JPS60106532A - Regeneration of adsorbent for boron trichloride - Google Patents

Regeneration of adsorbent for boron trichloride

Info

Publication number
JPS60106532A
JPS60106532A JP21490083A JP21490083A JPS60106532A JP S60106532 A JPS60106532 A JP S60106532A JP 21490083 A JP21490083 A JP 21490083A JP 21490083 A JP21490083 A JP 21490083A JP S60106532 A JPS60106532 A JP S60106532A
Authority
JP
Japan
Prior art keywords
active carbon
bcl3
activated carbon
impurities
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21490083A
Other languages
Japanese (ja)
Other versions
JPH0353017B2 (en
Inventor
Takahiro Murayama
村山 敬博
Tadami Sugimoto
杉本 忠身
Yoshiro Suzuki
鈴木 与四郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP21490083A priority Critical patent/JPS60106532A/en
Publication of JPS60106532A publication Critical patent/JPS60106532A/en
Publication of JPH0353017B2 publication Critical patent/JPH0353017B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To regenerate used active carbon and to recover simultaneously adsorbed BCl3 with almost same amt. of impurity as BC3 used in the starting stage by heating the active carbon in the first stage to recover gas consisting essentially of BCl3 and then heating said active carbon at higher specified temp. in the second stage to regenerate the active carbon. CONSTITUTION:For the regeneration of active carbon used for removal of Si compd., phosgen, and chlorinated hydrocarbons contained in BCl3 gas, the active carbon is first heated at 40-120 deg.C, and the gas consisting essentially of BCl3 eliminated from said active carbon is recovered, then the active carbon is heated at 200-700 deg.C. By this method, the active carbon is regenerated, and major portion of adsorbed BCl3 is recovered as BCl3 having almost same degree of the content of impurities as high as the BCl3 used in the starting stage. The regenerated active carbon is not deteriorated and is usable repeatedly. Therefore, the consumption of raw materials and adsorbent per unit weight of final product are remarkably reduced. The process contributes to cost reduction of purified BCl3.

Description

【発明の詳細な説明】 本発明は塩化ホウ素中の不純物を吸着除去するのに用い
た活性炭を再生するとともに吸着した三塩化ホウ素を回
収する吸着剤の再生法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an adsorbent regeneration method for regenerating activated carbon used to adsorb and remove impurities in boron chloride and recovering adsorbed boron trichloride.

三塩化ホウ素(acza)は、陽イオン重合触媒等とし
て確立された用途を有しているが、さらに近年、集積回
路の微細化の要求の高まるにつれて、半導体素子の配線
として用いられるアルミニウムのドライエツチングにお
ける塩素の供給源として用途が急速lこのびている。
Boron trichloride (acza) has established uses as a cationic polymerization catalyst, but in recent years, as the demand for miniaturization of integrated circuits has increased, it has been used for dry etching of aluminum used as wiring for semiconductor devices. Its use as a source of chlorine in the world is rapidly increasing.

Bcll、は酸化ホウ素(B*Oa)をC1*、アルカ
リ金属の塩化物または四塩化けい素(8iCJ+)等に
よって塩素化する等公知の方法でつくられるが、生成さ
れた粗BCJa中には、N、% o、 、ホスゲン(C
’OC11)、ハロゲン化炭化水素(以下TOOという
)、8i化合物、各種金属が含有されており、BOA!
、をアルミニウムのドライエツチング等に使用するには
、上記不純物中、各種金属、C0CJffi、Si化合
物、TOCをtppm以下まで除去するのが望ましい。
Bcll is produced by a known method such as chlorinating boron oxide (B*Oa) with C1*, alkali metal chloride, silicon tetrachloride (8iCJ+), etc., but in the produced crude BCJa, N, % o, , phosgene (C
'OC11), halogenated hydrocarbons (hereinafter referred to as TOO), 8i compounds, various metals, and BOA!
, for dry etching of aluminum, etc., it is desirable to remove various metals, COCJffi, Si compounds, and TOC from among the impurities to tppm or less.

各塊金属は単に粗BCノ、をガス化することによって大
手は除去出来るがCUC/m、Si化合物、TOCをl
ppm以下とすることは困難である。従来の精製方法は
、高純度を必要とするドライエラチン用BC1,を対象
としないもの、或いは高純度まで精製可能であっても操
作が繁雑で収率が低く実用的でないもの等で、それぞれ
致命的な欠点があった。
Each lump metal can be removed by simply gasifying crude BC, but CUC/m, Si compounds, TOC, etc.
It is difficult to reduce the amount to less than ppm. Conventional purification methods do not target BC1 for dry elatin, which requires high purity, or are impractical due to complicated operations and low yields even if they can be purified to high purity. There was a drawback.

本発明者は、上記問題を解決すべく一1究を東ね、先に
粗B(J、(例えば液相分析値でSi成分(Siとして
) : 1901)l)In、 COCl1: 240
ppln%TOC:130.ppm 程度含有するBC
Im’)を気化させたB C11sガスを活性炭と接触
させ、高純度のBClaを留出させる方法を提案した。
In order to solve the above-mentioned problem, the present inventor conducted 11 investigations and first determined crude B(J, (for example, Si component (as Si) in liquid phase analysis value: 1901) l) In, COCl1: 240
ppln%TOC: 130. BC containing about ppm
We proposed a method for distilling high-purity BCla by contacting activated carbon with BCl1s gas, which is the vaporized BClIm').

この方法は、第1図番と示すように気化、したBClm
が活性炭に飽和吸着(初期吸着)されて留出し始めても
、不純物は活性炭に吸着されており、上記留出B C4
,に含まれないことを利用したもので、図中■、■で示
すSi成分、COCl2等(■:3i成分は、粗BCI
sを気化する際、相当部分が気化されずに残るが、それ
にもかかわらず最初に破過し、不純物破過の指標となり
、TOCはCOCl1よりさらに遅れて破過する)の不
純物が破過する前の高純度の留出BC1,を捕集する精
製法である。すなわち、不純物が活性炭層を破過する前
に、気化したBClsの送給を停止し、活性炭を再生し
て反覆使用する必要がある。
This method uses vaporized BClm as shown in Figure 1.
Even if the impurities are saturated adsorbed (initial adsorption) on the activated carbon and begin to distill, the impurities are still adsorbed on the activated carbon, and the above distillate B C4
, the Si component, COCl2, etc. (■: 3i component is shown as
When s is vaporized, a considerable portion remains unvaporized, but it nevertheless breaks through first and becomes an indicator of impurity breakthrough, and impurities (TOC breaks through even later than COCl1) break through. This is a purification method that collects the previous high-purity distillate BC1. That is, it is necessary to stop feeding the vaporized BCls and regenerate the activated carbon for repeated use before impurities penetrate the activated carbon layer.

ところで、上記初期吸着においては、BCl、が活性炭
重量の約1/2量吸着されるため、高価なりCJsを活
性炭の再生時に放出してしまうことは経済上の損失が極
めて大きい。また、再生によって回収したBCla中の
不純物の量が、精製原料である粗ucl、中の不純物濃
度に比してあまり高いと、回収B’(J、を上記精製法
の原料として使用することは、絹製効率を急速に低下さ
せる不都合を生ずる。
By the way, in the above-mentioned initial adsorption, BCl is adsorbed in an amount of about 1/2 of the weight of the activated carbon, so releasing expensive CJs during the regeneration of the activated carbon is an extremely large economic loss. In addition, if the amount of impurities in BCl recovered by regeneration is too high compared to the impurity concentration in crude UCL, which is the raw material for purification, it is not possible to use the recovered B'(J) as a raw material for the above purification method. , resulting in disadvantages that rapidly reduce the silk-making efficiency.

本発明は上記の事情に鑑み、活性炭を再生するとともに
、吸着しているBCl、の大部分を、不純物の含有験が
粗B C1,と同程度のB (J、として回収する方法
を提供することを目的とするもので、その要旨は、三塩
化ホウ素ガス中のけい素化合物、ホスゲン及び塩素化炭
化水素を吸着除去するために用いた活性炭を再生するに
際して、まず該活性炭を40〜120℃に加熱し、該活
性炭から脱離した三塩化ホウ素を主成分とするガスを回
収し、つぎに前記活性炭を200〜700℃に加熱する
三塩化ホウ素吸着剤の再生法にある。
In view of the above circumstances, the present invention provides a method for regenerating activated carbon and recovering most of the adsorbed BCl as B(J), which has the same impurity content as crude BCl. The purpose is to regenerate activated carbon used to adsorb and remove silicon compounds, phosgene, and chlorinated hydrocarbons in boron trichloride gas. The present invention provides a method for regenerating a boron trichloride adsorbent, which comprises heating the activated carbon to a temperature of 200 to 700°C, recovering the gas mainly composed of boron trichloride desorbed from the activated carbon, and then heating the activated carbon to a temperature of 200 to 700°C.

以下本発明の詳細な説明する。The present invention will be explained in detail below.

本発明の方法は、上記B CJl、の精製に使用して、
BCJsおよび各種不純物を吸着している活性炭を、比
較的低い温度の第1段処理および烏温の第2段処理する
ものである。
The method of the present invention is used to purify the above B CJl,
Activated carbon that has adsorbed BCJs and various impurities is subjected to a first stage treatment at a relatively low temperature and a second stage treatment at a relatively low temperature.

@1段処理においては、活性炭を40〜120℃好まし
くは80〜100℃に保持し、小量の不活性ガス(例え
ばNl )を流し、吸着しているBCl、を脱離させる
。この際、BCAsが慶先して放出され、精製における
除去対象物であ−るSi化合物、c o cl、、TO
Cは一部しか脱離せず、回収したBCl、は、粗BCJ
、と同程蔵の不純物を含有したものとなり、そのまま、
精製原料として使用出来る。この第1段処理によつ゛C
回収されるBCI、は、吸着時に活性炭に吸着されたB
 C1sの約80係である。
In the @1-stage treatment, activated carbon is maintained at a temperature of 40 to 120°C, preferably 80 to 100°C, and a small amount of inert gas (for example, Nl) is passed through to desorb adsorbed BCl. At this time, BCAs are released first, and the Si compounds, CO Cl, TO
Only a portion of C is desorbed, and the recovered BCl is crude BCJ.
, it will contain the same amount of impurities from storage, and as it is,
Can be used as a refining raw material. Due to this first stage processing, ゛C
The recovered BCI is the B that was adsorbed on activated carbon during adsorption.
It is about 80 sections of C1s.

第1段処理の温度が40℃以下ではBCA’3が実質的
に脱離せず、120℃以上では回収BC/、中の不純物
濃度が高くなる。
If the temperature of the first stage treatment is 40° C. or lower, BCA'3 is not substantially desorbed, and if the temperature is 120° C. or higher, the impurity concentration in the recovered BC increases.

また、第2段処理においては、上記第1段処理した活性
炭を200〜700℃、好ましくは230〜300℃に
保持し、小量の不活性ガスを流し、残留しているBCl
、および不純物を完全に離脱せしめる。
In the second stage treatment, the activated carbon treated in the first stage is maintained at 200 to 700 °C, preferably 230 to 300 °C, and a small amount of inert gas is passed through to remove the remaining BCl.
, and completely remove impurities.

第2段処理の温度が200℃以下では吸着物の脱離に長
時間(3時間以上)を要し実用的でない。
If the temperature of the second stage treatment is 200° C. or lower, it will take a long time (more than 3 hours) to remove the adsorbate, which is not practical.

特に160℃程度では長時間にわたって第2段処理をし
ても、完全に不純物を脱離させることが出来ず、この活
性炭を用いてBCi、の精製を行なうと、第2図に示す
ように最初に留出するBCI、中に8iが検出される。
Particularly at around 160°C, impurities cannot be completely removed even if the second stage treatment is carried out for a long time, and when BCi is purified using this activated carbon, the initial 8i is detected in the BCI distilled out.

この8iはBCIaの留出を継続すると間もなく消失し
、再生不良によって留出したものであることを示す。上
記現象は、190℃で比較的短時間処理した場合にも現
われる。すなわち、第2段処理によって吸着不純物を完
全に脱離せしめることは極めて重要である。また、温度
の上限は、不活性ガス中の加熱であるので、杵容限度は
萬いが、700℃以上では、活性炭および装置に悪影響
を与え、経済的にも不利である。
This 8i disappears soon after continuing distillation of BCIa, indicating that it was distilled due to poor regeneration. The above phenomenon also appears when processing at 190° C. for a relatively short time. That is, it is extremely important to completely remove adsorbed impurities through the second stage treatment. Moreover, since the upper limit of the temperature is heating in an inert gas, the punch capacity limit is 10,000, but if it exceeds 700° C., it will have an adverse effect on the activated carbon and the equipment, and is also economically disadvantageous.

上目dB(J、吸屑剤の再生方法によって再生した活性
炭は、反覆使用してもB(J、の精製能力は伺ら低下せ
ず、また、第1段処理によって回収したB (J、は粗
BCJ、と同程度の不純物を含有し、そのまま精製原料
とすることが出来る。
The activated carbon regenerated by the upper dB(J) regeneration method does not reduce the refining ability of B(J) even after repeated use, and the B(J, contains the same level of impurities as crude BCJ, and can be used as a refined raw material as is.

なお、上記再生する活性炭の加熱方法は、活性炭を充填
した吸着管を外部加熱しても、或いは吸着管に導入する
不活性ガスを前もって加熱してもいずれでもよく、特に
制限はない。
The method of heating the activated carbon to be regenerated is not particularly limited, and may be either external heating of the adsorption tube filled with activated carbon or heating of the inert gas introduced into the adsorption tube in advance.

次に実施例を示し本発明の方法を具体的に説明する。Next, the method of the present invention will be specifically explained with reference to Examples.

実施例1゜ 内径が28tmのジャケット付吸層管に、充分乾燥した
8〜32メツシユの活性炭110g(215cc) を
充填し、ジャケットに冷水を通して、活性炭層を13〜
15℃に保持し、液相分析値で8i:190ppm、C
OCl、:240ppm、TOC:iaoppm (7
)fflB C1sヲ気化させ8V:50h−1で流L
AM1図に示す不純物の破過曲線を得た。不純物が破過
し、留出したBCJ、が活性炭量の2.5倍となった時
BCJ、の送給を停止し、B(J、および不純物が吸着
している活性炭を再生テストの試料とした。上記活性炭
には、吸着時、活性炭量の約1/2 (557)のBC
II、が吸着しており、送給したBCJ、は活性炭重量
の約3倍となる。
Example 1 A jacketed absorption tube with an inner diameter of 28 tm was filled with 110 g (215 cc) of sufficiently dried activated carbon of 8 to 32 meshes, and cold water was passed through the jacket to form a layer of activated carbon of 13 to 32 mm.
Maintained at 15℃, liquid phase analysis value: 8i: 190ppm, C
OCl, :240ppm, TOC:iaoppm (7
) fflB C1s is vaporized and flowed at 8V:50h-1
A breakthrough curve of impurities shown in the AM1 diagram was obtained. When the impurities broke through and the amount of distilled BCJ was 2.5 times the amount of activated carbon, the supply of BCJ was stopped, and B(J) and the activated carbon adsorbed with impurities were used as samples for the regeneration test. The activated carbon contained approximately 1/2 (557) of the amount of BC during adsorption.
II, is adsorbed, and the supplied BCJ is about three times the weight of activated carbon.

次に第1次処理として、上記活性炭にSV:2Qh−1
で島を流し、80℃に1時間保持し、脱離するBCJs
を冷却トラップによって捕集した。
Next, as a first treatment, the activated carbon was treated with SV:2Qh-1.
Flow the islets with water and hold at 80°C for 1 hour to release BCJs.
was collected by a cold trap.

さらに、第2次処理として、島はそのまま流し続け、活
性炭を250’Qに昇温し、3時間保持し、その間脱離
するB(J、を捕集した。
Furthermore, as a secondary treatment, the activated carbon was kept flowing as it was, and the activated carbon was heated to 250'Q and held for 3 hours, during which time the desorbed B(J) was collected.

上記第1次、第2次処理によって得られたBCA’。BCA' obtained by the above first and second treatments.

の貴および不純物濃度を第1表に示す。The impurity and impurity concentrations are shown in Table 1.

第1表において、2次処理において回収したB(J、中
のcock、が少ないのは、この温度で活性炭の触媒作
用により、COCl1がcoとchに分解するためであ
る。
In Table 1, the amount of B(J, cock) recovered in the secondary treatment is small because COCl1 decomposes into co and ch due to the catalytic action of activated carbon at this temperature.

実施例2 上記再生した活性炭を用いて、実施例1と全く同じ操作
、条件によってBCI、を留出せしめた。
Example 2 Using the above regenerated activated carbon, BCI was distilled under the same operation and conditions as in Example 1.

上記再生、BC1a精’JRを交互に10回繰返えして
、不純物の破過曲線をめたが、いずれの破過曲線もほぼ
第1図と同じとなり、再生の反覆による活性炭の劣化が
認められなかった。また第1次処理で回収したBCJI
’、中の不純物濃度はほぼ一定しており、粗Bcl、と
して、充分精製原料として使用出来るものであった。
The above regeneration and BC1a Sei'JR were alternately repeated 10 times to obtain breakthrough curves for impurities, and all breakthrough curves were almost the same as in Figure 1, indicating that the activated carbon deteriorated due to repeated regeneration. I was not able to admit. In addition, BCJI collected in the first treatment
', the impurity concentration in it was almost constant, and it could be used as crude Bcl as a sufficiently purified raw material.

以上述べたように本発明に係るBCII、吸着剤の再生
法は、精製ζこ際して吸着されたBCJ8の大部分を、
粗B(J、の不純物a度とほぼ同じBCII、として回
収し、かつ再生された活性炭は劣化することなく反覆使
用出来るので、吸着精製法における原料および吸着剤の
原単位が大幅に低下し、精製BC1,のコスト引下げに
大きく寄与するものである。
As described above, the BCII and adsorbent regeneration method according to the present invention removes most of the BCJ8 adsorbed during purification.
The recovered and regenerated activated carbon as BCII, which has approximately the same impurity a degree as crude B (J), can be used repeatedly without deterioration, so the basic unit of raw material and adsorbent in the adsorption purification method is significantly reduced. This greatly contributes to reducing the cost of purified BC1.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はB(J、を活性炭によってr4製する場合の、
不純物の破過状態を示す図、第2図は、再生不足な活性
炭でB(J、を精製した場合の81の挙動を示す図であ
る。 ■・・・・・・Si(Si化合物)、■・・・・・・c
ockl。 出願人昭和電工株式会社
Figure 1 shows the case where B(J) is made of r4 using activated carbon.
Figure 2, which shows the breakthrough state of impurities, is a diagram showing the behavior of 81 when B (J) is purified with activated carbon that is insufficiently regenerated. ■...Si (Si compound), ■・・・・・・c
ockl. Applicant Showa Denko Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 三塩化ホウ素ガス中のけい素化合物、ホスゲン及び塩素
化炭化水素を吸着除去するために用いた活性炭を再生す
るに際して、まず該活性炭を40〜120℃に加熱し、
該活性炭から脱離した三塩化ホウ素を主成分とするガス
を回収し、つぎに前記活性炭を200〜700℃に加熱
することを特徴とする三塩化ホウ素吸着剤の再生法。
When regenerating the activated carbon used to adsorb and remove silicon compounds, phosgene, and chlorinated hydrocarbons in boron trichloride gas, first heat the activated carbon to 40 to 120 ° C.
A method for regenerating a boron trichloride adsorbent, which comprises recovering a gas mainly composed of boron trichloride desorbed from the activated carbon, and then heating the activated carbon to 200 to 700°C.
JP21490083A 1983-11-15 1983-11-15 Regeneration of adsorbent for boron trichloride Granted JPS60106532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21490083A JPS60106532A (en) 1983-11-15 1983-11-15 Regeneration of adsorbent for boron trichloride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21490083A JPS60106532A (en) 1983-11-15 1983-11-15 Regeneration of adsorbent for boron trichloride

Publications (2)

Publication Number Publication Date
JPS60106532A true JPS60106532A (en) 1985-06-12
JPH0353017B2 JPH0353017B2 (en) 1991-08-13

Family

ID=16663418

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21490083A Granted JPS60106532A (en) 1983-11-15 1983-11-15 Regeneration of adsorbent for boron trichloride

Country Status (1)

Country Link
JP (1) JPS60106532A (en)

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CN102658101A (en) * 2012-04-19 2012-09-12 东华大学 Regeneration method for activated carbon adsorbed and saturated by refractory organics
CN102728178A (en) * 2011-04-08 2012-10-17 中国电力工程顾问集团公司 Active coke regeneration heating system in active coke boiler flue gas desulfurization system
CN115724437A (en) * 2022-12-14 2023-03-03 陕西天鼎工程技术有限公司 Purification method of boron trichloride

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077296A (en) * 1973-11-12 1975-06-24
JPS5340699A (en) * 1976-09-27 1978-04-13 Daikin Ind Ltd Continous regenerator for activated carbon

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077296A (en) * 1973-11-12 1975-06-24
JPS5340699A (en) * 1976-09-27 1978-04-13 Daikin Ind Ltd Continous regenerator for activated carbon

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5073454A (en) * 1989-09-05 1991-12-17 Westates Carbon Oxidation resistant activated carbon and method of preparation
SG87151A1 (en) * 1999-09-03 2002-03-19 Air Liquide Processes and systems for purification of boron trichloride
JP2009034163A (en) * 2007-07-31 2009-02-19 Mitsubishi Electric Corp Rice cooker
JP2009112331A (en) * 2007-11-01 2009-05-28 Mitsubishi Electric Corp Steam recovering device and cooker with steam recovering device
JP2009219859A (en) * 2008-02-21 2009-10-01 Mitsubishi Electric Corp Cooker
JP2010075272A (en) * 2008-09-24 2010-04-08 Mitsubishi Electric Corp Cooker
CN102728178A (en) * 2011-04-08 2012-10-17 中国电力工程顾问集团公司 Active coke regeneration heating system in active coke boiler flue gas desulfurization system
CN102728178B (en) * 2011-04-08 2014-08-20 中国电力工程顾问集团公司 Active coke regeneration heating system in active coke boiler flue gas desulfurization system
CN102658101A (en) * 2012-04-19 2012-09-12 东华大学 Regeneration method for activated carbon adsorbed and saturated by refractory organics
CN115724437A (en) * 2022-12-14 2023-03-03 陕西天鼎工程技术有限公司 Purification method of boron trichloride

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