JPS5963057A - Manufacture of floating type magnetic head - Google Patents
Manufacture of floating type magnetic headInfo
- Publication number
- JPS5963057A JPS5963057A JP17261482A JP17261482A JPS5963057A JP S5963057 A JPS5963057 A JP S5963057A JP 17261482 A JP17261482 A JP 17261482A JP 17261482 A JP17261482 A JP 17261482A JP S5963057 A JPS5963057 A JP S5963057A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- head
- magnetic head
- ion beam
- irradiating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
Abstract
Description
【発明の詳細な説明】
本発明は浮動型磁気ヘッドの製造方法に関し、特にスラ
イダー面のエツジの精密面取りを必要とする浮動型磁気
ヘッドの製造方法に係る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a floating magnetic head, and more particularly to a method for manufacturing a floating magnetic head that requires precision chamfering of the edges of a slider surface.
一般に浮動型磁気ヘッドは第１図のように磁性媒体であ
るディスク１の回転に伴う空気流による揚力とヘッド２
を支持するバネ３の加重により微少間隔看を有し浮上す
る。そしてヘッド２に組込まれた磁気記録再生変換器に
よりディスク１から信号を読み取ったり書き込んだりす
る。このようなヘッド２はディスク１が静止している時
にはヘッド２のスライダー面４とディスク］は面接触し
ており、回転が上がるに従い浮上する。ティスフ１０回
転が一定になるまでの時間にお（・てはへラド２は不安
定状態となりスライダー面４のエツジ部とディスク１が
衝突し、この時ディスクを傷つケタリ、エツジ部のカケ
脱落が起こりやすくなるため、エツジ部の面取りを行な
う必要がある。In general, a floating magnetic head uses the lift force generated by the air flow accompanying the rotation of the magnetic disk 1, as shown in Figure 1, and the head 2.
Due to the load of the spring 3 supporting it, it floats with a slight distance between the two. A magnetic recording/reproducing converter built into the head 2 reads and writes signals from the disk 1. In such a head 2, when the disk 1 is stationary, the slider surface 4 of the head 2 and the disk are in surface contact with each other, and as the rotation increases, the disk floats up. During the time it takes for the rotation of 10 revolutions to become constant, the disk 2 becomes unstable and the edge of the slider surface 4 collides with the disk 1, causing the disk to be damaged and the edge to break off. It is necessary to chamfer the edges.
従来、この種のエツジ面取りは第２図ａ、ｂの正面図、
側面図に示すように、ダイヤモンド砥粒等を保持した比
較的柔軟な研摩媒体５の上にヘッド２のスライダーエツ
ジを押しつけ摺４すさせることにより加工して（・た。Conventionally, this type of edge chamfering has been done in the front view shown in Figures 2a and b.
As shown in the side view, processing was carried out by pressing and sliding the slider edge of the head 2 onto a relatively flexible polishing medium 5 holding diamond abrasive grains or the like.
しかしながら、かかる方法では面取り部分の面積および
角度の制御がむすかしく、特に薄膜ヘッドのように磁性
体ボールがエツジに極めて近（・場合には磁性体ボール
部まで面取りを行なってしまう７１ど、歩留り良く安定
した面取り加工が困難であった。However, in such a method, it is difficult to control the area and angle of the chamfered portion, and the yield rate is reduced, especially in thin-film heads where the magnetic ball is very close to the edge (in some cases, the chamfering is performed to the magnetic ball portion71). It was difficult to achieve a good and stable chamfering process.
本発明の目的は上記欠点を解消し精密なエツジの面取り
加工を歩留り良く実現する浮動型磁気ヘッドの製造方法
を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a floating magnetic head that eliminates the above-mentioned drawbacks and realizes precise edge chamfering with a high yield.
本発明は、浮動型磁気ヘッドの磁性妖体に対向するスラ
イダー面の一部を写真触刻法括により形成された金属薄
膜あるいはフォトレジストマスクで拠り・、そのあとド
ライエソチンク“装置内にてイオンビームな照射するこ
とにより精密な面積と角度をもつ面増り部を有１゛ろ浮
動型は気ヘッドを製造する方法である。In the present invention, a part of the slider surface facing the magnetic body of a floating magnetic head is covered with a metal thin film or a photoresist mask formed by photolithography. The floating type is a method of manufacturing an air head that has an increased surface area with a precise area and angle by irradiation with an ion beam.
次に本発明の一実施例について図面を参照して説明する
。Next, an embodiment of the present invention will be described with reference to the drawings.
第３図から第６図までは本発明による浮動型磁気−・ラ
ドの製造方法の実施例を示し、第３図ａ。3 to 6 show an embodiment of the method for manufacturing a floating magnetic rad according to the present invention, and FIG.
ｂ、ｃは面取り前の薄膜ヘッド６の斜視図、スライダー
エツジ部分の拡大平面図、断面図である。b and c are a perspective view of the thin film head 6 before chamfering, an enlarged plan view of the slider edge portion, and a sectional view.
ここで磁性体ボール７は面取り加工されてはならな（・
部分である。第４図〜第６図はマスキング工程を示し、
第４図ａ、 ｂの平面図、断面図に示す工程では、薄
膜ヘッド６のスライダー面に７メトレジスト８を塗布お
よび乾燥し、第５図ａ、ｂの平面図、断面図に示す工程
にて露光、現像し、第６図ａ、ｂの平面図、断面図に示
す工程で高温ベークすることによりフォトレジスト８の
端部がなだらかに傾刺しマスキング工程が完了する。次
に第７図のように、マスキングされた薄膜ヘッド６をド
ライエツチング装置９内に入れ、適尚な照射角度になる
ようにセットし、矢印の方向からイオンビームを照射す
る。一定の時間経過拶、ドライエツチング装置゛９から
薄膜ヘッド６を取り出すと第８図ａ、ｂの平面図、断面
図に示すようにフォトレジスト８と薄膜ヘッド６のエツ
ジ部がそれぞれエツチングされ、そのあとフォトレジス
ト８を剥離すると、第９図ａ、ｂの平面図、障１面図に
示すようになる。この時、面取り形状はなだらかな傾斜
をもち、この角度θおよび面積Ｓはフォトレジスト形状
、イオンビームの照射角度および照射時間により精密に
制御できる。Here, the magnetic ball 7 must not be chamfered (・
It is a part. Figures 4 to 6 show the masking process,
In the step shown in the plan view and cross-sectional view of FIG. By exposing, developing, and baking at a high temperature in the steps shown in the plan view and cross-sectional view of FIGS. 6a and 6b, the edges of the photoresist 8 are gently tilted and the masking process is completed. Next, as shown in FIG. 7, the masked thin film head 6 is placed in a dry etching device 9, set at a suitable irradiation angle, and ion beam is irradiated from the direction of the arrow. After a certain period of time, when the thin film head 6 is taken out from the dry etching device 9, the photoresist 8 and the edge portions of the thin film head 6 are etched, as shown in the plan view and cross-sectional view of FIGS. 8a and 8b. After the photoresist 8 is peeled off, the result is as shown in the plan view and front view of FIGS. 9a and 9b. At this time, the chamfered shape has a gentle slope, and the angle θ and area S can be precisely controlled by the photoresist shape, ion beam irradiation angle, and irradiation time.
本発明は以上説明したように浮動型磁気ヘッドのスライ
ダー面の一部にマスクをかけドライエツチング装置内で
イオンビーム照射によりエツチングターることにより精
密な角度と面積を有するエツジ面取りを歩留り良くしか
も大級に加工できる効果がある。As explained above, the present invention masks a part of the slider surface of a floating magnetic head and etches it with ion beam irradiation in a dry etching device, thereby chamfering an edge with a precise angle and area with a high yield and large size. It has the effect of being able to be processed to a high level.
第１図は一般的な浮動捜磁気ヘッドとディスクとの関係
を示す側面図、第２図ａ、ｂは従来の製造方法を示す正
面図、側面図、第３図〜第９図は本発明の実施例を示し
、第３図ａ、ｂ、ｃは薄膜ヘッドの余１親、図、Ａ部拡
大平面図、Ｂ−Ｂ断面図、第４図ａ、第５図ａ、第６図
ａはマスキング工程を示す拡大平面図、第４図１ｂ、第
５図す、第６図すはマスキング工程を示すＣ−Ｃ，Ｄ−
Ｄ、Ｅ−Ｅ断面図、第７図はドライエツチング工程を示
す断面図、第８図ａ、第９図ａは面取り加工後を示す拡
大平面図、第８図ｂ、第９図すはそのＦ−Ｆ。
Ｇ−Ｇ断面図である。
１・・・・・・ディスク、２・・団・ヘッド、３・・・
・・・バネ、４・・・・・・スライダー面、５・・山研
摩媒体、６・・山薄膜ヘッド、７・・・・・・磁性体ボ
ール、８・・曲・フォトレ鱈 ／ 図
算 ？ 図
ｆ！７４７
鵠 ７ 口Fig. 1 is a side view showing the relationship between a general floating magnetic hunting head and a disk, Figs. 2 a and b are front and side views showing the conventional manufacturing method, and Figs. 3 to 9 are the invention of the present invention. FIGS. 3a, b, and c show the remaining parts of the thin-film head, an enlarged plan view of part A, a sectional view taken along line B-B, and FIGS. 4a, 5a, and 6a. 4 is an enlarged plan view showing the masking process, FIG. 4 1b, FIG. 5 S, and FIG.
D, EE sectional views, FIG. 7 is a sectional view showing the dry etching process, FIGS. 8a and 9a are enlarged plan views showing after chamfering, FIGS. 8b and 9 are F-F. It is a GG sectional view. 1...disc, 2...group head, 3...
...Spring, 4...Slider surface, 5...Mountain polishing medium, 6...Mountain thin film head, 7...Magnetic ball, 8...Song/photore cod / Illustration calculation ? Figure f! 747 goose 7 mouth
Claims (1)
イダー面の一部にマスクをかけ、そのあとドライエツチ
ング装置内にてイオンビームを照射させてスライダー面
のエツジ面取りを行なうことを特徴とする浮動型磁気ヘ
ッドの製造方法。 （２、特許請求の範囲（１）項において前記マスクとし
て写真蝕刻法により形成した金属薄膜ある（・け）λト
レジストを用（・ることを特徴とする浮動型硝気ヘッド
の製造方法。(1) A floating magnetic head characterized in that a part of the slider surface facing the magnetic medium of the floating magnetic head is masked, and then an ion beam is irradiated in a dry etching device to chamfer the edges of the slider surface. A method of manufacturing a type magnetic head. (2) A method for manufacturing a floating type nitrogen head according to claim (1), characterized in that the mask is a λ resist, which is a metal thin film formed by photolithography.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17261482A JPS5963057A (en) | 1982-10-01 | 1982-10-01 | Manufacture of floating type magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17261482A JPS5963057A (en) | 1982-10-01 | 1982-10-01 | Manufacture of floating type magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5963057A true JPS5963057A (en) | 1984-04-10 |
Family
ID=15945137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17261482A Pending JPS5963057A (en) | 1982-10-01 | 1982-10-01 | Manufacture of floating type magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5963057A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6421205B1 (en) | 1999-02-23 | 2002-07-16 | International Business Machines Corporation | Recessed slider trailing edge for reducing stiction |
| US7212380B2 (en) | 2004-04-26 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head with recessed overcoat |
| US7520048B2 (en) | 2004-05-28 | 2009-04-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method of fabricating a GMR head |
-
1982
- 1982-10-01 JP JP17261482A patent/JPS5963057A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6421205B1 (en) | 1999-02-23 | 2002-07-16 | International Business Machines Corporation | Recessed slider trailing edge for reducing stiction |
| US7212380B2 (en) | 2004-04-26 | 2007-05-01 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic write head with recessed overcoat |
| US7520048B2 (en) | 2004-05-28 | 2009-04-21 | Hitachi Global Storage Technologies Netherlands B.V. | Method of fabricating a GMR head |
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