JPS5937056A - Manufacturing of abrasive material layer - Google Patents

Abstract

PURPOSE:To improve efficiency of abrasion by a method wherein the vacuum evaporated substance containing silicon oxide compound therein applied with a high frequency electric field to be ionized is vacuum evaporated on a substrate to make an abrasive layer and active oxygen is utilized during the application of the high frequency electric field. CONSTITUTION:As one example, a chromium is put in at first as a vacuum evaporated material 7 in a vacuum evaporated material container 6 within a vacuum container 5 and the degree of vacuum in the vacuum container 5 is decreased down to 1X10<-5>(Torr). Oxygen gas is fed from a gas feeding pipe 11 until the degree of vacuum is intensified to 8X10<-5>(Torr) and oxygen gas atmosphere 10 is formed in the vacuum container 5. Under this condition, the chromium is evaporated by an electron beam heating and evaporated source 8 and the chromium particles evaporated with the high frequency electric field formed by an electrode 4 causes an oxidation reaction with oxygen gas. The chromium particles adhere to the vacuum evaporated substrate 1 made of vinyl chloride held by a holder 3, resulting in producing an abrasive layer with high abrasion efficiency.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing an abrasive layer, and particularly to a method for manufacturing an abrasive layer suitable for polishing microfabricated parts.

There is a method of manufacturing the abrasive layer by vapor depositing chromium and silicon oxide compounds. Figure 1 shows how to form an abrasive layer using this method. ! This shows a general vapor deposition apparatus for 1 production, with nine empty containers 5 and a vapor deposition material container 6 for containing vapor deposition materials 7 such as chromium and silicon oxide compounds.
An electron beam heating evaporation source 8 is provided beside the evaporation material container 6, and the evaporation material 7 is thereby evaporated.

Further, a high frequency electrode 4 is provided, and the evaporated deposition material 7 is ionized by the high frequency electric field generated by the high frequency electrode 4. Then, particles of the ionized vapor deposition material lI+7 adhere to the holder 5 and onto the vapor deposition target substrate 1, which is attached, to form an abrasive layer.

Conventionally, an inert gas 2 such as argon is used as the atmospheric gas in the vacuum container 5 when performing the above operations, and the container B5 is filled with this inert gas 2.

However, when a hard brittle microfabricated part is polished using a current-sized abrasive layer manufactured using inert gas 2,
There are problems in that the polishing efficiency is low, the life of the abrasive layer is short, and productivity is poor.

The purpose of the present invention is also to polish hard and brittle micro parts.
It is an object of the present invention to provide a method for manufacturing an abrasive layer that has high polishing efficiency and a long life.

Hereinafter, an embodiment of the method for manufacturing an abrasive layer of the present invention will be described with reference to FIGS. 2 to 4.

FIG. 2 shows the inside of an example of an apparatus used in manufacturing an abrasive layer according to the present invention, and the same manufacturing apparatus as the conventional one can be used. This device consists of a vacuum container 5 containing an evaporation material 7, an electron beam heating evaporation source 8 beside the evaporation material container 6, a high frequency electrode 4 for generating a high frequency electric field, and a evaporation substrate 1. A holder 3 for holding the gas and a gas introduction pipe 11 for introducing gas into the container are installed.

A method for manufacturing an abrasive layer according to the present invention using the above-described manufacturing apparatus will be explained using a primary VC. In this example, chromium is first put into the vapor deposition material container 6 in the vacuum vessel 5 as the vapor deposition material 7. Then, inside the vacuum container 5, 1
The degree of vacuum is lowered to x 10'' (Torr), and the inside is once made clean. Here, gas introduction W1
1 to oxygen gas at a vacuum degree of 8x10-5 (Torr
) to form an oxygen gas atmosphere 10 in the vacuum container 5. In this state, chromium is evaporated by the electron beam heating evaporation source 8, and the evaporated chromium is ionized by the high frequency electric field generated by the high frequency electrode 4. At this time, since the oxygen gas atmosphere 10 is present, the ionized chromium particles undergo an oxidation reaction by the oxygen gas. These oxidized chromium particles adhere to the deposition target substrate 1 made of vinyl chloride material held by the holder 3. In this way, chromium Cr, which is an evaporation material, is deposited on the substrate 1 to be evaporated.
It becomes x and is deposited. Furthermore, the substrate 1 to be vapor deposited on which chromium oxide is attached is used, and silicon oxide compound Si is used as the vapor deposition material.
A silicon oxide compound is deposited as SiOx by a manufacturing method that uses O and constitutes the same oxygen atmosphere as the method for depositing chromium described above. As a result, chromium oxide Crux is deposited as a first layer and silicon oxide compound SiOx is deposited as a second layer on the deposition target substrate 1, thereby forming an abrasive layer.

Using the abrasive layer manufactured by the manufacturing method of 2J:, the tip of a rod-shaped hard brittle fine component 9 with a diameter of 2 mm was ground into a conical shape with a tip angle of 55°, as shown in Fig. 3. The results are shown in Figure 4. In this figure, for comparison, in addition to using conventionally used argon gas and oxygen gas according to the present invention, a mixture of argon gas and oxygen scum is used as the atmosphere gas. The case where this is done is also shown. In this graph/i, the vertical axis shows the amount of polishing per fixed time, and the horizontal axis shows the partial pressure ratio of argon and oxygen in the atmosphere gas. As shown in the figure, compared to when argon gas is 100 inches or when argon gas and oxygen gas are mixed, when oxygen gas is 100 inches, the amount of polishing reaches about five times in the same time. As described above, an abrasive layer produced by a manufacturing method that utilizes the reactivity of active oxygen gas has significantly improved polishing efficiency and excellent polishing resistance compared to conventional abrasive layers. Also, although not shown in the diagram, the lifespan is longer than conventional ones. In this example, chromium and a silicon oxide compound are used as vapor deposition materials, and the two layers are vapor-deposited on an extremely rigid substrate made of vinyl chloride material. Similar effects can be obtained when the abrasive layer is manufactured by vapor deposition using the reactivity of active oxygen gas.

As described above, according to the method for manufacturing an abrasive layer according to the present invention, since the vapor deposition is performed in an oxygen gas atmosphere while a high frequency electric field is superimposed, the ionized vapor deposition material undergoes an oxidation reaction while being vapor deposited. An abrasive layer is produced by vapor deposition on a substrate, and the abrasive layer thus obtained has significantly improved polishing efficiency, excellent polishing resistance, and long life.

[Brief explanation of drawings]

FIG. 1 is a schematic cross-sectional view of a manufacturing device manufacturing an abrasive layer according to the prior art, FIG. 2 is a schematic cross-sectional view of the same manufacturing device manufacturing an abrasive layer according to the present invention, and FIG. Use layer A
Figure 4 shows an example of a hard and brittle microfabricated part polished by polishing.
The figure is a chart comparing the polishing efficiency of an abrasive layer according to the prior art and an abrasive layer according to the present invention. 1... Board, 4... High frequency 1! Extreme, 7... Vapor deposition material. 10...Oxygen gas atmosphere

Claims (1)

[Scope of Claims] 1. An abrasive material in which an abrasive layer is formed by using a material containing a silicon oxide compound as a vapor deposition material, superimposing a high frequency electric field on the vapor deposition material to ionize it, and vapor depositing it on a substrate. 1. A method for producing an abrasive layer, characterized in that vapor deposition is performed by forming an oxygen gas atmosphere in a portion where a high-frequency electric field is superimposed. 2. The vapor deposition material is chromium and a silicon oxide compound. Chromium is vapor-deposited as the first layer and a silicon oxide compound is vapor-deposited as the second layer on the substrate. 2. The method of manufacturing an abrasive layer according to claim 1, wherein the vapor deposition is performed in a gas atmosphere.