JPS5928047B2 - Hermetic sealing method for semiconductor devices - Google Patents

Hermetic sealing method for semiconductor devices

Info

Publication number
JPS5928047B2
JPS5928047B2 JP51102389A JP10238976A JPS5928047B2 JP S5928047 B2 JPS5928047 B2 JP S5928047B2 JP 51102389 A JP51102389 A JP 51102389A JP 10238976 A JP10238976 A JP 10238976A JP S5928047 B2 JPS5928047 B2 JP S5928047B2
Authority
JP
Japan
Prior art keywords
photocurable resin
bubbles
light emitting
semiconductor
semiconductor devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51102389A
Other languages
Japanese (ja)
Other versions
JPS5327366A (en
Inventor
浩 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP51102389A priority Critical patent/JPS5928047B2/en
Publication of JPS5327366A publication Critical patent/JPS5327366A/en
Publication of JPS5928047B2 publication Critical patent/JPS5928047B2/en
Expired legal-status Critical Current

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  • Casings For Electric Apparatus (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Led Device Packages (AREA)

Description

【発明の詳細な説明】 本発明は、光硬化性樹脂を使用して半導体素子を気密封
止即ちモールドする方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of hermetically sealing or molding semiconductor devices using photocurable resins.

従来、発光ダイオード、トランジスタ、ダイオード等を
モールドする場合には、まず第1図に示す如くリード部
材1に半導体チップ2を接着したものを用意し、これを
第2図に示すような所定形状の型3に入れ、例えばエポ
キシ樹脂4を注入し、しかる後加熱硬化することによつ
て第3図に示すようなモールド素子5としていた。
Conventionally, when molding light-emitting diodes, transistors, diodes, etc., first a semiconductor chip 2 is bonded to a lead member 1 as shown in FIG. 1, and then this is molded into a predetermined shape as shown in FIG. It was placed in a mold 3, injected with, for example, an epoxy resin 4, and then heated and cured to form a molded element 5 as shown in FIG.

この種のモールドはエポキシベース材と硬化剤との2液
混合で行うため、混合時に気泡が入り、更に加熱硬化時
に気泡が膨張し、気泡の残留が半導体素子の特性に悪影
響を与えるという問題がある。例えば、発光素子に於い
て気泡が残留していれば、発光表示の識別の幣害となり
、また一般の半導体素子に於いては耐圧の低下等の原因
となる。熱硬化性エポキシ樹脂の代りに光硬化性樹脂を
使用すれば、混合の必要がないので気泡が少なくなる。
This type of mold is made using a two-part mixture of an epoxy base material and a hardening agent, so there are problems such as air bubbles entering during mixing, expanding during heating and curing, and remaining air bubbles having an adverse effect on the characteristics of the semiconductor element. be. For example, if bubbles remain in a light-emitting element, it will impede the identification of the light-emitting display, and in general semiconductor elements, it will cause a drop in withstand voltage. If a photocurable resin is used instead of a thermosetting epoxy resin, there is no need for mixing, which reduces air bubbles.

またエポキシ樹脂のように混合後の使用時間の制限がな
いので、十分脱泡した状態での長期保存が可能である。
更に加熱によつて気泡が大きくなることが制限される。
従つて光硬化性樹脂でモールドした方が熱硬化性樹脂で
モールドするよりは気泡等の点で有利である。しかし、
光硬化性樹脂でモールドしても気泡の発生を避けること
は不可能であり、気泡による問題があつた。そこで、本
発明は気泡の少ないモールド素子を得るための半導体素
子のモールド方法即ち気密封止方法を提供することを目
的とするものである。
In addition, unlike epoxy resins, there is no restriction on the usage time after mixing, so it can be stored for a long time in a sufficiently defoamed state.
Furthermore, the growth of bubbles due to heating is limited.
Therefore, molding with a photocurable resin is more advantageous than molding with a thermosetting resin in terms of air bubbles, etc. but,
Even when molded with a photocurable resin, it is impossible to avoid the generation of bubbles, and problems arise due to bubbles. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method for molding a semiconductor device, that is, a method for hermetically sealing a semiconductor device to obtain a molded device with fewer bubbles.

即ち、本発明は、半導体素子の所定部分を末硬化の光硬
化性樹脂で所定形状に包むこと、前記所定形状の光硬化
性樹脂の周縁の少なくとも一部を非露光状態に保つて前
記一部以外の部分を露光し、硬化部分と末硬化部分とを
形成すること、前記末硬化部分である前記一部を除去す
ることを含んで半導体素子の気密封止をすることを特徴
とする半導体素子の気密封止方法に係わり、このような
工程をとることによつて気泡を極めて容易に除去し、気
泡の少ない半導体素子を提供しようとするものである。
次に図面を参照して本発明の1実施例に係わるモールド
方法を説明する。
That is, the present invention includes wrapping a predetermined portion of a semiconductor element in a predetermined shape with a partially cured photocurable resin, and keeping at least a portion of the periphery of the photocurable resin having the predetermined shape in a non-exposed state. A semiconductor device characterized in that the semiconductor device is hermetically sealed by exposing the remaining portion to light to form a cured portion and a partially cured portion, and removing the portion that is the partially cured portion. By using such a step, air bubbles can be removed extremely easily, and a semiconductor element with fewer air bubbles can be provided.
Next, a molding method according to an embodiment of the present invention will be described with reference to the drawings.

第4図〜第□図は本発明の1実施例に係わる発光素子の
モールド方法を工程順に示すものである。
FIGS. 4 to □ show a method of molding a light emitting device according to an embodiment of the present invention in the order of steps.

このモールドに当つてはまず、第4図に示す如く、支持
枠10を利用して所定パターンのマスク11を備えたガ
ラス板12を配置し、このガラス板12にモールド樹脂
が接着するのを防止するための透明フイルム13を置く
。この透明フイルム13は厚さ10〜30μのポリエス
テル又はポリプロピレンフイルムが適する。発光ダイオ
ードチツプ14が接着されたリード部材15は、下部治
具16と上部治具17及び支持枠10のピン18を利用
して位置決めされる。下部及び上部治具16及び17は
アセトン洗浄に耐えるAlやポリエチレンで作られたも
のであることが望ましい。支持枠10のピン18を利用
してマスク用ガラス板12、透明フイルム13、下部治
具16、リード部材15、上部治具17を順次に配置す
れば、側壁が治具16及び17で形成され底面が透明フ
イルム13で形成された凹部19中に発光ダイオードチ
ツプ14及びリード部材15の一部が置かれた状態とな
る。この状態に於いて、例えば関西ペイント社製のゾン
ネKPMlO46と呼ばれる光硬化性樹脂20を凹部1
9の容積より約10%多めに注入する。次に下部の透明
フイルム13と同質の透明フイルム21を覆せ、凹部1
9よりも幅の広いローラ22を透明フイルム21上に置
き、凹部19から盛り上つている光硬化性樹脂20を除
去するように凹部19の一端から他端に向つてローラ2
2を転がす。これにより、気泡の存在している光硬化性
樹脂20の上部が除去される。ローラ22を転がすこと
によつて光硬化性樹脂20の上面が平坦になつたら、第
5図に示す如くマスク23を有するガラス板24をピン
18を利用して透明フイルム21上に位置決めする。
For this mold, first, as shown in FIG. 4, a glass plate 12 with a mask 11 in a predetermined pattern is placed using a support frame 10 to prevent the mold resin from adhering to the glass plate 12. A transparent film 13 is placed thereon. This transparent film 13 is suitably a polyester or polypropylene film with a thickness of 10 to 30 microns. The lead member 15 to which the light emitting diode chip 14 is adhered is positioned using the lower jig 16, the upper jig 17, and the pins 18 of the support frame 10. The lower and upper jigs 16 and 17 are preferably made of Al or polyethylene that can withstand acetone cleaning. By sequentially arranging the mask glass plate 12, the transparent film 13, the lower jig 16, the lead member 15, and the upper jig 17 using the pins 18 of the support frame 10, the side walls are formed by the jigs 16 and 17. The light emitting diode chip 14 and part of the lead member 15 are placed in the recess 19 whose bottom surface is formed of the transparent film 13. In this state, for example, a photocurable resin 20 called Sonne KPMlO46 manufactured by Kansai Paint Co., Ltd. is placed in the recess 1.
Inject approximately 10% more volume than No. 9. Next, cover the transparent film 21 of the same quality as the lower transparent film 13, and
9 is placed on the transparent film 21, and the roller 2 is moved from one end of the recess 19 to the other end so as to remove the photocurable resin 20 protruding from the recess 19.
Roll 2. As a result, the upper part of the photocurable resin 20 where the bubbles are present is removed. When the upper surface of the photocurable resin 20 is made flat by rolling the roller 22, the glass plate 24 having the mask 23 is positioned on the transparent film 21 using the pins 18, as shown in FIG.

マスク23のパターンは下側のマスク11のノマターン
と同じであつて、光透過可能な窓25の幅は凹部19の
幅よりも小になつており、光硬化性樹脂?の周縁部26
が露光しないようになつている。光硬化性樹脂20の非
露光周縁部26の幅Lは凹部19の深さ即ち光硬化性樹
脂20の厚さの1/10に0.3umを加算した値とす
ることが望ましく、この実施例では凹部19の深さが4
mW!であるので、0.7mmとなつている。尚この幅
Lは光硬化性樹脂20を凹部19に注入したときに気泡
が発生し易い領域に対応している。第5図に示すマスク
合せが終了したら、上下の窓25を通して紫外線を約2
0分間光硬化性樹脂20に照射する。
The pattern of the mask 23 is the same as the pattern of the lower mask 11, and the width of the light-transmissible window 25 is smaller than the width of the recess 19. peripheral portion 26 of
is designed not to be exposed to light. The width L of the non-exposed peripheral portion 26 of the photocurable resin 20 is preferably a value obtained by adding 0.3 um to the depth of the recess 19, that is, 1/10 of the thickness of the photocurable resin 20. In this case, the depth of the recess 19 is 4.
mW! Therefore, it is 0.7 mm. Note that this width L corresponds to a region where bubbles are likely to occur when the photocurable resin 20 is injected into the recess 19. After completing the mask alignment shown in FIG.
The photocurable resin 20 is irradiated for 0 minutes.

この紫外線の照射は、例えば、30Wのケミカルランプ
2本を4cr1L間隔に並べ、且つマスクとの間隔を5
?として照度約30ルクスで行う。これにより、平行光
線27が生じ、周縁部26を非露光状態に保つた露光が
可能となる。露光が完了したら、マスク用ガラス板24
、透明フイルム21、上部治具17を取除き、光硬化性
樹脂で包まれたチツプ14及びリード部材15を取り出
す。第6図は取り出したモールド発光素子28を示すも
のであり、この状態では露光により硬化された光硬化性
樹脂の硬化部分29と非露光により末硬化の周縁部26
とがある。末硬化の周縁部26は治具16及び17に接
する部分であるので、比較的多くの気泡30が存在する
部分である。次に発光素子28をアセトンで洗浄し、末
硬化の周縁部26を溶解除去し、第7図で示す如く硬化
部分29のみとする。
This ultraviolet ray irradiation can be carried out using, for example, two 30W chemical lamps arranged at a spacing of 4cr1L, and a distance of 5cm from the mask.
? The illuminance is approximately 30 lux. This generates parallel light rays 27 and enables exposure while keeping the peripheral edge 26 in an unexposed state. When the exposure is completed, the mask glass plate 24
, the transparent film 21 and the upper jig 17 are removed, and the chip 14 and the lead member 15 wrapped in the photocurable resin are taken out. FIG. 6 shows the molded light emitting element 28 that has been taken out, and in this state, there is a hardened part 29 of the photocurable resin that has been hardened by exposure and a peripheral part 26 that has not yet been cured by not being exposed to light.
There is. The partially cured peripheral edge portion 26 is a portion in contact with the jigs 16 and 17, and is therefore a portion in which a relatively large number of bubbles 30 are present. Next, the light emitting element 28 is washed with acetone, and the partially cured peripheral portion 26 is dissolved and removed, leaving only the cured portion 29 as shown in FIG.

しかる後、約80℃の恒温槽に約30分間入れて光硬化
性樹脂の硬化部分29の硬化を完全に達成させ、発光素
子28を完成させる。
Thereafter, the photocurable resin is placed in a constant temperature bath for about 30 minutes to completely cure the cured portion 29 of the photocurable resin, thereby completing the light emitting device 28.

第4図〜第7図には理解を容易にするためにチツプ14
及びリード部材15が概略的に示されているが、実際に
は第8図に示すようなリードフレームから成るリード部
材15に複数の表示セグメントに対応して複数のチツプ
14を接着したものである。
Figures 4 to 7 contain chips 14 for ease of understanding.
Although the lead member 15 is schematically shown, in reality, the lead member 15 is made of a lead frame as shown in FIG. 8, and a plurality of chips 14 are bonded thereto in correspondence with a plurality of display segments. .

従つて硬化後には第9図に示す如くりード部材15を切
断し、かつ第10図に示す形状とする。上述の方法で発
光素子を形成すれば、エポキシモールドに比較して気泡
が少なくなるばかりではなく、気泡の発生し易い注入し
た光硬化性樹脂の周縁部26を非露光状態に保つて最終
的に除去しているので、極めて気泡が少なくなる。
Therefore, after curing, the lead member 15 is cut as shown in FIG. 9 and shaped into the shape shown in FIG. 10. If a light emitting element is formed using the above method, not only will there be fewer bubbles compared to epoxy molding, but the peripheral edge 26 of the injected photocurable resin, where bubbles are likely to be generated, will be kept in a non-exposed state and the final Since the bubbles are removed, the number of bubbles is extremely reduced.

従つて発光状態を観察し易い発光素子を提供出来る。ま
た凹部19に余分に光硬化性樹脂20を入れ、気泡の存
在する上部をローラ22を転すことによつて除去してい
るので、上部にも気泡の存在しない発光素子を提供出来
る。以下本発明の1実施例に付いて述べたが、本発明は
上述の実施例に限定されるものではなく、更に変形可能
なものである。
Therefore, it is possible to provide a light emitting element whose light emitting state is easy to observe. Further, since an extra photocurable resin 20 is placed in the recess 19 and the upper part where air bubbles exist is removed by rolling the roller 22, a light emitting element without air bubbles can be provided in the upper part. Although one embodiment of the present invention has been described below, the present invention is not limited to the above-described embodiment and can be further modified.

例えば光硬化性樹脂20の側面に対応する周縁部26を
非露光とせずに、チツプ14の上下面に相当する周縁部
を非露光として、ここを除去してもよい。また発光素子
のモールドに限らず、フオトトランジスタ、ダイオード
、トランジスタ等のモールドにも適用可能である。要す
るに気泡が存在することによつて光学的又は電気的に影
響を受けるあらゆる素子の製造に適用可能である。
For example, instead of leaving the peripheral edge part 26 corresponding to the side surface of the photocurable resin 20 unexposed, the peripheral edge part corresponding to the upper and lower surfaces of the chip 14 may be left unexposed and removed. Moreover, it is applicable not only to molds for light emitting elements but also to molds for phototransistors, diodes, transistors, and the like. In short, it is applicable to the manufacture of any element that is optically or electrically affected by the presence of bubbles.

【図面の簡単な説明】 第1図、第2図、及び第3図は夫々従来のモールド法を
順次に示す概略的断面図、第4図、第5図、第6図及び
第7図は本発明の1実施例に係わる発光素子のモールド
法を工程順に示す概略断面図、第8図、第9図及び第1
0図は夫々具体的な発光素子の構成を示す平面図及び斜
視図である。
[BRIEF DESCRIPTION OF THE DRAWINGS] FIGS. 1, 2, and 3 are schematic sectional views sequentially showing conventional molding methods, and FIGS. 4, 5, 6, and 7 are 8, 9, and 1 are schematic cross-sectional views showing a molding method for a light emitting device according to an embodiment of the present invention in the order of steps.
FIG. 0 is a plan view and a perspective view, respectively, showing the configuration of a specific light emitting element.

Claims (1)

【特許請求の範囲】 1 半導体素子の所定部分を末硬化の光硬化性樹脂で所
定形状に包むこと、前記所定形状の光硬化性樹脂の周縁
の少なくとも一部を非露光状態に保つて前記一部以外の
部分を露光し、硬化部分と末硬化部分とを形成すること
、及び前記末硬化部分である前記一部を除去することを
含んで半導体素子の気密封止をすることを特徴とする半
導体素子の気密封止方法。 2 前記半導体素子が、発光素子である特許請求の範囲
第1項記載の半導体素子の気密封止方法。 3 前記一部が、気泡の発生し易い部分である特許請求
の範囲第1項又は第2項記載の半導体素子の気密封止方
法。
[Scope of Claims] 1. Wrapping a predetermined portion of a semiconductor element in a predetermined shape with a partially cured photocurable resin, and keeping at least a part of the periphery of the photocurable resin in a non-exposed state to The semiconductor element is hermetically sealed by exposing a portion other than the semiconductor element to light to form a cured portion and a partially cured portion, and removing the portion that is the partially cured portion. A method for hermetically sealing semiconductor devices. 2. The method for hermetically sealing a semiconductor device according to claim 1, wherein the semiconductor device is a light emitting device. 3. The method for hermetically sealing a semiconductor device according to claim 1 or 2, wherein the portion is a portion where bubbles are likely to occur.
JP51102389A 1976-08-27 1976-08-27 Hermetic sealing method for semiconductor devices Expired JPS5928047B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51102389A JPS5928047B2 (en) 1976-08-27 1976-08-27 Hermetic sealing method for semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51102389A JPS5928047B2 (en) 1976-08-27 1976-08-27 Hermetic sealing method for semiconductor devices

Publications (2)

Publication Number Publication Date
JPS5327366A JPS5327366A (en) 1978-03-14
JPS5928047B2 true JPS5928047B2 (en) 1984-07-10

Family

ID=14326083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51102389A Expired JPS5928047B2 (en) 1976-08-27 1976-08-27 Hermetic sealing method for semiconductor devices

Country Status (1)

Country Link
JP (1) JPS5928047B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0430102Y2 (en) * 1986-01-28 1992-07-21

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4666763A (en) * 1984-12-07 1987-05-19 Akzona Incorporated Fiber batts and the method of making

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0430102Y2 (en) * 1986-01-28 1992-07-21

Also Published As

Publication number Publication date
JPS5327366A (en) 1978-03-14

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