JPS5958844A - Sealing method - Google Patents

Sealing method

Info

Publication number
JPS5958844A
JPS5958844A JP57168555A JP16855582A JPS5958844A JP S5958844 A JPS5958844 A JP S5958844A JP 57168555 A JP57168555 A JP 57168555A JP 16855582 A JP16855582 A JP 16855582A JP S5958844 A JPS5958844 A JP S5958844A
Authority
JP
Japan
Prior art keywords
sealed
ultraviolet rays
sealing
refrigerant
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57168555A
Other languages
Japanese (ja)
Inventor
Yoshinori Kataoka
好則 片岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP57168555A priority Critical patent/JPS5958844A/en
Publication of JPS5958844A publication Critical patent/JPS5958844A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto

Abstract

PURPOSE:To seal a body to be sealed completely by a method wherein an ultraviolet curing type resin is applied on the surface of a soldering section, the body to be sealed is radiated by ultraviolet rays from which heat waves are removed passing through refrigerant, the body to be sealed is cooled by the refrigerant, a coating is formed and a protective coating is baked. CONSTITUTION:An Si element 1 is soldered to the bottom of a radiator plate 2, a glass epoxy substrate 4 is superposed and a lead 8 is inserted into a hole 7, and a sealed space 5 is formed through compression bonding. Solder paste is applied to the hole 7 and heated, and a copper foil 6 is soldered 9 to the lead 8. A pigment, through which ultraviolet rays do not transmit, etc. are removed completely from the ultraviolet curing type resin, and decompressed and defoamed glass powder through which ultraviolet rays transmit is mixed in place of the pigment, etc. and applied thinly on the foil 6 and the solder 9. When an assembly 12 is placed on a cooling base 13 and ultraviolet rays are irradiated, hot waves are removed first by pure water 16, which is flowed back 19 and cooled 15, and only ultraviolet rays are radiated, and the assembly is cooled 13. Accordingly, a solid sealing coating 21 is completed, and no defect such as a pin hole is generated even when an epoxy resin 22 is superposed and baked.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、はんだ付は部分により密閉空間を形成する場
合に、はんだ部分に存在するピンホール等の欠陥によシ
惹起する各種障害を防止するための密閉方法に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention prevents various failures caused by defects such as pinholes existing in soldered parts when soldering parts form a sealed space. Regarding the sealing method for

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

近時多用されている自動車用の整流素子組立品は、ダイ
オード素子をはんだ部分で密閉した構造となっている。
Rectifying element assemblies for automobiles, which are frequently used these days, have a structure in which a diode element is sealed with a soldered part.

すなわち、第1図はこのことを示す整流素子組立品の要
部断面図であるが、Siダイオード素子(1)、 (1
)は、導電性の放熱板(2)の陥凹部(3) 、 (3
)と、上記放熱板(2)に加圧接着されたガラスエポキ
シ基板(4)とによ多形成された密閉空間(5)、(5
)に収納されている。上記ガラスエポキシ基板(4)の
Siダイオード素子(1)、(1)装着側とは反対側の
面には、銅箔(6)が被着されている。そして、ガラス
エポキシ基板(4)の密閉空間(5) 、 (5)形成
位置には、それぞれ1個の貫通孔(力、(力が穿設され
ていて、これら貫通孔(力、(力にはSiダイオード素
子(1)、 (1)のリード線(8)、(8)が遊挿さ
れている。そして、貫通孔(力、(7)の開口部分にお
いて、銅箔(6)とリード線(8)i8)がはんだ付け
されている。その結果、はんだ部分(9) 、 (9)
K ヨC1tfl?v3(6) (!: Si タイ、
t −)” 素子(1)、(1)が・電気的に接続され
るとともに、密閉空間(5) 、 (5)が外気から完
全に遮断される。なお、Siダイオードt’l) 、 
(1)は、放熱板(2)とSiダイオード(1)、(1
)との間に介在しているはんだ部分(10)、 (10
)によシ放熱板(2)に電気的に接続されている。一方
、銅箔(6)及びはんだ部分(9) 、 <9)上には
、耐我、*気的絶縁及びはんだ部分(9)、t9)に形
成されている例えばピンホール等のはんだ欠陥の穴埋め
を目的として、エポキシ樹脂、ポリエステル樹脂時の塗
膜01)が被着されている。ところが、塗装焼付けの際
に、密閉空間(5)、(5)中の空気が熱膨張し、膨張
した空気は、はんだ部分+9) 、 (9)中のピンホ
ール等のはんだ欠陥を通過して加熱纜よシ粘度が低下し
た塗虞圓を破壊し、塗膜Uυ中に外界への通気孔となる
ピンホールが形成される。上記ピンホールから密閉空間
(5) 、 (5)に流入した湿度の高い空気は、整流
素子組立品の使用時においては、約1500まで加熱さ
れる。その結果、密閉空間(5)、(5)に収納されて
いる8iダイオード素子(1)、(1)が酸化された寿
命が短くなったシ、上記はんだ部分(9)、f9)劃0
1. Qlの接触不良を惹起する等の信頼性低下の原因
となっている。
That is, FIG. 1 is a cross-sectional view of the main parts of a rectifier assembly showing this, and Si diode elements (1), (1
) are the recesses (3) of the conductive heat sink (2), (3
) and a glass epoxy substrate (4) that is pressure-bonded to the heat sink (2).
) is stored in. A copper foil (6) is attached to the surface of the glass epoxy substrate (4) opposite to the side on which the Si diode elements (1), (1) are attached. One through hole (force, (force) is drilled in each of the positions where the sealed spaces (5), (5) are formed in the glass epoxy substrate (4). The lead wires (8) and (8) of the Si diode element (1) and (1) are loosely inserted.Then, the copper foil (6) and the leads are connected at the opening of the through hole (7). The wire (8) i8) is soldered.As a result, the solder part (9), (9)
K YoC1tfl? v3(6) (!: Si tie,
t-)" Elements (1), (1) are electrically connected, and the sealed space (5), (5) is completely cut off from the outside air. Note that the Si diode t'l),
(1) consists of a heat sink (2) and a Si diode (1).
), the solder part (10), (10
) is electrically connected to the heat sink (2). On the other hand, on the copper foil (6) and the solder part (9), <9), there is a For the purpose of filling the holes, a coating film 01) of epoxy resin or polyester resin is applied. However, when baking the paint, the air in the sealed spaces (5) and (5) expands thermally, and the expanded air passes through solder defects such as pinholes in the solder parts +9) and (9). When heated, the coating film whose viscosity has decreased is destroyed, and pinholes are formed in the coating film Uυ, which serve as ventilation holes to the outside world. The humid air flowing into the closed spaces (5), (5) through the pinholes is heated to about 1500 ℃ when the rectifying element assembly is used. As a result, the 8i diode elements (1), (1) housed in the sealed spaces (5), (5) were oxidized and their lifespan was shortened.
1. This causes a decrease in reliability such as poor contact of Ql.

〔発明の目的〕[Purpose of the invention]

本発明は、上記事情を参酌してなされたもので、はんだ
付は部分によシ密閉空間を形成する場合に、はんだ付は
部分にピンホール等の密封性を害する欠陥が存在しても
、外気から完全に遮断された密閉空間を形成することの
できる密閉方法を提供することを目的とする。
The present invention has been made in consideration of the above-mentioned circumstances, and when soldering is used to form a sealed space in a part, even if there is a defect in the part that impairs the sealing property, such as a pinhole, soldering can be performed. It is an object of the present invention to provide a sealing method capable of forming a sealed space completely cut off from the outside air.

〔発明の概要〕[Summary of the invention]

はんだ付けによjl閉空間が形成される被密閉体の少な
くともはんだ付は部分表面に紫外線硬化型樹脂を塗布し
、この紫外線硬化型樹脂が塗布された被密閉体に熱線を
吸収する冷媒を通過した紫外線を照−射するとともに、
上記冷媒にょシ上記被密閉体を冷却して、密閉塗膜を形
成したのち、この密閉塗j戻上にエポキシ樹脂、ポリエ
ステル樹脂等の強固な保映塗腺を焼成するようにしたも
のである。
A closed space is formed by soldering.At least for soldering, UV-curable resin is applied to the partial surface of the sealed body, and a coolant that absorbs heat rays is passed through the sealed body coated with this UV-curable resin. In addition to irradiating ultraviolet rays,
After cooling the object to be sealed with the refrigerant and forming a sealing coating, a strong reflective coating of epoxy resin, polyester resin, etc. is fired on the sealing coating. .

〔発明の実施例〕[Embodiments of the invention]

以下、本発明を図面を参照して実施例に基づいて詳述す
る。なお、以下の説明においては、従来技術の説明に用
いた第1図と同一部位には同一記号を付し−Cいる。
Hereinafter, the present invention will be described in detail based on embodiments with reference to the drawings. In the following description, the same parts as in FIG. 1 used to explain the prior art are given the same symbols -C.

まず、第2図に示す陥凹部(3)を竹する例えば鉄板等
の放熱板(2)の底部に、rよんだペーストを塗布し、
その上にSiダイオード(1)を載置する。しかるのち
、上記Siダイオード(1)を載置した放熱板(2)を
加熱炉中eこ−置時間保持してはんだペーストを溶融さ
せたのし加熱炉から取出し、Siダイオード(1)を放
熱板(2)にはんだ付けする。その結果、Siダイオー
ド(f)と放熱板(2)とが、はんだ部分(10) k
 )’r Lで電気的に接続される。しかして、銅箔(
6)を被着したガラスエポキ/基板(4)を、上1fC
8’ダイオードfl)を収納した放熱板(2)に、Si
ダイオード(1)のリード線(8)が19「定の貫通孔
(7)に挿通するように重ね合わせ、加圧接着し密閉空
間(5)を形成する。つぎに、貫通孔(7)の開口部分
に、はんだペーストをmシ、加熱炉中に一定時間保持し
たのち取出して、リード線(8)を銅箔(6)にはんだ
部分(9)を介してはんだ付けする。しかるのち、第1
衣に示す紫外線硬化型の樹脂から充填剤としての紫外線
を透過しない顔料及び体質顔料を完全に除去し、代シに
充填剤として紫外線を透過する径10〜13μmのガラ
ス粉末(例えば日東紡製のガラス粉末A;生成分は二酸
化ケイ素、酸化アルミニウム、酸化カルシウムでちゃ繊
維状である。)を、樹脂100部に対して、75部混合
し、ホモジナイザによp、10.00Orpmで約30
分かく拌する。つぎに、減圧脱泡した上記ガラス粉末を
充填剤として含有する紫外線硬化型の樹脂を、銅箔(6
)上及びはんだ部分(9)上に厚さ数10μmないし数
100μmの範囲内になるように塗布する。
First, apply R-type paste to the bottom of a heat dissipation plate (2), such as an iron plate, which has a recessed part (3) shown in Fig. 2.
A Si diode (1) is placed thereon. After that, the heat sink (2) on which the Si diode (1) is mounted is kept in the heating furnace for a period of time to melt the solder paste, and then taken out from the heating furnace and the Si diode (1) is placed on the heat sink. Solder to board (2). As a result, the Si diode (f) and the heat sink (2) are connected to the solder part (10) k
)'r Electrically connected at L. However, copper foil (
The glass epoxy/substrate (4) coated with
Si
The lead wire (8) of the diode (1) is overlapped so that it passes through the through hole (7) of 19", and is bonded under pressure to form a sealed space (5). Next, the through hole (7) is After applying solder paste to the opening and keeping it in the heating furnace for a certain period of time, it is taken out and the lead wire (8) is soldered to the copper foil (6) via the solder part (9). 1
Pigments and extender pigments that do not transmit ultraviolet rays as fillers are completely removed from the ultraviolet curable resin shown in the coating. Glass powder A (produced components are silicon dioxide, aluminum oxide, calcium oxide and is fibrous) was mixed with 75 parts to 100 parts of resin, and then mixed with a homogenizer at 10.00 rpm to approx.
Stir briefly. Next, a copper foil (6
) and the solder portion (9) to a thickness of several tens of micrometers to several hundred micrometers.

この場合、はんだ部分(9)の形状が複雑であるので、
厚い部分の樹脂厚みは、数mmに達する。しかして、上
記紫外線硬化型樹脂が塗布された被密閉体である整流素
子組立品(121を、第3図に示す冷却台(131上第
1表 に載置する。この冷却台(13)内部には熱を吸収する
例えば純水などのような冷媒が循環するようになってい
る。そして、冷却台(13)の冷媒人口側は、導管(1
41を介して作動装置(151に接続されている。冷却
台Uの上方には、熱線吸収体(Itjが配設されている
In this case, since the shape of the solder part (9) is complicated,
The resin thickness in the thick part reaches several mm. The rectifying element assembly (121), which is a sealed object coated with the ultraviolet curable resin, is placed on the cooling stand (131 shown in Table 1 above) shown in FIG. 3. Inside this cooling stand (13) A refrigerant such as pure water that absorbs heat is circulated through the cooling stand (13).The refrigerant side of the cooling stand (13) is
It is connected to the actuating device (151) via 41. Above the cooling stand U, a heat ray absorber (Itj) is arranged.

この熱線吸収体tL6)は、例えば石英製の透明な中空
容器に上記冷媒である純水が冗填されるようになってい
る。そして、この熱線吸収体([0の一端部側は、導管
αDを介して冷却装置Uωに接続されている。
This heat ray absorber tL6) is configured such that a transparent hollow container made of, for example, quartz is redundantly filled with pure water, which is the refrigerant. One end of this heat ray absorber ([0) is connected to a cooling device Uω via a conduit αD.

まだ、熱線吸収体四の他端部側は、導管q81を介して
冷却台(13)の冷媒出口側に接続されている。そして
、上記冷媒が、矢印(11・・・方向に、熱線吸収体(
16)冷却装置α四及び冷却台α尋問を項流するように
なっている。しかして、熱線吸収体t16)の上方に設
置されている出力が例えば80W/cIrLの高圧水銀
ラング(7!eから、365 nm付近の紫外線光を照
度1000W/m2に調整し、熱線吸収体uQを透過さ
せて、整流素子組立品a4にWJ10秒間照射する。こ
のとき、面圧水銀ランプ四から投射された紫外線中に含
まれている熱線である赤外線は、熱線吸収体住6)中の
冷媒に吸収され、紫外線のみが、菫亜された紫外線硬化
型樹脂に照射される。また、冷却台(2)上に載置され
ている整流素子組立品(121自体も冷却される。した
がって、紫外線硬化型樹脂の粘度が下がったシ、密閉空
間(5)中の空気が膨張して、樹脂膜を破壊したシする
ことがないので、塗布された樹脂の紫外線硬化によシ堅
牢な密閉塗膜(2刀が形成される(第2図参照)。また
、本実施例で用いている紫外線硬化型の樹脂は、充填剤
としてガラス粉末を用いているので、上記樹脂厚みが数
量に達する部位でも、紫外線はその底部(はんだ部分(
9)及び銅箔(6)の表面)まで十分に到達する。した
がって、充填剤として上記紫外線を、透過しない顔料前
を用いた場合に比べて内部硬化性並びにはんだ部分(9
)及び塗膜Cυ上に、電気的絶縁性及び耐食性を有する
例えばエポキシ樹脂、ポリエステル樹脂、7リコーン樹
脂、ポリウレタン樹脂等の塗料を厚き50μmないし8
0μm8度になるように塗布する。しかして、たとえば
170°Cにて30分間焼成し、第4図に示すような保
護塗膜し秒を形成する。このとき、密閉空間(5)中の
空気は熱膨張するが、はんだ部分(9)と保護塗膜Q3
Jとの間には、上記密閉塗膜(2υが介在しているので
、密閉空間(5)中の空気の外部への膨出は密閉塗膜(
121で阻止され、保護塗膜(2渇中にはピンホール等
の密」4性を害する欠陥は形成されな−。
The other end of the heat ray absorber 4 is still connected to the refrigerant outlet side of the cooling stand (13) via a conduit q81. Then, the refrigerant is directed toward the heat ray absorber (
16) Cooling device α4 and cooling stand α interrogation are connected to each other. Therefore, from a high-pressure mercury rung (7!e) with an output of 80 W/cIrL installed above the heat ray absorber t16), the ultraviolet light around 365 nm is adjusted to an illuminance of 1000 W/m2, and the heat ray absorber uQ The rectifying element assembly a4 is irradiated with WJ for 10 seconds.At this time, the infrared rays, which are heat rays contained in the ultraviolet rays projected from the surface pressure mercury lamp 4, are absorbed by the refrigerant in the heat ray absorber housing 6). Only the ultraviolet rays are irradiated onto the violet-coated ultraviolet curable resin. In addition, the rectifying element assembly (121 itself) placed on the cooling stand (2) is also cooled. Therefore, the viscosity of the ultraviolet curing resin decreases, and the air in the closed space (5) expands. Since the resin film will not be destroyed by UV curing of the applied resin, a robust sealing film (see Fig. 2) is formed. The UV-curable resin used in this product uses glass powder as a filler, so even if the resin reaches the thickness mentioned above, the UV rays will only reach the bottom (solder part).
9) and the surface of the copper foil (6)). Therefore, compared to the case where a pigment material that does not transmit the ultraviolet rays is used as a filler, internal hardening and solder parts (9
) and the coating film Cυ, a paint having electrical insulation and corrosion resistance, such as epoxy resin, polyester resin, 7 silicone resin, polyurethane resin, etc., is applied to a thickness of 50 μm to 8 μm.
Apply so that the thickness is 0 μm and 8 degrees. Then, it is baked at, for example, 170° C. for 30 minutes to form a protective coating as shown in FIG. At this time, the air in the closed space (5) thermally expands, but the solder part (9) and the protective coating Q3
Since the sealing coating film (2υ) is interposed between the sealing coating film (2υ) and the sealing coating film (2υ), the expansion of air in the sealed space (5) to the outside is prevented by the sealing coating (
121, and no defects that impair the properties of the protective coating (2, such as pinholes, etc., are formed during drying).

また、保a塗膜(lは、はんだ部分(9)に対するより
も、密閉塗膜(211に対する方が密着性が良好であシ
、保護塗膜(221は密閉塗膜上に一体的に被着する。
In addition, the protective coating (l) has better adhesion to the sealing coating (211) than to the solder portion (9), and the protective coating (221 is integrally coated on the sealing coating). wear it.

したがって、保護塗膜は、銅箔(6)の腐食の防止及び
電気的絶縁とともに、密閉塗膜(121と一体となって
密閉空間の気密性を維持する。
Therefore, the protective coating film not only prevents corrosion of the copper foil (6) and provides electrical insulation, but also works together with the sealing coating film (121) to maintain the airtightness of the sealed space.

つぎに、本実施例の性能試験結果について述べる。Next, the performance test results of this example will be described.

まず、はんだ部分(9)にドリルで貫通孔(7)と連通
ずる直径0.5van 、 1 mm及び1.5 mr
nの通気孔を穿設し、第3図に示す冷却のだめの装置を
用いて密閉塗膜0D及び保護塗膜(24を形成する。こ
の場合、密閉塗膜(2D形成のための紫外線硬化型樹脂
は、粘度が2000 cP及び4600 cPの2種類
のものを用いる。しかして、通気孔の穴径と紫外線硬化
域樹脂の粘度との6種類の各組合せについて、100個
の試験片を作成し、このときの保護塗JM (22)に
生じているピンホールの有無による合格率を第2表に示
した。
First, drill a hole in the solder part (9) with a diameter of 0.5 van, 1 mm and 1.5 mr to communicate with the through hole (7).
n ventilation holes are drilled, and a sealing coating film 0D and a protective coating film (24) are formed using the cooling tank device shown in FIG. Two types of resin were used with viscosities of 2000 cP and 4600 cP.100 test pieces were created for each of the six combinations of the hole diameter of the vent hole and the viscosity of the ultraviolet curing resin. Table 2 shows the pass rates based on the presence or absence of pinholes in the protective coating JM (22).

この第2表中には、第3図に示す冷却のだめの装置を用
いず、常温の載物台上に載置された試験片に直接紫外線
を照射した場合の合格率を合わせて併記しである。この
表かられかるように、粘度が2000 cPの場合、本
実施例の方が、冷却しない場合に比べて格段に密閉性能
が同上する。ことに、孔第   2   表 径が大きくなるほどその効果は大きくなる。一方、高粘
度である4600 cPの場合は、両者とも密閉性能に
ほとんど差はないが、それでも冷却しなかった場合、わ
J″かであるが不良品が発生するのに対して、本実施例
の場合は、不良品は全く発生しない。
This Table 2 also includes the pass rate when the ultraviolet rays are directly irradiated to the test piece placed on the stage at room temperature without using the cooling reservoir device shown in Figure 3. be. As can be seen from this table, when the viscosity is 2000 cP, the sealing performance of this example is significantly higher than that of the case without cooling. In particular, the larger the second surface diameter of the pores, the greater the effect. On the other hand, in the case of a high viscosity of 4600 cP, there is almost no difference in sealing performance between the two, but if it is not cooled, some defective products will occur, whereas in this example In this case, there will be no defective products at all.

したがって、本実施例による密閉方法によれば、はんだ
部分(9)にピンホール等の密閉性を害する欠陥が存在
していても、密閉空間の気密性を維持することができる
Therefore, according to the sealing method according to this embodiment, even if there is a defect such as a pinhole in the solder portion (9) that impairs the sealing property, the airtightness of the sealed space can be maintained.

なお、上記実施例においては、紫外線硬化型樹脂に顔料
及び体質顔料の代シにガラス粉末を添加したが、これに
制約されることなく、ガラス粉末を添加することなく、
通常の顔料及び体質顔料を含有する紫外線硬化型樹脂を
用いてもよい。さらに、上記実施例においては、同一の
純水を用いて、紫外線中の熱線を吸収するとともに、整
流素子組立品(12)を冷却しているが、それぞれ異な
る純水によシ行ってもよい。きらに、実際の量産ライン
においては、整流素子組立品u4近傍の雰囲気全体を冷
却するようにしてもよい。また、熱線吸収体a〜の容器
羽村は、石英に限ることなく、通常のナトリウム・ガラ
スでもよい。さらにまた、冷媒も純水に限ることなく、
市水でもよい。
In addition, in the above example, glass powder was added to the ultraviolet curable resin in place of the pigment and extender pigment, but there is no limitation to this, and without adding glass powder,
An ultraviolet curable resin containing ordinary pigments and extender pigments may also be used. Further, in the above embodiment, the same pure water is used to absorb heat rays in ultraviolet rays and cool the rectifying element assembly (12), but different pure water may be used for each. . Furthermore, in an actual mass production line, the entire atmosphere near the rectifier assembly u4 may be cooled. Moreover, the container hamura of the heat ray absorber a is not limited to quartz, and may be made of ordinary sodium glass. Furthermore, the refrigerant is not limited to pure water.
City water is also fine.

〔発明の効果〕〔Effect of the invention〕

本発明の密閉方法によれば、紫外線硬化型樹脂の硬化中
に、密閉空間中の空気が膨張したシ、樹脂の粘度が低下
したシすることがなくなシ、よシ完全に密閉塗膜を形成
できるので、保護塗膜焼成中に、保護塗膜にピンホール
が発生したシ、さらには、実際の使用中に、亀裂や剥離
したシすることがないので、密閉空間の気密性が十分に
保障される。しだがって、密閉空間に収納されている電
気部品は、完全に外気から遮断され、高温多湿の過酷な
環境下においても酸化や腐食を受けず電気部品の寿命が
長く在る。
According to the sealing method of the present invention, the air in the sealed space does not expand or the viscosity of the resin decreases during curing of the ultraviolet curable resin, thereby completely sealing the coating film. This prevents pinholes from forming in the protective coating during firing, and also prevents it from cracking or peeling during actual use, ensuring sufficient airtightness in closed spaces. Guaranteed. Therefore, electrical components housed in a sealed space are completely isolated from the outside air, and do not suffer from oxidation or corrosion even in harsh environments of high temperature and humidity, and have a long lifespan.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来技術によシ形成された密閉全問を示す断面
図、第2図は本発明の一実施例の密閉方法による密閉塗
膜の形成を示す断面図、第3図は本発明の一実施例の密
閉方法による整流素子組立品に対する紫外線照射を示す
説明図、第4図は第躾 2図の密閉塗膜上への保腹塗〆の形成を示す断面図であ
る。 aω:整流素子組立品(被密閉体)、 (11:冷却装置、    (−二熱線吸収体、Cυ:
密閉塗膜、    @:保護塗膜。 代理人 弁理士  則 近 憲 佑 (ほか1名〕 第1図
Fig. 1 is a cross-sectional view showing the entire seal formed by the conventional technique, Fig. 2 is a cross-sectional view showing the formation of a sealing film by the sealing method of one embodiment of the present invention, and Fig. 3 is the present invention. FIG. 4 is an explanatory view showing ultraviolet ray irradiation on a rectifying element assembly according to the sealing method of one embodiment, and FIG. 4 is a cross-sectional view showing the formation of a bulge-retaining coating on the sealing coating of FIG. 2. aω: Rectifier assembly (sealed body), (11: Cooling device, (-biheat ray absorber, Cυ:
Sealing coating, @: Protective coating. Agent Patent attorney Kensuke Chika (and 1 other person) Figure 1

Claims (4)

【特許請求の範囲】[Claims] (1)被密閉体の一部をはんだ付けして上記被密閉体に
密閉空間を形成する工程と、上記被密閉体の少なくとも
はんだ付けされた部分に紫外線硬化型樹脂を塗布する工
程と、上記被密閉体の昇温を防止しながら紫外線を上記
被密閉体に塗布された紫外線硬化型樹脂に照射して密閉
塗膜を形成する工程と、上記密閉塗膜上に絶縁性塗料を
塗布したのち焼成して保護塗膜を形成する工程とを具備
することを特徴とする密閉方法。
(1) a step of soldering a part of the object to be sealed to form a sealed space in the object to be sealed; a step of applying an ultraviolet curable resin to at least the soldered portion of the object to be sealed; A process of forming a sealing coating film by irradiating ultraviolet rays onto the ultraviolet curable resin coated on the sealing body while preventing the temperature rise of the sealing body, and after applying an insulating paint on the sealing coating. A sealing method characterized by comprising the step of baking to form a protective coating film.
(2)被密閉体を冷却することによシこの被密閉体の昇
温を防止することを特徴とする特許請求の範囲第1項記
載の密閉方法。
(2) The sealing method according to claim 1, characterized in that temperature rise of the sealed object is prevented by cooling the sealed object.
(3)冷媒中を透過した熱線を含まない紫外線を被密閉
体に照射することによシこの被密閉体の昇温を防止する
ことを特徴とする特許請求の範囲第1項又は第2項例記
載の密閉方法。
(3) Claims 1 or 2 characterized in that temperature rise of the sealed object is prevented by irradiating the sealed object with ultraviolet rays that do not include heat rays that have passed through the refrigerant. Sealing method described in example.
(4)冷媒が純水であることを特徴とする特許請求の範
囲第3項記載の密閉方法。
(4) The sealing method according to claim 3, wherein the refrigerant is pure water.
JP57168555A 1982-09-29 1982-09-29 Sealing method Pending JPS5958844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57168555A JPS5958844A (en) 1982-09-29 1982-09-29 Sealing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57168555A JPS5958844A (en) 1982-09-29 1982-09-29 Sealing method

Publications (1)

Publication Number Publication Date
JPS5958844A true JPS5958844A (en) 1984-04-04

Family

ID=15870192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57168555A Pending JPS5958844A (en) 1982-09-29 1982-09-29 Sealing method

Country Status (1)

Country Link
JP (1) JPS5958844A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05138348A (en) * 1991-11-15 1993-06-01 Nippon Steel Corp Automatic welding equipment
JP2020520553A (en) * 2017-05-02 2020-07-09 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Electronic assembly having a device inserted between two substrates and method of making the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05138348A (en) * 1991-11-15 1993-06-01 Nippon Steel Corp Automatic welding equipment
JP2020520553A (en) * 2017-05-02 2020-07-09 シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft Electronic assembly having a device inserted between two substrates and method of making the same

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