colored light"). A dyed film (2a) of No. 1 is formed.

Next, as shown in FIG. 1(B), the surface of the substrate (1) and the first. The first coating is applied over the surface of the dyed film (2a).
A transparent intermediate resist film (3a) is formed to prevent the dyed film (2a) from being colored by the dye. Then the first
The first dyed film (2a) on the surface of the intermediate resist dyed film (3a) is prepared by the same method as in the stage shown in Figure (At).
A second dyed film (2a) colored using a dye that transmits the second colored light constituting the three primary colors on a part spaced apart from the first dyed film (2a) on one side of the 2b) is formed.

Next, as shown in Figure 1 (C), an intermediate resist film (3a) is applied.
and over the surface of the second dyed film (2b), an intermediate resist dyeing film (3b) similar to intermediate resist dyeing i (3a) is applied.
form. Next, the second dyeing film (2b) on the surface of the intermediate resisting film (3b) is dyed with the first dyeing 1112a by a method similar to the method shown in FIG.
A third dyed film colored using a dye that transmits a third colored light constituting the three primary colors, on a part spaced apart from the second dyed film (2b) on the opposite side. (2C) is formed.

Finally, as shown in Figure 1 (l), apply the intermediate resist film (3b).
By forming a transparent surface protective film (4) over the surface of the dye film (2C) of @3 and the surface of the dyed film (2C) of @3, a color filter for a solid-state image sensor according to this conventional method is obtained.

By the way, in this conventional method, a dyed film (
2a), (2b), (2C) can be formed, but in order to form dyeing *, (2a), (2b), (2C), the formation of intermediate resist M (3a), (3b) Since this method requires the following steps, there is a problem in that the number of manufacturing steps increases.

Therefore, the three primary colors that separate the pixels of the image projected onto the imaging surface of one solid-state imager are: violet blue (hereinafter referred to as "07 color"), yellow (hereinafter referred to as "Ye color"), 07 color, and Ye color. By creating a color mixture of green (hereinafter referred to as "G color"), it is possible to form an intermediate resist dyeing film in one step. A method for manufacturing a color filter has been developed according to the prior art. Fig. 2 shows the main parts of the method for manufacturing a color filter for a solid-state image pickup device according to the prior art. FIG.

In the figure, the same symbols as those shown in FIG. 1 indicate equivalent parts.

First, as shown in FIG. 2 (A), an image is projected onto the imaging surface of the monolithic image sensor on the surface of the substrate (1) by the same method as in the step shown in FIG. 1 (At). A 07 color dyed agricultural product (2cl) and an Oy color beam were colored using 07 color dye on the part where the ay color light transmitting film was to be formed and the part where the 0 color light transmitting film was to be formed, respectively, in the part corresponding to the pixel of A colored film (2e) is formed.Then, a substrate (1) is formed.
and Oy color staining on the surface of +19 (2d), (2e)
After forming the middle III resist dyeing crotch (3a) over the surface of the intermediate resist dyeing j4=k (3a), a transparent photosensitive liquid is applied onto the surface of the intermediate resist dyeing j4=k (3a) and is dried to form a photosensitive film (2). Next, a transparent window (5a) and a transparent window (5a) are placed on the part of the photoresist film (2) directly above the 07 color dyeing N (2e) and the part where the Me color light transmitting film is to be formed, respectively. 5b) through a photomask (5).

Next, as shown in FIG. 1% (zf) of Ye color staining is formed on the portion directly above 2e), and at the same time, a Ye color dyeing film (2g) is formed on the surface of intermediate resist dyeing 1 (3a).

Finally, although not shown, intermediate resist dyeing JE= (3a)
By forming a surface retention nh over the iron surface of and the surfaces of the Ye color dyed films (2f) and (2g), a color filter for a solid-state imaging device using the method according to this prior art is obtained.

In the method according to this prior art, the pixels of this part are separated into the three primary colors of Cr7 colors, G colors, and Ye colors in the part corresponding to the pixels of the image projected on the imaging surface of the solid-state imaging element of the color filter. ay color dyed film (
2d) and the G color light transmitting film.

07 color stained film (2e) and Ye color stained film (2f)
and the Ye color dyeing jω (2g) constituting the Ye color light transmitting film can be formed by forming only the intermediate resist dyeing film (3a), so in the case of the conventional example whose manufacturing process is shown in the first panel You can make it less expensive.

However, in the method according to this prior art, the photoresist film (
2) Ay color staining k (2d), (28) Since the film thickness of the upper part is thinner than the other parts, the film thickness of Ye color dyeing film (2g) was changed from Oy color staining month. (za), (2
If an attempt is made to make the film thickness approximately the same as that of the 07 color dyed film (2θ), the film thickness of the Ye color dyed film (2f) will be less than that of the 07 color dyed film (2θ). Therefore, the short wavelength side of the G color light transmitted through the G color light transmitting film composed of the Ye color dyed film (2f) and the Oy color dyed film (2e) is the thickness of the Ye color dyed film (2f) and the Oy color dyed film. Compared to (2e) where the film thickness is approximately the same, the G color light is shifted to the shorter wavelength side, causing a color shift.

FIG. 3 shows a color filter according to the prior art method.
This is a diagram showing an example of the relationship between wavelength and transmittance of 07 color light, G color light, and Ye color light. In the figure, the horizontal axis indicates the wavelength (unit: nm) of 07 color light, G color light, and Ye color light, and the vertical axis ay colored light.

00y indicating the transmittance (unit: chi) of G color light and Ye color light
, G and Yθ are 07 color light, G color light and Ye
Colored light. Hikoo, Oy color-stained membrane (2a), (2e)
The film thickness of this film and that of the Ye color dyed film (2 g) are approximately the same.

As shown in Figure 3, the film thickness of the Ye color dyed film (2f) and C
If the film thickness of the y-color dyed film (2e) is about the same, the G color light is composed of the intersection of the 07 color light and the Ye color light.
In the method according to the prior art, the thickness of the Ye color dyed film (2f) is thinner than that of the Cy color dyed film (2e), so that the G color light shifts toward the 68 wavelength side, causing a color shift of the G color light.

Therefore, with the methods according to the prior art, it is not easy to obtain a good color balance of 01 color, G color and Ye color, and to obtain self-angle reversibility. Ta.

[Summary of the Invention] This invention has been made for the purpose of eliminating such drawbacks. In the method for manufacturing a color filter, the image pickup surface on the surface of the substrate or A first dyeing color plate for configuring a first color light transmitting film and a first dyeing color plate for configuring a third color light transmitting film are formed on a portion of the image plane corresponding to a pixel of the image; After forming an intermediate resisting film and a negative photoresist film over the surface of the first dyeing color plate and the surface of the substrate, the first dyeing color for forming the third color light transmitting Ak of the photoresist film is formed. The part directly above the plate and the part where the second colored light transmitting film is to be formed are exposed, and again only the part directly above the first dyeing color plate for forming the third color light transmitting film is exposed. Developing the exposed photoresist film to form a second colored dyed film for forming the third color light transmitting film and a second color dyed film for forming the second color light transmitting film on the surface of the intermediate resist dyeing film. The present invention provides a method for manufacturing a color filter that can obtain good color reproducibility.

[Embodiments of the invention]

FIG. 4 (1119 and 1119 are cross-sectional views showing the state of essential parts at the cage stage of the method for manufacturing a color filter for an image element having 4% solids according to an embodiment of the present invention.

In the figure, the same symbols as those shown in FIG. 2 indicate equivalent parts.

First, as shown in FIG. 4(A), a substrate (1) is prepared by a method similar to that in the step shown in FIG. 2(A).
In this embodiment, the first colored light transmitting film, which is the first color dyeing film, is formed on the surface of the solid-state image sensor on a portion corresponding to the pixels of the image projected on the captured image of the solid-state image sensor. Construction Oy
The color dyed film (2d) and the first color dyed film for configuring the third color light transmitting film in this example, 07 for configuring the 0 color light transmitting film.
A colored dyed film (2e) is formed. Next, after sequentially forming an intermediate resist dyeing film (3a) and a negative photoresist film (2) on the surface of the substrate (1) and the surfaces of the 07 color dyed M (24) and (2e), the photoresist film In the part directly above the 07 color dyed film (2e) in (2) and the part where the Ye color light transmitting film, which is the second color light transmitting film in this example, is to be formed,
Transparent windows (5a) are provided in the areas corresponding to these areas.
A first bright light is applied through a photomask (5) having a transparent window (5b). After that, the photoresist film (2
A second blind light is applied to the part immediately above the Oy color dyeing B (2e) of ) through a photomask (61) having a transparent window (6a) only in the part corresponding to this part.

Next, as shown in Figure 4, the exposed photoresist film (2) is developed by the same method as in the stage shown in Figure 2. Membrane (3a)
On the surface of the 07 color dyed film (26), a Ye color dyed film (2h ) and on the surface of intermediate resist dyeing # (3a), a Ye color dyed film (2 g ) to form.

Finally, although not shown, a surface protective layer is formed over the surface of the intermediate resist dyeing film (3a) and the surfaces of the Ye color dyed films (2g) and (zh), which results in the solid state of the method of this example. A color filter for an image sensor is obtained.

In the method of this example, the Ye color dyed film (2g) is formed by the -th exposure to the photoresist film (2), and the Ye color dyed film (2h) is formed by the -th and second exposure to the photoresist IP1 (2). Since it is formed by a double achromatic process, the film thickness of the part where the Ye color dyeing # (2g) of Karako Mk (2) is formed, and the Ye color dyeing film (2h) of the photoresist film (2) is formed. The relationship between the film thickness of the area to be exposed, the amount of light entering the photoresist film (2), and the residual film rate is taken as a prerequisite, and then the photosensitive film (2) is exposed! In order to control the second exposure and the second exposure to Ij (2), the Ye color dyeing I[I(2)
The film thickness of g) and the film thickness of the Ye color dyed film (2h) can be made to be approximately the same. Therefore, '(3Y color dyeing exhibition (2(
1), (2e) film thickness and Ye color dyed film (2g), (
2h) can be made as good as the film thickness, so Y
G color light transmitting film consisting of e color dyeing # (2h) and Cy color dyeing film (2e) G color light shifts to the wavelength side and shifts to the wavelength side can be prevented.

Figure 5 shows color filter 07 according to the method of this embodiment.
FIG. 3 is a diagram showing an example of the relationship between wavelength and transmittance of colored light, G color light, and Ye color light.

In the figure, the horizontal and vertical axes are the same as the horizontal and vertical axes shown in FIG. 3, respectively, and 07v G and Ye are the same as Oy, G, and Ye shown in FIG. 3, respectively. Note that the film thicknesses of the Oy color dyed films (2d) and (2e) and the film thicknesses of the Ye color dyed films (2g) and (2h) are approximately the same.

As shown in FIG. 5, in the method of this example, the thickness of the Oy color dyed film (2e) and the film thickness of the Ye color dyed film (2h) can be made to be approximately the same, so the G color light short wavelength 1
The color shift caused by the shift to 111 can be eliminated.

Therefore, a good color balance between the 01 color, G color and Ye color can be obtained, and good color reproducibility can be obtained.

In this embodiment, a case has been described in which pixels of an image are separated into three primary colors consisting of 01 color, Ye color, and G color, but the present invention is not limited to this, and the first color and the second color and the first
It can also be applied to the case where the color is separated into three primary colors consisting of a third color which is a mixture of the second color and a third color.

Although the method for manufacturing a color filter for a solid-state image pickup device has been described as an example, the present invention is not limited to this. It can also be applied to a method of manufacturing a filter.

(Effects of the Invention) As described above, in the method for manufacturing a color filter of the present invention, the color filter is placed on the imaging surface of an image sensor or the image surface of the image element, and the pixels of the image on the imaging surface or the image surface are In the method for manufacturing a color filter that separates into three primary colors consisting of a first color, a second color, and a third color that is a mixture of the first and second colors, the above-mentioned imaging surface on the surface of the substrate or the above-mentioned image a step of forming a first dyeing color group for configuring a 10th color light transmitting film and a first color stripe color plate for configuring a 30th color light transmitting film on a portion of the area corresponding to the image pixel on the surface; After sequentially forming an intermediate resisting film and a negative photoresist film on the surface of the first color plate and the surface of the substrate, a third color light transmitting film of the photoresist film is applied.
The first exposure is applied to the part directly above the color stripe of the color stripe and the part where the second color light transmitting film is to be formed, and then the part directly above the color stripe of the third color light transmitting film forming brush 1 is exposed again. A step of exposing only the portions to light for a second time, developing the exposed photoresist film, and applying a second color light transmitting film composition brush 2 on the surface of the intermediate resist film.
The amount of no light applied to the photosensitive film in the first application and the amount of light in the second application are controlled through the process of forming the second dyed color layer using the color stripe and the second colored light transmitting film. By doing the 30th
Since the film thickness of the second dyed color layer for configuring a colored light transmitting film and the film thickness of the second color stripe color plate for configuring a second color light transmitting film are made to be approximately the same, the third color light transmitting film configuring brush can be used. It is possible to make the film thickness of the first color stripe color plate and the si of the dyed color layer of the third color light transmitting film composition brush 2 to be approximately the same υ, and the thickness of the first color stripe color plate and # It is possible to eliminate the color shift of the third color light that passes through the second dyeing color change, and it is possible to obtain good color reproducibility.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view sequentially showing the state of main parts at the main stages of an example of a conventional method for manufacturing a color filter for a solid-state image sensor, and FIG. 2 is a main stage of a method for manufacturing a color filter for a solid-state image sensor according to the prior art. 3 is a diagram showing an example of the relationship between the wavelength and transmittance of 01 color light, G color light, and Ye color light of a color filter according to the prior art method. Cross-sectional views sequentially showing the states of the wall portion in the first stage of the method for manufacturing a color filter for a solid-state image sensor according to an embodiment of the present invention, Figure 5.01 color light of the color filter shown in the method of this embodiment, This is a diagram showing an example of the relationship between wavelength and transmittance of G color light and Ye color light. In the figure, (1) is the substrate, (2) is the photoresist film, and (2d) is the substrate.
and °(2e) are respectively Oy color light transmission Il! Oy color dyed film for composition (color streak color version of first color light transmission film composition brush 1) and Oy color dyed film for composition of G color light transmission film (third and (
2h) are respectively Ye color dyed films (
Second color light transmitting film #4 - second color stripe) and G
A Ye color dyed film for color light transmitting P#1 (second dyeing color for 30th color light transmitting film) 0 Note that the same reference numerals in the drawings indicate the same or corresponding parts, respectively. Agent Masuo Oiwa Figure 1 (A), Z^ (C) (D) Procedural amendment (spontaneous) 1. Display of 11 items Patent Application No. 59-046106; 3
．． To the representative Hitoshi Katayama of the person making the amendment Part 4, Column 6 of the detailed explanation of the invention in the agent's specification, Contents of the amendment (1) Page 9 of the specification, lines 4 to 5 K "The horizontal axis is "11111" is replaced by "The horizontal axis is the wavelength of light from a monochromatic light source (
The unit is nm).''that's all

Claims (1)

[Claims] (1) A pixel of an image placed on an imaging surface of an image sensor or an image surface of an image element and mixed with a first color, a second color, and the first and second colors; In the method for manufacturing a color separation filter that separates into three primary colors consisting of a third color and a third color, a first color light transmitting film on a portion corresponding to a pixel of an image on the imaging surface or the image surface of the surface of the substrate; A first color dyed film for configuring a tenth color light transmitting film and a first color dyed film for configuring a third color light transmitting film are respectively applied on the portion where the color light transmitting film is to be formed and the portion where the third color light transmitting film is to be formed. First step of forming 1 On the surface of the substrate, on the surface of the first color dyed film for forming the first color light transmission film, and on the surface of the first color dyed film for forming the third color light transmission film. a second step of sequentially forming a transparent intermediate resist film and a negative p-photosensitive film;
The third step of exposing the part directly above the first color dyeing layer and the part where the second color light transmitting film is to be formed, above, the third color light transmission of the dynamic photosensitive film. a fourth step of exposing again only the portion directly above the first color-dyed film for film formation;
The photoresist film exposed in the third and fourth steps is developed to form the third color light transmitting film #4 on the surface of the intermediate resist dyeing film, directly above the first color dyeing film. forming a second color dyeing film for forming a third color light transmitting plate on the surface of the third color light transmitting plate; and forming a second color dyeing film for forming a second color light transmitting film on the surface of the intermediate resist dyeing film; The light transmitting film of the 30th color is formed by controlling the amount of light exposure to the light-relaxing film in the third step and the amount of mist light applied to the photoresist film in the fourth step. A method for manufacturing a color separation filter, characterized in that the thickness of the second color dyed film and the second color dyed film for forming the second color light transmitting film are approximately the same.