JPS5985863A - 多孔質基体への連続蒸着方法 - Google Patents
多孔質基体への連続蒸着方法Info
- Publication number
- JPS5985863A JPS5985863A JP19737482A JP19737482A JPS5985863A JP S5985863 A JPS5985863 A JP S5985863A JP 19737482 A JP19737482 A JP 19737482A JP 19737482 A JP19737482 A JP 19737482A JP S5985863 A JPS5985863 A JP S5985863A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- vapor deposition
- porous substrate
- rotating drum
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19737482A JPS5985863A (ja) | 1982-11-10 | 1982-11-10 | 多孔質基体への連続蒸着方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19737482A JPS5985863A (ja) | 1982-11-10 | 1982-11-10 | 多孔質基体への連続蒸着方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5985863A true JPS5985863A (ja) | 1984-05-17 |
| JPS6334223B2 JPS6334223B2 (https=) | 1988-07-08 |
Family
ID=16373435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19737482A Granted JPS5985863A (ja) | 1982-11-10 | 1982-11-10 | 多孔質基体への連続蒸着方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5985863A (https=) |
-
1982
- 1982-11-10 JP JP19737482A patent/JPS5985863A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6334223B2 (https=) | 1988-07-08 |
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