JPS60134203A - Color separation filter - Google Patents

Abstract

PURPOSE:To eliminate level difference at the overlapping parts of both patterns by forming a multilayer interference film on the recesses patternwise formed on a base up to a plane similar in level to the surface of the base, and forming a transparent colored ink layer patternwise on them. CONSTITUTION:A resist pattern is formed on a base 2 of glass, resin, or the like, and its opening parts are etched to form recesses 3 patternwise, and on these recesses 3 plural layers of a high refractive index substance 4, such as TiO2 or CeO2, and plural layers of a low refractive index substance 5, such as SiO2 or CaF2, are alternately laminated up to a plane similar in level to the surface of the base 2 to form a multilayer interference film 6. A transparent colored ink layer 7 is patternwise formed on the surfaces of the base 2 and the films 6. When needed, a protective layer 8 made of acrylic resin or the like may be formed as the uppermost layer.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a color separation filter and a method for manufacturing the same, and more specifically, it is used in full-color liquid crystal display devices, image pickup tube type cameras, solid-state color cameras, color facsimiles, etc. . The present invention relates to a color separation filter having a multilayer interference film and a transparent colored ink layer, and a method for manufacturing the same.

Technical background of the invention and its problems Multi-J-interference films and colored images have not typically been used as color separation filters used in full-color liquid crystal display devices and the like. Among these, multilayer interference films are generally composed of inorganic materials, so they have excellent heat resistance, light resistance, chemical resistance,
Although it has the advantage of being excellent in wash resistance, it has the following disadvantages: V) There is little freedom in selecting spectral characteristics, and the manufacturing process is complicated and the cost is high. On the other hand, colored images, which are obtained by coloring a transparent resin obtained by irradiating a transparent photosensitive material with light using an organic dye, have the advantage of having a greater degree of freedom in selecting spectral characteristics and lower manufacturing costs. However, it has the disadvantage of being inferior in physical properties such as heat resistance and light resistance.

In order to solve the above-mentioned drawbacks, color separation filters that combine both a multilayer interference film and a transparent colored ink layer have been proposed, and V.
) has the advantage that there is a large degree of freedom in selecting spectral characteristics and that the manufacturing cost is not very high. However, in the five color separation filters mentioned above, the patterned multilayer interference film and the A-turn transparent layer are superimposed or formed in parallel on the substrate. V) As a result, a step occurs in the heavy part of the chisel turn, which significantly impedes the straightness of the filter and causes deterioration of the spectral characteristics as a color separation filter. -1! Even if we focus on the manufacturing aspect of color separation filters, if a transparent colored ink layer is provided on a substrate on which a multilayer interference film has already been formed, it will be difficult to produce a multilayer interference film because the multilayer interference film has a certain thickness. Because of the difference in level, it has become extremely difficult to form the transparent N color ink layer in precisely slanted dimensions and positions compared to the case where a transparent colored ink layer is provided on the flat surface 1. This also applies to the case where a transparent colored ink layer is formed on a substrate and a multilayer interference film is formed by cutting out the transparent colored ink layer.

OBJECTS OF THE INVENTION AND SUMMARY OF THE INVENTION The present invention attempts to eliminate the technical drawbacks associated with the prior art as described above, and is intended to solve the above-mentioned technical drawbacks associated with the prior art. To provide a color separation filter which is provided with both a film and a patterned transparent colored ink layer, does not produce a step difference even in the part where the two patterns intersect, and therefore has excellent spectral characteristics.

(bl) When sequentially forming the e-turn multi-I-1000 film and the patterned transparent colored ink layer on the substrate, the dimensions and positions of Isuwa's putter 7 were precisely controlled. To provide a method for easily manufacturing a color separation filter of type J or type 5.

The color separation filter according to the present invention includes: a substrate having four parts formed in a diagonal shape, and a high refractive index material and a low refractive index material reciprocally disposed within the concave portion on almost the same plane as the substrate plane. It consists of a multi-layered interference film, which is laminated in multiple layers, and a transparent colored ink layer, which is provided in a butter-like manner on the substrate. A protective film may be provided on the surface. Also, in some cases,
The e-separation filter according to the present invention is 1. A transparent colored ink layer formed in a pattern on the same plane and a multilayer interference film laminated in a pattern on the substrate.
In this case, a purulent-retaining film may be provided on the entire surface of the pre-color separation filter, depending on necessity.

On the other hand, the method for manufacturing a color separation filter according to the present invention includes the following steps (al to el).

Step (a): A step of forming a resist pattern provided with openings for opening 1° on the main surface of the substrate.

Step (b): A step of etching the main surface of the substrate seeded with the resist pattern to form patterned recesses in the resist openings of the substrate.

Step (C): A high refractive index material and a low refractive index material are alternately placed in the recesses of the substrate in which patterned recesses are formed and a resist pattern is provided, until they are approximately flush with the substrate. A process of laminating multiple layers to a controlled optical thickness to form a multilayer interference film.

Step (d): removing the resist nozzle and the multi-no interference film laminated thereon from the two substrates.

Step (e): A step of providing a pattern-shaped transparent colored ink layer on the main surface of the solder substrate on which the multilayer interference film is provided in the recess 81i.

To provide a transparent color ink layer in a pattern on the main surface of a substrate in which a multilayer interference film is provided in the recess.

Transparent colored ink is printed on the main surface of the substrate in a ξ-turn pattern at a desired position using a printing method such as screen printing, offset printing, transfer printing, or letterpress printing.

To form a recess formation opening or a resist pattern on the main surface of the substrate, a conventional method can be followed, but one method is to apply photoresist over the entire surface of the main surface of the substrate. The applied trowel may be subjected to turn exposure and development. Alternatively, a thin film of metal such as chromium, nickel, copper, gold, aluminum, tantalum, titanium, etc. is entirely deposited on the main surface of the substrate, and then photoresist is coated entirely on the gold 1'A HI layer. After that, pattern exposure and development are carried out to form an e-turn shaped photoresist. Next, this patterned photoresist is used to etch a metal thin film, and the photoresist E-turn is removed. I can't get it.

To form the four parts on the main surface of the substrate, in addition to the etching method using a resist as described above, a method using laser processing, a method using ultrasonic processing, a method using electric discharge machining, a method using ion beam processing, Physical processing force such as electron beam processing method, drilling method, etc.
method can also be used. In order to create a color separation filter according to the present invention by forming recesses on the main surface of the substrate using such a physical processing method, the following steps +a+ to t are performed.
I wonder if dl will be adopted.

Step (a) After forming a resist chimney turn in which openings for forming recesses are provided on the surface of the second base soil.

1. Perform physical or chemical processing on the resist opening of the substrate. A curved ζ or 8 object in the form of an e-tar/shape is applied to the i. A process of forming a multilayer interference film by stacking layers to a controlled optical film thickness until they reach almost the same plane.

Step (C) Step of removing the resist bag 7 and the multilayer interference film laminated thereon from the two substrates.

Process (mountain: Process of providing a patterned transparent "JJN color A/K layer" on the main surface of the substrate on which the multilayer interference film is provided in the recessed part.

DETAILED DESCRIPTION OF THE INVENTION] The present invention will be described below with reference to preferred embodiments shown in the drawings.

As shown in FIG. 1, the first clear color separation filter according to the present invention includes a substrate 2 having four portions 3 formed in a turn shape, and a substrate plane and an at. A multilayer interference film 6 consisting of multiple layers of high refractive index materials 4 and low refractive objects [5] alternately laminated almost on the same surface, and a transparent colored ink provided in a pattern on the substrate. The device substrate 2 composed of the layer 7 is made of soda lime, silicic acid glass,
Alumina, 5-silicate glass, quartz glass, synthetic quartz plate,
A transparent substrate such as an optical resin plate, a transparent resin film, a cathode ray tube substrate, a solid-state imaging element, etc. are used.

In this substrate 2, recesses 3 are formed in a pattern by an etching method or a physical processing method such as laser processing or wave excitation processing. Refraction accessory storage 5 and multiple 11 alternately! A multilayer interference film 6 formed by a multilayer interference film 1 is provided on almost the same plane as the substrate plane.

A high refractive index precipitated material layer 4 and a low refractive index material are deposited in the four parts 3 of the substrate 2. The total number of laminated layers including tl*5 is 8 or more layers. This combination d) Lamination is 61-
If it is less than ζ, the rise of the original transmission characteristic at the boundary between the transmission region and the reflection region will no longer be the chassis, and the transmittance in the reflection region will become negligibly small, which is undesirable. Furthermore, as the product J-number increases, the rise of the high light transmission characteristic at the boundary becomes sharper and the transmission a becomes smaller in the reflective region, but the product process becomes more complicated, so from a practical point of view It is preferable that the range is from Vl to approximately Vl.

The laminated high refractive index material layer 4 and low refractive index material layer 5 are /
9i Lamination is performed such that the optical film thickness is 1λ with respect to the constant wavelength λ. Note that the optical film thickness is defined as when the refractive index of the material constituting the film is n and the sample is d.
Precede the value nd.

In some cases, in order to reduce the phenomenon in which the transmission changes with changes in wavelength in the transmission region (so-called ripple phenomenon), the optical structure of the high refractive index "V/J'J!1 layer 4 and the low-layer precipitate shield layer 5 may be It is preferable to set the film thickness as follows.

1) In a multilayer interference film type color separation PTR filter formed by alternating six or more high refractive index material layers and low refractive small material layers on a substrate.

(at high refractive index precipitate layer 1 layered closest to the substrate)
- The optical film thickness for a given wavelength te is 1.1N1.
3 11□--λ, and the optical film thickness of the first layer of low refractive index material formed thereon by nt layer is 1.0\1.3 11--λ.

lbl The optical film thicknesses of the high refractive precipitated material layers and the low refractive index material layers having a total of at least 211i1 which are alternately laminated on this low refractive index small material layer are it 7-λ, (C1 1.1 of the high refraction heavy material layer on the side farthest from the substrate
\1.5)'f: The optical film thickness is -4-1λ, and the optical film thickness of the low refractive index material layer layered thereon is 2.0λ.

2) On the substrate, the optical film thickness with respect to the source of the predetermined wavelength λ is ↓λ
Multi-layer interference 1. A multilayer interference system in which a multilayer interference layer is provided, in which two or more layers of a high refractive index material M layer having an optical thickness of 1λ and a low refractive index material layer having an optical thickness of 1λ are alternately laminated. In the separation filter, between the 1.1-1.3λ fat substrate and the laminate, there are separated bacterial substances 1θ and 1.021.2λ having a film thickness of -4-.
A low refractive index material j@ having a film thickness of 1λ is provided on the substrate in this order, and an optical film of 1λ is placed on the low refractive index material +il of the box furthest from the substrate of the laminate. Thickness: 1.0
\1.2 A layer of high refractive index material 'n'4 - A low refractive index material layer having an optical thickness of λ and a high refractive precipitated material layer having an optical thickness of λ above are provided in this order. .

3) On the substrate, the optical film thickness is 1λ for a given λ
A multilayer interference film type color separation device is provided in which a bond 1 is formed by alternately stacking two or more layers of refractive index material layers and low refractive small material layers having a thickness of 1λ to 1 m. In the filter, between the 141\1.3 fal substrate and the Ail storage 1, -1, --
A high refractive index precipitated material layer with an optical thickness of λ and ■, 0＼
A low 1144-fold film with an optical film thickness of 1.2 m = -λ was deposited on the substrate in this III order, as was the case in the past.
1.0-1 with an optical film thickness of 1λ on the low refractive small material layer which is the most ~ I # widest from the S plate of the body
．． 2 High-reflection 17i small material layer '4-1λ original film thickness 1.1
~1.3) -1□-120) A fungal precipitated material layer with an optical thickness of 1°0 to 2°0λ? Low M with II pot 1”J
i! Jr car! The I pores layer is provided in this l1I11 order.

4) On the substrate, a high refractive precipitate material layer whose optical film thickness is above λ with respect to 5ffi of a predetermined wavelength λ, and the optical film thickness t-λ
In a multilayer interference model color separation filter in which a multilayer interference model color separation filter is provided with a laminate formed by alternately stacking four or more low refractive index material layers, any illusion of the following Φ conditions 1al and (bl) is provided. A high refractive index material layer and a low refractive index material rm
Laminate.

(al) a high refractive index material layer having an optical thickness of 1.111.3λ between the substrate and the laminate;
This +1
11i on the substrate, or fbl A low-resolution agent j- having an optical film thickness on the side furthest from the substrate of the laminate and facing V is provided in this l1ll'1 order.

As a high refractive index substance, TlO2 (refractive index n=2.2)
, 5b203 (n=2.04), Ce02 (n=2.4
2), Zr07 (n=2.10), Zn5 (n=2.
35) etc. are used for V1 et al.

In addition, as a low refractive index Kemonoka, 5io2 (n=x, 46
), CaF2 (n ~ 1.23) 1MgF2 (n
"1-d8) etc. are used first. Among these, the combination of TlO2 as a high refractive index material and 5io2 as a low refractive index material, or from the viewpoint of stress relaxation between layers when laminating multiple layers, preferable.

1 island refractive index material II! ! 4 and the low refraction accessory oil layer 5,
The layers are formed by a vapor deposition method or a vapor deposition method such as a sintering method. The optical film thickness of the stiff material layer is 1
The film thickness is measured using a film thickness monitoring device such as the optical film thickness tester.

The high refractive index material layer 4 and the low refractive index material layer 5 are provided in a pattern on the substrate and are laminated in the four parts 3 until they are approximately flush with the plane of the plate 4. On the other hand, if the substrate is scarlet, a patterned recess 3 having a depth corresponding to the combined thickness of the high refractive index material layer 4 and the low refractive index material layer 50 is formed in advance. It means good things.

On the main surface of the substrate 2, on which the multi-interference film 6 is laminated in the recess 3 formed in the shape of a chimney, a transparent colored ink layer 7 is formed in a pattern with a thickness of 0.2 to 5.0 μrn. The film thickness is h.

This transparent colored ink layer 7 is formed on the main surface of the substrate 2 in the shape of a putter 7 with a desired thickness by a printing method such as a screen printing method, an offset printing method, a transfer printing method, or a letterpress printing method. Illusion.

An example of the relationship between the pattern 7 of the multilayer interference film 6 and the pattern of the transparent colored ink 1-7 is shown in FIGS.
IcI and IcI. The patterns of the turf and the transparent colored ink layer 7 may be stripes parallel to each other, or the patterns of the multilayer interference film 60 shown in FIG. , for example n~25°
It may also be in the form of cross stripes that cross each other at a certain angle. Alternatively, it may be formed into a turn as shown in FIG. 2 (as shown in C1, a mosaic type in which both putters 7 are stacked with bricks).

Depending on the case, a protective layer f#8 may be further provided on the uppermost layer 1-, and this protective layer 8 can be made of a transparent resin such as acrylic resin.

Below, a method for manufacturing a color separation filter according to the present invention will be explained with reference to the south side. In addition, in order to save the explanation,
The Renost putter 7 is made of a photosensitive film.

First, a resist 9 is applied entirely on the main surface of the substrate 2 according to a conventional method (see Fig. 3 (al)). After #1.@shi, busy Rennost pattern 9 on board 2
(see Figure 3 (bl)).

Next, as described above, apply K and resist pattern 9 to create a stylish J.
Further, the main surface of the substrate is etched to form patterned four portions 3 in the resist openings of the substrate 2 (see FIG. 3 fbl).

In the end, turn 9 on the resistor and put it on board 2.
In the ξ-turn-shaped four parts 3, a high refractive material layer 4 and a low refractive index material layer 5 are arranged alternately, and of course, a high refractive material layer 4 and a low refractive material layer 5 are formed on the substrate and almost on the substrate. %Im5 is laminated (see Figure 3 (dl)).

The groove-shaped resist 9, the high refractive index material 1-4 and the low oil precipitate material layer 5 formed as an fft layer thereon are removed from the substrate 2 by a conventional method such as a reverse etching method. Multi-no interference [6 is formed only on the /e-turn-shaped four parts 3 of the substrate 2, approximately on the same half plane as the substrate (
Figure 3 (el@teru).

A multilayer interference filter 6 is provided in the recess 3, and a pattern Z-shaped transparent colored ink 17 is formed on the main surface of the substrate 2 (see Fig. 3 (fl)). The desired transparent colored ink composition has the following contents.

Pigments that give so-called color characteristics, consisting of inorganic pigments, carbon black, and extender pigments.

Coloring materials that combine fluorescent pigments and dyes, drying oils, alkyds,
Plastics, solvents, natural resins such as rosin and shellac, and rosin-modified phenolic fats.

Synthesis of polyamide resin, etc.; LA4 resin, vinyl chloride, etc.
A vehicle consisting of a polymer such as a vinyl acetate copolymer or a rubber derivative is used as the main raw material, and auxiliary agents such as a suitability regulator for printing presses, a drying regulator, and a coating film property improver are added to the dough. Printing ink is produced by ball milling or roll milling in order to uniformly disperse colorants as fractional substances in a vehicle, which is a dispersion medium.

The vehicle is a dispersion medium for the pigment, controls υit iV+ properties, and further contributes to drying and adhesion.

Auxiliary agents are added for the purpose of imparting and controlling the suitability that the printing ink should have, and are selected and added in order to provide properties corresponding to the intended use. Specifically, there are auxiliary agents related to fluidity properties, auxiliary agents related to drying, and auxiliary agents related to processing suitability.

In particular, a dryer is added as a drying aid.

As the dryer, Kanasugi soaps such as C0, Mn, and PI)7:C are used, and as the fatty rJ1 group, octenoic acid, naphthi heptaic acid, linseed oil, etc. are mainly used.

As dryness inhibitors, phenol compounds such as eugenol and hydroquino 7, and oxime compounds such as methyl ethyl ketoxime are used for the purpose of preventing ink from skinning and thickening.

Waxes are used as viscoelastic modifiers, and lubricants are added as anti-scratch agents to improve the ink film. As the anti-scratch agent, polyethylene 7, which is a low molecular weight material, is mainly used, and as the RN agent, paraffin wax, amide wax, etc. are used.

Further, as the non-toxic printing ink, a thermosetting reactive ink is used. The curing reaction of this ink is
A combination of various reactions including -Alder reaction etc. can be considered, but basically, 1) condensation polymerization reaction of unsaturated polyester containing 0H or C0OH and amino resin system 11) reaction of epoxy resin and amine resin Crosslinking reactions such as the system iii) Radical polymerization reactions such as the system of 4tJ polyester and unsaturated monomers are roughly classified into 033 types.

Resins used as vehicles include saturated and monophasic polyesters, modified polyesters, polyesters such as alkyds and modified alkyd resins, amino-1a1 resins such as urea formaldehyde resins, melamine formaldehyde resins, butylated amine resins, Epoxy resins synthesized from polyhydric phenol and epichlorohydrin, polyether resins, etc. are used.

Active additives include esters of acrylic acid and methacrylic acid, and styrene. Maleic acid ester, allyl ester, etc. are used.

In order to give this ink heavy phase quick-drying properties, a combination accelerator or catalyst is added to the ink depending on the reaction.
For kneading, promoters such as organic peroxides and metal driers, and various organic and inorganic catalysts are used.

Another bath-free printing ink is ultraviolet pure hardening ink.The curing reaction of this printing ink is...

Belongs to photopolymerization reactions of monomers and polymers 1) Noazo,
Photodecomposition reactions of azide compounds, etc.; 1) Reactions of polymer compounds, such as cinnamic acid salts; 111) Photopolymerization reactions of vinyl compounds.

Among these reactions, the reactions applied to printing inks require the addition of a photopolymerization initiator. Note epoxy resin.

A prepolymer of various polyester resins, various monosubstituted ethylenes and 1,1 disubstituted ethylenes and derivatives thereof, which are compatible with the prepolymers, and a photopolymerization initiator. It's made with meat paste. - As an example, the composition of an ultraviolet curable printing ink is shown.Chrome Permillion 15% Noethylhydroxylamine 0.4 Benzoin methyl ether 5+0 Cyclohexano: / 1.6 tt Other, tactile I# curable inks There are also Seiko Beam hardening type inks. Such Inoki silk soles for forming a transparent colored ink layer can be printed with 7J using printing techniques such as screen printing, offset printing, transfer printing, and letterpress printing.
It is formed at the desired position and film thickness.

Furthermore, if necessary, a transparent protective layer can be added as the top layer. The film 8 may be formed by applying the film 8 (see FIG. 3 (gl)).

In the above specific example, the multilayer interference film and 14. ! We have described a color separation filter consisting of 1i transparent colored ink layer, but two or more types of transparent Numamura ink! ? It can also be formed on the main surface of a four-dimensional substrate.

In the above method, an etching method using a resist is not adopted when forming the recesses on the main surface of the substrate. After cleaning the main surface of this board KA
Physical processing such as laser machining, ultra-H wave machining, electric discharge machining, and drilling is applied to the turn shape to create a 5-gutter/
In addition to forming a concave portion in the shape of a concave portion, a renostonomiturn may be left on the main surface of the substrate where the four portions are not formed.

In addition, in the above method, a reverse etching method such as lift-off is used to remove the Lennost nomiturn and the multilayer interference film laminated thereon from the main surface of the substrate. The resist pattern can also be removed by mechanical methods such as polishing, grinding, or cutting.

The color separation filter 1 of the present invention is based on the 20th color separation filter 1.

As shown in FIG. 4, there is a substrate 2 having four turf-shaped portions 3, and a transparent film F formed in the concave portion 3 on substantially the same plane as the base SV- plane. A multilayer interference film 6 is formed by laminating a plurality of layers of a high refractive index material 4 and a low refractive index material 5 in a pomelo shape on the substrate (/(A turn shape).
and ρ), and in some cases, a protective layer 8 may be provided on the top layer.

Effect of the invention The preferred color separation filter (b-type) according to the present invention is as follows.

A multilayer interference film is stacked in a phantom recess formed in a nosoturn shape to have an appropriate depth in the substrate until it reaches almost the same plane as the substrate plane, and then this substrate layer is layered.
Since it has +314 calligraphy colors, 1 foil, 6-g, and all leaves are candy, it has the following effects.

+a+ The multilayer interference film and the transparent colored ink layer do not overlap each other with a step difference, so the original straightness is not hindered and the color separation Pa1e has excellent spectral characteristics.
I can't get the filter.

fbl When providing a transparent color ink layer on a substrate, it is possible to form a 6 Meiji color ink layer on a flat surface instead of a flat surface with steps, and it is possible to form an o turf of a transparent color ink layer. It can be easily formed in the dimensions and position with a dense side slope.

The above effect can be achieved by adding an appropriate depth to the substrate.
A transparent colored ink layer is placed in the concave portion formed in the shape of a turn, reaching almost the same half surface as the substrate, and a multilayer interference film is further laminated on this substrate in the shape of a turf. In this case, the same cannot be obtained.

The manufacturing method of the 1M [i filter for the color separation method of the present invention is such that many color separation filters must be formed in a narrow area. It is particularly useful for

The present invention will be explained below with reference to Examples, but the actual performance is not limited to these Examples.

Example 1 A soda lime substrate with a diameter of 4 inches and a thickness of 1.511 mm was thoroughly washed with a 10% surfactant aqueous solution, then washed with water, washed with 21 g of isopronominol, and then dried with Freon vapor under displacement. It was further dried with hot air at 100°C.

A negative molding film (manufactured by TPR Tokyo Ohka) having a viscosity of centipoise at 25° C. is applied to the entire surface of this substrate.
After coating with a film thickness of 0 μm, additional silibaking treatment was performed at a temperature of 90° C. in an oven.

An HRP dry plate (manufactured by Kodak Co., Ltd.) was placed as a mask on top of the resist 1, and an o-turn was performed for 1 second using a Xeno 7 lamp at 80,000 lux on the top surface. Next, a phenomenon occurred in TPR developer A (manufactured by Tokyo Ohka),
After forming a resist pattern on the substrate by selectively removing the unexposed base portions, a post-baking process was performed at a temperature of 160° C. to 180° C. between markings using an oat 7.

Next, the substrate covered with the resist pattern was etched using a glass etching solution (MAX-7011G, Tokyo product).
(manufactured by J''fT) for 1 minute at a temperature of 5°C to form a striped pattern to a depth of approximately 1.40 to 1.45 μI11.
A recess was formed.

After setting the obtained substrate with the concave portions formed in a part of the substrate holder of the first Makabe vapor deposition apparatus where the yC film thickness gauge is arranged,
After evacuation at 1×10 Torr f, the substrate temperature was set at 350°C. And Ti0 layered during vacuum deposition
In order to prevent □ from being reduced to 110 Ti, 0□ gas was introduced at k 2 After sufficiently preheating by electron beam heating, the shutter was opened and Ti0□ was deposited on the substrate at a thickness of 1λ and a film thickness of KM. This vapor deposition was carried out by setting the current E of the gun to 25 ornA.

The film thickness of Tie21- to be deposited is 1 yuan" fJJ. Using a film thickness meter, the temperature of the monitor wavelength λ is 6.
The optical film thickness (
By monitoring the relationship between nd) and reflected light, the optical film thickness was determined to be as early as λ.

Next, after stopping the introduction of 0□ gas, the Si0□ sample (manufactured by Ogtro Z) set at a predetermined no. The film was deposited to an optical thickness of λ on a t T 102 basis. The optical thickness of Si0□ film is λ, Lλ
, 1λ1. ! -λ,-! -λ, 1λ optical film thickness causes stiffness 4
444 A total of 14 layers were laminated, 17 layers each.

Next, as a 15th layer, a TiO2 film with an optical thickness of 1λ was deposited on the topmost SiO2 film, and finally, as a 16th layer, a SiO2 film with an optical thickness of λ was deposited as a 15th layer.
The 0□ film is stacked on top of the TiO2 film, and the substrate temperature is 200°.
After slowly cooling to °C, it was taken out into the atmosphere. The total thickness of the multilayer interference film was 1.42 μm.

Note that the obtained multilayer interference film has a TE in the light transmission region.
Changes in Transmission Characteristics: The so-called ripple phenomenon is characterized by sharp absorption at the boundary, and light transmittance in the reflective region is extremely small, less than 1%. This multilayer interference film has a monitor wavelength of 65
Since it was set to 0 nm, it had cyan 44+ properties.

Next, TPR Renost exclusive yI! The Rennost pattern and the multilayer interference film laminated thereon were peeled off from the main surface of the substrate by immersing the substrate in one solution of Stripping Solution C (manufactured by Tokyo Mae).

Next, a transparent colored ink layer was formed in a .xi. turn shape as described below on the main surface of the substrate U+1 selected by the above operation.

According to the offset printing method, first, the putter 7 to be printed is printed using 28th grade glue skort bono LKP (manufactured by N1 Shiyakuhin Kogyo Co., Ltd.), an offset printing plate is created to simulate a complicated phenomenon, and mailed/done printing is performed. Offset printing was performed using a printer (manufactured by Maylander), followed by JJII heat drying at 100-120°C for 10 minutes.

The ink used had the following composition.

Alkyd Logi/Malay 35-40 parts varnish dryer (cobalt-based) 0.5-1.0 Petroleum solvent 35-40 Facial 20-25 Various pigments were selected depending on the required hue.

Inorganic pigments include chromate, monovalent ferrocyanide, WLe salt, oxide, hydroxide, and silicate.

Natural dye pigments, nitroso-based pigments, nitro threads, azo threads, phthalocyanine-based pigments, basic dye threads, acid dye threads, architectural dyes, mordant dyes, etc. were used as organic pigments such as carbonates and carbon substances.

In addition, according to the free-leaf printing method, a nickel negative plate (5 μm thick
) to a metal screen plate (biased at 45°) which was adhered by the drying method, and the ink was transferred using a urethane squeegee with a rubber hardness of 70°. After that, 100-120
'<;, Heat drying was performed for 10 minutes.

The ink used had the following composition.

Dryer (Conort type) 0.5-1.0〃Petroleum-based solvent 35-40〃 Facial 20-25〃 Also, depending on the octopus printing method of the transfer method, oil is applied to a printing copper plate with a thickness of 1.9 mm. The chisel turn on the bottom is etched to a thickness of approximately blade μm using the usual photo-etching method, and then using a plate plated with nickel and chromium to a thickness of 2 to 3 μm each, filled with ink, scratched with a doctor blade, and coated with rubber. The image was transferred using a 75 degree urethane roll. After that, 100~
Heat drying was performed at 120° C. for 10 minutes. The ink used had the following composition.

Alkyd rosin malein 35-40 parts Acid face dryer (cobalt thread) 0.5-1.0 Petroleum bath agent 35-40 Facial 20-25 Still good results using the following printing inks Obtained and subtracted. Acid polymerization type process ink NS Sl key,
N5SR-Aka (mainly rosin-modified phenolic resin manufactured by Isuwamo Moroboshi Ink), heat drying after mark-11 is 70-9
It was 0'C1w minutes.

Example 2 A soda lime substrate with a diameter of 4 inches, a thickness of 1, and 5 mm was [
It was thoroughly washed with a θ% surfactant water bath solution, and then washed with water.

Then after washing twice with isopropatool.

It was dried by displacement with Freon vapor and further dried with hot air at 100°C. Iε was applied to the entire surface of this substrate at 25°C.
A negative resist (TPR) with a viscosity of

After coating the film with a film thickness of 1.0 μm (manufactured by Tokyo Ohka Chemical Co., Ltd.), additional silibaking treatment was performed at a temperature of 90'C in an open environment.

On the main surface of the substrate coated with resist in this way,
A carbon dioxide laser (output 100 W) with a wavelength of 10.6 μm is used to form a stripe at a depth of 1.5 mm at a speed of about 5 o/sec.
Four parts of 4-1.5 μrn were formed.

Thereafter, in the same manner as in Example 1, a multilayer interference film was formed on the main surface of the substrate, and a multilayer interference film was laminated in the concave portion, the resist pattern was peeled off, and the main surface was rotary polished.
The deformed portions and the resist film produced on the main surface of the substrate during laser carving were removed by polishing with K (manufactured by KK). after that,
In the same manner as in Example 1, one layer of transparent colored ink was formed, and finally a transparent protective film was formed over the entire surface of the product using SE 5102 (manufactured by Mitsubishi Rayon) to produce a color separation filter. .

Example 3 In Example 2, when forming the four parts on the main surface of the substrate, ultrasonic processing (output 400 W, frequency 28 KH
An N1f filter for one color was manufactured in the same manner as in Example 2, except that concave portions were formed in a stripe shape using a planar cutter-like horn at a speed of 2 μm and 10.5 seconds.

[Brief explanation of the drawing]

An example of the relationship between the pattern of the multilayer interference film in the filter and the chisel turn of one colored image is shown in the bottom diagram, and Figure 3 +
al to (g) are cross-sectional views showing the manufacturing process of the color separation filter according to the present invention, and FIG. 4 is a cross-sectional view of another specific example of the color separation filter according to the present invention. 1...color separation filter, 2...substrate, 3...goods"
Department. Applicant's agent Kiyoshi Inomata (1) Figure 3 (d) (e) (f) Figure 3 (9) Figure 4

Claims (1)

[Claims] 1. A substrate having four parts formed in a pattern, and a plurality of layers of a high refractive index material and a low refractive index material layered in pomelo on substantially the same plane as the substrate plane within the recessed part. - A color separation filter comprising a multilayer interference film formed by a multilayer interference film, and a transparent colored ink layer provided in a pattern on a substrate. 2. A method for manufacturing a color separation filter characterized by including the following steps (a) to le): Step (a): Forming a resist pattern in which openings for forming recesses are provided on the main surface of a substrate. Step (b) Step T- (Mlr1 tube, e A-y 44' 11) of etching the main surface of the substrate to form four patterned parts on the substrate. )l
lIl 'IIJI h”-JK Resistant J pattern 7-1-1
-Multiple layers of high refractive index material and low refractive index material are placed in the concave part of the substrate where the resist nozzle is provided, and the film thickness is controlled until they reach almost the same plane as the substrate. Step (d) of laminating a multilayer interference film to form a multilayer interference film; Step (d) of removing the resist nozzle and the multilayer interference film laminated thereon from the two substrates; Step (e): a substrate with a multilayer interference film provided in the recesses; A step of providing a transparent colored ink layer in the shape of a putter 7 on the main surface. 3. Method for manufacturing a color separation filter characterized by including the following steps (al to (dl): Step (al: After forming a resist pattern in which four-part forming openings are provided on the main surface of the substrate, A process of forming a soturn-shaped recess on the substrate by physically or artistically processing the resist opening of . Process of forming a multilayer interference film by laminating a plurality of layers of high-refractive index material and low-refractive index material alternately until they are almost flush with the substrate to form a multilayer interference film. (C) Two substrates. Step (d) of removing the resist pattern and the multilayer interference film laminated thereon from the resist pattern: A transparent colored ink layer in a nosoturn shape is provided on the main surface of the substrate on which the multilayer interference film is provided in the recess. Process.