JPS5943793U - Low temperature tank residual liquid processing equipment - Google Patents

Low temperature tank residual liquid processing equipment

Info

Publication number
JPS5943793U
JPS5943793U JP13890982U JP13890982U JPS5943793U JP S5943793 U JPS5943793 U JP S5943793U JP 13890982 U JP13890982 U JP 13890982U JP 13890982 U JP13890982 U JP 13890982U JP S5943793 U JPS5943793 U JP S5943793U
Authority
JP
Japan
Prior art keywords
residual liquid
low temperature
processing equipment
temperature tank
liquid processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13890982U
Other languages
Japanese (ja)
Inventor
充 福島
石田　常夫
健 辻
智 藤原
渡辺　安久
Original Assignee
石川島播磨重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 石川島播磨重工業株式会社 filed Critical 石川島播磨重工業株式会社
Priority to JP13890982U priority Critical patent/JPS5943793U/en
Publication of JPS5943793U publication Critical patent/JPS5943793U/en
Pending legal-status Critical Current

Links

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  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Coating Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の好適一実施例を低温タンクに取付けた
状態を示す縦断面図、第２図は第１図中■−■線矢視断
面図、第３図は気化ガス供給パイプに取付けた噴射ノズ
ルの一部示示す平面図である。 尚、図中１は低温タンク、２ａはタンクの底板、５は残
液処理装置、６は気化ガス供給パイプ、９は噴射ノズル
、１１は吸引装置、１２は気化ガス供給装置である。Fig. 1 is a vertical sectional view showing a preferred embodiment of the present invention installed in a low temperature tank, Fig. 2 is a sectional view taken along the line ■-■ in Fig. It is a top view which shows a part of the attached injection nozzle. In the figure, 1 is a low temperature tank, 2a is a bottom plate of the tank, 5 is a residual liquid processing device, 6 is a vaporized gas supply pipe, 9 is an injection nozzle, 11 is a suction device, and 12 is a vaporized gas supply device.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 低温液を貯留するための低温タンクにおいて、上記タン
ク内の底板に臨ませて、該底板上に残留する残液を加熱
気化するために加熱された気化ガスを噴射するための噴
射ノズルを設けたことを特徴とする低塩タンクの残液処
理装置。In a low-temperature tank for storing low-temperature liquid, an injection nozzle is provided facing the bottom plate of the tank for injecting heated vaporized gas in order to heat and vaporize residual liquid remaining on the bottom plate. A residual liquid treatment device for a low-salt tank, which is characterized by:
JP13890982U 1982-09-16 1982-09-16 Low temperature tank residual liquid processing equipment Pending JPS5943793U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13890982U JPS5943793U (en) 1982-09-16 1982-09-16 Low temperature tank residual liquid processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13890982U JPS5943793U (en) 1982-09-16 1982-09-16 Low temperature tank residual liquid processing equipment

Publications (1)

Publication Number Publication Date
JPS5943793U true JPS5943793U (en) 1984-03-22

Family

ID=30311523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13890982U Pending JPS5943793U (en) 1982-09-16 1982-09-16 Low temperature tank residual liquid processing equipment

Country Status (1)

Country Link
JP (1) JPS5943793U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159721A (en) * 1978-06-07 1979-12-17 Kawasaki Heavy Ind Ltd Residual liquid processing system for low temperature liquified gas tank

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159721A (en) * 1978-06-07 1979-12-17 Kawasaki Heavy Ind Ltd Residual liquid processing system for low temperature liquified gas tank

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