JPS60146237A - Coating method and its device of electrophotographic recording body base material or the like - Google Patents

Coating method and its device of electrophotographic recording body base material or the like

Info

Publication number
JPS60146237A
JPS60146237A JP130584A JP130584A JPS60146237A JP S60146237 A JPS60146237 A JP S60146237A JP 130584 A JP130584 A JP 130584A JP 130584 A JP130584 A JP 130584A JP S60146237 A JPS60146237 A JP S60146237A
Authority
JP
Japan
Prior art keywords
coating liquid
coating
bead
circumferential surface
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP130584A
Other languages
Japanese (ja)
Inventor
Takeshi Tanaka
武志 田中
Hiroshi Kojima
寛 小島
Koichi Yamamoto
幸一 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP130584A priority Critical patent/JPS60146237A/en
Publication of JPS60146237A publication Critical patent/JPS60146237A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0525Coating methods
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/007Slide-hopper coaters, i.e. apparatus in which the liquid or other fluent material flows freely on an inclined surface before contacting the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0241Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to elongated work, e.g. wires, cables, tubes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/06Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work

Abstract

PURPOSE:To apply stably and uniformly a coating liquid by providing a distributing slit on a distributing chamber without any joint, in the circumferential direction of a cylindrical base material. CONSTITUTION:Each different coating liquid S1, S2 is supplied to distributing chambers 3A, 3B through feed pipes 4A, 4B. The coating liquid is distributed in the circumferential direction of a coating device body 1, and flows out uniformly and continuously in the circumferential direction from coating liquid outflow ports 9A, 9B through slits 8A, 8B. The coating liquid S1 which has flowed out of the outflow port 9A flows down on a liquid slide part 10, is bridges to an outside circumferential surface 13 of a cylindrical base material 12 from a hopper edge 11 and forms a bead. On the other hand, the coating liquid S2 which has flowed out of the outflow port 9B is bridged between the hopper edge 11 and the base material outside circumferential surface 13, as it is, formed beads and it is coated in a shape of two layers L1, L2 to the base material outside circumferential surface by both the coating liquid beads.

Description

【発明の詳細な説明】 本発明はエンドレスに形成された連続周面を有する基材
周面上に2以上の塗布液を同時重畳塗布する電子写真記
録体基材等の塗布方法、および該方法を実施するのに好
適である装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a coating method for an electrophotographic recording material substrate, etc., in which two or more coating liquids are simultaneously applied in a superimposed manner onto the circumferential surface of a substrate having an endlessly formed continuous circumferential surface, and the method. The present invention relates to an apparatus suitable for carrying out.

本出願人は、電子写真記録体基拐等の同時重畳塗布装置
について、先に、スライド型として特願昭58−201
104号を、また押し出し型として特願昭58−201
105号を提案した。これら先提案技術のうち前者のス
ライド型のものは、2以上の塗布液分配室及び塗布液分
配室の各々につながる塗布液分配スリットの各々が連続
、であシ、各塗布液分配室に塗布液を供給する塗布液供
給手段が各塗布液分配室に連結してあシ、各塗布液分配
スリットの内側に位置し、塗布液分配スリットの各塗布
液排出口の下側に連続して下方斜めに卸斜しかつエンド
レスに形成された連続面をイτする基材外寸よシやや犬
なる寸法において終端をなすように構成されだ液スライ
ド面を有し、エンドレスに形成された連続miミラする
基拐外寸よシ大きく、液スライド面終端よシ下方に媚び
るホッパーエツジを有している塗布装置であシ、この装
置による塗布は次のようにして行われる。即ち、電7写
真記録体の如く、エンドレスに形成された連続周面を有
する基拐を塗布する場合において、該基材分取り囲むよ
うに且つ該に1j面との間に間隙を維持するようにホッ
パーを設け、該間隙に、基拐周面に対向するホッパーエ
ツジと基材周面とを架橋する塗布液ビードを形成し、該
ビードに対して、1つの塗布液層が他の塗布液層を連続
的に且つ同時に供給して、各個別の層が明確な1畳関係
に維持される如くなし、前記基材をその周面が前記塗布
液ビードと交叉し且つ接触するように連続的に移動させ
、基材周面が、塗布液ビードの重畳層の外端部に係合し
て結合層を同時に引出し同時重畳塗布さhる。このスジ
イド型重畳塗布装置によれは、例えば、電子写真感光体
等の記録体の塗布層(例えば下引層、電荷発生層、電荷
輸送層等)ケ塗布する場合、低粘度の塗布液の場合は問
題はないが、高粘度塗布液は、液スライド部上を流下す
る際、その流下が日常に行われず、基材の塗布膜厚の制
御が容易でない。また塗布に除し、低粘度塗布液の上層
に高粘度塗布液を重畳するような場合、基材周面上に塗
布される膜厚か必要且つ均一に得られないという不都合
が生じることを本出願人は見い出した。
The present applicant previously filed a patent application in 1983-201 for a slide type coating device for simultaneous superimposition coating of electrophotographic recording media, etc.
No. 104 was also applied as an extrusion type in 1984-201.
No. 105 was proposed. Among these previously proposed technologies, the former sliding type has two or more coating liquid distribution chambers and coating liquid distribution slits connected to each of the coating liquid distribution chambers, each of which is connected to the coating liquid distribution chamber in a continuous manner. A coating liquid supply means is connected to each coating liquid distribution chamber, and is located inside each coating liquid distribution slit, and is connected to the bottom of each coating liquid discharge port of the coating liquid distribution slit. An endlessly formed continuous surface having a saliva sliding surface configured to terminate at a dimension slightly different from the outer dimension of the base material. This is a coating device that has a hopper edge that is larger than the base surface to be mirrored and extends downward from the end of the liquid slide surface.Coating by this device is carried out as follows. That is, when applying a substrate having an endlessly formed continuous circumferential surface such as an electrophotographic recording medium, the substrate is coated so as to surround the substrate and to maintain a gap between it and the surface 1j. A hopper is provided, and a coating liquid bead is formed in the gap to bridge the hopper edge facing the substrate circumferential surface and the substrate circumferential surface, and one coating liquid layer is connected to another coating liquid layer with respect to the bead. are applied continuously and simultaneously so that each individual layer is maintained in a well-defined one-layer relationship, and the substrate is continuously and simultaneously applied so that its circumferential surface intersects and is in contact with the coating liquid bead. The substrate is moved so that the peripheral surface of the substrate engages with the outer end of the overlapping layer of the coating liquid bead, and the bonding layer is simultaneously pulled out and applied overlappingly. This striped type superposition coating device is used, for example, when coating coating layers (for example, undercoat layer, charge generation layer, charge transport layer, etc.) of a recording medium such as an electrophotographic photoreceptor, or when coating a low viscosity coating liquid. However, when a high viscosity coating liquid flows down on the liquid slide part, the flow down is not carried out on a daily basis, and it is not easy to control the coating film thickness on the base material. In addition, it should be noted that when coating a high viscosity coating liquid on top of a low viscosity coating liquid, there will be an inconvenience that the required and uniform film thickness cannot be obtained on the circumferential surface of the substrate. The applicant found out.

一方、後者の押し出し型のものは、2以上の塗布液分配
室及び塗布液分配室の各々につながる塗布液分配スリッ
トの各々が連続であシ、各塗布液分配室に塗布液を供給
する塗布液供給手段が各塗布液分配室に連結してあシ、
前記各塗布液分配スリットを通ってその出口である塗布
液31e出口が、エンドレスに形成された連続周面を有
する基材外寸よシやや大なる寸法において形成された塗
布面との間に設けられ、該塗布面は前記基拐外寸より大
きく、塗布に必要な塗布方向長さを有する塗布装置であ
シ、この装置による塗布は次のように行われる。即ち、
ホッパー塗布面内に、エンドレス形成された連続面を有
する基材を挿入し、siJ記装置に対して基材を相対的
に鉛面上方に移動させ、各々塗布液分配スリットを通っ
て各塗膜り液がC出口から押し出された各塗布液は、直
接該基拐周面上に同時重畳塗布される。そして、この場
合、直接塗布、ビード塗布のいずれが適用されてもよい
On the other hand, in the latter extrusion type, two or more coating liquid distribution chambers and coating liquid distribution slits connected to each of the coating liquid distribution chambers are continuous, and the coating liquid is supplied to each coating liquid distribution chamber. A liquid supply means is connected to each coating liquid distribution chamber,
An outlet of the coating liquid 31e passing through each of the coating liquid distribution slits is provided between the coating surface and the coating surface formed with a dimension slightly larger than the outer dimension of the base material having an endlessly formed continuous circumferential surface. The coating surface is larger than the outer dimensions of the base material, and the coating device has a length in the coating direction necessary for coating. Coating by this device is carried out as follows. That is,
A substrate having an endlessly formed continuous surface is inserted into the hopper coating surface, and the substrate is moved vertically upward relative to the siJ marking device, and each coating film passes through the coating liquid distribution slit. The respective coating liquids extruded from the C outlet are applied directly onto the substrate peripheral surface simultaneously and in a superimposed manner. In this case, either direct coating or bead coating may be applied.

この44Fし出し型11畳塗布装置では、前記スライド
型の装置とは反対に、高粘度の塗布液は問題ないが、低
粘度塗布液を塗布することが難しい。即ち、各塗布液は
各々塗布液分配室より各分配スリットを通してホッパー
塗布面に直接押し出され、晶拐周面上に塗布されるため
、塗布液の供給圧が塗布膜厚に大きく影響し、低粘度塗
布液においては該供給圧の制御が非常に困難であること
も判った。
Contrary to the slide type device, this 44F push-out type 11 tatami coating device has no problem with applying a high viscosity coating solution, but it is difficult to apply a low viscosity coating solution. That is, since each coating liquid is directly pushed out from the coating liquid distribution chamber through each distribution slit onto the coating surface of the hopper and applied onto the crystallization surface, the supply pressure of the coating liquid has a large effect on the coating film thickness, resulting in low It has also been found that it is very difficult to control the supply pressure for viscous coating liquids.

即ち、上記スライド型では高粘度塗布液が適さず、押し
出し型では低粘度塗布液が適さないので、高粘度と低粘
度上の組合せの塗布液を塗布する場合には、上記両装置
のいずれも不適当である。
In other words, high viscosity coating liquids are not suitable for the slide type, and low viscosity coating liquids are not suitable for the extrusion type, so when applying a combination of high and low viscosity coating liquids, neither of the above devices is suitable. It's inappropriate.

本発明は、上記スラ・イド型および押し出し型重畳塗布
装置における欠点を解決すべく成されたもので、エンド
レスに形成された連続周面を同時型9塗布する場合にか
いて、塗布される塗布液が高粘度と低粘度との組合せか
ら成る塗布液である場合に均−且つ必要な膜厚が安定に
得られるよう塗布することが可能な塗布装置を提供する
ものであp1本発明の他の目的ないし旬随する目的は本
明細書の以下の記述によって明らかにされるー上記目的
を達成する本発明法は、電子写真記録体基材の如く、エ
ンドレスに形成された連続周面を有する基@を塗布する
方法において、該基材を取シ囲むように且っ該周面との
間に間隙を維持するよりに2以上のホッパー装置を設け
、該間隙に、基材周面に対向するホッパーエツジと基材
周面とを架橋する2層以上の塗布液ビードを形成し、該
ビードのうち最上層のビードに対してはスライドによっ
て塗布液を供給し、一方、最下層のビードに対しては押
し出しによって塗布液を供給し、両塗布液を連続的に且
つ同時に供給して、各個別のビード層が明確な重畳関係
に維持される如くなし、mj記基材をその周面が前記塗
布液ビー下と交叉し且つ接触するように連続的に移動さ
せ、基材周面が、塗布液ビードの重畳層の外端部に係合
して結合層を同時に引出し同時重畳塗布されること′f
r、特徴とする。
The present invention has been made in order to solve the drawbacks of the above-mentioned slide-slide type and extrusion type superimposed coating devices. An object of the present invention is to provide a coating device capable of coating a coating solution consisting of a combination of high viscosity and low viscosity so as to uniformly and stably obtain a necessary film thickness. The object and related objects will be made clear by the following description of the present specification. The method of the present invention for achieving the above object is applicable to a substrate having an endlessly formed continuous peripheral surface, such as an electrophotographic recording material substrate. In the method of applying @, two or more hopper devices are provided so as to surround the base material and maintain a gap between the base material and the surrounding surface, and in the gap, two or more hopper devices are provided so as to face the base material circumferential surface. Two or more layers of coating liquid beads are formed to bridge the hopper edge and the circumferential surface of the substrate, and the coating liquid is supplied to the uppermost layer of the beads by a slide, while the coating liquid is supplied to the lowermost layer of the beads. The coating liquid is supplied by extrusion, and both coating liquids are supplied continuously and simultaneously so that each individual bead layer is maintained in a distinct overlapping relationship, and Continuously moving the coating liquid bead so as to intersect with and contact the bottom of the coating liquid bead, the peripheral surface of the substrate engages the outer end of the superimposed layer of the coating liquid bead, and simultaneously draws out the bonding layer and simultaneously applies the superimposed layer. 'f
r, characterized.

また、上記方法を実施する場合に用いて適切である装置
は、ホッパーエツジが基材周面を115!シ囲むように
且つ該基材周面との間に2以上の重畳3糸布液層からな
るビードを架橋可能な間隙を維持するように、ホッパー
装置が配置されており、該ポツパー装置には、前記塗布
液ビードの重畳層の各々に、塗布液を重畳の関係で供給
する塗布液分配室が基材周面を取シ囲むように設けられ
ておシ、且つ前記重畳塗布液層の最上層ビードに塗布液
を供給する方のホッパー装置は、前記塗布液分配室よシ
塗布液分配スリットを通して液スライド部に押し出し、
該液スライド部上を連続的に流下させて前記間隙にビー
ドを維持するスライドポツパー装置であり、一方、最下
層ビルドに塗布′ti、を供給する方のホッパー装置は
、前記塗布液分配室よシ塗布液分配スリットを通してn
IJ記ホッパーエツジに直接押し出して前記間隙にビー
ドを維持する押し出しホッパーである。
In addition, an apparatus suitable for carrying out the above method has a hopper edge that cuts the circumferential surface of the substrate 115! A hopper device is arranged so as to surround the base material and maintain a gap between it and the circumferential surface of the base material that can bridge the bead made of two or more superimposed three-layer fabric liquid layers. , a coating liquid distribution chamber for supplying the coating liquid in a superimposed relationship in each of the superimposed layers of coating liquid beads is provided so as to surround the circumferential surface of the substrate; The hopper device that supplies the coating liquid to the upper layer bead pushes the coating liquid from the coating liquid distribution chamber through the coating liquid distribution slit to the liquid slide part,
A slide popper device is configured to continuously flow down the liquid over the slide portion to maintain a bead in the gap, while a hopper device for supplying the coating solution to the bottom layer build is connected to the coating solution distribution chamber. Through the coating liquid distribution slit
This is an extrusion hopper that directly extrudes to the hopper edge and maintains the bead in the gap.

本発明に係る2以上の塗布液の1畳塗布は、スライド型
ホッパー装置と押し出し型ポツパー装置との任意の組合
せからなる塗布装置にょシ好適に行なわれ、好ましくは
最上方にスライド型ホッパー装置を、また最下方に押し
出しポツパー装置を配置するのがよい。
Coating of two or more coating liquids in one tatami mat according to the present invention is preferably carried out using a coating device consisting of any combination of a slide-type hopper device and an extrusion-type popper device, and preferably a slide-type hopper device is installed at the top. Also, it is preferable to place an extrusion popper device at the bottom.

先ず、上Δ11スライドホッパー装置について説明する
First, the upper Δ11 slide hopper device will be explained.

本装置に係るスライドポツパー装置は塗布液分配室及び
塗布液分配室につながる塗布液分配スリットが連続であ
シ、塗布液分配室(チャンバー室)に塗布液を供給する
塗布液供給手段が塗布液分配室に連結してあシ、塗布液
分配スリットの内4Jlliに位置し、塗布液分配スリ
ットの4血液がr出口の下側に連続して下方斜めに傾斜
しかつエンドレスに形成された連続面を有するハロ外寸
よりやや人なる寸法において終端をなすように本q成こ
れた液スライド面を有し、エントレZに形成はれた連れ
面會有する基拐外寸よJo、05〜1mm大きく、液ス
ライド面終端よシ下方に廷びる長さ01〜10閣好まし
くは05〜4mlのポツパーエツジをイ〕するのがよい
。又6iJ記ホツパーエツジは前記スライド面終端よシ
鉛直下方及びそノ′)、より30度迄の範囲内で前記ハ
ロと反対側に11.l′i余(したものであシ、よシ好
ましくは、鉛直下方及びそれよシ2014迄の範囲内で
傾いて延びるものである。ポツパーエツジの傾斜が30
度を超えると塗布液の架橋が鐙くなシ、ビードが不安定
となって良好な塗布膜が得VC< くなる。
The slide popper device of this device has a continuous coating liquid distribution chamber and a coating liquid distribution slit connected to the coating liquid distribution chamber, and a coating liquid supply means that supplies the coating liquid to the coating liquid distribution chamber (chamber chamber). Connected to the liquid distribution chamber, the four bloods of the coating liquid distribution slit are connected to the liquid distribution chamber and are located in four of the coating liquid distribution slits. It has a liquid slide surface formed so as to terminate at a dimension slightly larger than the outer dimension of the halo having a surface, and has a swollen mating surface formed at the entrance Z. The base outer dimension is 05 to 1 mm. It is preferable to use a large popper edge with a length of 0.1 to 10 ml, preferably 0.5 to 4 ml, extending below the end of the liquid slide surface. In addition, the hopper edge 6iJ is located vertically below and beyond the end of the slide surface, within a range of up to 30 degrees from the end of the slide surface, on the side opposite to the halo. Preferably, it should extend vertically downwards and beyond it up to 2014 degrees.
If it exceeds VC, the crosslinking of the coating solution will not be strong enough, and the bead will become unstable, resulting in a good coating film.

次に、本装置に係る押し出しホッパー装置について説明
する。
Next, the extrusion hopper device according to the present device will be explained.

このホッパー装@は、塗布液分配室及び塗布液分配室に
つながる塗布液分配スリットが連続でおシ、塗布液分配
室(チャンバー室)に塗布液を供給する塗布液供給手段
が塗布液分配室に連結してあシ、前記塗布液分配スリン
)1通ってその出口である塗布液流出口が、エンドレス
に形成された連続周面を有する基材外寸よシやや大なる
寸法において形成されたホッパーエツジとの間に設けら
れ、該ホッパーエツジは011記基材外寸よJ 0.0
5〜1++m大きく、よシ好ましくは塗布膜厚をhOw
++とすると2h□ tranから4hommまでの範
囲であシ、塗布方向長さ0.1〜10簡、よシ好ましく
は05〜4閣を有するものであるのが望捷しい。また該
ホッパーエツジはその上端よシ鉛直下方及びそれより3
0度までの範囲内で前記基材の反対側に傾斜したもので
あシ、よシ好ましくは鉛直下方及びそれより20度まで
の範囲内で傾いて延びるものがよい。またホッパーエツ
ジの傾斜が30度を越えると塗布液の架橋が短くなシ、
ビードが不安定となって良好な塗布膜が得にくくなる。
In this hopper system, the coating liquid distribution chamber and the coating liquid distribution slit connected to the coating liquid distribution chamber are continuous, and the coating liquid supply means for supplying the coating liquid to the coating liquid distribution chamber (chamber chamber) is connected to the coating liquid distribution chamber. The coating liquid distribution opening (1) is connected to the coating liquid distribution line (1), and the coating liquid outlet is formed in a dimension slightly larger than the outer dimension of the base material having an endlessly formed continuous circumferential surface. The hopper edge is provided between the hopper edge and the hopper edge.
5 to 1++m larger, preferably coating film thickness hOw
++ is in the range from 2h□tran to 4homm, and preferably has a length in the coating direction of 0.1 to 10mm, preferably 05 to 4mm. In addition, the hopper edge is vertically downward from its upper end and 3
It should be inclined toward the opposite side of the base material within a range of up to 0 degrees, and preferably extend vertically downward and within a range of up to 20 degrees. Also, if the slope of the hopper edge exceeds 30 degrees, the crosslinking of the coating liquid will be short.
The bead becomes unstable and it becomes difficult to obtain a good coating film.

本発明では塗布装置に供給された各塗布液は一旦各塗布
液分配室に溜められ、これに連結する各々の塗布液分配
スリットに塗布液を均一に分配するようにさり、るが、
前記各塗布液を前記各々スリットに均一に分配しかつ前
記各々スリットに分配された各塗布液を基材面に均一に
塗布できるようにするには、前記各々塗布液分配スリッ
トに対する前記各塗布液分配室の圧力損失比はスライド
型のもので80以上でアシ、好ましくは80〜10o、
oooの範囲内であシ、また押し出し型のものでは、該
圧力損失比ti40以上であり、好ましくは40〜10
0,000の範囲内である。圧力損失が80(スライド
型)、および40(押し出し型)未満の場合は、塗布液
の均一な分配及び塗布ができに〈〈なシ、両者共100
.00Of、1lfiえると塗布液分配室を大きくする
とか、スリットを長くする必要が生じ装置構造上問題を
生ずる。
In the present invention, each coating liquid supplied to the coating device is temporarily stored in each coating liquid distribution chamber, and the coating liquid is uniformly distributed to each coating liquid distribution slit connected to the chamber.
In order to uniformly distribute each of the coating liquids to each of the slits and to uniformly apply each of the coating liquids distributed to each of the slits to the substrate surface, each of the coating liquids for each of the coating liquid distribution slits is The pressure loss ratio of the distribution chamber is 80 or more for a sliding type, preferably 80 to 10o,
ooo, and in the case of an extrusion type, the pressure loss ratio ti is 40 or more, preferably 40 to 10.
Within the range of 0,000. If the pressure loss is less than 80 (slide type) or 40 (extrusion type), uniform distribution and application of the coating liquid may not be possible.
.. If 00Of, 1lfi is increased, it becomes necessary to enlarge the coating liquid distribution chamber or to lengthen the slit, which causes problems in terms of the structure of the apparatus.

本発明に係る塗布装置を用いてハエに形成される塗布膜
は、塗布液ビードによる。即ち、塗布装置を離れる塗布
液の層は、その離れるときと同じ厚さの層で基材に直接
塗布されるのではなくて一度液溜シ(ビード)になって
から該基材に移るのである。従ってこの塗布液ビードに
よって形成される塗布膜は、実際上、塗布装置から基材
に直接形成ばオしるのでになく、塗布装置は単に塗布液
ビードを維持し、基材はそのビードから塗布される。
The coating film formed on the fly using the coating device according to the present invention is formed by a coating liquid bead. That is, the layer of coating solution leaving the coating device is not directly applied to the substrate in a layer of the same thickness as when it left, but rather forms a bead and then transfers to the substrate. be. Therefore, the coating film formed by this bead of coating solution is not actually formed directly on the substrate from the coating device; instead, the coating device simply maintains the bead of coating solution, and the substrate is coated from the bead. be done.

該塗布液ビードの維持は、塗布液分配スリットを押し出
された塗布液(液スライド部上を流下してきた塗布液)
によシ、基材とホッパーエツジとの間に架橋して形成さ
れる。このビードによる塗布で15、ぞのビードを横切
ってこれと交叉して移動するハロ上に塗布される塗布膜
の厚みは、ビードの作用によって法定され且つ基@が移
動する速度、塗布液の供給速度お・よび供給圧、ホッパ
ー構造の効率等によって変化する。
The coating liquid bead is maintained by the coating liquid that has been pushed out of the coating liquid distribution slit (the coating liquid that has flowed down on the liquid slide section).
Otherwise, it is formed by crosslinking between the base material and the hopper edge. In coating with this bead, the thickness of the coating film applied on the halo moving across each bead is determined by the action of the bead, the speed at which the base moves, and the supply of coating liquid. Varies depending on speed, supply pressure, efficiency of hopper structure, etc.

本発明の塗布装置における塗布液分配室に塗布液を供給
する塗布液供給手段としてはパイプを用いることが好ま
しく、且つ塗布液の安定性、均−性等のよシ一層の向上
のため、26以上の複数のバイブ等を配設してもよい。
It is preferable to use a pipe as the coating liquid supply means for supplying the coating liquid to the coating liquid distribution chamber in the coating apparatus of the present invention. A plurality of the above-mentioned vibrators etc. may be provided.

また、塗布液分配室よシ塗布液を取シ出す排出パイプを
設けてもよく、この場合も2以上の複数本の排出バイフ
全設りてもよい。
Further, a discharge pipe may be provided for discharging the coating liquid from the coating liquid distribution chamber, and in this case as well, two or more plurality of discharge pipes may be provided.

本発明の塗布装置による塗布は次のようにして行われる
。即ち、エンドレスに形成された連続周面を有する基材
を移動させながら塗布液を塗布するビード塗布装置にお
いて、該基材周面を敗シ囲むように且つ塗布液によるビ
ードを架橋可能な間隙を維持するようにホンパーエツジ
が形成されており、該ホッパーエツジには、塗布液分配
スリットを通してii!接塗布液を流出する塗布液流出
ロケ有する押し出しホッパー装置が設けられると共に、
前記ホッパーエツジから上方に向かう液スライド部を有
するスライドホッパー装置が設けらitておシ、#J記
上ビード対して1つの塗布液層が他の塗布液層を連続的
に且つ同時に供給して、各個別の層が明確な1畳関係に
維持される如くなし、前記基@をその周面が前記塗布液
ビードと交叉し且つ接触するように連続的に移動はせ、
基材周面が、塗布液ビードの重畳層の外端部に係合して
結合層を同時に引き出し同時重畳塗布される。
Coating by the coating apparatus of the present invention is performed as follows. That is, in a bead coating device that applies a coating liquid while moving a substrate having an endlessly formed continuous circumferential surface, a gap is formed so as to completely surround the circumferential surface of the substrate and allow the bead to be bridged by the coating liquid. A hopper edge is formed to maintain the hopper edge through which the coating solution distribution slit passes ii! An extrusion hopper device having a coating liquid outflow location for discharging the coating liquid is provided, and
A slide hopper device having a liquid sliding portion extending upward from the hopper edge is provided, and one coating liquid layer continuously and simultaneously supplies another coating liquid layer to the upper bead #J. , continuously moving said base so that its circumferential surface intersects and contacts said coating liquid bead, such that each individual layer is maintained in a well-defined tatami relationship;
The circumferential surface of the substrate engages the outer end of the superimposed layer of the coating liquid bead and simultaneously pulls out the bonding layer so that the coating is simultaneously superimposed.

以下、本発明の実施例を添附図面に従って詳述する。し
かし本発明は以下に述べる実施態様に限定されるもので
はない、 第1図(a)および(b)は本発明に係る塗布方法の実
施に用いるのに最適の装置における2層同時塗布の場合
の実施例であシ、第1図(a)は排出口のないもの、第
1図(b)は排出口のあるものの基材への塗布状態を示
す断面図である、 各図において、1は塗布装置本体、2は塗布液を塗布す
るホッパー装置である。3A、3Bは塗布液+1口で、
該分配室3A、3Bには各々異なる塗布液S1.82を
供給する供給バイブ4A。
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below. Figures 1 (a) and (b) show the case of simultaneous two-layer coating in an apparatus most suitable for carrying out the coating method according to the present invention. FIG. 1(a) is a cross-sectional view showing the state of application to the base material of the example without a discharge port, and FIG. 2 is a coating device main body, and 2 is a hopper device for coating a coating liquid. 3A and 3B are coating liquid + 1 mouth,
A supply vibrator 4A supplies different coating liquids S1.82 to the distribution chambers 3A and 3B.

4Bが前記分配室3A、3Bの堕布液供給口5A、5B
に連結されている、第1図(b)における6A、6Bは
排出パイプであシ、前記塗布液供給口5A、5Bにハロ
ケ基準にして対向する位置であシ、AjJ記分配分配室
3ABに形成された排出ロアA。
4B is the droplet liquid supply port 5A, 5B of the distribution chamber 3A, 3B.
6A and 6B in FIG. 1(b) are discharge pipes, which are connected to the coating liquid supply ports 5A and 5B at positions opposite to each other on a halo reference, and are connected to the distribution chamber 3AB marked AjJ. Formed discharge lower A.

7Bに連結されている。aA、sBFim布液分配スリ
ットで端部を持たず基材外周を取シ囲むように連続して
形成されている。9A、9Bは塗布液+1口、10は液
スライド部、11にホッパーエツジである。
Connected to 7B. aA, sBFim fabric liquid distribution slits are formed continuously so as to surround the outer periphery of the base material without having an end. 9A and 9B are coating liquid +1 mouth, 10 is a liquid slide part, and 11 is a hopper edge.

各々界なる塗布液S1,52Fi図示しないポンプ等に
よシ供給バイブ4A、4Bi介して分配室3A、3Bに
供給される。そこで塗布液Sl、S2は塗布装置本体(
円筒形)1の円周方向に分配され、スリン)8A、8B
を通して塗布液流出口9A、9Bから円周方向に均−且
つ連続的に流出し、該流出口9Aから流出した塗布液S
1は液スライド部10上を流下して、ホッパーエツジ1
1よシ円筒形基材12の外周面13との間に架橋してビ
ードを形成し、一方、流出口9Bから流出した塗布液S
2はそのまま前記ホッパーエツジ11と前記基材外周面
13との間に架橋してビード?形成して、両者の塗布液
ビードによって該基材外周面13に二層の層状LL、L
2に塗布される。
The respective coating liquids S1 and 52Fi are supplied to the distribution chambers 3A and 3B via supply vibrators 4A and 4Bi by pumps (not shown) or the like. Therefore, the coating liquids Sl and S2 are applied to the coating device main body (
Cylindrical) 1, distributed in the circumferential direction, Surin) 8A, 8B
The coating liquid S flows out uniformly and continuously in the circumferential direction from the coating liquid outlets 9A and 9B through the coating liquid S.
1 flows down on the liquid slide section 10 and reaches the hopper edge 1.
1 and the outer circumferential surface 13 of the cylindrical base material 12 to form a bead, while the coating liquid S flows out from the outlet 9B.
2 directly forms a bead by cross-linking between the hopper edge 11 and the outer circumferential surface 13 of the base material. Then, two layers LL, L are formed on the outer circumferential surface 13 of the base material by both coating liquid beads.
2.

本発明の好ましい実施態様では、液スライド部の傾斜角
度は水平に対して10〜70°の範囲であシ、よシ好ま
しくは20〜45°の範囲であるう本装置において塗布
された塗布膜は円筒形基材円周方向に、継き目なく分配
室分配スリットが配置されているため塗布された塗膜は
、継ぎ目なく均一なものである。又塗膜厚は塗布液供給
量と円筒形の移動速度によシ決定されるため容易にコン
トロールが可能であシ、同時に塗布速度は浸漬法に比べ
はるかに速くできる。
In a preferred embodiment of the present invention, the inclination angle of the liquid sliding portion is in the range of 10 to 70 degrees with respect to the horizontal, more preferably in the range of 20 to 45 degrees. Since the distribution chambers and distribution slits are arranged seamlessly in the circumferential direction of the cylindrical base material, the applied coating film is seamless and uniform. Furthermore, since the coating thickness is determined by the amount of coating solution supplied and the speed of movement of the cylinder, it can be easily controlled, and at the same time, the coating speed can be much faster than in the dipping method.

また本発明では第2図に示す如く、塗布装置本体1の対
向する側に供給バイ14C,4Dを設は塗布液分配室3
A、3Bに塗布液Sを供給し、過剰塗布液Sを該分配室
3A 、3Bよシ、前記供給バイブ4C,4Dに直交し
て排出バイブロC、6Dを設け、MJ記分配室3A、3
B外へ排出するようにしてもよい。さらに分配室3A、
3Bに通じる各供給・排出パイプは必要に応じて複数本
設けてもよい。この場合、分配室内の塗布液流れが停滞
することかないように配置すれはよい、さらにまた、排
出バイブよシ排出された塗布液は、例えば攪拌器による
攪拌等の処理を行った後、再び塗布液として供給パイプ
に供給されるように、塗布液を循環させるよう構成して
もよい。
In addition, in the present invention, as shown in FIG.
The coating liquid S is supplied to the distribution chambers 3A and 3B, and the discharge vibrators C and 6D are provided perpendicularly to the supply vibrators 4C and 4D, and the excess coating liquid S is transferred to the distribution chambers 3A and 3B.
It is also possible to discharge it outside B. Furthermore, distribution room 3A,
A plurality of supply/discharge pipes leading to 3B may be provided as necessary. In this case, the arrangement should be such that the flow of the coating liquid in the distribution chamber does not stagnate.Furthermore, the coating liquid discharged from the discharge vibrator should be stirred with a stirrer, for example, and then applied again. The coating liquid may be configured to be circulated so that it is supplied as a liquid to the supply pipe.

本発明では、塗布液分配室内の塗布液全排出する塗布液
排出口または排出パイプに、塗布液のにIF出液量を規
制するバルブを設け、供給側だけによらず、排出預Uに
おいても液量調節を行うようにしてもよい。
In the present invention, a valve is provided at the coating liquid outlet or discharge pipe for discharging all of the coating liquid in the coating liquid distribution chamber to regulate the amount of the coating liquid coming out at the IF, so that it can be used not only on the supply side but also on the discharge storage U. The liquid volume may also be adjusted.

本発明に係る塗布液の供給は、供給パインから供給され
、一部は塗布液分配スリン]・を通じて塗布面に流出し
、他の一部は排出バイブによシ排出され、この液の流れ
は連続的に行われるが、塗布液の凝集時間を考慮して塗
布液を一定時間毎に供給するなど、塗布液供給を間欠的
に行ってもよい。
The coating liquid according to the present invention is supplied from the supply pin, a part of which flows out onto the coating surface through the coating liquid distribution line, and the other part is discharged by the discharge vibrator, and the flow of this liquid is Although this is carried out continuously, the coating liquid may be supplied intermittently, such as by supplying the coating liquid at regular intervals in consideration of the aggregation time of the coating liquid.

本発明の塗布装置においては、塗布液の粘度からきまる
膜厚範囲を下回る膜厚で塗布する場合、塗布液粘度が高
すぎる場合、又塗布速度が高速となりすぎたりした場合
に、該円筒形基材円周上にホッパーエツジで塗布された
液が持ち去られる時に液の粘性によシビードの液を上に
持ち上けようとする力が強く働いて該円筒形基材とホッ
パーエツジとの間に形成されるビードが安定に存在する
ことができなくなることがあり、これを防止するために
第3図に示す如く、ホッパーエツジ11と連続面を有す
る基材12との間に形成している塗布液のビードの下部
に該ビードと円筒形基材12と協働する減圧室11設け
、当該減圧室14に連通する気体排出管15f:設けて
減圧室14内を界囲気気圧より負圧に保つよう減圧し塗
布を行なうようにした塗布装置も好適に用いることがで
きる。
In the coating device of the present invention, the cylindrical substrate can When the liquid applied to the circumference of the material is carried away by the hopper edge, a strong force acts to lift the Thibeed liquid upward due to the viscosity of the liquid, causing a gap between the cylindrical base material and the hopper edge. The formed beads may not be able to exist stably, and in order to prevent this, as shown in FIG. A decompression chamber 11 is provided below the liquid bead to cooperate with the bead and the cylindrical base material 12, and a gas discharge pipe 15f communicating with the decompression chamber 14 is provided to maintain the inside of the decompression chamber 14 at a negative pressure from the ambient air pressure. A coating device that performs coating under reduced pressure can also be suitably used.

この装置を用いれば、ビード下方に該ビード及び円筒形
基材12表面一部を壁の一部として含む減圧室14内よ
シ窒気を排気管15を通して排出し減圧室14内圧を雰
囲気圧より貨に(望ましくは雰囲気圧より1穏水柱〜3
00m+n水柱の範囲で低く)保って塗布するようにし
て制御される。従って塗布速度の変卯Jや円筒形ドラム
ホッパーエツジとの間隙の変動等による塗布が不均一と
なることを防止することができる。
If this device is used, nitrogen gas is exhausted from the inside of the decompression chamber 14 which includes the bead and a part of the surface of the cylindrical base material 12 as part of the wall below the bead through the exhaust pipe 15, and the internal pressure of the decompression chamber 14 is lowered from the atmospheric pressure. (preferably 1 to 3 columns of water below atmospheric pressure)
It is controlled so that the coating is maintained at a low level (in the range of 00m+n water column). Therefore, it is possible to prevent uneven coating due to variations in coating speed or variations in the gap between the cylindrical drum hopper edge and the like.

以上、本発明の実施例では2つの塗布液を同時重畳塗布
する場合について述べたが、これら実施例の適当な組合
せによって3以上の塗布液を同時重畳塗布することもで
きる。この場合のホッパー装置の組合せは、例えば、ス
ライド型(!−2つと押し出し型1つとを組合せてもよ
く、了しグこ子の逆の組合せでもよく、さらに4以上の
ホッパー装置の組合せの場合においても、スライド型と
押し出し型との組合せは任意であるが、その糺合せは、
塗布液の粘度に応じて、即ち、高粘度塗布液を押出しホ
ッパーによって且つ低粘度の塗布液をスクイドホッパー
によって塗布する、というように月−ツバ−装置を構成
するのが望ましい。また上記3以上の塗布層としては例
えば、電子写真感光体智の記kA体の製造に用いるS七
の下引層、電荷発生層、電荷輸送層等(’l”i開開5
1−90827号、回57−67934−君、同57−
179857号衛参照。
Although the embodiments of the present invention have been described above in which two coating liquids are applied simultaneously in a superimposed manner, it is also possible to apply three or more coating liquids simultaneously in a superimposed manner by appropriately combining these embodiments. In this case, the combination of hopper devices may be, for example, a combination of two slide type (!-) and one extrusion type, a reverse combination of hopper devices, and a combination of four or more hopper devices. Also, the combination of the slide mold and the extrusion mold is arbitrary, but the combination is
It is desirable to configure the moon-tube apparatus in accordance with the viscosity of the coating liquid, that is, a high viscosity coating liquid is applied by an extrusion hopper, and a low viscosity coating liquid is applied by a squid hopper. Examples of the above three or more coating layers include a subbing layer of S7, a charge generation layer, a charge transport layer, etc. used in the production of an electrophotographic photoreceptor.
No. 1-90827, No. 57-67934-kun, No. 57-
See No. 179857.

)を同時重畳塗布することも可能である。) can also be applied simultaneously.

本発明に係る装置は薄膜で均一な塗布膜奮要来する電子
写真感光体等の記録体ドラム、静電記録体ノ製造、ロー
ラー表面上′\の被0、″エンドレス帯状物等の外周面
への塗膜形成等に用いられそれらに制限されるととはな
い。即ちエンドレスに形成された連続面を有する基材の
外面上の塗布装置として用いられる。塗布はエンドレス
に形成された連続面を有する基材自体が移動しても塗布
装置が移動しても良く更に基材(円筒形ドラム)vi−
回転してもよい。なおホッパー塗布面と円筒形基材は、
ある間隙を持って配置されているため基材(円筒形ドラ
ム)を傷つけることがない。
The apparatus according to the present invention is used for manufacturing recording drums such as electrophotographic photoreceptors, electrostatic recording materials, which require a thin and uniform coating film, and for manufacturing recording materials such as electrophotographic photoreceptors, coatings on the surface of rollers, and outer peripheral surfaces of endless strips, etc. It is used as a coating device on the outer surface of a substrate having an endless continuous surface.The application is not limited to the following: The base material itself may be moved, or the coating device may be moved, and the base material (cylindrical drum) vi-
May be rotated. The hopper coating surface and cylindrical base material are
Since they are arranged with a certain gap, they do not damage the base material (cylindrical drum).

以上のように本発明の塗布装置は、エンドレスに形成さ
れた基材の連続周面上に傷つけることなく、2以上の塗
布液を均−且つ安定に塗布することが可能であシ、特に
、各々粘度の異なる塗布液でも均一な膜Nが得られるよ
う塗布することができ、その膜厚制御も容易であシ、迅
速且つ高い生産性を有する。
As described above, the coating device of the present invention is capable of uniformly and stably coating two or more coating liquids without damaging the continuous circumferential surface of an endlessly formed base material. Even coating liquids having different viscosities can be applied to obtain a uniform film N, the film thickness can be easily controlled, and the productivity is rapid and high.

本発明において、塗布液が加出口9A、9Bよシ円周方
向で均一に淀出するためには、スライドホッパー装置に
あっては、分配室抵抗(Pc)と、塗布液分配スリット
を流れるときのスリット抵抗(Ps)とがP S /P
 c≧80で、よシ好ましくは100〜100,000
の範囲であり、押し出しホッパー装置にあっては、分配
室抵抗(Pc)と、塗布液分配スリット?流れる際のス
リット抵抗(Ps)とがPs/Pc≧40、 よシ好ま
しくif、40〜100.000の範囲内の関係に保た
れる事により、塗布液を安定且つ均一に塗布することが
可能である。
In the present invention, in order for the coating liquid to stagnate uniformly in the circumferential direction from the addition ports 9A and 9B, in the slide hopper device, the distribution chamber resistance (Pc) and the time when the coating liquid flows through the coating liquid distribution slit are required. The slit resistance (Ps) is P S /P
c≧80, preferably 100 to 100,000
In the extrusion hopper device, the distribution chamber resistance (Pc) and the coating liquid distribution slit? By maintaining the relationship between the slit resistance (Ps) during flow and Ps/Pc≧40, preferably within the range of 40 to 100.000, it is possible to apply the coating liquid stably and uniformly. It is.

上記関係は、単層または蓮9畳塗布のいずれの塗布装置
においても成シ立ち、重畳塗布の場合には、溶成系また
は分散系の塗布液の粘度や塗布液供給速度および供給圧
に応じて、各々前記分配窓抵抗(Pc)とスリット抵抗
(Ps)とが決定されていればよい。
The above relationship holds true for both single layer and Ren9 tatami coating systems, and in the case of multilayer coating, it depends on the viscosity of the melted or dispersed coating solution, the coating solution supply rate, and the supply pressure. It is only necessary that the distribution window resistance (Pc) and the slit resistance (Ps) are determined respectively.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る塗布方法を実施するのに用いて最
適である装置における2層同時塗布の1J″合の一実施
例であシ、(a)は排出口のないもの、(b)は排出口
のあるものの基材への塗布状態を示す断面図、第2図は
本発明の他の実施例を示す平面図、第3図は本発明のさ
らに他の実施例を示す断面図である。 図中において、1は塗布装面本体、2はホッパー装置、
3A、3Bは塗布液分配室、4A、4Bは供給パイプ、
5Δ、5Bは律布液供給[」、6A、6Bは杉[出パイ
プ、?A、7Bは塗布液排出口、8A、811に塗布液
分配スリット、9 A 、 9 Bは塗布液流出口、1
0は液スライド部、111jポツパーエツジ、12は基
材、Fi、81.S2は塗布液を各々指示する。 %作出願人 小西六方真工業株式会社 代理人 弁理士 坂 口 信 昭 (tよか1名) 第 3 図
FIG. 1 shows an example of a 1J'' case of two-layer simultaneous coating using an apparatus that is most suitable for carrying out the coating method according to the present invention, (a) is one without a discharge port, (b) ) is a cross-sectional view showing the state of coating on a base material with a discharge port, FIG. 2 is a plan view showing another embodiment of the present invention, and FIG. 3 is a cross-sectional view showing still another embodiment of the present invention. In the figure, 1 is the coating surface main body, 2 is the hopper device,
3A and 3B are coating liquid distribution chambers, 4A and 4B are supply pipes,
5Δ, 5B are Rippu liquid supply ['', 6A, 6B are cedar [out pipe, ? A and 7B are coating liquid discharge ports, 8A and 811 are coating liquid distribution slits, 9 A and 9B are coating liquid outlet ports, 1
0 is a liquid slide part, 111j is a potsper edge, 12 is a base material, Fi, 81. S2 indicates each coating liquid. Applicant: Konishi Roppo Shin Kogyo Co., Ltd. Agent: Nobuaki Sakaguchi (1 person) Figure 3

Claims (1)

【特許請求の範囲】 (11電子写真記録体基材の如く、エンドレスに形成さ
hた連続周面分有する基拐を塗布する方法において、該
基拐を取シ囲むように一目つ該周面との間に間隙を維持
するように2以上のホッパー装置金膜け、該間隙に、基
材周面に対向するポツパーエランと基材周面とを架橋す
る2層以上の塗布液ビードを形成し、該ビードのうち最
上層のビードに対してはスライドによって塗布液を供給
し、一方、最下層のビードに対しては押し出しによって
塗布液を供給し、両塗布液を連続的に且つ同時に供給し
て、各個別のビード層が明確な重畳関係に維持これる如
くなし、前記基材をその周面が前5ピ塗布液ピードと交
叉し且つ猿′触するように連続的に移動させ、基拐周面
が、塗布液ビードの重畳層の外端部に係合して結合層を
同時に引出し同時頂畳塗布されることを特徴とする電子
写真記録体基材等の塗布方法、 (2)電子写真記録体基材の如く、エンドレスに形成さ
れた連続周面ケ有する基材を移動させながら液を塗布す
るビード塗布装置において、ホッパーエランが基拐周面
を叡シ囲むように且つ該基拐周面との間に2以上の重畳
塗布液層からなるビードを架橋可能な間隙を維持するよ
うに、ホッパー装置が配置されておシ、該ポツパー装置
には、前記塗布液ビードの11畳層の各々に、塗布液を
重畳の関係で供給する塗布液分配室が基材周面を取シ囲
むように設けられており、且つ前記重畳塗布液層の最上
層ビードに塗布液ケ供給する方のホッパー装置u、ni
+記市布液分配掌よシ塗布液分配スリットを通して液ス
ライド部に押し出し、該液スライド部上を連続的に流下
1せて前記間隙にビード全維持するスライドホッパー装
置であシ、一方、最下層ビートにrム布液を供給する方
のホッパー装置は、前記塗布液分配室よシ塗布液分配ス
リットヲ通して前記ホッパーエツジに直接押し出して前
記間隙にビードを維持する押し出しホッパーであること
を特徴とする電子写真記録体基拐等の塗布装置、(3)
 スライド型および/または押し出し型の塗布液分配室
へ塗布液を供給する塗布液供給口と共に、該塗布液を前
記塗布液分配室外へ排出する塗布液排出口が設けられて
いることを特徴とする特許請求の範囲第2項記載の電子
写真記録体基材等の塗布装置。
[Scope of Claims] (11) In a method of applying a substrate having an endlessly formed continuous circumferential surface, such as an electrophotographic recording material substrate, a continuous circumferential surface is formed so as to surround the substrate. Two or more hopper devices coat the gold film so as to maintain a gap between the two or more hopper devices, and in the gap, two or more layers of coating liquid beads are formed to bridge the gap between the potsuperan facing the circumferential surface of the substrate and the circumferential surface of the substrate. The coating liquid is supplied to the uppermost bead among the beads by sliding, while the coating liquid is supplied to the lowermost bead by extrusion, and both coating liquids are supplied continuously and simultaneously. The base material is continuously moved so that its circumferential surface intersects and touches the front 5-pied coating liquid bead, so that each individual bead layer is maintained in a clear overlapping relationship. A method for coating an electrophotographic recording material substrate, etc., characterized in that the circumferential surface engages with the outer end of the superimposed layer of the coating liquid bead to simultaneously pull out the bonding layer and simultaneously apply the top layer. (2) In a bead coating device that applies a liquid while moving a substrate having an endlessly formed continuous circumferential surface, such as an electrophotographic recording material substrate, a hopper elan is applied so as to surround the circumferential surface of the substrate. A hopper device is arranged to maintain a gap between the coating liquid bead and the coating surface so as to maintain a gap capable of bridging the bead consisting of two or more superimposed coating liquid layers. Each of the layers is provided with a coating liquid distribution chamber that supplies the coating liquid in a superimposed relationship so as to surround the circumferential surface of the substrate, and supplies the coating liquid to the uppermost layer bead of the superimposed coating liquid layer. hopper device u, ni
A slide hopper device is used to push out the coating liquid through a distribution slit to the liquid slide section and to continuously flow the liquid down over the slide section to maintain the entire bead in the gap. The hopper device for supplying the ram cloth liquid to the lower layer bead is an extrusion hopper that directly extrudes the liquid from the coating liquid distribution chamber to the hopper edge through the coating liquid distribution slit and maintains the bead in the gap. Coating device for electrophotographic recording material substrate, etc., (3)
A coating liquid supply port for supplying the coating liquid to a slide type and/or push type coating liquid distribution chamber is provided, as well as a coating liquid discharge port for discharging the coating liquid to the outside of the coating liquid distribution chamber. A coating apparatus for electrophotographic recording material substrates, etc., according to claim 2.
JP130584A 1984-01-10 1984-01-10 Coating method and its device of electrophotographic recording body base material or the like Pending JPS60146237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP130584A JPS60146237A (en) 1984-01-10 1984-01-10 Coating method and its device of electrophotographic recording body base material or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP130584A JPS60146237A (en) 1984-01-10 1984-01-10 Coating method and its device of electrophotographic recording body base material or the like

Publications (1)

Publication Number Publication Date
JPS60146237A true JPS60146237A (en) 1985-08-01

Family

ID=11497770

Family Applications (1)

Application Number Title Priority Date Filing Date
JP130584A Pending JPS60146237A (en) 1984-01-10 1984-01-10 Coating method and its device of electrophotographic recording body base material or the like

Country Status (1)

Country Link
JP (1) JPS60146237A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4942343A (en) * 1972-05-01 1974-04-20
JPS49130736A (en) * 1973-04-17 1974-12-14
JPS5487229A (en) * 1977-12-23 1979-07-11 Fujitsu Ltd Coating device of photo sensitive drum for zerography
JPS54124039A (en) * 1978-03-01 1979-09-26 Agfa Gevaert Nv Method and apparatus for providing multii layers on web by curtain coating
JPS54128740A (en) * 1978-03-29 1979-10-05 Fujitsu Ltd Production of photosensitive drum for zerography
JPS5615866A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material to peripheral surface of cylindrical substrate
JPS5615864A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material on peripheral surface of cylindrical-substrate
JPS5615865A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material on peripheral surface of cylindrical substrate

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4942343A (en) * 1972-05-01 1974-04-20
JPS49130736A (en) * 1973-04-17 1974-12-14
JPS5487229A (en) * 1977-12-23 1979-07-11 Fujitsu Ltd Coating device of photo sensitive drum for zerography
JPS54124039A (en) * 1978-03-01 1979-09-26 Agfa Gevaert Nv Method and apparatus for providing multii layers on web by curtain coating
JPS54128740A (en) * 1978-03-29 1979-10-05 Fujitsu Ltd Production of photosensitive drum for zerography
JPS5615866A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material to peripheral surface of cylindrical substrate
JPS5615864A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material on peripheral surface of cylindrical-substrate
JPS5615865A (en) * 1979-07-17 1981-02-16 Matsushita Electric Ind Co Ltd Method of applying coating material on peripheral surface of cylindrical substrate

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