JPS594508B2 - How to prevent dripping from the ceiling inside the booth - Google Patents
How to prevent dripping from the ceiling inside the boothInfo
- Publication number
- JPS594508B2 JPS594508B2 JP10508580A JP10508580A JPS594508B2 JP S594508 B2 JPS594508 B2 JP S594508B2 JP 10508580 A JP10508580 A JP 10508580A JP 10508580 A JP10508580 A JP 10508580A JP S594508 B2 JPS594508 B2 JP S594508B2
- Authority
- JP
- Japan
- Prior art keywords
- booth
- ceiling
- heater
- processing
- zones
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Chemical Treatment Of Metals (AREA)
Description
【発明の詳細な説明】
本発明は、鉄鋼等を連続的に化成処理する装置のブース
内天井からの落滴防止方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for preventing drips from falling from the ceiling inside a booth of an apparatus that continuously chemically treats steel or the like.
鉄鋼等の連続的な化成処理工程は、一般に「脱脂→水洗
→皮膜化成→水洗→乾燥」の工程からなつており、場合
によつては被処理物の材質、処理品質、処理目的等によ
り酸洗、表面調整、後処理等の工程が組込まれている。The continuous chemical conversion treatment process for steel, etc. generally consists of the steps of "degreasing → water washing → film formation → water washing → drying". It incorporates processes such as washing, surface conditioning, and post-treatment.
その化成処理をするための装置は、一般に谷工程に必要
なそれぞれの処理液槽と、その各処理液槽の上方を通り
各処理液槽の底面に実質的に平行に設けられ入口及び出
口を有するトンネル状のブースと、そのブースの入口及
び出口を通つて延びるコンベヤと、種力附帯設備とから
なつている。又前記ブース内は、それぞれ前記の複数の
工程を処理するための複数の処理ゾーンと、互いに隣接
する処理ゾーンの中間に位置する谷処理液のドレーンゾ
ーンと、乾燥ゾーンとからなつている。各処理ゾーンは
、スプレ0一方式がとられたり浸漬方式がとられたりす
る。このような化成処理装置を稼動させて鉄鋼等の被処
理物を連続的に処理すると、熱せられた処理液を使用す
る処理ゾーンでは加熱、スプレー等による水蒸気又は霧
がブース内に充満してブース内″5 壁で結露し、天井
部で結露したものは滴となつて被処理物上に落下する。
各処理ゾーンにおける落滴は被処理物が処理液により覆
われているので問題ないが、各ドレーンゾーンで被処理
物上に落滴すると、落滴部の被処ノ0 理物表面は滴に
より微妙な化学変化を起し、黄鋼の発生や化成皮膜むら
等の化成不良の原因となる。The equipment for the chemical conversion treatment generally includes each treatment liquid tank necessary for the valley process, and is installed substantially parallel to the bottom surface of each treatment liquid tank, passing above each treatment liquid tank, and has an inlet and an outlet. It consists of a tunnel-shaped booth, a conveyor extending through the entrance and exit of the booth, and seed power auxiliary equipment. The inside of the booth is comprised of a plurality of processing zones for respectively processing the plurality of steps, a drain zone for the valley processing liquid located between the mutually adjacent processing zones, and a drying zone. Each treatment zone uses either a spray method or an immersion method. When such chemical conversion treatment equipment is operated to continuously process materials such as steel, the booth is filled with water vapor or mist from heating, spraying, etc. in the processing zone where heated processing liquid is used, causing the booth to overflow. Inner "5" Dew condenses on the walls, and the condensation on the ceiling becomes droplets and falls onto the object to be processed.
Droplets falling in each processing zone are not a problem because the object to be processed is covered with the processing liquid, but if drops fall on the object to be processed in each drain zone, the surface of the object to be treated at the droplet area will be covered by the droplets. Subtle chemical changes occur, causing defects in chemical conversion such as the formation of yellow steel and uneven chemical conversion coatings.
この落滴を防止するためには種々方法がとられている。
例えば、ブースの天井を傾斜させて結露した水フ5 滴
が壁伝いに流下するようにしたり、或いはブース内に大
量の新鮮空気を給気してブース内の水蒸気を排出させた
りしている。Various methods have been used to prevent this droplet from falling.
For example, the ceiling of the booth is sloped so that five drops of condensed water flow down the wall, or a large amount of fresh air is supplied into the booth to discharge water vapor inside the booth.
しかし、前者はブースの天井をかなり急傾斜にすること
から、それに見合つた高さの建屋でないと設置出来ない
し、後90者は被処理物が乾き易くなつて化成皮膜むら
の発生原因になると共に大量の熱エネルギを損失すると
いう欠点があつた。本発明の目的は、ブースの天井を傾
斜させることなく、又被処理物に影響を与えることなく
、ブ35−ス天井部からの落滴を防止する方法を提供す
ることにある。However, since the former requires a fairly steep slope to the ceiling of the booth, it cannot be installed unless the building is of an appropriate height, and the latter 90% can cause the processed material to dry easily, causing unevenness in the chemical conversion coating. The disadvantage was that a large amount of thermal energy was lost. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for preventing drops from falling from the booth ceiling without inclining the ceiling of the booth or affecting the objects to be processed.
本発明の目的を達成させるその方法は、ブース内の互い
に隣接する谷処理ゾーンの中間に位置するドレーンゾー
ンの上部天井に直接または近接してヒータを設け、前記
天井の下面及びその周辺温度を、ブース内の谷処理ゾー
ンの露点温度以上に保持する方法である。The method for achieving the object of the present invention is to provide a heater directly or in close proximity to the upper ceiling of a drain zone located between mutually adjacent valley treatment zones in the booth, and to adjust the temperature of the lower surface of said ceiling and its surroundings by: This method maintains the temperature above the dew point temperature of the valley processing zone in the booth.
本発明の第1実施例を第1図を参照しながら説明すれば
、化成処理装置は、下方に処理液槽1,2,3が配置さ
れ、各処理液槽の上方を通り各処理液槽の底面に実質的
に平行に入口及び出口を有するトンネル状のブース4が
配置され、ブース4の入口及び出口を通つてコンベヤ5
が設けられている。The first embodiment of the present invention will be described with reference to FIG. 1. The chemical conversion treatment apparatus includes treatment liquid tanks 1, 2, and 3 disposed below, and passes above each treatment liquid tank. A tunnel-shaped booth 4 is arranged having an inlet and an outlet substantially parallel to the bottom surface of the
is provided.
前記ブース4内には処理液槽1,2,3に対応して3つ
の処理ゾーン1a,2a,3aがあり、例えば処理ゾー
ン1a及び3aは高温雰囲気であり、処理ゾーン2aは
常温雰囲気である。隣接する処理ゾーンの中間にはドレ
ーンゾーン6a,6bがあり、プレートヒータ8a,8
bがドレーンゾーン6a,6bの上部天井1a,7bの
下面に近接し且つそのプレートヒータの平面が平行にな
るように設けられている。プレートヒータ8a,8bは
順次蒸気パイプ9a,9b,9cとによつて接続され、
蒸気によつてプレートヒータ8a,8bを加熱し、ブー
ス内処理ゾーン1a,3a露点温度よりも高く、例えば
その雰囲気温度よりも2℃以上高く保持されるようにす
る。つぎに本発明の第2実施例を第2図を参照しながら
説明すれば、第1実施例のプレートヒータ8a,8bの
かわりに、ブース4内のドレーンゾーン6a,6bの上
部天井Ra,rbが二重構造となつて空隙10a,10
bを有する天井ヒータ.11a,11bが設けられ、そ
の天井ヒータは、第1実施例のプレートヒータと同様に
蒸気パイプ9a,9b,9cによつて接続され、蒸気に
よつつ天井ヒータ11a,11bを加熱し、ブース内処
理ゾーン1a,3aの露点温度よりも高く、例えばその
雰囲気温度よりも2℃以上高く保持されるようにする。In the booth 4, there are three processing zones 1a, 2a, and 3a corresponding to the processing liquid tanks 1, 2, and 3. For example, the processing zones 1a and 3a have a high temperature atmosphere, and the processing zone 2a has a normal temperature atmosphere. . There are drain zones 6a, 6b between adjacent processing zones, and plate heaters 8a, 8.
b is close to the lower surface of the upper ceilings 1a, 7b of the drain zones 6a, 6b, and the planes of the plate heaters are parallel to each other. Plate heaters 8a, 8b are sequentially connected by steam pipes 9a, 9b, 9c,
Plate heaters 8a and 8b are heated by steam so that the temperature is maintained higher than the dew point temperature of processing zones 1a and 3a in the booth, for example, 2° C. or more higher than the ambient temperature thereof. Next, a second embodiment of the present invention will be described with reference to FIG. 2. In place of the plate heaters 8a and 8b of the first embodiment, upper ceilings Ra and rb of drain zones 6a and 6b in the booth 4 are has a double structure and the voids 10a, 10
Ceiling heater with b. 11a, 11b are provided, and the ceiling heaters are connected by steam pipes 9a, 9b, 9c similarly to the plate heater of the first embodiment, and heat the ceiling heaters 11a, 11b with steam to heat the inside of the booth. The temperature is maintained higher than the dew point temperature of the processing zones 1a and 3a, for example, 2° C. or more higher than the ambient temperature thereof.
前述の第1及第2実施例におけるプレートヒータ8a,
8b又は天井ヒータ11a,11bの加熱方法は、処理
液槽の加熱液を誘導して加熱しても良く、又他の熱水を
誘導して加熱しても良い。Plate heater 8a in the above-mentioned first and second embodiments,
8b or the ceiling heaters 11a, 11b may be heated by inducing the heating liquid in the processing liquid tank, or may be heated by inducing other hot water.
蒸気が蒸気パイプ9aよりプレートヒータ8a又は天井
ヒータ11aに誘導されると、プレートヒータ8a又は
天井ヒータ11aの下面は加熱され、プレートヒータ8
a周辺及びそのプレートヒータに近接する天井下面又は
天井ヒータ11a下面及びその周辺は高温雰囲気となリ
ブース内雰囲気の露点温度以上に保持されることとなり
、結露しない。プレートヒータ8a又は天井ヒータ11
aに誘導された蒸気は、次の蒸気パイプ9bを通り次の
プレートヒータ8b又は次の天井ヒータ11bに導入さ
れ、蒸気パイプ9cより排出される。以上の如く、本発
明を実施することによつて、ブース内の互いに隣接する
各処理ゾーンの中間に位置するドレーンゾーンの上部天
井面は結露することがなくなるので、被処理物は落滴1
9よる黄錆の発生や化成皮膜むら等の化成不良がなくな
る。When steam is guided from the steam pipe 9a to the plate heater 8a or the ceiling heater 11a, the lower surface of the plate heater 8a or the ceiling heater 11a is heated, and the plate heater 8
The area around a and the lower surface of the ceiling close to the plate heater or the lower surface of the ceiling heater 11a and its surroundings are maintained at a temperature higher than the dew point temperature of the atmosphere in the rebooth, which is a high temperature atmosphere, and no dew condensation occurs. Plate heater 8a or ceiling heater 11
The steam guided to a is introduced to the next plate heater 8b or the next ceiling heater 11b through the next steam pipe 9b, and is discharged from the steam pipe 9c. As described above, by carrying out the present invention, dew condensation does not form on the upper ceiling surface of the drain zone located between the mutually adjacent processing zones in the booth.
9, chemical formation defects such as occurrence of yellow rust and unevenness of chemical conversion coating are eliminated.
第1図及び第2図は本発明の第1及び第2実施例の線図
的側面断面説明図である。
1,2,3・・・・・・処理液槽、1a,2a,3a・
・・・・・処理ゾーン、4・・・・・・ブース、5・・
・・・・コンベヤ、6a,6b・・・・・・ドレーンゾ
ーン、Ra,rb・・・・・・上部天井、8a,8b・
・・・・・プレートヒータ、9a,9b,9c・・・・
・・蒸気パイプ、10a,10b・・・・・・空隙、1
1a,11b・・・・・・天井ヒータ。1 and 2 are diagrammatic side sectional explanatory views of first and second embodiments of the present invention. 1, 2, 3... Processing liquid tank, 1a, 2a, 3a.
...Processing zone, 4...Booth, 5...
...Conveyor, 6a, 6b...Drain zone, Ra, rb...Upper ceiling, 8a, 8b...
...Plate heater, 9a, 9b, 9c...
...Steam pipe, 10a, 10b...Gap, 1
1a, 11b...Ceiling heater.
Claims (1)
ーンを有する装置において、前記装置のブース内の互い
に隣接する各前記処理ゾーンの中間に位置するドレーン
ゾーンの上部天井に直接または近接してヒータを設け、
前記天井を前記ブース内の露点温度よりも高くすること
を特徴とするブース内天井からの落滴防止方法。1. In an apparatus having a plurality of processing zones for continuous chemical conversion treatment of steel, etc., directly or adjacent to the upper ceiling of the drain zone located between the mutually adjacent processing zones in the booth of the apparatus. Install a heater,
A method for preventing drops from falling from a ceiling inside a booth, characterized by making the ceiling higher than the dew point temperature inside the booth.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10508580A JPS594508B2 (en) | 1980-08-01 | 1980-08-01 | How to prevent dripping from the ceiling inside the booth |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10508580A JPS594508B2 (en) | 1980-08-01 | 1980-08-01 | How to prevent dripping from the ceiling inside the booth |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5735683A JPS5735683A (en) | 1982-02-26 |
JPS594508B2 true JPS594508B2 (en) | 1984-01-30 |
Family
ID=14398077
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10508580A Expired JPS594508B2 (en) | 1980-08-01 | 1980-08-01 | How to prevent dripping from the ceiling inside the booth |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS594508B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59184116U (en) * | 1983-05-26 | 1984-12-07 | 松下電器産業株式会社 | Optical connector fixing device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6250481A (en) * | 1985-08-30 | 1987-03-05 | Parker Sangyo Kk | Surface treatment of metallic strip |
-
1980
- 1980-08-01 JP JP10508580A patent/JPS594508B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59184116U (en) * | 1983-05-26 | 1984-12-07 | 松下電器産業株式会社 | Optical connector fixing device |
Also Published As
Publication number | Publication date |
---|---|
JPS5735683A (en) | 1982-02-26 |
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