JPS5952845A - Shifter for substrate - Google Patents

Shifter for substrate

Info

Publication number
JPS5952845A
JPS5952845A JP16347182A JP16347182A JPS5952845A JP S5952845 A JPS5952845 A JP S5952845A JP 16347182 A JP16347182 A JP 16347182A JP 16347182 A JP16347182 A JP 16347182A JP S5952845 A JPS5952845 A JP S5952845A
Authority
JP
Japan
Prior art keywords
overturning
substrates
substrate
arm
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16347182A
Other languages
Japanese (ja)
Inventor
Shigeo Inomata
猪又 重郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16347182A priority Critical patent/JPS5952845A/en
Publication of JPS5952845A publication Critical patent/JPS5952845A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

PURPOSE:To vary the arrangement of the substrates, to shift them in a carrier and to improve efficiency, reliability and stability by attracting the substrate to an arm, turning the substrate over by an overturning mechanism and shifting it. CONSTITUTION:The shaft 4 of the overturning arm 2 and a motor shaft are connected by a driving belt 6 in an overturning drive system, and the overturning arm is turned in a 180-degree arc by the revolution of a motor 5, and returned by a reversal. Pairing cylinders 7 are disposed on the same line crossing at right angles with an air bearing 9 and driven simultaneously on an overturning and the substrates 10 are positioned at predetermined positions by positioning pins 8, 8' as cylinder arms in a cylinder system. The substrates 10 are held by a vacuum chuck 3 set up at the nose of the overturning arm2, and shifted on the air bearing 9 by the overturning of the overturning arm 2. The surfaces and backs of the substrates 10 are disposed alternately in the arrangement of the substrates in the carrier 12', that is, a back-to-back is formed by overturning the substrates 10 on every other substrate, and the substrates can be fed to a CVD device through a vapor growth method.

Description

【発明の詳細な説明】 (a)  発明の技術分野 本発明は半導体ウェハの自動給料に係り、特に基板を反
転する反転機構を備えた基板移替機に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to automatic feeding of semiconductor wafers, and more particularly to a substrate transfer machine equipped with a reversing mechanism for reversing substrates.

(bン 技術の背景 半導体装置の生産プロセスは#導体ウェハ内に素子及び
回路パターンを組込んだ多数個の半導体素子を形成させ
、この半導体素子を個々に分割する方法が一般的で、ま
た半導体ウェハに施す各種の処理は生産性を向上させ、
半導体素子の特性バラツキを低減させる等の理由から複
数枚の半導体つ 4エバをキャリアに収容し同時に行なう、−男手導体つ
エバは厳しい管理条件のもとて高度の電気的化学的処理
がなされ、しかも微細加工であるため特に高い信頼度が
要求される。高品質を維持するため各加工装置を全自動
化して連結するインラインシステムが要請される。
(b) Background of the Technology The production process for semiconductor devices is generally to form a large number of semiconductor elements incorporating elements and circuit patterns in a conductor wafer, and to divide these semiconductor elements into individual pieces. Various treatments applied to wafers improve productivity,
For reasons such as reducing variations in the characteristics of semiconductor elements, multiple semiconductor wafers are housed in a carrier and processed simultaneously. -Male conductor evaporators undergo highly advanced electrochemical processing under strict control conditions. Moreover, since it is microfabricated, particularly high reliability is required. In order to maintain high quality, an in-line system that fully automates and connects each processing device is required.

(c)  従来技術と問題点 インライン方式の半導体クエハカロエ装置では例えはゲ
ート電極、絶M1.膜等の形成にはCVD装置が、また
回路パターン形成にはレジスト膜塗布、露光転写、現像
、エツチング等の各装置が最適の条件下に配設されその
各装置r#11をベルト又はエアベアリング吟で連結し
、半導体ウェハ全自動搬送する。半導体ウェハLキャリ
ア内に複数枚収容され加工装置によっては予備室に導入
し予備加熱又は減圧して装置に供給される。この場合半
導体ウェハは同一キャリアに収容された状態で各加工装
置にセットされるのが理想的であるが処理方法の相違か
ら専用キャリアへの移替又は半導体ウェハの配列を変更
する必要からノ・ンドリンク操作を伴なうクエハのρ*
***/1′り矛タヂタクゲl〆ダ/4!l夕りz、g
azヴ移替が必要となる。か\る移替操作は装置の効率
を低下させるとともにウェハ特性に悪影響を与えること
になる。
(c) Prior art and problems In the in-line type semiconductor Kuehakaloe device, for example, the gate electrode, the absolute M1. A CVD device is used to form films, etc., and devices for resist film coating, exposure transfer, development, etching, etc. are installed under optimal conditions to form circuit patterns, and each device r#11 is connected to a belt or air bearing. Connected by Gin, fully automatic transfer of semiconductor wafers. A plurality of semiconductor wafers are stored in an L carrier, and depending on the processing equipment, they are introduced into a preliminary chamber, preheated or depressurized, and then supplied to the equipment. In this case, ideally, the semiconductor wafers should be set in each processing device while being housed in the same carrier, but due to differences in processing methods, it may be necessary to transfer to a dedicated carrier or change the arrangement of the semiconductor wafers. Queha's ρ* with link operation
***/1' Riko Tajitakuge l〆da/4! l evening z, g
Azv transfer is required. Such transfer operations reduce the efficiency of the equipment and adversely affect wafer characteristics.

(d)  発明の目的 本発明は上記の欠点に鑑みキャリア内に収容する半導体
基板を他のキャリア内に基板配列を変更して収容可能な
反転機能を有する基板移替機の提供を目的とする。
(d) Purpose of the Invention In view of the above-mentioned drawbacks, the present invention aims to provide a substrate transfer machine having a reversing function that allows a semiconductor substrate accommodated in a carrier to be accommodated in another carrier by changing the substrate arrangement. .

(ピン 発明の構成 上記目的は本発明によれば、基板をアームに吸着させ、
該アームがモータ駆動で反転する反転機構によ仄、前記
基板を反転させ移替を行なうことtl−特徴とする基板
移替機〇 (f)  発明の実施例 以下本発明の実施例fc図面によシ詳述する。
(Pin Structure of the Invention According to the present invention, the above object is to attract the substrate to the arm,
A board transfer machine characterized by reversing and transferring the board by using a reversing mechanism in which the arm is reversed by motor drive. I will explain in detail.

第1図は本発明の一実施例である基板移替機を示す構成
図、第2図は本発明の一実施例である反転アーム部を示
す上面図である0上下に移動するテーブル11上にキャ
リア12を載置し、キャリア12内の基板10を順次ベ
ルト又はエアベアリング9上に送出する。送出された基
板10は反転機構を有する基板移替機1により必要時に
基板10を反転させ他の専用キャリア12′に収容され
る。
FIG. 1 is a configuration diagram showing a board transfer machine which is an embodiment of the present invention, and FIG. 2 is a top view showing a reversing arm part which is an embodiment of the present invention. The carrier 12 is placed on the carrier 12, and the substrates 10 in the carrier 12 are sequentially delivered onto the belt or air bearing 9. The sent-out substrate 10 is inverted when necessary by a substrate transfer machine 1 having a reversing mechanism, and is accommodated in another dedicated carrier 12'.

基板移替機1は基板10を吸着保持するバーキュームチ
ャック3を設けた反転アーム2と反転アーム2を駆動す
るモーター5で構成される反転駆動系と、基板10を位
置決めピン8によシ所定位置に固定するシリンダー系と
で構成される。反転駆動系では反転アーム20回転軸4
とモータ軸とを駆動ベルト6で連結し、モータ5の回転
によシ反転アームを180°回転させ、又逆回転によシ
復帰させる。一方シリンダー系では対をなすシリンダー
7をエアベアリング9に直交する同一線上に配設して反
転時、同時に駆動させシリンダーアームをなす位置決め
ピン8.8′によυ基板10を所定位置に位置決めする
。このように位置決めされた基板10は反転アーム2の
先端に設けたパーキ二−ムチャック3に保持され、反転
アーム2の反転によシェアベアリング9上に移替される
0パキーユームチヤツク3は反転アーム2に設けた真空
供給路13によシ保持又は解放する。解放された基板1
0は他のキャリア12’に収容される。この操作を11
次繰り返すが例えば基板1oを1個おきに反転させるこ
とによりキャリア12’の基板配列は基板10の表裏が
交互に配置され、所謂バック拳ツウ・バックとなし、気
相成長法例よるCVD装置への供給が可能である。また
他の例では基板10の裏面処理として金又はニッケル等
のメタ2イズ処理に適応される。
The substrate transfer machine 1 includes a reversal drive system consisting of a reversal arm 2 equipped with a vacuum chuck 3 that holds the substrate 10 by suction, a motor 5 that drives the reversal arm 2, and a reversal drive system that holds the substrate 10 in a predetermined position using positioning pins 8. It consists of a cylinder system that fixes it in position. In the reversing drive system, reversing arm 20 rotation axis 4
and a motor shaft are connected by a drive belt 6, and the rotation of the motor 5 rotates the reversing arm 180 degrees, and the reverse rotation causes it to return to the original position. On the other hand, in the cylinder system, a pair of cylinders 7 are arranged on the same line orthogonal to the air bearing 9, and when the cylinders are reversed, they are simultaneously driven and the υ board 10 is positioned at a predetermined position by positioning pins 8 and 8' forming cylinder arms. . The substrate 10 positioned in this manner is held by a parking chuck 3 provided at the tip of the reversing arm 2, and the parking chuck 3 is transferred onto the shear bearing 9 by reversing the reversing arm 2. It is held or released by the vacuum supply path 13 provided in the reversing arm 2. Released board 1
0 is accommodated in another carrier 12'. This operation is 11
As will be repeated next, for example, by inverting every other substrate 1o, the substrate arrangement of the carrier 12' is such that the front and back sides of the substrates 10 are alternately arranged, so that the so-called back-to-back arrangement is achieved. supply is possible. In another example, metal oxide treatment of gold, nickel, or the like is applied as the back surface treatment of the substrate 10.

反転アーム2とモータ5との連結は第2図で示すように
反転アーム2の回転軸4に連結する軸15を設け、軸1
5とモータ5とを駆動ベルト6を介して機械的に結合す
ることによりモータ5の回転により反転アーム2は反転
運動をくシ返すことになる。真空供給路13は軸15の
先端に設けた排気弁14よシ排気することによシバキュ
ームチヤング3F1基板10金吸匁する。またエアベア
リング9には基板ガイド16を設は基板lOの落下を防
止する。このような反転機構を備えた基板移替拶を用い
ることにより従来のバッチ処理から自動化が可能となる
太き々利点がある。
The connection between the reversing arm 2 and the motor 5 is as shown in FIG.
5 and the motor 5 are mechanically coupled via the drive belt 6, the rotation of the motor 5 causes the reversing arm 2 to reverse the reversing motion. The vacuum supply path 13 is evacuated through an exhaust valve 14 provided at the tip of the shaft 15 to absorb 10 yen of vacuum from the vacuum chamber 3F1 substrate. Further, a substrate guide 16 is provided on the air bearing 9 to prevent the substrate 10 from falling. The use of a substrate transfer system equipped with such a reversing mechanism has a significant advantage in that conventional batch processing can be automated.

@ 発明の効果 以上詳細に説明したように本発明の基板移替機を用いる
ことによシ、基板配列を変更させてキャリア内に移替が
可能となシ従来の手操作はなくなシ効率化が計られ、信
頼性、安定性が向上する効果が得られる。
@ Effects of the Invention As explained in detail above, by using the board transfer machine of the present invention, it is possible to change the board arrangement and transfer it into the carrier, eliminating the need for conventional manual operations and increasing efficiency. This has the effect of improving reliability and stability.

【図面の簡単な説明】[Brief explanation of the drawing]

Claims (1)

【特許請求の範囲】[Claims] 基板をアームに吸着させ、該アームがモータ駆動で反転
する反転機構によシ前記基板を反転させ移替を1jなう
ことを特徴とする基板移替機。
1. A substrate transfer machine, characterized in that a substrate is attracted to an arm, and the arm is driven by a motor to reverse the substrate, thereby inverting the substrate and transferring the substrate.
JP16347182A 1982-09-20 1982-09-20 Shifter for substrate Pending JPS5952845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16347182A JPS5952845A (en) 1982-09-20 1982-09-20 Shifter for substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16347182A JPS5952845A (en) 1982-09-20 1982-09-20 Shifter for substrate

Publications (1)

Publication Number Publication Date
JPS5952845A true JPS5952845A (en) 1984-03-27

Family

ID=15774496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16347182A Pending JPS5952845A (en) 1982-09-20 1982-09-20 Shifter for substrate

Country Status (1)

Country Link
JP (1) JPS5952845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6454417U (en) * 1987-09-30 1989-04-04

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5587422A (en) * 1978-12-25 1980-07-02 Mitsubishi Electric Corp Wafer-transferring device in wafer holder
JPS5687320A (en) * 1979-12-17 1981-07-15 M Setetsuku Kk Photoresist coating device on both sides

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5587422A (en) * 1978-12-25 1980-07-02 Mitsubishi Electric Corp Wafer-transferring device in wafer holder
JPS5687320A (en) * 1979-12-17 1981-07-15 M Setetsuku Kk Photoresist coating device on both sides

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6454417U (en) * 1987-09-30 1989-04-04

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