JPS60159198A - Ornamenting method of metallic product - Google Patents

Ornamenting method of metallic product

Info

Publication number
JPS60159198A
JPS60159198A JP59016389A JP1638984A JPS60159198A JP S60159198 A JPS60159198 A JP S60159198A JP 59016389 A JP59016389 A JP 59016389A JP 1638984 A JP1638984 A JP 1638984A JP S60159198 A JPS60159198 A JP S60159198A
Authority
JP
Japan
Prior art keywords
conductive
metal
layer
film layer
product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59016389A
Other languages
Japanese (ja)
Other versions
JPS6340880B2 (en
Inventor
Tsukasa Yamamoto
司 山本
Kazuo Matsuoka
松岡 和夫
Masahiro Fukuda
福田 全宏
Torazo Ito
伊藤 虎造
Yoshihiro Fukuda
吉宏 福田
Hirotaka Ito
伊藤 弘隆
Katsuo Iwasaki
岩崎 勝雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUKUDA METAL KOGEI KK
KATSUSHIKA PRESS KOGYOSHO KK
Kanebo Ltd
Original Assignee
FUKUDA METAL KOGEI KK
KATSUSHIKA PRESS KOGYOSHO KK
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUKUDA METAL KOGEI KK, KATSUSHIKA PRESS KOGYOSHO KK, Kanebo Ltd filed Critical FUKUDA METAL KOGEI KK
Priority to JP59016389A priority Critical patent/JPS60159198A/en
Publication of JPS60159198A publication Critical patent/JPS60159198A/en
Publication of JPS6340880B2 publication Critical patent/JPS6340880B2/ja
Granted legal-status Critical Current

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  • Laser Beam Processing (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To provide the ornament having excellent appearance and touch and good durability to a metallic product by removing the desired parts of a non- conductive film layer formed on the surface of the metallic product to expose the surface of a conductive metal then coating the exposed surface with a conductive thermosetting paint by electrodeposition painting and plating further the surface thereof. CONSTITUTION:A non-conductive film layer 2 consisting of a coated film layer of a thermosetting paint is formed on the surface of a metallic product 1 formed of a metallic material consisting of Al (alloy), copper (alloy), iron, etc. The desired parts of the layer 2 are removed according to a pattern, etc. to expose the conductive metallic surface 3. A conductive coated film layer 4 is in succession formed on the surface 3 by electrodeposition painting of a conductive thermosetting paint (e.g.; a mixture composed of a cationic type thermosetting resin and fine metallic powder). A plating metal 5 of gold, silver, copper, etc. is thereafter formed on the surface of the layer 4 by which the intended ornament is provided to the metallic product.

Description

【発明の詳細な説明】 本発明は、板、管、加1−v品等の金属製品の加飾方法
に関する。史に詳しくは、金属製品の表面に形成された
非4電性皮膜層の所ψの部分を除去し、その除去された
部分に導電性の熱硬化性塗料を電tT1塗装して導゛屯
性?4膜層を形成し、該塗119層の表面に鍍金処理を
施すことを特徴とする金属製品の加飾方法に関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for decorating metal products such as plates, pipes, and 1-v products. In detail, the part ψ of the non-quaternary conductive film layer formed on the surface of a metal product is removed, and the removed part is coated with a conductive thermosetting paint to make it conductive. sex? The present invention relates to a method for decorating metal products, which is characterized by forming 4 film layers and performing plating treatment on the surface of the 119 coated layers.

従来より、全1品製品の表面に形成された非導電性皮膜
層の所望の部分を、文字、図柄等に応して除去して金属
面を露出し、その金属面に鍍金処理を施す加飾方法は知
られている。
Conventionally, a desired part of the non-conductive film layer formed on the surface of a single product is removed according to characters, designs, etc. to expose the metal surface, and then the metal surface is plated. The method of decoration is known.

しかして、この方法の場合、非導電性皮膜の厚さは通常
lO〜30pmの範囲にあり、従って、これを除去した
部分の四部の深さは、 15〜35gm程度となるが、
一方鍍金処理によってこの四部を部分に埋めるのは一競
に困難であるため、鍍金処理を施した文字、図柄等の加
S部分は四部となり、外観1−好ましいものではない。
However, in the case of this method, the thickness of the non-conductive film is usually in the range of 10 to 30 pm, so the depth of the four parts where it is removed is about 15 to 35 gm.
On the other hand, it is very difficult to fill these four parts into a part by plating, so the added S part of letters, designs, etc. that has been subjected to plating becomes four parts, which is not desirable in appearance 1.

また、表面が平滑でないため1手に触れた吟にはざらつ
くなとの違和感を牛し、四には四部の周縁部は摩滅し易
く、加飾部分は耐摩耗性、耐腐食性に乏しいものである
などの欠点を41していた。
In addition, since the surface is not smooth, it feels rough to the touch, and fourth, the peripheral edges of the four parts are easy to wear, and the decorative parts have poor abrasion and corrosion resistance. There were 41 drawbacks such as:

勿論、儲金処理を長時間施し鍍金層を厚くして、前記文
字1図柄等の四部を平滑な表面とする方法も可能ではあ
るが、その場合は鍍金処理の吟間が15〜30分間と長
時間になるのみでなく、鍍金浴中に長時間浸漬すること
によって、他の表面を腐食する虞れも生しるなど、生産
性、加工費、及び品質面等に於いて満足し得る方法では
ない。
Of course, it is also possible to make the plating layer thicker by subjecting it to the plating process for a long time to make the four parts of the character 1 design etc. smooth, but in that case, the plating process would take 15 to 30 minutes. This method is not satisfactory in terms of productivity, processing costs, quality, etc., as it not only takes a long time but also poses a risk of corroding other surfaces due to long immersion in the plating bath. isn't it.

本発明は以)−の欠、rliに鑑みてなされたものであ
り、ぞの[」的とするところは、金属製品に外観ならび
に触感にすぐれ、かつ耐久性の良好な加飾を施す)J/
J!、を提供することにある。
The present invention has been made in view of the following (1) and (2), and its purpose is to decorate metal products with excellent appearance and feel as well as good durability. /
J! , to provide the following.

即ち9本発明の金属製品の加飾方法は、金属製品の表面
に非存゛市性皮膜層を形成した後、任意の文字、図柄等
に応して前記非導電性皮膜層の所望の部分を除去して導
電性の金属面を露出し、引続いて該金属面に導電性の熱
硬化性塗料を電着塗装して・q重性塗膜層を形成し、該
I#膜層の表面に鍍金処理を施すことを特徴とするもの
である。
That is, in the method for decorating metal products of the present invention, after forming a non-conductive film layer on the surface of a metal product, a desired portion of the non-conductive film layer is applied in accordance with arbitrary characters, designs, etc. is removed to expose the conductive metal surface, and then a conductive thermosetting paint is electrodeposited on the metal surface to form a q-heavy coating layer, and the I# film layer is It is characterized by a plating treatment applied to the surface.

本発明に於いて、金属製品とは、例えばアルミニラl、
 アルミニウム合金、銅、銅合金、鉄等の全屈素材によ
り形成された板、管、加工品等であり その形状は特に
限定されるものではない。
In the present invention, metal products include, for example, aluminum
It is a plate, tube, processed product, etc. made of a fully bent material such as aluminum alloy, copper, copper alloy, iron, etc., and its shape is not particularly limited.

金属製品の表面に形成される非導電性成膜層としては 
熱硬化性塗1の4:膜層か代表的なものの一つとして挙
げられる。この塗膜層は洗浄処理を施した金属製品に1
通常の塗装方法であるスプレー塗装、刷毛塗装、ローラ
ー塗装、電着塗装、静電塗装等により、アルキッド樹脂
、アクリル樹脂、エポキシ樹脂、ポリウレタン樹脂、ポ
リエステル樹脂等の熱硬化性樹脂からなる非導電性の塗
料を塗装し、その後加熱処理を施して形成される。ここ
で、塗装膜の厚さは特に限定されるものではないが、通
常20〜30Bmである。
As a non-conductive film formed on the surface of metal products,
Thermosetting coating 1-4: This is one of the typical film layers. This coating layer is applied to metal products that have undergone cleaning treatment.
Non-conductive materials made of thermosetting resins such as alkyd resins, acrylic resins, epoxy resins, polyurethane resins, and polyester resins can be coated using conventional painting methods such as spray painting, brush painting, roller painting, electrodeposition painting, and electrostatic painting. It is formed by applying a coat of paint and then subjecting it to heat treatment. Here, the thickness of the coating film is not particularly limited, but is usually 20 to 30 Bm.

また、金属製品の素材がアルミニウム或いはアルミニウ
ム合金である場合には、通常の方法で陽極醇化処理と封
孔処理とを施すことにより、金属製品の表面に非4電性
皮膜層を形成することが可能である。
In addition, if the material of the metal product is aluminum or aluminum alloy, a non-quaternary conductive film layer can be formed on the surface of the metal product by applying anodizing treatment and sealing treatment using the usual method. It is possible.

即ち、金属製品の表面を木酢化ナトリウム溶液等で脱脂
洗浄し、硫酸、陽酸、硫蓚酸等の水溶液からなる陽極酸
化皮膜生成浴中で、電流密度1.0〜1.5^/dm’
で20〜50分間直流電解し1次に必要に応じて染料溶
液中に浸漬し染色処理を施して、更に酢酸二ンケル、酢
酸コノヘルド等の水溶液中で者沸封孔処理をするか、或
いは、例えば7A気圧5kg/Cm’程度で20〜30
分間の蒸気封孔処理をすることによって達成される。陽
極酸化封孔処理層の厚さは、特に限定されるものではな
いが、通常10〜151である。
That is, the surface of the metal product is degreased and cleaned with a sodium pyrolyl acetate solution, etc., and then heated at a current density of 1.0 to 1.5^/dm' in an anodic oxide film forming bath consisting of an aqueous solution of sulfuric acid, anodic acid, sulfuric acid, etc.
Direct current electrolysis is carried out for 20 to 50 minutes, and then, if necessary, it is immersed in a dye solution for dyeing treatment, and then further subjected to a boiling hole sealing treatment in an aqueous solution of nickel acetate, conoheld acetate, etc., or For example, 20-30 at 7A atmospheric pressure 5kg/cm'
This is accomplished by steam sealing for minutes. The thickness of the anodized pore-sealing layer is not particularly limited, but is usually 10 to 151 mm.

前記非Jg電性(支)膜層を所望の文字、図柄等に応し
て除去する方法には、物理的なjJ]削方法、或いはレ
ーザービームを照射する方法か採用される。
The method for removing the non-Jg conductive (supporting) film layer according to desired characters, patterns, etc. may be a physical abrasion method or a laser beam irradiation method.

物理的な切削方法では、グイヤモントバイト。In terms of physical cutting methods, Guyamont bite.

セラミンクバイト、超硬合金タングステンバイト等が適
用される。
Ceramic bits, cemented carbide tungsten bits, etc. are applicable.

また、レーザービームを[!q射する方法は、YAGレ
ーザ−ビーム、C02カスレーザーヒーム、ルヒーレー
ザーヒーム等のいずれかを照射し、局部的に非4電性皮
119層を焼失或いは溶解ノン発せしめて除去する方法
である。この方法は再現性か良く、精瓜も冑<、シかも
効果が良い多1に生産に適しj−除去力法である。
Also, the laser beam [! The q-irradiation method is to irradiate with a YAG laser beam, C02 cass laser beam, Luhi laser beam, etc., and locally remove the 119 layers of non-quaternary conductive skin by burning it out or dissolving it and causing non-emission. be. This method has good reproducibility and is suitable for the production of melon as it is highly effective.

即ち、レーザービームを遮蔽する素材からなる所望の文
字5図柄等が開口されたマスクを適用し、金属製品の非
導電性皮膜層に該マスクを密着して、マスク仝面をレー
ザービームにより走査し照射すればよく、開口された部
分に相当する非導電性皮膜層のみがレーザービームによ
り照射され、焼失或いは溶融蒸発して除去される。レー
ザービームを遮蔽する素材、マスクはレーザービームの
種類により異なるが、例えばステンレス、銅合金等の金
属板、金属箔、金属含有塗装膜等により形成される。ま
た、レーザービームを走査し、照射する条件は、非導電
性皮膜層の種類とその厚さ及びレーザービームの種類等
により異なり−・概には言えないが、−例を挙げると、
YAGレーザーの場合であれば、ビーム径:50〜15
〇−φ、出カニl0−40W、送り速度: 200〜4
00 mm/secの条件に於いて、前記非導電性皮膜
層を除去することがrif能である。
That is, a mask made of a material that shields laser beams and has a desired character pattern, etc., is applied, the mask is closely attached to a non-conductive film layer of a metal product, and the surface of the mask is scanned with a laser beam. Only the non-conductive coating layer corresponding to the opened portion is irradiated with the laser beam and removed by burning or melting and vaporizing. The material or mask that shields the laser beam varies depending on the type of laser beam, but is formed of, for example, a metal plate of stainless steel, copper alloy, etc., metal foil, metal-containing paint film, or the like. In addition, the conditions for scanning and irradiating the laser beam vary depending on the type and thickness of the non-conductive film layer, the type of laser beam, etc. Although it is difficult to generalize, for example:
For YAG laser, beam diameter: 50-15
〇-φ, output crab l0-40W, feed speed: 200-4
It is possible to remove the non-conductive film layer under the condition of 00 mm/sec.

更に、文字、図柄等の原画を読み取る原画走査と、原画
に同一か或いは相似形の画像を被照射面に再現し照射す
るレーザービーム走査とを、同期して行う周知の装置を
利用することによって、前述したレーザービーム遮蔽マ
スクの必要もなく、−・品一様に所望の文字、図柄等を
非導電性皮膜層の除去された部分として、速やかに効率
良く金属製品の表面に再現することが出来る。
Furthermore, by using a well-known device that synchronizes original image scanning to read original images such as letters and designs, and laser beam scanning to reproduce and irradiate an image identical to or similar to the original image on the irradiated surface. , there is no need for the aforementioned laser beam shielding mask, and it is possible to quickly and efficiently reproduce desired characters, designs, etc. on the surface of metal products uniformly in the area where the non-conductive film layer has been removed. I can do it.

かくして、非道゛屯性皮膜層の所望の部分が除去され露
出した金属…1に、次いで導電性の熱硬化性塗料を電着
#、装するが、未発明に於いては該塗料としてカチオン
型の熱硬化性樹脂と金属微粉末とを成分とするものが好
適に用いられる。
In this way, a desired portion of the non-conductive film layer is removed and the exposed metal...1 is then electrodeposited with a conductive thermosetting paint. A thermosetting resin containing a thermosetting resin and a fine metal powder is preferably used.

カチオン型の熱硬化性樹脂は、例えば周知のアミノ貼を
イIするエポキシ樹脂、ウレタン樹脂、アクリル樹脂、
ポリアミノ樹脂等を適用し、また、その中和剤としては
、好ましくは燐酸、酢酸、乳酸、クエン酸等が使用され
る。
Examples of cationic thermosetting resins include epoxy resins, urethane resins, acrylic resins, and
A polyamino resin or the like is used, and phosphoric acid, acetic acid, lactic acid, citric acid, etc. are preferably used as the neutralizing agent.

金属微粉末は、良導′耐性の銀、銅、ニッケル等の微粉
末であって、周知の方法である機械的粉砕状、カーボニ
ル法、カス中蒸発法、電解法、イオン化傾向を利用した
置換法等により得られるものである。
Fine metal powders are fine powders of silver, copper, nickel, etc. with good conductivity resistance, and can be processed by well-known methods such as mechanical pulverization, carbonyl method, evaporation method in scum, electrolytic method, and substitution using ionization tendency. It can be obtained by law etc.

特に、本発明に適用される金属微粉末の粒径は005〜
2戸の範囲にあるのがよく、またその形状は〃イましく
は片状である。
In particular, the particle size of the metal fine powder applied to the present invention is 005~
It is preferably within the range of two houses, and its shape is preferably strip-like.

片状の金属微粉末は、まず液層反応で微粉末を生成し、
次に機械的な粉砕を行い、更に選別することにより得ら
れる。
The flaky metal fine powder is first produced by a liquid phase reaction,
Next, it is obtained by mechanical crushing and further sorting.

例えば、銀の微粉末を得るには、硝酸銀と苛性ソータと
の反応で酸化銀を生成し、次にホルムアルデヒドと反応
させるのであり、この場合それら反応物は各々特定濃度
の水溶液として用いればよく、これによって通常粒径0
.5〜5gmの微粉末が得られる。更にこの微粉末をベ
ンゼン、n−ヘキサン等の炭化水素と共にボールミル、
振動ミル等で粉砕すれば、所望の粒径0.2〜2ILI
11の銀の微粉末を効率良く得ることが1能である。
For example, to obtain fine silver powder, silver oxide is produced by reacting silver nitrate with a caustic sorter, and then reacting with formaldehyde. In this case, each of these reactants may be used as an aqueous solution with a specific concentration. This usually results in a particle size of 0.
.. A fine powder of 5-5 gm is obtained. Furthermore, this fine powder is ball milled with hydrocarbons such as benzene and n-hexane.
If pulverized with a vibrating mill etc., the desired particle size is 0.2~2ILI
It is possible to efficiently obtain fine silver powder of No. 11.

4、−に振動ミルで粉砕し得られる微粉末は片状となり
 その形状は、最長となる粒径が最短となる才q1¥(
厚さ)の5〜lO倍程度となるが、このものも含め一般
に片状微粉末は後述するJA電性塗膜層の表面に鍍金処
理を施す工程で良好な性能を発揮することから好ましい
ものである。
4. The fine powder obtained by crushing with a vibrating mill becomes flaky, and its shape is as follows: the longest particle size is the shortest.
It is about 5 to 10 times the thickness (thickness), but flaky fine powders, including this one, are generally preferred because they exhibit good performance in the process of plating the surface of the JA electroconductive coating layer, which will be described later. It is.

また、特に微細、な金属微粉末は、金属を不活性カス中
で加熱し、蒸発させて冷却面に旬五させて得られる超微
粒子の集合体であり、見掛は密度が小さく、分散性も良
く、導電性情1模層の表面を平滑となし、また該塗膜層
の導電性を高めることに優れ、後述する鍍金処理の1−
程を改善するものである。
In addition, especially fine metal powder is an aggregate of ultrafine particles obtained by heating metal in an inert scum, evaporating it, and placing it on a cooling surface. It is excellent in making the surface of the conductive layer smooth and increasing the conductivity of the coating layer, and is suitable for plating treatment described below.
It is intended to improve the process.

電着塗装液は、まず、前記カチオン型熱硬化性樹脂を、
必要に応じて界面活性剤と共に精製水に分散してエマル
ジョンを生成せしめ、次に前記中和剤で中和し、更に前
記金属微粉末を加え攪拌して該微粉末を樹脂のエマルジ
ョン粒子の中に、或いはそのFil囲に付着させ、また
は連続相である精製水中に分散せしめることにより得ら
れるものである。また、重石塗装液中に金属微粉末を均
一に分散させる為に、メチルセルロース、ポリビニルア
ルコール、ゼラチン等の増粘剤を添加することもl「能
である。
The electrodeposition coating liquid first contains the cationic thermosetting resin,
If necessary, disperse in purified water with a surfactant to form an emulsion, then neutralize with the neutralizing agent, add the fine metal powder, and stir to incorporate the fine powder into the resin emulsion particles. It can be obtained by adhering it to or around the film, or by dispersing it in purified water, which is a continuous phase. It is also possible to add a thickener such as methylcellulose, polyvinyl alcohol, gelatin, etc. to uniformly disperse the fine metal powder in the coating liquid.

電着4装Mの不揮発分は10〜30′I#、!6% 、
 pHは4〜8.また金属微粉末とカチオン型熱硬化性
樹脂のニーは、容積比率で2〜6二8〜4に、また@量
比率では 7〜9:3〜1とすればよい。
The non-volatile content of 4 electrodeposited M is 10~30'I#,! 6%,
pH is 4-8. The ratio of the metal fine powder to the cationic thermosetting resin may be 2 to 6:28 to 4 by volume, and the ratio by volume may be 7 to 9:3 to 1.

1E着塗装は、まず前処理として金属製品を脱脂洗浄し
、前記電着塗装液の入った浴中で、電着塗装液を攪拌し
ながら、金属製品を陰極に、ステンレス板等を陽極にし
て、両極間に50〜150vの直泣電流を 1〜3分間
JII+電する通常の方法により施せばよく、これによ
って前記非導電性皮膜層が除去ネれた導電性の金属面の
みに導電性熱硬化性塗料が゛il′i;着塗装される。
In 1E coating, the metal product is first degreased and cleaned as a pretreatment, and then placed in a bath containing the electrodeposition coating liquid, with the metal product used as a cathode and a stainless steel plate, etc., as an anode, while stirring the electrocoating liquid. , a direct welding current of 50 to 150 V may be applied between the two electrodes by the usual method of applying JII+ current for 1 to 3 minutes, thereby removing the non-conductive film layer and applying conductive heat only to the conductive metal surface. A curable paint is applied.

次に洗詐した後、 120〜200°Cの温度で15〜
30分間乾熱処理を施して完全に硬化せしめると、厚さ
10〜30μmの導電性塗j1り層が形成される。この
塗膜層の厚さは、非導電性皮膜層除去部分(四部)の深
さ、あるいは次に述べる鍍金層の厚さ等を勘案し、最終
的に鍍金層の表面が金属製品の表「11(除去されてい
ない非導電性成IIφ層の而)と略々同一・面にくるよ
うに調整される。
Next, after washing, wash at a temperature of 120-200°C for 15~
When completely cured by dry heat treatment for 30 minutes, a conductive coating layer with a thickness of 10 to 30 μm is formed. The thickness of this coating layer is determined by taking into consideration the depth of the non-conductive coating layer removed portion (four parts) or the thickness of the plating layer described below, etc., and finally the surface of the plating layer is determined to be the surface of the metal product. 11 (the non-conductive IIφ layer that has not been removed).

ここで、導電性熱硬化性塗料として片状の金属微粉末を
配合したものを用いた場合には、該金属微粉末の角が表
面に突出することが少なく、平滑な塗119層が形成さ
れ1次の鍍金工程で美麗かつ平滑で療さむらの少ない鍍
金層が得られるところから特に好ましいが、かかる効果
は電着塗装を採用したことによって特に顕著となるので
あり、他の塗装方法、例えば刷毛塗装、スプレー塗装、
ローラー塗装等によってこれを充分に達することは困難
である。
Here, when a conductive thermosetting paint containing flaky metal fine powder is used, the corners of the metal fine powder are less likely to protrude on the surface, and a smooth coating layer is formed. This is particularly preferable because a beautiful, smooth, and less uneven plating layer can be obtained in the first plating process, but this effect becomes particularly noticeable when electrodeposition coating is used, and other coating methods, such as e.g. Brush painting, spray painting,
It is difficult to achieve this sufficiently by roller coating or the like.

かくして形成された導電性塗膜層の表面に、次に鍍金処
理を施し、金、銀、銅、ニッケル、クロム、カドミウム
等の鍍金層を形成せしめる。その−JJ法は、従来より
実施されている導電性の塗装面或いは樹脂面に鍍金処理
を施す周知の方法に基づき適宜調整され得るものである
The surface of the conductive coating layer thus formed is then subjected to plating treatment to form a plating layer of gold, silver, copper, nickel, chromium, cadmium, or the like. The -JJ method can be adjusted as appropriate based on the well-known method of plating a conductive painted surface or resin surface.

諺金層の厚さは通常3〜6gmであれば良く、従って鍍
金処理時間も一般に3〜6分間程度の短「を間で十分で
ある。
The thickness of the gold layer should normally be 3 to 6 gm, and therefore a short plating time of about 3 to 6 minutes is sufficient.

図面は本発明の方法をその順序に従って示した型部断面
IAである。図面に於てlは金属製品、2は金属製品の
表面に形成された非導電性皮膜層、3は文字、図柄等に
応じて非導電性皮膜層を除去して露出された導電性の金
属面、4は金属面に電着塗装して形成された導電性の塗
膜層、5は該塗膜層の表面に鍍金処理を施し形成された
鍍金層である。 ・ 1−蓮のごとく、本発明は、金属製品の表面に形成され
た非導電性皮膜層を文字、図柄等に応じて除去して露出
した金属面に、導電性塗膜層を形成し、更に該塗膜層の
表面に鍍金処理を施す加飾方法であって、従来の如く該
金属面に直接鍍金処理を施す加飾方法とは異なり、以下
の如き利点を有するものである。
The drawing is a cross-section IA of a mold part showing the method of the present invention in its order. In the drawings, l is a metal product, 2 is a non-conductive film layer formed on the surface of the metal product, and 3 is a conductive metal exposed by removing the non-conductive film layer according to characters, designs, etc. 4 is a conductive coating layer formed by electrodeposition on a metal surface, and 5 is a plating layer formed by plating the surface of the coating layer.・1-Like a lotus, the present invention removes a non-conductive coating layer formed on the surface of a metal product according to characters, designs, etc. and forms a conductive coating layer on the exposed metal surface, Furthermore, the present invention is a decoration method in which the surface of the coating layer is plated, and unlike the conventional decoration method in which the metal surface is directly plated, it has the following advantages.

Iiuち、本発明方法によれば、鍍金層が形成された文
字5図柄等の部分を金属製品の他の表面部分と同一面と
することが容易であり、加飾された金属製品の表面は全
体として平滑なものとなるので外観1−も好ましく、手
に触れてもざらつくことも無く、史に耐摩滅性、耐腐食
性も向I−シ改善される。また、鍍金処理面間が短縮さ
れるので、鍍金浴中に長時間8)漬することにより金属
製品の表面がおかされるといったような爪れがない。更
に、償金処理はi前塗装して形成された文字、図柄等で
ある導電性塗膜層の表面に施されるのであり、細かいか
或いは11]の狭い文字、図柄等であっても、精畜に且
つ繊細に金属製品に加飾することが++(能である。更
にまた、特に導電性の熱硬化性塗料に含有されている金
属微粉末の形状が片状である場合には、導1を性情11
り層の表面に、平滑で、厚さにむらの少い均一な鍍金層
を形成することが出来る。
Iiu, according to the method of the present invention, it is easy to make the part such as the character 5 pattern on which the plating layer is formed on the same surface as the other surface part of the metal product, and the surface of the decorated metal product is Appearance 1- is also preferable because it is smooth as a whole, does not feel rough when touched, and has improved abrasion resistance and corrosion resistance. In addition, since the distance between the surfaces to be plated is shortened, there is no scratching of the surface of the metal product, which occurs when the metal product is immersed in a plating bath for a long time. Furthermore, the compensation process is applied to the surface of the conductive coating layer, which is characters, designs, etc. formed by pre-painting, and even if the characters, designs, etc. are fine or narrow, It is possible to decorate metal products delicately and delicately.Furthermore, especially when the metal fine powder contained in the conductive thermosetting paint has a flaky shape, 1 as sexual desire 11
A smooth, uniform plating layer with less unevenness in thickness can be formed on the surface of the plating layer.

本発明は各種金属製品に適用されるものであるが、特に
化粧料の容器となる金属製品に採用され、光輝性のある
文字、図柄等の外観を有する高品位にして極めて美しく
Hつ耐久性の優れた容器を提供するものである。
The present invention is applicable to various metal products, but is particularly applicable to metal products used as containers for cosmetics.The present invention is applied to metal products that are used as containers for cosmetics, and is of high quality, extremely beautiful, and durable, with an exterior appearance such as glittering letters and designs. This provides an excellent container.

次に1本発明の実施例と比較例を記載する。Next, an example of the present invention and a comparative example will be described.

尚、本発明は実施例に記載するもののみに限定されるも
のではない。
Note that the present invention is not limited to only what is described in the examples.

実施例 l アルミニウム〔純度sa、s @@% 、 (以下、子
端%を wt%と略記する)〕製のヤヤップを2wtχ
水酸化ナトリウム水溶液で脱脂洗浄し、18wt%硫酸
水溶液からなる液温23℃の電解浴中に浸漬17て電流
密度1.5A/dm″で30分間直施主解し、膜厚10
戸の陽81酸化皮膜を形成した。これを濃青色の染料溶
液中に20分間浸漬した後、液温95℃の5vt%酢酸
ニッケル溶液中に20分間浸漬して封孔処理を施した。
Example l Yayap made of aluminum [purity sa, s@@% (hereinafter, terminal % is abbreviated as wt%)] was 2wtχ
After degreasing and cleaning with an aqueous sodium hydroxide solution, the film was immersed in an electrolytic bath of 18 wt% sulfuric acid at a temperature of 23°C and directly applied for 30 minutes at a current density of 1.5 A/dm.
Tonoyo 81 oxide film was formed. This was immersed in a deep blue dye solution for 20 minutes, and then immersed in a 5vt% nickel acetate solution at a liquid temperature of 95°C for 20 minutes to seal the holes.

次に、このキャップの天面に、表面を研磨したステンレ
ス製或いは調合金製の薄板にAという文字が開口された
マスクをv=1し、このマスクの照射面(20av+ 
p ’)に、出力36〜52J/a/の条件でCO?ガ
スレーザーヒーム(波長10.83−)を照射して、A
という文字の陽極酸化封孔処理層を除去し、導゛屯Hの
アルミニウム金属面を露出した。この陽極酸化ト1孔処
理層を除去した部分の徐さは15戸であった。
Next, on the top surface of this cap, a mask with the letter A opened in a thin plate made of stainless steel or prepared alloy with a polished surface is placed v=1, and the irradiation surface of this mask (20av+
p'), CO? under the condition of output 36 to 52 J/a/? Irradiate with a gas laser beam (wavelength 10.83-) to
The anodic oxidation sealing layer marked with the letters ``H'' was removed to expose the aluminum metal surface of the conductor H. The roughness of the part from which this anodized one-hole treatment layer was removed was 15.

次に、このキャップを、カチオン型のアクリル系゛屯着
悄装樹脂と銀の微粉末(粒径:0.2〜2.〇−)を精
製水中に分散したエマルジョン型の電着塗装浴中に浸漬
し、パ電着塗装液を攪拌しながら、キャップを陰極に、
2ステンレス板を陽極にして両極間に100vの直流を
1分間通電した。電着塗装浴の液温は23℃、不揮発分
は20wt$ 、 pHは7.0であり、また上記銀微
粉末と電着塗装樹脂の重量比率は9:1とし、中和剤に
は酢酸を使用した。ついで、このキャンプを温度150
℃の加熱炉の中で20分間加熱して電着した塗膜層を硬
化せしめ、厚さlOμsの導電性@膜層を前記アルミニ
ウム金属露出面(Aという文字の部分)に形成した。
Next, this cap was placed in an emulsion-type electrodeposition coating bath in which a cationic acrylic coating resin and fine silver powder (particle size: 0.2 to 2.0-) were dispersed in purified water. While stirring the electrodeposition coating solution, place the cap on the cathode.
2 stainless steel plate was used as an anode, and a direct current of 100 V was applied for 1 minute between the two electrodes. The liquid temperature of the electrodeposition coating bath was 23°C, the nonvolatile content was 20wt$, and the pH was 7.0.The weight ratio of the above fine silver powder and electrodeposition coating resin was 9:1, and acetic acid was used as a neutralizing agent. It was used. Next, the temperature of this camp is 150
The electrodeposited coating layer was cured by heating in a heating oven at .degree. C. for 20 minutes, and a conductive @film layer with a thickness of 10 .mu.s was formed on the aluminum metal exposed surface (the part marked with letter A).

史に、このキャップを液温50°Cである銀鍍金浴(精
製水1父中、シアン化M< + 40g 、シアン化カ
リウム: 1803. Yti酸カリウム: 15g 
)中に浸漬し、キャップをV)−極に、銀板を陽極にし
て両極間しこ8vの直流を電流密度3A/dゴで2分1
141通“准し、厚さ51LI11の銀の鍍金層を前記
導電性塗膜層の表面に形成した。
Historically, this cap was placed in a silver plating bath with a liquid temperature of 50°C (1 part purified water, cyanide M < + 40g, potassium cyanide: 1803. Potassium Ytiate: 15g)
), and with the cap as the V) - pole and the silver plate as the anode, apply 8 V of direct current between the two poles to 1/2 at a current density of 3 A/d.
A silver plating layer having a thickness of 51 LI11 was formed on the surface of the conductive coating layer.

、す色のキャンプ天面に、光輝性のある銀色のAとい〉
文字を、高精度比つ高品位に加飾することか出来た。
, A shiny silver A on the amber camp top.
It was possible to decorate characters with high quality compared to high precision.

尚、鍍金層はキャップの表面(除去されていない陽極酸
化封孔処理層の面)とほぼ同一面りにあった。
Note that the plating layer was almost flush with the surface of the cap (the surface of the anodized pore-sealing layer that had not been removed).

比較例 l ゛X実施例に於いて、露出されたアルミニウム金属面に
導電性の塗膜層を形成する]二程を省き、該露出金属面
に、通常の方法でスズ置換処理をした後ニッケル鍍金処
理と銀鍍金処理を施して、厚さ15IiI11の鍍金層
を形成した。
Comparative Example l ゛In Example X, the second step of forming a conductive coating layer on the exposed aluminum metal surface was omitted, and the exposed metal surface was subjected to tin substitution treatment in a conventional manner, and then nickel was added. A plating layer having a thickness of 15IiI11 was formed by performing plating and silver plating.

鍍金処理に要した時間は22分間であり、実施例1の鍍
金処理時間である5分間より17分間長い鍍金処理時間
を必要とした。その為、キャップの天面に染色−したi
ff色は明らかに退色し、鍍金層の厚さにもむらを生じ
た。
The time required for the plating process was 22 minutes, which was 17 minutes longer than the plating time of 5 minutes in Example 1. Therefore, the top surface of the cap is dyed with i.
The ff color clearly faded, and the thickness of the plating layer also became uneven.

実施例 2 実施例1に於いて、重石塗装液に分散する銀微粉末の粒
径を0.05〜0.5戸とし、この銀微粉末とカチオン
型のアクリル系電着塗装樹脂の虫星比率を7:3とする
ほかは実施例1と同一の処理を施した6加飾された鍍金
層の表面は実施例1より1g1らかに平滑になっていた
。また、実施例1より銀微粉末の粒径を小さくすること
によって、銀微粉末の電着塗装樹脂に対する添加量−を
低減することが出来た。
Example 2 In Example 1, the particle size of the fine silver powder dispersed in the weight coating solution was set to 0.05 to 0.5, and the particle size of the fine silver powder and the cationic acrylic electrodeposition coating resin was mixed. The surface of the 6-decorated plating layer, which was subjected to the same treatment as in Example 1 except that the ratio was 7:3, was 1g1 smoother than in Example 1. Further, by making the particle size of the fine silver powder smaller than in Example 1, it was possible to reduce the amount of the fine silver powder added to the electrodeposition coating resin.

実施例 3 実施例1に於いて、形状が片状であり、粒径が0.2〜
2戸である銀微粉末を用い、このIii微粉末とカチオ
ン型のアクリル系゛ル:着塗装樹脂との重湯比率を7.
5 : 2.5とするほか実施例1と同一の処理を施し
た。
Example 3 In Example 1, the shape was flaky and the particle size was 0.2 to
Using two types of silver fine powder, the heavy water ratio of this III fine powder and cation type acrylic resin to coating resin was set to 7.
5: The same treatment as in Example 1 was performed except that the value was set to 2.5.

銀微粉末の添加量を実施例1より低減しても、加飾され
た鍍金層の表面は平滑でむらの無いものであった。
Even if the amount of silver fine powder added was lower than in Example 1, the surface of the decorated plating layer was smooth and without unevenness.

実施例 4 実施例1で002カスレーザービームを照射し。Example 4 In Example 1, the 002 cass laser beam was irradiated.

Aという文字の陽極酸化封孔処理層を除去する代りに、
ダイヤモンドバイトを使用した物理的な切削の方法でA
という文字の陽極酸化封孔処理層を除去するほかは実施
例1と同一の処理を施し、はぼ回−の加飾されたキャッ
プを作成した。
Instead of removing the anodized sealing layer of the letter A,
A by physical cutting method using a diamond bit
The same treatment as in Example 1 was performed except that the anodized pore sealing layer with the letters ``'' was removed, and a cap decorated with ``Habo-kai'' was produced.

実施例 5 黄銅製のネームプレートに通常の方法で酸、アルカリ洗
詐処理を施した後、ネームプレートの表面に黒色のエポ
キシ系塗料をエアー圧力5 Kg/ a/でスプレーI
P装し、加熱炉で130℃の温度で20分間熱処理して
4装咬を硬化せしめた。塗装膜の厚ゴは30Jinであ
ったや 次に、このネームプレートの1−記塗装脱がらBという
文字に相九する部分を削除するため、原画を読み取る原
画走査と、原画と同一の画像を被照射面に再現し照射す
るレーザービーム走査とを同期して行うYAGレーザ−
ビーム(波長1.06.)発生装置を利用した。この装
置は、原画をテレヒカメラで撮像し、テレヒカメラから
出力された画像アナログデーターをオン、オフ(iti
に変換して、このオン、オフイ向に応してレーザービー
ムのIQ;、I[をオン、オフ制御するようになってい
る。つまり、Bという文字のj車両をテレヒカ武うで撮
像走査すると同時tこ、Bという文字の画像を1ii記
塗装置19にYAGレーザ−ビームが照射走査して塗装
膜を除去することにより−rE”、 Bという文字の黄
銅の金属面を露出した。レーザービームを照射する条件
は、ビーム径: 120 pxnφ、出力+12W、Q
スイワナ周波数: 50K)+2 、送り速度: 3(
toam/see テあった。 次に、このネームプレ
ートを、カチオン型のエポキシ系電着塗装樹脂とニッケ
ルの微粉末(粒径:0.1〜10戸)を精製水中に分散
したエマルジョン型の電着塗装浴中に浸漬し、電着塗装
液を撹拌しながら、ネームプレートを陰極に、ステンレ
ス板を陽極にして両極間に100vの直流を2分間通゛
屯した。電着塗装浴の液温は28℃、不揮発分ハ25w
tX 、 pHハフ、5 テあり、また」記= ッケル
微粉末と樹脂の東都比率は8:1とし、中和剤には燐酸
を使用した。′ついで、このネームプレートを温1μm
60℃の加熱炉の中で30分間加熱して、電着した襠装
膜を完全に硬化せしめ、厚さ28Pの導電性塗装膜を前
記の露出した黄銅の金属面(Bという文字の部分)に形
成した。
Example 5 A brass name plate was washed with acid or alkali in the usual manner, and then black epoxy paint was sprayed on the surface of the name plate at an air pressure of 5 kg/a/I.
The four pieces were hardened by heat treatment in a heating furnace at a temperature of 130° C. for 20 minutes. The thickness of the paint film was 30Jin.Next, in order to delete the part that corresponds to the letter 1-B of this name plate, we scanned the original to read the original, and we also created an image that is the same as the original. A YAG laser that synchronizes the laser beam scanning that reproduces and irradiates the irradiated surface.
A beam (wavelength 1.06.) generator was used. This device captures the original image with a TV camera, and turns the image analog data output from the TV camera on and off (ITI).
The laser beam's IQ; In other words, when the vehicle with the letter B is imaged and scanned with a telegraph arm, the image of the letter B is irradiated and scanned with a YAG laser beam to the painting station 19 described in 1ii to remove the paint film. ”, the brass metal surface with the letter B was exposed.The conditions for irradiating the laser beam were: beam diameter: 120 pxnφ, output +12W, Q
Suiwana frequency: 50K)+2, feed speed: 3(
toam/see It happened. Next, this name plate was immersed in an emulsion-type electrodeposition coating bath in which cationic epoxy electrodeposition coating resin and fine nickel powder (particle size: 0.1 to 10 units) were dispersed in purified water. While stirring the electrodeposition coating solution, a 100 V direct current was passed between the two electrodes for 2 minutes using the name plate as the cathode and the stainless steel plate as the anode. The liquid temperature of the electrodeposition coating bath was 28℃, and the nonvolatile content was 25W.
tX, pH huff, 5 te, and tX, pH huff, 5 te. The ratio of Kkel fine powder to resin was 8:1, and phosphoric acid was used as a neutralizing agent. 'Then, heat this name plate to a temperature of 1 μm.
The electrodeposited gossamer film was completely cured by heating in a heating furnace at 60°C for 30 minutes, and a conductive coating film with a thickness of 28P was applied to the exposed brass metal surface (the part marked B). was formed.

更に このネームプレートを液温50℃である二;7ケ
ル鍵金浴(精製水1文中、硫酸ニッケル=240g、塩
化二、ケル:45g、はう酸: 30g)中に浸漬し、
ネームプレートを陰極に、ニッケル板を陽極にしテll
l1I8i間に−5V(7)直流ラミ流密113A/ 
dIT+′−c5分間通電し、厚さ5.のニッケルの鍍
金層を前記導電性塗膜層の表面に形成した。ついで、こ
のネームプレートを精製水で洗浄し、液温50℃の金鍍
金浴(精製水 1文中、シアン化カリウム=30g、第
二燐酸カリウム: 30g)中に浸漬し、ネームプレー
トを陰極に、金板を陽極にして両極間に3vの′lI′
J流をSi、流密度0.5A/ drn’で 5秒間通
電した。
Furthermore, this name plate was immersed in a 2:7 Kel key metal bath (1 cup of purified water, 240 g of nickel sulfate, 45 g of dichloride, 45 g of Kel, 30 g of ferrous acid) with a liquid temperature of 50°C.
Use the name plate as the cathode and the nickel plate as the anode.
-5V between l1I8i (7) DC laminate flow tightness 113A/
dIT+'-c energized for 5 minutes, thickness 5. A nickel plating layer was formed on the surface of the conductive coating layer. Next, this name plate was washed with purified water, and immersed in a gold plating bath (purified water, potassium cyanide = 30 g, dibasic potassium phosphate: 30 g) at a liquid temperature of 50°C, and the name plate was used as a cathode. with the anode and 3V 'lI' between the two poles.
J flow was applied to Si for 5 seconds at a flow density of 0.5 A/drn'.

黒色のネームプレートに、光輝性のある金色のBとい゛
う文字を、高品位にして且つ繊細に加飾することが出来
た。尚、鍍金層はネームプレートの表面(除去されてい
ないエポキシ樹脂塗装膜面)とほぼ同一の面に存在した
We were able to decorate the black name plate with a high-quality and delicately glittering gold letter B. Note that the plating layer was present on almost the same surface as the surface of the name plate (the surface of the epoxy resin coating film that was not removed).

【図面の簡単な説明】[Brief explanation of the drawing]

第1 図、第2 図、第3 図は本発明の方法をそのm
n序に従って示した要部断面図。 1〜 金属製品、 2〜 非導電性皮膜層、 3〜 金
属面(文字、(A柄等の部分 )、4〜4電性塗膜層、
5 〜 鍍金層
Figures 1, 2 and 3 illustrate the method of the present invention.
FIG. 1 - Metal product, 2 - Non-conductive film layer, 3 - Metal surface (letters, (parts such as A pattern), 4 - 4 electrically conductive film layer,
5 ~ Plating layer

Claims (1)

【特許請求の範囲】 1、りc属製品の表面に非4庫゛性皮腔層を形成した後
、任0の文字、図柄等に応じて前記非導電性皮膜層の所
望の部分を除去して導′心性の金属面を人出し、引hν
いて該金属面に導′ik性の熱硬化性塗料を【5ノ1塗
装して4 ’ik性4膜層を形成し1.、!;、塗膜層
の人聞に偵金処理を施すことを特徴とする金属製品の加
飾方法。 2、 全1工製品かアルミニウム或いはアルミニウム合
金からなり 非4電性皮膜層かr4A極酸化封孔処理膜
からなる特許請求の範囲第1項に記載の金属製品の加飾
方I去。 訳 非4電性皮膜層が非導電性皮膜層からなる特許請求
の範囲第1項に記載の金属製品の加飾力lノミ。 4、 非導電性皮膜層の所望の部分を除去する方法が物
理的な切削の方法である特許請求の範囲第1項乃至第3
項のいずれかに記載の金属製品の加飾 方ノ大 。 5 非4電性皮膜層の所望の部分を除去する方法がレー
ザービームを!K(射する方法である4¥許請宋の範囲
第1すI乃至第3項のいずれかに記載の金属製品の加飾
方法。 6.4電性の熱硬化性塗料がカチオン型熱硬化性樹脂と
金14m粉末とを成分としてなるものである特許請求の
範囲第1項乃至第5エロのいずれかに記載の金属製品の
加飾方法。
[Scope of Claims] 1. After forming a non-conductive skin layer on the surface of a LIC product, a desired portion of the non-conductive film layer is removed in accordance with letters, designs, etc. Then remove the conductive metal surface and remove it.
1. Apply a conductive thermosetting paint to the metal surface to form 4 layers of 4'ik property. ,! ; A method for decorating metal products, characterized by subjecting the surface of the paint film layer to a rectification process. 2. A method for decorating a metal product as set forth in claim 1, wherein the entire product is made of aluminum or aluminum alloy, and the product is made of a non-4-electrode coating layer or an R4A polar oxidation sealing film. The decoration power chisel for metal products according to claim 1, wherein the non-tetraelectric coating layer is a non-conductive coating layer. 4. Claims 1 to 3, wherein the method for removing a desired portion of the non-conductive film layer is a physical cutting method.
Decoration of metal products described in any of the paragraphs. 5 Laser beam is the method to remove the desired part of the non-tetraelectric film layer! A method for decorating metal products according to any one of Items 1 to 3 of the Song Dynasty, which is a method of spraying. 6.4 Electrothermosetting paint is cationic thermosetting. 5. A method for decorating a metal product according to any one of claims 1 to 5, which comprises a synthetic resin and gold 14m powder as ingredients.
JP59016389A 1984-01-30 1984-01-30 Ornamenting method of metallic product Granted JPS60159198A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59016389A JPS60159198A (en) 1984-01-30 1984-01-30 Ornamenting method of metallic product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59016389A JPS60159198A (en) 1984-01-30 1984-01-30 Ornamenting method of metallic product

Publications (2)

Publication Number Publication Date
JPS60159198A true JPS60159198A (en) 1985-08-20
JPS6340880B2 JPS6340880B2 (en) 1988-08-12

Family

ID=11914897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59016389A Granted JPS60159198A (en) 1984-01-30 1984-01-30 Ornamenting method of metallic product

Country Status (1)

Country Link
JP (1) JPS60159198A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62299334A (en) * 1986-06-18 1987-12-26 倉敷化工株式会社 Manufacture of corrosion-resistant rubber vibration insulator
JPS6346589U (en) * 1986-09-12 1988-03-29
JPS63293196A (en) * 1987-05-26 1988-11-30 Kawai Kako:Kk Surface treatment of metal
JPH01315375A (en) * 1988-06-10 1989-12-20 Kansai Paint Co Ltd Method for repairing coating film surface
EP1302567A1 (en) * 2001-10-11 2003-04-16 FRANZ Oberflächentechnik GmbH & Co KG Coating method for light metal alloys

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361681U (en) * 1989-10-17 1991-06-17

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62299334A (en) * 1986-06-18 1987-12-26 倉敷化工株式会社 Manufacture of corrosion-resistant rubber vibration insulator
JPH0455589B2 (en) * 1986-06-18 1992-09-03 Kurashiki Kako
JPS6346589U (en) * 1986-09-12 1988-03-29
JPS63293196A (en) * 1987-05-26 1988-11-30 Kawai Kako:Kk Surface treatment of metal
JPH0579760B2 (en) * 1987-05-26 1993-11-04 Kawai Kako Kk
JPH01315375A (en) * 1988-06-10 1989-12-20 Kansai Paint Co Ltd Method for repairing coating film surface
EP1302567A1 (en) * 2001-10-11 2003-04-16 FRANZ Oberflächentechnik GmbH & Co KG Coating method for light metal alloys
WO2003033779A2 (en) * 2001-10-11 2003-04-24 Franz Oberflächentechnik Gmbh & Co. Kg Coating method for light metal alloys
WO2003033779A3 (en) * 2001-10-11 2003-11-20 Franz Oberflaechentechnik Gmbh Coating method for light metal alloys

Also Published As

Publication number Publication date
JPS6340880B2 (en) 1988-08-12

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