JPS60141875A - Sensitizing solution for electroless plating - Google Patents
Sensitizing solution for electroless platingInfo
- Publication number
- JPS60141875A JPS60141875A JP24540883A JP24540883A JPS60141875A JP S60141875 A JPS60141875 A JP S60141875A JP 24540883 A JP24540883 A JP 24540883A JP 24540883 A JP24540883 A JP 24540883A JP S60141875 A JPS60141875 A JP S60141875A
- Authority
- JP
- Japan
- Prior art keywords
- soln
- sensitizing
- electroless plating
- pyrogallol
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、粉粒体の表面に無電解めっきで金属被覆する
際に、めっきの前処理として触媒作用のある物質を密着
させるために行なわれる感受性化。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to sensitization, which is performed as a pretreatment for plating to adhere a catalytic substance to the surface of powder or granules when metal coating is performed by electroless plating.
活性化処理工程の中の感受性化処理液の安定性の改良に
関する。This invention relates to improving the stability of a sensitizing solution during an activation process.
従来無電解めっきを行なうには塩化第一錫と塩酸とから
なる水溶液で被めっき物を感受性化処理し水洗し0次に
塩化パラジウムと塩酸とからなる水溶液で活性化処理し
、水洗したのち、無電解めっきを行なってきた。しかし
この方法を粉粒体特に微粉(ミクロン級)、極微粉(サ
ブミクロン級)に適用する場合1次のような欠点がある
。Conventionally, in electroless plating, the object to be plated is sensitized with an aqueous solution of stannous chloride and hydrochloric acid, washed with water, then activated with an aqueous solution of palladium chloride and hydrochloric acid, and washed with water. I have been doing electroless plating. However, when this method is applied to powder or granular materials, particularly fine powder (micron grade) or ultrafine powder (submicron grade), there are the following drawbacks.
(1)感受性化処理液中の塩化第一錫が空気酸化を受け
、感受性化処理液が老化し、無電解めっきにおいて全面
的あるいは部分的に未析出が起こる。(1) The stannous chloride in the sensitizing solution undergoes air oxidation, and the sensitizing solution ages, causing complete or partial non-deposition during electroless plating.
(2)粉粒体を感受性化処理すると処理中に液が分解し
、処理後に粉粒体をろ別分離する際、感受性化処理液の
分解生成物によシフイルターが目詰りし、ろ別分離がで
きなくなる。(2) When powder and granules are sensitized, the liquid decomposes during the treatment, and when the powder and granules are separated by filtration after treatment, the sifter is clogged with the decomposition products of the sensitized solution, and the sifter is separated by filtration. Separation becomes impossible.
(3)感受性化処理し、粉粒体を水洗する際に粉粒体に
付着している感受性化処理液が分解し1分解生成物によ
りフィルターが目詰りし、粉粒体のる別分離の支障をき
たす。(3) When the granular material is washed with water after sensitization treatment, the sensitizing treatment liquid adhering to the granular material decomposes and the filter is clogged by the decomposition products, resulting in separation of the granular material. cause trouble.
本発明の目的はこれらの欠点を除いた無電解めっきの前
処理における安定性の優れた感受性化処理液を提供する
ことである。An object of the present invention is to provide a sensitizing treatment solution that eliminates these drawbacks and has excellent stability in pretreatment for electroless plating.
感受性化処理液の安定性を改良する物質について種々検
討した結果、成る種の還元性物質が添加されると感受性
化処理液の安定性が飛躍的に向上することを見出した。As a result of various studies on substances that improve the stability of sensitized solutions, we have found that the stability of sensitized solutions can be dramatically improved when certain reducing substances are added.
本発明によれば塩化第一錫および塩酸を含み。According to the invention, it contains stannous chloride and hydrochloric acid.
かつチオ尿素、ピロガロールおよびヒドロキノンの中の
1種以上を含むことを特徴とする無電解めっき用感受性
化処理液が提供される。Further, there is provided a sensitizing treatment solution for electroless plating, which is characterized in that it contains one or more of thiourea, pyrogallol, and hydroquinone.
本発明によれば、さらに塩化第一錫および塩酸を含み、
かつチオ尿素、ピロガロールおよびヒドロキノンの中の
1種以上および金暉錫を含むことを特徴とする無電解め
っき用感受性化処理液が提供される。According to the invention, further comprising stannous chloride and hydrochloric acid,
Further, there is provided a sensitizing treatment solution for electroless plating, characterized in that it contains one or more of thiourea, pyrogallol, and hydroquinone, and gold tin.
本発明の感受性化処理液は使用時に各成分を混合して調
製してもよいが、あらかじめ各種濃度に調製した原液と
して充分に保存可能である。The sensitization treatment solution of the present invention may be prepared by mixing the components at the time of use, but it can be sufficiently stored as a stock solution prepared in advance at various concentrations.
通常の塩化錫−塩酸感受性化処理液は塩化錫を0.1〜
1oog7i含み、 pHが2以下である。このような
処理液に対してチオ尿素、ピロガロールおよびヒドロキ
ノンの1種以上の合計がO,OO1〜5g/!となるよ
うに添加される。Ordinary tin chloride-hydrochloric acid sensitization treatment solution contains tin chloride from 0.1 to
Contains 10og7i and has a pH of 2 or less. For such a treatment solution, the total content of one or more of thiourea, pyrogallol and hydroquinone is O,OO1-5g/! It is added so that
金属錫を添加する場合、錫は塊であっても粒状。When adding metallic tin, the tin is in the form of granules even if it is a lump.
片状であってもよい。処理液の保存ないし使用期間中溶
解してしまわない量で存在すればよい。It may be flaky. It is sufficient that it is present in an amount that does not dissolve during storage or use of the processing solution.
感受性化処理液の安定性に与える各種還元性物質の影響
を表1に示す。Table 1 shows the influence of various reducing substances on the stability of the sensitized treatment solution.
使用した感受性化処理液は8nC4109/ l 。The sensitization treatment solution used was 8nC4109/l.
pH1,05(HCIで調整)である。表1よりヒドロ
キノン、ピロガロールおよびチオ尿素の中の1種以上の
添加によし感受性化処理液の安定性が改善されることが
わかる。またこれらの還元性物質と金属錫が同時に共存
すると感受性化処理液の安定性は一段と向上する。安定
化剤の好ましい添加量は、0.001〜5g/lであり
、0.0011171以下では効果が少な(,5g/1
以上では、感受性化処理液の安定性が逆に低下する傾向
が認められたためである。かくして感受性化処理液の長
期保存が可能となる。また前記の安定化剤を添加した感
受性化処理液による粉粒体の感受性化処理においても感
受性化処理液の液成分の分解がなく。pH 1.05 (adjusted with HCI). Table 1 shows that the stability of the sensitized solution is improved by adding one or more of hydroquinone, pyrogallol, and thiourea. Furthermore, when these reducing substances and metallic tin coexist at the same time, the stability of the sensitization treatment solution is further improved. The preferable addition amount of the stabilizer is 0.001 to 5 g/l, and if it is less than 0.0011171, the effect is small (.5 g/1
This is because the stability of the sensitization treatment liquid tended to decrease in the above cases. In this way, the sensitized solution can be stored for a long period of time. Further, even in the sensitization treatment of powder and granular material using the sensitization treatment solution to which the above-mentioned stabilizer is added, there is no decomposition of the liquid components of the sensitization treatment solution.
処理後のフィルターによる粉粒体のろ別分離が容易に行
なわれることを確認すると共に感受性化処理に続く水洗
後め粉粒体のる別分離の際にも錫塩の分解によるフィル
ター〇目詰シの問題も解消される。It was confirmed that the powder and granules could be easily separated by filtration using the filter after treatment, and the filter was not clogged due to the decomposition of tin salts when the powder and granules were separated by filtration after washing with water following the sensitization treatment. This also solves the problem of .
感受性化処理液に安定化剤が添加されることによって液
中のSn2+イオンの粉粒体への密着析出が妨げられる
ことはなく、その後パラジウム塩による活性化処理で粉
粒体表面に充分な触媒活性が付与され、無電解めっきに
よりめっき欠陥のない均一な金属被膜が得られる。The addition of a stabilizer to the sensitization treatment solution does not prevent the Sn2+ ions in the solution from adhering to the powder and granule, and the subsequent activation treatment with palladium salt provides sufficient catalyst on the surface of the granule. Activation is imparted, and a uniform metal coating without plating defects can be obtained by electroless plating.
次に本発明を実施例により具体的に説明する。Next, the present invention will be specifically explained using examples.
実施例および比較例は以下に示す工程で行なった。Examples and comparative examples were carried out using the steps shown below.
感受性化処理(常温5分)→ろ過→水洗→ろ過→活性化
処理(pdclto、 2 g/ l 、 HCI 2
.5m//1、常温、5分)→ろ過→水洗→ろ過→無電
解Niめっき(日本カニゼン社5B−55,60°G、
1分)→ろ過→水洗→ろ過→乾燥
粉粒体には立方晶窒化硼素CBN (平均粉径6μ)1
.!i’ヲ用い、ろ過はメンブレンフィルター(孔径0
.4μm)によって行なった。Sensitization treatment (5 minutes at room temperature) → Filtration → Water washing → Filtration → Activation treatment (pdclto, 2 g/l, HCI 2
.. 5m//1, room temperature, 5 minutes) → Filtration → Washing with water → Filtration → Electroless Ni plating (Nippon Kanigen Co., Ltd. 5B-55, 60°G,
1 minute) → Filtration → Water washing → Filtration → Dry powder is cubic boron nitride CBN (average powder diameter 6 μ) 1
.. ! I'wo is used for filtration, using a membrane filter (pore size 0).
.. 4 μm).
実施例1゜
感受性化処理液にはsncM o g/l、ピロガロー
ル0.05g/A’を含み田1.05 (HC/ で調
整)を用いた。感受性化処理後のCBN粉のる別分離は
容易にでき、無電解Niめっきにより0.231の重量
増が得られ、 Niめっきは均一であった。Example 1 A sensitization treatment solution containing sncMog/l, pyrogallol 0.05g/A', and a concentration of 1.05 (adjusted with HC/) was used. Separation of the CBN powder after sensitization treatment was easy, and a weight increase of 0.231 was obtained by electroless Ni plating, and the Ni plating was uniform.
実施例2゜
感受性化処理液には8nC1* 10 g/ l 、チ
オ尿Niめつきにより0.15gの重量増が得られNf
めつきは均一であった。Example 2 The sensitization treatment solution contained 8nC1*10 g/l, and a weight increase of 0.15 g was obtained due to thiourine Ni plating.
The plating was uniform.
比較例1゜
感受性化処理液には5nC1t 109 / 1! 、
pH1,05(HO2で調整)を用いた。感受性化処
理後のCBN粉のろ別分離には3時間かかり、その後の
水洗でも支障をきたした。無電解Niめつき後のCBN
粉の重量は、試験開始時に比べてo、 03 、@減っ
ており、 Niの析出は局部的に僅か見られるだけであ
った。尚、無電解Niめつき後の秤量で重量減少となっ
たのは、各工程でCBN粉が槽壁に付着し、それらの回
収が100優でなかったために起こった。Comparative Example 1゜The sensitization treatment solution contained 5nC1t 109/1! ,
A pH of 1.05 (adjusted with HO2) was used. It took three hours to separate the CBN powder by filtration after the sensitization treatment, and the subsequent washing with water also caused problems. CBN after electroless Ni plating
The weight of the powder was reduced compared to the time at the start of the test, and Ni precipitation was only slightly observed locally. The weight decrease in the weighing after electroless Ni plating was caused by the fact that CBN powder adhered to the tank wall in each step and less than 100% of it was recovered.
Claims (1)
ことを特徴とする無電解めっき用感受性化処理液。 2、特許請求の範囲第1項に記載の無電解めっき用感受
性化処理液であってチオ尿素、ピロガロールまたはヒド
ロキノンの添加量の合計が0.001〜5fi/lであ
るもの。 3、塩化第一錫および塩酸を含み、かつチオ尿素。 ピロガロールおよびヒドロキノンの中の1種以上および
金鵬錫を含むことを特徴とする無電解めっき用感受性化
処理液。 4、特許請求の範囲第6項に記載の無電解めっき用感受
性化処理液であってチオ尿素、ピロガロールまたはヒド
ロキノンの添加量の合計が0.001〜5j;l/13
であるもの。[Claims] 1. A thiourea containing stannous chloride and hydrochloric acid. A sensitizing treatment solution for electroless plating, characterized in that it contains one or more of pyrogallol and hydroquinone. 2. The sensitizing solution for electroless plating according to claim 1, wherein the total amount of thiourea, pyrogallol or hydroquinone added is 0.001 to 5 fi/l. 3. Contains stannous chloride and hydrochloric acid, and thiourea. A sensitizing treatment solution for electroless plating, characterized in that it contains one or more of pyrogallol and hydroquinone, and Kinpeng tin. 4. The sensitizing treatment solution for electroless plating according to claim 6, in which the total amount of thiourea, pyrogallol or hydroquinone added is 0.001 to 5j; l/13
something that is.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24540883A JPS60141875A (en) | 1983-12-28 | 1983-12-28 | Sensitizing solution for electroless plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24540883A JPS60141875A (en) | 1983-12-28 | 1983-12-28 | Sensitizing solution for electroless plating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60141875A true JPS60141875A (en) | 1985-07-26 |
JPH0362793B2 JPH0362793B2 (en) | 1991-09-27 |
Family
ID=17133205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24540883A Granted JPS60141875A (en) | 1983-12-28 | 1983-12-28 | Sensitizing solution for electroless plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60141875A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5198273A (en) * | 1989-09-18 | 1993-03-30 | Hitachi, Ltd. | Electroless gold plating solution and method for plating gold therewith |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5237971A (en) * | 1975-09-22 | 1977-03-24 | Hakusui Purasuchitsuku Kougiyo | Method of molding hollow nonnporous plastic product |
-
1983
- 1983-12-28 JP JP24540883A patent/JPS60141875A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5237971A (en) * | 1975-09-22 | 1977-03-24 | Hakusui Purasuchitsuku Kougiyo | Method of molding hollow nonnporous plastic product |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5198273A (en) * | 1989-09-18 | 1993-03-30 | Hitachi, Ltd. | Electroless gold plating solution and method for plating gold therewith |
Also Published As
Publication number | Publication date |
---|---|
JPH0362793B2 (en) | 1991-09-27 |
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