JPS5991650A - Electron-beam welder - Google Patents
Electron-beam welderInfo
- Publication number
- JPS5991650A JPS5991650A JP20175482A JP20175482A JPS5991650A JP S5991650 A JPS5991650 A JP S5991650A JP 20175482 A JP20175482 A JP 20175482A JP 20175482 A JP20175482 A JP 20175482A JP S5991650 A JPS5991650 A JP S5991650A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- current
- electron gun
- circuit
- acceleration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/24—Circuit arrangements not adapted to a particular application of the tube and not otherwise provided for
- H01J37/241—High voltage power supply or regulation circuits
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は電子ビーム加工機に係り、特に電子銃内で生ず
る放電に起因する溶接欠陥の防止に好適なビーム制御装
置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam processing machine, and more particularly to a beam control device suitable for preventing welding defects caused by discharge generated within an electron gun.
本発明の最も近い公知例は特公昭4B−27278であ
る。この技術は電子銃内で放電が生じた場合。The closest known example of the present invention is Japanese Patent Publication No. 4B-27278. This technology works when a discharge occurs within the electron gun.
その高圧側回路電流を検知し、この値が例えば0.6A
の制限電流以上になると電子銃を25マイクロ秒より少
ない時間で遮断(ター/オフ)し35ミリ秒経過後ター
ンオンすることができる高圧回路の制御装置を設けて、
過負荷に起因する装置の保護を目的に開発されたもので
ある。The high voltage side circuit current is detected and this value is, for example, 0.6A.
A high-voltage circuit control device is provided that can shut off the electron gun in less than 25 microseconds and turn it on after 35 milliseconds if the current exceeds the current limit.
It was developed for the purpose of protecting equipment due to overload.
しかしながら実際の′電子ビーム加工機により例えば溶
接作業等を行なう場合、最も型費なことは電子銃内で放
電が生じても良好な溶接が可能でなければならない。However, when carrying out, for example, welding work using an actual electron beam processing machine, the most expensive thing is that it must be possible to perform good welding even if electrical discharge occurs within the electron gun.
実際の溶接試験を行なった結果本技術において次の欠点
が明らかとなった。As a result of conducting actual welding tests, the following drawbacks were revealed in this technology.
(1)装置の最大許容電流例えば0.6A以上で高圧回
路のターンオフを行ない、その後ターンオンする方式で
あるため例えば実際の溶接電流0.1A程度で作業して
いるにも拘らず電子銃内で度度生ずる微小放電等によ、
90.6 A以下の電流が流れても制御装置は作動しな
い。このため設定電流の数倍に及び電流が被加工物に加
わシ溶接部に溶融過多によるアンダカット等の欠陥が発
生することを防止することができない。(1) The device's maximum permissible current is, for example, 0.6 A or higher, and the high voltage circuit is turned off and then turned on. Due to micro discharges that occur frequently,
The control device will not operate even if a current of 90.6 A or less flows. Therefore, when a current several times higher than the set current is applied to the workpiece, it is impossible to prevent defects such as undercuts from occurring in the welded portion due to excessive melting.
(2)定格加速電圧30KV以上の電子ビーム加工機に
おいて、ターンオフ時間25マイクロ秒以i
下ではL−が犬となり電子制御回路のオペi
アンプ等がサージにより破損する。(Lは高圧ケーブル
および高圧トランスが主なもの)(3) 遮断経過時
間35ミリ秒では例えば100mm厚の横向き貫通溶接
で溶接の連続性が保持できずボイド欠陥が発生する。(2) In an electron beam processing machine with a rated acceleration voltage of 30 KV or more, if the turn-off time is less than 25 microseconds, L- will become a dog and the operational amplifier of the electronic control circuit will be damaged by the surge. (L mainly refers to high-voltage cables and high-voltage transformers) (3) If the interruption elapsed time is 35 milliseconds, for example, welding continuity cannot be maintained in horizontal penetration welding with a thickness of 100 mm, and void defects will occur.
以上のことより現状では電子銃内に金属蒸気等が侵入し
放電が生じることにより溶接部に発生するボイド等の溶
接欠陥を防止することができない。As described above, it is currently impossible to prevent welding defects such as voids occurring in the welded portion due to metal vapor entering the electron gun and generating electric discharge.
本発明の目的は、上記した従来技術の欠点を解決して%
電子ビーム溶接において電子銃内に放電が生じても良好
な溶接結果が得られる電子ビーム加工機を提供すること
にある。The object of the present invention is to solve the above-mentioned drawbacks of the prior art and to
An object of the present invention is to provide an electron beam processing machine that can obtain good welding results even if electric discharge occurs in an electron gun during electron beam welding.
本発明は、かかる目的を達成するために、電子ビーム加
工機の尚圧電源および該電源の負荷であ−る電子銃で構
成される高圧電気回路において、被加工機に照射するビ
ームの加速電圧およびビーノ・電流の変化を検知し、該
検知信号により前記加速電圧が設定値に対して10%以
上低下、またはビーム電流が設定値に対して10%以上
増加した場合に高圧電気回路を選定せる任意の時間遮断
し、電子銃の作動を停止する遮断および制御機構と高圧
電気回路を備えたことを特徴とする。In order to achieve such an object, the present invention provides an acceleration voltage of a beam irradiated onto a workpiece in a high voltage electric circuit consisting of a high voltage power source of an electron beam processing machine and an electron gun which is a load of the power source. and a change in the beam current, and selects a high-voltage electric circuit when the acceleration voltage decreases by 10% or more from the set value or the beam current increases by 10% or more from the set value based on the detection signal. It is characterized by being equipped with a cut-off and control mechanism and a high-voltage electric circuit that cut off the electron gun at any desired time and stop the operation of the electron gun.
以下、本発明を図示の実施例に基づき詳細に説明する。Hereinafter, the present invention will be explained in detail based on illustrated embodiments.
第1図は本発明の一実施例の構成図である。同図におい
て、電子ビーム加工機は、高圧電源1、電子銃2.真空
管18が高圧主回路を構成している。電子銃は陰極電源
3による陰極加熱で放出された熱電子をバイアス電源4
で制御し、これに高圧を加えて゛電子ビーム5を加速し
、被カロエ材6の溶接を行なう。定常状郭において、真
空管18は導通の状態で上記の如くして溶接が進行する
。電子銃内で異常放電が生ずると加速電圧検出器7の出
力電圧およびビーム電流検出器11の出力電圧が変化す
る。加速電圧検出器7の出力電圧の変化は、電圧設定器
8と加速電圧比較回路9で比較され、直流の出力信号を
出す。これによりマルチバイブレータ−?−10,が動
作する。又、ビーム電流検出器11の出力電圧の変化は
、電圧設定器12とビーム電流比較回路13で比較され
直流の出力信号を出す。上記したマルチバイブレータ−
10の出力信号又はビーム電流比較回路13の出力信号
のどちらか一方の出力信号が選択回路14を通じて制御
用トランジスタ15を動作させ、コントロールグリッド
電源16の出力が真空管1Bに掛り、この真空管で高圧
回路を遮断することができる。遮断後、直ちに、マルチ
バイブレーク−10の出力信号がOとなり、再び真空管
18は導通状態となり電子銃の運転を再開する。記号1
7は真空管のスクリーングリッド電源である。FIG. 1 is a block diagram of an embodiment of the present invention. In the figure, the electron beam processing machine includes a high voltage power supply 1, an electron gun 2. Vacuum tube 18 constitutes a high voltage main circuit. The electron gun uses thermionic electrons emitted by the cathode heating by the cathode power supply 3 to the bias power supply 4.
A high pressure is applied thereto to accelerate the electron beam 5 and weld the material 6 to be welded. In the steady state, the vacuum tube 18 is in a conductive state and welding proceeds as described above. When abnormal discharge occurs within the electron gun, the output voltage of the accelerating voltage detector 7 and the output voltage of the beam current detector 11 change. Changes in the output voltage of the accelerating voltage detector 7 are compared by a voltage setting device 8 and an accelerating voltage comparison circuit 9, and a DC output signal is output. Is this a multi-vibrator? -10, works. Further, changes in the output voltage of the beam current detector 11 are compared by a voltage setting device 12 and a beam current comparison circuit 13 to output a DC output signal. The multivibrator mentioned above
Either the output signal of 10 or the output signal of the beam current comparison circuit 13 operates the control transistor 15 through the selection circuit 14, and the output of the control grid power supply 16 is applied to the vacuum tube 1B, and this vacuum tube operates the high voltage circuit. can be blocked. Immediately after the cutoff, the output signal of the multi-by-break-10 becomes O, and the vacuum tube 18 becomes conductive again, restarting operation of the electron gun. symbol 1
7 is the screen grid power supply for the vacuum tube.
第2図は、上記した回路の動作をより詳細に表わしたも
のを示す。FIG. 2 shows a more detailed representation of the operation of the circuit described above.
定常状態では電子銃にビーム加速電圧V、が印加されて
、電子ビーム溶接が行なわれている。しかし、溶接中、
溶接金属から放出される金属蒸気等が、電子銃内に侵入
すると高圧(陰極−陽極間、又は、バイアス−陽極間)
の絶縁の破壊が生じ、電子銃内で放電が生ずる。In a steady state, a beam acceleration voltage V is applied to the electron gun, and electron beam welding is performed. However, during welding,
When metal vapor emitted from weld metal enters the electron gun, high pressure (between cathode and anode, or between bias and anode) occurs.
breakdown of the insulation occurs, and a discharge occurs within the electron gun.
このため、加速電圧V、が低下し、ビーム電流■、が増
加する。しかしながら、放電の程度によシ加速電圧の低
下およびビーム電流の増加の程度は異なる。放電が生じ
、ビーム電流がIb (Is=1.11.)となると
すなわち点27から点28に増加したとき、前記した制
御用トランジスタを動作する。この間ビーム電流は点2
8から点29に増加するがこの時間1oは数マイクロ秒
以下で無視できる時間である。この制御用トランジスタ
ONによりt3秒でビーム電流は点29から点30(零
アンペア)になるように真空管のプレート電圧を保持す
る。これに伴って、ビーム電流の低下とともに加速電圧
も低下し1点19から点20、点21そして点22(零
電位)になる。この時点20すなわちV b (V b
= 0.9 V −) Icなると、前記した加速電
圧比較回路から直流電圧が出力され、マルチバイブレー
タがONする。このマルチバイブレーターの出力は11
1秒間保持するようにセットされている。この時、ビー
ム電流は零であるため、前記したビーム電流比較回路の
出力は15秒後に零になっている。このため1選択回路
を介して、真空管のプレート電圧はマルチバイブレータ
−の出力により保持されている。従って18秒後にマル
チバイブレータ−の出力はオフとなり、前記プレート電
圧がター7オフ開始し、t1秒後にプレート電圧が零と
なる。これに伴って、電子銃の加速電圧は、点22から
点23を経て、最初に設定された■、値となり、ビーム
電流も同様に点30から点31を経て点32の■、値に
もどり、再び連続した電子ビーム溶接が可能である。Therefore, the accelerating voltage V, decreases and the beam current {circle around (2)} increases. However, the degree of decrease in acceleration voltage and increase in beam current differs depending on the degree of discharge. When a discharge occurs and the beam current reaches Ib (Is=1.11.), that is, when it increases from point 27 to point 28, the control transistor described above is activated. During this time, the beam current is at point 2
8 to point 29, but this time 1o is a negligible time of several microseconds or less. By turning on this control transistor, the plate voltage of the vacuum tube is maintained so that the beam current changes from point 29 to point 30 (zero ampere) in t3 seconds. Accordingly, as the beam current decreases, the acceleration voltage also decreases from point 19 to point 20 to point 21 to point 22 (zero potential). At this point 20, that is, V b (V b
= 0.9 V-) Ic, a DC voltage is output from the above-mentioned accelerating voltage comparison circuit, and the multivibrator is turned on. The output of this multivibrator is 11
It is set to hold for 1 second. At this time, since the beam current is zero, the output of the beam current comparison circuit described above becomes zero after 15 seconds. Therefore, the plate voltage of the vacuum tube is maintained by the output of the multivibrator via the 1 selection circuit. Therefore, after 18 seconds, the output of the multivibrator is turned off, the plate voltage starts to turn off, and after t1 seconds, the plate voltage becomes zero. Along with this, the accelerating voltage of the electron gun passes from point 22 to point 23 and returns to the initially set value (■), and the beam current similarly passes from point 30 to point 31 and returns to the value (■) at point 32. , again continuous electron beam welding is possible.
また、放電が生じ、ビーム電流が大きく変化せず、加速
電圧のみが低下し、Vb (Vb =0.9v、)と
なった場合は、前記したように、加速電圧比較回路から
、直流電圧が出力され、直ちにマルチバ・イブレータ−
がONし、同様の動作をし、1、+11+1.+14秒
後に定常状態に復帰し、連続した電子ビーム溶接が可能
となる。In addition, if a discharge occurs and the beam current does not change significantly and only the accelerating voltage decreases to Vb (Vb = 0.9v,), the accelerating voltage comparison circuit will detect the DC voltage as described above. output and immediately output to the multivibrator.
turns on and performs the same operation, 1, +11+1. After +14 seconds, the steady state is restored and continuous electron beam welding becomes possible.
さらに、本装置においては、加速電圧の再点弧に失敗し
た場合、マルチバイブレータ−が、点23より1.+1
.秒後再び前記した動作を行ない、加速電圧を点25よ
シ回復し、点26で正常に回復する機能を有している。Furthermore, in this device, when the accelerating voltage fails to re-ignite, the multivibrator is activated from point 23 to 1. +1
.. After a few seconds, the above operation is performed again, and the acceleration voltage is restored from point 25 to normal at point 26.
この場合の各要素への動作列を一点鎖線で示している。The sequence of operations for each element in this case is shown by a chain line.
さらに、加速電圧の再点弧時に過大なビーム電流(≧I
b)が流れた場合は前記した動作を行ない、正常に回復
する機能を有している。以上の各要素の動作で最も重要
ナモノカ、Ib g Vb @ j2 @ j3お
よびt、の値である。これらの具体的設定値とその結果
を以下に示す。Furthermore, excessive beam current (≧I
If b) occurs, the above-mentioned operation is performed to restore normality. The most important factors in the operation of each of the above elements are the values of Ib g Vb @ j2 @ j3 and t. These specific setting values and their results are shown below.
t!とt、は装置の保護的な面より500マイクロ秒か
ら1ミリ秒に設定すべきである。T! and t should be set from 500 microseconds to 1 millisecond to protect the device.
これは高圧回路に存在するインダクタンスLに生じ、電
子部品、特にオペレーティングアンプ等が破損するため
である。実験的には、加速電圧30KVで100mAの
ビーム電流のとき、t!が100マイクロ秒以下で前記
破損が発生した。This is because the inductance L present in the high voltage circuit causes damage to electronic components, especially the operating amplifier. Experimentally, when the acceleration voltage is 30 KV and the beam current is 100 mA, t! The damage occurred in less than 100 microseconds.
このため使用するビーム電流に応じて500マイクロ秒
から1ミリ秒の間で設定することが効果的であることが
判明した。For this reason, it has been found that it is effective to set the time between 500 microseconds and 1 millisecond depending on the beam current used.
■、は30〜50ミリ秒間で20%程度の降下で、溶接
に対して問題ないため、その半分の10%に設定した。(2) is a drop of about 20% in 30 to 50 milliseconds, which poses no problem for welding, so it was set to half that, 10%.
さらに、Ibについて30〜50ミ、l>、9間ら20
%程度の増加は、溶接に影響ないことを確認している
ため、その半分の10%に設定した。Furthermore, for Ib, 30 to 50 mi, l>, 9 to 20
Since it has been confirmed that an increase of about 10% does not affect welding, it was set at 10%, which is half of that increase.
t、は溶接の連続性を保持する上で、すなわち、健全な
溶接部を得るために最も重要な値である。t is the most important value for maintaining weld continuity, that is, for obtaining a sound weld.
板厚100wm級を貫通して溶接速度100m+/分で
電子ビーム溶接した結果、1.+1.+1゜が1zミリ
秒以下では良好な結果が得られたが、これを越えると、
急速な復帰にも拘らずボイド欠陥が発生した。この状況
を第3図、第4図に示す。As a result of electron beam welding through a plate thickness of 100 wm at a welding speed of 100 m+/min, 1. +1. Good results were obtained when +1° was less than 1z milliseconds, but beyond this,
Despite rapid recovery, void defects occurred. This situation is shown in Figures 3 and 4.
第3図は板厚100mmの被加工材33.34を突合せ
溶接し、前記した電子銃内で発生する放電の復帰を、1
.+1.+1.を12ミリ秒以下に設定して電子ビーム
溶接した結果であり、溶接部の横断面を(a)、そのA
−A断面すなわち縦断面を(b)に示している。溶接金
属35はいずれの断面とも欠陥のない良好な品質を示し
た。また、裏ビード36も均一で良好な形状を示してい
る。これに対して、12ミリ以上では、第4図にその縦
断面を示すが、ビード表面に凹み38および裏面に突起
39が生じ、一部にボイド37が発生している。Figure 3 shows the recovery of the discharge generated in the electron gun described above by butt welding workpieces 33 and 34 with a thickness of 100 mm.
.. +1. +1. This is the result of electron beam welding with the time set to 12 milliseconds or less, and the cross section of the weld is (a) and its A
-A section, that is, a longitudinal section is shown in (b). Weld metal 35 showed good quality with no defects in any cross section. Further, the back bead 36 also shows a uniform and good shape. On the other hand, when the bead is 12 mm or more, as shown in FIG. 4, a recess 38 is formed on the bead surface, a protrusion 39 is formed on the back surface, and a void 37 is formed in a portion.
さらに、板厚9.3〜30.9mの薄板についても同様
の結果が得られた。Furthermore, similar results were obtained for thin plates having a thickness of 9.3 to 30.9 m.
以上のことよりt3は10ミリ秒以下が望ましいO
本発明によれば、電子ビーム溶接において、電子銃内で
発生する放電に起因した溶接欠陥をなくすことが可能と
なる。さらに、放電によシ生ずるサージに起因する装置
の電子部品の破損をなくすことが可能となる。From the above, it is desirable that t3 be 10 milliseconds or less. According to the present invention, it is possible to eliminate welding defects caused by discharge generated within the electron gun in electron beam welding. Furthermore, it is possible to eliminate damage to electronic components of the device due to surges caused by discharge.
第1図は本発明の一実施例の構成図、第2図は、制御装
置の作動を示す線図、第3図(a)は本装置による被加
工材の溶接部の横断面図、第3図(bJは第3図(aJ
のA−A断面図、第4図は本発明以外の方法による被加
工材の溶接部の欠陥発生状況説明図である。
1・・・高圧電源、2・・・電子銃、3・・・陰極電源
、4・・・バイアス電源、5・・・電子ビーム、6・・
・被加工材、7・・・加速電圧検出器、8・・・電圧設
定器、9・・・加速電圧比較回路、10・・・マルチバ
イブレータ−111・・・ビーム電流検出器、12・・
・電圧設定器。
13・・・ビーム電流比較回路、14・・・選択回路、
15・・・制御用トランジスタ、16・・・コントロー
ルグリッド電源、17・・・スクリーングリッド電源、
18・・・真空管% 19〜26・・・加速電圧の変化
状況を説明するための点を示す、27〜32・・・ビー
ム電流の変化状況を説明するための点を示す、33゜3
4・・・被加工材、35・・・溶接金属、36・・・裏
ビード、37・・・ボイド欠陥、38・・・表ビード凹
み。
#を闇 □FIG. 1 is a block diagram of an embodiment of the present invention, FIG. 2 is a diagram showing the operation of the control device, FIG. Figure 3 (bJ is Figure 3 (aJ
FIG. 4 is a cross-sectional view taken along the line AA of FIG. 1... High voltage power supply, 2... Electron gun, 3... Cathode power supply, 4... Bias power supply, 5... Electron beam, 6...
- Workpiece material, 7... Accelerating voltage detector, 8... Voltage setting device, 9... Accelerating voltage comparison circuit, 10... Multivibrator-111... Beam current detector, 12...
・Voltage setting device. 13... Beam current comparison circuit, 14... Selection circuit,
15... Control transistor, 16... Control grid power supply, 17... Screen grid power supply,
18...Vacuum tube % 19-26...Indicates a point to explain the change situation of the accelerating voltage, 27-32...Indicates a point to explain the change situation of the beam current, 33゜3
4...Workpiece material, 35...Weld metal, 36...Back bead, 37...Void defect, 38...Top bead dent. # is darkness □
Claims (1)
ある電子銃で構成される高圧電気回路において、被加工
材に照射するビームの加速電圧とビーム電流の変化を検
知し、該検知信号により前記加速電圧が定格加速電圧の
10%以上低下した場合、又はビーム電流が定格電流の
10%以上増加した場合のみ前記高圧電気回路を選定せ
る任意の時間遮断し電子銃の作動を停止する遮断および
制御機構を高圧電気回路に備えたことを特徴とする電子
ビーム加工機。 2 電子銃の作動を停止する時間が10ミリ秒以下でか
つターンオフ、ターンオン時間を500マイクロ秒から
1ミリ秒で制御することを特徴とする特許請求範囲第1
項に係る電子ビーム加工機。[Claims] 1. In a high-voltage electric circuit consisting of a high-voltage power supply of an electron beam processing machine and an electron gun that is a load of the power supply, changes in the acceleration voltage and beam current of the beam irradiated onto the workpiece are detected. However, only when the acceleration voltage decreases by 10% or more of the rated acceleration voltage or the beam current increases by 10% or more of the rated current according to the detection signal, the high voltage electric circuit is shut off for a selected period of time and the electron gun is turned off. An electron beam processing machine characterized in that a high-voltage electric circuit is equipped with a shutoff and control mechanism for stopping operation. 2. Claim 1, characterized in that the time for stopping the operation of the electron gun is 10 milliseconds or less, and the turn-off and turn-on times are controlled within 500 microseconds to 1 millisecond.
Electron beam processing machine according to paragraph.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20175482A JPS5991650A (en) | 1982-11-17 | 1982-11-17 | Electron-beam welder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20175482A JPS5991650A (en) | 1982-11-17 | 1982-11-17 | Electron-beam welder |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5991650A true JPS5991650A (en) | 1984-05-26 |
Family
ID=16446377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20175482A Pending JPS5991650A (en) | 1982-11-17 | 1982-11-17 | Electron-beam welder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5991650A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61206200A (en) * | 1985-03-08 | 1986-09-12 | 日新ハイボルテ−ジ株式会社 | Discharge detection circuit for charged particle accelerator |
JPS62115637A (en) * | 1985-11-13 | 1987-05-27 | Hitachi Ltd | Electron beam machine tool |
JPS6396859A (en) * | 1986-10-09 | 1988-04-27 | Nec Kyushu Ltd | Ion implanting device for semiconductor substrate |
JPH0216555U (en) * | 1988-07-18 | 1990-02-02 |
-
1982
- 1982-11-17 JP JP20175482A patent/JPS5991650A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61206200A (en) * | 1985-03-08 | 1986-09-12 | 日新ハイボルテ−ジ株式会社 | Discharge detection circuit for charged particle accelerator |
JPS62115637A (en) * | 1985-11-13 | 1987-05-27 | Hitachi Ltd | Electron beam machine tool |
JPS6396859A (en) * | 1986-10-09 | 1988-04-27 | Nec Kyushu Ltd | Ion implanting device for semiconductor substrate |
JPH0216555U (en) * | 1988-07-18 | 1990-02-02 |
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