JPS5988878A - Surface light emitting type light emitting diode - Google Patents

Surface light emitting type light emitting diode

Info

Publication number
JPS5988878A
JPS5988878A JP57198557A JP19855782A JPS5988878A JP S5988878 A JPS5988878 A JP S5988878A JP 57198557 A JP57198557 A JP 57198557A JP 19855782 A JP19855782 A JP 19855782A JP S5988878 A JPS5988878 A JP S5988878A
Authority
JP
Japan
Prior art keywords
layer
light
light emitting
active layer
groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57198557A
Other languages
Japanese (ja)
Inventor
Kuniaki Iwamoto
岩本 邦彬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57198557A priority Critical patent/JPS5988878A/en
Publication of JPS5988878A publication Critical patent/JPS5988878A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To increase the detected amount of light for monitoring by providing a mechanism to guide light to one or more directions within the surface of an active layer, in a diode of a double hetero structure held between semiconductors having energy gap larger than that of the active layer. CONSTITUTION:By being positioned immediately under a window 29 at the center of an N type InP substrate 21, a V-groove or a mesa groove 31 is formed by chemical etching in the direction of [110], and an N type InGaAsP guide layer 32, the InGaAsP active layer 23, a P type InP layer 24, and a P<+> type InGaAsP cap layer 25 are laminated and epitaxially grown in liquid phase over the entire surface including the groove. At this time, the composition of the layer 32 is so set that the size of the band gap thereof becomes transparent to the emitted light of the layer 23. Since the refractive index of the layer 32 becomes larger than that of the substrate 21 in this manner, the distribution of actual working refractive index is generated in the layer 23 at the time of providing a projection (groove 31 here) on the layer 32 in contact with the layer 23. Therefore, the emitted light is guided to the end surface direction of the diode.

Description

【発明の詳細な説明】 この発明は、モニター光取出し装置付の表面発光型発光
ダイオードの構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the structure of a surface-emitting light emitting diode equipped with a monitor light extraction device.

AlGaAs−GaAsやIn1jaAs P−I n
P系からなる発光ダイオードは発光波長が0.85μm
及び1.3μm付近にありシリカ糸の光ファイバーの低
損先帝と一致し°Cいるため、中、短距離の各種光通信
および光情報処理用光源として実用化が進んでいる。
AlGaAs-GaAs or In1jaAs P-I n
The light emitting diode made of P-based material has an emission wavelength of 0.85 μm.
It is in the vicinity of 1.3 μm, consistent with the low loss of silica yarn optical fibers (°C), and is therefore being put into practical use as a light source for medium and short-distance optical communications and optical information processing.

表面発光ダイオードを光通信用光源に用いるとき、信号
光々量を一定に制御するためのモニター光監視装置を必
要とする場合がある。モニター光を監視するために、信
号光の一部をビーム・スプリッター等で分割し、光検出
器に導いたり、発光ダイオードをマウントしているステ
ム内での反射光の一部を検出したり、或いはpn接合面
内方向の光の一部を検出する等の方法が提案されている
が、肝要な信号光量を減少させたり、検出できる光量が
少ない等の欠点があった。そして検出光量を太きくする
ためには検出器の受光面積を大きくすればよいのだが光
通信用の発光ダイオードはできるだけ小さく設計されて
いるのため、大きな検出器を設置するためのペースがと
れないのが現実であった0 この発明の目的は、これらの欠点を解決するためになさ
れたもので、モニター光監視装置付の表面発光型発光ダ
イオードにおいて、信号光々量を減衰させることなく、
モニター用の検出光量を大きくすることのできる発光ダ
イオードを提供することにある。
When a surface light emitting diode is used as a light source for optical communication, a monitor light monitoring device may be required to control the amount of signal light to a constant level. In order to monitor the monitor light, part of the signal light is split with a beam splitter and guided to a photodetector, or part of the reflected light within the stem mounting the light emitting diode is detected. Alternatively, methods have been proposed in which a portion of the light in the direction within the pn junction plane is detected, but these methods have drawbacks such as reducing the amount of important signal light and reducing the amount of light that can be detected. In order to increase the amount of detected light, it is possible to increase the light-receiving area of the detector, but because light-emitting diodes for optical communication are designed to be as small as possible, there is no pace to install a larger detector. The purpose of the present invention was to solve these drawbacks, and the purpose of the present invention was to solve these drawbacks, and to provide a surface-emitting type light emitting diode with a monitor light monitoring device, without attenuating the amount of signal light.
An object of the present invention is to provide a light emitting diode that can increase the amount of light detected for monitoring.

この発明によれは、活性層より大きいエネルギー・ギャ
ップを有する半導体で狭まれたダブル・ヘテロ構造の表
面発光型発光ダイオードにおいて、活性層面内で一つ以
上の方向に、光を導波する機構を設けたことを特徴とす
る発光ダイオードが得られる。
According to the present invention, a mechanism for guiding light in one or more directions within the plane of the active layer is provided in a surface-emitting light emitting diode with a double heterostructure narrowed by a semiconductor having an energy gap larger than that of the active layer. A light emitting diode characterized in that it is provided is obtained.

この発明は半導体相料によらず適用できるが、光通信用
光源として注目を浴びているInGaAsP−InP系
からなるダブルへテロ構造の表面発光型発光ダイオード
の場合について、以下図面を参照して詳乳1に説明する
Although the present invention can be applied regardless of the semiconductor phase material, the case of a double heterostructure surface-emitting light emitting diode made of InGaAsP-InP system, which is attracting attention as a light source for optical communication, will be described in detail below with reference to the drawings. Explain to Milk 1.

第1図は、既に提案されているモニター光監視装置付の
表面発光ダイオードの一例を示す概念図で、ステム11
の中央部に#&看したサブマウント12上にマウントし
た表面発光型の発光ダイオード13からの信号光14は
、キャップ15の窓部16を通して、外部に等用される
。一方モニター用の光検出器17は信号光14の取出し
方向と垂直な市内の一つに、活性層と同じ高さになるよ
う配置されている。第 第2図は、表面発光型発光ダイオードの基本的構造を示
す概念的断面図で、n−InP基&21の(1oo )
 m上にn−1nPバッファ層22 、 InGaAs
P活性層23.p−InP層24及びp+−InGaA
sPキャップN25が通常の液相連続成長法で成長しで
ある。活性層23の混晶組成比は所定の波長になるよう
に予じめ選択されている。キャップ層25の一部に所定
の発光径になるように設定されたp形の部分電極26を
形成し、その周囲は、5in2やS iNx等の絶縁膜
27を被膜して発光径の制限を行なっている。n−In
P基板21上の部分を極26に対向する部分を除いてn
flllt極28を形成する。n−InP21,22は
活性層23での発光波長に対して透明であるので、信号
光14はn側電極の窓部29から外部に取出される。一
方InP 21.22 + 25の屈折率は活性層23
の屈折率より小さいので活性層23で発光した光の一部
は活性層23の面内方向に閉じ込められて端面方向に伝
搬する。従って第1図の構成において、端面光成分をモ
ニターすることが可能となる。しかし、半導体材料の屈
折率は約3.5と太きいため端面から外部に出るときに
は、屈折の法則に従って、大部分は全反射し”でしまい
検出器17で受光できる鎗はかなり少なくなっCしまり
FIG. 1 is a conceptual diagram showing an example of a surface-emitting diode with a monitor light monitoring device that has already been proposed.
Signal light 14 from a surface-emitting type light emitting diode 13 mounted on a submount 12 shown at the center of the cap 15 is transmitted to the outside through a window 16 of a cap 15. On the other hand, a monitoring photodetector 17 is placed in one of the areas perpendicular to the direction in which the signal light 14 is taken out so as to be at the same height as the active layer. Figure 2 is a conceptual cross-sectional view showing the basic structure of a surface-emitting type light emitting diode, with n-InP base &21 (1oo)
m, n-1nP buffer layer 22, InGaAs
P active layer 23. p-InP layer 24 and p+-InGaA
The sP cap N25 was grown using a conventional liquid phase continuous growth method. The mixed crystal composition ratio of the active layer 23 is selected in advance so as to have a predetermined wavelength. A p-type partial electrode 26 set to have a predetermined emission diameter is formed on a part of the cap layer 25, and an insulating film 27 such as 5in2 or SiNx is coated around it to limit the emission diameter. I am doing it. n-In
The portion on the P substrate 21 is n except for the portion facing the pole 26.
A flllt pole 28 is formed. Since the n-InP 21 and 22 are transparent to the wavelength of light emitted from the active layer 23, the signal light 14 is extracted to the outside through the window 29 of the n-side electrode. On the other hand, the refractive index of InP 21.22 + 25 is the active layer 23
Since the refractive index of the active layer 23 is smaller than the refractive index of the active layer 23, a part of the light emitted from the active layer 23 is confined in the in-plane direction of the active layer 23 and propagates toward the end surface. Therefore, in the configuration shown in FIG. 1, it is possible to monitor the end face light component. However, since the refractive index of the semiconductor material is large, approximately 3.5, when it exits from the end face, most of it is totally reflected according to the law of refraction, and the amount of light that can be received by the detector 17 is considerably reduced. .

第3図は本発明の一実施例を示す概念的断面図でn−I
nP基&21の中央部で窓部29の真下部に〔110〕
方向にv溝又はメサ状溝31を化学的エツチング法で形
成する。その上にn−InGaAsPガイド層32 、
InGaAsP活性層23.1)−InP層24、及び
p+−InGaAsPキー’flツブ層25が通常層液
5連続成長法で成長する。n−InGaAsPガイド層
32の組成は、そのバンド・キャップの大きさがInG
aAsP活性層230活性層2幻032の屈折率はn−
InP21の屈折率より大きくなるので、活性層23に
接したガイド層32に突起部(例えば31)を形成する
とその突起部の形状に応じて、活性層23内に実動的屈
折率分布が 5 − 生ずる。従って、第1図で説明した場合と同様の表面発
光型発光ダイオードにおいて限定された発光部を通過す
るようにガイド層32にV溝又はメサ状溝31を形成す
ると、活性層23の接合面内方向には光の導波作用が生
ずる。このため発光部で発光した光の接合面内成分を効
率よく、発光ダイオードの端面方向に導波することがで
きるので、第2図で生じた端面での全反射量を激減させ
ることができる。従って、第1図の構成において信号光
14の光量を減衰させることなくモニター用の光量を増
大させることができる。このため、光検出器の受光部面
積を従来の1/4s度にしても従来と同程度以上のモニ
ター信号が得られるようになった。
FIG. 3 is a conceptual cross-sectional view showing one embodiment of the present invention.
At the center of the nP group &21, directly below the window 29 [110]
A V-groove or mesa-shaped groove 31 is formed in the direction by chemical etching. On top of that, an n-InGaAsP guide layer 32,
The InGaAsP active layer 23.1)-InP layer 24 and the p+-InGaAsP key'fl bulge layer 25 are grown by a normal five-layer liquid growth method. The composition of the n-InGaAsP guide layer 32 has a band cap size of InG.
The refractive index of the aAsP active layer 230 active layer 2 phantom 032 is n-
Since the refractive index is larger than that of InP 21, when a protrusion (for example, 31) is formed on the guide layer 32 in contact with the active layer 23, the actual dynamic refractive index distribution within the active layer 23 changes depending on the shape of the protrusion. - arise. Therefore, if a V-groove or mesa-shaped groove 31 is formed in the guide layer 32 so as to pass through a limited light emitting part in a surface-emitting type light emitting diode similar to the case explained in FIG. A light waveguide effect occurs in the direction. Therefore, the in-junction surface component of the light emitted by the light emitting part can be efficiently guided toward the end face of the light emitting diode, so that the amount of total reflection at the end face that occurs in FIG. 2 can be drastically reduced. Therefore, in the configuration shown in FIG. 1, the amount of light for monitoring can be increased without attenuating the amount of signal light 14. Therefore, even if the area of the light-receiving portion of the photodetector is reduced to 1/4 s degree of the conventional one, it is now possible to obtain a monitor signal comparable to or greater than that of the conventional one.

また、この発明の発光ダイオードの量産性を考えると、
(110)方向のV溝又はメサ状溝31は直交する両方
向に形成した方がよい場合がある、つまり発光ダイオー
ド13をマウントするとき、四面ある端面のうちどの一
つが光検出器17に対向していても前述の効果は得られ
るので組立時の6 ー 作業性が著しく改善される。
Also, considering the mass productivity of the light emitting diode of this invention,
It may be better to form the V-groove or mesa-shaped groove 31 in the (110) direction in both orthogonal directions. In other words, when mounting the light emitting diode 13, which one of the four end faces faces the photodetector 17? Since the above-mentioned effects can be obtained even if the assembly is carried out, the workability during assembly is significantly improved.

以上(この発明について)InGaAsP活性層P糸の
表面発光型発光ダイオードについて詳細に説明してきた
が、この発明は表面発光型発光ダイオードなら他のいか
なる半導体材料の発光ダイオードにも適用できるととも
に、導電型を入れ換えた構造においても適用できること
はいうまでもない。
(About this invention) Although the surface-emitting light-emitting diode made of InGaAsP active layer P yarn has been described in detail, this invention can be applied to light-emitting diodes made of any other semiconductor material as long as it is a surface-emitting light-emitting diode. Needless to say, it can also be applied to a structure in which the two are replaced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のモニター光監視装置は表面発光型発光ダ
イオードの一例を示す断面図、第2図は従来の表面発光
型発光ダイオードの基本的構造を示す概念的断面図、第
3図はこの発明の一実施例を示す概念的断面図である。 11・・・・・・ステム、12・・・・・・サブマウン
ト、13・・・・・・表面発光型発光ダイオード、】4
・・・・・・信号光、15・・・・・・キャップ、16
・・・・・・ガラス窓、17・・・・・・モニター用検
出器、21・・・・・・n−InP基板、22・・・・
・・n−InPバッファtil!、23・・・・・・I
nGaAsP活性層、24・・・・・・p−InP、2
5・・・・・・p”−InGaAsPキーvyプ層、2
6 、28”””p + n電極、27・・・・・・絶
縁膜、29・・・・・・光透過窓、31・・・・・・V
溝又はメサ状溝部。 第1図 4 第2図 第3図
Fig. 1 is a cross-sectional view showing an example of a surface-emitting light emitting diode in a conventional monitor light monitoring device, Fig. 2 is a conceptual cross-sectional view showing the basic structure of a conventional surface-emitting light emitting diode, and Fig. 3 is a cross-sectional view showing an example of a surface-emitting light emitting diode. 1 is a conceptual cross-sectional view showing one embodiment of the invention. 11...Stem, 12...Submount, 13...Surface emitting type light emitting diode, ]4
...Signal light, 15 ...Cap, 16
...Glass window, 17...Monitor detector, 21...n-InP substrate, 22...
...n-InP buffer til! , 23...I
nGaAsP active layer, 24... p-InP, 2
5...p''-InGaAsP keep layer, 2
6, 28"""p + n electrode, 27...Insulating film, 29...Light transmission window, 31...V
Groove or mesa-like groove. Figure 1 4 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 活性層より大きいエネルギー・ギャップを有する半導体
で狭まれたダブル・ペテロ構造の表面発光型発光ダイオ
ードにおいて、活性層面内で一つ以上の方向に光を導波
する機構を設けたことを特徴とする発光ダイオード。
A surface-emitting light emitting diode with a double Peter structure narrowed by a semiconductor having an energy gap larger than that of the active layer, characterized by providing a mechanism for guiding light in one or more directions within the plane of the active layer. light emitting diode.
JP57198557A 1982-11-12 1982-11-12 Surface light emitting type light emitting diode Pending JPS5988878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57198557A JPS5988878A (en) 1982-11-12 1982-11-12 Surface light emitting type light emitting diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57198557A JPS5988878A (en) 1982-11-12 1982-11-12 Surface light emitting type light emitting diode

Publications (1)

Publication Number Publication Date
JPS5988878A true JPS5988878A (en) 1984-05-22

Family

ID=16393157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57198557A Pending JPS5988878A (en) 1982-11-12 1982-11-12 Surface light emitting type light emitting diode

Country Status (1)

Country Link
JP (1) JPS5988878A (en)

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