JPS5933279B2 - レ−ザ装置 - Google Patents

レ−ザ装置

Info

Publication number
JPS5933279B2
JPS5933279B2 JP9973376A JP9973376A JPS5933279B2 JP S5933279 B2 JPS5933279 B2 JP S5933279B2 JP 9973376 A JP9973376 A JP 9973376A JP 9973376 A JP9973376 A JP 9973376A JP S5933279 B2 JPS5933279 B2 JP S5933279B2
Authority
JP
Japan
Prior art keywords
laser
laser device
oscillation
single crystal
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9973376A
Other languages
English (en)
Other versions
JPS5325392A (en
Inventor
忠雄 小見
俊夫 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP9973376A priority Critical patent/JPS5933279B2/ja
Publication of JPS5325392A publication Critical patent/JPS5325392A/ja
Publication of JPS5933279B2 publication Critical patent/JPS5933279B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/1601Solid materials characterised by an active (lasing) ion
    • H01S3/1603Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1611Solid materials characterised by an active (lasing) ion rare earth neodymium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/163Solid materials characterised by a crystal matrix
    • H01S3/164Solid materials characterised by a crystal matrix garnet
    • H01S3/1643YAG
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16Solid materials
    • H01S3/1691Solid materials characterised by additives / sensitisers / promoters as further dopants

Description

【発明の詳細な説明】 本発明はレーザ用単結晶に関し、特にY3Al5O、2
/Nd単結晶(Nd二YAGと略記)を使用したレーザ
装置に関する。
Nd:YAGレーザは非常にすぐれているが高人力化す
ると発振出力は第1図の如く飽和現象が 2見られる。
このため発振が不安定になりレーザの応用上問題が生じ
る。この欠点を改良するため本発明者等はNd:YAG
単結晶中に微量のSiイオンを添加することにより発振
閾値も下がりレーザ装置として非常にすぐれた特性を持
つ事がわか 。つた。Nd:YAG単結晶を引上げる際
にメルト中にSiO2を添加して、得られた結晶を分析
し、Siイオン濃度とレーザ発振の閾値(thresh
old)の関係を測定した所第2図の如くになり、結晶
中のSiイオン濃度としては2Yiμmから103wm
の範囲が良い事がわかつた。以下、本発明の一実施例に
ついて説明する。
第1図は従来のY3Al5O、2/Ndと本実施例のY
3Al5O、2/ Nd、、Siとを比較した入カー発
振出力相関図であり、Nd濃度は2原子%及びSi含有
量&魚 100pμmのもので引上法によつて育成され
た。図示されている様に従来のY3Al5O12/Nd
では飽和現象を示したが、Siが含有された本実施例の
Y3Al5012/Nd、Siでは発振出力も大きく、
飽和が見られなかつた。
第2図は発振開始エネルギーとレーザ結晶中のSi含有
量との関係を示すもので、化学分析によりSi含有量を
測定した。第2図の結果から2pμmから103pμm
の間のSi量が有効にレーザ育成に働くことがわかつた
。従つて本発明におけるSiの含有量を定める理由とし
た。以上、実施例から明らかなように本発明のNd二Y
AG単結晶中にSiを含有させたレーザロッドをレーザ
装置に具備させる事によつて発振出力の飽和が見られな
い、レーザ発振開始エネルギーの低い、効率の良い高性
能のレーザ装置を得る事が出来、例えば穴あけの様な加
工等に使用する場合非常に精度を向上させることができ
るものである。
【図面の簡単な説明】
第1図は従来のレーザ用単結晶と本発明の単結晶とのそ
れぞれ入カー発振出力関係を示す相関図、第2図は本発
明におけるNd:YAG単結晶中のSiが及ぼす発振開
始エネルギーを示す図である。

Claims (1)

    【特許請求の範囲】
  1. 1 2ppmから103ppmのSiイオンを含んだY
    _3Al_5O_1_2/Nd単結晶を具備したレーザ
    装置。
JP9973376A 1976-08-23 1976-08-23 レ−ザ装置 Expired JPS5933279B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9973376A JPS5933279B2 (ja) 1976-08-23 1976-08-23 レ−ザ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9973376A JPS5933279B2 (ja) 1976-08-23 1976-08-23 レ−ザ装置

Publications (2)

Publication Number Publication Date
JPS5325392A JPS5325392A (en) 1978-03-09
JPS5933279B2 true JPS5933279B2 (ja) 1984-08-14

Family

ID=14255240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9973376A Expired JPS5933279B2 (ja) 1976-08-23 1976-08-23 レ−ザ装置

Country Status (1)

Country Link
JP (1) JPS5933279B2 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007112951A (ja) * 2005-10-24 2007-05-10 Fujifilm Corp 無機化合物及びこれを含む組成物と成形体、発光装置、固体レーザ装置

Also Published As

Publication number Publication date
JPS5325392A (en) 1978-03-09

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