JPS60161457U - エアレス噴霧機 - Google Patents
エアレス噴霧機Info
- Publication number
- JPS60161457U JPS60161457U JP4629784U JP4629784U JPS60161457U JP S60161457 U JPS60161457 U JP S60161457U JP 4629784 U JP4629784 U JP 4629784U JP 4629784 U JP4629784 U JP 4629784U JP S60161457 U JPS60161457 U JP S60161457U
- Authority
- JP
- Japan
- Prior art keywords
- adjuster
- airless sprayer
- housing
- threading
- solenoid coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Nozzles (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4629784U JPS60161457U (ja) | 1984-03-29 | 1984-03-29 | エアレス噴霧機 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4629784U JPS60161457U (ja) | 1984-03-29 | 1984-03-29 | エアレス噴霧機 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60161457U true JPS60161457U (ja) | 1985-10-26 |
JPH0128851Y2 JPH0128851Y2 (enrdf_load_stackoverflow) | 1989-09-01 |
Family
ID=30560557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4629784U Granted JPS60161457U (ja) | 1984-03-29 | 1984-03-29 | エアレス噴霧機 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60161457U (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1984
- 1984-03-29 JP JP4629784U patent/JPS60161457U/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0128851Y2 (enrdf_load_stackoverflow) | 1989-09-01 |
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