JPS60152674U - Cathode structure for spatuters - Google Patents

Cathode structure for spatuters

Info

Publication number
JPS60152674U
JPS60152674U JP3948684U JP3948684U JPS60152674U JP S60152674 U JPS60152674 U JP S60152674U JP 3948684 U JP3948684 U JP 3948684U JP 3948684 U JP3948684 U JP 3948684U JP S60152674 U JPS60152674 U JP S60152674U
Authority
JP
Japan
Prior art keywords
cathode
conductive plate
capacitance circuit
cathode structure
spatuters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3948684U
Other languages
Japanese (ja)
Inventor
宮島 愼
Original Assignee
日本ビクター株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本ビクター株式会社 filed Critical 日本ビクター株式会社
Priority to JP3948684U priority Critical patent/JPS60152674U/en
Publication of JPS60152674U publication Critical patent/JPS60152674U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

、  第1図は高周波スパッタ法の一例である複数ター
ゲツト法を説明するための図、第2図aは高周波スパッ
タ法の一例である複合ターゲツト法を説明するためのタ
ーゲットを示す図、第2図すは第2図aの側面図、第3
図は本考案になるスパッタ用カソード構造を示す図ミ第
4図はキャパシタンス(容量)を可変する方法の一例を
説明するための図である。 11・・・カソード、12・・・ターゲット、13・・
・基板、14・・・基板ホルダ、15・・・冷却水用パ
イプ、15a・・・冷却水導入口、15b・・・冷却水
排出口、16・・・軸受部、17・・・アースシールド
、18・・・真空槽の外壁、19・・・絶縁材、20・
・・駆動歯車、21・・・被駆動歯車、22・・田−タ
フイン(第1の導電板)、23・・・ステータフィン(
第2の導電板)、24・・・高周波電源入力端子、25
・・・カップリング・コイ/L; (LC)、26・・
・同調用コンデンサ(Ct)。
, FIG. 1 is a diagram for explaining a multiple target method, which is an example of a high frequency sputtering method, FIG. This is the side view of Figure 2a, Figure 3.
The figure shows the cathode structure for sputtering according to the present invention. FIG. 4 is a diagram for explaining an example of a method of varying capacitance. 11...Cathode, 12...Target, 13...
- Board, 14... Board holder, 15... Cooling water pipe, 15a... Cooling water inlet, 15b... Cooling water outlet, 16... Bearing part, 17... Earth shield , 18... Outer wall of vacuum chamber, 19... Insulating material, 20...
...Drive gear, 21...Driven gear, 22...Tough fin (first conductive plate), 23...Stator fin (
second conductive plate), 24...high frequency power input terminal, 25
...Coupling Koi/L; (LC), 26...
- Tuning capacitor (Ct).

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 高周波スパッタ装置において、ターゲットを保持するカ
ソードを回転自在に構成すると共に、前記カソードの回
転軸に第1の導電板を設け、この第1の導電板に対向す
るように第2の導電板を設け、これら第1及び第2の導
電板で静電容量回路を構成し、高周波電源を前記静電容
量回路弁して前記ターゲットに供給し1.かつ、前記静
電容量回路を整合器のカンプリング容量として用うるよ
うにしたことを特徴とするスパッタ用カソード構造。
In a high-frequency sputtering apparatus, a cathode that holds a target is configured to be rotatable, a first conductive plate is provided on the rotation axis of the cathode, and a second conductive plate is provided to face the first conductive plate. , a capacitance circuit is configured by these first and second conductive plates, and a high frequency power source is supplied to the target through the capacitance circuit valve; 1. A cathode structure for sputtering, characterized in that the capacitance circuit can be used as a compensating capacitor of a matching box.
JP3948684U 1984-03-19 1984-03-19 Cathode structure for spatuters Pending JPS60152674U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3948684U JPS60152674U (en) 1984-03-19 1984-03-19 Cathode structure for spatuters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3948684U JPS60152674U (en) 1984-03-19 1984-03-19 Cathode structure for spatuters

Publications (1)

Publication Number Publication Date
JPS60152674U true JPS60152674U (en) 1985-10-11

Family

ID=30547472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3948684U Pending JPS60152674U (en) 1984-03-19 1984-03-19 Cathode structure for spatuters

Country Status (1)

Country Link
JP (1) JPS60152674U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017503074A (en) * 2013-12-18 2017-01-26 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated AC power connector, sputtering apparatus, and method therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017503074A (en) * 2013-12-18 2017-01-26 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated AC power connector, sputtering apparatus, and method therefor
CN110942971A (en) * 2013-12-18 2020-03-31 应用材料公司 AC power connector, sputtering apparatus and method thereof
US10818475B2 (en) 2013-12-18 2020-10-27 Applied Materials, Inc. AC power connector, sputtering apparatus and method therefor

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