JPS5990806A - Working method of fine pattern - Google Patents

Abstract

PURPOSE:To enable easy working of an ultrafine pattern by forming the magnetization of the fine pattern on a thin vertical magnetization film formed on a base plate and sticking and fixing the magnetic particles coated with a high polymer material to the thin film thereby patterning the film. CONSTITUTION:A thin film 2 having high magnetic permeability is laminated on a base plate 1 and further a thin vertical magnetization film 3 is laminated by a method, such as sputtering, on the film 2, thereby forming a medium 6. Magnetization of a grating pattern is formed at a micro pitch P, for example, 0.5mum, on the thin film 3. Magnetic writing by a vertical magnetic head is used for forming the grating pattern. The magnetic pattern formed of the magnetic particles coated with a thermoplastic material 12 is developed. For example, iron powder and thermoplastic, etc. are used for the particles and the material. The material is then heated to melt and the particles are fixed on the film 3 thereby forming a mask 4. The parts of the thin film 3' and the thin film 2' covered by the mask 4 are allowed to remain and the remaining parts are dissolved away by etching, whereby the diffraction grating having the fine pattern is produced.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for processing fine patterns such as diffraction gratings.

Conventionally, for example, when producing a diffraction grating, etc., a processing method generally referred to as a photo-optic method has been used. This method first involves applying a thin layer of photoresist on the workpiece.
Place a negative mask on the mask and bake with 5B ultraviolet light, polymerizing only the photoresist in the exposed areas. Next, this is placed in a developer to dissolve and remove the photoresist in the areas not exposed to light. Furthermore, soak this in etching solution,
Etch the exposed portion of the workpiece from which the photoresist has been removed. Thereafter, by removing the photoresist, the object can be processed with the pattern drawn on the mask.

However, in the above-mentioned processing method, if a fine pattern is to be processed, a large and expensive device is required to manufacture the mask. Furthermore, it has been difficult to process extremely fine patterns (for example, 1 μm or less) due to the resolution limit of the mask during exposure.

SUMMARY OF THE INVENTION In view of the above-mentioned facts, an object of the present invention is to provide a method for processing a fine pattern that can easily process a very fine pattern.

The present invention includes a process of forming a perpendicularly magnetized thin film on a substrate, a process of forming a fine pattern of magnetization on the perpendicularly magnetized thin film, and a process of forming magnetic particles coated with a polymeric material on the perpendicularly magnetized thin film according to the fine pattern. The above object is achieved by a fine pattern processing method comprising the steps of adhering and fixing the magnetic particles and patterning the perpendicularly magnetized thin film according to the adhering and fixing pattern of the magnetic particles.

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 (N~(0) is a schematic cross-sectional view illustrating the process of producing a diffraction grating by the processing method based on the present invention.

First, as shown in FIG. 1A, a medium 6 is formed by laminating a high magnetic permeability thin film 2 on a substrate 1 and a perpendicular magnetization thin film 6 thereon by, for example, sputtering. Here, the high magnetic permeability thin film 2 helps form a fine pattern by concentrating the magnetic flux on the part that comes into contact with the main pole of the perpendicular magnetization head when forming a magnetization pattern, which will be described later. However, it is not necessarily necessary. The omission is well known.

Next, as shown in FIG. 1 (E9), a lattice pattern of magnetization is formed on the perpendicularly magnetized thin film 6 at a minute pitch P (for example, 0.5 μff1). Magnetic writing using perpendicular magnetic head pressure is used, known as .This process is shown in FIG.

In FIG. 2, 7 is a main magnetic pole made of a thin plate of high magnetic permeability material, the tip of which is in contact with the medium 6. Further, 8 is an auxiliary magnetic pole made of a material with high magnetic permeability, and 9 is a signal winding wound around the auxiliary magnetic pole, which together with the main magnetic pole 7 constitutes a perpendicular magnetization head. While moving the medium 6 at a constant speed in the direction of arrow A, a pulse voltage is applied to the winding 9 to excite a vertical magnetic field between the main magnetic pole 7 and the auxiliary magnetic pole 8, as shown in 10 in the figure. To form a grid pattern of magnetization. In this case, the repetition period of the .<Russ voltage is determined by the moving speed of the medium B and the set value of the grating pitch of the diffraction grating to be sought.

Next, according to the lattice pattern formed as described above, a mask 4 is formed on the perpendicular magnetization thin film 6 as shown in FIG.
This will be explained in detail in 3I. First, as shown in Figure 6, the magnetization I (turn) formed by the magnetic particles 11 coated with the thermoplastic material 12 is developed. At this time, the magnetic particles 11 follow the magnetic field generated by the boriding, and The magnetic particles 11 and the thermoplastic material 12 used here can be, for example, iron powder and thermoplastic plastic, respectively.The method for attaching the magnetic particles 11 is as follows:
Specifically, a perpendicularly magnetized thin film 6 is placed in a solution containing magnetic particles.
Soak. Alternatively, a method such as flowing this solution onto the perpendicularly magnetized thin film 6 may be considered. Next, as shown in FIG. 6 (Bl), the thermoplastic material 12 is heated and melted, and the magnetic particles 11 are fixed on the perpendicularly magnetized thin film 6 to form the mask 4.

Finally, as shown in FIG. 1 tq, the remaining portions of the perpendicular magnetization thin film 6' and high magnetic permeability thin film 2' cut off by the mask 4 are dissolved and removed by etching to produce a fine pattern of diffraction gratings. .

FIG. 4 is a schematic cross-sectional view showing another example of a fine pattern formed based on the present invention. This fine pattern is formed by further removing the mask 4 from the upper part of FIG. Thin film 6'
The fine pattern consisting of the high magnetic permeability thin film 2' can be used not only as a diffraction grating but also as a scale plate of Magnescale, for example, by magnetizing the perpendicularly magnetized thin film 3'.

Further, as shown in FIG. 5(A), after the process shown in FIG. 1, the substrate 1 is also etched, and from there one screen 4. By removing the perpendicular magnetization thin film 6' and the high magnetic permeability thin film 2', the fifth
It is also possible to carve fine turns on the substrate 1 itself, such as in the case of 1st ridge.

When producing the diffraction grating of the above-mentioned example, the grating pitch error was 4! of the pulse voltage in the process of forming the magnetization pattern. ! It is determined by the fluctuation of the return period and the fluctuation of the feeding speed of the medium. Therefore, in the system shown in Fig. 2,
The amount of feed υ of the medium 6 is detected by a position sensor such as a magnescale, and based on this position information, υ is sent to the signal winding 9.
By controlling the application of the pulse voltage, it is possible to fabricate a highly accurate diffraction grating. In addition, the main magnetic pole 7 can be made by using a thin film of high magnetic permeability formed by vapor deposition or sputtering on a glass substrate with good flatness instead of the thin plate of the high magnetic permeability material described above. It is also possible to improve the linearity of the diffraction grating.

The method for forming a fine pattern according to the present invention is not limited to the above-mentioned embodiments, and various variations are possible. For example, instead of using a perpendicular magnetization head, the magnetization pattern can be written optically. This method is generally known as magneto-optical recording method. To put it simply, a perpendicularly magnetized thin film is magnetized in one direction (upward or downward) in advance, and a light beam such as a laser beam is passed over the perpendicularly magnetized thin film. Scan with . In the area hit by the light beam, the humidity increases to more than a Curie point, and the magnetization direction becomes disordered. is magnetized with the direction of magnetization reversed. This principle is used to write a magnetization pattern using a light beam.

In addition, although the example shows an example in which a magnetization pattern is recorded in a straight line, it is possible to record a magnetization pattern including a curved line by variously changing the shape and number of the main magnetic poles, or by using the above-mentioned magneto-optical recording method. However, it is also possible to form even more complex micropatterns.

Furthermore, based on the present invention, not only the above-mentioned diffraction grating and scale plate but also objective electrochromators, Fresnel lenses, etc. can be manufactured.

As described above, the present invention has the effect of facilitating the formation of even finer patterns by applying the perpendicular magnetic recording method to the conventional fine pattern forming method.

[Brief explanation of drawings]

FIG. 1 (volumes 8 to 8) are schematic cross-sectional views showing the process of the method of forming a fine pattern based on the present invention, and FIG. 2 is a schematic diagram explaining the process of writing the magnetization of a fine pattern using a perpendicular magnetization head. 6 fA) and fBl are schematic cross-sectional views illustrating the process of forming a mask in the present invention, respectively. FIG. 5 (A) and (Q are schematic cross-sectional views illustrating the formation process of still other fine patterns based on the present invention, respectively. Main magnetic pole, 8... Auxiliary (1° trending pole, 9... ... Signal winding, 10... Magnetization of lattice pattern, 11-- Fist magnetic particles, 12-- Thermoplastic material procedural amendment (voluntary) February 4, 1980 Mr. Kazuo Wakasugi, Commissioner of the Patent Office Display of the case 1982 Patent application No. 200914 F#,
I'-3-30-2 people (+00) Canon Co., Ltd. Canon Co., Ltd. 1 (I:1, talk 758-211
1) 5. Specification subject to correction 6, Contents of correction 1) From the 1st line to the 2nd line of page 4 of the specification, "perpendicular magnetic head" is corrected to 1 perpendicular magnetic head. 2) Correct "perpendicular magnetization head" in line 7 of page 4 to "perpendicular magnetic head". (b) On page 7, line 6, "perpendicular magnetic head" is corrected to "perpendicular magnetic head." 4) On page 8, lines 16 to 14, ``perpendicular magnetic head'' is corrected to ``1 perpendicular magnetic head''. 39-

Claims (1)

[Claims] (1) A process of forming a perpendicularly magnetized thin film on a substrate, a process of forming a fine pattern of magnetization on the perpendicularly magnetized thin film, and a process of forming magnetic particles coated with a polymeric material on the perpendicularly magnetized thin film according to the fine pattern. A method for processing a fine pattern, comprising the steps of adhering and fixing the magnetic particles, and patterning the perpendicularly magnetized thin film according to the adhering and fixing pattern of the magnetic particles.