JPS60118283A - Treatment of organic solvent-containing waste water - Google Patents
Treatment of organic solvent-containing waste waterInfo
- Publication number
- JPS60118283A JPS60118283A JP22763883A JP22763883A JPS60118283A JP S60118283 A JPS60118283 A JP S60118283A JP 22763883 A JP22763883 A JP 22763883A JP 22763883 A JP22763883 A JP 22763883A JP S60118283 A JPS60118283 A JP S60118283A
- Authority
- JP
- Japan
- Prior art keywords
- reverse osmosis
- osmosis membrane
- org
- waste water
- filtrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
(al技術分野
この発明は、有機溶剤を含有する排水を処理し、再利用
するための有機溶剤含有排水の処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field This invention relates to a method for treating wastewater containing organic solvents for treating and reusing wastewater containing organic solvents.
(b)従来技術
半導体素子の製造上、半導体基板等の洗浄には、有機溶
剤による有機洗浄の後、純水による洗浄が行われる。と
ころが、この純水による洗浄の排水には、有機洗浄の際
に半導体基板等に残留したトリクレン等の有機溶剤が微
量に含まれることになる。このため、この排水は、生物
化学的酸素要求量(BOD)や化学的酸素要求量(CO
D)が高くなり、そのまま放流することができないので
、活性汚泥法等による処理が必要であった。(b) Prior Art In manufacturing semiconductor devices, semiconductor substrates and the like are cleaned using organic solvents and then purified water. However, the waste water from cleaning with pure water contains a trace amount of organic solvents such as trichlene remaining on semiconductor substrates and the like during organic cleaning. Therefore, this wastewater has biochemical oxygen demand (BOD) and chemical oxygen demand (CO
D) becomes high and cannot be discharged as is, so treatment using an activated sludge method or the like is required.
fc1発明の目的
この発明は、このような実情に鑑みてなされたものであ
って、半導体基板の洗浄に用いた有機溶剤を含有する排
水を逆浸透膜(R10)と限外濾過膜(UF)とを使用
して処理することにより、排水から純水と有機溶剤とを
分離して回収し再利用することができ、排水を処理して
放流する必要のない有機溶剤含有排水の処理方法を提供
することを目的とする。fc1 Purpose of the Invention This invention was made in view of the above-mentioned circumstances, and is intended to treat wastewater containing organic solvents used for cleaning semiconductor substrates by using a reverse osmosis membrane (R10) and an ultrafiltration membrane (UF). Provides a method for treating wastewater containing organic solvents that does not require treating and discharging wastewater by separating pure water and organic solvents from wastewater, recovering and reusing the wastewater. The purpose is to
fd1発明の構成および効果
この発明は、有ta溶剤を含有する排水の処理工程にお
いて、排水を逆浸透膜で濾過し、この逆浸透膜で濃縮さ
れた液を限外濾過膜で濾過し、この限外濾過膜の濾液を
前記逆浸透膜で濾過する前の排水に戻して混合すること
を特徴とする。FD1 Structure and effect of the invention This invention, in the process of treating wastewater containing TA solvent, filters the wastewater with a reverse osmosis membrane, filters the liquid concentrated with the reverse osmosis membrane with an ultrafiltration membrane, and It is characterized in that the filtrate from the ultrafiltration membrane is returned and mixed with the waste water before being filtered by the reverse osmosis membrane.
上記のように構成されたこの発明の有機溶剤含有排水の
処理方法は、逆浸透膜の濾液が十分に有機溶剤等の不純
物の少ない状態で得られるので、この濾液に簡単な処理
を施すだけで高純度の純水を回収することができ、排水
を放流することな(再利用が可能となって、経済的であ
る。また、逆浸透膜で濾過されなかった液は、排水に戻
され混合して再び逆浸透膜に送られ、この間を循゛環す
る。このため、循環する排水中に溶は込んだ有機溶剤の
濃度が高まりエマルジョン化を起こしてコロイド粒子と
なるので、限外濾過膜で取り除くことが可能となる。し
たがって、有機溶剤も高濃度で回収することができるの
で、これを脱水してボイラー等の燃料として使用すれば
無駄がなくなる。In the method for treating wastewater containing organic solvents of the present invention configured as described above, the filtrate of the reverse osmosis membrane can be obtained in a state with sufficient amounts of impurities such as organic solvents, so that the filtrate can be simply treated. It is possible to recover high-purity pure water, and it is economical because wastewater can be reused without having to be discharged.Also, the liquid that is not filtered by the reverse osmosis membrane is returned to the wastewater and mixed. Then, it is sent to the reverse osmosis membrane again and circulated between these membranes.As a result, the concentration of the organic solvent dissolved in the circulating wastewater increases, causing emulsion and becoming colloidal particles, which are passed through the ultrafiltration membrane. Therefore, the organic solvent can also be recovered at a high concentration, so if it is dehydrated and used as fuel for boilers, etc., there will be no waste.
また、コロイド粒子が限外濾過膜で取り除かれることか
ら、逆浸透膜がこのコロイド粒子によって目詰まりを起
こすのを防ぐこともできる。Furthermore, since the colloidal particles are removed by the ultrafiltration membrane, it is possible to prevent the reverse osmosis membrane from being clogged by the colloidal particles.
tel実施例
図面は、この発明の実施例である有機溶剤含有排水の処
理方法の工程を示すブロック図である。The tel embodiment drawing is a block diagram showing the steps of a method for treating organic solvent-containing wastewater, which is an embodiment of the present invention.
半導体基板等の洗浄工程1では、純水と有機溶剤とを用
い、まず、有機溶剤による有機洗浄が行われた後、純水
による洗浄が行われる。この洗浄工程1から出た有機溶
剤等の不純物を微量に含有する排水は、−耳受は槽2に
貯えられる。受は槽2から引き出された排水は、ポンプ
3で加圧されて、逆浸透膜フィルタ4に送られ濾過され
る。逆浸透膜フィルタ4で濾過され十分に有機溶剤等の
不純物が少なくなった濾液は、有機物分解槽5に送られ
、過酸化水素(H2O2)を混入されるとともに紫外線
(UV)の照射を受けて、残留する有機溶剤等の有機物
を分解する。有機物分解槽5で処理された排水は、次に
、活性炭フィルタ6に送られ、分解された有機物やその
他の不純物の粒子を取り除かれる。活性炭フィルタ6を
通った排水は、さらに、イオン交換樹脂フィルタ7に送
られ、イオンを取り除かれる。このイオン交換樹脂フィ
ルタ7を通った排水は、不純物を殆ど含まない高純度の
純水として回収されるので、再び洗浄工程1に戻し、洗
浄用の純水として使用する。なお、活性炭フィルタ6や
イオン交換樹脂フィルタ7を通しただけで−は水の純度
が十分でない場合には、さらに高段階の処理を行うか、
または、水があまり高純度である必要のない他の用途に
使用する。逆浸透膜フィルタ4で濾過されず、有機溶剤
等の不純物の濃度が高まった濃縮液は、限外濾過膜フィ
ルタ8に送られる。そして、この限外濾過膜フィルタ8
の濾液は、再び受け槽2内の排水に戻して混合される。In the cleaning process 1 for semiconductor substrates, etc., using pure water and an organic solvent, organic cleaning with the organic solvent is first performed, and then cleaning with pure water is performed. The wastewater discharged from the cleaning step 1 and containing a small amount of impurities such as organic solvents is stored in a tank 2. The waste water drawn out from the tank 2 is pressurized by a pump 3, and sent to a reverse osmosis membrane filter 4 where it is filtered. The filtrate that has been filtered through the reverse osmosis membrane filter 4 and has been sufficiently reduced in impurities such as organic solvents is sent to the organic matter decomposition tank 5, where it is mixed with hydrogen peroxide (H2O2) and irradiated with ultraviolet (UV) light. , decomposes residual organic substances such as organic solvents. The wastewater treated in the organic matter decomposition tank 5 is then sent to an activated carbon filter 6, where decomposed organic matter and other impurity particles are removed. The waste water that has passed through the activated carbon filter 6 is further sent to an ion exchange resin filter 7 to remove ions. The waste water that has passed through the ion-exchange resin filter 7 is recovered as highly pure water containing almost no impurities, so it is returned to the cleaning step 1 and used as pure water for cleaning. In addition, if the purity of the water is not sufficient even after passing through the activated carbon filter 6 or the ion exchange resin filter 7, a higher stage treatment may be performed.
Or use it for other applications where the water does not need to be very pure. The concentrated liquid that is not filtered by the reverse osmosis membrane filter 4 and has an increased concentration of impurities such as organic solvents is sent to the ultrafiltration membrane filter 8. And this ultrafiltration membrane filter 8
The filtrate is returned to the waste water in the receiving tank 2 and mixed therewith.
このため、逆浸透膜フィルタ4で濾過されなかった液は
、受は槽2と逆浸透膜フィルタ4との間を循環すること
になる。すると、この循環する排水中に熔は込んだ有機
溶剤は、濃度が高まりエマルジョン化を起こしてコロイ
ド粒子となり、限外濾過膜フィルタ8で取り除かれる。Therefore, the liquid that has not been filtered by the reverse osmosis membrane filter 4 will be circulated between the receiving tank 2 and the reverse osmosis membrane filter 4. Then, the organic solvent that has entered the circulating wastewater increases in concentration, emulsifies, becomes colloidal particles, and is removed by the ultrafiltration membrane filter 8.
このようにして、限外濾過膜フィルタ8で取り除かれた
高濃度の有機溶剤は、水分除去装置9で脱水され、ボイ
ラー等の燃料として回収される以上説明したように、こ
の有機溶剤含有排水の処理方法は、逆浸透膜フィルタ4
の濾液を、有機物分解槽5.活性炭フィルタ6およびイ
オン交換樹脂フィルタ7で処理することにより、高純度
な純水として回収することができるので、排水を放流す
る必要がなく、経済的である。また、有機溶剤は、限外
濾過膜フィルタ8によって取り除くことができるので、
ボイラー等の燃料として回収することができ、無駄がな
くなる。In this way, the highly concentrated organic solvent removed by the ultrafiltration membrane filter 8 is dehydrated by the water removal device 9 and recovered as fuel for boilers, etc. As explained above, this organic solvent-containing wastewater is The treatment method is reverse osmosis membrane filter 4
The filtrate of 5. By treating the water with the activated carbon filter 6 and the ion exchange resin filter 7, highly pure water can be recovered, so there is no need to discharge wastewater, which is economical. In addition, since the organic solvent can be removed by the ultrafiltration membrane filter 8,
It can be recovered as fuel for boilers, etc., eliminating waste.
図面は、この発明の実施例である有機溶剤含有排水の処
理方法の工程を示すプロ・ツク図である。
4−逆浸透膜フィルタ(逆浸透膜)
8−限外濾過膜フィルタ(ffl外濾外膜過膜出願人
関西日本電気株式会社
代理人 弁理士 小森久夫The drawings are process diagrams showing the steps of a method for treating wastewater containing organic solvents, which is an embodiment of the present invention. 4-Reverse osmosis membrane filter (reverse osmosis membrane) 8-Ultrafiltration membrane filter (ffl outer filtration membrane applicant
Kansai NEC Co., Ltd. Representative Patent Attorney Hisao Komori
Claims (1)
排水を逆浸透膜で濾過し、この逆浸透膜で濃縮された液
を限外濾過膜で濾過し、この限外濾過膜の濾液を前記逆
浸透膜で濾過する前の排水に戻して混合することを特徴
とする有機溶剤含有排水の処理方法。(1) In the process of treating wastewater containing organic solvents,
The wastewater is filtered through a reverse osmosis membrane, the liquid concentrated by the reverse osmosis membrane is filtered through an ultrafiltration membrane, and the filtrate from the ultrafiltration membrane is returned to and mixed with the wastewater before being filtered through the reverse osmosis membrane. A method for treating wastewater containing organic solvents.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22763883A JPS60118283A (en) | 1983-11-30 | 1983-11-30 | Treatment of organic solvent-containing waste water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22763883A JPS60118283A (en) | 1983-11-30 | 1983-11-30 | Treatment of organic solvent-containing waste water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60118283A true JPS60118283A (en) | 1985-06-25 |
Family
ID=16864019
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22763883A Pending JPS60118283A (en) | 1983-11-30 | 1983-11-30 | Treatment of organic solvent-containing waste water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60118283A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0434616U (en) * | 1990-07-20 | 1992-03-23 | ||
JPH04131486U (en) * | 1991-05-20 | 1992-12-03 | エスアンドシー株式会社 | Treatment of rinsing water in ultrasonic cleaning and deburring equipment |
CN100400432C (en) * | 2004-10-29 | 2008-07-09 | 中国石油化工股份有限公司 | Terephthalic acid production waste water disposal method |
JP2014188468A (en) * | 2013-03-27 | 2014-10-06 | Mitsubishi Heavy Ind Ltd | Water treatment system for space applications |
-
1983
- 1983-11-30 JP JP22763883A patent/JPS60118283A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0434616U (en) * | 1990-07-20 | 1992-03-23 | ||
JPH04131486U (en) * | 1991-05-20 | 1992-12-03 | エスアンドシー株式会社 | Treatment of rinsing water in ultrasonic cleaning and deburring equipment |
CN100400432C (en) * | 2004-10-29 | 2008-07-09 | 中国石油化工股份有限公司 | Terephthalic acid production waste water disposal method |
JP2014188468A (en) * | 2013-03-27 | 2014-10-06 | Mitsubishi Heavy Ind Ltd | Water treatment system for space applications |
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