JPS60179885A - Processing method of pattern - Google Patents

Abstract

PURPOSE:To store information and to prevent the sensor processing allocation to each pattern component from an error due to the positional shift of patterns between sensors or the difference of shapes by allocating processing sensors to respective pattern components on the basis of the relative positions of plural sensors and their corresponding results. CONSTITUTION:Adjacent vidual field areas on an object 1 to be read out are read out so as to be overlapped by sensors N, N+1 and stored in pattern memories 11, 12 respectively. Receiving pattern processing information including an input overlapped part from a control circuit 41, an outline tracking processing circuit 21 segments the pattern of the corresponding processing area from the pattern memories 11, 12 in each sensor while referring the relative position information between sensors from inter-sensor relative position information memory 31. Then, the circuit 21 separates the patterns in the segmented processing area into a series of pattern components by outline tracking processing and stores the outline information and the coordinates of the outmost point of every direction.

Description

Detailed Description of the Invention [Field of Application of the Invention] The present invention relates to a pattern processing method for overlapping visual fields of multiple line sensors in an optical character reading device, etc.
The present invention relates to a pattern processing method suitable for processing pattern components forming a continuous area such as a symbol.

[Background of the invention]

In conventional pattern processing of overlapping visual fields using multiple line sensors, processing sensors are allocated to each pattern component simply by comparing the position of each pattern component with a processing boundary. For this reason, errors may occur in the allocation of processing sensors due to positional deviations between the two sensors of patterns near the processing boundary caused by variations in the physical characteristics of the sensor field of view configuration and the electrical characteristics of the sensors, and shape differences such as cutting and merging of patterns. This method has the drawbacks of double processing and missing processing.

[Purpose of the invention]

An object of the present invention is to solve the above-mentioned drawbacks of the prior art, and to process patterns in overlapping visual field areas, each pattern component resulting from positional deviation and shape difference between patterns obtained from overlapping input sensors. It is an object of the present invention to provide a pattern processing method that prevents errors in sensor processing allocation.

[Summary of the invention]

In order to achieve the above object, the present invention provides a pattern processing device that has a plurality of sensors that simultaneously recognize the same area, and processes a pattern that is input by overlapping adjacent viewing areas of the plurality of sensors. means for separating the pattern of the area into pattern components forming one continuous area for each of the plurality of sensors, and detecting the coordinates of the outermost point in the horizontal, vertical, and vertical directions for each of the pattern components; and the relative positional relationship of the plurality of sensors. and the relative positional relationship, the pattern component obtained from one sensor of the redundant input section is
and a means for determining which pattern component obtained from the other sensor corresponds, and by assigning the sensor to be processed to the pattern component based on the correspondence result,
It is characterized by accurately matching pattern components between sensors by absorbing pattern positional deviations and shape differences, and dealing with the physical characteristics of the sensor field of view configuration and the non-uniformity of the sensor's electrical characteristics. be.

[Embodiments of the invention]

An embodiment of the present invention will be described below based on the drawings.

FIG. 1 is a block diagram showing a pattern processing method according to an embodiment of the present invention.

In the figure, 11 and 12 are pattern memories that store patterns input from sensors N and N+1, 21 is a contour tracing circuit that traces the contours of the pattern, and separates each subsequent contour line as a pattern component; A component information memo Tc 23 that stores outline information of pattern components and outermost point coordinates is a duplicate pattern successive circuit that reads out pattern components from a duplicate input section;
24 is an overlapping component information memory having an information table for each pattern component of the overlapping input section; 25 is a component correspondence determination circuit for determining correspondence between a plurality of overlapping pattern components; 26
31 is a processing sensor assignment circuit that assigns one sensor to process each pattern component; 31 is an inter-sensor relative position information memory that stores relative position information between each sensor;
41 is a control circuit that controls each of the memories and circuits mentioned above.

Next, the pattern processing operation will be explained.

Adjacent viewing areas on the reading target l are the sensors N, N+
1 are read in duplicate and the patterns are respectively stored in pattern memories 11, 12. Next, the contour tracing processing circuit 21 connects the control circuit 41 to the control circuit 41 via the signal line 101.
When pattern processing area information including an input overlap part is received from , the inter-sensor relative position information in the inter-sensor relative position information memory 31 is referred to, and the pattern of the corresponding processing area is cut out for each sensor from the pattern memory 11.12. Thereafter, the contour tracing processing circuit 21 separates the pattern in the cut out processing area into a series of pattern components by contour tracing processing, and stores the contour information and the coordinates of the left, right, top, bottom, and outermost points in the component information memory 22. . This component information memory 22 stores not only pattern components of overlapping parts but also pattern components of non-overlapping parts at the same time.

FIG. 2 shows the coordinates of the pattern of the duplicate input section. The contour tracing processing circuit 21 also processes patterns that are inputted repeatedly by the inner sensors N and N+1 and stored in the memories 11 and 12 as shown in FIG. , by the contour tracing process, the following pattern components C, , C1 (i, j=1.2
,...) and simultaneously separate the outermost point coordinates of each component in the horizontal and vertical directions Xs, ,Xe, ,Ys, ,Ye, ,X
'S, , X' el, Y's, , Y'e1, and the contour information of each component are stored in the component information memory 22 of FIG. Here, due to the difference in characteristics between sensor N and N+'1, as shown in FIG.
1 and 1 differ in the recognition content for the same character "5",
Suppose that on one hand it is recognized as a continuous "5" and on the other hand it is recognized as a broken "5". In this case, @contour tracing processing circuit 21 separates the pattern by sensor N into two pattern components when performing contour tracing processing, and treats the pattern by sensor N+1 as one pattern component. , are stored in the component information memory 22 for each sensor.

When the control circuit 41 issues a command to request processing of the sensor overlapped portion via the signal line 102, the overlap pattern reading circuit 2
3 includes pattern information for each pattern component stored in the component information memory 22 and inter-sensor relative position information memory 3.
Based on the inter-sensor relative position information in 1, the information on the pattern components included in the overlap input section is selected and stored in the overlap component information table in the overlap component information memory 24 as shown in FIG. Stores the sensor number, component number, component coordinates (outermost point position coordinates), and pattern pointer. The outline pattern of each pattern component in the overlapping component information memory 24 is associated with the outline information in the component information memory 22 via the signal line 201 according to the pattern pointer.

Next, the control circuit 41 activates the component correspondence determination circuit 25 through the signal line 10.3. Based on the inter-sensor relative position information in the inter-sensor relative position information memory 31, it is determined which pattern component of one sensor corresponds to each pattern component of the other sensor. This association is performed by determining the consistency of the outermost point coordinates of the components in the left, right, up and down directions in the sensors N and N+1 based on the inter-sensor relative position coordinates D'x, Dy (see FIG. 2). That is, components C1 and C'.

Xs, -(X'S, +Dx)=ΔXs (1
)X e, −(X ′e, +Dx)=Δx e (2
)Ys, (Y'S, +Dy)=ΔYs (3
)Y e, −(Y' e, +Dy)=ΔY e (
4). If these values are below a certain tolerance value, C1
and C' are determined to be corresponding patterns, and the same synchronization number is assigned to them, for example, to pattern components cl and c' in FIG. The above ΔXs, ΔXe, Δ used for this judgment
Ys and ΔYe make it possible to absorb errors in relative positions between sensors and differences in thickness of patterns.

Furthermore, as shown in the example of components C2, C7, and C10 shown in FIG. In order to ensure the following, the following determinations are made regarding the components determined to be unsuitable by the method described above. The outermost point coordinate differences ΔXs, ΔXe, ΔYs, ΔYe exceeded the allowable value, but the point exceeding the allowable value (outermost point coordinate Xe of Ct,
Yc2. and the outermost Pisces of C3 [x s, , X e,
, Y S, , Y e, ) are all within the other coordinate point (the outermost point coordinates of C'2
Y's z.

'Y'e, ), that is, when one component contains the other, it is determined that they are corresponding pattern components, and the same synchronization number is assigned to the duplicate component information memory 24 as shown in FIG. write to the table.

As mentioned above, the correspondence of pattern components between sensors is
By absorbing pattern positional deviations and shape differences to perform accurate pattern processing, stable pattern processing is always possible for duplicate input sections, regardless of the physical characteristics of the sensor field of view configuration and non-uniformity of the sensor's electrical characteristics. It becomes possible to execute.

′ A pattern component number is individually assigned to a pattern component for which no correspondence has been made.

When the synchronization number of the pattern component is assigned in this manner, the processing sensor assignment circuit 26 is operated by the control signal 104, and the sensor to be processed is uniquely assigned to the synchronization number. The allocation method is as follows.

First, among the pattern components corresponding to sensor N, the outermost point X coordinate of each pattern component corresponding to a certain synchronization number is read out, and the midpoint coordinate value M of the maximum value and minimum value thereof is calculated. The center point coordinate value M and the sensor N as shown in FIG.
, and if the midpoint coordinate value M is in a region that does not exceed the boundary coordinate value R, each pattern component of that synchronization number shall be processed by the sensor N. , turn on the processing request flag for each pattern component corresponding to the synchronization number, and turn on the other sensor N.
The processing request flag of the pattern component associated with the same synchronization number by +1 is turned OFF and written to the duplicate component information table in the duplicate component information memory 24. For example, for pattern component C□ with synchronization number 1, (X Sl +x 1Ilt )/2<R (5) Note:
[In the pattern component corresponding to sensor N, there is no one with synchronization number l, C or L, so the maximum and minimum values of the X coordinates are the outermost point position coordinates of the X coordinate of pattern component C8. Therefore, pattern component C1 is to be processed by sensor N, and as shown in FIG.
', the processing request flag is turned OFF. Furthermore, pattern components C2 and C3 of synchronization number 2 are (minimum value of X coordinate Xs2+maximum value of X coordinate Xe,)/2
≧R(6) Therefore, it is decided that sensor N+1 will not process the process, and the process request flags of pattern components C2 and C3 will be turned OFF, and pattern component C'2 of synchronization number 2 in sensor N+1 will be processed. Turn on the processing request flag.

Further, ON or OFF is written in the processing request flag of a component that has a synchronization number independently, depending on the purpose.

In this way, a unique processing request flag is associated with one synchronization number, and by referring to this processing request flag, it is possible to realize pattern processing that prevents double processing and missing processing for each pattern component.

After the above processing is completed, the control circuit 41 can refer to the information for each pattern/component stored in the component information memory 22 and the duplicate component information memory 24. Therefore, the control circuit 41 refers to the overlapping component information memory 24 and uniquely determines the sensor to be processed, and then uses the pattern pointer of the main restored component information memory 24 through the signal line 201 to select the sensor overlapping area of the component information memory 22. It can be matched with existing pattern components, cut out as a pattern from the component information memory 22, and output.

Note that pattern components other than the one duplicate input portion may be extracted by directly referring to the component information memory 22.

Through the above processing, the input cover turns of two sensors can be processed without cutting the pattern at the overlapped input part, and also prevents double processing and missing processing due to pattern cutting, merging, and positional shift. becomes possible.

〔Effect of the invention〕

As explained above, according to the present invention, in pattern processing of overlapping visual field areas, processing allocation of sensors to each pattern component resulting from mutual positional deviation and shape difference between patterns obtained from overlapping input part sensors is controlled. Errors can be prevented.

[Brief explanation of drawings]

FIG. 1 is a block diagram showing a pattern processing method according to an embodiment of the present invention, FIG. 2 is a diagram for explaining the coordinates of a duplicate input section (turn), and FIG. 3 is a diagram showing a duplicate component information table. be.

Claims (1)

[Claims] (1) Has multiple sensors that simultaneously recognize the same area,
In a pattern processing device that processes a pattern input by overlapping adjacent viewing areas of the plurality of sensors, the pattern of the overlapping input section is divided into pattern components forming one continuous area for each of the plurality of sensors; means for detecting the outermost point coordinates in the horizontal and vertical directions for each pattern component; means for storing the relative positional relationship of the plurality of sensors; A pattern processing method comprising means for determining which pattern component a pattern component corresponds to obtained from another sensor, and a sensor to be processed is assigned to each pattern component based on the correspondence result.