JPS5995629U - Resist coating equipment - Google Patents
Resist coating equipmentInfo
- Publication number
- JPS5995629U JPS5995629U JP19124682U JP19124682U JPS5995629U JP S5995629 U JPS5995629 U JP S5995629U JP 19124682 U JP19124682 U JP 19124682U JP 19124682 U JP19124682 U JP 19124682U JP S5995629 U JPS5995629 U JP S5995629U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor wafer
- suction
- resist
- resist coating
- envelope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の装置を示す断面図、第２図は本考案の一
実施例を示す断面図、第３図は排気量調節装置の一例を
示す断面図、第４図は塗布時間とレジストの微粒体との
増加率および発生状態を示す図、第５図は排気量調節操
作を示す図である。
１・・・吸着板、３・・・駆動装置、４・・・ノズル、
６・・・外囲器、７・・・ダクト、１０・・・排気量調
節装置、１１・・・制御装置。Fig. 1 is a sectional view showing a conventional device, Fig. 2 is a sectional view showing an embodiment of the present invention, Fig. 3 is a sectional view showing an example of an exhaust amount adjusting device, and Fig. 4 is a sectional view showing coating time and resist. FIG. 5 is a diagram showing the rate of increase with fine particles and the state of occurrence, and FIG. 5 is a diagram showing the displacement adjustment operation. 1... Adsorption plate, 3... Drive device, 4... Nozzle,
6... Envelope, 7... Duct, 10... Exhaust volume adjustment device, 11... Control device.
Claims (1)
記回転機構の半導体ウェハ保持部を取り囲み飛散物を収
容する外囲器と、上記吸着保持されて回転される半導体
ウェハにレジストを同心的に滴下させるレジスト供給装
置と、上記外囲器に接続する通気路を介して上記吸着保
持部の周囲に排気流を発生させる排気装置と、上記排気
装置の排気量をレジスト塗布時間に合わせて変化させる
調節装置とを備えたレジスト塗布装置。a rotation mechanism that suction-holds and rotates a semiconductor wafer; an envelope that surrounds a semiconductor wafer holding portion of the rotation mechanism and accommodates scattered objects; and a resist concentrically dripping onto the semiconductor wafer that is suction-held and rotated. an exhaust system that generates an exhaust flow around the suction holding section through a ventilation path connected to the envelope; and an adjustment that changes the exhaust volume of the exhaust system in accordance with the resist application time. A resist coating device equipped with a device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19124682U JPS5995629U (en) | 1982-12-20 | 1982-12-20 | Resist coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19124682U JPS5995629U (en) | 1982-12-20 | 1982-12-20 | Resist coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5995629U true JPS5995629U (en) | 1984-06-28 |
Family
ID=30411879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19124682U Pending JPS5995629U (en) | 1982-12-20 | 1982-12-20 | Resist coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5995629U (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5612206B2 (en) * | 1973-06-08 | 1981-03-19 | ||
| JPS5652745A (en) * | 1979-10-05 | 1981-05-12 | Matsushita Electric Ind Co Ltd | Method and apparatus for applying photosensitive resin |
| JPS5666044A (en) * | 1979-11-05 | 1981-06-04 | Toshiba Corp | Semiconductor device |
| JPS5918636A (en) * | 1982-07-22 | 1984-01-31 | Nec Corp | Deposition of photoresist |
| JPS5950438B2 (en) * | 1975-03-25 | 1984-12-08 | カワサキユコウ カブシキガイシヤ | high speed hydraulic press |
-
1982
- 1982-12-20 JP JP19124682U patent/JPS5995629U/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5612206B2 (en) * | 1973-06-08 | 1981-03-19 | ||
| JPS5950438B2 (en) * | 1975-03-25 | 1984-12-08 | カワサキユコウ カブシキガイシヤ | high speed hydraulic press |
| JPS5652745A (en) * | 1979-10-05 | 1981-05-12 | Matsushita Electric Ind Co Ltd | Method and apparatus for applying photosensitive resin |
| JPS5666044A (en) * | 1979-11-05 | 1981-06-04 | Toshiba Corp | Semiconductor device |
| JPS5918636A (en) * | 1982-07-22 | 1984-01-31 | Nec Corp | Deposition of photoresist |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5995629U (en) | Resist coating equipment | |
| JPS5950438U (en) | Resist coating equipment | |
| JPS5836738U (en) | Exposure mask device | |
| JPS594543U (en) | Resist coating equipment | |
| JPS58158441U (en) | semiconductor etching equipment | |
| JPS5848334U (en) | Solid-gas contact device | |
| JPS5877050U (en) | Substrate adsorption device | |
| JPS5831949U (en) | sandblasting equipment | |
| JPS6067842U (en) | Wafer polishing equipment | |
| JPS5982257U (en) | Resist coating equipment | |
| JPS5916166U (en) | magnetoresistive element | |
| JPS60109687U (en) | Pachinko ball counting device | |
| JPS5834816U (en) | parts feeder | |
| JPS6110586U (en) | object detection device | |
| JPS6014430U (en) | humidifier | |
| JPS5996830U (en) | coating equipment | |
| JPS5913644U (en) | Throttle valve air volume adjustment device | |
| JPS60194332U (en) | semiconductor manufacturing equipment | |
| JPS60169838U (en) | semiconductor manufacturing equipment | |
| JPS6067127U (en) | Drain discharge device in compressed air dehumidification equipment | |
| JPS58170210U (en) | air conditioner | |
| JPS6032297U (en) | Powder blocking mechanism | |
| JPS58172723U (en) | air conditioner | |
| JPS59193656U (en) | holding device | |
| JPS5934079U (en) | Actuator operating device |