JPS5974645A - Holder for wafer - Google Patents

Holder for wafer

Info

Publication number
JPS5974645A
JPS5974645A JP18505982A JP18505982A JPS5974645A JP S5974645 A JPS5974645 A JP S5974645A JP 18505982 A JP18505982 A JP 18505982A JP 18505982 A JP18505982 A JP 18505982A JP S5974645 A JPS5974645 A JP S5974645A
Authority
JP
Japan
Prior art keywords
wafer
diameter
small
disk
annular member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18505982A
Other languages
Japanese (ja)
Inventor
Masaharu Aoyama
青山 正治
Masayasu Abe
正泰 安部
Jiro Oshima
次郎 大島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18505982A priority Critical patent/JPS5974645A/en
Publication of JPS5974645A publication Critical patent/JPS5974645A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Abstract

PURPOSE:To eliminate the need for the exchange of carriers, etc. every time a small-sized wafer is carried by setting up an annular member capable of matching the small-sized wafer to one surface of a disk carrying a large-sized wafer and fitting the small-sized wafer to the annular member. CONSTITUTION:The annular member 2 with an inserting port of a diameter D2 slightly larger than that of the small-sized wafer to be carried is set up on the disk 1 with the same diameter D1 as the large-sized wafer as a standard. The radial sectional shape of the annular member 2 is formed to an approximately L shape and the member 2 is fixed to one surface of the disk 1 at that time, thus forming an annular connecting groove 3 of depth (d) sufficient for connecting and holding the small-sized wafer to be carried and width (W) slightly larger than the thickness of the small-sized wafer between the member 2 and the disk 1. Accordingly, the holder for the small-sized wafer is set up on the disk 1 for the large-sized wafer, the small-sized wafer is positioned in the connecting groove 3 by using vacuum tweezers, and the small-sized wafer is carried by the disk 1.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は半導体製造工程においてウェーハを保持し搬送
するためのウェーハ保持具に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a wafer holder for holding and transporting wafers in a semiconductor manufacturing process.

〔発明の技術的背景] 半導体集積回路の製造は、シリコン単結晶を薄く輪切り
にしたウェーハ上にフォトエツチング、拡散、成長など
の一連のウェーハプロセスを行うことによって行われる
。1枚のウェーハ上には、例えば従来主流であった外径
3インチ(76、2yi)のものでは3朋口のチップ換
算で約400個分の集積回路チップが形成され、完成後
スクライビングを行って分割し、パッケージングにより
集積回路が完成する。ところでウェーハの大きさが大き
いほど多数の集積回路チップを同時に作ることができ、
しかも無駄になるウェーハ部分が少ないことからウェー
ハの大きさは拡大化の傾向が見られ、外径4インチ(1
01,6mm )  あるいは5インチ(127fl)
のものが多くなっている。
[Technical Background of the Invention] Semiconductor integrated circuits are manufactured by performing a series of wafer processes such as photoetching, diffusion, and growth on a wafer made of thinly sliced silicon single crystals. For example, on a single wafer with an outer diameter of 3 inches (76.2yi), which was the mainstream in the past, approximately 400 integrated circuit chips (equivalent to 3 chips) are formed on a single wafer, and scribing is performed after completion. The integrated circuit is then divided into parts and packaged to complete the integrated circuit. By the way, the larger the wafer, the more integrated circuit chips can be made at the same time.
Moreover, since there is less wasted wafer portion, there is a tendency for the size of wafers to increase, with an outer diameter of 4 inches (1
01.6mm) or 5 inches (127fl)
There are more and more things.

一方、半導体製造工程においては、自動化が進み、作業
者がウェーハを手で持って次工程へ移行させる方式から
製造装置に設けられた搬送機構により自動搬送を行う方
式に移行しつつある。すなわち、ウェーハ25程度度で
10ツトを構成してカセットに挿入し、カセット単位で
工程間の搬送を行い、また、イオン注入、反応性イオン
エツチング、スパッタ等の装置ではウェーハを1枚ずつ
キャリヤで支えて自動搬送を行う1、 〔背景技術の問題点〕 ところが、これらの搬送装置では一定の大きさのウェー
ハを対象としてチャッキング機構、カセット、搬送経路
などができており、ウェーハの大きさが変わる場合には
その都度キャリヤや搬送ベルトの幅などを変更する等の
作業を行わなければならない。このためウェーハの外径
毎に多量のスペアパーツを準備する必要があり、スペア
パーツ交換作業に伴う装置の停止時間(デッドタイム)
が生ずる等経費、能率上大きな損失をひき起すという問
題がある。特に高真空装置においては装置の再使用が可
能になるまでの時間が著しく長いため生産計画にも大き
な影響を与えている。
On the other hand, in the semiconductor manufacturing process, automation is progressing, and the system is shifting from a system in which a worker manually holds a wafer and moves it to the next process to a system in which wafers are automatically transported using a transport mechanism provided in a manufacturing device. In other words, 10 wafers of about 25 degrees are inserted into a cassette and transported between processes in units of cassettes, and in equipment for ion implantation, reactive ion etching, sputtering, etc., wafers are transferred one by one onto a carrier. Supporting and automatic transport 1. [Problems with background technology] However, these transport devices are equipped with chucking mechanisms, cassettes, transport paths, etc. for wafers of a certain size; If there is a change, the width of the carrier or conveyor belt must be changed each time. For this reason, it is necessary to prepare a large amount of spare parts for each outer diameter of the wafer, which results in equipment downtime (dead time) due to replacement of spare parts.
There is a problem in that it causes a large loss in terms of costs and efficiency. Especially in high-vacuum equipment, the time required before the equipment can be reused is extremely long, which has a significant impact on production planning.

〔発明の目的〕[Purpose of the invention]

そこで、本発明は、外径の異なる複数のつ二一ハに対し
て装置の保守部品の交換やそれに伴う装置の停止を生ず
ることなく搬送を可能にするウェーハ保持具を提供する
ことを目的とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a wafer holder that can transport a plurality of wafers having different outer diameters without replacing maintenance parts of the equipment or stopping the equipment accordingly. do.

〔発明の概要〕[Summary of the invention]

本発明にかかるウェーハ保持具は、標準となる大口径ウ
ェーハと等しい直径を有する円板上に、搬送すべき小口
径ウェーハが係合するのに十分な深さを円板の半径方向
に、小口径ウェーハの厚さよりもわずかに大きな幅を円
板の垂直方向に有する環状の係合溝な与える環状部材を
取付け、この環状部材の内周側端部の挿入口直径は小口
径ウェーへの直径よりもわずかに大きくしたものであり
小口径ウェーハな大口径ウェーハと同様に取扱い搬送す
ることを可能ならしめるものである。
The wafer holder according to the present invention has a diameter sufficient to engage a small diameter wafer to be transported on a disk having the same diameter as a standard large diameter wafer. An annular member such as an annular engagement groove having a width slightly larger than the thickness of the wafer in the vertical direction of the disk is attached, and the diameter of the insertion opening at the inner peripheral end of this annular member is the same as the diameter of the small-diameter wafer. This makes it possible to handle and transport small-diameter wafers in the same way as large-diameter wafers.

〔発明の実施例〕[Embodiments of the invention]

以下、図面を参照しながら本発明の実施例のいくつかを
説明する。
Some embodiments of the present invention will be described below with reference to the drawings.

第1図は本発明にかかるウェーハ保持具の一実施例の平
面図であって、標準となる大口径ウェーハと等しい直径
D1を有する円板1上には搬送すべき小口径ウェーハの
直径よりわずかに大きい直径D2の挿入口を有する環状
部材2が取り付けられている。
FIG. 1 is a plan view of an embodiment of the wafer holder according to the present invention, in which a disk 1 having a diameter D1 equal to that of a standard large-diameter wafer has a diameter D1 slightly smaller than the diameter of a small-diameter wafer to be transported. An annular member 2 having an insertion opening with a large diameter D2 is attached to.

第2図は第1図の実施例のA A ’断面図であって、
環状部材2は半径方向断面形状がほぼL字形をなし、円
板1の一面に固着される。これにより環状部材2は円板
1との間に搬送すべき小口径ウェーハを係合保持するの
に十分な深さdとこの小口径ウェーハの厚さよりもわず
かに大きな幅Wの環状の係合溝3を形成している。この
環状部月2の内周側端部2aは、前述のように直径D2
の開口を形成しており、ウェーハの挿入口となる。
FIG. 2 is a sectional view along A A′ of the embodiment shown in FIG.
The annular member 2 has a substantially L-shaped cross section in the radial direction and is fixed to one surface of the disc 1. As a result, the annular member 2 has an annular engagement with the disk 1 having a depth d sufficient to engage and hold a small-diameter wafer to be transported and a width W slightly larger than the thickness of the small-diameter wafer. A groove 3 is formed. The inner end 2a of this annular portion 2 has a diameter D2 as described above.
The opening serves as a wafer insertion port.

このウェーハ保持具を使用するには、搬送すべき小口径
のウェーハを例えばバキュームピンセットで保持し、挿
入口よりウェーハ保持具の中に挿入し、係合溝3に係合
させる。これにより、ウェーハは安定に保持され、また
、円板1の外径が大口径ウェーへの直径と等しいことか
ら小口径ウェーハを大口径ウェーハ用の搬送装置に搭載
することができる。
To use this wafer holder, a small-diameter wafer to be transported is held, for example, with vacuum tweezers, inserted into the wafer holder through the insertion opening, and engaged with the engagement groove 3. Thereby, the wafer is stably held, and since the outer diameter of the disk 1 is equal to the diameter of the large-diameter wafer, a small-diameter wafer can be mounted on a transfer device for large-diameter wafers.

このウェーハ保持具は例えばステンレス合金を切削およ
び中ぐり加工することにより一体として、また、円板1
に環状部利2を溶接することにより製作することができ
る。
This wafer holder can be made integrally by cutting and boring a stainless steel alloy, or a disc holder.
It can be manufactured by welding the annular part 2 to the annular part 2.

第3図は他の実施例についてのAA’断面図であって、
円板10周縁部1aをオフセットし、このオフセット部
分に環状平板部材2′を固着して環状係合溝3を形成し
ている。この場合、環状係合溝3と円、板10周縁部1
aとが同一面となるような位置に設けているから、小口
径ウエーノ・を係合保持した際ウェー・・が円板1の周
縁部1aと同一面位置になる特徴がある。
FIG. 3 is a sectional view along line AA' of another embodiment,
The peripheral edge portion 1a of the disk 10 is offset, and an annular flat plate member 2' is fixed to this offset portion to form an annular engagement groove 3. In this case, the annular engagement groove 3 and the circle, the peripheral edge 1 of the plate 10
Since it is provided at such a position that the wafer a is flush with the peripheral edge 1a of the disc 1, when the small diameter wafer is engaged and held, the wafer .

第4図は他の実施例についてのAA’断面図であって、
円板1に小口径ウエーノ・の直径より小さな直径D3の
開口4を設げたものであり、ウェーハ保持具に小口径ウ
ェー/・を保持した状態で、イオン注入、スパッタリン
グ等の処理を行う際のウェーハへの熱伝導を円板1が妨
げないようにすると共に、保持具の軽量化を図ったもの
である。
FIG. 4 is a cross-sectional view along line AA′ of another embodiment,
The disk 1 is provided with an opening 4 having a diameter D3 smaller than the diameter of the small-diameter wafer, and is used for processing such as ion implantation and sputtering while the small-diameter wafer is held in the wafer holder. This is to prevent the disk 1 from interfering with heat conduction to the wafer, and to reduce the weight of the holder.

第5図は、形状を変更した環状部材2tr  による実
施例を説明する拡大断面図であって環状部材20円板1
と対向する面2bが係合溝3を半径方向外側に向うにつ
れて狭幅とするように傾斜しているとともに、内周側端
部2aから円板10面に垂直な方向に立上った突縁部2
cを有している。このような構造はウェーハの保持の確
実化とウェーハが保持具外に飛び出す可能性を減少させ
るものである。
FIG. 5 is an enlarged sectional view illustrating an embodiment using an annular member 2tr whose shape has been changed.
The surface 2b facing the engagement groove 3 is inclined so as to become narrower toward the outside in the radial direction, and has a protrusion that rises from the inner peripheral end 2a in a direction perpendicular to the surface of the disk 10. Edge 2
It has c. Such a structure ensures that the wafer is held securely and reduces the possibility that the wafer will fly out of the holder.

第6図は環状部材2の一部に切欠き2dを設け、かつ円
板1の底部にオリエンテーションフラット1bを設けた
他の実施例を示す平面図である。この切欠き2dにより
マニュアルピンセットを挿入してウェーハを持つことが
可能となる またオリエンテーションフラット1bを設
けることにより保持具全体をウェーハと同様の形態にす
ることがテキ、小口径ウェーハ5をオリエンテーション
フラットの方向を一致させて挿入することにより、各処
理工程におけるウェーハの方向を一定にすることができ
る。
FIG. 6 is a plan view showing another embodiment in which a notch 2d is provided in a part of the annular member 2 and an orientation flat 1b is provided at the bottom of the disc 1. This notch 2d makes it possible to insert manual tweezers and hold the wafer.In addition, by providing the orientation flat 1b, it is possible to make the entire holder in the same form as the wafer, so the small diameter wafer 5 can be held on the orientation flat. By inserting the wafer in the same direction, the direction of the wafer can be kept constant in each processing step.

以上の各実施例はそれぞれ任意に組合わせることが可能
である。
Each of the above embodiments can be combined arbitrarily.

また、本発明にかかるウエーノ・保持具の材料はステン
レス合金の他、耐薬品性を有する材料ならば何でもよく
、例えば軽量化のためにチタンやチタン合金を使用する
ことができる。
In addition to stainless steel, the material of the ueno/holder according to the present invention may be any chemically resistant material; for example, titanium or a titanium alloy may be used to reduce weight.

〔発明の効果〕〔Effect of the invention〕

以上のような本発明にかかるウエーノ1保持具によれば
、円板とこれに取り付けられた環状部材の間に設けた係
合溝により小口径ウエーノ・を保持でき、標準となる大
口径ウェーノーと等し〜・径を持つ円板により、小口径
ウエーノ・を大口径ウェーノ・と同4子に保持、搬送す
ることが可能とな、る。このため、各種の製造装置にお
いて標準となる太10径ウエーノ・に搬送系をセットし
ておけば、小口径ウェーハの搬送の都度キャリアや搬送
ベルトの調整や交換を行う必要がなくなり、スベアノく
−ツの準備やスペアパーツ交換作業に伴う装置の停止が
不要となって、経費の減少、能率の向上を図る二とがで
きる。
According to the Waeno 1 holder according to the present invention as described above, a small diameter Waeno can be held by the engagement groove provided between the disc and the annular member attached thereto, and it is different from the standard large diameter Waeno. By using disks with the same diameter, it is possible to hold and transport a small-diameter wafer and a large-diameter wafer in the same space. For this reason, if the transfer system is set to a thick 10-diameter wafer, which is standard in various manufacturing equipment, there will be no need to adjust or replace the carrier or transfer belt each time small-diameter wafers are transferred. There is no need to stop the equipment due to preparation of parts or replacement of spare parts, which reduces costs and improves efficiency.

本発明のウエーノ1保持具において、円板の周縁部を保
合溝と対応する位置に設ければ、ウェー7・保持時の重
量バランスが良くなる効果があるっ円板に保持すべき小
口径ウェーハよりも小さな開口を設ければ、加熱工程に
おけるウェー21への熱伝導が容易となり、熱効率が向
上するとともに軽量化が達成できる。
In the wafer 1 holder of the present invention, if the peripheral edge of the disc is provided at a position corresponding to the retaining groove, the weight balance when holding the wafer 7 can be improved.Small diameter to be held on the disc Providing an opening smaller than the wafer facilitates heat conduction to the wafer 21 during the heating process, improving thermal efficiency and reducing weight.

また、環状部材の円板と対向する面を係合溝を半径方向
外側に向うにつれて狭部とするように傾斜させれば、ウ
ェーハの保持を確実化する。
Furthermore, if the surface of the annular member facing the disk is inclined so that the engagement groove becomes narrower toward the outside in the radial direction, the wafer can be held securely.

また、環状部材の内周側端部から円板に垂直な方向に立
上った突縁部を設ければ、ウエーノ・が抜は落ちにくく
することができる。
Furthermore, by providing a protruding edge that rises from the inner peripheral end of the annular member in a direction perpendicular to the disc, it is possible to prevent the wafer from falling off.

また、環状部材に切欠きを設ければ、マニュアルピンセ
ットの挿入が可能になることにより、操作性を向上する
ことができる。
Furthermore, if a notch is provided in the annular member, manual tweezers can be inserted into the annular member, thereby improving operability.

さらに、円板の周縁部にオリエンテーションフラットを
設ければ、本発明にかかる保持具を大口径ウェーハと同
様に取扱5ことかできる。
Further, by providing an orientation flat on the peripheral edge of the disk, the holder according to the present invention can be handled in the same manner as a large diameter wafer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明にかかるウェーハ保持具の一実施例を表
わす平面図、第2図はその中心断面図、第3図は円板の
周縁部と係合溝の位置を対応させた実施例を示す中心断
面図、第4図は円板に開口を設けた他の実施例を示す中
心断面図、第5図は他の構造の係合溝を採用した実施例
を示す拡大断面図、第6図は環状部材と円板を変形した
他の実施例を示す平面図である。 1・・・円板、1a・・・周縁部、1b・・・オリエン
テーションフラット、2・・・環状部材、2a・・・内
周側端部、2b・・・対向面、2c・・・突縁部、3・
・・係合溝、4・・・開口。 出願人代理人  猪  股     清’i$1図 半3図   弗4図 第5図 1°   栴6M d
Fig. 1 is a plan view showing one embodiment of the wafer holder according to the present invention, Fig. 2 is a central sectional view thereof, and Fig. 3 is an embodiment in which the positions of the peripheral edge of the disk and the engagement groove correspond to each other. FIG. 4 is a central sectional view showing another embodiment in which an opening is provided in the disc, FIG. 5 is an enlarged sectional view showing an embodiment employing an engagement groove of another structure, and FIG. FIG. 6 is a plan view showing another embodiment in which the annular member and the disk are modified. DESCRIPTION OF SYMBOLS 1... Disk, 1a... Peripheral part, 1b... Orientation flat, 2... Annular member, 2a... Inner peripheral side end, 2b... Opposing surface, 2c... Protrusion Edge, 3.
...Engagement groove, 4...Opening. Applicant's agent Kiyoshi Inomata'i$1 Figure and a half 3 figures 弗4 figure 5 figure 1 degree Shi6M d

Claims (1)

【特許請求の範囲】 1、標準となる大口径ウェーハと等しい直径を有する円
板と、 この円板に取付けられ、搬送すべき小口径ウェーハを係
合保持するのに十分な深さを前記円板の半径方向に、こ
の小口径ウェーへの厚さよりもわずかに大きな幅を前記
円板面に垂直な方向に有する環状の係合溝な前記円板と
の間に与える環状部材とを有し、 前記環状部材の内周側端部により形成される挿入口直径
は前記小口径ウェーハの直径よりもわずかに大きくした
ことを特徴とするウェーハ保持具。 2、円板の周縁部が環状の係合溝と対応する位置に設げ
られている特許請求の範囲第1項記載のウェーハ保持具
。 3、円板が小口径ウェーへの直径よりも小さい開口を有
するものである特許請求の範囲第1項及び第2項記載の
ウェーハ保持具。 4、環状部材が切欠部を有するものである特許請求の範
囲第1項ないし第3項記載のウェーハ保持具。 5、環状部材の円板との対向面が係合溝を半径方向外側
に向うにつれて狭幅とするように傾斜している特許請求
の範囲第1項ないし第4項記載のウェーハ保持具。 6、環状部材がその内周側端部から円板面に垂直方向に
立上る突縁部を有する特許請求の範囲第1項ないし第5
項記載のウェーハ保持具。 7、円板がオリエンテーションフラットを有するもので
ある特許請求の範囲第1項ないし第6項記載のウェーハ
保持具。
[Scope of Claims] 1. A disk having the same diameter as a standard large-diameter wafer; and a disk having a depth sufficient to engage and hold the small-diameter wafer to be transported. and an annular member provided between the wafer and the disc, which is an annular engagement groove having a width slightly larger than the thickness of the small diameter wafer in a direction perpendicular to the disc surface in the radial direction of the plate. A wafer holder, wherein the diameter of the insertion opening formed by the inner peripheral end of the annular member is slightly larger than the diameter of the small diameter wafer. 2. The wafer holder according to claim 1, wherein the peripheral edge of the disc is provided at a position corresponding to the annular engagement groove. 3. The wafer holder according to claims 1 and 2, wherein the disc has an opening smaller than the diameter of the small diameter wafer. 4. The wafer holder according to claims 1 to 3, wherein the annular member has a notch. 5. The wafer holder according to any one of claims 1 to 4, wherein the surface of the annular member facing the disk is inclined so that the engagement groove becomes narrower toward the outside in the radial direction. 6. Claims 1 to 5, in which the annular member has a projecting edge that rises from the inner peripheral end in a direction perpendicular to the disk surface.
Wafer holder as described in section. 7. The wafer holder according to claims 1 to 6, wherein the disc has an orientation flat.
JP18505982A 1982-10-21 1982-10-21 Holder for wafer Pending JPS5974645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18505982A JPS5974645A (en) 1982-10-21 1982-10-21 Holder for wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18505982A JPS5974645A (en) 1982-10-21 1982-10-21 Holder for wafer

Publications (1)

Publication Number Publication Date
JPS5974645A true JPS5974645A (en) 1984-04-27

Family

ID=16164081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18505982A Pending JPS5974645A (en) 1982-10-21 1982-10-21 Holder for wafer

Country Status (1)

Country Link
JP (1) JPS5974645A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6073240U (en) * 1983-10-24 1985-05-23 松下電子工業株式会社 Board support
EP1380898A1 (en) * 2002-07-11 2004-01-14 ASML Netherlands B.V. Substrate holder and device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6073240U (en) * 1983-10-24 1985-05-23 松下電子工業株式会社 Board support
EP1380898A1 (en) * 2002-07-11 2004-01-14 ASML Netherlands B.V. Substrate holder and device manufacturing method

Similar Documents

Publication Publication Date Title
EP0961309A2 (en) A tool for the contact-free support of plate-like substrates
JP4570037B2 (en) Substrate transfer system
JP7125244B2 (en) process kit ring adapter
JP2009043771A (en) Chuck table mechanism and holding method for workpiece
TW201611154A (en) Wafer loading and unloading
JPH10284577A (en) Method for transferring substrate to be processed
JP2001068541A (en) Processed substrate tray
JP2000003951A (en) Transfer device
JP2006019544A (en) Substrate transfer apparatus and substrate carrier system
US20240025670A1 (en) Substrate processing system carrier
JPS5974645A (en) Holder for wafer
JPH04346247A (en) Semiconductor manufacturing apparatus, wafer transfer arm and wafer mounting stand
JP2002033378A (en) Wafer-handling device
JP7250525B2 (en) Wafer transfer tray
JPH1171025A (en) Wafer conveying device
JPH02271643A (en) Wafer carrying device
JP2009010160A (en) Cutter
JPS6054449A (en) Conveying jig for semiconductor wafer
JPH0523570Y2 (en)
JP3421358B2 (en) Transport method
JP2002110777A (en) Support frame of object processed
JPH08316287A (en) Board handling method and board frame used for it
JPH06132382A (en) Plate-like material grooving support transfer method and jig therefor
JPH10107117A (en) Substrate treating device
KR960001463Y1 (en) ñíñTYPE SUPPORT PIN FOR PREVENTING WAFER DAMAGE