JPS59215354A - Wax composition and method for using the same - Google Patents

Abstract

PURPOSE:To provide the titled compsn. which can be easily processed into a wax pattern and has good shape retension after processing, by incorporating a polymerizable monomer and a photopolymerization initiator in wax. CONSTITUTION:A wax compsn. is obtd. by incorporating a polymerizable monomer having a (meth)acryloyl group at its terminal or its oligomer having a (meth)acryloyl group at its terminal (e.g. phenoxytriethylene glycol acrylate) and a photopolymerization initiator (e.g. benzophenone) in wax (e.g. beeswax or paraffin wax). Wax patterns prepd. from conventional wax compsn. for lost wax process easily undergoes changes in its shape so that productivity is low and manufacturing cost is increased. By incorporating said polymerizable monomer and the photopolymerization initiator, a compsn. can be obtd. which can be processed into a wax pattern which has good shape retention after irradiating it with actinic rays to photopolymerize it.

Description

[Detailed description of the invention] FIELD OF THE INVENTION This invention relates to wax compositions and methods of using the same.

Wax compositions used in wax patterns used in relatively small-sized precision casting methods, or lost wax methods, are susceptible to deformation even when handled carefully by technicians, which reduces productivity and slows down production. This caused the cost to soar.

Furthermore, in the summer, it is difficult to obtain sufficient hardness with ordinary wax compositions, and it is sometimes difficult to maintain the shape of wax turns even after processing.

The present invention solves the above-mentioned conventional drawbacks, and provides a wax composition that is easy to process into a wax pattern and has good shape retention after processing, and a method for using the same. .

The gist of the present invention is as follows: (2) a wax composition comprising a wax, a polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group at the terminal, and a photopolymerization initiator; A wax pattern is formed using a wax composition consisting of a polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group and a photopolymerization initiator, and the polymerizable monomer or oligomer is polymerized by irradiation with actinic light. A method of using a wax composition characterized by:

The wax used in the present invention is a wax that has been conventionally used in the lost wax method, and specifically, spermaceti,
Means beeswax, linden wax, rough-in, lanolin, stearin, etc., and mixtures thereof.

In the present invention, a polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group at the end is mixed with the wax.

Polymerizable monomers or oligomers having an acryloyl group or methacryloyl group at the end are those that can be activated by light irradiation to initiate polymerization, and wax 100
Based on parts by weight, 1 to 302 II'jt parts are used.

When the core polymerizable monomer or oligomer is polymerized in the wax, it becomes a polymer and becomes like a core in the wax, which improves shape retention and eliminates easily deformable cores.

Further, at the stage where the polymerizable monomer or oligomer has not yet started polymerization, it is easily deformed and the process of forming a wax pattern can be carried out as usual.

If the polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group at the end is 1 part by weight per 100 parts of the ring, the effect of modification by polymerization will be small, and if it exceeds 30 parts by weight, the volume due to polymerization will decrease. Changes and deformations are more likely to occur.

Specific examples of polymerizable monomers or oligomers having an acryloyl group or methacryloyl group at the end are as follows.

Methoxypolyethylene glycol methacrylate, tetrahydrofurfuryl methacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, polyethylene glycol diacrylate - 1.3
Butylene glycol dimethacrylate, neopentyl glycol dimethacrylate, diethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol diacrylate fiber acrylate, phenoxytriethylene glycol acrylate, phenoxypolyethylene glycol acrylate, p-)nylphenoxytriethylene Glycol acrylate, P-nonylphenoxydipropylene glycol 7/rylate, 7-el glyceryl acrylate,
mono-(acryloyl)ethyl-7thaleate, mono-(acryloyl)ethyl-sulfcine), 1.6
-Hexanediol diacrylate, CH2:CH-COO-(KG-PA-)-(EC)-
OOC-CII=CH2, CH2:CH-COO-(g
c) -(rDt)-(gc-AnA)-(!ζ G)-
(TDI)-(+!G)-00C-CI! =C■21 CH2=CH-Coo-(GC-BP)-GC-00C
-CH=Cf12, (EG: ethylene glycol, PA: 7 tar acid, tDi;) luene diisocyanate, AnA: adivin [, GCi glycerin, B
P; indicates bisphenol A).

In the present invention, a photopolymerization initiator is further mixed. The photopolymerization initiator is mixed by weight of 0.01 to 1 part by weight per 100 parts by weight of wax.

The photopolymerization initiator may be one that activates the polymerizable monomer or Mori oligomer and initiates polymerization upon receiving active light, such as ultraviolet light, and specific examples include benzophenone, P-P' -Bis(dimethylamino)benzophenone, biclamide, 1,2-benzoanthraquinone, 2-nitrofluorene, 5-nitroacenaphthene, N-acetyl-4-nitro-1-su7thylamine, diacetyl, benzyl, benzoin, α- Halogenated ketones, ω-bromoacetophenone, cyclohexanone,
Mercaptans, diphenyl sulfide, dipenzothiazoyl disulfide, dialkylxanthogens tR,
Tetramethylthiuram monosulfide, tetramethylthiuram disulfide, methyldiethyldithiocarbamate, S-acyldithiocarbamate, decylthiobenzoate, azobisisobutyronitrile, 2.2'-azobispropane, Bunte salt, m, m'- Azoxystyrene, hydrazones, benzoyl peroxide, di-t-butyl peroxide, cyclic peroxide, 1-naphthoyl peroxide, 2-nathoyl peroxide, acetyl peroxide-anthracene, acetyl peroxide naphthalene, fluorenone peroxide -fluorenone, benzoyl peroxide, chlorophyll, etc.

The wax composition of the present invention is heated to a temperature close to the melting point of red.
A polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group at the end and a photopolymerization initiator are uniformly mixed in a short time, and a wax separation agent is applied to the master mold to form a wax pattern.

Next, a radical monomer or oligomer is polymerized using a photopolymerization initiator such as ultraviolet rays.

When the polymerizable hexamer or oligomer is polymerized, a core is formed in the wax pattern, and it is not easily deformed, and there is no need for particular cooling even in summer.

Thereafter, the wax pattern is removed from the original mold, coated with a refractory in the same manner as conventionally exposed, and the wax pattern is buried in a refractory slurry, deringed and fired to obtain a mold. The method of using the same can be applied to the production of mechanical parts such as jet engines, vehicles, pumps, etc., or clasps and sprues for dental technology.

Example 30 parts by weight of beeswax, paraffin wax (111 points, 57°C
) 70 parts by weight, 10 parts by weight of phenoxytriethylene glycol acrylate, and 0.5 parts by weight of benzophenone were uniformly mixed at 50°C for 1 minute.
A 5-inch rod is made of wax for clasps used by dental technicians.
Created a turn.

Next, ultraviolet rays were irradiated for 10 minutes using a high-pressure mercury lamp.

Example r〉 Instead of phenoxytriethylene glycol acrylate in Example 1, r-nonylzenoxytriethylene glyco, -ru*@tll@l-11-acrylate x
oli blue part was used.

<Example 3> In place of phenoxytriethylene glycol acrylate in Example 1, 110 parts by weight of r-nonylphenoxydibrobin glycol acrylate was used.

<Example 4> Phenylglyceryl acrylate) 10 at 97 p of the phenoxytriethylene glycol acrylate of Example 1
A heavy bale section was used.

*For any of Examples 1 to 4, the process of turning the wax can be performed to 1% of the volume, and after polymerizing the polymerizable monomer or oligomer, the shape retention is increased and the temperature at 30°C It did not deform easily even at temperatures above this level, and we were able to remove the wax turn and create the mold.

Comparative example> 30 parts by weight of beeswax, rose twin wax (melting point 57°C) 7
I tried forming a wax pattern using 0 parts by weight of wax in the same manner as in the example, but it became extremely easy to deform when heated to 25°C, requiring treatments such as immersion in ice water, making processing difficult. Ta.

patent applicant Kinsui Chemical Industry Co., Ltd. Representative: Mototoshi Fujinuma

Claims (1)

[Scope of Claims] A wax composition comprising +11 wax, a polymerizable monomer or oligomer having an acryloyl group or methacryloyl group at the end, and a photopolymerization initiator. (2) A wax pattern is formed using a wax composition consisting of ^, a polymerizable monomer or oligomer having an acryloyl group or a methacryloyl group at the end, and a photopolymerization initiator, and irradiation with actinic light allows the #polymerizable monomer to be formed. Or 011 to polymerize oligomers? A method of using the wax composition of t.