JPS5978437A - Charged particle beam irradiation type line analyzer - Google Patents

Charged particle beam irradiation type line analyzer

Info

Publication number
JPS5978437A
JPS5978437A JP18785982A JP18785982A JPS5978437A JP S5978437 A JPS5978437 A JP S5978437A JP 18785982 A JP18785982 A JP 18785982A JP 18785982 A JP18785982 A JP 18785982A JP S5978437 A JPS5978437 A JP S5978437A
Authority
JP
Japan
Prior art keywords
sample
scanning
charged particle
particle beam
adjusting board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18785982A
Other languages
Japanese (ja)
Other versions
JPH0255903B2 (en
Inventor
Yuji Mori
森 優治
Masao Kawai
河合 政夫
Fukuo Zenitani
銭谷 福男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP18785982A priority Critical patent/JPS5978437A/en
Publication of JPS5978437A publication Critical patent/JPS5978437A/en
Publication of JPH0255903B2 publication Critical patent/JPH0255903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To realize line analizing along a desired long line by alternately operating a scanning means by beam deflection and a means for fine drive of sample and thereby supporting the scanning on the occasion of analyzing a line with an analyzer. CONSTITUTION:An analyzer such as X-ray microanalyzer is formed with an X- direction sample fine adjusting board X and a vertical direction sample fine adjusting board Z driven by a pulse motor MP. A height of a fine adjusting board Z is detected by a detector H and the data is then sent to a control circuit C in order to control the beam deflection through a scanning signal output circuit D. Simultaneously a number of pulses for moving the fine adjusting board X is calculated and it is set to a register R. Moreover, a pulse motor PM is driven by controlling the gate G. Accordingly, scanning for a long line can be realized in combination with beam deflection and movement of the fine adjusting board X and simultaneously only a pair of pulse motor PM is used in view of simplifying the structure.

Description

【発明の詳細な説明】 本発明は電子イオン等の荷電粒子ビームで試料を照射1
2、試料から放出される電子とかX線等を検出1〜で試
料の分析を行う装置、例えばX線マイクロアナライザの
ような分析装置における線分析装置に関する。
Detailed Description of the Invention The present invention provides a method for irradiating a sample with a beam of charged particles such as electron ions.
2. Detection of electrons, X-rays, etc. emitted from a sample 1--Relates to a ray analysis device in an analysis device such as an X-ray microanalyzer, which analyzes the sample.

上述した分析装置で線分析即ち試料を一本の線に沿って
分析する場合、荷電粒子ビームを偏向させて電子光学的
に走査する方法とビームの方を固定しておき、試料の方
を移動させる方法とがある。
When performing line analysis, that is, analyzing a sample along a single line, using the above-mentioned analyzer, there are two methods: deflecting a charged particle beam and scanning it electro-optically, and keeping the beam fixed while moving the sample. There is a way to do this.

所でビームを偏向させる方法では試料面上で走査できる
距離は200μm以下であり、分析しだい長さが200
μm以上に及ぶときは試料の方を移動させる方法が用い
られる。
In the method of deflecting the beam, the distance that can be scanned on the sample surface is less than 200 μm, and as soon as the analysis
When the distance exceeds μm, a method is used in which the sample is moved.

従来線分析のために試料を移動させるためには、試料微
動装置にモータを取付けてモータ駆動によって試料を動
かす方法を用いていだが、この方法では試料を高速で送
る場合モータを外す必要があった。もう少し詳細に説明
すると、試料微動装置に高速送り用モータを結合し、更
にクラッチを介して低速送り用モータを数句けていた。
Conventionally, in order to move a sample for line analysis, a motor was attached to the sample fine movement device and the sample was driven by the motor, but with this method it was necessary to remove the motor if the sample was to be sent at high speed. . To explain in more detail, a high-speed feed motor was connected to the sample fine movement device, and several low-speed feed motors were connected via a clutch.

使用するモータは高速送りも低速送りも共にパルスモー
クを用いるが、高速送りの場合、モータの一ステップ当
り0.5μm位の送り量であるが低速送りでは分析の位
置的分解能を得るだめ−ステップ当り0・01μm位の
送り量であり、微動装置とモータとの間には高速送り用
に比し大きな比率の減速機構が介在されている。このだ
め微動機構と低速送り用モータとが結合されたま\の状
態では高速送り用モータは低速送り用モータを増速しで
持ち回わることになシ大きな負荷を持つことになるので
、低速送り用モータはクラッチを介して微動装置と結合
し、高速送りを行う場合にはクラッチを切る必要がある
。このようにして従来は200μm以上の長さにわたる
線分析の場合低速送り用モータによって試料を移動させ
、微動装置をもとの位置へ戻す場合高速送り用モータに
切換えていた。従って従来のX線マイクロアナライザ等
の荷電粒子線照射型分析装置では試料微動装置には高速
送り用と低速送り用の2つのモータと減速機構とクラ高
速送シ用モータだけで、低速送り用モータとそうとする
ものである。
The motor used is a pulse smoke motor for both high-speed and low-speed feed. In the case of high-speed feed, the feed amount is about 0.5 μm per step of the motor, but in the case of low-speed feed, it is difficult to obtain the positional resolution of the analysis. The feed amount is about 0.01 μm per feed, and a reduction mechanism with a larger ratio than that for high-speed feed is interposed between the fine movement device and the motor. If the fine movement mechanism and the low-speed feed motor are still connected, the high-speed feed motor will have to carry around the low-speed feed motor at an increased speed, so the low-speed feed motor will have a large load. The motor is connected to a fine movement device via a clutch, and it is necessary to disengage the clutch when performing high-speed feed. In this way, conventionally, when performing line analysis over a length of 200 μm or more, the sample was moved using a low-speed feed motor, and when returning the fine movement device to its original position, the sample was switched to a high-speed feed motor. Therefore, in conventional charged particle beam irradiation analyzers such as X-ray microanalyzers, the sample fine movement device only requires two motors, one for high-speed feeding and one for low-speed feeding, a deceleration mechanism, and a motor for high-speed feeding. This is what we are trying to do.

本発明はビーム偏向と試料高連送シとを交互に組合せて
、高速送り用モータたけを用いて任意に長い線に沿って
線分析を行い得るようにしたことを特徴とする荷電粒子
線照射型分析装置に係るものである。以下実施例によっ
て本発明を説明する。
The present invention is characterized by a charged particle beam irradiation method that alternately combines beam deflection and high-speed sample feeding to perform line analysis along an arbitrarily long line using a high-speed feeding motor. This relates to a mold analysis device. The present invention will be explained below with reference to Examples.

第1図は試料面を示す。試料は例えば銅の生地C’uに
鉄の不純物Feが混入しており、一本の線Xに沿って線
分析を行う。分析範囲はX線上A点からD点までである
。本発明ではこのADの線分析範囲において、A点から
B点捷で荷電粒子ビームを左方へ偏向させて走査し、こ
の−走査が終った所で試料を高速送りモータによって右
方に送シ、B点を図のA点の位置まで移動させる。その
後ビームを一回[]と同じ範囲で右から左へ偏向させて
区 試料面を走査することによって試料上のBCの値開を分
析する。以下同様の動作を繰返し、ADの全長にわたる
線分析を完了する。」二連した線分析動作と合せて記録
計のチャートを間欠的に駆動すると、試料上のA点から
D点に至るX線に清う線分析の結果が第2図に示すよう
に連続し/こ記録として得られる。第3図は上述した線
分析動作のタイムチャートで、同図イは荷電粒子ビーム
のX方向走査信号であり、この図でA、B、C,Dの各
点1−]:第1図におけるA 、 D点と対応している
。ビームは第1図でA点からB点まで第3図の鋸歯状波
形の走置信号で偏向され、A点に戻り、次いで試料が駆
動されて試料上のA点の位置にB点が来る。
Figure 1 shows the sample surface. The sample is, for example, a copper material C'u mixed with iron impurity Fe, and a line analysis is performed along a single line X. The analysis range is from point A to point D on the X-ray. In the present invention, in this AD line analysis range, the charged particle beam is scanned by deflecting it to the left from point A to point B, and at the end of this scanning, the sample is sent to the right by a high-speed feed motor. , move point B to the position of point A in the figure. Thereafter, the beam is deflected once from right to left in the same range [ ] to scan the surface of the sample, thereby analyzing the BC value spread on the sample. Thereafter, similar operations are repeated to complete the line analysis over the entire length of AD. When the chart of the recorder is driven intermittently in conjunction with two continuous line analysis operations, the line analysis results for the X-rays from point A to point D on the sample will be displayed continuously as shown in Figure 2. / Obtained as a record. FIG. 3 is a time chart of the above-mentioned line analysis operation, and A in the figure is the X-direction scanning signal of the charged particle beam. It corresponds to points A and D. The beam is deflected from point A to point B in Figure 1 using the sawtooth waveform scanning signal in Figure 3, returns to point A, and then the sample is driven to bring point B to the position of point A on the sample. .

第3図口はパルスモータの始動及び停止を示している。Figure 3 shows starting and stopping of the pulse motor.

パルスモータの始動は走査信号の立下りを検出してこの
検出信号によって行われ、一定数のパルスが供給された
所で停止する。走査信号における一つの鋸歯状波の終点
力・ら次の鋸歯状波の始点までの時間間隔はパルスモー
タが回転している期間よシ長くなるように設定されてい
る。パルスモータは上記した一定数のパルスを供給され
ることによシ試料微動装置をビームの一走査幅と等しい
距離だけ移動させる。第3図ハは記録計のチャートの送
りを示し、ビーム走査が行われている期間たけチャート
送シがなジれる。
The pulse motor is started by detecting the fall of the scanning signal and using this detection signal, and stops when a certain number of pulses have been supplied. The time interval from the end point of one sawtooth wave in the scanning signal to the start point of the next sawtooth wave is set to be longer than the period during which the pulse motor is rotating. The pulse motor moves the sample fine movement device by a distance equal to one scanning width of the beam by being supplied with the above-mentioned fixed number of pulses. FIG. 3C shows the chart feeding of the recorder, and the chart feeding is interrupted during the beam scanning period.

第4図は本発明装置の構成を示す。Bけ電子ビーム、S
Cはビーム偏向コイル、Lは対物レンズでSは試料であ
る。XばX方向試料微動台でパルスモータPMによって
駆動される。2は上下方向試料微動台で、試料の上下位
置によってビームの同一偏向角に対するX方向走査幅が
変化する。Hは試料微動台の高さ位置を検出する手段で
ある。
FIG. 4 shows the configuration of the device of the present invention. Bke electron beam, S
C is a beam deflection coil, L is an objective lens, and S is a sample. X: An X-direction sample fine movement table driven by a pulse motor PM. Reference numeral 2 denotes a vertical sample fine movement table, and the X-direction scanning width for the same beam deflection angle changes depending on the vertical position of the sample. H is means for detecting the height position of the sample fine movement table.

線分析の場合、X方向微動台LrJ−@述したようにビ
ーム偏向による走査幅と等しい距離だけ移動させる必要
があるので、Z方向微動台Zの高さを検出してそのデー
タを制御回路Cに送ると、制御回路Cてはその高さにお
けるビーム走査幅から、その幅たけX方向微動台を移動
させるだめのパルスモータ供給パルス数を算定してレジ
スタRにその数を設定する。制御回路Cは走査信号出力
回路りを制御してビーム偏向を制御すると共に、走査信
号の立下り時点でゲートGを開く。ゲー)Gはパルスモ
ータPMとパルス発生回路PGとの間に介在され、この
ゲートが開くことによってパルスモータPMが始動し、
X方向試料微動台Xが駆動される。パルスモータPMに
供給されるパルスはカウンタにで計数され、その計数出
力がコンパレータComでレジスタRに設定されている
データと比較され両者が一致したときRから出力される
信号でゲートGが閉じられパルスモータPMが停止する
と共にカウンタKがリセツトされる。
In the case of line analysis, as mentioned above, it is necessary to move the fine movement table in the X direction by a distance equal to the scanning width by beam deflection, so the height of the fine movement table Z in the Z direction is detected and the data is sent to the control circuit C. , the control circuit C calculates the number of pulses to be supplied to the pulse motor to move the fine movement table in the X direction by that width from the beam scanning width at that height, and sets the number in the register R. The control circuit C controls the scanning signal output circuit to control beam deflection, and also opens the gate G at the falling edge of the scanning signal. Gate) G is interposed between the pulse motor PM and the pulse generation circuit PG, and when this gate opens, the pulse motor PM starts.
The X-direction sample fine movement table X is driven. The pulses supplied to the pulse motor PM are counted by a counter, and the counted output is compared with the data set in the register R by the comparator Com. When the two match, the gate G is closed by the signal output from R. When the pulse motor PM stops, the counter K is reset.

本発明によれば線分析のだめにX方向試料微動台駆動用
パルスモータを高速送り用と低速送り用の2個用いる必
要がなく、2個のモータを用いる場合に必要であったモ
ータ着脱機構等も不要となり装置が簡単化されると共に
線分析がビーム偏向による走査の継ぎ足しで行われるの
で、走査速度が自由に設定でき広い範囲の走査速度を選
択することが可能となる。
According to the present invention, there is no need to use two pulse motors for driving the X-direction sample fine movement table, one for high-speed feeding and one for low-speed feeding, for line analysis, and the motor attachment/detachment mechanism, etc. that was necessary when using two motors, etc. Since line analysis is performed by adding scanning by beam deflection, the scanning speed can be freely set and a wide range of scanning speeds can be selected.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は試料面の一例の平面図、第2図は線分析の記録
チャートの平面図、第3図は本発明の−・実施例装置の
動作を示すタイムチャート、第4図は本発明の一実施例
装置の構成を示すブロック図である。 B・・・電子ビーム、SC・・・ビーム仰向コイル、S
・・試料、X・・・X方向試料微動台、PM・・・X方
向試料微動台駆動用パルスモータ、D・・走査信号出力
回路、C・・・制御回路、PG・・・パルス発生回路、
G・・・ゲート、K・・・カウンタ、R・・・レジスタ
、Com  ・・・コンパレータ。 代理人 弁理士  縣   浩  介
Fig. 1 is a plan view of an example of a sample surface, Fig. 2 is a plan view of a record chart for line analysis, Fig. 3 is a time chart showing the operation of the embodiment device of the present invention, and Fig. 4 is a plan view of the present invention. 1 is a block diagram showing the configuration of a device according to an embodiment; FIG. B...Electron beam, SC...Beam supine coil, S
・・Sample, ,
G...Gate, K...Counter, R...Register, Com...Comparator. Agent Patent Attorney Kosuke Agata

Claims (1)

【特許請求の範囲】[Claims] 荷電粒子ビームで試料照射することにより試料から放出
される放射線を検出する型の分析装置において、荷電粒
子ビームを偏向させて試料面を走査する手段と、試料微
動装置を荷電粒子ビームによる試料面走査方向と反対方
向に、この走査における走査幅だけ駆動する駆動手段と
を設け、上記ビーム偏向による走査手段と上記試料微動
装置駆動手段とを交互に作動させ、記録計を上記ビーム
子線照射型線分析装置。
In an analyzer that detects radiation emitted from a sample by irradiating the sample with a charged particle beam, there is a means for scanning the sample surface by deflecting the charged particle beam, and a means for scanning the sample surface using the charged particle beam. A drive means for driving by the scanning width in this scan is provided in the opposite direction to the scanning direction, and the scanning means by beam deflection and the sample fine movement device drive means are operated alternately, and the recorder is moved by the beam irradiation type beam. Analysis equipment.
JP18785982A 1982-10-25 1982-10-25 Charged particle beam irradiation type line analyzer Granted JPS5978437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18785982A JPS5978437A (en) 1982-10-25 1982-10-25 Charged particle beam irradiation type line analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18785982A JPS5978437A (en) 1982-10-25 1982-10-25 Charged particle beam irradiation type line analyzer

Publications (2)

Publication Number Publication Date
JPS5978437A true JPS5978437A (en) 1984-05-07
JPH0255903B2 JPH0255903B2 (en) 1990-11-28

Family

ID=16213458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18785982A Granted JPS5978437A (en) 1982-10-25 1982-10-25 Charged particle beam irradiation type line analyzer

Country Status (1)

Country Link
JP (1) JPS5978437A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0378077A2 (en) * 1989-01-09 1990-07-18 Hitachi, Ltd. Ion mass-spectroscopic analysis method and apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51103760A (en) * 1975-03-10 1976-09-13 Hitachi Ltd
JPS5715421A (en) * 1980-07-03 1982-01-26 Fujitsu Ltd Electron beam exposing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51103760A (en) * 1975-03-10 1976-09-13 Hitachi Ltd
JPS5715421A (en) * 1980-07-03 1982-01-26 Fujitsu Ltd Electron beam exposing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0378077A2 (en) * 1989-01-09 1990-07-18 Hitachi, Ltd. Ion mass-spectroscopic analysis method and apparatus

Also Published As

Publication number Publication date
JPH0255903B2 (en) 1990-11-28

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