JPS60109561A - Preparation of beta-lactam compound - Google Patents

Preparation of beta-lactam compound

Info

Publication number
JPS60109561A
JPS60109561A JP58215647A JP21564783A JPS60109561A JP S60109561 A JPS60109561 A JP S60109561A JP 58215647 A JP58215647 A JP 58215647A JP 21564783 A JP21564783 A JP 21564783A JP S60109561 A JPS60109561 A JP S60109561A
Authority
JP
Japan
Prior art keywords
group
compound
formula
protecting group
hydrogen atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58215647A
Other languages
Japanese (ja)
Inventor
Hamao Umezawa
梅沢 浜夫
Masaji Ono
大野 雅二
Toshio Izawa
伊沢 敏雄
Yoshio Takahashi
高橋 良雄
Hiroshi Ishihama
石浜 洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kowa Co Ltd
Original Assignee
Kowa Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kowa Co Ltd filed Critical Kowa Co Ltd
Priority to JP58215647A priority Critical patent/JPS60109561A/en
Publication of JPS60109561A publication Critical patent/JPS60109561A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Abstract

PURPOSE:To obtain the titled compound of (3S, 4S) useful as an intermediate for a compound having antimicrobial action and inhibitory action on beta-lactamase, by using an easily obtainable L-aspartic acid as a starting raw material, converting it into an azetidine compound which is sterically specific (4S). CONSTITUTION:Amino group of aspartic acid is protected, it is then dehydrated, and reduced to give a compound shown by the formula I (R4 is amino-protecting group). Hydroxyl group of this compound is protected, the amino-protecting group is deprotected, to give a compound shown by the formula II (R1' is OH- protecting group), which is subjected to ring closure to give a compound shown by the formula III. Imino group of this compound is protected, to give a compound shown by the formula IV (R1' is hydroxy-protecting group; R2' is iminoprotecting group), which is oximated to give a compound shown by the formula V, which is reduced, optionally amino group of this compound is protected, and optionally R1' and/or R2' is deprotected to give a compound shown by the formula VI (R1 is H, or R1'; R2 is H, or R2'; R3 is H, or amino-protecting group). USE:An intermediate for bicyclic beta-lactam compound and monobactam antibiotic.

Description

【発明の詳細な説明】 本発明はβ−ラクタム化合物の製造法、更に詳細には、
次の一般式(1)、 (式中、”1は水素原子又は水酸基の保護基を、R2は
水素原子又はイミノ基の保内基を、R3は水素原子又は
アミノ基の保護基會示す)で表わされる化合物の新規な
製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing β-lactam compounds, more specifically,
The following general formula (1), (wherein 1 represents a hydrogen atom or a hydroxyl group-protecting group, R2 represents a hydrogen atom or an imino group, and R3 represents a hydrogen atom or an amino group-protecting group) This invention relates to a novel method for producing the represented compounds.

式(1)化合物は、抗菌作用及びβ−ラクタマーゼ阻害
作用を有する化合物を合成するための中間体として有用
である。
The compound of formula (1) is useful as an intermediate for synthesizing a compound having antibacterial activity and β-lactamase inhibitory activity.

式(1)化合物は、例えば特開昭58−77861号及
び同58−121269号の明細書等に記載されている
モノバクタム系抗生物質、J、Am。
Examples of the compound of formula (1) include monobactam antibiotics, J and Am, which are described in, for example, the specifications of JP-A-58-77861 and JP-A-58-121269.

Chem、8oc、99 2352.2353(197
7)等に記載の2環性β−ラクタム化合物を製造するた
めの重要な中間体である。
Chem, 8oc, 99 2352.2353 (197
It is an important intermediate for producing the bicyclic β-lactam compound described in 7).

本発明によれば、式(1)化合物は下記の反応式に従っ
て製造される。
According to the present invention, the compound of formula (1) is produced according to the following reaction scheme.

アスノQラギン酸 (式中%R1°は水酸基の保護基を、R2′はイミノ基
の保護基を、R41dアミノ基の保護基を示し、他の記
号は前記の意味を有する) すなわち、本発明は、アス、eラギン酸のアミノ基を保
護し、次いで脱水してN−保護無水アメ)Qライン酸(
tl)となし、次いでこのものを還元して化合物1)と
なし、次いで水酸基を保護したのち、アミン基の保静基
を脱離して化合物(IV)となし、次いでこのものを閉
環して化合物凹となし、次いでこの化合物のイミノ基を
保蝕したのちオキシム化して化合物(Vl)となし、次
いでこのものを還元し、更に所望によジアミノ基を保護
し、次いで所望によシ保護基n II及び/又はR2′
を脱離して化合物(I)を製造する方法である。
Asno-Q lagging acid (in the formula, %R1° represents a hydroxyl group-protecting group, R2' represents an imino group-protecting group, R41d represents an amino group-protecting group, and the other symbols have the above-mentioned meanings), that is, the present invention protects the amino group of as, e-lagic acid, and then dehydrates to form N-protected anhydride) Q-line acid (
tl), this product is then reduced to give compound 1), the hydroxyl group is protected, the amine group is removed to give compound (IV), and this product is ring-closed to give compound (IV). Then, after preserving the imino group of this compound, it is converted into an oxime to form a compound (Vl), which is then reduced, and further the diamino group is protected as desired, and then the diamino group is protected as desired. II and/or R2'
This is a method for producing compound (I) by eliminating.

次に、本発明の前記各反応につき詳述する。Next, each of the above-mentioned reactions of the present invention will be explained in detail.

■アスノQジギン酸→ω) アス、Qラギン酸のアミ7基を医謹したのち、脱水反応
に付すと化合物(II)が得られる。アミ7基の保護基
としては、従来ペゾチド合成において常用されている公
知のものを用いることができる。これらの保設基として
は、例えばエチルオキシカルゼニル基、三級ブチルオキ
シカルボニル基、三級アミルオキシカルボニル基等のア
ルキルオキシカルボニル基ニジクロヘキシルオキシカル
ボニル基等のシクロアルキルオキシカルボニル基;o−
ニトロフェノキシカルはニル基等のアリールオキシヵル
ゼニル基:ペンシルオキシヵルボニル基、p−メトキシ
ペンシルオキシカルボニル基等のアルアルキルオキシカ
ルゼニル基;アセチル基、ゾロピオニル基等の低級アシ
ル基などが挙げられる。保護基の導入は通常の方法で行
うことができる。
(2) Asno Q digic acid → ω) Compound (II) is obtained by subjecting the amine 7 groups of as and Q lagging acid to a dehydration reaction. As the protecting group for the amine 7 group, known ones commonly used in conventional pezotide synthesis can be used. Examples of these supporting groups include alkyloxycarbonyl groups such as ethyloxycarzenyl group, tertiary butyloxycarbonyl group, and tertiary amyloxycarbonyl group; cycloalkyloxycarbonyl group such as dichlorohexyloxycarbonyl group; o-
Examples of nitrophenoxylic include aryloxycarzenyl groups such as nyl groups; aralkyloxycarzenyl groups such as pencyloxycarbonyl group and p-methoxypencyloxycarbonyl group; lower acyl groups such as acetyl group and zolopionyl group. It will be done. Introduction of a protecting group can be carried out by a conventional method.

N−保護アス、Qラギン酸の脱水反応は、溶媒中で脱水
mJ k作用させる方法を用いることが好ましい。脱水
剤としてはアセチルクロリド、チオニルクロリド、塩化
ホスホリル、無水酢酸などを用いることができる。溶媒
としては、酢酸エチル、テトラヒドロフラン、ジメチル
スルホキシドなどを利用できるが、前記の脱水剤を過剰
に用いて溶媒を兼ねさせることもできる。反応社室温乃
至200℃で数分乃至数時間で終了する。
For the dehydration reaction of N-protected as, Q lagic acid, it is preferable to use a method in which dehydration mJk is applied in a solvent. As the dehydrating agent, acetyl chloride, thionyl chloride, phosphoryl chloride, acetic anhydride, etc. can be used. As the solvent, ethyl acetate, tetrahydrofuran, dimethyl sulfoxide, etc. can be used, but the above-mentioned dehydrating agent can also be used in excess to serve as a solvent. The reaction is completed in several minutes to several hours at room temperature to 200°C.

■(It)→01) 化合物(II) k F2元すると化合物(詩が得られ
る。
■(It) → 01) Compound (II) When k F2 elements, a compound (poetry) is obtained.

還元は還元剤として水素化リチワムアルミニワム、水素
化ホワ素ナトリワム、水素化ホワ素カリワムなどの錯金
桟水素化物を用いる方法が特に好ましい。反応はエーテ
ル、テトラヒドロフラン等の溶媒中で化合物(II)に
前記還元剤を一30〜+60℃で1o分〜10時間作用
させることによシ行われる。
Particularly preferred for the reduction is a method using a complex metal hydride such as lithium aluminum hydride, sodium borohydride, potassium fluoride hydride, etc. as a reducing agent. The reaction is carried out by allowing the reducing agent to act on the compound (II) in a solvent such as ether or tetrahydrofuran at -30°C to +60°C for 1 minute to 10 hours.

■ (璽)→ (IV) 化合物(1)の水酸基を保護し、アミン基の保護基な脱
離すると化合物(mV)が得られる。水酸基の保護基と
しては、例えばt−ブチル基、N−7タルイミドメチル
基、ベンゾイルメチル基、ナフトイルメチル基、ニトロ
ベンゾイルメチル基、ペンシル基、ニトロペンシル基、
メトキシペンシル基、トリメチルシリル基、トリエチル
シリル基、t−ブチルジメチルシリル基などがあけられ
る。化合物(1)には水酸基の他にカルゼキシル基が存
在するタメ、−般に」二記の保口基で水酸基を保賎する
反応を行うと、該カルボキシル基も保簡される。従って
、両官能基が保簡されたのち、カルボキシル基の保簡基
のみを脱離させる必要がある。
■ (Seal) → (IV) Compound (mV) is obtained by protecting the hydroxyl group of compound (1) and removing the protecting group from the amine group. Examples of the hydroxyl protecting group include t-butyl group, N-7 thalimidomethyl group, benzoylmethyl group, naphthoylmethyl group, nitrobenzoylmethyl group, pencil group, nitropencyl group,
A methoxypencyl group, a trimethylsilyl group, a triethylsilyl group, a t-butyldimethylsilyl group, etc. can be used. Since the compound (1) has a carxyl group in addition to a hydroxyl group, the carboxyl group is also preserved when the reaction to preserve the hydroxyl group with the retention group described in "2" is generally carried out. Therefore, after both functional groups are bound, it is necessary to remove only the bound group of the carboxyl group.

本反応の一例を示せに以下の通りである。An example of this reaction is shown below.

(1)7ミ/基’にペンシルオキシカルボニル基(す下
2と略称する)で保賎したアスノqラギン酸を原料とし
て前記■及び■の反応によυR475i2である化合物
側)を得る。シ)化合物側)(R4=Z)にt−ブチル
ジメチルシリル/・ライドを作用サセ、カルボキシル基
及び水酸基をt−iチルジノチルシリル基(以下県+と
記す)で保欣する。、(3)アミン基を2で、カルボキ
シル基及び水酸基’ts’4+で保賎した化合物(1)
に弱酸(例えば希塩酸)又は弱塩基(例えは希水酸化ナ
トリウム水浴液)を作用させてカルボキシル基の保護基
を脱離させる。アミン基と水酸基を2及び81+で保磁
した化合物1)を接触還元に付し、アミノ基の保独基2
を脱離する。
(1) Using asno-qlaginic acid in which the 7 groups are bound with a pencyloxycarbonyl group (abbreviated as 2) as a raw material, a compound (υR475i2) is obtained by the reactions of (1) and (2) above. C) Compound side) (R4=Z) is treated with t-butyldimethylsilyl/-ride, and the carboxyl group and hydroxyl group are protected by a t-i tyldinotylsilyl group (hereinafter referred to as ken+). , (3) Compound (1) in which the amine group is supported by 2 and the carboxyl group and the hydroxyl group 'ts'4+
A weak acid (for example, dilute hydrochloric acid) or a weak base (for example, a dilute sodium hydroxide water bath) is applied to remove the protecting group of the carboxyl group. Compound 1) in which the amine group and the hydroxyl group are coercive with 2 and 81+ is subjected to catalytic reduction to form the coercive group 2 of the amino group.
to detach.

■(iV)→(y> 化合物(ff)を閉狽すると化合物(■が侍られる。反
応は、溶媒中で化合物(1v)のカルボキシル基を油性
化する化合物、触媒等の存在下に行うことが好ましい。
■(iV) → (y> When compound (ff) is closed, compound (■) is present.The reaction should be carried out in a solvent in the presence of a compound, catalyst, etc. that converts the carboxyl group of compound (1v) into an oily substance. is preferred.

カルボキシル基を活性化する化合物としては、酸ノ・ラ
イド、成熱水物、活性アミド、活性エステル、活性チオ
エステル等を形成する化合物の(nJれも使用できるが
、ジピリジルジスルフィド等のチオエステルを形成する
化合物の使用が特に好ましい。触媒としては、トリフェ
ニルホスフィン。
Compounds that activate carboxyl groups include compounds that form acids, hydrothermal hydrates, active amides, active esters, active thioesters, etc. (Although compounds that form thioesters such as dipyridyl disulfide can also be used) Particular preference is given to using compounds such as triphenylphosphine as catalyst.

トリノルマルブチルホスフィン、トリフェニルホスファ
イト等な使用できる。溶媒としてハ、ベンゼン、トルエ
ン、n−ヘキサン等の炭化水素類;クロロホルム、塩化
メチレン等のハロゲン化炭化水素類;エーテル、テトラ
ヒドロフラン、ジオキサン等の工゛−チル類)他アセト
ニトリへ、ゾメチルホルムアミド、ジメチルスルホキサ
イドなどを単独又は組み合せて利用できる。反応は、0
〜150’Cで数分〜数十時間で進行する。
Tri-n-butylphosphine, triphenylphosphite, etc. can be used. As a solvent, hydrocarbons such as benzene, toluene and n-hexane; halogenated hydrocarbons such as chloroform and methylene chloride; ethyl compounds such as ether, tetrahydrofuran and dioxane; and acetonitrile, zomethylformamide, Dimethyl sulfoxide and the like can be used alone or in combination. The reaction is 0
It progresses in several minutes to several tens of hours at ~150'C.

■凹〜(Vl) 化合物(V)の1位イミノ基を保香したのちオキシム化
すると化合物(vI)が得られる。イミノ基の保護基と
しては、前記の保静基、汐すえば2基等のアシル基の利
用も可能であるが、この保護基は次工程で行われる接触
還元反応に於いて脱離されるので、目的物(1)中R2
が水素原子以外のもの金望む場合には接触還元反応で脱
離しない保謂基、例えばトリアルキルシリル基の使用が
好ましい。保B基の導入は通常の方法で行われる。
(2) Concave (Vl) Compound (vI) is obtained by preserving the imino group at the 1-position of compound (V) and then converting it into an oxime. As a protecting group for the imino group, it is also possible to use the above-mentioned holding group or acyl group such as Ushioba 2, but since this protecting group is removed in the catalytic reduction reaction carried out in the next step, , R2 in object (1)
When a metal other than a hydrogen atom is desired, it is preferable to use a protective group that does not leave off in a catalytic reduction reaction, such as a trialkylsilyl group. Introduction of the B-retaining group is carried out by a conventional method.

化合物(ト)のオキシム化は、YJllえばラクタム環
の第3付合活性化(アニオンを形成)させたのち亜硝酸
化合物を作用させることによって行うことができる。第
3位の活性化け、例えば低温下にリチワムジイソグロビ
ルアミドのような有機強塩基を作用させることにより行
われる。亜硝酸化合物としては、亜硝酸の炭素数1〜6
の低級アルキルエステルなどを用いることができる。活
性化とオキ′シム化は同一反応系で行うことができ、例
えに、窒素、アルゴン等の不活性ガス雰囲気下で一20
0護したもの)とリチウムジイソゾロビルアミドを数分
〜数時間反応させ、次いで例えば、亜硝酸アミルエステ
ルを加え数分〜数時間反応させることにより目的物が生
地する。この反応は溶媒中で行われ、溶媒としては前記
■の反応で例示したものを使用することができる。本反
応によると、2種の異性体(シン型及びアンチ型)が得
られるが、これらは例えはシリカゲルクロマトグラフィ
ーにより容易に分離することができる。しかしながら、
次の工程の原料とするに際しては、これらを分離せずに
混合物のまま用いても、目的物(1)の立体配位には影
響を与えない。
The oxime formation of compound (g) can be carried out by activating the third bond of the lactam ring (forming an anion) and then reacting with a nitrite compound. Activation of the 3rd position is carried out, for example, by the action of a strong organic base such as lithium diisoglobilamide at low temperature. As a nitrous acid compound, nitrite has 1 to 6 carbon atoms.
Lower alkyl esters of , etc. can be used. Activation and oximation can be carried out in the same reaction system, for example, under an inert gas atmosphere such as nitrogen or argon.
The desired product is prepared by reacting the lithium diisozorobylamide with lithium diisozorobylamide for several minutes to several hours, and then adding, for example, amyl nitrite and allowing the reaction to occur for several minutes to several hours. This reaction is carried out in a solvent, and as the solvent, those exemplified in the reaction (2) above can be used. According to this reaction, two types of isomers (syn type and anti type) are obtained, but these can be easily separated by, for example, silica gel chromatography. however,
When used as a raw material for the next step, even if these are used as a mixture without separation, the steric coordination of the target product (1) will not be affected.

■(Vl) −(11 化合物(vl)を接触還元すると化合物(1)が得られ
る。このとき使用される触妹としては、例えばノQ2ゾ
ウム、酸化、Qラジウム、ノqラゾウム黒、白金、酸化
白金、ニッケル、酸化ニッケル、ラネーニッケル、ロジ
ウム、ルテニウムなどが羊げられる。溶媒、!−してt
i例えばメタノール、エタノール、プロ、Qノール等の
アルコール類、酢酸エチルなどを使用することができる
。反応は常圧もしくは加圧下、−30−Zo。
■(Vl) -(11 Compound (1) is obtained by catalytic reduction of compound (vl). Examples of catalysts used at this time include NoQ2zoum, oxide, Q radium, Noqlazoum black, platinum, Examples include platinum oxide, nickel, nickel oxide, Raney nickel, rhodium, ruthenium, etc.Solvent, !-t
For example, alcohols such as methanol, ethanol, pro, Q-nol, ethyl acetate, etc. can be used. The reaction is carried out under normal pressure or increased pressure, -30-Zo.

℃で1〜20時間水素添加することにょシ終了する。こ
のとき化合物(vl) の第3位オキシムに°関する異性体の割合の如何によら
ず、生成する化合物(1)の3,4位間シス−トランス
異性体の割合は約7:1であシ、これらは例えば、シリ
カゲルクロマドグ5フイーで容易に分離することができ
る。
Hydrogenation is completed at 1 to 20 hours at ℃. At this time, regardless of the ratio of isomers regarding the 3-position oxime of compound (vl), the ratio of cis-trans isomers between the 3- and 4-positions of compound (1) to be produced is approximately 7:1. These can be easily separated using, for example, silica gel Chromadog 5F.

上記反応によって(R1〜H,R1−4IN。By the above reaction (R1-H, R1-4IN.

R,= II )である化合物(1)が得られるが、更
に所望によシ、3位アミノ基の保磁又は1位イミ7基及
び4位側鎖水酸基の脱保論を常法によって行うことがで
きる。
Compound (1) with R, = II) is obtained, and if desired, coercion of the amino group at the 3-position or removal of the imide group at the 1-position and the side chain hydroxyl group at the 4-position is carried out by a conventional method. be able to.

本発明の目的化合物(D中、下記式の(38゜4s)化
合物は生物活性を有する化合物を製造するために特に重
要な中間体であり、本発明によれば、原料化合物として
、容易に入手可能なL−アスノqラギン酸を用いること
によシ、立体特異的に(4B)である化合物凹を経て、
(3s、4s)である化合物(I) t−工業的有利に
製造できる。
The target compound of the present invention (in D, the compound (38°4s) of the following formula is a particularly important intermediate for producing biologically active compounds, and according to the present invention, it can be easily obtained as a raw material compound. By using L-asnoqlagic acid, the compound stereospecifically (4B) can be prepared by
Compound (I) t- (3s, 4s) can be produced industrially with advantage.

!−アス/Qラギ/Ii! (V) (4B)(式中、
各符号は前記した意味を有する)次に実施例を挙けて説
明する。
! -Asu/Q Lagi/Ii! (V) (4B) (wherein,
(Each symbol has the meaning described above) Next, an explanation will be given with reference to an example.

実施例1 N−ベンジルオキシカルボニル−L−アスノQ2ギン酸
の製造: L−アスノQラギン酸26.6f及び酸化マグネシワム
29. Ofを水300dK懸濁させ、水冷、攪拌下に
ペンゾルオキシカルゼニルクロリド40.91を加えて
室温で一夜攪拌し九。
Example 1 Preparation of N-benzyloxycarbonyl-L-asnoQ2 gic acid: L-asnoQ laginic acid 26.6f and magnesium oxide 29. Of was suspended in water at 300 dK, and while cooling with water and stirring, 40.91 g of penzoloxycarzenyl chloride was added, and the mixture was stirred overnight at room temperature.

反応液よシネ溶物を炉去し、v液を濃塩酸で酸性にした
のち、酢酸エチルで抽出した。抽出液を飽和食塩水で洗
浄したのち、乾燥し、溶媒を留去した。残渣をエーテル
−ヘキサンよシ結晶化すると、融点115〜120℃の
目的物50.1F(収率94%)が得られた。
The cine solution was removed from the reaction solution, and the solution was made acidic with concentrated hydrochloric acid, and then extracted with ethyl acetate. The extract was washed with saturated brine, dried, and the solvent was distilled off. The residue was crystallized from ether-hexane to obtain the desired product 50.1F (yield 94%) with a melting point of 115-120°C.

3340.3400〜2500.1710〜1690゜
1275.1195.1065 実MAM2 N−ベンシルオキシカルボニル−L−無水アスノqラギ
ン酸の製造; 実施例1で得られたN−保護アミノ酸5.89Fを酢酸
エチル3511jに懸濁させ、チオニルクロリド161
1tを滴下し、1時間攪拌した。反応液より溶媒を留去
し、残渣をエーテル−石油エーテルよシ再結晶すると、
融点108〜1111::の目的物5.1 Of (収
率93−)が得られた。
3340.3400-2500.1710-1690゜1275.1195.1065 Real MAM2 Production of N-bensyloxycarbonyl-L-asnoqlagic anhydride; Suspended in ethyl 3511j, thionyl chloride 161
1 t was added dropwise and stirred for 1 hour. The solvent was distilled off from the reaction solution, and the residue was recrystallized from ether-petroleum ether.
The desired product 5.1 Of (yield 93-) was obtained with a melting point of 108-1111::.

比旋光度;〔α) −41,9°(c 1.08 、酢
酸)実施PII3 (3B)−3−ペンシルオキシカルボニルアミノ−4−
ヒドロキシ酪酸の製造: 水素化ホワ素ナトリヮム75.6Qt−テトラヒドロ7
ラン0.4−に−懸濁させ、水冷下に実施M2で得られ
た酸無水物49゜8 Qをテトラヒドロ7ラン1.61
に溶解した液を滴下し、室温で1時間攪拌した。反応液
に2Nの塩酸を加えてpHlとし、次いで飽和食塩水を
加え、酢酸エチルで抽出した。抽出液を飽和食塩水で洗
浄し、乾燥後、溶媒を留去した。残渣’ttfl化メチ
レンで結晶化すると融点109〜110℃の目的物27
0叩(収率53−)が得られた。
Specific optical rotation; [α) -41,9° (c 1.08 , acetic acid) Implementation PII3 (3B)-3-pencyloxycarbonylamino-4-
Production of hydroxybutyric acid: Sodium borohydride 75.6Qt-tetrahydro7
The acid anhydride obtained in Run M2 (49°8
A solution dissolved in was added dropwise to the mixture, and the mixture was stirred at room temperature for 1 hour. 2N hydrochloric acid was added to the reaction solution to adjust the pH to l, then saturated brine was added, and the mixture was extracted with ethyl acetate. The extract was washed with saturated brine, dried, and then the solvent was distilled off. When the residue is crystallized with methylene chloride, the desired product 27 with a melting point of 109-110°C is obtained.
0 hits (yield 53-) was obtained.

比旋光度: 〔α) −10,6°(C1,メタノール
)実施例4 (3B)−3−アミノ−4−t−ブチルジメチルシリル
オキシ酪酸の製造: 実施例3で得られ九N−保薩ヒドロキシ酸5068F!
及びt−ブチルゾメチルクロルシラン725哩をジメチ
ルホルムアミド81に溶解し、水冷下にイミダゾール6
8189を加え、室温で一夜攪拌した。反F5液を氷冷
してエーテルを加えたのち、冷IN−塩酸、氷水及び飽
和食塩水で洗浄し、乾燥後に溶媒を留去した。
Specific optical rotation: [α) -10,6° (C1, methanol) Example 4 (3B) Production of -3-amino-4-t-butyldimethylsilyloxybutyric acid: Satsuma Hydroxy Acid 5068F!
and 725 kg of t-butylzomethylchlorosilane were dissolved in 81 kg of dimethylformamide, and 61 kg of imidazole was dissolved under cooling with water.
8189 was added and stirred at room temperature overnight. After ice-cooling the anti-F5 solution and adding ether, it was washed with cold IN-hydrochloric acid, ice water, and saturated brine, and after drying, the solvent was distilled off.

残渣なテトラヒドロ7ラン18mAに溶解し、水冷下0
.51iの塩酸2−を加え、25分間攪拌した。反応液
に氷水を加え、酢酸エチルで抽出し、抽出液を水及び飽
和食塩水で洗浄したのち、乾燥して溶媒を留去した。残
渣をシリカゲルのカラムに付し、酢酸エチルで溶出して
溶媒を留去した。
The residual tetrahydro7ran was dissolved in 18 mA and cooled under water cooling.
.. 51i of hydrochloric acid 2- was added and stirred for 25 minutes. Ice water was added to the reaction solution, extracted with ethyl acetate, and the extract was washed with water and saturated brine, dried, and the solvent was distilled off. The residue was applied to a silica gel column, eluted with ethyl acetate, and the solvent was distilled off.

残渣をメタノールl0IIIAに溶解し、5qbの、e
ラゾワムー炭素80#を加え、3〜15℃で1時間、常
温で1時間常圧下で水素添加した。以下、常法によシ分
離、精製すると、目的物466η(略定量的)が得られ
た。
The residue was dissolved in methanol 10IIIA and 5 qb of e
Lazoimu Carbon 80# was added and hydrogenated at 3 to 15°C for 1 hour and at room temperature for 1 hour under normal pressure. Thereafter, the product was separated and purified by a conventional method, and the target product 466η (substantially quantitative) was obtained.

比旋光度;〔α)D−13,6° (C1,メタノール
)実施fl15 (4B)−4−((t−プテルゾ゛メチルシリル)オキ
シメチル〕−アゼチゾンー2−オンの製造: 実施例4で得られた〇−保論化合物1871g及びゾビ
リゾルゾスルフイド212薦gをアセトニトリル361
に懸濁させ、80℃に加熱してトリフェニルホスフィン
252■のアセトニトリル36−溶液を滴下し、2.5
時間攪拌した。反応液よシ溶媒管留去し、残渣tシリカ
グルカ〉ムクロマトグラフイーによって分離精製すると
目的物g s、 s my (収率56%)が得られ良
Specific optical rotation; [α) D-13,6° (C1, methanol) Example fl15 (4B) Production of -4-((t-pterzomethylsilyl)oxymethyl]-azetizon-2-one: Obtained in Example 4 1871 g of the 〇-bond compound and 212 g of zobilisolzosulfide were mixed with 361 g of acetonitrile.
The suspension was heated to 80°C, and a solution of 252 μm of triphenylphosphine in 36 μm of acetonitrile was added dropwise.
Stir for hours. The solvent was distilled off from the reaction solution using a tube, and the residue was separated and purified by chromatography on silica gluca to give the desired product g s, s my (yield 56%).

比旋光度:〔α)、+31.2°(C1,クロロホルム
)実施例6 (4B)−1−(t−グチルゾメテルシリル)−4−[
(t−グチルゾメチルシリル)オキシメチル〕−アゼチ
ゾンー2−オンの製造:実施ガ5で得られたアゼチジン
化合物 66019及びトリエチルアミ?10.512111j
をジメチルホルムアミド51に溶解し、水冷下に、アル
ゴン雰囲気下でt−グチルゾメチルク四ルシラン556
叩を加え、水冷下で10分、室温で一夜攪拌した。反応
液を氷水に注加し、エーテルで抽出した。抽出液を飽和
食塩水で洗浄し、乾燥後、減圧下で濃縮した。
Specific optical rotation: [α), +31.2° (C1, chloroform) Example 6 (4B)-1-(t-gylzomethylsilyl)-4-[
Production of (t-gylzomethylsilyl)oxymethyl]-azetizone-2-one: azetidine compound 66019 obtained in Example 5 and triethylamine? 10.512111j
was dissolved in dimethylformamide 51, and t-glyzomethylctetrasilane 556 was dissolved in dimethylformamide 51 and cooled with water under an argon atmosphere.
The mixture was stirred for 10 minutes under water cooling and overnight at room temperature. The reaction solution was poured into ice water and extracted with ether. The extract was washed with saturated brine, dried, and concentrated under reduced pressure.

残渣をシリカゲルカラムクロマトグラフィー〔溶媒:エ
ーテル−n−へキサン(1:2)]で精製すると、無色
油状物として目的物1.0f(収率99%)が得られた
The residue was purified by silica gel column chromatography [solvent: ether-n-hexane (1:2)] to obtain the desired product 1.0f (yield 99%) as a colorless oil.

2凰、S 比旋光度:〔α) −29,4°(c 1.11 、り
aaホルム) 2950.2880,1730.1465NMR値:δ
0DOh e pp” 0.07(11= 6H)to、23(s、3H)0.
24(s 、3H)、0.90(s 、9H)0.96
(El#911)。
2 凰, S Specific optical rotation: [α) -29.4° (c 1.11, aa form) 2950.2880, 1730.1465 NMR value: δ
0DOh e pp” 0.07 (11=6H)to, 23(s, 3H)0.
24 (s, 3H), 0.90 (s, 9H) 0.96
(El#911).

2.75 (ad、J=1&4 e 2.5Hz、IH
)3.07(dd、J=15.4,4.8Bg、IH)
3.5 o〜a、so (m 、 3B )マススペク
トル値;m/θ 329(M )、314.272 夾施9117 (4El)−1−(t−プテルゾメチルシリル−4−(
(t−グチルゾメチルシリル)オキシメチルツー3−ヒ
ドロキシイミノーアゼチゾン−2−オンの製造: リチワムゾインfOビルアミド71.2myQテトラヒ
ドロフラン1.4ml溶液に、実施例6で得られたゾシ
リル化合物76.6149のテトラヒト07ラン9.4
7N溶液を滴下し、−70℃で15分間、−50℃で1
0分間攪拌した反応液會再び一70℃に冷却し、亜硝酸
1ソアミルエステル0.089JIJ4加えチー70t
l:で1時間攪拌した。反応液に酢酸0.106 Nt
を加えたのち、室温に戻し、反応液を酢酸エチルと飽和
食埠水の混液に圧加し、有機層を分取した。この有機層
を飽和食塩水で洗浄し、乾燥後、減圧下で濃縮した。残
渣をシリカグルゾレノQラテイプ薄層クロマトグラフィ
ー〔溶媒:エーテル−〇−へキサン(1:1))で精製
すると、無色油状物の目的物(A) 40.3■及び(
B) 12.1即が得られた。
2.75 (ad, J=1&4 e 2.5Hz, IH
) 3.07 (dd, J=15.4, 4.8Bg, IH)
3.5 o~a, so (m, 3B) Mass spectrum value; m/θ 329 (M), 314.272 9117 (4El)-1-(t-pterzomethylsilyl-4-(
Production of (t-gylzomethylsilyl)oxymethyl-3-hydroxyiminoazethizon-2-one: To a 1.4 ml solution of lithiumzoin fO biramide 71.2 myQ tetrahydrofuran was added the zosilyl compound 76.6149 obtained in Example 6. Tetrahit 07 run 9.4
7N solution was added dropwise at -70°C for 15 minutes and at -50°C for 1 hour.
The reaction mixture was stirred for 0 minutes, then cooled again to -70°C, and 0.089JIJ4 of nitrous acid 1-soamyl ester was added to the mixture, and 70t of chi was added.
The mixture was stirred for 1 hour at Add 0.106 Nt of acetic acid to the reaction solution.
was added, the mixture was returned to room temperature, the reaction solution was pressurized to a mixture of ethyl acetate and saturated sodium chloride water, and the organic layer was separated. This organic layer was washed with saturated brine, dried, and concentrated under reduced pressure. The residue was purified by silica Glusoleno Q Latepe thin layer chromatography [solvent: ether-〇-hexane (1:1)] to yield the desired product (A) as a colorless oil, 40.3■ and (
B) 12.1 was obtained.

に))の性状 薄層クロマトグラフィー〔シリカゲル、エーテル−D−
ヘキサン (1:1)) Rf=0.38 比旋光度 ; 〔α)、+32.9°(cl、94.ク
ロロホルム)工R値ニジ0HOj。
) Properties of thin layer chromatography [silica gel, ether-D-
Hexane (1:1)) Rf = 0.38 Specific rotation: [α), +32.9° (cl, 94.chloroform) R value: 0HOj.

wax 、副−1 338012950,2850,1750,14601
1MR値:δ0DOIs # PPm0.07(s、6
H)yO,30(e、6H)。
wax, sub-1 338012950, 2850, 1750, 14601
1MR value: δ0DOIs # PPm0.07(s, 6
H)yO,30(e,6H).

1−88(s、9H) 、1.99(s e 9H)+
3.92(da −J=11.3.3.OH5g 、I
H)4.04(ddtJ=IL3t3.5Hm、IH)
4.42((id、J=3.5.3.0H,IH)9.
64(br、s、IH) マススペクトル値: m/e 341.305 (B)の性状 薄層クロマトグラフィー〔シリカゲル、エーテル−n−
ヘキサン(1: 1)) Rf=0.26 ルム) 3390.2940.2860.1750 。
1-88 (s, 9H), 1.99 (s e 9H) +
3.92 (da - J = 11.3.3.OH5g, I
H) 4.04 (ddtJ=IL3t3.5Hm, IH)
4.42 ((id, J=3.5.3.0H, IH)9.
64 (br, s, IH) Mass spectrum value: m/e 341.305 Properties of (B) Thin layer chromatography [silica gel, ether-n-
Hexane (1:1)) Rf=0.26 lum) 3390.2940.2860.1750.

465 NMR値:δ0DOIs 、I’Pm 0.07(8,6FI)、0.32(8#6H)。465 NMR value: δ0DOIs, I’Pm 0.07 (8,6FI), 0.32 (8#6H).

1.88(e 、9B、)、1.98(e、9H)=3
、86 (d = J =3.5 Hw e 2 H)
4.22 (t 、 J=3.5Hz 、 I H)8
.80(br、s、lH) マススペクトル値: m / @ 341.305 実施例8 (3R及びB、4B)−3−アミノ−1−(t−グチル
ゾメチルシリル)−4−[(を−グチルゾメテルシリル
)オキシメチルツーアゼチジン−2−オンの製造: 実施例7で得られたオキシム化合物(AとBの混合物)
94111Fl酢酸エチル1.01に溶解し、酸化白金
30IIgを加え、水素雰囲気下、室温で7時間攪拌し
た。反応液をセライトで濾過し、p液を減圧下で濃縮し
た。残液管シリカグルゾレノ9ラティプ薄層クロマトグ
ラフィー〔溶媒:エーテル−n−ヘキサン(4:1)〕
で精製すると無色油状物として(3B)−アミノ化合物
65.4 N及び(3R)−アミノ化合物9.0■が得
られた。
1.88(e, 9B,), 1.98(e, 9H)=3
, 86 (d = J = 3.5 Hw e 2 H)
4.22 (t, J=3.5Hz, IH)8
.. 80 (br, s, lH) Mass spectrum value: m / @ 341.305 Example 8 (3R and B, 4B)-3-amino-1-(t-glyzomethylsilyl)-4-[(a- Production of oxymethyltoazetidin-2-one: oxime compound obtained in Example 7 (mixture of A and B)
94111Fl was dissolved in 1.01 ml of ethyl acetate, 30 II g of platinum oxide was added thereto, and the mixture was stirred at room temperature under a hydrogen atmosphere for 7 hours. The reaction solution was filtered through Celite, and the p solution was concentrated under reduced pressure. Residual tube silica glutoleno 9 latip thin layer chromatography [solvent: ether-n-hexane (4:1)]
After purification, 65.4 N of the (3B)-amino compound and 9.0 of the (3R)-amino compound were obtained as colorless oils.

(3B)−アミノ化合物(シス体)の性状薄層り四マド
グラブイー(シリカゲル、エーテル)Rf=0.56 比旋光度:〔α)D−26,5°((!0.93.りa
ロホルム) 3420.2950.2870,1735゜47O NMR値:δ0DOI@、ppm 0.11(日、611 ) + 0.19 (8e 3
 H) eo、29(et3EI)、0.91(II1
9H)。
Properties of (3B)-amino compound (cis form)
Roform) 3420.2950.2870,1735°47O NMR value: δ0DOI@, ppm 0.11 (day, 611) + 0.19 (8e 3
H) eo, 29 (et3EI), 0.91 (II1
9H).

0.95(B、9H)11.96(8,2H)。0.95 (B, 9H) 11.96 (8, 2H).

3゜60〜3.70(m 、IH)、3.88(rn 
、2H) 。
3゜60-3.70 (m, IH), 3.88 (rn
, 2H).

4.23(d 、、T=5.8111g 、IH)(3
R)−アミノ化合物(トランス体)の性状 薄層りq′マトグ2フィー(シリカゲル、エーテル)R
f値:0.43 比旋光度:〔α)、+6.5°((!0.99.クロa
ホルム) 3350(br、)、2950,2880,1740゜
47O NMR値: δ0DCIs −Pp” 0.07(s −6JI) 、 0.23(s e 3
H) 。
4.23(d,,T=5.8111g,IH)(3
R)-Properties of amino compound (trans form)
f value: 0.43 Specific optical rotation: [α), +6.5° ((!0.99.
holm) 3350 (br, ), 2950, 2880, 1740°47O NMR value: δ0DCIs -Pp” 0.07 (s -6JI), 0.23 (s e 3
H).

0.25(s、3H)IO,90(11e9H)−0,
96(tg * 911 ) −1−95(s −2H
) 。
0.25(s, 3H)IO, 90(11e9H)-0,
96(tg*911) -1-95(s-2H
).

3.35(dd、J=4.2.7H1,IHル3.67
(dd、J=11.3.4Hg 、11)。
3.35 (dd, J=4.2.7H1, IH le 3.67
(dd, J=11.3.4Hg, 11).

3.82(dd、J=11.3.4Hz、IH)。3.82 (dd, J=11.3.4Hz, IH).

3.95 (d 、 J =2.7 Hz 、 IH)
マススペクトル値: ym / e 329.301,287 実#例9 (as、4s)−a−ベンシルオキシカルにルアミツ−
1−(t−ジチルジメチルシリル)−4−((t−ジチ
ルジメチルシリル)オキシメチル〕−アゼチ2シン−2
−オンの製造;実施例8て得られた(3S)−アミノ化
合物9189をテトラヒトlff7ラン1.01及び水
0.5−の混液に溶解し、水冷下、炭酸水素ナトリワム
3111F及び塩化ペンシルオキシカーボネート0.0
45jIjを加え、水冷下2時間攪拌した。
3.95 (d, J = 2.7 Hz, IH)
Mass spectrum value: ym/e 329.301,287 Actual #Example 9
1-(t-dityldimethylsilyl)-4-((t-dityldimethylsilyl)oxymethyl]-azethi-2-2
-Production of (3S)-amino compound 9189 obtained in Example 8 was dissolved in a mixture of 1.01 of tetrahydrof7ran and 0.5 of water, and under water cooling, sodium bicarbonate 3111F and pencil oxycarbonate chloride were added. 0.0
45jIj was added and stirred for 2 hours under water cooling.

反応g、を酢酸エチル及び飽和食塩水の混液に汗加し、
酢酸エチル層を分取した。この有機層を飽和食塩水で洗
浄し、乾燥後、減圧下で濃縮した。残渣をシリカゲルプ
レIQラティプ薄層夕日マドグラフィー〔溶媒:エーテ
ル−n−ヘキサン(6:5))で精製すると無色油状物
として目的物126q(定量的〕が得られた。
Reaction g is added to a mixture of ethyl acetate and saturated saline,
The ethyl acetate layer was separated. This organic layer was washed with saturated brine, dried, and concentrated under reduced pressure. The residue was purified by silica gel PreIQ Latip thin layer sunset mudgraphy [solvent: ether-n-hexane (6:5)] to obtain the desired product 126q (quantitative) as a colorless oil.

比旋光度:〔α) −11,6°(cl、25.クロ。Specific optical rotation: [α) -11.6° (cl, 25. chlor.

ホルム) ■R値ニジOHOIs m&X 、cm−” 3450.1745.1?20,1515t465 11Mfl値: δCD01z 、 Pp!11O,0
8(a−6H)eO,20(s、311)。
Holm) ■R value Niji OHOIs m&X, cm-” 3450.1745.1?20,1515t465 11Mfl value: δCD01z, Pp!11O,0
8(a-6H)eO, 20(s, 311).

0.31 (s = 3H)e O,90(8,9H)
ro、96(se9H)、3.68〜3.95(m、3
B)。
0.31 (s = 3H)e O,90(8,9H)
ro, 96 (se9H), 3.68-3.95 (m, 3
B).

5.12(s 、2H)。5.12 (s, 2H).

5.22(dd 、J=10.5.5.5Hg 、lH
)。
5.22(dd, J=10.5.5.5Hg, lH
).

5.77 (d = J =10.5 Hz e I 
H) 。
5.77 (d = J = 10.5 Hz e I
H).

7.32(s、5H) マススペクトル値:m/e 478(M )、464,421 以上7.32 (s, 5H) Mass spectrum value: m/e 478 (M), 464, 421 that's all

Claims (1)

【特許請求の範囲】 1、一般式 (式中、Rloは水酸基の保護基を、R2′はイミノ基
の保護基を示す)で表わされる化合物をオキシム化して
一般式 (式中、Rlo及びR2°は前記の意味を有する)で表
わされる化合物となし、次いでこのものを還元し、更に
所望によりアミノ基音保護し、次いで所望によ)保護基
R,l及び/又はR,1を脱離することを特徴とする一
般式 (式中、R1は水素原子又は水酸基の保護基を、R2は
水素原子父はイミノ基の保護基を、R3は水素原子又は
アミノ基の保恐基を示す)で表わされる化合物の製法。 2、一般式 (式中、Rloは水酸基の保護基を、R2′はイミノ基
の保護基を示す)で表わされる化合物よシ、一般式 (式中、R1は水素原子又は水酸基の保護基を、R3は
水素原子又はイミノ基の保瞳基を、R3は水素原子又は
アミノ基の保護基を示す)で表わされる化合物を製造す
る特許請求の範囲第1項記載の方法。 3、一般式 %式% (式中、R1′は水酸基の保護基を示す)で表わされる
化合物を閉環して一般式 (式中、R,eは前記の意味を有する)で表わされる化
合物となし、次いでこの化合物のイミノ基を保護したの
ちオキシム化して一般式(式中、R1′はイミノ基の保
護基を示し、n11は前記の意味を有する)で表わされ
る化合物となし、次いでこのものを還元し、更に所望に
よジアミノ基な保賎し、次いで所望によシ保護基U1を
及び/又はU、tを脱離することを特徴とする一般式 (式中、R1は水素原子又は水酸基の保護基を、R3は
水素原子又はイミノ基の保護基を、R3は水素原子又は
アミノ基の保賎基奮示す)で表わされる化合物の製造法
。 4、 アスノQラギン酸のアミノ基を保ML、次いで脱
水してN−保護無水アスノQラギン酸となし、次いでこ
のものを還元して一般式 (式中、R4はアミノ基の保護基を示す)で表わされる
化合物となし、次いで水酸基を保護したのち、アミノ基
の保護基を脱離して一般式(式中、R1′は水酸基の保
護基を示す)で表わされる化合物となし、次いでこのも
のを閉環して一般式 (式中、RSは前記の意味を有する)で表わされる化合
物となし、次いでこの化合物のイミノ基を保画したのち
オキシム化して一般式(式中、R1はイミノ基の保護基
を示し、R’1社前記の意味な崩する)で表わされる化
合物となし、次いでこのものを還元し、更に7Jr望以
1余白 によジアミノ基を保饅し、次いで所望により保股基u、
l及び/又はn、tを脱離することを特徴とする一鼾j
式 (式中、R1は水素原子又は水酸基の保護基を、R,は
水素原子又はイミノ基の保護基を、R3は3゜ 水素原子又はアミノ基の保愚基を示す)で表わされる化
合物の製造法。 5、L−アス、Qラギン酸よシ、一般式(式中、R1’
は水酸基の保護基を、R2′はイミノ基の保護基を示す
)で表わされる化合物を経由して一般式 (式中、R1は水素原子又は水酸基の保内基を、馬は水
素原子又はイミノ基の保護基を、Rsは水素原子又はア
ミ7基の保護基を示す)で表わされる化合物を製造する
特許請求の範囲第4項記載の方法。
[Scope of Claims] 1. A compound represented by the general formula (in the formula, Rlo represents a hydroxyl group-protecting group and R2' represents an imino group-protecting group) is converted into an oxime to form a compound represented by the general formula (in the formula, Rlo and R2 ° has the above-mentioned meaning), this is then reduced, further optionally amino-protected, and then optionally) the protecting groups R,l and/or R,1 are removed. (wherein R1 represents a hydrogen atom or a hydroxyl group-protecting group, R2 represents a hydrogen atom or an imino group-protecting group, and R3 represents a hydrogen atom or an amino-protecting group) Method of making the compounds represented. 2. Compounds represented by the general formula (wherein, Rlo represents a hydroxyl group-protecting group and R2' represents an imino group-protecting group), as well as compounds represented by the general formula (wherein, R1 represents a hydrogen atom or a hydroxyl group-protecting group). , R3 represents a hydrogen atom or a protecting group for an imino group, and R3 represents a hydrogen atom or a protecting group for an amino group. 3. A compound represented by the general formula % formula % (in the formula, R1' represents a hydroxyl group protecting group) is ring-closed to form a compound represented by the general formula (in the formula, R and e have the above meanings). Next, after protecting the imino group of this compound, it is converted into an oxime to obtain a compound represented by the general formula (in the formula, R1' represents a protecting group for the imino group, and n11 has the above meaning), and then this compound (wherein R1 is a hydrogen atom or R3 represents a protecting group for a hydroxyl group, R3 represents a protecting group for a hydrogen atom or an imino group, and R3 represents a protective group for a hydrogen atom or an amino group. 4. The amino group of Asuno-Q lagging acid is protected by ML, then dehydrated to give N-protected Asuno-Q lagging anhydride, and this is then reduced to form the general formula (wherein R4 represents a protecting group for the amino group). ), then protect the hydroxyl group, remove the protecting group for the amino group to form a compound represented by the general formula (in the formula, R1' represents a protecting group for the hydroxyl group), and then this compound is ring-closed to form a compound represented by the general formula (in the formula, RS has the above-mentioned meaning), and then the imino group of this compound is retained and then converted into an oxime to form the general formula (in the formula, R1 is the imino group). This compound is then reduced, and the diamino group is further preserved in one margin of 7 Jr., and then, if desired, the compound is reduced. Base u,
A snore characterized by the elimination of l and/or n, t
A compound represented by the formula (wherein R1 represents a hydrogen atom or a hydroxyl group protecting group, R represents a hydrogen atom or an imino group protective group, and R3 represents a 3° hydrogen atom or an amino group protecting group) Manufacturing method. 5, L-as, Q lagic acid, general formula (in the formula, R1'
represents a hydroxyl group-protecting group, and R2' represents an imino group-protecting group. 5. The method according to claim 4, for producing a compound represented by the following formula (Rs represents a hydrogen atom or a protecting group for an amine 7 group).
JP58215647A 1983-11-16 1983-11-16 Preparation of beta-lactam compound Pending JPS60109561A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58215647A JPS60109561A (en) 1983-11-16 1983-11-16 Preparation of beta-lactam compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58215647A JPS60109561A (en) 1983-11-16 1983-11-16 Preparation of beta-lactam compound

Publications (1)

Publication Number Publication Date
JPS60109561A true JPS60109561A (en) 1985-06-15

Family

ID=16675864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58215647A Pending JPS60109561A (en) 1983-11-16 1983-11-16 Preparation of beta-lactam compound

Country Status (1)

Country Link
JP (1) JPS60109561A (en)

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