JPS6012285B2 - Method for producing cadmium sulfide deposited film - Google Patents

Method for producing cadmium sulfide deposited film

Info

Publication number
JPS6012285B2
JPS6012285B2 JP1189877A JP1189877A JPS6012285B2 JP S6012285 B2 JPS6012285 B2 JP S6012285B2 JP 1189877 A JP1189877 A JP 1189877A JP 1189877 A JP1189877 A JP 1189877A JP S6012285 B2 JPS6012285 B2 JP S6012285B2
Authority
JP
Japan
Prior art keywords
reaction
film
cadmium sulfide
substrate
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1189877A
Other languages
Japanese (ja)
Other versions
JPS5396995A (en
Inventor
寿明 岡田
正和 棚橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1189877A priority Critical patent/JPS6012285B2/en
Publication of JPS5396995A publication Critical patent/JPS5396995A/en
Publication of JPS6012285B2 publication Critical patent/JPS6012285B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、チオ尿素とカドミウムイオンとを主反応物質
とする均一沈澱反応により硫化カドミウム析出膜を得る
方法の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for obtaining a cadmium sulfide precipitated film by a homogeneous precipitation reaction using thiourea and cadmium ions as main reactants.

従来、この種の硫化カドミウム析出膜の製造法において
、1回の反応で得られる膜の厚さを増す目的で「反応液
の組成、反応温度、あるいは基板などについて数多くの
検討が行われている。
Conventionally, in the manufacturing method of this type of cadmium sulfide precipitated film, many studies have been conducted on the composition of the reaction solution, reaction temperature, substrate, etc. in order to increase the thickness of the film obtained in one reaction. .

しかし、いずれにしても、反応は溶液中での均一沈澱反
応であるため、基板の単位面積当たりの硫化カドミウム
析出量を多くすることは困難であり、1回の反応で0.
5〜0.6レ程度の膜厚を得るのが限度であった。また
膜としての回収率も20%程度が限度であった。本発明
は、反応液の全反応が終了する間に、溶液中での硫化カ
ドミウム生成量に対し、硫化カドミウム膜としての生成
量を多くし、かつ1回の反応で生成される濃厚を厚くす
る方法を提供するものである。
However, in any case, since the reaction is a homogeneous precipitation reaction in a solution, it is difficult to increase the amount of cadmium sulfide precipitated per unit area of the substrate, and it is difficult to increase the amount of cadmium sulfide precipitated per unit area of the substrate.
The limit was to obtain a film thickness of about 5 to 0.6 mm. Moreover, the recovery rate as a membrane was also limited to about 20%. The present invention increases the amount of cadmium sulfide produced as a cadmium sulfide film compared to the amount of cadmium sulfide produced in the solution while the entire reaction of the reaction solution is completed, and thickens the concentration produced in one reaction. The present invention provides a method.

まず、液組成や反応温度と、反応速度、膿成長速度、得
られる腰厚についての検討結果を第1表に示す。
First, Table 1 shows the results of the study regarding the liquid composition, reaction temperature, reaction rate, growth rate of pus, and thickness obtained.

反応液は、カドミウムイオン濃度0.0667モル/そ
、チオ尿素濃度0.333モル/Z、アンモニア濃度1
.05モル/Zとして餌10.17に調整したものを標
準とし、反応温度の標準は8び0とした。
The reaction solution had a cadmium ion concentration of 0.0667 mol/Z, a thiourea concentration of 0.333 mol/Z, and an ammonia concentration of 1.
.. The standard was adjusted to 0.05 mol/Z and the feed was adjusted to 10.17, and the standard reaction temperature was set to 8.0.

反応速度に相当するるものとしてカドミウムイオン濃度
が反応開始時のそれの1/4に減少するまでの時間で表
し、膜厚は前記の時間までに得なれた膜厚で表した。第
1表 これらの実験の結果、溶液中での反応速度が、し、場合
(舷.7,10,13)には一定量のカドミウムイオン
の反応に対する膜成長は減少する。
The reaction rate was expressed as the time required for the cadmium ion concentration to decrease to 1/4 of that at the start of the reaction, and the film thickness was expressed as the film thickness obtained up to the aforementioned time. Table 1 The results of these experiments show that when the reaction rate in solution is (7, 10, 13), the film growth for a given amount of cadmium ion reaction decreases.

また液中での硫化カドミウム生成量の多い場合(蛇1)
にも膜成長は減少する。しかし他の場合にはそれほど大
きな差が見られなかった。液相反応の温度依存性の検討
は第1表にあげた例の他、数種類の混合液を用いて行っ
たが、これらの結果は液組成の変化にほとんど関係なく
、1式でk工koexp(−26.1×IQ/T)
……lk: 反応速度定数ko:定数(反応液により異
なる) T :絶対温度 表されることが判かつた。
Also, if there is a large amount of cadmium sulfide produced in the liquid (Snake 1)
Also film growth is reduced. However, in other cases no significant differences were observed. In addition to the examples listed in Table 1, studies on the temperature dependence of liquid phase reactions were conducted using several types of mixed liquids, but these results were almost unrelated to changes in liquid composition. (-26.1×IQ/T)
...lk: reaction rate constant ko: constant (varies depending on the reaction solution) T: absolute temperature.

一方、反応初期の膜成長速度の温度依存性も「同様の式
により表され2式の様になった。
On the other hand, the temperature dependence of the film growth rate at the initial stage of the reaction was also expressed by a similar equation, as shown in Equation 2.

V=Voexp(一11.5×1ぴ/T) ……2V
:(膿成長速度Vo:定数(反応液により異なる) T:絶対温度 この結果から反応速度および膜成長速度は温度の上昇と
ともに指数函数的に増加することがわかる。
V = Voexp (11.5 x 1 pi/T) ...2V
: (Pus growth rate Vo: Constant (varies depending on the reaction solution) T: Absolute temperature From these results, it can be seen that the reaction rate and film growth rate increase exponentially as the temperature rises.

また膜の成長は常に新しい反応液中に放置した場合、初
期の成長速度が保たれ、第1図に示す様に膜厚は時間と
ともに直線的に増加することが確かめられた。
It was also confirmed that when the film was left in a fresh reaction solution, the initial growth rate was maintained, and the film thickness increased linearly with time as shown in FIG.

また反応液中に硫化カドミウムが多量に生成された場合
にはト膜の成長は止まることともに沈澱物が次着し、良
い膜が得られない現象も観察された。
It was also observed that when a large amount of cadmium sulfide was produced in the reaction solution, the growth of the film stopped and a precipitate adhered to it, making it impossible to obtain a good film.

これらの実験の結果、厚い膜を作る方法として2つの方
法が考えられる。
As a result of these experiments, two methods can be considered to create a thick film.

1つは常に新しい反応液を流し、簾を成長させる方法で
ある。
One method is to constantly flow a new reaction solution to grow the screen.

しかしこの方法では全反応に対する膜としての回収率が
非常に少なくなり、工業的な使用目的のためには好まし
くない。本発明は、反応の液の大部分の液の温度を低く
おさえ、硫化カドミウムを析出させる基板部分の液の温
度を高くすることによって、回収率が大きく、かつ濃厚
の厚い硫化カドミウム析出膜を提供するものである。
However, in this method, the recovery rate as a membrane based on the total reaction is very low, and it is not preferable for industrial purposes. The present invention provides a high recovery rate and a thick cadmium sulfide precipitated film by keeping the temperature of most of the reaction solution low and increasing the temperature of the solution on the substrate where cadmium sulfide is deposited. It is something to do.

本発明を実施するには次のような方法がある。The present invention can be implemented in the following ways.

1 反応液を循環させ、基板のある部分で液温を上げ、
それ以外の部分は冷却する方法。
1 Circulate the reaction solution and raise the temperature of the solution at a certain part of the substrate.
How to cool other parts.

2 バッチ法で、反応液を冷却し、基板板の部分で加熱
する方法。
2. A batch method in which the reaction solution is cooled and heated at the substrate plate.

3 1,2を絹合せた方法で、液を循環させて冷却し、
基板の部分だけ加熱する方法。
3 Using a method that combines steps 1 and 2, circulate the liquid and cool it.
A method that heats only the board part.

以下本発明の実施例を説明する。Examples of the present invention will be described below.

第2図は上記1の方法を実施する装置の概要を示すもの
で、基板1を設置した高温反応管2に、ポンプ3を備え
た反応液循環路4を結合し、図矢印Xの方向に反応液を
循環させる。
Fig. 2 shows an outline of an apparatus for carrying out method 1 above, in which a reaction liquid circulation path 4 equipped with a pump 3 is connected to a high-temperature reaction tube 2 in which a substrate 1 is installed. Circulate the reaction solution.

5は反応管2を加熱する加熱器、6は冷却管、7は冷却
水の入口、8はその出口である。
5 is a heater for heating the reaction tube 2, 6 is a cooling pipe, 7 is an inlet of cooling water, and 8 is an outlet thereof.

この装置によれば、反応管2内の液が加熱され、次に冷
却管6で冷却されるので、循環路4中での反応は抑制さ
れる。第3図は、上記2の方法を実施する装置を示すも
ので、反応液を収容した反応槽9の側部に基板1を取り
付け、基板1をヒーター0等により外部から加熱するよ
うにする。この方法によれば、反応液は基板と接する部
分が加熱されるので、.その部分の反応速度が大きくな
る。第4図は上記3の方法を実施する装置を示す。
According to this device, the liquid in the reaction tube 2 is heated and then cooled in the cooling tube 6, so that the reaction in the circulation path 4 is suppressed. FIG. 3 shows an apparatus for carrying out method 2 above, in which a substrate 1 is attached to the side of a reaction tank 9 containing a reaction solution, and the substrate 1 is heated from the outside by a heater 0 or the like. According to this method, the part of the reaction solution that comes into contact with the substrate is heated. The reaction rate of that part increases. FIG. 4 shows an apparatus for carrying out method 3 above.

11は反応管で、これに基板1を取り付けてヒ−夕12
により加熱する。
11 is a reaction tube, the substrate 1 is attached to this and the heater 12 is
Heat.

13は反応管11に結合した反応液の循環路で、ポンプ
12を有する。
Reference numeral 13 denotes a circulation path for a reaction solution connected to the reaction tube 11, and includes a pump 12.

14は冷却管、15は冷却水の入口、16はその出口で
ある。
14 is a cooling pipe, 15 is an inlet of cooling water, and 16 is an outlet thereof.

この装置では、反応液は基板と接する部分のみが加熱さ
れ、その他の部分は冷却される。次に上記2の方法の具
体例を述べる。
In this device, only the portion of the reaction liquid that comes into contact with the substrate is heated, and the other portions are cooled. Next, a specific example of method 2 above will be described.

反応液には、前記の標準液を用い、これをガラス容器に
入れて外部より冷却し、ガラス製基板はその裏面に10
0午0に加熱したオイルを流して加熱するようにした。
The above-mentioned standard solution was used as the reaction solution, which was placed in a glass container and cooled from the outside.
At 0:00 am, heated oil was poured into the tank to heat it up.

この方法によると、基板には、温度約80qoにおける
膜成長速度に相当する速さで析出膜が成長したが、反応
液の反応速度は約40qoでの反応に対応してゆるやか
なものであった。また反応液全体の温度を80qoにし
た従釆法では液相中での反応によりカドミウムイオン濃
度が減少するため、一定の厚さで膜の成長が停止した。
上記本発明のaと従来法bについて反応時間と析出膜の
厚さとの関係は第5図の如くで、本発明によれば、膜厚
3仏以上の良質の析出膜が得られた。以上のように、本
発明によれば、基板部分が優先的に加熱されるので、析
出膜の厚さを大きくすることができ、かつその他の液相
部分における反応が抑制されるので、膜としての回収率
を良くすることができる。
According to this method, a precipitated film grew on the substrate at a rate equivalent to the film growth rate at a temperature of about 80 qo, but the reaction rate of the reaction solution was slow corresponding to the reaction at about 40 qo. . In addition, in the secondary method in which the temperature of the entire reaction solution was set to 80 qo, the cadmium ion concentration decreased due to the reaction in the liquid phase, so the growth of the film stopped at a certain thickness.
The relationship between the reaction time and the thickness of the deposited film for the above-mentioned method a of the present invention and conventional method b is as shown in FIG. 5. According to the present invention, a good quality deposited film with a thickness of 3 mm or more was obtained. As described above, according to the present invention, since the substrate portion is heated preferentially, the thickness of the deposited film can be increased, and the reaction in other liquid phase portions is suppressed, so that the film The recovery rate can be improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は反応温度を一定にし、かつ基板が常に新しい反
応液と接するようにしたときの反応時間と析出膜の厚さ
との関係を示す図、第2〜第4図は本発明を実施する装
置の構成例を示す図、第5図は本発明法と従来法の反応
時間と析出膜の厚さとの関係を示す。 第1図 第3図 第2図 第4図 第5図
Figure 1 is a diagram showing the relationship between the reaction time and the thickness of the deposited film when the reaction temperature is kept constant and the substrate is always in contact with fresh reaction solution. FIG. 5, which is a diagram showing an example of the configuration of the apparatus, shows the relationship between the reaction time and the thickness of the deposited film in the method of the present invention and the conventional method. Figure 1 Figure 3 Figure 2 Figure 4 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 1 チオ尿素とカドミウムイオンンとを主反応物質とし
て含む溶液に基板を浸漬し前記両反応物質による沈澱反
応により基板上に硫化カドミウム膜を析出させる方法で
あって、前記溶液の基板と接触する部分の温度を他の部
分より高くすることを特徴とする硫化カドミウム析出膜
の製造法。
1. A method in which a substrate is immersed in a solution containing thiourea and cadmium ions as main reactants, and a cadmium sulfide film is deposited on the substrate by a precipitation reaction caused by both of the reactants, the portion of the solution coming into contact with the substrate. A method for producing a cadmium sulfide precipitated film, characterized by increasing the temperature of the cadmium sulfide deposited film higher than that of other parts.
JP1189877A 1977-02-04 1977-02-04 Method for producing cadmium sulfide deposited film Expired JPS6012285B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1189877A JPS6012285B2 (en) 1977-02-04 1977-02-04 Method for producing cadmium sulfide deposited film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1189877A JPS6012285B2 (en) 1977-02-04 1977-02-04 Method for producing cadmium sulfide deposited film

Publications (2)

Publication Number Publication Date
JPS5396995A JPS5396995A (en) 1978-08-24
JPS6012285B2 true JPS6012285B2 (en) 1985-04-01

Family

ID=11790538

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1189877A Expired JPS6012285B2 (en) 1977-02-04 1977-02-04 Method for producing cadmium sulfide deposited film

Country Status (1)

Country Link
JP (1) JPS6012285B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3014908B1 (en) * 2013-12-12 2016-01-29 Electricite De France PERSULFATE BATH AND METHOD FOR CHEMICAL DEPOSITION OF A LAYER.

Also Published As

Publication number Publication date
JPS5396995A (en) 1978-08-24

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