JPS5983110A - Reproduction of patterned diffraction grating - Google Patents
Reproduction of patterned diffraction gratingInfo
- Publication number
- JPS5983110A JPS5983110A JP19302582A JP19302582A JPS5983110A JP S5983110 A JPS5983110 A JP S5983110A JP 19302582 A JP19302582 A JP 19302582A JP 19302582 A JP19302582 A JP 19302582A JP S5983110 A JPS5983110 A JP S5983110A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- diffraction grating
- ionizing radiation
- pattern
- curable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】 するものである。[Detailed description of the invention] It is something to do.
回折格子は光を照射することにより得られる透過光若し
くは反射光が回折現象を起こすものであり、光学部品と
して使用される他、白色光を照射するときに見られる虹
色を利用して装飾品にも広(使用される等、利用価値の
高いものである。Diffraction gratings cause a diffraction phenomenon in transmitted light or reflected light obtained by irradiating light, and in addition to being used as optical components, they can also be used as decorative items by utilizing the rainbow colors seen when irradiated with white light. It is widely used and has high utility value.
回折格子を作製する方法には釉々の方法があり、例えば
機械的な方法としては材料の表面に間隔O. Sμ〜S
μ程度の微細な縞状の凹凸をダイヤモンドカッター等を
用いて切削する方法があり、光化学的な方法としてはフ
ォトレジスト等の感光性材料にレーザー光等を用いて干
渉縞を露光し、現像する方法がある。There are various methods for producing diffraction gratings, such as glazing methods.For example, a mechanical method is such that the surface of the material is formed at intervals of 0. Sμ〜S
There is a method of cutting micro-sized striped irregularities using a diamond cutter, etc., and a photochemical method involves exposing a photosensitive material such as a photoresist to interference fringes using a laser beam, etc., and developing it. There is a way.
しかし、上記の方法はいずれも回折格子自体を得る方法
としては適していると言っても、このような方法そのも
のを量産に利用すると甚だ非能率的である上、使用材料
やランニングコストの点でも有利とは言えないので、回
折格子を量産する際には上記のような方法で得られる回
折格子を原型として複製用型を作製し、複製用型を用い
て適宜な材料に賦型するのが能率的である。このように
複製用型を用いると回折格子の複製は容易になるが、回
折格子を装飾的な用途に使用する除には回折格子?−面
に設けるだけでな(、パターン状に形成する方が装飾的
な価値が高(、多(のパターンに対応した複製用型や、
ひいてはその原型を作製する必要があり、その都度、前
記した機械的な方法や光化学的な方法に頼らざるを得す
、非能率的、かつ、不経済である。However, although all of the above methods are suitable for obtaining the diffraction grating itself, it is extremely inefficient to use these methods for mass production, as well as in terms of materials used and running costs. Therefore, when mass producing diffraction gratings, it is recommended to create a reproduction mold using the diffraction grating obtained by the above method as a prototype, and then use the reproduction mold to form an appropriate material. Be efficient. Using a duplication mold like this makes it easy to reproduce diffraction gratings, but what is the purpose of using diffraction gratings other than for decorative purposes? - It is more decorative to form it in a pattern rather than just forming it on a surface.
Furthermore, it is necessary to produce the prototype, and each time it is necessary to rely on the above-mentioned mechanical method or photochemical method, which is inefficient and uneconomical.
本発明は上記した従来の欠点を補なうものであって、電
離放射線硬化性組成物を]くターン状に形成した後、回
折格子複製用型を用い、かつ、電離放射線を照射すれば
、同一の回折格子複製用型を用いて種々のパターンの回
折格子を複製しうろことを見い出して研究の結果完成を
見たものである。The present invention compensates for the above-mentioned drawbacks of the conventional art, and is such that, after forming an ionizing radiation-curable composition into a pattern, using a mold for replicating a diffraction grating and irradiating with ionizing radiation, This work was completed as a result of research by duplicating various patterns of diffraction gratings using the same mold for duplicating diffraction gratings and discovering scales.
即ち本発明のパターン状回折格子の複製方法は以下に詳
細に述べるように少(とも一方が電離放射線透過性であ
る基体と回折格子複製用型を準備し、前記基体の表面に
霜、離放射線硬化性組成物をパターン状に塗布形成し、
前記塗布面に前記回折格子複製用型を密着させ、次いで
電離放射線を前記基体若しくは前記回折格子複製用型の
うち電離放射線透過性である物の側より照射して、前記
パターン状に塗布形成した電離放射線硬化性組成物を硬
化させると共に賦型し、その後、前記回折格子複製用型
を離脱させることを特徴とするものである。That is, the method for replicating a patterned diffraction grating according to the present invention involves preparing a small substrate (one of which is transparent to ionizing radiation) and a mold for replicating a diffraction grating, as described in detail below. Applying a curable composition in a pattern,
The diffraction grating duplication mold was brought into close contact with the coated surface, and then ionizing radiation was applied from the side of the substrate or the diffraction grating duplication mold that was transparent to ionizing radiation to form the pattern. The method is characterized in that the ionizing radiation-curable composition is cured and shaped, and then the diffraction grating duplication mold is removed.
以下、図面を用いながら本発明の方法について更に詳細
に説明する。Hereinafter, the method of the present invention will be explained in more detail with reference to the drawings.
第1図は本発明の方法において基体lの表面に電離放射
線硬化性組成物をパターン状に塗布しパターンλを形成
した状態を示すための模式的な断面図である。第2図は
第1図のパターンλ上に回折格子複製用型3ン密着させ
、回折格子複製用型3の側より電離放射線ダを照射する
状態を示す断面図である。又、第3図は第9図のごとく
電離放射線ダを照射した後、回折格子複製用型3を離脱
し、パターンコの表面に回折格子の微細凹凸Sが複製さ
れた状態を示す断面図である。FIG. 1 is a schematic cross-sectional view showing a state in which an ionizing radiation-curable composition is applied in a pattern onto the surface of a substrate 1 to form a pattern λ in the method of the present invention. FIG. 2 is a sectional view showing a state in which the diffraction grating duplication mold 3 is brought into close contact with the pattern λ of FIG. 1 and ionizing radiation is irradiated from the side of the diffraction grating duplication mold 3. Furthermore, FIG. 3 is a cross-sectional view showing the state in which the fine irregularities S of the diffraction grating are replicated on the surface of the pattern after the mold 3 for copying the diffraction grating is removed after irradiation with ionizing radiation as shown in FIG. 9. be.
本発明の方法におい′Cはまず、少(とも一方が電離放
射線透過性である基体と回折格子複製用型を準備する。In the method of the present invention, first, a substrate (at least one of which is transparent to ionizing radiation) and a mold for replicating a diffraction grating are prepared.
基体としては、釉々のプラスチックのフィルム若しくは
シート又は板状体、金属等の単独、若しくは複合体や、
或いは成形物を使用することができ、これらの基体には
後述する電離放射線硬化性組成物との硬化後の接着力を
向上させる意味で必要に応じ適宜な表面処理を行なって
もよい。基体として表面に蒸着金属薄膜を形成したもの
は回折格子の装飾効果上好ましい。The substrate may be a glazed plastic film, sheet or plate, a metal or a composite,
Alternatively, molded products may be used, and these substrates may be subjected to appropriate surface treatment as necessary in order to improve the adhesive strength after curing with the ionizing radiation curable composition described below. A substrate having a vapor-deposited metal thin film formed on its surface is preferable in view of the decorative effect of the diffraction grating.
後述する電帥放射線の照射は基体若しくは回折格子複製
用型のうち、いずれか電離放射線透過性のものの側から
行なうが、基体をプラスチックのフィルム若しくはシー
ト又は板状体とするときは電離放射線透過性を有するの
で基体側から照射できる。The irradiation with electric radiation described below is carried out from the side of either the substrate or the mold for copying the diffraction grating, which is transparent to ionizing radiation, but when the substrate is a plastic film, sheet, or plate, it is necessary to irradiate the side of the substrate or the mold for copying the diffraction grating, which is transparent to ionizing radiation. Since it has , it can be irradiated from the substrate side.
回折格子複製用型としては種々のものを使用できる。例
えば前記したような機械的な方法や光化学的な方法によ
り原型を作製し、(イ)得られた原型にめっきを施して
めっき層を形成した後、該めっき層を剥離してなるもの
、(ロ)原型を熱可塑性樹脂シートに熱プレスしてなる
もの、更にはe−1w、型に硬化性樹脂液を密着させ、
熱、紫外線、若しくは電子線等により硬化させて得られ
るもの等が利用できる。Various types of diffraction grating replicating molds can be used. For example, a model is prepared by a mechanical method or a photochemical method as described above, (a) the obtained model is plated to form a plating layer, and then the plating layer is peeled off. b) Those made by hot pressing the prototype onto a thermoplastic resin sheet, and even e-1w, by applying a curable resin liquid to the mold,
Those obtained by curing with heat, ultraviolet rays, electron beams, etc. can be used.
上、記において(ロ)及び(ハ)の回折格子複製用型を
用いるときは電離放射線透過性を有するので回折格子複
製用型の側より電離放射線の照射が行なえる。In the above, when the diffraction grating duplication molds (b) and (c) are used, the ionizing radiation can be irradiated from the side of the diffraction grating duplication mold because they are transparent to ionizing radiation.
仄に上記した基体の表面に電離放射線硬化性組成物をパ
ターン状に塗布形成する0
〔電離放射線硬化性組成物〕
電離放射線硬化性組成物としては分子中に不飽和結合を
有する七ツマ−及びオリゴマー及びブVポリマー等や、
エポキシ化合物とルイス酸の混合物等があり、必要によ
り増感剤を加え℃使用すればよい。An ionizing radiation curable composition is coated in a pattern on the surface of the above-mentioned substrate. Oligomers and V polymers, etc.
There are mixtures of epoxy compounds and Lewis acids, etc., and if necessary, a sensitizer may be added and used at °C.
上記の電離放射線硬化性組成物を基体の表面にパターン
状に塗布形成するには種々の印刷方法、例えばグラビア
印刷、オフセット印刷、凸版印刷、フレキソ印刷、スク
リーン印刷等や手描きによって行なうことができ電離放
射線硬化性組成物及び基体の種類により適宜に選択して
用いればよ(、適宜なパターンを有する印刷版は周知の
方法により作製できる。The above-mentioned ionizing radiation-curable composition can be applied and formed into a pattern on the surface of a substrate by various printing methods, such as gravure printing, offset printing, letterpress printing, flexo printing, screen printing, etc., or by hand drawing. The radiation curable composition and the type of substrate may be used by appropriately selecting one and used. (A printing plate having an appropriate pattern can be produced by a well-known method.
上記でパターン状に電離放射線硬化性組成物を設けた基
体のパターンの上に前記回折格子複製用型を密着させ、
次いで基体若しくは回折格子複製用型のうち電離放射線
透過性である物の側より電離放射線を照射する。基体の
パターンの上に回折格子複製用型を密着させる際には平
プレスやロールプVスを用いて加圧することが好ましい
。Bringing the diffraction grating duplication mold into close contact with the pattern of the substrate on which the ionizing radiation curable composition is provided in a pattern,
Next, ionizing radiation is irradiated from the side of the substrate or the mold for copying the diffraction grating that is transparent to ionizing radiation. When bringing the diffraction grating duplication mold into close contact with the pattern on the base, it is preferable to apply pressure using a flat press or a roll press.
電離放射線としては紫外線、電子線、xH1γ線、中性
子線等が使用できるが、装置が手軽な紫外線や透過力が
大きい電子線が好ましい。電離放射線の照射により、前
記したパターン状に形成された′電離放射線硬化性組成
物が硬化し、次いで回折格子複製用型を離脱させること
により基体の表面にパターン状回折格子が得られる。As the ionizing radiation, ultraviolet rays, electron beams, xH1γ rays, neutron beams, etc. can be used, but ultraviolet rays, which are easy to use, and electron beams, which have high penetrating power, are preferred. The ionizing radiation-curable composition formed in the pattern described above is cured by irradiation with ionizing radiation, and then the diffraction grating duplication mold is removed to obtain a patterned diffraction grating on the surface of the substrate.
以上の本発明によると、パターン状回折格子な得るのに
、その都度原型や複製用型を作製する会費がな(、電離
放射線硬化性組成物を予めパターン化することにより、
任意の〕くターンのパターン状回折格子が容易に、かつ
能率良(生産できる。According to the present invention described above, although a patterned diffraction grating can be obtained, there is no need to pay for the production of a master model or a copying mold each time (by patterning the ionizing radiation curable composition in advance,
Patterned diffraction gratings with arbitrary turns can be produced easily and efficiently.
実施例
厚み0..2 mのトリアセテートフィルムに紫外線硬
化樹脂(A、P%R1旭化成四−をスクリーン印刷によ
りパターン状に塗布した。Example thickness: 0. .. A UV curable resin (A, P%R1 Asahi Kasei 4-) was applied in a pattern onto a 2 m triacetate film by screen printing.
次に、全面に微細な凹凸で回折格子が刻まれた金型な上
記フィルムの〕くターン面上に重ね合わせ、二本のロー
ル間を圧力をかけた状態で通過させて密着させた。さら
に、フィルム側より超高圧水銀灯を用いて紫外線を照射
し、紫外線硬化樹脂が硬化した後、フィルムを金型より
剥離したところ、フィルム上にノくターン状に回折格子
が記録された。Next, the above-mentioned film, which was a mold having a diffraction grating engraved with fine irregularities on its entire surface, was superimposed on the turned surface of the mold, and passed between two rolls under pressure to bring them into close contact. Furthermore, when the film was irradiated with ultraviolet rays using an ultra-high-pressure mercury lamp and the ultraviolet curing resin was cured, the film was peeled from the mold, and a cross-shaped diffraction grating was recorded on the film.
第1図〜第3図は本発明の各工程を示すための断面図で
ある。
10争會・・・基 体
20・・・・・ パ タ − ン3 ・・・・・
・・回折格子複製用型
グ・・・・・・・電離放射線
S・・・・・・・凹 凸
第1図
第2図
第3図1 to 3 are cross-sectional views showing each step of the present invention. 10 competitions... base 20... pattern 3...
...Diffraction grating duplication mold...Ionizing radiation S...Concave Convex Figure 1 Figure 2 Figure 3
Claims (1)
折格子複製用型を準備し、前記基体の表面に電離放射線
硬化性組成物をパターン状に塗布形成し、前記塗布面に
前記回折格子複製用型を密着させ、次いで電離放射腓を
前記基体若しくは前記回折格子?7W用型のうち電離放
射線透過性である物の側より照射して、前記パターン状
に塗布形成した電離放射線硬化性組成物を硬化させると
共に賦型し、その後、前記回折格子複製用型を離脱させ
ることを特徴とするパターン状回折格子の複製方法。(11) Prepare a substrate and a mold for replicating a diffraction grating, at least one of which is transparent to ionizing radiation, coat the surface of the substrate with an ionizing radiation-curable composition in a pattern, and apply the replica of the diffraction grating to the coated surface. The ionizing radiation curable composition is applied in the pattern by bringing the mold into close contact with the mold, and then irradiating the ionizing radiation from the side of the substrate or the diffraction grating 7W mold that is transparent to ionizing radiation. 1. A method for replicating a patterned diffraction grating, comprising curing and forming the diffraction grating, and then removing the mold for replicating the diffraction grating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19302582A JPS5983110A (en) | 1982-11-02 | 1982-11-02 | Reproduction of patterned diffraction grating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19302582A JPS5983110A (en) | 1982-11-02 | 1982-11-02 | Reproduction of patterned diffraction grating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5983110A true JPS5983110A (en) | 1984-05-14 |
Family
ID=16300917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19302582A Pending JPS5983110A (en) | 1982-11-02 | 1982-11-02 | Reproduction of patterned diffraction grating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5983110A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62231753A (en) * | 1985-12-05 | 1987-10-12 | 東洋メタライジング株式会社 | Laminate displaying iris pattern and manufacture thereof |
JPS644703A (en) * | 1987-06-27 | 1989-01-09 | Shimadzu Corp | Diffraction grating and its production |
JP2000264000A (en) * | 1999-03-15 | 2000-09-26 | Dainippon Printing Co Ltd | Color-changing vapor deposition medium and its manufacture |
KR100624414B1 (en) * | 2003-12-06 | 2006-09-18 | 삼성전자주식회사 | Manufacturing Method of Diffractive Lens Array and UV Dispenser |
-
1982
- 1982-11-02 JP JP19302582A patent/JPS5983110A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62231753A (en) * | 1985-12-05 | 1987-10-12 | 東洋メタライジング株式会社 | Laminate displaying iris pattern and manufacture thereof |
JPS644703A (en) * | 1987-06-27 | 1989-01-09 | Shimadzu Corp | Diffraction grating and its production |
JP2000264000A (en) * | 1999-03-15 | 2000-09-26 | Dainippon Printing Co Ltd | Color-changing vapor deposition medium and its manufacture |
KR100624414B1 (en) * | 2003-12-06 | 2006-09-18 | 삼성전자주식회사 | Manufacturing Method of Diffractive Lens Array and UV Dispenser |
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