JPS5988732A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS5988732A
JPS5988732A JP19936482A JP19936482A JPS5988732A JP S5988732 A JPS5988732 A JP S5988732A JP 19936482 A JP19936482 A JP 19936482A JP 19936482 A JP19936482 A JP 19936482A JP S5988732 A JPS5988732 A JP S5988732A
Authority
JP
Japan
Prior art keywords
vinyl
photosensitive
monomer
composition
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19936482A
Other languages
Japanese (ja)
Other versions
JPH0368377B2 (en
Inventor
Tsugio Yamaoka
亜夫 山岡
Kiyomi Sakurai
桜井 清美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP19936482A priority Critical patent/JPS5988732A/en
Publication of JPS5988732A publication Critical patent/JPS5988732A/en
Publication of JPH0368377B2 publication Critical patent/JPH0368377B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain an image forming material developable with water and giving an image with superior resistance to water, acid and solvent by emulsion- polymerizing a vinyl monomer having a photosensitive group with other monomers including a monomer having two or more polymerizable vinyl groups in the molecule. CONSTITUTION:When a vinyl monomer having a photosensitive group is emulsion-polymerized with other vinyl monomers, a monomer having >=2 polymerizable vinyl groups in the molecule is used by >=1wt% of the amount of other vinyl monomers. By blending the resulting resin emulsion composition, a photosensitive resin composition is obtd. Said vinyl monomer having a photosensitive group is a water insoluble liq. monomer such as the ester of carboxylic acid having an azido group with a vinyl monomer having a hydroxyl group or the adduct of an isocyanate compound having an azido group to a vinyl monomer having a hydroxyl group.

Description

【発明の詳細な説明】 本発明は水で現像でた、しかち得られた画像が耐水性、
耐酸性、耐溶剤性等の諸性性に優れた画像形成材料に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides an image developed in water, and the resulting image is water resistant.
This invention relates to an image forming material that has excellent properties such as acid resistance and solvent resistance.

製版用感光性材料は、現像によって未露毘部または露光
部のいずれかに相当する部分の感光膜が除去され、得ら
れた画像を金属腐食用のレノス)としてや印刷j′FL
として利用するものである。かかる感光性材料として要
求される性能として最も好ましい形態は、現像が水道水
でできることであり、1!1られた画像が親油性良好で
しかも耐溶剤性、耐摩耗性か良好であれば平版印刷版と
して利用でき、また耐酸性か良好であれば金属1順り用
のフォトレノストとして利用でき、また耐水性か良好で
あれば各種画像形成材料として利用できる。
The photosensitive material for plate making is developed so that the photosensitive film in the areas corresponding to either the unexposed area or the exposed area is removed, and the resulting image is used as a photosensitive material for metal corrosion or printing.
It is used as a. The most preferable form of performance required for such a photosensitive material is that development can be done with tap water, and if the 1:1 developed image has good lipophilicity and good solvent resistance and abrasion resistance, it can be used for lithographic printing. It can be used as a printing plate, and if it has good acid resistance, it can be used as a photorenost for metal 1 grade, and if it has good water resistance, it can be used as various image forming materials.

このような製版用感光性材料として各種の材料か開発さ
れ、使用に供されているが、これらはいずれも−]−記
条件を沼J足していない。例えば水現像できる感光性材
料として知られているン゛アゾ樹脂は、耐摩耗性が劣る
ため、印刷版として使用するためにはランカーによる補
強が必要である5、金属加工用フォトレノストとして知
られているポリビニルアルコールのケイ酸エステルは、
耐酸性は良好だが、溶剤現像であるという欠点がある。
Although various materials have been developed and put into use as such photosensitive materials for plate making, none of these materials meet the conditions described below. For example, azo resin, which is known as a photosensitive material that can be developed with water, has poor abrasion resistance and requires reinforcement with a lunker in order to be used as a printing plate5. The silicate ester of polyvinyl alcohol is
Although it has good acid resistance, it has the disadvantage of being developed in a solvent.

かかる従来の感光性材料の欠点を改良した感光性材料と
して、本発明者らは、アン゛ド基を有するビニルモノマ
ーと他のビニルモアマーと1L(tJ介して21i+ら
れる自己感光性ポリマーの水+1エマルンヨンを用いる
と、水現像でき、しかも画像は親油性があるため、イン
キ受理・1)1、耐摩耗・l’l良I1.IIな印刷版
が得られることを見い出しすてに特5′[出IQjlし
テイル(特開昭56 67i:48y3)。:ノチノは
従来の感光性材料と異なり、水で現像て゛き、(θ・j
摩耗性、耐酸性に曖れた材料ではあるか、画像形成にお
いてエマルン′ヨンを形成するポリマ〜Ihr間で光架
橋を行なわせるため、画像の再現・1)1−において従
来の均一な溶液系の感光材料に比べて劣るという欠点が
判明した1、即ち、杓丁−同志のつなかりにおいて画像
を形成するため、画像の周jU部においてシャープな輪
郭か得られない1、またボリマーネ(!1間でのた架橋
は進むか、ポリマー勅r内・\の光の透過か不足するた
めポリマーR,1’の光架橋か不足することにより、耐
溶剤性において好ましくない結果を有する5:とら’I
’l+明した3゜本発明者らは1−記欠点を改良すべく
鋭、u611究を・進め、本発明を完成した。即ち、感
光J1(を有するビニル千77−と他の一種または一神
具1゛のビニ3− ルモ7マーとを乳化重合する際、池のビニルモノマーの
少なくとも1重量%以−1−として分子内に2イ1硝;
J汁の重合性ビニル基を有するモアマーを使用して1)
jられる樹脂エマルジョン糺成物を配合して成る感光性
樹脂組成物を用いることにより、」1記欠点か解消され
ることを見い出した。このように!L化重合時に多官能
のビニルモアマーを添加することにより、密に橋かけし
たミクロゲルの水分散能か得られるから、一般のラテッ
クスよりも微細な粒子が得られて、均−溶剤系から得ら
れる画像に近くなり、輪郭のシャープな画像が得られる
In order to develop a photosensitive material that improves the drawbacks of such conventional photosensitive materials, the present inventors have developed a method of combining a vinyl monomer having an anddo group, another vinyl momer, water + 1 emulsion of a self-photosensitive polymer which is 21i+ via tJ. When used, it can be developed with water, and the image is lipophilic, so it has good ink acceptance, 1) 1, abrasion resistance, and good I1. It was discovered that a printing plate with the highest quality could be obtained. : Unlike conventional photosensitive materials, Nochino can be developed with water, and (θ・j
Although it is a material whose abrasion resistance and acid resistance are uncertain, in order to perform photocrosslinking between the polymer and Ihr that form the emulsion in image formation, image reproduction 1) Conventional uniform solution system in 1- 1, which was found to have a drawback that it was inferior to the photosensitive materials of 1. That is, since the image is formed at the connection between the ladle and the comrades, a sharp outline could not be obtained at the periphery of the image. 5: The cross-linking between 1' and 1' progresses, or the light transmission within the polymer 1' is insufficient, resulting in insufficient photo-crosslinking of the polymer R, 1', which has unfavorable results in terms of solvent resistance. 'I
In order to improve the drawbacks noted in 1-, the inventors of the present invention made extensive research into u611 and completed the present invention. That is, when emulsion polymerizing vinyl 3-77-mer having photosensitive J1 (177-) and vinyl 3-77-mer of another kind or one divine tool 1, at least 1% by weight of the vinyl monomer in the 1-1- 2 in 1 nitrate;
1) Using Moamer with polymerizable vinyl group of J juice
It has been found that by using a photosensitive resin composition containing a resin emulsion paste composition, the disadvantage described in item 1 can be overcome. in this way! By adding a polyfunctional vinyl moamer during L-polymerization, the water dispersibility of a densely cross-linked microgel can be obtained, resulting in finer particles than ordinary latex, which improves the image quality obtained from a homogeneous solvent system. , resulting in an image with sharp outlines.

また個々の粒子か密に橋かけしていることにより、耐溶
剤性、耐久性に優れた感光性材料か得られる。
Furthermore, since the individual particles are tightly cross-linked, a photosensitive material with excellent solvent resistance and durability can be obtained.

本発明における感光基を有するビニルモアマー(以下、
感光性モアマーと称す)は、水に溶解しない液体状のも
のであって、例えばアジド基を有するカルボン酸(アッ
ト安息香酸、アジドベンゼンスルホン酸、これらの誘導
体など)とヒドロキシル基を有するビニルモアマー(ヒ
ドロキシエチルアクリレート、ヒドロキシエチルメタク
リレート=4− なと)とのエステル化物、または7ノド」、1、をイ1
するイソンアネー1化合物(アンド7Iニルイソンアネ
ート、その誘導体など)と1−記ヒFロキシル基を有す
るビニルモア7−とのイ・l加物が挙げられ、具体的に
は・4−アット安p、杏酸2−メタクリロイロキシエチ
ル、・1−アンド安p、6酸2−7クリロイロキシエチ
ル、・1−アット安p、杏酸1−メナル−−2−メタク
リロイロキジエチル、・1−アジドベンゼンスルホン酸
2−メタクリロイロキジエチル、・′1−アジドフェニ
ルカルバミド酸2−メタクリロイロキシエチル等か例示
される。飢の感光性モノマーとじては、ベンゾインまた
はベンゾフェノンを側鎖に有するアクリル酸またはメタ
クリル酸のエステル化物か挙げられる。その例示として
は、ベンゾインアクリレ−)・、ヘンジインメタクリレ
ート、・1−アクリロイロキシベ/ゾ7工7ン、・1−
メタクリロイロキシベンゾフエ/ン、ビニルベンゾフェ
ノン等が例示される。、これらの14ΦJたは2神具−
1−を使用に供する。
Vinyl molymer having a photosensitive group in the present invention (hereinafter referred to as
Photosensitive moamers (referred to as photosensitive moamers) are liquids that do not dissolve in water, such as carboxylic acids with azide groups (atbenzoic acid, azidobenzenesulfonic acid, derivatives thereof, etc.) and vinyl moamers with hydroxyl groups (hydroxyl moamers). esterified product with ethyl acrylate, hydroxyethyl methacrylate = 4-, or
Examples include 1-1 adducts of isonane 1 compounds (and7I nylisonanate, derivatives thereof, etc.) and vinylmore 7- having a 1-hyfuroxyl group; 2-Methacryloyloxyethyl anthate, ・1-and-amp, 2-7-ammonyl 6-acid, ・1-at-amp, 1-menal--2-methacryloyloxyethyl anthate, ・1- Examples include 2-methacryloyloxyethyl azidobenzenesulfonate and 2-methacryloyloxyethyl .'1-azidophenylcarbamate. Examples of photosensitive monomers include esters of acrylic acid or methacrylic acid having benzoin or benzophenone in the side chain. Examples include benzoin acrylate), hengeine methacrylate, 1-acryloyloxybe/zo7-7, 1-
Examples include methacrylyloxybenzophenone and vinylbenzophenone. , these 14ΦJ or 2 sacred tools-
1- is put to use.

本発明における分子内に2個以−I−の重合性ビニルノ
1(を有するビニルモア7−(以下、多官能性ヒニルモ
77−ト称−i )としては、ジ゛ビニルベンゼン、エ
チレングリフールノ(メタ)アクリレート(エチレング
リコールノアクリレートとエチレングリコールノメタク
リレ−1・の両者を示す、以下同様)、ネオペンチルク
リコールノ(7り)アクリレート、メチレンビスアクリ
ルアミド、トリメチロールプロパン)す(メタ)アクリ
レ−)・、テトラメチロールメタンテトラ(メタ)アク
リレート等が一例として挙げられる。かがる多官能+1
ビニルモノマーと(W用できる池のビニルモノマーとし
ては、一般的なビニルモノマーはすべて使用できる。例
えば、スチレン、酢酸ビニル、アクリル酸メチル、メタ
クリル酸メチル、アクリル酸エチル、メタクリル酸エチ
ル、アクリル酸等が挙げられる。
In the present invention, examples of the vinylmore 7- (hereinafter referred to as polyfunctional vinyl 77-i) having two or more -I- polymerizable vinyl molecules in the molecule include divinylbenzene, ethylene glycol ( meth)acrylate (indicates both ethylene glycol no acrylate and ethylene glycol no methacrylate-1, the same shall apply hereinafter), neopentyl glycol acrylate, methylene bisacrylamide, trimethylol propane) (meth) acrylate -)., tetramethylolmethanetetra(meth)acrylate, etc. are mentioned as examples. Kagaru multifunctional +1
All common vinyl monomers can be used for vinyl monomers and (W). For example, styrene, vinyl acetate, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, acrylic acid, etc. can be mentioned.

感光性モアマーと池の一種または二種以上のビニル千7
マーの2L化重合における比率は、感光性千77−3〜
70重量%、好ましくは5〜60重h:、%と他のビニ
ルモア7−30−り7重量%、好、tしくは4()・−
05重部1%である。感光+r1モアマーを適i「範囲
の下限を越えて使用すると、感光・Vlか↑;足して画
像形成か困知になり、十限を越えて使用すると皮膜の耐
久・ビ1が不足する1、上記した飢のビニルモア7−の
うもの少なくとも1屯ij″t、%以上、好ましくは3
重F11%以−1−において11’i’ fri竹ビニ
ルモ/マーか゛使用される。かがるビニルモノマーを下
限以ドの量で使用すると、皮膜の耐溶剤・1f1、画像
画現性が劣る。
One or more types of vinyl photosensitive moamer and pond
The ratio in the 2L polymerization of mer is photosensitive 177-3~
70% by weight, preferably 5 to 60% by weight and 7% by weight of other vinyl moles 7-30-, preferably t or 4().-
05 weight part is 1%. If you use the photosensitive + r1 moamer beyond the lower limit of the range, it will be difficult to add the photosensitive Vl or image formation, and if you use it beyond the 10 limit, the film will lack durability and Bi1. The above-mentioned starved vinyl mower 7 - at least 1 ton, % or more, preferably 3
11'i' fri bamboo vinyl resin/mer is used in a heavy F of 11% or more. If the darkening vinyl monomer is used in an amount less than the lower limit, the solvent resistance, 1f1, and image development properties of the film will be poor.

乳化重合は通常の条f’lす;よび不法にJ:り行なっ
てよく、例えば不活fr力゛ス雰囲気中、通常の保護コ
ロイド、7L化剤I;よU゛反応開始^11の存イ11
ζでモノマーを滴下しながら、温度6 (,1−8、”
)°Cで2〜5時間重介させることでよい。1−2保5
(コロ伺パとしては、ポリビニルアルコール、ポリビニ
ルピロリドン、アルキルセルロース類、ポリアクリルア
ミド、ポリメタクリルアミド等の水溶性高分子かイφ用
できる。本発明にあっては、’i’L化屯合時にかかる
保護コロイドを使用せずに行なってもよいし乳化重合後
に添加して使用することら可能である。
Emulsion polymerization may be carried out in the usual manner and illegally, for example in an inert gas atmosphere, with the presence of conventional protective colloids, 7L-forming agents I, and U-reaction initiation. I11
While dropping the monomer at ζ, the temperature is 6 (,1-8,”
) C. for 2 to 5 hours. 1-2 protection 5
(Water-soluble polymers such as polyvinyl alcohol, polyvinylpyrrolidone, alkyl celluloses, polyacrylamide, polymethacrylamide, etc. can be used as the roller. In the present invention, when The process may be carried out without using such a protective colloid, or it may be used by adding it after emulsion polymerization.

」二記、7L化剤や反応開始剤は一般的な刑が使用でき
る。即ち、IL化剤にあってはカチオン性、アニオン性
、非イオン性の10ヒ剤のいずれもが使用できる。反応
開始剤としては過硫酸塩類、亜硫酸水素塩類等が挙げら
れる。
”2, 7L-forming agents and reaction initiators can be used in general manner. That is, any of cationic, anionic, and nonionic agents can be used as the IL agent. Examples of the reaction initiator include persulfates and hydrogen sulfites.

本発明にあっては、以上のようにして得られる樹脂エマ
ルジョン組成物に池の材を添加することも可能である。
In the present invention, it is also possible to add pond material to the resin emulsion composition obtained as described above.

かかる材の一例を挙げると、皮膜強度の向上、基材との
密着力の向」二等のための、常圧で1(月)℃以−11
の沸点を有する重合性エチレン系不飽和化合物である。
An example of such a material is a material that can be heated to -11°C or lower for 1 (month) at normal pressure in order to improve film strength and improve adhesion to the base material.
It is a polymerizable ethylenically unsaturated compound with a boiling point of .

その具体例としては、例えば(メタ)アクリルアミド、
N、N’−メチレンビス(メタ)アクリルアミド、N−
メチロール(メタ)アクリルアミド、トリアクリルホル
マール、11−ブトキシメチル(メタ)アクリルアミド
、N−t−メチル(メタ)アクリルアミド、ナ1リウム
(メタ)アクリレート、カルシウム(メタ)アクリレー
ト、ジンク(メタ)アクリレート、アルミニウム(メタ
)アクリレート、ポリエチレングリフールジ(メタ)ア
クリレート、2−ヒドロキシエチル(メタ)アクリレ8
− 一ト、2−ヒドロキシエチル(メタ)アクリr−−1、
あるいはエポキシやウレタンから誘導されるアクリルオ
リコマ−なと′で゛ある。、ニゲ)、1、うな1刊合・
l/lエチレン系ト飽和化合物の添加は、感光ノ1(と
して−\ンゾインやペンシフ□ノンを有するビニル千7
で−によるエマルジョンを用いた場合に特に効果的であ
る。かがる材の添加箪範凹は、上記(相指エマルンヨン
糺成物の固型分に対して、3〜10()重量%が好まし
い。
Specific examples include (meth)acrylamide,
N, N'-methylenebis(meth)acrylamide, N-
Methylol (meth)acrylamide, triacryl formal, 11-butoxymethyl (meth)acrylamide, Nt-methyl (meth)acrylamide, sodium (meth)acrylate, calcium (meth)acrylate, zinc (meth)acrylate, aluminum (meth)acrylate, polyethylene glyfur di(meth)acrylate, 2-hydroxyethyl (meth)acryle 8
- monoto, 2-hydroxyethyl (meth)acrylic r--1,
Alternatively, it is an acrylic olicomer derived from epoxy or urethane. , Nige), 1, Una 1 Publication/
The addition of l/l ethylene-based saturated compounds can be applied to photosensitive compounds such as vinyl chloride containing
This is particularly effective when an emulsion is used. The amount of addition of the darning material is preferably 3 to 10% by weight based on the solid content of the emulsion paste composition described above.

以−11の構成から成る本発明組成物は1.7L化重合
時に多官能性ビニル七77−が添加されている二とから
、高度に架橋したポリマー粒子が水に分散した状態で成
っているため、感光液としての保存性もよく、さらに該
組成物を基体上に塗布乾燥して得られた皮膜の貯蔵安定
性も良好であるため、予備増感された画像形成材料とし
て非常に有用なものである。さらにポリマー粒子自体が
あらh化め高度に架橋されているため、かがるボリマー
ネ?。
The composition of the present invention, which has the following constitution (11), contains highly crosslinked polymer particles dispersed in water due to the addition of polyfunctional vinyl 77-77 during the 1.7L polymerization. Therefore, it has good storage stability as a photosensitive solution, and the storage stability of the film obtained by coating and drying the composition on a substrate is also good, making it very useful as a presensitized image forming material. It is something. In addition, the polymer particles themselves are abrasive and highly crosslinked, causing them to become dull. .

1間の架橋で得られた画像は優れた耐水性、耐溶剤性、
耐酸性、耐摩耗性等を有する。しがちががる優秀な画像
が水現像−二よっても得られるという特色をも有する。
Images obtained by crosslinking between 1 and 2 have excellent water resistance, solvent resistance,
Has acid resistance, wear resistance, etc. It also has the feature that excellent images with distinct differences can be obtained even after water development.

。 本発明組成物を基体−1−に塗布し、乾燥した後ネガフ
ィルムを介して紫外線を照射すると、露光部か硬化して
水にXlξ溶になるいわゆるネガタイプの感光性材料に
なる。硬化した皮膜は耐酸性にすぐれているので、金属
加工用の7オトレノストまjこはスクリーン印刷用レノ
入トとして使用でき、主だ水の存在で油性インキを受け
つけ、耐摩耗性、耐溶剤性が良好で゛あるので耐刷力を
要する平版用オフセフ1S版としても用いることができ
る。
. When the composition of the present invention is applied to a substrate-1-, dried, and then irradiated with ultraviolet rays through a negative film, the exposed areas harden to become a so-called negative-type photosensitive material that becomes Xlξ-soluble in water. The hardened film has excellent acid resistance, so 7-Otrenost Mako for metal processing can be used as a refill for screen printing, and mainly in the presence of water, it accepts oil-based inks and has excellent abrasion and solvent resistance. Since it has good properties, it can also be used as an offset 1S plate for lithography which requires printing durability.

次に実施例および比較例を挙げて本発明を具体的に説明
する。
Next, the present invention will be specifically explained with reference to Examples and Comparative Examples.

実施例1 攪拌装置、温度計、窒素注入管および還流冷却管を取り
付けた四つ目フラスコ中に水] 1:+ +:+重量部
およびラウリル硫酸ナトリウム2重量部をいれて:((
)分間かけて窒素置換した。次いで温度を710°Cに
あげてから、4−アンド安、Q、6酸2−メタクリロイ
ロキシエチル 1()重量部、又チレン8重型部お上び
/ヒニルベンヤン11いjj) +’slS i、 混
合したモア7−混合物のうちの10屯11)%分を加え
、(30分攪拌した91反応開始削とし′ζ過硫酸カリ
ウム0.2屯64部および亜硫酸水素す)・リウl、(
)。
Example 1 Into a fourth flask equipped with a stirrer, a thermometer, a nitrogen injection tube, and a reflux condenser, add 1:+ +:+ parts by weight of water and 2 parts by weight of sodium lauryl sulfate: ((
) The air was replaced with nitrogen over a period of 1 minute. Then, the temperature was raised to 710°C, and then 1 part by weight of 2-methacryloyloxyethyl 4-andoamine, Q, 6-acid, and 8 parts of tyrene/hinylbenyan 11 parts by weight were added. , Add 10 ton (11)% of the mixed Moa 7-mixture and stir for 30 minutes (91 reaction start, 64 parts of 0.2 ton of potassium persulfate and 64 parts of hydrogen sulfite).
).

2重量部をそれぞれ水S IjHt部に溶解した水溶、
1ダの10重に%分の1jYを加えてかり?L!晶腰;
?(1分後に6(,1”(:になったと、−ろで残1j
(のモアマー市合液と反応開始剤水溶液を少しずつ滴〔
した15滴1・゛中湿度を7 (1= 75°Cに保ち
、滴1ζ終J′後冑1度を)i f−1’(:に保ちな
から;(時間攪拌を続け7L化重合を・行なった後ン晶
度を室ン品lこIζ1す゛た。
an aqueous solution in which 2 parts by weight were each dissolved in SIjHt parts of water,
How about adding % of 1jY to 10 times of 1 da? L! Akiko;
? (After 1 minute, it becomes 6 (, 1”
Slowly drop the Moamar mixture solution and the reaction initiator aqueous solution.
15 drops 1.゛The humidity was kept at 7 (1 = 75 °C, and after the end of the drop 1 After doing this, the crystallinity of the product was reduced to 1.

このようにして得られた7L化1ト合物] il f1
Φ15′部に7重量%濃度のポリビニルアルコール水溶
液1 (’l fi市祉部を添加して感光性U(脂釦成
物とした。
7L-1 compound thus obtained] il f1
A 7% by weight polyvinyl alcohol aqueous solution 1 was added to the Φ15' portion to obtain a photosensitive U (fatty phosphorescent product).

二の組成物をホワラーを用いて砂[lアルミ板に塗布し
、乾燥した。−晩放置後ネ〃フィルムを真空密着してケ
ミカルランプで:(分間露光を行い、水道水の流水下で
綿で、ニすることにより現像を11なった後、クリスタ
ルヴイオレント水溶液をかけて画像部を染色し、画像を
見やすくした。、二の画像を11− 工学顕微鏡を用いて観察したところ、画像周辺部の輪り
1−はシャープであった。さらにこのものをゴl、例外
した後、水の存在下でオフセント用油性インキを版面に
こすりつけると、画線部のみインキか゛着肉した。この
ものをオフセント印刷機にかけて印刷を実施したところ
、鮮明な印刷画像が得られた。
The second composition was applied to a sand aluminum plate using a whirler and dried. - After leaving it overnight, the film was vacuum-adhered and exposed with a chemical lamp: (Exposed for one minute, developed by rubbing with a cotton ball under running tap water until the temperature reached 11. The image area was stained to make the image easier to see. When the second image was observed using an engineering microscope, the ring 1- around the image periphery was sharp. After that, when oil-based offset ink was rubbed on the printing plate in the presence of water, the ink was deposited only on the image area.When this was printed using an offset printing machine, a clear printed image was obtained.

また砂目アルミ板に塗布した材料をco’cのオーブン
中で6時間保存しtこ後、連続調濃度変化なイアするコ
ダックフオトグラフインクステップタブレッ)No、2
を真空密着し、露光、水現像と同様に処理したところ、
60°Cでの保存前と後の版についてステンプの残存段
数に変化はなかった。
In addition, after storing the material coated on a grained aluminum plate for 6 hours in a CO'C oven, there will be no continuous tone density change (Kodak Photo Ink Step Tablet) No. 2
When it was vacuum-adhered and processed in the same manner as exposure and water development,
There was no change in the number of remaining steps of the stencil between the plates before and after storage at 60°C.

さらにこのようにして得られたエマルジョン状態の感光
性樹脂組成物を暗所において6ケ月ftl+貯蔵しすこ
液は外観J−,変化はなかったし、この液を用いて」1
記と同様に処理してアルミ板−1−に画像を作成しtこ
ところ、6ケ月前の画像と同等であった。
Further, the photosensitive resin composition in the emulsion state thus obtained was stored in a dark place for 6 months, and the appearance of the liquid was J-, with no change.
An image was created on aluminum plate-1 by processing in the same manner as described above, and it was identical to the image taken 6 months earlier.

比較例1 実施例1においてシ゛ビニルベンゼン1重量部を12− 用いずに、池は実施例1と同様に処理して感光性t84
脂組成物をIj)た、2この組成物をホワラーをIIい
て砂11アルミ板に塗布し乾燥した4、 晩放置律ネ7
7′フィルムを真空密着してケミカルランプで5分間露
光を行い、水道水の流水ドで綿で、−すって現像を行っ
た。この画像を実施例1と同様にして顕微鏡で観察した
ところ、画像周辺部の輪郭かシャープでなく、凹凸のあ
る画像であった。
Comparative Example 1 The pond was treated in the same manner as in Example 1, except that 1 part by weight of vinylbenzene was not used in Example 1 to obtain photosensitive T84.
A fat composition was prepared (Ij), 2) This composition was coated on a sand 11 aluminum plate using a whitewasher, and dried.4.
The 7' film was vacuum-adhered, exposed for 5 minutes using a chemical lamp, and developed by rubbing it with a cotton pad under running tap water. When this image was observed under a microscope in the same manner as in Example 1, it was found that the outline of the peripheral part of the image was not sharp and had irregularities.

さらに砂11アルミ板に塗布した材料をG (1”Cの
オーフン中で6時間保存した後、フグンク7ォトグラフ
ィックステソプタブレントNO,2を製版したところ、
保存前の版に比ベステップの残(r段数が4〜5段のび
、現像しにくくなっていた。
Furthermore, after storing the material coated on the Sand 11 aluminum plate for 6 hours in a G (1"C oven), the Fugunku 7 Photographic Step Tablet No. 2 was made into a plate.
The plate before storage had residual steps (the number of steps had increased by 4 to 5), making it difficult to develop.

またこのようにして得られたエマルジョン状態の感光性
樹脂組成物をIfi所において貯蔵したところ、2ケ月
て゛エマルジョンが黄変し、0ケ月後1こはエマルジョ
ンか破壊し、沈殿物が発生した。
Furthermore, when the thus obtained photosensitive resin composition in the form of an emulsion was stored at an Ifi facility, the emulsion turned yellow after two months, and after one month, the emulsion broke and a precipitate was generated.

実施例2 4−アット安Q、杏酸2−7クリロイロキシエチル] 
(l 重f1 部、スチレン7重す部、ジヒニルベンゼ
ン2.5重電部を用いて、泄は実施例1と同様に処理し
て感光(JI I+脂組成物を1rlた。、二のものを
砂[1アルミ板に塗布し、(i (’l ’(:のオー
7ン中でに時間保存した板と、該熱処理していない板と
をケミカルランプで゛3分間露光し水道水の流水下で綿
で゛、ニすることにより現像を行った後、クリスタルウ
゛イオレット水溶液をかけて画像部を染色した。
Example 2 4-at-an Q, 2-7 chloroyloxyethyl kanoate]
The excretion was treated in the same manner as in Example 1 using 1 part by weight, 7 parts by weight of styrene, and 2.5 parts by weight of dihinylbenzene. Sand [1] was applied to an aluminum plate, and the plate was stored in an oven for 7 hours and the unheated plate was exposed to a chemical lamp for 3 minutes, and then exposed to water under running tap water. After development was carried out by wiping with cotton, the image area was dyed with an aqueous solution of crystal violet.

、二のらのは両者ともステンプ段数に段で、差はなかっ
た。画像周辺部の輪郭はシャープであり、この版を用い
て印刷したところ魚Y明な印刷画像が得られた。
, Ninora's both had a step number of steps, and there was no difference. The outline of the image periphery was sharp, and when this plate was used for printing, a bright printed image was obtained.

このエマルジョン状態の感光性樹脂組成物を暗所におい
て6ケ月間貯蔵したところ、液の外観−]―の変化はな
く、この液を用いて画像を作ったところ、6ケ月前の画
像と同等で・あった。
When this photosensitive resin composition in an emulsion state was stored in a dark place for 6 months, there was no change in the appearance of the liquid, and when images were made using this liquid, they were the same as the images made 6 months ago. ·there were.

実施例:( 実施例2において、・1−アシF安Q、杏酸2−アクリ
ロイロキシエチル10重量部のがわりにベンゾインアク
リレ−+1o重遭部を用いて、他は実施例〕の重合方法
に従って同様に処理し乳化重合物を得た。このようにし
て1(1られた7L化屯合物10fl 重ji+部に7
千11F%濃度のポリヒニルアルフール水溶液1 (1
(l取量71ζ、アクリルアミド゛1屯箪部、N 、 
N ’−メチレンビスアクリルアミド1屯厭部を混合し
て感光1−1(相指釦成物とした。。
Example: Polymerization of (in Example 2, using benzoin acrylate + 1o polymerization part in place of 1-acyanF-anQ and 10 parts by weight of 2-acryloyloxyethyl cyanoate, and the other parts are as in Example)) A similar treatment was carried out according to the method to obtain an emulsion polymer.In this way, 7L was added to 10fl of the 7L compound obtained in 1
Polyhinyl alfur aqueous solution 1,11F% concentration (1
(Amount of 71 ζ, 1 ton of acrylamide, N,
One part of N'-methylenebisacrylamide was mixed to obtain Photosensitive 1-1 (composite button product).

この組成物をホワラーを用いて砂11アルミ根1−に塗
布し乾燥した。−晩放置後ネヵ゛フィルl、を真空密着
してケミカルランプでj)分間露先を11ない、水道水
の流水1ζて・、ニすることにより現像を行なったとこ
ろ、良好な現像+1を示した。さらにこのものをゴl、
引きした後、水の(r在ドでオ7セノF用油性インキを
版面にこすりつけると、画線部のみインキか着肉した。
This composition was applied to sand 11 aluminum roots 1- using a whirler and dried. - After leaving it overnight, I vacuum-adhered the film and developed it with a chemical lamp for 11 minutes with the dew point turned off for 11 minutes and then running tap water for 1 minute. Indicated. Furthermore, gol this thing,
After drawing, when I rubbed the O7 Seno F oil-based ink on the printing plate with water, the ink was inked only in the image area.

このものをオフセラ1. Fll刷機にかけて印刷を天
施したところ、魚Y明な印刷画像か得られ、15万部印
刷にも変化はなかった。
This item is off-seller 1. When the paper was printed on a full press, a very bright printed image was obtained, and there was no change even after 150,000 copies were printed.

実施例・1〜11 実施例1と同様の)i法で、第1表に示1モア7−を使
用して乳化重合を行ない、樹脂エマルジョン糾成物を製
造する。各実施例の!l成物に−)いて、実施例1と同
様な試験を行なった結果、水現像ヤ1、15− 画像のシャープさ、インキ着肉性、保存性にす5いて実
施例1の組成物と同程度の効果が認められた。
Examples 1 to 11 Emulsion polymerization was carried out using the same method (i) as in Example 1 using 1 moa 7- as shown in Table 1 to produce a resin emulsion compact. of each example! As a result of conducting the same tests as in Example 1, it was found that the water developer 1, 15- was superior to the composition of Example 1 in terms of image sharpness, ink receptivity, and preservability. Similar effects were observed.

16− *モアマーA: 4−アジド安息香酸2−メタクリロイ
ロキシエチル モノマーB :  、=1−アンド安息香酸1−メチル
ー2−メタクリロイロキシエチル モノマーC: ・1−アンドフェニルカルバミド酸2−
メタクリロイロキシエチル モ/マーD:4−アクリロイロキシベンゾフェノン ** 実施例3に従って処理した。
16- *Moamer A: 4-azidobenzoic acid 2-methacryloyloxyethyl monomer B: , =1-andbenzoic acid 1-methyl-2-methacryloyloxyethyl monomer C: ・1-andophenylcarbamic acid 2-
Methacryloyloxyethylmo/mer D: 4-acryloyloxybenzophenone** Treated according to Example 3.

特許出願人 日本ペイント株式会社 代理人弁理士青山 葆 ほか1名 19−Patent applicant: Nippon Paint Co., Ltd. Representative Patent Attorney Aoyama Aoyama 1 other person 19-

Claims (1)

【特許請求の範囲】 1、感光基を有するビニルモノマーと池の一種または二
種V月二のビニルモノマーとを乳化重合しテ得うれる樹
脂エマルノヨン組成物を含む感光性樹脂組成物で・あっ
て、池の該ビニルモノマーの少なくとも1重量%u−1
−かけ子内;二2個以上の重合性ビニル基を有するモノ
マーであることを特徴とする組成物。 2、感光基を有するビニルモノマーか、アン゛ド基を有
するカルボン酸とヒドロキシル基を有するビニルモノマ
ーとのエステル化物で゛ある上記第1項記載の組成物。 3、感光基を有するビニルモノマーか、アジ゛ド基を有
するイソシアネート化合物とヒドロキシル基を有するビ
ニルモノマーとの付加物て′ある上記第1項記載の組成
物。 4、感光基を有するビニルモノマーが、ベンゾインまた
はペンゾフェ7ンを側鎖にイ1する(〆り)アクリル酸
エステル化物またはビニル化合物であるI−記第1」(
“上記、Iikの糾tU物。 へ0分子内に2個以1−の重合ヤ1′ビニルJ1(を・
有するモノマーがンビニルベンゼンである1−配電1n
l記載の組成物。 6、%光)7:を有するビニルモノマーがビニルモア7
−全体の3〜70屯11)%である1−配電1項記戦の
組成物。 7、感光性樹脂組成物が、常l−1′、で沸点] fl
 +1 ’0以4−の重合性エチレン系不飽和化合物を
樹脂エマルンヨン組成物の固型分に対して;)−100
巾量%の範囲で・含む1−記ffN項の組成物。
[Scope of Claims] 1. A photosensitive resin composition comprising a resin emulsion composition obtained by emulsion polymerization of a vinyl monomer having a photosensitive group and one or two types of vinyl monomers. and at least 1% by weight of the vinyl monomer in the pond
- Inside the brace: A composition characterized in that it is a monomer having 22 or more polymerizable vinyl groups. 2. The composition according to item 1 above, which is a vinyl monomer having a photosensitive group or an esterified product of a carboxylic acid having an anddo group and a vinyl monomer having a hydroxyl group. 3. The composition according to item 1 above, which is a vinyl monomer having a photosensitive group or an adduct of an isocyanate compound having an azide group and a vinyl monomer having a hydroxyl group. 4. The photosensitive group-containing vinyl monomer is an acrylic acid ester or a vinyl compound having benzoin or penzophene as a side chain.
"Above, Iik's tU product. 2 or more 1- polymerization layers 1' vinyl J1 (in the 0 molecule)
1-distribution 1n in which the monomer having is vinylbenzene
The composition according to I. 6, % light) 7: Vinyl monomer having 7:
- 3-70 ton 11)% of the total 1- power distribution composition; 7. The photosensitive resin composition has a boiling point of 1-1' fl
+1 '0 to 4- polymerizable ethylenically unsaturated compound to the solid content of the resin emulsion composition;) -100
1-The composition of the ffN term in the range of width %.
JP19936482A 1982-11-13 1982-11-13 Photosensitive resin composition Granted JPS5988732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19936482A JPS5988732A (en) 1982-11-13 1982-11-13 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19936482A JPS5988732A (en) 1982-11-13 1982-11-13 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5988732A true JPS5988732A (en) 1984-05-22
JPH0368377B2 JPH0368377B2 (en) 1991-10-28

Family

ID=16406525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19936482A Granted JPS5988732A (en) 1982-11-13 1982-11-13 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5988732A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0219848A (en) * 1988-07-08 1990-01-23 Hoechst Gosei Kk Photosensitive resin composition

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4960390A (en) * 1972-10-18 1974-06-12
JPS52121085A (en) * 1976-04-05 1977-10-12 Fuji Photo Film Co Ltd Reactive high polymers
JPS54117539A (en) * 1978-01-30 1979-09-12 Richardson Co Photopolymerizable latex system
JPS5667848A (en) * 1979-11-08 1981-06-08 Nippon Paint Co Ltd Photosensitive resin composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4960390A (en) * 1972-10-18 1974-06-12
JPS52121085A (en) * 1976-04-05 1977-10-12 Fuji Photo Film Co Ltd Reactive high polymers
JPS54117539A (en) * 1978-01-30 1979-09-12 Richardson Co Photopolymerizable latex system
JPS5667848A (en) * 1979-11-08 1981-06-08 Nippon Paint Co Ltd Photosensitive resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0219848A (en) * 1988-07-08 1990-01-23 Hoechst Gosei Kk Photosensitive resin composition

Also Published As

Publication number Publication date
JPH0368377B2 (en) 1991-10-28

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