JPS5980469U - Target for sputtering equipment - Google Patents
Target for sputtering equipmentInfo
- Publication number
- JPS5980469U JPS5980469U JP17680982U JP17680982U JPS5980469U JP S5980469 U JPS5980469 U JP S5980469U JP 17680982 U JP17680982 U JP 17680982U JP 17680982 U JP17680982 U JP 17680982U JP S5980469 U JPS5980469 U JP S5980469U
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering equipment
- sputtering
- sputtering device
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来構造のターゲットの消耗状態を示す断面図
、第2図は本考案によるターゲットの正面図、第3図は
本考案によ、る中央部のターゲット部材にあけられたピ
ン穴の配置を示す図、第4図は本考案による周縁部のタ
ーゲット部材に設けられたピンの構造を示す側面図、第
5図は本考案による中央部のターゲット部材に設けられ
たピン穴に、本考案による周縁部のターゲット部材に設
けられたピンがセットされた状態を示す部分断面図であ
る。
なお図において、1・・・・・・中央部のターゲット部
材、1′・・・・・・従来構造による消耗したターゲッ
ト、2.3・・・・・・周縁部のターゲット部材(長辺
)、4゜5・・・・・・周縁部のターゲット部材(短辺
)、6,7゜8.9・・・・・・4隅のターゲット部材
、10・・・・・・中央部のターゲット部材に設けられ
たピン穴、11・・・・・・周縁部のターゲット部材に
設けられたピン、である。Fig. 1 is a cross-sectional view showing the state of wear of a target with a conventional structure, Fig. 2 is a front view of the target according to the present invention, and Fig. 3 is a cross-sectional view showing the state of wear of a target with a conventional structure. FIG. 4 is a side view showing the structure of the pin provided in the peripheral target member according to the present invention, and FIG. 5 is a diagram showing the pin hole provided in the central target member according to the present invention. FIG. 6 is a partial cross-sectional view showing a state in which pins provided on the peripheral target member according to the invention are set; In the figure, 1... Target member at the center, 1'... Worn target with conventional structure, 2.3... Target member at the periphery (long side) , 4゜5...Target member at the periphery (short side), 6,7゜8.9...Target members at the four corners, 10...Target at the center A pin hole provided in the member, 11... is a pin provided in the target member at the peripheral portion.
Claims (1)
垂直に配置したスパッタリング装置に使われるターゲッ
トにおいて、ターゲットを部分的に変換できるようにし
たことを特徴とするスパッタリング装置用ターゲット。1. A target for a sputtering device, which is used in a sputtering device in which parallel plate electrodes are vertically arranged in a sputtering chamber to face each other, and is characterized in that the target can be partially converted.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17680982U JPS5980469U (en) | 1982-11-22 | 1982-11-22 | Target for sputtering equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17680982U JPS5980469U (en) | 1982-11-22 | 1982-11-22 | Target for sputtering equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5980469U true JPS5980469U (en) | 1984-05-31 |
Family
ID=30384305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17680982U Pending JPS5980469U (en) | 1982-11-22 | 1982-11-22 | Target for sputtering equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5980469U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008032489A1 (en) * | 2006-09-11 | 2008-03-20 | Shinmaywa Industries, Ltd. | Structure for attaching plasma gun to chamber |
-
1982
- 1982-11-22 JP JP17680982U patent/JPS5980469U/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008032489A1 (en) * | 2006-09-11 | 2008-03-20 | Shinmaywa Industries, Ltd. | Structure for attaching plasma gun to chamber |
JP2008066240A (en) * | 2006-09-11 | 2008-03-21 | Shin Meiwa Ind Co Ltd | Mounting structure of plasma gun into chamber |
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