JPS597317A - Multicolor optical filter and its manufacture - Google Patents

Abstract

PURPOSE:To obtain a multicolor optical filter prevented from peeling of films, elution, decoloration, opacification, etc., and superior in heat resistance, by coating the surface of said filter with an overcoat layer formed by photohardening a polymer having specified groups to protect it. CONSTITUTION:Color filter elements having >=2 colors are regularly arranged on a support 10 composed of the substrates of solid-state image pickup elements to form a multicolor filter 16, and its surface is coated with a polymer of the formula as shown in which R is H, alkyl, cyano, or aryl. Then, it is exposed to UV rays except the parts of the filter 16 corresponding to the parts 12 of the bonding pads of the substrate to photoharden the polymer and form an overcoat layer 17. The present multicolor optical filter is obtained by removing the polymer at said unexposed parts.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a polychromatic optical filter and a method for manufacturing the same, and in particular, the present invention relates to a polychromatic optical filter provided with a novel overcoat layer and used in a color image pickup tube or a color solid-state image sensor. and its manufacturing method.

The surface of a single-plate or dual-plate color solid-state image sensor has a red color corresponding to each pixel that makes up the device.

A multicolor optical filter is stacked with color separation filter elements such as green, evening, cyan, yellow, green, and white. The color composition of polychromatic optical filters is these 6
It's not just limited to colors, there are also two colors, four colors, or more. Such color solid-state image sensing devices are roughly classified into bonding methods and on-wafer methods depending on their manufacturing methods.

The former method involves separately creating a solid-state image sensor substrate and a polychromatic optical filter plate having color separation filter elements formed on a transparent support corresponding to each pixel of the solid-state image sensor, and then bonding the two together. formed by.

On the other hand, the latter is a method in which a large number of color solid-state image sensors are simultaneously formed on a wafer on which a large number of solid-state image sensors are arranged, corresponding to each pixel of the solid-state image sensor; While this method requires the color separation filter elements to be bonded while accurately registering them, it is possible to incorporate the process of forming a multicolor optical filter as part of the semiconductor manufacturing process, making it possible to use color solid-state image sensors. This is an essential technology for manufacturing at low cost.

A protective layer called an overcoat layer is provided on the filter surface of the color solid-state image sensor thus obtained. That is, in order to manufacture such a color solid-state image sensor, a wafer (on which a large number of solid-state image sensors are formed) is required.
After forming a large number of multicolor optical filters corresponding to the elements on a multi-chip wafer, it is necessary to cut these substrates one by one (guiding cut). It is necessary to provide an overcoat layer so that even if the chips adhere to the filter surface, they can be easily removed, and furthermore, the chips will not pierce the filter surface and cause defects. Furthermore, after forming a polychromatic optical filter on a multi-chip wafer on which a large number of solid-state imaging devices are formed, it is necessary to expose the bonding butt portion of the solid-state imaging device, but at least the bonding pad portion is selected for the overcoat layer. The layer is required to be highly photosensitive so as to be removable, and it must also be able to prevent the polychromatic optical filter from discoloring due to the process of exposing the bonding butt portion.

Properties required for such an overcoat layer include the following.

(1) It must be colorless and transparent.

Naturally, the parts of the polychromatic optical filter other than the filter element are required to be colorless and transparent.

(2) Good heat resistance.

When manufacturing a color solid-state image sensor, a forced test of, for example, 200T:', 6 hours, or a reliability test of, for example, 125C, 1000 hours, is conducted to guarantee the reliability of the device. It is necessary that no deterioration or dimensional change occurs in the test.

(3) Good adhesion.

Good adhesion between the resin forming the filter element (for example, heavy oxalate gelatin) and the surface of the element substrate (for example, if a layer for preventing ion penetration is provided, the surface of this layer).

(4) Be photosensitive.

Particularly preferably, from the viewpoint of compatibility with various semiconductor manufacturing processes, it is required to be photosensitive to ultraviolet rays, to be photocrosslinked by ultraviolet irradiation, and to be soluble in solvents (or to be removable by dry etching) when not crosslinked. However, it becomes insoluble (becomes a resist for photo-etching) during photo-crosslinking. That is, after coating, the overcoat layer is crosslinked by irradiating ultraviolet rays except for the bonding butt part and/or the dicing part, and is converted into a film having properties such as solvent resistance and heat resistance.
It is necessary that the bonding pad portion and/or the dicing portion be removed without being photo-crosslinked.

(5) Improve solvent resistance/chemical resistance.

The cross-linked part of the Mevercoat layer is used for etching the overcoat and cleaning after cutting.)
It should not be attacked by liquids, freon, acetone, ethanol, water, etc., and it should also be resistant to being attacked by various solvents and chemicals for forming color image pickup devices. Furthermore, after removing the overcoat layer on the dicing part, the layer on the bonding butt part is removed using the photo-crosslinked overcoat layer as a resist. It must be invulnerable to treatments such as ammonium fluoride used to etch films, such as phosphosilicate glass, provided to prevent implantation.

(6) The film should have sufficient stability during dicing.

After forming a large number of polychromatic optical filters on a multi-chip wafer, when dicing each element, dicing is performed while strongly applying water, but the force of this water must not cause peeling. . In addition, the cuts produced during dicing pierce the surface and cause solid ML,
'jC To have hardness like C.

4) The coating layer is required to have the above-mentioned properties, but 7) has not been used in the past. ) As the interest rate, for example, KPFt (trade name, manufactured by Eastman Kodak Company).

Various photoresists such as TPR (vinyl cinnamate photoresist, manufactured by Tokyo Ohka Kogyo Co., Ltd.), 4111 electron beam resists such as polymethyl methacrylate, polyglycyl, ++/methacrylate, etc. are used. Although all of these satisfy some of the above properties, there is no material that satisfies the above properties, so there is a demand for paulownia wood that can satisfy these properties. has been done.

As a result of extensive studies under these circumstances, the inventors of the present invention found that -CiH=C-C- group (R represents a hydrogen atom, an alkyl group, a cyano group, or an aryl group) is converted into a reester, It has now been discovered that older materials containing polymers such as polyamide or 11 sericarbonate are preferred as overcoat layers for on-wafer polychromatic optical filters as described above, leading to the present invention.

In addition, in the case of multicolor apertures produced by on-wafer method, minute irregularities such as electrodes that make up the element are formed on the surface of the solid-state image sensor, and the When trying to form a multicolor optical filter, it may be difficult to apply the photosensitive resin of the filter forming phase, or even if it is possible to apply it, the film thickness of each filter element will vary, making it difficult to obtain good light transmittance. Therefore, before coating the photosensitive resin for filter formation, a smoothing layer is provided to fill in these irregularities and smooth the °C surface, as necessary. It has been found that the above polymer satisfying the properties is effective and can be used, for example, in combination with other resins to adjust the viscosity.Also, when forming a polychromatic optical filter,
For example, a relief of a first photosensitive resin is formed, this is dyed with a dye of a first color to form a first filter element, and then a relief of a photosensitive resin (17j resin is formed again). In the so-called dyeing filter forming method, which includes the process of dyeing this with a second color dye to form a second filter element, after the first dyeing is performed, the next dyeing is carried out. It is known as one type of resist dyeing treatment to provide a raw interlayer after dyeing so that color mixing does not occur in the previous dyeing pattern or dyed relief. Polymers are also effective in such intermediate layers.

Therefore, an object of the present invention is to provide a polychromatic optical filter having a novel overcoat layer and a method for manufacturing the same.

That is, the present invention provides a polychromatic optical filter in which color filter elements of at least two colors are regularly arranged on a support, in which an oatmeal coating layer for covering and protecting the surface of the polychromatic optical filter has a cyano group or A polychromatic optical filter is characterized in that it is formed of a photocured material having a polymer having an aryl group (representing an aryl group). In a polychromatic optical filter arranged in a multicolor optical filter, an O7!-coat layer for covering and securing the surface of the polychromatic optical filter, an undercoat layer and/or each filter element provided as necessary on the support. A polychromatic optical filter that is made of a photo-cured material having a hydrogen atom, an alkyl group, a cyan group, or an aryl group (if necessary, to prevent color mixing between the two). Furthermore, the present invention has a polychromatic optical frame in which at least two color filter elements are regularly arranged on a support consisting of a solid-state image sensor substrate (indicating an alkyl group, a cyano group, or an aryl group). After applying a polymer and then exposing at least a portion of the substrate corresponding to the bonding butt portion and photocuring the other portions to UV light to form an overcoat layer, the HV reamer in the unexposed portion is removed. This is a method for manufacturing a polychromatic optical filter.

Hereinafter, the present invention will be explained in more detail with reference to the drawings.

FIG. 1 shows a solid-state image sensor substrate (wafer) used in the present invention, and 10 is a solid-state image sensor 11 formed on a Si wafer by a normal wafer process.
This shows a solid-state image sensor substrate on which a large number of are arranged. Each solid-state image sensor 11 has a light receiving part 14 where pixels are assembled and a bonding pad part 12 for taking out a lead wire, as shown in FIG.

6 and 4 show the solid-state image sensor substrate 1 shown in FIG.
1 is a cross-sectional view schematically showing a color solid-state image sensor in which a polychromatic optical filter is provided on the color solid-state image sensor.

In FIG. 6, 15 is a layer provided on the surface of the solid-state image sensor substrate for preventing ion penetration into the substrate;
For example, it is formed of phosphosilicate glass (PSG) or silicon nitride. 16 is a polychromatic optical filter, for example, disclosed in Japanese Patent Application Laid-open No. 47-37237, Japanese Patent Application Laid-open No. 48-
Publication No. 63739.

JP 48-66855 or JP 56-2
As described in Publication No. 48, for example, a multicolor optical filter element is formed by repeating the process of coating a photosensitive layer such as dichromate gelatin for each color, exposing it imagewise, developing it to form a relief, and then dyeing it. Dyeing methods such as
3t" Opening and Closing Publication No. 55-6542, Japanese Patent Application Publication No. 56-756
As described in Japanese Patent Application Publication No. 06-06 and Japanese Patent Application Laid-Open No. 1982-91203, a method of forming a polychromatic optical filter element by repeatedly subjecting a silver halide emulsion layer to imagewise exposure and color development, or, for example, Japanese Patent Publication No. 40-8590 and Japanese Patent Publication No. 52-34
It is formed by a method using a glycoic film such as that described in Japanese Patent No. 40. Reference numeral 17 denotes an overcoat layer that is characteristic of the present invention, and is formed of a material obtained by photo-curing a polymer having a cyano group or an aryl group.

Bonding pad portion 12 of this overcoat layer 17
An opening 18 is formed in a portion corresponding to the bonding pad portion, and the layer 15 that prevents ion penetration into the substrate (such as a layer such as PSG) is also etched away to expose the bonding pad portion.
is formed. Further, it is preferable that a portion of this overcoat layer 17 corresponding to the guising cut portion 16 shown in FIG. 1 is also removed. In order to remove the overcoat layer 17 in the portions corresponding to the ponting butt portions 12 and the guising cut portions 16, after applying the overcoat layer 17, these portions are masked and exposed to remove other portions. After photo-crosslinking and preventing these portions from being photo-crosslinked, they may be removed with a solvent. In addition, in order to remove the layer (PSG layer) 15 that prevents penetration of ions corresponding to the bonding para)N (12), the overcoat layer 1 corresponding to the bonding pad portion is removed as described above.
After removing 7, the overcoat layer remaining may be used as a resist for etching with ammonium fluoride or plasma etching.

Here, as shown in FIG. 4, the surface of the solid-state image sensor is St, electrodes 26 and 24, an insulating film 22, etc. are provided on the substrate 21, and a minute uneven surface is formed for each pixel. In practice, it is preferable to provide a smoothing layer 25 to fill in these uneven surfaces and smooth the surface before forming the multicolor optical filter 16, and for example, when forming the multicolor optical filter by a dyeing method. After forming the first relief and dyeing it with a dye such as cyan, an intermediate layer 26 is applied to prevent color mixing with the next dyeing process, and then the intermediate layer 26 is applied to the next filter element. Relief formation and dyeing for the formation are also carried out, but these smoothing layers 25 and (in the formula, R is a hydrogen atom,
It is preferable to form the material by photocuring a polymer having an alkyl group, a cyano group, or an aryl group. By using the polymer described in ``2'', not only can an intermediate layer and a smoothing layer with favorable properties be obtained, but also an overcoat.) The bonding butt part 12 is exposed and the polymer in the dicing cut part is removed by a process similar to JF4. Furthermore, it is possible to remove the bonding butt portion 12 and the dicing cut portion in one step after providing the overcoat layer. When using the above sq IJ mom for the smoothing layer, it is effective to increase the viscosity by using a suitable resin in combination.

In the above explanation, the polychromatic optical filter of the present invention and its manufacturing method have been described based on the on-wafer method for forming a polychromatic optical filter. However, the present invention is not limited to the on-wafer method, and is applicable to color image pickup tubes, for example. The present invention can be applied to a polychromatic optical filter when a color solid-state image sensor is formed by a polychromatic optical filter and a bonding method. That is, when producing a color image pickup tube or a color solid-state image sensor using a bonding method, a step is required to bond the filter before forming it to a glass face plate or a solid-state image sensor wafer using an adhesive or the like. . Therefore, it is necessary to provide an overcoat layer on the filter surface to prevent the filter element from being affected (for example, the filter element may change color due to the influence of the amine in the epoxy-amine adhesive. After forming a large number of multicolor filters on a glass substrate of the same size, even if glass chips adhere to the filter surface when cutting the substrate, it can be easily removed by washing. It is necessary to provide an overcoat layer on the filter surface to prevent it from penetrating the filter surface and causing defects. Therefore, the polymer having a cyano group or an aryl group used in the present invention is photocured. These materials are also useful as overcoats for these polychromatic optical filters.

Since the remer itself has a certain degree of photosensitivity, the polymer itself can be used as an overcoat, but the multicolor of the present invention satisfies the above characteristics by adding a sensitizer to the remer to increase the photosensitivity. Optical filters can be obtained.

Photosensitive polymers in the case of elementary atoms are described in U.S. Patent No. 3.0.
30,208 and 3.707.373, and an example of using this polymer as a photosensitive layer of a photosensitive lithographic printing plate is described in JP-A-50-138961. However, a composition comprising such a polymer and a sensitizer satisfies all the characteristics required for the oatmeal coat for multicolor optical filters, and is suitable as an overcoat material. This is completely unexpected and was discovered for the first time by the present inventors.

The polymer used in the present invention contains a group represented by the above-mentioned general formula. An alkyl group is preferable, and a phenyl group is preferable as an aryl group. Preferred IJ polymers are polyesters, polyamides 9 and polycarbonates having groups of the above general formula.

, in the group represented by the above general formula, the -CH=CH- terminal is an aromatic nucleus (e.g. inzene nucleus, e.g. alkyl, 71
)-, aralkyl, alkoxy, nitro, amine, carboxy, halogen, or the like is preferably a nozene nucleus. ), and the -Co- terminus is preferably bonded to an aromatic nucleus (for example, those mentioned above are preferable), 0
-R3- (R3 represents an alkylene group) is preferably bonded to the nitrogen atom of ami r.

Suitable polymers are polyesters having the above-mentioned groups, which are polyester compounds which are dehydrated and condensed from polycarboxylic acids and sq IJ hydroxy compounds, which contain unsaturated double bonds in the main chain, and which have substantially organic It is a compound that is soluble in a solvent, and in particular, a compound that itself has film-forming ability is preferred. The unsaturated group is contained in either the polycarboxylic acid or the polyhydric alcohol. Typical polycarboxylic acids include P-phenylene diacrylic acid, fumaric acid, succinic acid, adipic acid, terephthalic acid, citric acid, tartaric acid,
Maleic acid, itaconic acid, phenylmaleic acid, chalcone type dicarboxylic acids represented by the following structural formula: and mixtures thereof are included. Typical polyhydric alcohols include ethylene glycol, polyethylene glycol (diethylene glycol, tri: r-f V 7
f rej-ru'! ? -), 1,5-propanediol, 1,6-hexanediol, neo-R-methyl glycol, 1,4-cyclohexane dimetatool, 1,4-
:)-β-hydroxyethoxy/cyclohexane, dihydroxychalcone, cyhydroxydibenzalketone and mixtures thereof.

Unsaturated polymers that can be used in the present invention include, for example, U.S. WF Nos. 3,030,208 and 3.707. Ro7
It was condensed from P-carboxycinnamic acid dimethyl ester and glycol diacetate described in each specification of No. (51J ester compound, a condensate of P-phenylene diacrylate and polyethylene glycol, a condensate of a chalcone type dicarboxylic acid and ethylene glycol having the following structural formula.

and copolymers of paraphenylene diacrylic/l/acid and 1,4-bis(β-hydroxyethoxy)cyclohexane, p-phenylene as described in U.S. Pat. No. 3,745,028. Polyester made by condensation of equimolar moles of jetoxyacrylate with 1,4-diβ-1-80oxycyclohexane, U.S. Pat. No. 2,9
56,878 and 3,173,787, for example, polyesters obtained by condensation of a 2-chloroberitemalonic acid compound such as cinnamylidenemalonic acid and a difunctional glycol. such as polyvinyl alcohol, starch, cellulose and the like, as described in U.S. Pat. Cinnamate esters of hydroxyl group-containing polymers such as those described in U.S. Pat. No. 3,376,168 and U.S. Pat. Canadian Patent No. 6, a prepolymer that becomes insolubilized by the action of actinic rays.
yl'' recarbonates as described in No. 96.997.

In the present invention, a sensitizer is preferably used together with the above polymer. Such sensitizers include, for example, U.S. Pat.
No. 10,120, No. 2,670,285, No. 2.67
No. 0,286, No. 2,670,287, No. 2,690
, No. 966, No. 2,732,301, No. 2,855,
No. 656, No. 2,956,878, No. 3,023,1
No. 00, No. 3,066.117, No. 3,141,77
No. 0, No. 3,173,787, No. 6,65 861, No. 5,409,596, No. 5,418,295,
&453,110.

No. 3,475,617, No. 3,561,969, No. 3,575,929, No. 3,582,327, No. 3
, No. 647,470, No. 3,721,566, No. 3,
767.319 etc. are included.

Specific examples of particularly useful sensitizers include 2-benzoylmethylene-1-methyl-β-naphthothiazoline, 5-nitroacenaphthene, β-chloroanthraquinone, 1.2-
Examples include benzal anthraquinone, p,p'-tetraethyldiaminodiphenylketone, p,p'-dimethylamino, nzophenone, 4-nitro-2-chloroaniline, and the like. The ratio of sensitizer to polymer is 0.5
A range of 15% by weight is preferred, with a particularly preferred range of 2-8% by weight.

The composition of the present invention is dissolved in a coating solvent and coated as an Ohno coat with a thickness of about 0.1 to 5 microns using a suitable means such as a spin code.

The coating solvent is ethylene dichloride, monochlorobenzene, glycol monomethyl ether, glycol monoethyl ether, glycol monomethyl ether acetate,! ') Col monoethyl ether, ruacetate, methanol, ethanol, propatool, ethyl acetate, butyl acetate, amyl acetate, etc. are easy to use.

The oat coat provided by the composition used in the present invention is etched away in the unexposed areas to expose the dicing and bond pad areas. The etchant used for this purpose is a solution containing 15 to 95% by weight of lactam and 2 to 30% by weight of benzyl alcohol. The lactams used here include, for example, propionlactam, butyrolactam (
2-pyrrolidone), valerolactam (pi is lidone), caprolactam, N-methylpyrrolidone, etc.

These may be used alone or in combination of two or more.

Particularly preferred lactams are caprolactam and butyrolactam. Particularly preferred lactams have an amount of about 20 to
It is 90% by weight. Lactones can also be used in place of lactams.

Etching the overcoat according to the invention - The etchant may further contain a solvent capable of dissolving or swelling the unexposed areas. Kaya solvents include e.g.
2-methoxyethanol, 2-ethoxyethanol, 2
-propoxyethanol, 2-nodoxyethanol, 2
-2-Alkoxy alcohols such as methoxyethyl acetate, 2-ethoxyethyl acetate, 2-propoxyethyl acetate and their acetate esters are used.

The etchant may further contain a surfactant to speed up the penetration of the etchant into the unfogged areas.

Effective surfactants include anionic surfactants and nonionic surfactants.

Anionic surfactants include l1iKtUu salts, aliphatic sulfonic acid salts, higher alcohol tL+mL ester salts, reduced alcohol phosphate esters, sulfonic acid salts of dibasic fatty acid esters, fatty acid amide sulfonic acids +&Q, and alkylaryl sulfones. There is a naphthalene sulfone sulfone condensed with acid salts and formaldehyde.

Nonionic and T51 surfactants include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, polyoxyethylene sorbitan alkyl esters, polyoxypropylene polyoxyethylene Ethers, polyethylene oxide/polypropylene oxide block cobolimer-1
1 is included. Details of these surfactants are provided in "Surfactant 1 Handbook" (Santrnsho Co., Ltd.) and the like.

Two or more of these surfactants may be used in combination.The amount used is not particularly limited, but the preferred range 1 is about 0.1 to 6% by weight, preferably about 0.1 to 6% by weight, based on the entire T-image solution. It is contained in an amount of 6 to 2% by weight.

The present invention will be explained below with reference to Examples.

Example: Seratin dichromate with a thickness of 0.7 micron was placed on a CCD type solid-state image sensor plate (containing a large number of QCCD type solid-state image sensors and having a protective layer made of phosphosilicate glass on the surface). A photocurable resin layer was provided, and UV exposure was performed using a mask (exposure pattern) made of a mosaic pattern thereon. Next, the exposed resin layer was washed with hot water to elute and remove the uncured portions, leaving a cured resin layer consisting of mosaic-like convex portions.

This cured resin layer was dyed with a yellow dye (Suminol, Milling, Yellow MR: manufactured by Sumima Kagaku Kogyo Co., Ltd.) to prepare a yellow colored resin film. Next, as a resist dyeing treatment for the resin film, a resist dye: trade name Mesitol N, B, S, l1q
uiol (manufactured by Bayer Co., Ltd.) was diluted 40 times with water and adjusted to pH 4 with acetic acid. The dye was immersed in a resist dyeing bath heated to 4DC for 4 minutes, then washed with washing water with a pH of about 6. Then, it was heated at 150C in the open for 60 minutes. A cyan colored resin film was further formed on the resist-dyed yellow colored resin film by a method similar to the method for forming the yellow colored resin film described above. However, in order to dye cyan, the dye used is Kayanor Milling Turkers Blue 3.
G (manufactured by Nippon Kayaku Co., Ltd.) was used.

The color filters formed as above are cyan, yellow, green (overlapping cyan and yellow),
The white (non-resin part) perfectly matches the COD picture element area. On top of this, a 1 micron thick layer of ethyl P-phelene diacrylate and an equimolar amount of 1.4-
His(β-human 80oxyethoxy)-cyclohexanone copolymer (2-benzoylmethylene as a sensitizer)
An oat ζ-coat resin layer consisting of 1-methyl-β-naphthotizoline (containing 2% by weight) was provided, and then 150%
After pre-hardening for C10 minutes, the bonding butt portion and the guising cut portion were covered thereon, and UV exposure was performed using a mask (exposure pattern) exposing the pixel area. Next, it was developed with r-butyrolactone, and the unexposed parts of the resin (bonding butt part and die cinder cut part) were eluted and removed. Then 170U
After 40 minutes of post-hardening, ammonium fluoride is used to etch and clean the phosphosilicate glass that was the surface protective layer on the bonding butt. (At the same time, the phosphosilicate glass layer on the dicing cut portion was also etched and removed.) Next, it was cut using a diamond V cutter while being showered with water, and separated into each color solid-state image sensor.

The separated color solid-state image sensor is exposed to water, trichloride,
Ultrasonic cleaning was performed using a solvent such as Freon to remove chips and oil adhering to the surface. The color image sensor thus obtained is then transferred to the wire bonding process, but when it was observed under magnification under a microscope before wire bonding, it was found that the oatmeal coat layer and the blue resin film had peeling. No changes to the filter, such as elution, decolorization, color mixing, or opacity, were observed. next,
This was left open for 6 hours at 2001:', subjected to 2-stroke thermography, and then observed under a microscope, but no change was observed here either. It was found that the colored resin film and overcoat layer also have excellent heat resistance.

This is wire bonded and pancaged, and C
It was installed in an OD color camera, and a color image with good color reproducibility was reproduced on a cathode ray tube.

[Brief explanation of drawings]

1 to 4 are a sectional view and a plan view showing an embodiment of the present invention. 10: Solid-state image sensor wafer. 12: Bonding bat, 16: Dicing section. 15: Ion permeation prevention layer, 16: Color filter. 17: Main barcode layer, 25: Smoothing layer. 26: Middle class. Figure 1 Figure 2 1. ! . Figure 3 Figure 4 Procedural Amendments Showa 581 March 2.3 Showa 5740! r, yti>, [ith 115554
Bow 2 Name of the invention Polychromatic optical filter and method for manufacturing the same: 3. Supplement i ``Person who does +'l No Seki I1.: '4-, '77'l Applicant friend? 1st name f520) Fuji Riki ° Shin Film Co., Ltd. 7 Subject of amendment [Detailed description of the invention j Column 8 Contents of amendment The "Detailed Description of the Invention" column is amended as follows. <1) On page 4, line 5 of the specification, "shi, kusu 1, sanase ni sama" was changed to "while aligning" iE 2) Same page 6 6
-7th line, [(e.g. gelatin dichromate) is corrected to R, e.g. gelatin dichromate. 6) In the 6th line from the 9th Teishi, [-because it can be obtained] is supplemented with ``because it cannot be obtained.'' iE. 4) In the 9th line of the 14th member, add ``penetration'' and ``infiltration''. '-) Same, 15th line, 2nd line, 1-penetration' is corrected to 'penetration'. ) On page 27, line 4, "ceratin chromate" is corrected to "gelatin dichromate." ) Same 27th line 10-11, 1 Suminol, Milling, Yellow MRJ [Sminol Milling Yellow M
RJ and Sode i "do. 8) Same page 27, line 7 from the bottom, (g), B, S. Correct 11qulolJ to [NBs 1lquldl, above~

Claims (1)

[Scope of Claims] (1.1 In a polychromatic optical filter in which color filter elements of at least two colors are regularly arranged on a support, an overcoat layer for covering and protecting the surface of the polychromatic optical filter is provided. -CH=C-C-11 O group (in the formula, R represents a hydrogen atom, an alkyl group, a cyano group, or an aryl group). (2) In a polychromatic optical filter in which color filter elements of at least two colors are randomly arranged on a support, an overcoat is used to cover and protect the surface of the polychromatic optical filter. The coating layer and the undercoat layer provided on the support or the intermediate layer provided to prevent color mixing between each filter element are made of a photocured material of a polymer having cyan groups or aryl groups). I know that it is formed
I? A polychromatic optical filter. (3) The polychromatic optical filter according to claim 1 or 2, characterized in that the support is a solid-state image sensor substrate. (4) The polychromatic optical filter according to claim 2, wherein the undercoat layer is a smoothing layer for smoothing the uneven surface of the solid-state image sensor substrate. (5) A polymer having at least two color filter elements regularly arranged on a support consisting of a solid-state imaging device substrate (wherein R represents a hydrogen atom, an alkyl group, a cyano group, or an aryl group); After coating the substrate, leaving at least a portion corresponding to the bonding butt portion and exposing the other portions to ultraviolet light to form an overcoat layer, the polymer in the unexposed portions is removed. A method for manufacturing a distinctive polychromatic optical filter.