JPS6013082A - Transferring and surface treating apparatus - Google Patents

Transferring and surface treating apparatus

Info

Publication number
JPS6013082A
JPS6013082A JP11978783A JP11978783A JPS6013082A JP S6013082 A JPS6013082 A JP S6013082A JP 11978783 A JP11978783 A JP 11978783A JP 11978783 A JP11978783 A JP 11978783A JP S6013082 A JPS6013082 A JP S6013082A
Authority
JP
Japan
Prior art keywords
conveyor
rollers
etching
substrate
center
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11978783A
Other languages
Japanese (ja)
Inventor
Hiroyuki Nogawa
野川 博之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11978783A priority Critical patent/JPS6013082A/en
Publication of JPS6013082A publication Critical patent/JPS6013082A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To treat uniformly both sides of a substrate by setting a mechanism for rotating a conveyor round a line connecting the center of the inlet side of conveyor rollers in the lateral direction to the center of the outlet side of the rollers in the lateral direction at the height of a line passing through the conveyor as the imaginary axis of rotation and by arranging nozzles around the conveyor. CONSTITUTION:In a transferring and surface treating apparatus, the surfaces of a plate 2 to be treated are treated by driving plural conveyor rollers 1 composed of pairs of upper and under sending rollers so as to pass the plate 2 through the chemical soln. spray chamber 3. Rotating disks 14a, 14b, 14c for rotating the whole conveyor round a line connecting the center of the inlet side of the rollers 1 in the lateral direction to the center of the outlet side of the rollers 1 in the lateral direction at the height of a line passing through the conveyor as the imaginary axis of rotation are set in the apparatus, and chemical soln. spray nozzles 4, 5 are arranged around the conveyor.

Description

【発明の詳細な説明】 本発明は搬送表面処理装置に関し特に印刷配線基板(以
f基板と称す)などを搬送しつつ表面をエツチング処理
する装置lVJ改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a conveyance surface treatment apparatus, and more particularly to an improved IVJ apparatus for etching the surface of a printed wiring board (hereinafter referred to as an "F-board") while conveying it.

従来の搬送表面処理装置として第1の例を第1図に側断
面図で示す。上下両面に銅箔層を有する基板の製造工程
の中で絶縁基板上の所望の位置に配線口路を得るため、
基板両面の銅箔層上にエツチングレジストで所望の回路
を被覆形成し、−この被覆した所望回路以外の銅箔をエ
ツチング除去して回路を形成させるために用いるエツチ
ング装置がある。
A first example of a conventional conveyance surface treatment apparatus is shown in a side sectional view in FIG. In the manufacturing process of a board that has copper foil layers on both the top and bottom sides, in order to obtain a wiring path at a desired position on an insulating board,
There is an etching device used to form a circuit by coating a desired circuit with an etching resist on the copper foil layer on both sides of a substrate and then etching away the copper foil other than the coated desired circuit.

次に、このエツチング装置の動作を説明する。Next, the operation of this etching apparatus will be explained.

コンベアローラー1の右端上へ基板2を釆せると。When the substrate 2 is placed on the right end of the conveyor roller 1.

進行方向に回転しているコンベアローラー1により、基
板2はエツチング室3へ送られ、右から左へ移動しなが
ら上ノズル4と下ノズル5から噴霧された工、チング液
6が銅箔の繕出部分全エツチング処理する。その後、基
板2は次の水洗室7へ送られる。かかる従来の搬送表面
処理装置での基板のエツチングによる仕上り性は、上面
側ではエツチング液の噴霧時にエツチング作用を完了し
The substrate 2 is sent to the etching chamber 3 by the conveyor roller 1 rotating in the advancing direction, and as it moves from right to left, the etching solution 6 sprayed from the upper nozzle 4 and lower nozzle 5 repairs the copper foil. All exposed parts are etched. Thereafter, the substrate 2 is sent to the next washing chamber 7. Regarding the finishing quality of the substrate by etching in such a conventional transport surface treatment apparatus, the etching action is completed on the upper surface side when the etching liquid is sprayed.

劣化した工、チンダ液が基板2の上面に落ちずに滞留状
態になり易い、このためエツチング速度は遅くなる。
The degraded etching solution tends to remain on the upper surface of the substrate 2 without falling onto the upper surface of the substrate 2, which slows down the etching speed.

1だ劣化したエツチング液は全上面に対し、不均一状態
に滞留するため、上面内でもエツチング速度のばらつき
が発生し、エツチング処理が不均一となる。
Since the etching solution that has deteriorated even more remains in a non-uniform state over the entire upper surface, variations in the etching rate occur even within the upper surface, resulting in non-uniform etching.

一方、下面側では劣化したエツチング液は工。On the other hand, the deteriorated etching solution can be removed from the bottom side.

チング作用金完了した後、直ちに落下し、新鮮なエツチ
ング液が常に下面側へ接触するので上面側と比べるとエ
ツチング速度は早くなる。
After the etching process is completed, the etching solution drops immediately and fresh etching solution always comes into contact with the lower surface, so that the etching speed is faster than on the upper surface.

このため上面側と下面側との両者間では均一なエツチン
グ仕上りが得られない、また回路幅Q3nm以下の回路
を必要とする高密度な基板の場合には。
For this reason, a uniform etching finish cannot be obtained between both the upper surface side and the lower surface side, and in the case of a high-density substrate requiring a circuit with a circuit width Q of 3 nm or less.

生産歩留りが悪く、基板を不良にしてしまう欠点があっ
た。そこで従来装置では上記欠点を若干でも良くするよ
うに、全体のコンベア軸全1〜3゜程度傾け、上面側の
液を少しでも早く流下させる手段金とることがあるが、
装置が仮雑になり、かつ装置の費用が冒くなる割に効果
は少ながった。
This had the drawback of poor production yields and defective substrates. Therefore, in order to improve the above-mentioned drawbacks even slightly, in conventional equipment, the entire conveyor axis is tilted by about 1 to 3 degrees to make the liquid on the upper surface flow down as quickly as possible.
The equipment became complicated and the cost was high, but the effectiveness was low.

また高精度な基板全処理する第2例を第2図の斜視図で
示す0箱状に六側面全囲ったブース8内へ基板2を垂直
に立設して、基板2と対面する両側のノズル9でエツチ
ング液全一定時間噴霧して処理する。その後、扉10全
開けて基板2を取り出していた。基板2を立設してエツ
チングしているので、エツチング液は基板2上に滞留す
ることがなくなり、基板2の両面の仕上りは同じとなる
In addition, a second example of highly accurate processing of all substrates is shown in the perspective view of FIG. The etching solution is sprayed with the nozzle 9 for a certain period of time. After that, the door 10 was fully opened and the board 2 was taken out. Since the substrate 2 is etched while standing upright, the etching solution does not stay on the substrate 2, and both sides of the substrate 2 have the same finish.

従来装置の第1の例よりは、精度は同上するが。Although the accuracy is the same as that of the first example of the conventional device.

立設状態の基板2の下部側は上部側に比べると劣化した
液の流れによ一す、エツチング液の噴霧全じゃへいする
ため、均一なエツチング処理が行えない、また、処理の
単位形態がバッチ処理(逐次一括処理)であるため、量
産性が無く工数が多大にかかる欠点があった。
The lower side of the substrate 2 in an upright state has a deteriorated flow of liquid compared to the upper side, and the spray of etching liquid is completely blocked, so uniform etching cannot be performed, and the unit form of the process is Since it is a batch process (sequential batch process), it has the disadvantage that it is not suitable for mass production and requires a large number of man-hours.

不発明の目的はかかる従来装置の欠点を解決した搬送表
面処理装置を提供することにある0本発明によれば上下
一対の送りローラーからなる複数ノコンヘアローラーを
駆動し薬液スプレーチャンバー内を通過させて被処理板
の表面を処理する搬送表面処理装置において、上記コン
ベアローラーの人口側の幅方向の中心とコンベアローラ
ーの出口側の幅方向の中心全コンベア通過ラインの高さ
で結んだ線を回転架空軸としてコンベア全体全回転させ
る機構と、上記コンベアの周囲に薬液スプレーノズルを
配設したことを特徴とする搬送表面処理装置が得られる
The object of the invention is to provide a conveying surface treatment device that solves the drawbacks of the conventional devices.According to the present invention, a plurality of continuous hair rollers consisting of a pair of upper and lower feed rollers are driven to pass through a chemical spray chamber. In a conveying surface treatment device that processes the surface of a plate to be treated, a line connecting the widthwise center of the above-mentioned conveyor roller on the artificial side and the widthwise center of the outlet side of the conveyor roller at the height of the entire conveyor passage line is rotated. A conveying surface treatment device is obtained, which is characterized by having a mechanism for fully rotating the entire conveyor as an imaginary axis, and a chemical spray nozzle arranged around the conveyor.

以下、不発明による搬送表面処理装置全基板のエツチン
グ装置に適用した一実施例について第3図乃至第8図全
参照して説明する。第3図および第4図は不実施例の側
断面図であり、第5図はコンベア入口側からの正面図、
第6図はエツチング室の正断面図、第7図はコンベア出
口側からの正囲図、第8図はコンベアローラーの駆動原
理全あられす斜視図である。まず構成全説明する。右の
エツチング室3から左隣りの水洗室7にかけて上ノズル
4と下ノズル5および両側に垂設された左右のノズル1
1の中間にコンベアフレーム12が連架されている。コ
ンベアフレーム12はエツチング室3および水洗室7に
放射状に配設された各々の滑車13に保持された回転円
板14a、14b。
Hereinafter, an embodiment of the conveying surface treatment apparatus according to the invention applied to an etching apparatus for all substrates will be described with reference to all of FIGS. 3 to 8. Figures 3 and 4 are side sectional views of non-embodiments, and Figure 5 is a front view from the conveyor entrance side.
FIG. 6 is a front sectional view of the etching chamber, FIG. 7 is a square view from the exit side of the conveyor, and FIG. 8 is a perspective view of the driving principle of the conveyor rollers. First, I will explain the entire configuration. From the etching chamber 3 on the right to the washing chamber 7 on the left, there are an upper nozzle 4, a lower nozzle 5, and left and right nozzles 1 vertically installed on both sides.
A conveyor frame 12 is connected between the conveyor frames 1 and 1. The conveyor frame 12 includes rotating disks 14a and 14b held by pulleys 13 arranged radially in the etching chamber 3 and the washing chamber 7, respectively.

14Cに固着されJ回転円板14a、14b、14Cは
中(心の高さ全コンベアローラー1の基板通過ラインP
、Lとしたコンベアローラー10幅の中心点CP全回転
中心としている。第5図で示すように回転円板14aに
取)付けられているタイミング平歯車15a とモータ
ー16側のタイミング平歯車15bにはタイミングベル
ト17が掛けられている。コンベアローラー1の形状は
噴霧の妨げとならないように第8図のように輪切り状の
コンベアローラーlとなっている。第3図のように上下
一対のコンベアローラー1のうち、上の回転自由状態の
コンベアローラー1はスプリング18により下の軸駆動
側のコンベアローラー1へ押されて駆動力を受けている
。またスプリング18は、基板2の搬送時の保持も行っ
ている。
14C, and the J rotating disks 14a, 14b, 14C are fixed to the substrate passing line P of the conveyor roller 1.
, L is the center point of the width of the conveyor roller 10, which is the center of full rotation. As shown in FIG. 5, a timing belt 17 is hung between a timing spur gear 15a attached to a rotating disk 14a and a timing spur gear 15b on the motor 16 side. The shape of the conveyor roller 1 is a round conveyor roller 1 as shown in FIG. 8 so as not to interfere with spraying. As shown in FIG. 3, of the pair of upper and lower conveyor rollers 1, the upper conveyor roller 1 in a freely rotating state is pushed by the spring 18 to the lower shaft-driven conveyor roller 1 and receives a driving force. The spring 18 also holds the substrate 2 during transportation.

次にコンベアローラー1の駆動系の構成を説明する。第
8図で示すように回転円板14Cに内歯車19が取り伺
けられて、内側には従動の小歯車20がかみ合っている
。コンベア主1駆動軸21には小歯車20.および各々
のコンベアローラー1の軸端に取力付けられている従動
かさ歯車22とかみ合う位置に原動かさ歯車23が各々
配設されテイル、コンベアフレーム12の回転数とエツ
チング室3の有効処理長さL(第3図参照)との関係は
、均一処理が行えるように、エツチング室3を基板2が
通過する場合、エツチング室3に入った時の基板2の傾
き(水平、垂直も含む)および面の位置がエツチング室
3′f:出る時も同一となるように、コンベアフレーム
12を整数の回転数で回転させる。
Next, the configuration of the drive system of the conveyor roller 1 will be explained. As shown in FIG. 8, an internal gear 19 is provided on the rotary disk 14C, and a driven small gear 20 is meshed with the internal gear. The conveyor main 1 drive shaft 21 has a small gear 20. A driving bevel gear 23 is disposed at a position where it meshes with a driven bevel gear 22 attached to the shaft end of each conveyor roller 1. The relationship with L (see Figure 3) is that when the substrate 2 passes through the etching chamber 3, the inclination (including horizontal and vertical) of the substrate 2 when it enters the etching chamber 3 and the The conveyor frame 12 is rotated at an integral number of revolutions so that the surface position remains the same when exiting the etching chamber 3'f.

この条件金満すため次式で各歯車を選択する。To satisfy this condition, each gear is selected using the following formula.

内歯車19.小歯車200回転数をNhN、。Internal gear19. NhN, the number of revolutions of the small gear is 200.

ピッチ円直径をD!、D2.歯数’i”Zt、Zzとす
るとN2/N!=Dt/D冨=Zx/Z2となり。
The pitch circle diameter is D! , D2. Letting the number of teeth 'i'' be Zt and Zz, then N2/N!=Dt/Dt=Zx/Z2.

Nt’rlとすればN z == D 1 / ]) 
zとなる。従動かさ歯車22.および原動かさ歯車23
の歯数を1対1とするとコンベアローラー1の回転数は
N2と等しくなる。コンベアローラー1の径kDsとし
て2次式の答えが整数となるように各歯車のピ、チ円直
径、?lli数及びコンベアロー2−10Kl決める。
If Nt'rl, then N z == D 1 / ])
It becomes z. Driven bevel gear 22. and prime mover gear 23
If the number of teeth is 1:1, the number of rotations of the conveyor roller 1 will be equal to N2. As the diameter kDs of the conveyor roller 1, set the diameter of each gear so that the answer to the quadratic equation is an integer. Determine the number of lli and conveyor row 2-10Kl.

尚、この時コンペフレーム120回転速度は基板2を容
易にコンベアローラー1へ投入できる速度となるように
する。
At this time, the rotation speed of the competition frame 120 is set such that the substrate 2 can be easily thrown into the conveyor roller 1.

N、XD3 X□=整数 算出した整数の値はエツチン
グ室3で基板2が回転する値である。基板2の銅箔の厚
さによりエツチング処理時間(工、チング不足または過
多とならないようにする)を変えなければないが、コン
ベア7レーム120回転でコンベアロール1が回転して
いるので、何れのコンベアスピードでも、必ず算出した
整数値で基板2はエツチング室3内を回転する。
N, XD3 X□=integer The calculated integer value is the value at which the substrate 2 rotates in the etching chamber 3. The etching time (to avoid insufficient etching or excessive etching) must be changed depending on the thickness of the copper foil on the substrate 2, but since the conveyor roll 1 is rotating at 120 revolutions per conveyor 7 frame, no Even at the conveyor speed, the substrate 2 always rotates in the etching chamber 3 at the calculated integer value.

次にエツチング処理の手J@’c説明する。Next, the etching process will be explained.

所定のコンベアスピードとなるようにモータ−16全回
動じてコンベアフレーム12を回転およびコンベアロー
ラ−1全回動する。基板2を投入口24へ入れ、第3図
のように上ノズル4.下ノズル5および両側のノズルか
らエツチング液6盆噴霧し、コンベアローラー1の回動
により、基板2をエツチング室3.水洗室7へと回転さ
せながら搬送し、取り出し口25より基板2を取り出し
エツチング処理を完了させる。
The motor 16 is fully rotated to rotate the conveyor frame 12 and the conveyor roller 1 is fully rotated so as to achieve a predetermined conveyor speed. Insert the substrate 2 into the input port 24, and insert the upper nozzle 4 as shown in FIG. Etching liquid 6 is sprayed from the lower nozzle 5 and the nozzles on both sides, and the substrate 2 is moved into the etching chamber 3 by rotation of the conveyor roller 1. The substrate 2 is transported to the washing chamber 7 while being rotated, and the substrate 2 is taken out from the take-out port 25 to complete the etching process.

以上2本発明により次の効果がある。The above two inventions have the following effects.

(1)基板の両面とも同一、かつ均一なエツチング仕上
りが得られる。
(1) The same and uniform etching finish can be obtained on both sides of the substrate.

(1i)高精度な回路を肩する基板も確実にエツチング
処理が行え、生産上の歩留vを向上することができる。
(1i) The etching process can be reliably performed on a substrate carrying a high-precision circuit, and the production yield v can be improved.

((10まfi−量産的な処理が行え、工数を削減でき
る。
((10 mafi- Mass production processing can be performed and the number of man-hours can be reduced.

【図面の簡単な説明】 第1図および兜2図は従来の搬送表面処理装置のそれぞ
れ第1および@2の側断面図。第3図および第4図は不
発明の一実施例の側断面でそれぞれ、コンベア水平時の
処理状態、およびコンベア垂直時の処理状態を示す、第
5図はコンベア入口側からの正面図、第6図はエツチン
グ室の正断面図、第7図はコンベア出口側からの正面図
、第8図はコンベアローラーの駆動原理をあられす斜視
図・ 1・・・・・・コンベアローラー、2・・・・・・基L
 3・・・・・・エツチング室、4・・・・・・上ノズ
ル、5・・・・・・下ノズル。 6・・・・・・工、チング液、7・・・・・・水洗室、
8・・・・・・ブース、9・・・・・・両側のノズル、
10・・・・・・扉、11・・・・・・左右のノズル、
12・・・・・・コンベアフレーム、13・・・・・・
滑車Th 14a、14b、14C・・・・・・回転円
板h 15a。 15b・・・・・・タイミング平歯車、16・・・・・
・モーター、17・・・・・・タイミ/グベルト、18
・・・・・・スプリング。 19・・・・・内歯車、20・・・・・・小歯車、21
・・・・・・主駆動軸、22・・・・・・従動かさ歯車
、23・・・・・・原動かさ歯車、24・・・・・・投
入口%25・・・・・・取り出し口。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 and FIG. 2 are side sectional views of the first and @2 parts of a conventional conveying surface treatment device, respectively. 3 and 4 are side cross sections of an embodiment of the invention, showing the processing state when the conveyor is horizontal and the processing state when the conveyor is vertical, respectively. FIG. 5 is a front view from the entrance side of the conveyor, and FIG. Figure 6 is a front sectional view of the etching chamber, Figure 7 is a front view from the conveyor exit side, and Figure 8 is a perspective view showing the driving principle of the conveyor rollers.・・・・Basic L
3...Etching chamber, 4...Upper nozzle, 5...Lower nozzle. 6...Engine, tinging liquid, 7...Washing room,
8...booth, 9...nozzles on both sides,
10...door, 11...left and right nozzles,
12... Conveyor frame, 13...
Pulley Th 14a, 14b, 14C...Rotating disk h 15a. 15b... Timing spur gear, 16...
・Motor, 17...Taiimi/Gubert, 18
······spring. 19... Internal gear, 20... Small gear, 21
...Main drive shaft, 22...Driver bevel gear, 23...Main mover gear, 24...Input port %25...Take out mouth.

Claims (1)

【特許請求の範囲】[Claims] 上下一対の送ルローラーからなる複数のコンベアローラ
ーt−駆動し薬液スプレーチャンバー内を通過させて被
処理板の表面を処理する搬送表面処理装置において、前
記コンベアローラーの人口側の幅方向の中心とコンベア
ローラーの出口側の幅方向の中心をコンベア通過ライン
の高さで結んだ線を回転架空軸としてコンベア全体を回
転させる機構と、前記コンベアの周囲に薬液スプレーノ
ズル全配設したことを特徴とする搬送表面処理装置。
In a conveying surface treatment device that treats the surface of a plate to be treated by passing through a chemical spray chamber by driving a plurality of conveyor rollers consisting of a pair of upper and lower feed rollers, the center of the width direction of the artificial side of the conveyor roller and the conveyor The present invention is characterized by a mechanism for rotating the entire conveyor using a line connecting the widthwise centers of the exit side of the rollers at the height of the conveyor passage line as a rotating aerial axis, and a mechanism in which the entire conveyor is rotated, and chemical spray nozzles are all disposed around the conveyor. Conveyance surface treatment equipment.
JP11978783A 1983-07-01 1983-07-01 Transferring and surface treating apparatus Pending JPS6013082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11978783A JPS6013082A (en) 1983-07-01 1983-07-01 Transferring and surface treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11978783A JPS6013082A (en) 1983-07-01 1983-07-01 Transferring and surface treating apparatus

Publications (1)

Publication Number Publication Date
JPS6013082A true JPS6013082A (en) 1985-01-23

Family

ID=14770209

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11978783A Pending JPS6013082A (en) 1983-07-01 1983-07-01 Transferring and surface treating apparatus

Country Status (1)

Country Link
JP (1) JPS6013082A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0343765U (en) * 1989-09-07 1991-04-24
JPH0572165U (en) * 1992-03-05 1993-09-28 昭和電工株式会社 Etching equipment
JPH062739U (en) * 1992-06-15 1994-01-14 株式会社石井表記 Equipment for etching, developing and stripping printed circuit boards

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0343765U (en) * 1989-09-07 1991-04-24
JPH0572165U (en) * 1992-03-05 1993-09-28 昭和電工株式会社 Etching equipment
JPH062739U (en) * 1992-06-15 1994-01-14 株式会社石井表記 Equipment for etching, developing and stripping printed circuit boards

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