JPS58162399U - Low temperature tank residual liquid vaporization device - Google Patents

Low temperature tank residual liquid vaporization device

Info

Publication number
JPS58162399U
JPS58162399U JP6072082U JP6072082U JPS58162399U JP S58162399 U JPS58162399 U JP S58162399U JP 6072082 U JP6072082 U JP 6072082U JP 6072082 U JP6072082 U JP 6072082U JP S58162399 U JPS58162399 U JP S58162399U
Authority
JP
Japan
Prior art keywords
temperature tank
residual liquid
low temperature
vaporization device
liquid vaporization
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6072082U
Other languages
Japanese (ja)
Inventor
勉 新田
椋本　洋一
野口　信久
蟻義　正裕
Original Assignee
石川島播磨重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 石川島播磨重工業株式会社 filed Critical 石川島播磨重工業株式会社
Priority to JP6072082U priority Critical patent/JPS58162399U/en
Publication of JPS58162399U publication Critical patent/JPS58162399U/en
Pending legal-status Critical Current

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  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案の一実施例を示す図である。 １・・・低温タンク、２・・・ＢＯＧコンプレッサー、
５・・・噴射管。The drawings are diagrams showing one embodiment of the present invention. 1... Low temperature tank, 2... BOG compressor,
5... Injection pipe.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 低温タンク内の底部に噴射管を設け、該噴射管に、前記
低温タンク内の気化ガスを回収し圧縮するＢＯＧコンプ
レッサーを接続してなる低温タンクの残液気化装置。　
　　　　゛A residual liquid vaporization device for a low-temperature tank, comprising an injection pipe provided at the bottom of the low-temperature tank, and a BOG compressor for recovering and compressing vaporized gas in the low-temperature tank connected to the injection pipe.
゛
JP6072082U 1982-04-26 1982-04-26 Low temperature tank residual liquid vaporization device Pending JPS58162399U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6072082U JPS58162399U (en) 1982-04-26 1982-04-26 Low temperature tank residual liquid vaporization device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6072082U JPS58162399U (en) 1982-04-26 1982-04-26 Low temperature tank residual liquid vaporization device

Publications (1)

Publication Number Publication Date
JPS58162399U true JPS58162399U (en) 1983-10-28

Family

ID=30070955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6072082U Pending JPS58162399U (en) 1982-04-26 1982-04-26 Low temperature tank residual liquid vaporization device

Country Status (1)

Country Link
JP (1) JPS58162399U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019056381A (en) * 2017-09-19 2019-04-11 三井Ｅ＆Ｓ造船株式会社 Boil-off gas treatment system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159720A (en) * 1978-06-07 1979-12-17 Kawasaki Heavy Ind Ltd Residual liquid processing system for low temperature liquified gas tank

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54159720A (en) * 1978-06-07 1979-12-17 Kawasaki Heavy Ind Ltd Residual liquid processing system for low temperature liquified gas tank

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019056381A (en) * 2017-09-19 2019-04-11 三井Ｅ＆Ｓ造船株式会社 Boil-off gas treatment system

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