JPS60187037A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPS60187037A
JPS60187037A JP4190284A JP4190284A JPS60187037A JP S60187037 A JPS60187037 A JP S60187037A JP 4190284 A JP4190284 A JP 4190284A JP 4190284 A JP4190284 A JP 4190284A JP S60187037 A JPS60187037 A JP S60187037A
Authority
JP
Japan
Prior art keywords
cell
wiring
layer
test
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4190284A
Other languages
Japanese (ja)
Other versions
JPH0658937B2 (en
Inventor
Chikahiro Hori
親宏 堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP4190284A priority Critical patent/JPH0658937B2/en
Publication of JPS60187037A publication Critical patent/JPS60187037A/en
Publication of JPH0658937B2 publication Critical patent/JPH0658937B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an integrated circuit with which a potential measurement can be performed directly after it has been manufactured by a method wherein, in the integrated circuit on which a plurality of cell columns are provided pinching a wiring region, a test cell is formed in a logical cell column, and a pad to be used for potential measurement is provided in the top wiring layer. CONSTITUTION:When an NAND cell 17, an NOA cell 18, an inverter cell 19 and the like are provided pinching a wiring region, a test cell 20 is formed between the cells 17 and 18, for example. Said cell 20 is composed of the wiring part consisting of the first layer Al 11, the second layer Al 12 which is the top layer and will be turned to a pad, a contact hole 13 and the like, and the test cell is registered in the cell library of a computer together with a logical cell. Through these procedures the designer of the device determines that the test cell is to be connected to what part of the circuit together with the wiring relations of each logical cell, these data are inputted to a computer, and a shortest wiring process is performed.

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は半導体集積回路に関する。[Detailed description of the invention] [Technical field to which the invention pertains] The present invention relates to semiconductor integrated circuits.

〔従来技術とその問題点〕[Prior art and its problems]

近年、ICにおいては論理セルの列を配線領域(チャ2
ネ51ル1領、域)を挾んで複数並置し、これに多層配
線を施して集積回路を製造するセミカスタムICが多用
されている。かかるセミカスタムICでは、論理セルを
ライブラリーとして登録し、ユーザーの仕様に応じて配
線のレイアウト、時には論理セルの列内位置までをコン
ピュータにより設計する。かかるセミカスタムICでは
、上記配線領域には多数条の配線トラックが設けられ、
これを用いてセルからの導出配線間が結線される。
In recent years, in ICs, columns of logic cells have been
Semi-custom ICs are often used in which integrated circuits are manufactured by arranging a plurality of integrated circuits in parallel with each other, sandwiching a wall (51 area, 1 area), and applying multilayer wiring to these ICs. In such a semi-custom IC, logic cells are registered as a library, and the wiring layout, sometimes even the position within a column of logic cells, is designed by computer according to the user's specifications. In such a semi-custom IC, a large number of wiring tracks are provided in the wiring area,
This is used to connect the lead-out wirings from the cells.

ところで、集積回路においては、それが予定通りに動作
しているか否かをテストする事が望ましい。最も直接的
な方法は所定の回路上の位置の電位測定をすることであ
る。
By the way, in integrated circuits, it is desirable to test whether or not they are operating as planned. The most direct method is to measure the potential at a given circuit location.

専用IC等、ICのレイアウトが手書きで為されていた
時代には、レイアウト後、配線に張り出し部を設けてパ
ッドとし、後に電位測定をしてテストする事が行なわれ
ていた。然しなから設計の自動化等、設計の信頼性向上
の陰にこの技術は忘れ去られ様としている。
In the days when layouts of ICs such as dedicated ICs were done by hand, after the layout, protruding parts were provided on the wiring to serve as pads, and potentials were later measured and tested. However, this technology seems to be forgotten due to improvements in design reliability due to design automation.

しかしながら、製造時のトラブル解明やデバイスの誤動
作チェックには見逃せない手法2あると言える。
However, it can be said that there is a method 2 that cannot be overlooked when solving problems during manufacturing and checking for device malfunctions.

ところで、このテスト手法をセミカスタムICζ二適用
しようとする場合、幾多の問題が存在する。
By the way, when trying to apply this test method to a semi-custom IC, there are many problems.

最大の問題は、テ、ヤノ木トルξ領・域には、その大規
横比の為に高密度に配線が設けられ、配線が混んでいる
と最早パッド部が設けられない事である。
The biggest problem is that in the Yanoki Tor ξ region/area, wiring is provided at a high density due to its large-scale horizontal ratio, and if the wiring is crowded, a pad section can no longer be provided.

〔発明の目的〕[Purpose of the invention]

本発明は、上記事情に鑑みて為されたものであり、その
目的とするところはIC製造後、直接電位測定可能なI
Cを提供する事である。
The present invention has been made in view of the above circumstances, and its purpose is to provide an IC that can directly measure the potential after IC manufacturing.
It is to provide C.

〔発明の概襄〕[Summary of the invention]

本発明は、先述論理セル列の中に最上層配線を用いたパ
ッドによりIC製造後テスト可能とした、テストセルを
組み込んだ事を特徴とする。
The present invention is characterized in that a test cell is incorporated into the logic cell array mentioned above, which enables testing after IC manufacture by means of a pad using the uppermost layer wiring.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、テストセルを論理セル列中に組み込ん
だ事により、パッドに充分な大きさを与えると共にチャ
ネル領域に何の制限を与える事なく集積回路が得られる
According to the present invention, by incorporating the test cells into the logic cell array, an integrated circuit can be obtained with sufficient pad size and without any restriction on the channel region.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面な参焦して説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第1図(a)〜(C)、第2図(al (bl、第3図
(a) (b)はテストセルな示している。一定鎖線は
セル領域を示している。例えば第1図(a)は一端子の
例で、第2層Al112らなる配線部と、第2層Al1
12 (最上j―配線)からなるパッド部を有している
。13はコンタクトボールである。同様に(blは2端
子の例、(C1はテストセルが論理素子を有している1
例である。
Figures 1 (a) to (C) and Figures 2 (al (bl), and Figures 3 (a) and (b) show test cells. Constant chain lines indicate cell areas. For example, in Figure 1 (a) is an example of one terminal, with a wiring part made of second layer Al112 and a second layer Al1
12 (top j-wiring). 13 is a contact ball. Similarly, (bl is an example of 2 terminals, (C1 is 1 where the test cell has a logic element)
This is an example.

14は8iクエハーに形成された拡散層、15はポリシ
リコン層である。以下、同−膜は同じハツチングで示す
14 is a diffusion layer formed in an 8i wafer, and 15 is a polysilicon layer. Hereinafter, the same membranes are indicated with the same hatching.

第2図はパッドの形状に特徴を有するもので、特に(b
)は図中12′の部分が抜かれた第2層Al112であ
り、数字が異なるものを準備すればテップ上で識別が容
易である。第4図+11) (b)は、第2層A7.ポ
リシリコン層でテストセルに符号を付したものである。
Figure 2 shows the shape of the pad, especially (b).
) is the second layer Al 112 from which the part 12' in the figure has been removed, and if the parts with different numbers are prepared, they can be easily identified on the step. Figure 4+11) (b) shows the second layer A7. Test cells are labeled with polysilicon layers.

第4図〜第6図は実際の具体例で、図中17はNAND
セル、18はNORセル、19はインバータセル、21
は第2図(C)のタイプのテストセルである。これらの
セル内の図は省いである。又、20 、23 、24は
テストセルを示している。各図で、テストセルは論理セ
ル列の中に組み込まれてセル列を形成し。
Figures 4 to 6 are actual concrete examples, and 17 in the figure is a NAND
cell, 18 is a NOR cell, 19 is an inverter cell, 21
is a test cell of the type shown in FIG. 2(C). Diagrams inside these cells are omitted. Further, 20, 23, and 24 indicate test cells. In each figure, test cells are embedded within logic cell columns to form cell columns.

その両側のチャネル領域を挾んでこれが多数列ウェハー
上に形成されている。
Multiple rows of these are formed on the wafer, sandwiching the channel regions on both sides.

実際には、テストセルは論理セルと共にコンピュータの
セルライブラリーに登録される。そして設計者は各論理
セルの結線関係と共にテストセルな回路上のどの部分に
つなぐかを決定する。そしてこれらのデータをコンピュ
ータに入力し配線の最短化処理を行ない各セルの配置、
配線パターンを決定する。勿論セルライブラリーには各
セルのサイズ、その端子位置が登録されている。そして
配線条件は先述した様に例えばX方向は第1層M配線、
Y方向は定められた配線トラック数を用いた第1層M配
線で為される。
In practice, test cells are registered in a computer's cell library along with logic cells. The designer then determines the connection relationship of each logic cell and to which part of the test cell circuit the logic cell should be connected. This data is then input into a computer to minimize the wiring and determine the placement of each cell.
Determine the wiring pattern. Of course, the size of each cell and its terminal position are registered in the cell library. As mentioned above, the wiring conditions are, for example, the first layer M wiring in the X direction,
The Y direction is formed by first layer M wiring using a predetermined number of wiring tracks.

この様にして製造された集積回路はその最上層配線層形
成後、パッド部にプローブを当接して動作状態における
電位測定が可能である。しかも配線トラックを阻害する
事なく充分な大きさのパッドが形成出来る。又、テップ
内では幾つかの論理セルを用いて回路ブロックを構成し
、この回路ブロックを組み合わせてICを構成する事に
なるので配線の最短化に伴ない論理セル列内には空き領
域が生じるが、この空き領域にテストセルな形成する事
ができるので集積度を損なう事はない。
After forming the uppermost wiring layer of the integrated circuit manufactured in this manner, it is possible to measure the potential in the operating state by contacting a probe to the pad portion. Furthermore, pads of sufficient size can be formed without interfering with wiring tracks. Also, within a step, several logic cells are used to form a circuit block, and these circuit blocks are combined to form an IC, so as the wiring is minimized, an empty area is created within the logic cell row. However, since test cells can be formed in this empty area, the degree of integration is not compromised.

以上説明したテストセルを多数設ける場合、使用するテ
ストセル内の形状を異ならせたり、順番に文字や番号等
識別記号を付せば所望のテストセルな探し出すのに容易
である。特にコンピュータ設計では思いがけない位置に
セルが飛ぶ事があるが、その際検出は著しく容易となる
When providing a large number of test cells as described above, it is easy to find the desired test cell by changing the shape of the test cells used or sequentially attaching identification symbols such as letters or numbers. Especially in computer design, cells can sometimes fly to unexpected locations, which is much easier to detect.

【図面の簡単な説明】 第1図、第2図及び第3図はテスト用セルの平面図、第
4図、第5図、第6図は実施例を説明する為の平面図で
ある。 図において、 11・・・第1層A!、 12・・・第2層A7 。 20.21,23,24・・・テストセル。 代理人 弁理素側 近 憲 佑 (他1名)第 1 図 畝) <b) (C) 第 2 図 第 3 図 (/ (clン tb) 第 4 図 第 5 図
BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1, 2, and 3 are plan views of a test cell, and FIGS. 4, 5, and 6 are plan views for explaining an embodiment. In the figure, 11...first layer A! , 12...second layer A7. 20.21, 23, 24...Test cell. Attorney Kensuke Chika (and 1 other person) Figure 1 ridge) <b) (C) Figure 2 Figure 3 (/ (cln tb) Figure 4 Figure 5)

Claims (1)

【特許請求の範囲】[Claims] 論理セル列を配線領域を挾んで複数設け、多層配線を施
して形成された半導体集積回路において、前記論理セル
列中にテストセルが設けられ、このテストセルには最上
層配線層を用いて電位測定用のパッドが設けられた事を
特徴とする半導体集積回路。
In a semiconductor integrated circuit formed by providing a plurality of logic cell rows with a wiring area in between and performing multilayer wiring, a test cell is provided in the logic cell row, and a potential is applied to the test cell using the uppermost wiring layer. A semiconductor integrated circuit characterized by being provided with a pad for measurement.
JP4190284A 1984-03-07 1984-03-07 Semiconductor integrated circuit Expired - Lifetime JPH0658937B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4190284A JPH0658937B2 (en) 1984-03-07 1984-03-07 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4190284A JPH0658937B2 (en) 1984-03-07 1984-03-07 Semiconductor integrated circuit

Publications (2)

Publication Number Publication Date
JPS60187037A true JPS60187037A (en) 1985-09-24
JPH0658937B2 JPH0658937B2 (en) 1994-08-03

Family

ID=12621212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4190284A Expired - Lifetime JPH0658937B2 (en) 1984-03-07 1984-03-07 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH0658937B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4881029A (en) * 1985-09-30 1989-11-14 Kabushiki Kaisha Toshiba Semiconductor integrated circuit devices and methods for testing same
US6269280B1 (en) 1998-01-19 2001-07-31 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and method of fabricating the same
JP2006324443A (en) * 2005-05-18 2006-11-30 Nec Electronics Corp Semiconductor device and its manufacturing method, system and method for supporting design thereof, and method for verifying performance thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4881029A (en) * 1985-09-30 1989-11-14 Kabushiki Kaisha Toshiba Semiconductor integrated circuit devices and methods for testing same
US6269280B1 (en) 1998-01-19 2001-07-31 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and method of fabricating the same
JP2006324443A (en) * 2005-05-18 2006-11-30 Nec Electronics Corp Semiconductor device and its manufacturing method, system and method for supporting design thereof, and method for verifying performance thereof

Also Published As

Publication number Publication date
JPH0658937B2 (en) 1994-08-03

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